CN207977317U - Pixel defines structure, electroluminescent device and display device - Google Patents
Pixel defines structure, electroluminescent device and display device Download PDFInfo
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- CN207977317U CN207977317U CN201820307095.5U CN201820307095U CN207977317U CN 207977317 U CN207977317 U CN 207977317U CN 201820307095 U CN201820307095 U CN 201820307095U CN 207977317 U CN207977317 U CN 207977317U
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Abstract
The utility model is related to a kind of pixels to define structure, electroluminescent device and display device, it includes pixel defining layer and hydrophobic conductive layer that the pixel, which defines structure, hydrophobic conductive layer is set in pixel defining layer, and a side surface of the hydrophobic conductive layer far from pixel defining layer is in concaveconvex structure.The pixel, which defines structure, can simplify the production method of luminescent device, and can reduce the voltage drop of top electrode, improve non-uniform light；The surface can also effectively prevent ink spilling pixel hole in printing process to lead to colour mixture situation in the hydrophobic conductive layer of concaveconvex structure simultaneously, additionally it is possible to expand the selection range of pixel defining layer, no longer be defined in lyophobicity pixel defining layer material.
Description
Technical field
The utility model is related to field of display devices, more particularly to a kind of pixel define structure, electroluminescent device and
Display device.
Background technology
In the present age of information-intensive society, the importance of the display device as visual information transmission medium is further strengthening.
In order to occupy leading position in future, display device is just towards lighter, thinner, more low energy consumption, more inexpensive and more preferable image
The trend development of quality.
Organic electroluminescent LED (OLED) due to it with self-luminous, reaction is fast, visual angle is wide, brightness is high, frivolous etc.
Advantage is the Main way of current display device research.Wherein, aperture opening ratio of the top emission type device since bigger can be obtained,
As the hot spot of recent researches.
Transmitance of traditional top emitting display device due to needing increase light, the thickness of top electrode is generally relatively thin, leads to electricity
Pole sheet resistance is larger, and voltage drop is serious, causes the non-uniform phenomenon of display lighting.And in order to improve non-uniform light, tradition
Top emitting display device often introduces the auxiliary electrode being connected with top electrode, is reduced by the high conductivity of auxiliary electrode
The voltage drop of top electrode improves the uniformity of light emission luminance.But the auxiliary electrode is typically lighttight, cannot be produced on
On light-emitting zone.Currently, auxiliary electrode generally makes in the process for making array (array), there is class with pixel light emission area
As be open, production process is complicated, is unfavorable for saving cost of manufacture.
Utility model content
Based on this, it is necessary to which top electrode voltage drop can be reduced and can make simple pixel circle of production process by providing one kind
Determine structure, electroluminescent device and display device.
A kind of pixel defines structure, including pixel defining layer and hydrophobic conductive layer；
The hydrophobic conductive layer is set in the pixel defining layer, the separate pixel defining layer of the hydrophobic conductive layer
A side surface be in concaveconvex structure.
In implementing at wherein one, the depth of the concaveconvex structure hollow cavity is 30-100nm.
In implementing at wherein one, the hydrophobic conductive layer includes the first metallic conduction film layer and the second metal conductive film
Layer, the first metallic conduction film layer are set in the pixel defining layer, and the second metallic conduction film layer is set to described first
In metallic conduction film layer；
The consistency of the second metallic conduction film layer be less than the first metallic conduction film layer consistency, described second
It is in porous nanometer structure in the entire surface of metallic conduction film layer.
In implementing at wherein one, the thickness of the second metallic conduction film layer is 200-500nm, and second metal is led
The surface roughness of electrolemma layer is 20-50nm.
In implementing at wherein one, the pixel defining layer is lyophily pixel defining layer or lyophobicity pixel defining layer.
A kind of electroluminescent device, including：
Substrate；
Hearth electrode, the hearth electrode are set on the substrate；
Pixel described in any one of the above embodiments defines structure, and the pixel defines structure on the substrate, the pixel
It defines layer and the hearth electrode matches to form pixel hole；
Luminescent layer, the luminescent layer are set on the hearth electrode and in pixel holes；And
Top electrode, the top electrode are set on the hydrophobic conductive layer and the luminescent layer.
