CN207924370U - A kind of mask plate - Google Patents
A kind of mask plate Download PDFInfo
- Publication number
- CN207924370U CN207924370U CN201820462852.6U CN201820462852U CN207924370U CN 207924370 U CN207924370 U CN 207924370U CN 201820462852 U CN201820462852 U CN 201820462852U CN 207924370 U CN207924370 U CN 207924370U
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- CN
- China
- Prior art keywords
- substrate
- mask plate
- driving electrodes
- particle
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 claims abstract description 112
- 239000002245 particle Substances 0.000 claims abstract description 61
- 230000000694 effects Effects 0.000 claims abstract description 24
- 230000008033 biological extinction Effects 0.000 claims abstract description 12
- 230000005540 biological transmission Effects 0.000 claims abstract description 10
- 230000002209 hydrophobic effect Effects 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 15
- 238000010521 absorption reaction Methods 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 239000000565 sealant Substances 0.000 claims description 6
- 230000005611 electricity Effects 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 3
- 229920006362 Teflon® Polymers 0.000 claims description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 3
- 239000012965 benzophenone Substances 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 claims description 3
- 229960001860 salicylate Drugs 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229920000052 poly(p-xylylene) Polymers 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims 2
- 125000005605 benzo group Chemical group 0.000 claims 1
- 239000003292 glue Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 10
- 230000008569 process Effects 0.000 abstract description 6
- 238000009826 distribution Methods 0.000 abstract description 5
- 238000001259 photo etching Methods 0.000 abstract description 5
- 230000005684 electric field Effects 0.000 description 7
- 230000009471 action Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Landscapes
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The application discloses a kind of mask plate, including：First substrate, second substrate and the polar particle between the first substrate and the second substrate being oppositely arranged, the polar particle have extinction or light transmission effect；The first substrate includes the multiple driving electrodes being arranged in array being arranged towards the second substrate, and the driving electrodes control the polar particle and be moved in specified driving electrodes for receiving electric signal, form predetermined pattern.The mask plate of the utility model embodiment, by the driving electrodes in array distribution on first substrate come the movement of control polarity particle, it can be according to practical mask needs, polar particle is moved in specified driving electrodes, light-shielding pattern flexibility and changeability can form the mask plate with different mask patterns, the effect of multiple mask plates is realized by a mask plate, manufacture craft is simple, and the cost of photoetching process mask plate can be greatly lowered, and promotes the utilization rate of mask plate.
Description
Technical field
The utility model is related to display technology fields, more particularly to a kind of mask.
Background technology
Lithography mask version integrates equal fields in precision manufactureing and circuit and has been widely used, and such as semiconductor devices manufacture, integrates
Circuit board fabrication, medical chip manufacture etc. are required to be exposed etching technics using lithography mask version, form target pattern.
The mask plate for being presently used for photoetching process is typically employed in formation metal chromium pattern on quartz glass, utilizes metal
Pattern is used as photo etched mask to blocking for light.Since the metal pattern of formation can not be changed, for needing multiple tracks light
In the processing procedure of carving technology, need to be equipped with multiple mask plates；Also, it is special right that the production process of different product is needed again to prepare
The mask plate answered, the mask plate can not be applied to the processing procedure of other products.
The complex manufacturing technology of existing mask plate, and light-shielding pattern can not be changed, the utilization rate of mask plate is relatively low, multiple
The making of mask plate increases the cost of product manufacturing, is unfavorable for the control of production cost.
Utility model content
The utility model provides a kind of mask plate, to solve mask plate preparation process complexity in the prior art, utilization rate
Low problem.
In a first aspect, the utility model provides a kind of mask plate, including be oppositely arranged first substrate, second substrate, with
And there is extinction or light transmission to make for the polar particle between the first substrate and the second substrate, the polar particle
With；
The first substrate includes the multiple driving electrodes being arranged in array being arranged towards the second substrate, the drive
Moving electrode controls the polar particle and is moved in specified driving electrodes for receiving electric signal, forms predetermined pattern.
