CN207638963U - Plasma processing apparatus - Google Patents
Plasma processing apparatus Download PDFInfo
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- CN207638963U CN207638963U CN201721533870.0U CN201721533870U CN207638963U CN 207638963 U CN207638963 U CN 207638963U CN 201721533870 U CN201721533870 U CN 201721533870U CN 207638963 U CN207638963 U CN 207638963U
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- processing apparatus
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- 239000004020 conductor Substances 0.000 claims abstract description 57
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000011800 void material Substances 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 58
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 13
- 238000004804 winding Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 8
- 230000009931 harmful effect Effects 0.000 description 6
- 230000006698 induction Effects 0.000 description 6
- 230000006978 adaptation Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- BGOFCVIGEYGEOF-UJPOAAIJSA-N helicin Chemical compound O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@H]1OC1=CC=CC=C1C=O BGOFCVIGEYGEOF-UJPOAAIJSA-N 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000008429 bread Nutrition 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000013316 zoning Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/32119—Windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
Abstract
Plasma processing apparatus in the embodiments of the present invention includes：Receiving is by the process chamber of processing substrate, with be housed in the indoor window configured by the relatively configured antenna structure of processing substrate and between the antenna structure and the process chamber of the processing, the antenna structure includes the antenna part spirally formed between two opposite different virtual planes of the upper surface of the window by antenna conductor, the antenna part is formed as, the distance between its described two different virtual plane be in described two different virtual planes below the plane neighbouring with the window and the window between at a distance from twice or more.
Description
Technical field
The utility model is related to a kind of plasma processing apparatus, especially generate plasma and to display panel etc.
Substrate implements used plasma processing apparatus when processing.
Background technology
In the device for implementing the processing such as CVD, etching to substrate using plasma, used more to comprising antenna
Device apply RF power, to form induction field around antenna and generate the mode of plasma.
On the other hand, with the enlargement of processed substrate, processing unit also gradually enlargement, in order to enlargement
Substrate implements uniform processing, becomes universal gradually using the substrate board treatment with mutiple antennas.
In the case of with mutiple antennas, usually using the structure for two-dimensionally configuring spiral helicine antenna, at this point,
There are the region that electric current is in opposite direction flowing between adjacent antenna, therefore, the induction field in the region is cancelled out each other, from
And form the region for hardly generating plasma or generation low density plasmas.
Existing technical literature
Korean Patent Publication No. the 10-2016-0012741st
Utility model content
Technical problem
The purpose of the utility model is to provide a kind of corona treatments that can generate more uniform plasma
Device.
The purpose of this utility model is not limited to the above-mentioned purpose referred to, and those of ordinary skill in the art can pass through following note
Load is clearly understood that the other purposes not referred to.
Technical solution
In order to solve the above technical problems, the plasma processing apparatus in the embodiments of the present invention includes：Accommodate quilt
The process chamber of processing substrate, the processing is indoor described by the relatively configured antenna structure of processing substrate with being housed in
And the window configured between the antenna structure and the process chamber, the antenna structure include by antenna conductor with institute
The antenna part spirally formed between two opposite different virtual planes of the upper surface of window is stated, the antenna part is formed as,
The distance between its described two different virtual plane are neighbouring with the window in described two different virtual planes
Twice or more the distance between below plane and the window.
The antenna part includes the with the first antenna portion of first direction configured in parallel and with second direction configured in parallel
The first direction length of two antenna parts, the first antenna portion can be shorter than the second direction length of second antenna part.
The second direction length ratio of the first direction length in the first antenna portion and second antenna part can be
1：1.2 to 1：Between 1.8.
The distance between described two different virtual planes in the first antenna portion can be than second antenna part
The distance between described two different virtual planes it is long.
The number of turns of the antenna conductor in the first antenna portion can be more than the number of turns of the antenna conductor of second antenna part.
The distance between described two different virtual planes in the first antenna portion can be with second antenna part
The distance between described two different virtual planes it is equal.
The antenna conductor in the first antenna portion is launched into the entire length after straight line can be with described second day
It is equal that the antenna conductor in line portion is launched into the entire length after straight line.
