CN108330470A - The chemical vapor depsotition equipment of single heating system multi-reaction chamber - Google Patents
The chemical vapor depsotition equipment of single heating system multi-reaction chamber Download PDFInfo
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- CN108330470A CN108330470A CN201810335363.9A CN201810335363A CN108330470A CN 108330470 A CN108330470 A CN 108330470A CN 201810335363 A CN201810335363 A CN 201810335363A CN 108330470 A CN108330470 A CN 108330470A
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- Prior art keywords
- chemical vapor
- reaction tube
- equipment
- vapor depsotition
- gas
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
A kind of chemical vapor depsotition equipment, including：At least two independent reative cells with air inlet and exhaust outlet, a removable heating equipment；Each reative cell includes an one end open and adapter that the closed reaction tube of the other end, a gas-guide tube being placed in inside reaction tube and one are connected with reaction tube open end and gas-guide tube simultaneously；The removable heating equipment has the cavity for being arranged the reaction tube.Chemical vapor depsotition equipment according to the present invention can be heated using a set of heating equipment to multiple reative cells, without heating and cooling repeatedly, has not only fully been saved the energy, can also have been improved production efficiency.
Description
Technical field
The present invention relates to material manufacture and modified field more particularly to a kind of chemical vapor depsotition equipments.
Background technology
Production of thin film by chemical gas-phase deposition material is widely used in semi-conductor industry and other industrial circles.For one
Typical chemical vapor deposition processes, the reaction gas with specific components and flow enter from air inlet equipped with reaction base material
Reative cell occurs chemical reaction and the deposition film on reaction base material, reacts by product and residual gas from row in the reaction chamber
Gas port is discharged.
(horizontally or vertically) tubular type furnace system is a kind of common equipment for being used for chemical vapor deposition, is please referred to Fig.1.Figure
1 show a kind of existing tube furnace chemical vapor depsotition equipment 000.The reative cell 001 of the equipment 000 is that quartz or ceramics are anti-
Ying Guan.The middle part of reative cell 001 is placed in tube furnace 002.Reaction base material 003 is placed in 001 middle part of reative cell.In general, reaction gas
Body enters reative cell 001 from one end of reative cell 001, i.e. air inlet 004, chemical reaction occurs in reative cell 001 and anti-
Deposition film on base material 003 is answered, reacts by product and residual gas from the other end of reative cell 001, i.e. exhaust outlet 005 is discharged.
This equipment 000 has the shortcomings that following several：1) rapid thermal treatment cannot be carried out, i.e., heating and cooling rate by
Limitation.2) entire production process includes being packed into reaction base material, heating reaction base material (while part energy is had for heating tube
Formula stove itself), deposition film cools down (cooling for including furnace body), takes out the key steps such as reaction base material.It can be seen that being used for
The energy of heated Tube-furnace itself slatterns；And base material is reacted being packed into, and during cooling, and taking-up base material, tubular type
Stove then belongs to the idle waste to equipment there is no being used；Meanwhile repeatedly to tube furnace heating and cooling, can also shorten it makes
Use the service life.
For these reasons, it is necessary to develop a kind of chemical vapor depsotition equipment, can rapid temperature rise and drop, and subtract
The waste of few energy, improves service efficiency, increases service life.
Invention content
To achieve the above object, the present invention provides a kind of new chemical vapor depsotition equipment (or Equipment for Heating Processing), and
Use the method for the equipment.
Chemical vapor depsotition equipment provided by the invention includes：At least two is independent anti-with air inlet and exhaust outlet
Answer room, a removable heating equipment；
Each reative cell including an one end open and the closed reaction tube of the other end, one be placed in reaction tube
The gas-guide tube in portion and an adapter being connected simultaneously with reaction tube open end and gas-guide tube；
The adapter includes at least one connector, an air inlet, an exhaust outlet and a drain hole,
Its connector is connected with the reaction tube open end, the one end of air inlet inside adapter and the one of the gas-guide tube
End is connected, and the other end of the gas-guide tube extends close to the blind end of the reaction tube；
The removable heating equipment has the cavity for being arranged the reaction tube.
The air inlet of reative cell (reaction tube) and exhaust outlet are arranged same by the above unique structure design by the present invention
Side so that the other end of reaction tube is closed, so as to so that reative cell can quickly be covered with removable heating equipment
It connects.
Under preferable case, chemical vapor depsotition equipment of the invention further includes that a set of limitation moves heating equipment movement road
The track of line.
Under preferable case, universal wheel is housed on the pedestal of the removable heating equipment.
Under preferable case, the removable heating equipment is tube type resistance furnace.
The chemical vapor depsotition equipment of the present invention can also be applied to the heat treatment process of material.
Chemical vapor depsotition equipment according to the present invention can be added using a set of heating equipment to multiple reative cells
Heat has not only fully saved the energy, can also improve production efficiency without heating and cooling repeatedly.
Description of the drawings
Fig. 1 is the structural schematic diagram of existing chemical vapor depsotition equipment；
Fig. 2 is the schematic side view of the chemical vapor depsotition equipment of the present invention；And
Fig. 3 is the schematic top plan view of the chemical vapor depsotition equipment of the present invention.
Specific implementation mode
To absolutely prove the characteristic of the present invention and implementing the mode of the present invention, embodiment is given below.
Chemical vapor depsotition equipment (or Equipment for Heating Processing) according to the present invention includes：At least two is independent with air inlet
The reative cell of mouth and exhaust outlet, a removable heating equipment.
