CN208308948U - A kind of rear portion ARC magnetic field adjustment mechanism - Google Patents

A kind of rear portion ARC magnetic field adjustment mechanism Download PDF

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Publication number
CN208308948U
CN208308948U CN201820808461.5U CN201820808461U CN208308948U CN 208308948 U CN208308948 U CN 208308948U CN 201820808461 U CN201820808461 U CN 201820808461U CN 208308948 U CN208308948 U CN 208308948U
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China
Prior art keywords
cooling flange
target
cooling
rear portion
weldment
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Active
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CN201820808461.5U
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Chinese (zh)
Inventor
刘晓华
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Dalian weitike nanotechnology Co., Ltd
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DALIAN VACUUM TECHNOLOGIES Inc
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Priority to CN201820808461.5U priority Critical patent/CN208308948U/en
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Abstract

A kind of rear portion ARC magnetic field adjustment mechanism, target seat top is installed by target, cooling flange is equipped with below target seat, cooling flange outer symmetrical is welded with cooling flange weldment, cooling flange weldment is hollow structure, cooling flange weldment end connects water nozzle, and the hollow structure between cooling flange weldment, cooling flange top and target stand constitutes cooling water channel;Nut cap is installed in cooling flange lower part, installs handle through nut cap screw thread, and the handle upper end inside cooling flange installs magnetic receiver, installs magnet on magnetic receiver.Rear portion magnet is mounted on adjustable handle mechanism by the utility model, realizes that rear portion magnetic field provides enough energy to plasma sputter always effectively to adjust magnet at a distance from target;It is cooling to target plus cooling device behind target, while also can guarantee that the ion of sputtering is more tiny, prevent the generation of bulky grain, make that film layer is finer and smoother, enhancing binding force, keeps arc source runnability more stable, reliable.

Description

A kind of rear portion ARC magnetic field adjustment mechanism
Technical field
The utility model relates to technical field of vacuum equipment more particularly to vacuum coating equipments.
Background technique
In the prior art, vacuum equipment, in use can be gradually since in coating process, arc source target is consumables Consumption, causes target thinning, and subsequent fixed magnet intensity cannot be supplied to plasma sputter gradually with enough energy, and to plating The factors such as membrane efficiency and binding force, adhesive force generate irreversible influence.
And target temperature increases the generation that will lead to the ion bulky grain of sputtering, it is difficult to guarantee that film layer is fine and smooth and combines Power, arc source runnability are unstable.
Utility model content
In order to solve the above problem existing for existing vacuum coating equipment, the utility model provides a kind of rear portion ARC magnetic Field adjustment mechanism.
The utility model technical solution used for the above purpose is: a kind of rear portion ARC magnetic field adjustment mechanism, target Target is installed on material seat top, is equipped with cooling flange below target seat, and cooling flange outer symmetrical is welded with cooling flange weldment, Cooling flange weldment is fixedly connected with target seat, and cooling flange weldment is hollow structure, and cooling flange weldment end connects Water collecting nozzle, the hollow structure structure between cooling flange weldment, cooling flange top and target stand claim cooling water channel;Under cooling flange Nut cap is installed in portion, installs handle through nut cap screw thread, the handle upper end inside cooling flange installs magnetic receiver, magnet Magnet is installed on seat.
The magnetic receiver is fixed on handle by vertebra end jackscrew.
The positioning sleeve of installation insulation outside the magnetic receiver.
The rear portion the ARC magnetic field adjustment mechanism of the utility model, rear portion magnet is mounted on adjustable handle mechanism, with Effectively adjustment magnet realizes that rear portion magnetic field provides enough energy to plasma sputter always at a distance from target;Behind target It in addition cooling device is cooling to target, while also can guarantee that the ion of sputtering is more tiny, prevent the generation of bulky grain, make film layer Finer and smoother, enhancing binding force, keeps arc source runnability more stable, reliable.
Detailed description of the invention
Fig. 1 is the rear portion the utility model ARC magnetic field adjustment mechanism structure chart.
In figure: 1, target, 2, target seat, 3, water nozzle, 4, cooling flange, 5, nut cap, 6, handle, 7, vertebra end jackscrew, 8, Magnetic receiver, 9, positioning sleeve, 10, magnet, 11, O-ring seal, 12, cooling flange weldment.
Specific embodiment
The rear portion the ARC magnetic field adjustment mechanism structure of the utility model is as shown in Figure 1, target 1, target are installed in 2 top of target seat Cooling flange 4 is equipped with below material seat 2,4 outer symmetrical of cooling flange is welded with cooling flange weldment 12, cooling flange weldment 12 are fixedly connected with target seat 2, and cooling flange weldment 12 is hollow structure, and 12 end of cooling flange weldment connects water nozzle 3, Hollow structure between cooling flange weldment 12,4 top of cooling flange and target stand 2 constitutes cooling water channel;4 lower part of cooling flange Nut cap 5 to be installed, handle 6 is installed through 5 screw thread of nut cap, magnetic receiver 8 is installed in 6 upper end of handle inside cooling flange 4, Magnet 10 is installed, magnetic receiver 8 is fixed on handle 6 by vertebra end jackscrew 7, and installation insulation determines outside magnetic receiver 8 on magnetic receiver 8 Position set 9 is used to support magnetic receiver 8.
In use, adjusting the distance between upper magnet 10 and target 1 by rotating handle 6, realize that structure is simple, pacifies Entirely, versatility is good.One water nozzle 3 of cooling flange weldment 12 is water inlet water nozzle, and the water nozzle 3 of the other side is water outlet water nozzle, is led to Gap between 12 hollow structure of supercooling flange connector, cooling flange 4 and target seat 2 forms water route, realizes the cold of target 1 But.
Target is consumables in the system, can be gradually used up in use, causes target thinning, and rear portion magnet is pacified On adjustable handle mechanism, realize rear portion magnetic field always to sputtering effectively to adjust magnet 10 at a distance from 1 material of target Ion provides enough energy.Target can generate heat in sputtering process in the system, thus plus cooling behind target Device is cooling to target, while also can guarantee that the ion of sputtering is more tiny, prevents the generation of bulky grain, makes film layer more refinement Greasy, enhancing binding force, keeps arc source runnability more stable, reliable.
The utility model is described by embodiment, and those skilled in the art know, practical new not departing from this In the case where the spirit and scope of type, various changes or equivalence replacement can be carried out to these features and embodiment.In addition, at this Under the introduction of utility model, it can modify to these features and embodiment to adapt to particular situation and material without taking off Spirit and scope from the utility model.Therefore, the utility model is not limited to the particular embodiment disclosed, and is owned The embodiment fallen within the scope of claims hereof belongs to the protection scope of the utility model.