The first antenna portion can be configured in a manner of forming the short side of virtual rectangle, and second antenna part can be with
It is configured in a manner of forming the long side of the virtual rectangle.
The antenna part can also include third antenna portion of the configuration in the corner of the virtual rectangle.
The third antenna portion is located in plane neighbouring with the window in described two different virtual planes
A part of in antenna conductor can be parallel with the first direction, and another part can be parallel with the second direction.
Other details of the utility model are included in detailed description and attached drawing.
Advantageous effect
Embodiment according to the present utility model at least has the effect of following.
More uniform plasma can be generated.
The effect of the utility model is not limited to the above-mentioned content referred to, and this specification will include other technology effects with a greater variety
Fruit.
Description of the drawings
Fig. 1 is the synoptic diagram of the plasma processing apparatus of the one embodiment for indicating the utility model.
Fig. 2 is that the summary of the antenna structure for generating plasma for the first embodiment for indicating the utility model is flat
Face figure.
Fig. 3 is the stereogram in the first antenna portion for the antenna structure for indicating Fig. 2.
Fig. 4 is the front synoptic diagram for the part for indicating first antenna portion and window.
Fig. 5 is the comparison synoptic diagram for indicating first antenna portion and the second antenna part.
Fig. 6 is the stereogram in the third antenna portion for indicating Fig. 2.
Fig. 7 is the stereogram for the other embodiments for indicating third antenna portion.
Fig. 8 is the figure for the electric current flowing for indicating the effective coverage in the antenna structure of Fig. 2 for generating plasma.
Fig. 9 is the summary of the power supply structure of the plasma processing apparatus of the one embodiment for indicating the utility model
Figure.
Figure 10 is the summary of the antenna structure for generating plasma for the second embodiment for indicating the utility model
Plan view.
Figure 11 is the summary of the antenna structure for generating plasma for the 3rd embodiment for indicating the utility model
Plan view.
Figure 12 is the summary of the antenna structure for generating plasma for the fourth embodiment for indicating the utility model
Plan view.
Figure 13 is the summary of the antenna structure for generating plasma for the 5th embodiment for indicating the utility model
Plan view.
Figure 14 is the summary of the antenna structure for generating plasma for the sixth embodiment for indicating the utility model
Plan view.
Reference numeral
1：Plasma processing apparatus 10：Chamber
20：Base support component 30：Pedestal
50：Window 61,71：Supply lines
62、72：High frequency electric source 63,73：Adaptation
100、200、300、400、500、600：Antenna structure
110：Central antenna portion 110a：Central power input terminal
110b：Central power output end 111,112,113,114：Central antenna conducting wire
120、220：Intermediate antenna portion 121,122,123,124：Intermediate antenna conducting wire
121a、122a、123a、124a：Intervening power input terminal
121b、122b、123b、124b：Intervening power output end
130、230、330、430：First antenna portion
130a、331f：First power input end 130b, 331g：First power output end
140、340：Second antenna part 140a, 341f：Second power input end
140b、341g：Second power output end 150,150 ', 250：Third antenna portion
150a、250a：Third power input end 150b, 250b：Third power output end
221：First intermediate antenna section 222：Second intermediate antenna section
251：Third antenna conducting wire
331、332、333、344、345：First antenna section
341、342、343：Second antenna segment C1, C2, C3, C4：Variable condenser
D1：First direction D2：Second direction
L1：First direction length L2：Second direction length
P1：First plane P2：Second plane
T1、T2、T3、T4：Delivery outlet
Specific implementation mode
The embodiment described with reference to attached drawing and in detailed below, the advantages of more clearly understanding the utility model and feature are simultaneously
Reach these method.But the utility model is not limited to embodiments disclosed below, but other can be made to it
Different various deformations, the present embodiment are intended to completely disclose the utility model, are provided completely for those skilled in the art
Utility model scope, the utility model are only defined by the claims.Same reference marks is specified same in specification full text
Inscape.
In addition, the embodiment that is described of this specification can with reference to the exemplary plot as the utility model sectional view and/or
Synoptic diagram illustrates.Therefore, the form of exemplary plot can be deformed according to manufacturing technology and/or allowable error.In addition, being
Convenient for illustrating each element, the case where how much illustrated each attached drawing of the utility model expand or shrink.In specification
Same reference marks specifies same inscape in full text.