In the embodiment illustrated in figure 2, chemical vapor depsotition equipment of the invention includes two 100 Hes of independent reative cell
200, reative cell 100 and 200 structures having the same.In other embodiments, reative cell can also be three and three or more,
The structure of multiple reative cells can also be slightly different, as long as adapting to same heating equipment.
Referring specifically to Fig. 1, reative cell 100 is including an one end open and the closed reaction tube of the other end 101, one is placed in
Gas-guide tube 102 inside reaction tube 101 and an adapter being connected simultaneously with 101 open end of reaction tube and gas-guide tube 102
104.Reaction tube 101 is used for placing to be deposited or heat treatment reaction base material 106.Quartz or ceramics may be used in reaction tube 101
Pipe, naturally it is also possible to be made of metal or other materials.
Adapter 104 includes an exhaust outlet 105 of air inlet 103, one of connector 109, one and a drain hole
107.The open end sealing of connector 109 and reaction tube 101 is connected, the one end of air inlet 103 inside adapter 104 with lead
One end of tracheae 102 is connected, and the other end of gas-guide tube 102 extends close to the blind end of reaction tube 101.In the reality shown in attached drawing
It applies in example, adapter 104 is " ten " font four-way structure, and air inlet 103 and about 105 exhaust outlet are opposite, drain hole 107
It is opposite with connector 109 or so；Air inlet 103 is under, and exhaust outlet 105 is upper；This design structure both facilitated and reaction tube 101
Connection is also convenient for picking and placeing reaction base material 106.Adapter 104 is also provided with supporting rack 108.
Removable heating equipment 10 can be specifically tube type resistance furnace, have the cavity for being arranged reaction tube 101.It is removable
Universal wheel 11 is housed, to be moved easily on the pedestal of heating equipment 10.
The chemical vapor depsotition equipment of the present invention further includes the track that a set of limitation moves 10 mobile route of heating equipment
12.Track 12 is arranged around each reative cell so that removable heating equipment 10 is quickly converted between each reative cell.
Lower mask body introduces the application method of the chemical vapor depsotition equipment of the present invention.
First removable heating equipment 10 and the reaction tube 101 of first reative cell 100 are socketed, from drain hole 107 to anti-
It should be put into reaction base material 106 in pipe 101, start heating, be passed through reaction gas, after the completion of deposition；By removable heating equipment 10
It is detached from first reative cell 100, second reative cell 200 is quickly transferred to by track 12 and reacts with it pipe socket, into
Removable heating equipment 10 can be moved to next reative cell or back to first by row heating deposition after reaction
Reative cell 100 carries out new deposition reaction, and so on.
It should be appreciated by those skilled in the art that specific implementation mode described above is only for more fully understanding the present invention, and
It is not used in and limits the invention.Those skilled in the art can utilize conventional without departing from the spirit of the invention
Means simply retrofit to above-described embodiment, but within should all belonging to the scope of protection of the present invention.
Claims (4)
1. a kind of chemical vapor depsotition equipment, which is characterized in that including：
At least two independent reative cells with air inlet and exhaust outlet, a removable heating equipment；
Each reative cell includes an one end open and the closed reaction tube of the other end, one be placed in inside reaction tube
Gas-guide tube and an adapter being connected simultaneously with reaction tube open end and gas-guide tube；
The adapter includes at least one connector, an air inlet, an exhaust outlet and a drain hole, is connected
Interface is connected with the reaction tube open end, one end phase of the one end of air inlet inside adapter and the gas-guide tube
Even, the other end of the gas-guide tube extends close to the blind end of the reaction tube；
The removable heating equipment has the cavity for being arranged the reaction tube.
2. chemical vapor depsotition equipment according to claim 1, which is characterized in that further include the removable heating of a set of limitation
The track of equipment mobile route.
3. chemical vapor depsotition equipment according to claim 1, which is characterized in that the bottom of the removable heating equipment
Universal wheel is housed on seat.
4. chemical vapor depsotition equipment according to claim 1, which is characterized in that the removable heating equipment is pipe
Formula resistance furnace.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810335363.9A CN108330470A (en) | 2018-04-16 | 2018-04-16 | The chemical vapor depsotition equipment of single heating system multi-reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810335363.9A CN108330470A (en) | 2018-04-16 | 2018-04-16 | The chemical vapor depsotition equipment of single heating system multi-reaction chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108330470A true CN108330470A (en) | 2018-07-27 |
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ID=62933174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810335363.9A Pending CN108330470A (en) | 2018-04-16 | 2018-04-16 | The chemical vapor depsotition equipment of single heating system multi-reaction chamber |
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| CN (1) | CN108330470A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1618746A (en) * | 2003-11-20 | 2005-05-25 | 住友电气工业株式会社 | Glass tube processing method, apparatus and glass tube |
| CN103343331A (en) * | 2013-07-02 | 2013-10-09 | 中国航空工业集团公司北京航空制造工程研究所 | Chemical vapor deposition reaction device |
-
2018
- 2018-04-16 CN CN201810335363.9A patent/CN108330470A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1618746A (en) * | 2003-11-20 | 2005-05-25 | 住友电气工业株式会社 | Glass tube processing method, apparatus and glass tube |
| CN103343331A (en) * | 2013-07-02 | 2013-10-09 | 中国航空工业集团公司北京航空制造工程研究所 | Chemical vapor deposition reaction device |
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