Optionally, the first substrate further includes being arranged to deviate from the first of the second substrate side in the driving electrodes
The first dielectric layer and the first hydrophobic layer towards the second substrate side in the driving electrodes is arranged in substrate, wherein described
First hydrophobic layer is arranged close to the second substrate side；
The second substrate includes that the second substrate being cascading, reference electrode layer, the second dielectric layer and second are thin
Water layer, wherein second hydrophobic layer is arranged close to the first substrate side.
Optionally, the through-hole injected for the polar particle with suction is offered on the second substrate.
Optionally, the first substrate is sealed with the second substrate by sealant, the thickness of the sealant
For 0.1mm-1mm.
Optionally, the polar particle is the drop with absorption effects, has extinction material, the suction in the drop
The material of stimulative substance includes at least one of salicylate substance, benzophenone substance, benzotriazole substance.
Optionally, the first substrate and the second substrate are transparent substrate.
Optionally, the material of first dielectric layer and second dielectric layer include silicon nitride, silica, send it is auspicious
At least one of woods, SU-8；
The material of first hydrophobic layer and second hydrophobic layer includes at least one of Teflon and Cytop.
Compared with prior art, the utility model embodiment has the following advantages：
The mask plate of the utility model embodiment, including be oppositely arranged first substrate, second substrate and be located at two bases
Polar particle between plate, the polar particle have extinction or light transmission effect, pass through the drive in array distribution on first substrate
Moving electrode carrys out the movement of control polarity particle, polar particle can be moved to specified region, shading according to practical mask needs
Flexible shapes are variable, can form the mask plate with different mask patterns, multiple mask plates are realized by a mask plate
Effect, manufacture craft is simple, and the cost of photoetching process mask plate can be greatly lowered, and promotes the utilization rate of mask plate.
Description of the drawings
Fig. 1 show the structural schematic diagram of the mask plate of the utility model embodiment；
Fig. 2 show partial cross section's structural schematic diagram of the mask plate of the utility model embodiment；
Fig. 3 a~b show mask plate and are formed and occupation mode schematic diagram.
Specific implementation mode
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
It clearly and completely describes, it is clear that described embodiment is the utility model a part of the embodiment, rather than whole implementation
Example.Based on the embodiments of the present invention, those of ordinary skill in the art are obtained without making creative work
The every other embodiment taken, shall fall within the protection scope of the present invention.
It is that the mask plate includes the first substrate 1 being oppositely arranged, second substrate 2 and positioned at the as depicted in figs. 1 and 2
Polar particle 3 between one substrate 1 and second substrate 2, the polar particle 3 have extinction or light transmission effect.
First substrate 1 includes the multiple driving electrodes 12 being arranged in array being arranged towards second substrate 2, the driving electrodes
12 for receiving electric signal, and control polarity particle 3 is moved in specified driving electrodes 12, forms predetermined pattern.
For example, each driving electrodes 12 can be loaded telecommunications by the mask plate to form predetermined pattern by external circuit
Number, after driving electrodes 12 receive electric signal, charge and discharge are carried out, there are potential differences between adjacent driving electrodes 12, form electric field,
To drive polar particle 3 to move, by the control to loading electric signal, polar particle 3 is set to be moved in electric field action specified
Driving electrodes 12 on, formed with predetermined pattern mask plate, it is to be understood that the arrangement shape of specified driving electrodes 12
Shape is consistent with predetermined pattern.Polar particle 3 can be positively charged or negative electricity charged particle, can be to corresponding under electric field action
Direction movement, polar particle may be drop etc., and there is polar particle, electric field can change that its is in contact with substrate
Power, to drive drop to move.
It is understood that the polar particle 3 between first substrate 1 and second substrate 2 can be with absorption effects
Polar particle, or with light transmission effect particle.
For example, when being the particle with absorption effects, first substrate 1 and the second base between first substrate 1 and second substrate 2
Plate 2 is transparent substrate, and by loading electric signal to driving electrodes 12, control polarity particle 3 is moved to specified driving electrodes 12
On, the mask plate with predetermined pattern is formed, then the polar particle 3 in the specified driving electrodes 12 plays the work for blocking light path
With, and the region of remaining nonpolarity particle, light can pass through；When between first substrate 1 and second substrate 2 for suction
The particle of light action, first substrate 1 can be the substrate with shaded effect with second substrate 2, by adding to driving electrodes 12
Electrical signals, control polarity particle 3 are moved in specified driving electrodes 12, form the mask plate with predetermined pattern, then should
Polar particle 3 in specified driving electrodes 12 can change the translucency of two substrates in the region, ensure the zonal ray
It passes through, and the region of remaining nonpolarity particle, light cannot pass through.By the above-mentioned means, mask effect may be implemented.