Hereinafter, by the attached drawing with reference to the plasma processing apparatus to illustrate the embodiments of the present invention, to this reality
It is illustrated with novel.
Fig. 1 is the synoptic diagram of the plasma processing apparatus of the one embodiment for indicating the utility model.
The plasma processing apparatus 1 of one embodiment of the utility model is by being used to 10 inside supply step of chamber
Gas generates plasma, and the device for the treatment of process is carried out to the substrate S inside chamber 10.
As shown in Figure 1, the plasma processing apparatus 1 of one embodiment of the utility model include chamber 10, pedestal 30,
Window 50 and antenna structure 100.Antenna structure 100 refers to the antenna for generating plasma.
The inside of chamber 10 is formed as being formed with the close of the space that pedestal 30, window 50 and antenna structure 100 can be arranged
Seal structure.Chamber 10 can be made of the aluminium that inner wall was anodized.
As shown in Figure 1, pedestal 30 is located at the lower part inside chamber 10.Pedestal 30 is configured to bearing and is moved to inside chamber 10
Substrate S, be electrically connected with the high frequency electric source 62 of biasing by supply lines 61, the ion in plasma introduced into substrate S.Partially
The high frequency electric source 62 set can apply pedestal 30 RF power of 6MHz.
It can be with configurations match device 63 between the high frequency electric source 62 and pedestal 30 of biasing.Adaptation 63 can by supply lines 61
With in biasing with carrying out impedance matching between high frequency electric source 62 and pedestal 30.
The temperature control device of having heaters and/or refrigerant flow path etc. can be set in pedestal 30, to control process
In substrate S temperature.
Pedestal 30 can be supported by base support component 20, and base support component 20 can be in the airtight shape for maintaining chamber 10
The bottom surfaces of chamber 10 are penetrated through under state, and to the Outer elongate of chamber 10.Base support component 20 can be by configuring in chamber
Elevating mechanism outside 10, in 10 inside lifting pedestal 30 of chamber.
It is able to maintain that the airtight conditions inside chamber 10 if even if being lifted for pedestal 30 and foreign is prevented to be flowed into
Inside chamber 10, bellows can be configured in a manner of base support component 20 to surround between pedestal 30 and the bottom surfaces of chamber 10
40。
On the other hand, the top setting fenestrate 50 inside chamber 10.Window 50 can be by the upper space zoning in chamber 10
At the processing space of the antenna installation space and generation plasma that are provided with antenna structure 100.To which window 50 is both antenna
The bottom of installation space, while being also the top of processing space.
Window 50 can be made of dielectrics such as ceramics, quartz, or be made of the electric conductor of such as aluminum or aluminum alloy.
The top of window 50 is provided with antenna structure 100.
Antenna structure 100 obtains the supply of RF power by supply lines 71 from high frequency electric source 72.High frequency electric source 72 can
To supply the RF power of 13.56MHz to antenna structure.
Adaptation 73 is configured between antenna structure 100 and high frequency electric source 72, adaptation 73 can be with by supply lines 71
Impedance matching is carried out between high frequency electric source 72 and antenna structure 100.
When the RF power supplied by high frequency electric source 72 is applied to antenna structure 100, by window 50 in processing space
Induction field is generated, is supplied to the processing gas of processing space by induction field by plasma, to raw in process chamber
At plasma.
The processing gas that will be externally supplied can be provided with although not showing in Fig. 1, in chamber 10 to be transmitted to
The gas flow path and spray head of processing space.In addition, the side wall of chamber 10 could be formed with the carrying-in/carrying-out for substrate S
Mouthful.
Hereinafter, antenna structure is specifically described.
Fig. 2 is that the summary of the antenna structure for generating plasma for the first embodiment for indicating the utility model is flat
Face figure.
As shown in Fig. 2, the antenna structure 100 for generating plasma of the first embodiment of the utility model includes
A pair of of first antenna portion 130,140, four third antenna portions 150 of a pair of second antenna part, central antenna portion 110 and intermediate antenna
Portion 120.