In implementing at wherein one, the electroluminescent device further includes electronic work ergosphere, and the electronic work ergosphere is set to
It is connect with the high spot of the hydrophobic conductive layer with the recess of the hydrophobic conductive layer, the top electrode on the luminescent layer.
In implementing at wherein one, the electronic work ergosphere includes hole blocking layer, electron transfer layer and/or electron injection
Layer；And/or
The electroluminescent device further includes hole injection layer, hole transmission layer and/or electronic barrier layer.
In implementing at wherein one, the luminescent layer is organic electro luminescent layer, quantum dot light emitting layer or described organic
Electroluminescence layer and the quantum dot light emitting layer, which combine, is formed by hybrid illuminating layer.
A kind of display device, including electroluminescent device described in any one of the above embodiments.
It includes pixel defining layer and hydrophobic conductive layer that above-mentioned pixel, which defines structure, and hydrophobic conductive layer is set to pixel defining layer
On, a side surface of the separate pixel defining layer of hydrophobic conductive layer is in concaveconvex structure, and then opening photomask may be used
(mask) the electronic works ergospheres such as electron transfer layer (ETL)/electron injecting layer (EIL) of printed electroluminescent device are prepared, this is in
The hydrophobic surface of concaveconvex structure can not be covered by electronic work ergosphere completely, to be formed on its surface discontinuous film, at this time
When preparing top electrode, top electrode can pass through discrete electronic work ergosphere directly with the hydrophobic conductive layer contact, to be formed good
Conduct, so as to simplify the production method of luminescent device and save cost of manufacture, and the voltage drop of top electrode can be reduced,
Improve non-uniform light.Meanwhile the surface can also effectively prevent ink in printing process in the hydrophobic conductive layer of concaveconvex structure
Overflowing pixel hole leads to colour mixture situation, additionally it is possible to expand the selection range of pixel defining layer, no longer be defined in lyophobicity pixel circle
Given layer material.
Description of the drawings
Fig. 1 is the partial structurtes schematic cross-sectional view of the electroluminescent device of an embodiment；
Fig. 2 is the fabrication processing schematic diagram that pixel defines structure in the electroluminescent device in Fig. 1.
Specific implementation mode
The utility model is more fully retouched below with reference to relevant drawings for the ease of understanding the utility model,
It states.The preferred embodiment of the utility model is given in attached drawing.But the utility model can in many different forms come in fact
It is existing, however it is not limited to embodiment described herein.Make public affairs to the utility model on the contrary, purpose of providing these embodiments is
The understanding for opening content is more thorough and comprehensive.
It should be noted that when element is referred to as " being set to " another element, it can directly on another element or
There may also be elements placed in the middle by person.
Unless otherwise defined, all of technologies and scientific terms used here by the article is led with the technology for belonging to the utility model
The normally understood meaning of technical staff in domain is identical.Terminology used in the description of the utility model herein only be
The purpose of description specific embodiment, it is not intended that in limitation the utility model.Term as used herein "and/or" includes
Any and all combinations of one or more relevant Listed Items.
Incorporated by reference to Fig. 1, the electroluminescent device 10 of an embodiment, including substrate 100, hearth electrode 200, pixel define knot
Structure, luminescent layer, electron transfer layer, electron injecting layer and top electrode.
In the present embodiment, there is driving tft array on substrate 100, for driving light emitting component, realize that image is aobvious
Show.Wherein, substrate 100 can be rigid substrates or flexible base board, and tft array may include non-crystalline silicon tft array, polycrystalline TFT
Array and metal oxide tft array etc..Rigid substrates can be ceramic material or all kinds of glass materials etc..Flexible base board can
To be Kapton (PI) and its derivative, polyethylene naphthalate (PEN), phosphoenolpyruvate (PEP)
Or diphenylene ether resin etc..It may include non-crystalline silicon tft array, polycrystalline tft array and metal oxide to drive tft array
TFT arrays etc..
In the present embodiment, hearth electrode 200 is referred to as pixel electrode, and hearth electrode patterning is set on substrate, and
It is connect with driving tft array by connecting hole.
In the present embodiment, it includes pixel defining layer 310 and hydrophobic conductive layer 320 that pixel, which defines structure,.Pixel defines
Structure is set on substrate 100, and pixel defining layer 310 matches the picture to be formed for filling lighting function ink with hearth electrode 200
Element hole.Hydrophobic conductive layer 320 is set in pixel defining layer 310, side table of the hydrophobic conductive layer 320 far from pixel defining layer 310
Face is in concaveconvex structure.