Claims (3)

1. a kind of rear portion ARC magnetic field adjustment mechanism, it is characterised in that: target (1) is installed on target seat (2) top, under target seat (2) Side is equipped with cooling flange (4), and cooling flange (4) outer symmetrical is welded with cooling flange weldment (12), cooling flange weldment (12) it is fixedly connected with target seat (2), cooling flange weldment (12) is hollow structure, and cooling flange weldment (12) end connects Water collecting nozzle (3), the hollow structure between cooling flange weldment (12), cooling flange (4) top and target seat (2) constitute cooling Water route;Nut cap (5) are installed in cooling flange (4) lower part, through nut cap (5) screw thread installation handle (6), are located at cooling flange (4) magnetic receiver (8) are installed in internal handle (6) upper end, install magnet (10) on magnetic receiver (8).
2. a kind of rear portion ARC magnetic field according to claim 1 adjustment mechanism, it is characterised in that: the magnetic receiver (8) passes through Vertebra end jackscrew (7) is fixed on handle (6).
3. a kind of rear portion ARC magnetic field according to claim 1 adjustment mechanism, it is characterised in that: the magnetic receiver (8) is external The positioning sleeve (9) of insulation is installed.
CN201820808461.5U 2018-05-29 2018-05-29 A kind of rear portion ARC magnetic field adjustment mechanism Active CN208308948U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201820808461.5U CN208308948U (en) 2018-05-29 2018-05-29 A kind of rear portion ARC magnetic field adjustment mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201820808461.5U CN208308948U (en) 2018-05-29 2018-05-29 A kind of rear portion ARC magnetic field adjustment mechanism

Publications (1)

Publication Number Publication Date
CN208308948U true CN208308948U (en) 2019-01-01

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201820808461.5U Active CN208308948U (en) 2018-05-29 2018-05-29 A kind of rear portion ARC magnetic field adjustment mechanism

Country Status (1)

Country Link
CN (1) CN208308948U (en)

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Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20201021

Address after: 116600, No. seven, 13 street, Northeast Economic and Technological Development Zone, Liaoning, Dalian

Patentee after: Dalian weitike nanotechnology Co., Ltd

Address before: 116600 -A, B, 3-1 West Tieshan Road, Dalian economic and Technological Development Zone, Liaoning, China

Patentee before: DALIAN VACUUM TECHNOLOGIES Inc.

TR01 Transfer of patent right