Furthermore, it is possible to according to the size of shading-area, covering for the polar particle with absorption effects or light transmission effect is selected
Film version can select the mask plate with light transmission action polarity particle, work as needs when needing shading-area to be more than glazed area
When shading-area is less than glazed area, the mask plate with the polar particle of absorption effects can be selected, as such, it is desirable to polarity grain
The amount of son is relatively fewer, correspondingly, it is less for the electricity of the driving consumption of polar particle, save resource.
Above-mentioned polar particle 3 can be drop, the setting of above-mentioned first substrate 1, second substrate 2, polar particle 3, and
It is micro- by the way that existing number can be used for reference in the movement of the 12 control polarity particle 3 of driving electrodes of array distribution on first substrate 1
Fluidics, the digital microfluidic technology based on dielectric electro-wetting principle can accurately manipulate drop, realize sprawling, moving for drop
The operations such as dynamic, fusion, separation.
The mask plate of the utility model embodiment, including be oppositely arranged first substrate 1, second substrate 2 and be located at two
Polar particle 3 between substrate, the polar particle 3 have extinction or light transmission effect, by first substrate in array distribution
Driving electrodes 12 carry out the movement of control polarity particle 3, polar particle 3 can be moved to specified according to practical mask needs
Driving electrodes on, light-shielding pattern flexibility and changeability can form the mask plate with different mask patterns, pass through a mask plate
Realize the effect of multiple mask plates, manufacture craft is simple, and the cost of photoetching process mask plate can be greatly lowered, and promotes mask
The utilization rate of version.
It is illustrated so that polar particle 3 is with the drop of absorption effects as an example below, there is extinction material in the drop,
First substrate 1 and second substrate 2 are transparent substrate.
Specifically, above-mentioned first substrate 1 further includes that the first substrate for deviating from 2 side of second substrate in driving electrodes 12 is arranged
11, the first dielectric layer 13 and the first hydrophobic layer 14 towards 2 side of second substrate in driving electrodes 12 are set, wherein first dredges
Water layer 14 is arranged close to 2 side of second substrate.Second substrate 2 includes the second substrate 21 being cascading, reference electrode layer
22, the second dielectric layer 23 and the second hydrophobic layer 24, wherein the second hydrophobic layer 24 is arranged close to 1 side of first substrate.
First substrate 11 and the second substrate 21 can be glass substrate；The material of driving electrodes 12 and reference electrode layer 22 can
Think transparent electrode ITO, specifically first can deposit ITO in the first substrate 11 of first substrate 1, then expose etching, is formed
Multiple driving electrodes 12 of array arrangement, and reference electrode layer 22 then deposits entire ITO in the second substrate of second substrate 2
；The material of first dielectric layer 13 and the second dielectric layer 23 is specifically as follows such as silicon nitride, silica, Parylene, SU-8；
The material of first hydrophobic layer 14 and the second hydrophobic layer 24 is specifically as follows Teflon, Cytop etc..