In present embodiment, pixel defines in structure since surface being arranged in pixel defining layer 310 in concaveconvex structure
Hydrophobic conductive layer 320, so as to prepare the electron transfer layer of printed electroluminescent device using opening photomask (mask)
(ETL) the electronic works ergospheres such as/electron injecting layer (EIL), and being somebody's turn to do can not be completely by electronic work in the hydrophobic surface of concaveconvex structure
Ergosphere covers, and to be formed on its surface discontinuous film, when preparing top electrode at this time, top electrode can pass through discrete electricity
Subfunction layer directly with the projection contacts on the hydrophobic conductive layer 320, forms and conducts structure with satisfactory electrical conductivity, from
And the production method of luminescent device can be simplified, and the voltage drop of top electrode can be reduced, improve non-uniform light.Meanwhile the table
Face can also effectively prevent ink spilling pixel hole in printing process to lead to colour mixture feelings in the hydrophobic conductive layer 320 of concaveconvex structure
Condition, additionally it is possible to expand the selection range of pixel defining layer 310, no longer be defined in lyophobicity pixel defining layer material.
In the present embodiment, pixel defining layer 310 is lyophoby pixel defining layer, and ink is further prevented to overflow pixel hole
Lead to colour mixture situation.Lyophobicity refers mainly to liquid and is not easy the performance that the surface of solids is sprawled made of lyophobicity material.If liquid
Body is water, and what lyophobicity referred to is exactly hydrophobicity.Lyophobicity material can be silica, lyophobicity photoresist or polytetrafluoroethylene (PTFE)
Deng.
In other embodiments, pixel defining layer 310 or lyophily pixel defining layer.Wherein, lyophily is main
Refer to liquid and is easy to the performance that the surface of solids is sprawled made of lyophily material.If liquid is water, that lyophily refers to is exactly parent
It is aqueous.
Specifically, hydrophobic conductive layer 320 includes the first metallic conduction film layer and the second metallic conduction film layer.First metal is led
The material of electrolemma layer and the second metallic conduction film layer can be Al, Ag, Cu etc..First metallic conduction film layer is set to pixel defining layer
On 310, the second metallic conduction film layer is set in the first metallic conduction film layer.The consistency of second metallic conduction film layer is less than first
The consistency of metallic conduction film layer is to ensure the satisfactory electrical conductivity of the first metallic conduction film layer and top electrode.
It is in porous nanometer structure in the entire surface of second metallic conduction film layer.Its porous nanometer structure surface has super thin
It is aqueous, to effectively prevent the spilling of ink in printing process；Meanwhile porous uneven surface can prevent opening mask systems again
Surface is completely covered when standby electron transfer layer so that top electrode can be contacted directly with its high spot, because of its good electric conductivity
Auxiliary electrode is can be used as, the electric conductivity of top transparent electrode in top emission type electroluminescent device is improved, is avoided because of transparent top electricity
Caused by the electric conductivity deficiency of pole caused by voltage drop the case where non-uniform light.
Further, the depth of the concaveconvex structure hollow cavity (corresponding recess) of hydrophobic conductive layer 320 can be 30nm,
50nm, 80nm, 120nm, 180nm etc., preferably 30-100nm.The thickness of second metallic conduction film layer be can be 200nm,
240nm, 280nm, 350nm, 430nm, 520nm etc., preferably 200-500nm.The surface roughness of second metallic conduction film layer
Can to be 20nm, 25nm, 29nm, 33nm, 48nm, 55nm etc., preferably 20-50nm.
In the present embodiment, luminescent layer is set on hearth electrode 200 and in pixel hole.In addition, electroluminescent device
10 further include electronic work ergosphere.Wherein, electronic work ergosphere includes hole blocking layer, electron transfer layer and/or electron injecting layer.Electricity
Subfunction layer be set to luminescent layer on and hydrophobic conductive layer 320 recess so as to make top electrode directly with hydrophobic conductive layer
320 high spot connection.