Central antenna portion 110 is located at the center of antenna structure 100, and intermediate antenna portion 120 is to surround central antenna portion 110
The centrally located antenna part of mode 110 outside, first antenna portion 130, the second antenna part 140 and third antenna portion 150 are to wrap
The mode for enclosing intermediate antenna portion 120 is located at the outside in intermediate antenna portion 120.
Central antenna portion 110 includes the multiple central antenna conducting wires extended in the shape of a spiral from central power input end 110a
111、112、113、114.Fig. 2 shows multiple central antenna conducting wires 111,112,113,114 to be configured to from central electric power input
The spiral helicine example that end 110a is rotated in a clockwise direction.
It is formed twice as shown in Fig. 2, each central antenna conducting wire 111,112,113,114 can have vertically to be bent
Three sides surrounded shape, and be configured to be separated by 90 degree centered on central power input terminal 110a respectively.
Because the present embodiment shows the example using four central antenna conducting wires 111,112,113,114, so in each
Centre antenna conductor 111,112,113,114 is configured to be separated by 90 degree, but as central antenna conducting wire 111,112,113,114 counts
The variation of amount, the configuration space between each central antenna conducting wire 111,112,113,114 can also change therewith.
The end of each central antenna conducting wire 111,112,113,114 be formed with central power output end 110b, 110c,
110d, 110e, by the electric power of central power input terminal 110a supply can along each central antenna conducting wire 111,112,113,
114 flow through.
On the other hand, intermediate antenna portion 120 includes the four intermediate antenna conducting wires 121,122,123,124 being separated from each other.
As shown in Fig. 2, each intermediate antenna conducting wire 121,122,123,124 is enclosed with three bread made of being vertically bent twice
Shape, and it is Chong Die with other two intermediate antenna conducting wire 121,122,123,124 to be configured to part of it, makes central antenna portion
110 are surrounded by intermediate antenna portion 120.
One end of each intermediate antenna conducting wire 121,122,123,124 be formed with intervening power input terminal 121a, 122a,
123a, 124a, the other end are formed with intervening power output end 121b, 122b, 123b, 124b.To defeated by each intervening power
Entering to hold the electric power that 121a, 122a, 123a, 124a are supplied can flow through along each intermediate antenna conducting wire 121,122,123,124.
As shown in Fig. 2, intervening power input terminal 121a, 122a, 123a, 124a and intervening power output end 121b, 122b,
The flowing that 123b, 124b are formed as flowing through the electric current of each intermediate antenna conducting wire 121,122,123,124 is in integrally square clockwise
To.
On the other hand, a pair of of first antenna portion 130, a pair of second antenna part 140 and four third antenna portions 150 are with entirety
The mode for forming dimetric frame is configured to surround intermediate antenna portion 120.
As shown in Fig. 2, a pair of of first antenna portion 130 configures in parallel to each other along first direction D1, a pair of second antenna part
140 configure in parallel to each other in a second direction, and at least form the part on dimetric each side.
In addition, four third antenna portions 150 are configured in a manner of forming dimetric each corner.
When being rectangle by processing substrate S, the first direction length L1 in first antenna portion 130 can be formed as than second day
The second direction length L2 in line portion 140 is short.At this point, the first direction length L1 in first antenna portion 130 and the second antenna part 140
The ratio between second direction length L2 can be 1：1.2 to 1：Between 1.8.
To four formed by a pair of of first antenna portion 130, a pair of second antenna part 140 and four third antenna portions 150
Angular to become rectangle, first antenna portion 130 can be located at the short side of rectangle, and the second antenna part 140 can be located at rectangle
Long side.
In order to which the substrate S to rectangle is more effectively handled, the indoor plasma distribution of preferred process has on the whole
There is the rectangular shape similar with substrate S-shaped shape.
Therefore, make participation generation corresponding to the first antenna portion 130 of the plasma of the fringe region of substrate S and second day
The length in line portion 140 differs, and the outline shape of antenna structure 100 is made to constitute rectangle on the whole.
Fig. 3 is the stereogram in the first antenna portion for the antenna structure for indicating Fig. 2.