It is understood that reference electrode layer 22 is oppositely arranged in the driving electrodes 12 of array distribution, between
Multiple electric fields can be formed, by electric field action, tension of the drop on 23 surface of the first dielectric layer 13 and the second dielectric layer reduces, connects
Feeler becomes smaller, and the change of tension causes drop force unbalance, to drive the movement of drop, specifically, can be for each
A corresponding thin film transistor switch is arranged in driving electrodes 12, and at least corresponding two signal lines of the driving electrodes 12 are thin
Film transistor switch includes control terminal, signal input part, signal output end, and the wherein control terminal of film crystal switch and signal is defeated
Enter end to connect with two signal lines respectively, signal output end is connect with driving electrodes 12, by this way, can control list respectively
The electric signal that a driving electrodes 12 load, reference electrode layer 22 can load constant voltage signal.Certainly, reference electrode layer 22 can also
Be set as with 12 one-to-one array electrode of driving electrodes, by controlling each electrod-array of reference electrode layer 22 respectively and driving
Moving electrode 12 controls the electric field between two substrates, to drive the movement of drop.Further, it is also possible to by each driving electrodes
The 12 individual signal wires of connection, are controlled, and there are many modes that driving electrodes 12 are loaded with electric signal, in this regard, this practicality
It is novel not to be limited, it is to be understood that above-mentioned thin film transistor switch, signal wire can integrate on first substrate 1, with drive
12 same layer of moving electrode is arranged, and can also be located in other layer of structure；It can also be arranged on second substrate 2, be realized by via
With being electrically connected for driving electrodes 12, its specific location the utility model is not also limited.
Specifically, electric signal can be loaded to driving electrodes 12 by external circuit, it is to be understood that when will be above-mentioned
When thin film transistor switch and signal wire are arranged on the first substrate, have on first substrate 1 a plurality of defeated to driving electrodes 12
The cabling of electric signals, the pin 7 of these cablings, which generally concentrates, to be arranged at the edge of a side of first substrate 1, and pin 7 is facilitated
With being bonded or directly from external equipment load electric signal for flexible PCB.
Further, above-mentioned first substrate 1 and second substrate 2 are sealed by sealant 4, certain thickness sealant
4 can form the gap between first substrate 1 and second substrate 2, and for injecting drop, the thickness of sealant 4 can be
0.1mm-1mm, to ensure that drop can be located in the sealing space that two substrates are formed.
The through-hole 25 for injecting and being sucked out for polar particle 3 is offered on second substrate 2, which is generally arranged at
The fringe region of second substrate 2, prevents it from being impacted to mask pattern.For the specific location and quantity of through-hole, this practicality
It is novel not to be limited.
According to the wavelength of exposure light source in photoetching process, the polar particle 3 of different absorption effects is selected, it can be in polarity grain
Injection carries out different light sources the extinction material of extinction in son 3.For example, when exposure light source is ultraviolet light, then can select to have
There is the drop of ultraviolet light absorption effects, salicylate substance, benzophenone substance, benzotriazole object can be dissolved in drop
At least one of matter is for the absorption to ultraviolet light.It, can be from through-hole 25 between needing adjustment two substrates when the quantity of drop
Drop is sucked out in injection；When replacing exposure light source, drop can be equally sucked out from through-hole 25, be reinjected to the exposure light source
There is the drop of absorption effects.The setting of through-hole 25 facilitates the quantity and type for adjusting drop according to actual needs.
The formation of mask plate is exemplified below and uses process, with reference to shown in Fig. 3 a~b, light source 5 can be purple in figure
Outer light, photoresist 6 are that positive photoresist is then first passed through and covered above-mentioned to form the exposing patterns in Fig. 3 b shown on substrate 8
The pin 7 of the first substrate 1 of film version loads external electric signal, after driving electrodes 12 receive electric signal, control polarity particle 3 such as liquid
Drop is mobile and covers in Fig. 3 a in the dark driving electrodes 12 arranged by predetermined pattern, at this point, when drop is moved to these
When by the driving electrodes 12 of preset rules arrangement, stops load electric signal or identical telecommunications is loaded to each driving electrodes 12
Number, drop can be maintained in these driving electrodes 12, form the mask plate with predetermined pattern；Mask plate is placed in light source later
5 and coating photoresist 6 wait for photolithographic substrate 8 between, play the role of photo etched mask；After exposure, by the light of drop blocking position
Photoresist 6 retains, and can form photoengraving pattern shown in Fig. 3 b on the substrate 8.
It is understood that polar particle 3 occupies the single-row driving electrodes 12 of uniline in diagram, but it is not limited in practical application
This, can need that polar particle 3 is made to occupy multiple lines and multiple rows according to practical mask, can also more polar particles 3 concentrate on one
In driving electrodes 12.Driving electrodes 12 are rectangle in diagram, but driving electrodes 12 or the shape such as round, triangle
Shape.The exposure accuracy of mask plate is related with the size of polar particle 3 with driving electrodes 12, and driving electrodes 12 are smaller, polar particle 3
It is smaller, you can the minimum feature and minimum line reached is away from smaller, then the precision of mask plate regulation and control is also higher, in the present embodiment
The driving electrodes minimum of mask plate is up to tens microns, in practical applications, can be made according to the precision of exposing patterns different
The mask plate of driving electrodes size.