In other embodiments, electroluminescent device 10 can also include hole functional layer.Wherein, hole functional layer can
To include hole injection layer, hole transmission layer and/or electronic barrier layer.Preferably, the light emitting functional layer of electroluminescent device 10
Including hole injection layer, hole transmission layer, electronic barrier layer, luminescent layer, exciton confining layers, the hole barrier being cascading
Layer, electron transfer layer and electron injecting layer.In addition, light emitting functional layer can also be quantum dot light emitting functional layer or organic electroluminescence
Light emitting functional layer and quantum dot light emitting functional layer are combined the mixed luminescence functional layer to be formed.
In the present embodiment, top electrode integrally covers hydrophobic conductive layer 320 and luminescent layer, top electrode and hydrophobic conductive layer
320 high spot connection.When electroluminescent device 10 is top emitting display device, hearth electrode is aluminium, silver, magnesium silver alloy and aluminium
The materials such as silver alloy make the metallic conduction film layer to be formed；Top electrode can be that the materials such as ITO, IZO, AZO make the gold to be formed
Belong to oxide conducting film layer, transparent state, or the materials such as graphene, conducting polymer make the Organic Conductive Films to be formed
Layer.
The production method that pixel defines structure in the electroluminescent device of present embodiment, includes the following steps：
S1 provides the substrate 100 with driving circuit and patterned hearth electrode 200.
S2, it is whole successively on the side surface with patterned hearth electrode 200 on the substrate 100 please further combined with Fig. 2
Face deposits to form pixel defining layer film 2, hydrophobic membrane of conducting layer 3 and photoresist film 4.
Wherein, hydrophobic membrane of conducting layer 3 is deposited using sputtering technology, is included the following steps：
S21 is first deposited on pixel defining layer film 2 using high power sputter deposition and is formed the first metal conductive film
Layer, thickness are 200-1000 μm, sputtering power 300-500W.It can be in pixel defining layer film using higher sputtering power
The film that one layer of even compact is formed on 2, to improve the electric conductivity and surface smoothness of the first metallic conduction film layer.
S22, then in situ deposited in the first metallic conduction film layer using low-power sputter deposition form the second metal
Conductive film layer, sputtering power 50-200W, sputtering time 30-60min.When using smaller sputtering power, gaseous metal point
Son and part metals ion are splashed to from target in plasma gas, then with lower deposition rate to the first metallic conduction
The surface of film layer then deposits film forming.Due to gaseous molecular and metal ion deposition to the first metallic conduction film surface
Speed is relatively low, therefore can form nanoporous loose, with gap (cavity) structure in the first metallic conduction film surface
Structure, as the second metallic conduction film layer with concaveconvex structure, surpass so that the second metallic conduction film surface has
Hydrophobic property, due to its loose porous structure, after subsequently preparing other functional layers, the portion of the nano-porous structure protrusions
Top electrode and the first metallic conduction film layer can be directly connected to by dividing.
S3 is exposed development to photoresist film 4, forms patterned photo-resistive mask 41.
S4 is etching mask using photo-resistive mask 41, is etched graphically to hydrophobic membrane of conducting layer 3, forms figure
The hydrophobic conductive layer 320 changed.
S5 is mask using patterned hydrophobic conductive layer 320, is patterned to pixel defining layer film 2, forms figure
The pixel defining layer 310 of case.
S6 removes photo-resistive mask 41, and (bake) sizing treatment is toasted to pixel defining layer 310, forms pixel and defines
Structure.
A kind of display device includes the electroluminescent device of any of the above-described.
Each technical characteristic of embodiment described above can be combined arbitrarily, to keep description succinct, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, it is all considered to be the range of this specification record.
Above-described embodiments merely represent several embodiments of the utility model, the description thereof is more specific and detailed,
But therefore it can not be interpreted as the limitation to utility model patent range.It should be pointed out that for the common skill of this field
For art personnel, without departing from the concept of the premise utility, various modifications and improvements can be made, these are belonged to
The scope of protection of the utility model.Therefore, the protection domain of the utility model patent should be determined by the appended claims.
Claims (10)
1. a kind of pixel defines structure, which is characterized in that including pixel defining layer and hydrophobic conductive layer；
The hydrophobic conductive layer is set in the pixel defining layer, one far from the pixel defining layer of the hydrophobic conductive layer
Side surface is in concaveconvex structure.
