CN208167098U - The chemical vapor depsotition equipment of single heating system multi-reaction chamber - Google Patents

Abstract

A kind of chemical vapor depsotition equipment, including：At least two independent reaction chambers with air inlet and exhaust outlet, a removable heating equipment；Each reaction chamber includes the adapter that one open at one end and the closed reaction tube of the other end, a gas-guide tube being placed in inside reaction tube and one are connected with reaction tube open end and gas-guide tube simultaneously；The removable heating equipment has the cavity for being arranged the reaction tube.Chemical vapor depsotition equipment according to the present utility model can be heated to multiple reaction chambers using a set of heating equipment, without heating and cooling repeatedly, not only sufficiently save the energy, can also improve production efficiency.

Description

The chemical vapor depsotition equipment of single heating system multi-reaction chamber

Technical field

The utility model relates to material manufacture and modified field more particularly to a kind of chemical vapor depsotition equipments.

Background technique

Production of thin film by chemical gas-phase deposition material is widely used in semi-conductor industry and other industrial circles.For one Typical chemical vapor deposition processes, the reaction gas with specific components and flow enter from air inlet equipped with reaction substrate Reaction chamber occurs chemical reaction and the deposition film on reaction substrate, reacts by product and residual gas from row in the reaction chamber Port discharge.

(horizontally or vertically) tubular type furnace system is a kind of equipment for being commonly used for chemical vapor deposition, please refers to Fig. 1.Figure 1 show a kind of existing tube furnace chemical vapor depsotition equipment 000.The reaction chamber 001 of the equipment 000 is that quartz or ceramics are anti- Ying Guan.The middle part of reaction chamber 001 is placed in tube furnace 002.Reaction substrate 003 is placed in 001 middle part of reaction chamber.In general, reaction gas Body enters reaction chamber 001 from one end of reaction chamber 001, i.e. air inlet 004, chemical reaction occurs in reaction chamber 001 and anti- Deposition film on substrate 003 is answered, reacts by product and residual gas from the other end of reaction chamber 001, i.e. exhaust outlet 005 is discharged.

This equipment 000 has the shortcomings that following several：1) not can be carried out rapid thermal treatment, i.e., heating and cooling rate by Limitation.2) entire production process includes being packed into reaction substrate, heating reaction substrate (while part energy is had for heating tube Formula furnace itself), deposition film cools down (cooling including furnace body), takes out the key steps such as reaction substrate.It can be seen that being used for The energy of heated Tube-furnace itself slatterns；And substrate is reacted being packed into, and during cooling, and taking-up substrate, tubular type Furnace then belongs to the idle waste to equipment there is no being used；Meanwhile repeatedly to tube furnace heating and cooling, can also shorten it makes Use the service life.

For these reasons, it is necessary to develop a kind of chemical vapor depsotition equipment, can rapid temperature rise and drop, and subtract The waste of few energy, improves service efficiency, increases service life.

Utility model content

To achieve the above object, the utility model provides a kind of new chemical vapor depsotition equipment (or Equipment for Heating Processing), And the method using the equipment.

Chemical vapor depsotition equipment provided by the utility model includes：At least two is independent with air inlet and exhaust outlet Reaction chamber, a removable heating equipment；

Each reaction chamber include that one open at one end and the closed reaction tube of the other end, one be placed in reaction tube The gas-guide tube in portion and an adapter being connected simultaneously with reaction tube open end and gas-guide tube；

The adapter includes at least one connector, an air inlet, an exhaust outlet and a drain hole, Its connector is connected with the reaction tube open end, the one end of air inlet inside adapter and the one of the gas-guide tube End is connected, and the other end of the gas-guide tube extends close to the closed end of the reaction tube；

The removable heating equipment has the cavity for being arranged the reaction tube.

The air inlet of reaction chamber (reaction tube) and exhaust outlet are arranged by the above unique structure design for the utility model In the same side, so that the other end of reaction tube is closed, so as to so that reaction chamber can carry out fast with removable heating equipment Ground socket.

Under preferable case, the chemical vapor depsotition equipment of the utility model further includes that a set of limit moves heating equipment shifting The track of dynamic route.

Under preferable case, universal wheel is housed on the pedestal of the removable heating equipment.

Under preferable case, the removable heating equipment is tube type resistance furnace.

The chemical vapor depsotition equipment of the utility model also can be applied to the heat treatment process of material.

Chemical vapor depsotition equipment according to the present utility model can be carried out using a set of heating equipment to multiple reaction chambers Heating, without heating and cooling repeatedly, has not only sufficiently saved the energy, can also improve production efficiency.