It is above-mentioned only by polar particle 3 be with the drop of absorption effects for illustrate, for polar particle 3 be with
The particle of light transmission effect, similar to the above embodiments, details are not described herein.
Each embodiment in this specification is described in a progressive manner, the highlights of each of the examples are with
The difference of other embodiment, the same or similar parts between the embodiments can be referred to each other.For system embodiment
For, since it is basically similar to the method embodiment, so description is fairly simple, referring to the portion of embodiment of the method in place of correlation
It defends oneself bright.
Although the preferred embodiment of the utility model has been described, once a person skilled in the art knows basic
Creative concept, then additional changes and modifications can be made to these embodiments.It is wrapped so the following claims are intended to be interpreted as
It includes preferred embodiment and falls into all change and modification of the utility model embodiment range.
Above description is only a specific implementation of the present invention, but the scope of protection of the utility model is not limited to
In this, any one skilled in the art within the technical scope disclosed by the utility model, can readily occur in variation
Or replace, it should be covered within the scope of the utility model.Therefore, the scope of protection of the utility model should be wanted with right
Subject to the protection domain asked.
Claims (7)
1. a kind of mask plate, which is characterized in that including：The first substrate that is oppositely arranged, second substrate and it is located at described first
Polar particle between substrate and the second substrate, the polar particle have extinction or light transmission effect；
The first substrate includes the multiple driving electrodes being arranged in array being arranged towards the second substrate, the driving electricity
Pole controls the polar particle and is moved in specified driving electrodes for receiving electric signal, forms predetermined pattern.
2. mask plate according to claim 1, which is characterized in that the first substrate further includes setting in driving electricity
Pole deviates from the first substrate of the second substrate side, and first in the driving electrodes towards the second substrate side is arranged
Dielectric layer and the first hydrophobic layer, wherein first hydrophobic layer is arranged close to the second substrate side；
The second substrate includes the second substrate being cascading, reference electrode layer, the second dielectric layer and the second hydrophobic layer,
Wherein described second hydrophobic layer is arranged close to the first substrate side.
3. mask plate according to claim 1, which is characterized in that offered on the second substrate for the polarity grain
Through-hole injection and be sucked out.
4. mask plate according to claim 1, which is characterized in that the first substrate is with the second substrate by sealing frame
Glue is sealed, and the thickness of the sealant is 0.1mm-1mm.
5. mask plate according to claim 2, which is characterized in that the polar particle is the drop with absorption effects,
There is extinction material, the material of the extinction material includes salicylate substance, benzophenone substance, benzo three in the drop
At least one of azole substance.
6. mask plate according to claim 5, which is characterized in that the first substrate is transparent with the second substrate
Substrate.
7. mask plate according to claim 2, which is characterized in that the material of first dielectric layer and second dielectric layer
Material includes at least one of silicon nitride, silica, Parylene, SU-8；
The material of first hydrophobic layer and second hydrophobic layer includes at least one of Teflon and Cytop.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820462852.6U CN207924370U (en) | 2018-04-03 | 2018-04-03 | A kind of mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820462852.6U CN207924370U (en) | 2018-04-03 | 2018-04-03 | A kind of mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207924370U true CN207924370U (en) | 2018-09-28 |
Family
ID=63595472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820462852.6U Expired - Fee Related CN207924370U (en) | 2018-04-03 | 2018-04-03 | A kind of mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207924370U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023197550A1 (en) * | 2022-04-11 | 2023-10-19 | 西湖大学 | Mask, photolithographic apparatus, and method for manufacturing mask |
-
2018
- 2018-04-03 CN CN201820462852.6U patent/CN207924370U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023197550A1 (en) * | 2022-04-11 | 2023-10-19 | 西湖大学 | Mask, photolithographic apparatus, and method for manufacturing mask |
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