2. pixel according to claim 1 defines structure, which is characterized in that the depth of the concaveconvex structure hollow cavity is
30-100nm。
3. pixel according to claim 1 defines structure, which is characterized in that the hydrophobic conductive layer is led including the first metal
Electrolemma layer and the second metallic conduction film layer, the first metallic conduction film layer are set in the pixel defining layer, second gold medal
Belong to conductive film layer to be set in the first metallic conduction film layer；
The consistency of the second metallic conduction film layer is less than the consistency of the first metallic conduction film layer, second metal
It is in porous nanometer structure in the entire surface of conductive film layer.
4. pixel according to claim 3 defines structure, which is characterized in that the thickness of the second metallic conduction film layer is
The surface roughness of 200-500nm, the second metallic conduction film layer are 20-50nm.
5. pixel according to any one of claims 1 to 4 defines structure, which is characterized in that the pixel defining layer is parent
Fluidity pixel defining layer or lyophobicity pixel defining layer.
6. a kind of electroluminescent device, which is characterized in that including：
Substrate；
Hearth electrode, the hearth electrode are set on the substrate；
Pixel described in any one of claim 1 to 5 defines structure, and the pixel defines structure on the substrate, described
Pixel defining layer and the hearth electrode match to form pixel hole；
Luminescent layer, the luminescent layer are set on the hearth electrode and in pixel holes；And
Top electrode, the top electrode are set on the hydrophobic conductive layer and the luminescent layer.
7. electroluminescent device according to claim 6, which is characterized in that the electroluminescent device further includes electronic work
Ergosphere, the electronic work ergosphere be set to the luminescent layer on and the hydrophobic conductive layer recess, the top electrode with it is described
The high spot of hydrophobic conductive layer connects.
8. electroluminescent device according to claim 7, which is characterized in that the electronic work ergosphere includes hole barrier
Layer, electron transfer layer and/or electron injecting layer；And/or
The electroluminescent device further includes hole injection layer, hole transmission layer and/or electronic barrier layer.
9. according to claim 6 to 8 any one of them electroluminescent device, which is characterized in that the luminescent layer is Organic Electricity
Electroluminescent layer, quantum dot light emitting layer or the organic electro luminescent layer and the quantum dot light emitting layer, which combine, is formed by mixing
Luminescent layer.
10. a kind of display device, which is characterized in that including the electroluminescent device described in any one of claim 6 to 9.
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| CN109449314A (en) * | 2018-10-30 | 2019-03-08 | 京东方科技集团股份有限公司 | Display base plate and its manufacturing method, display panel |
| CN110034170A (en) * | 2019-04-24 | 2019-07-19 | 京东方科技集团股份有限公司 | Pixel defining layer and preparation method thereof, array substrate, display panel and device |
| CN110534553A (en) * | 2019-09-11 | 2019-12-03 | 昆山国显光电有限公司 | A kind of luminescent device, display device and preparation method |
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| CN109449314A (en) * | 2018-10-30 | 2019-03-08 | 京东方科技集团股份有限公司 | Display base plate and its manufacturing method, display panel |
| US10991775B2 (en) | 2018-10-30 | 2021-04-27 | Boe Technology Group Co., Ltd. | Display substrate, fabrication method thereof, and display panel |
| CN110034170A (en) * | 2019-04-24 | 2019-07-19 | 京东方科技集团股份有限公司 | Pixel defining layer and preparation method thereof, array substrate, display panel and device |
| WO2020216237A1 (en) * | 2019-04-24 | 2020-10-29 | 京东方科技集团股份有限公司 | Array substrate and fabrication method therefor, display panel and display device |
| US11594585B2 (en) | 2019-04-24 | 2023-02-28 | Boe Technology Group Co., Ltd. | OLED with bank having base and protrusion portions |
| CN110534553A (en) * | 2019-09-11 | 2019-12-03 | 昆山国显光电有限公司 | A kind of luminescent device, display device and preparation method |
| CN110993669A (en) * | 2019-12-12 | 2020-04-10 | Tcl华星光电技术有限公司 | Display panel manufacturing method and display panel |
| CN112736209A (en) * | 2020-12-30 | 2021-04-30 | 广东聚华印刷显示技术有限公司 | Quantum dot light-emitting diode, preparation method thereof and display panel |
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