Detailed description of the invention

Fig. 1 is the structural schematic diagram of existing chemical vapor depsotition equipment；

Fig. 2 is the schematic side view of the chemical vapor depsotition equipment of the utility model；And

Fig. 3 is the schematic top plan view of the chemical vapor depsotition equipment of the utility model.

Specific embodiment

To absolutely prove the characteristic of the utility model and implementing the mode of the utility model, embodiment is given below.

Chemical vapor depsotition equipment (or Equipment for Heating Processing) according to the present utility model includes：At least two independent have The reaction chamber of air inlet and exhaust outlet, a removable heating equipment.

In the embodiment illustrated in figure 2, the chemical vapor depsotition equipment of the utility model includes two independent reaction chambers 100 and 200, the structure having the same of reaction chamber 100 and 200.In other embodiments, reaction chamber can also be three and three More than, the structure of multiple reaction chambers can also be slightly different, as long as adapting to same heating equipment.

Referring specifically to Fig. 1, reaction chamber 100 is open at one end including one and the closed reaction tube of the other end 101, one is placed in Gas-guide tube 102 and an adapter being connected simultaneously with 101 open end of reaction tube and gas-guide tube 102 inside reaction tube 101 104.Reaction tube 101 is used to place to be deposited or heat treatment reaction substrate 106.Reaction tube 101 can be using quartz or ceramics Pipe, naturally it is also possible to be made of metal or other materials.

Adapter 104 includes an exhaust outlet 105 of air inlet 103, one of connector 109, one and a drain hole 107.The open end sealing of connector 109 and reaction tube 101 is connected, the one end of air inlet 103 inside adapter 104 with lead One end of tracheae 102 is connected, and the other end of gas-guide tube 102 extends close to the closed end of reaction tube 101.In the reality shown in attached drawing It applies in example, adapter 104 is " ten " font four-way structure, and air inlet 103 and about 105 exhaust outlet are opposite, drain hole 107 It is opposite with connector 109 or so；Air inlet 103 is under, and exhaust outlet 105 is upper；This design structure both facilitated and reaction tube 101 Connection also facilitates pick-and-place reaction substrate 106.Adapter 104 is also provided with support frame 108.

Removable heating equipment 10 specifically can be tube type resistance furnace, have the cavity for being arranged reaction tube 101.It is removable Universal wheel 11 is housed, to be moved easily on the pedestal of heating equipment 10.

The chemical vapor depsotition equipment of the utility model further includes that a set of limit moves 10 mobile route of heating equipment Track 12.Track 12 is arranged around each reaction chamber, so that removable heating equipment 10 is quickly turned between each reaction chamber It changes.

Lower mask body introduces the application method of the chemical vapor depsotition equipment of the utility model.

First the reaction tube 101 of removable heating equipment 10 and first reaction chamber 100 is socketed, from drain hole 107 to anti- Reaction substrate 106 should be put into pipe 101, starting heating is passed through reaction gas, after the completion of deposition；By removable heating equipment 10 It is detached from first reaction chamber 100, second reaction chamber 200 is quickly transferred to by track 12 and reacts with it pipe socket, into Removable heating equipment 10 can be moved to next reaction chamber or back to first after reaction by row heating deposition Reaction chamber 100 carries out new deposition reaction, and so on.

It should be appreciated by those skilled in the art that specific embodiment described above is originally practical new only for more fully understanding Type is not used to limit the utility model.Those skilled in the art under the premise of not departing from the spirit of the present invention, It can use conventional means and simply retrofited to above-described embodiment, but all should belong within the protection scope of the utility model.

Claims (4)

1. a kind of chemical vapor depsotition equipment of single heating system multi-reaction chamber, which is characterized in that including：

At least two independent reaction chambers with air inlet and exhaust outlet, a removable heating equipment；

Each reaction chamber includes that one open at one end and the closed reaction tube of the other end, an air guide being placed in inside reaction tube Pipe and an adapter being connected simultaneously with reaction tube open end and gas-guide tube；

The adapter includes at least one connector, an air inlet, an exhaust outlet and a drain hole, is connected Interface is connected with the reaction tube open end, one end phase of the one end of air inlet inside adapter and the gas-guide tube Even, the other end of the gas-guide tube extends close to the closed end of the reaction tube；

The removable heating equipment has the cavity for being arranged the reaction tube.

2. the chemical vapor depsotition equipment of single heating system multi-reaction chamber according to claim 1, which is characterized in that also Including a set of track for limiting removable heating equipment mobile route.

3. the chemical vapor depsotition equipment of single heating system multi-reaction chamber according to claim 1, which is characterized in that institute Universal wheel is housed on the pedestal for the removable heating equipment stated.

4. the chemical vapor depsotition equipment of single heating system multi-reaction chamber according to claim 1, which is characterized in that institute The removable heating equipment stated is tube type resistance furnace.