As shown in figure 3, first antenna portion 130 by first antenna conducting wire along be parallel to first direction D1 and second direction D2
Two different imaginary plane Ps 1, vertical radially winding helically shaped of P2 and formed.
More particularly, first antenna conducting wire is in the first virtual plane for being parallel to first direction D1 and second direction D2
It is continuously perpendicularly bent toward between P1 and the second plane P2 to form first antenna portion 130.
Fig. 3 is shown encloses the first antenna portion 130 formed by first antenna Wire-wound two.First antenna conducting wire is first
Two circle of winding between plane P1 and the second plane P2, so that one end and the other end are located on the first plane P1.
To as shown in figure 3, first antenna conducting wire includes three conducting wires being located on the first plane P1 of opposing lower portions
131a, 131b, 131c and positioned at two conducting wires 132a, 132b on the second plane P2 of opposite upper parts.Also, including vertical
In the first plane P1 and the second plane P2 and connect four of three conducting wires 131a, 131b, 131c and two conducting wires 132a, 132b
Conducting wire 133a, 133b, 133c, 133d.
Three conducting wires 131a, 131b, 131c on the first plane P1 are formed as linear in being mutually parallel.Although
Two conducting wires 132a, 132b on the second plane P2 be similarly formed as it is linear in being mutually parallel, but can be with the
The position of three conducting wire 131a, 131b, 131c obliques on one plane P1.
In fig. 2, three conducting wires 131a, 131b, 131c being located on the first plane P1 are indicated by the solid line, and it is flat to be located at second
Two conducting wires 132a, 132b on the P2 of face are represented by dashed line.
As shown in Fig. 2, one end of first antenna conducting wire is formed with the first power input end 130a, the other end is formed with first
Power output end 130b.A part in the RF power supplied by high frequency electric source 72 is applied by the first power input end 130a
Pass through the first power output end 130b outflows after to first antenna conducting wire.
In the present embodiment, it is carried out for the first antenna portion 130 formed by being enclosed by first antenna Wire-wound two
Illustrate, but the windings of first antenna conducting wire can be changed according to embodiment.For example, working as first antenna Wire-wound
When one circle forms first antenna portion 130, it can be two to be located at the conducting wire on the first plane P1, leading on the second plane P2
Line can be one.Alternatively, when the windings of first antenna conducting wire are more than two circles, the conducting wire being located on the first plane P1 can
Think three or more, it can be two or more to be located at the conducting wire on the second plane P2.
Fig. 4 is the front synoptic diagram for the part for indicating first antenna portion and window.
First antenna portion 130 can be located at the top of window 50 with the state separated with window 50.Alternatively, first antenna portion 130
The upper surface of window 50 can be placed in.
As shown in figure 4, it is preferred that first antenna portion 130 is formed as the distance between the first plane P1 and the second plane P2 H2 ratios
H1 long the distance between below first plane P1 and window 50.More particularly, between the first plane P1 and the second plane P2
Distance H2 the distance between is formed as below the first plane P1 and window 50 twice or more of H1.
By the electric current for being located at antenna conductor 131a, 131b, 131c on the first plane P1 in first antenna portion 130 through flowing
The induction field of generation generates plasma in the processing space of the lower part of window 50.
But due to the electric current of antenna conductor 132a, 132b being located on the second plane P2 through flowing first antenna portion 130
With through flow be located at the first plane P1 on antenna conductor 131a, 131b, 131c electric current opposite direction flowing, so can be to plasma
The generation of body generates harmful effect.
To generate or reduce in order to prevent the electric current through flowing antenna conductor 132a, 132b for being located on the second plane P2
It is flat to be formed as first for the harmful effect of the generation of plasma, preferably the distance between the first plane P1 and the second plane P2 H2
Twice or more of H1 the distance between below face P1 and window 50.
The second antenna part is illustrated below.
Second antenna part 140 is equally similarly formed with first antenna portion 130.
That is, the second antenna part 140 is equally to be parallel to first direction D1 and second direction D2 by the second antenna conductor
It is continuously perpendicularly bent toward between virtual the first plane and the second plane with the spiral-shaped of the radial direction vertical with each plane
And it is formed.
Preferably, there is same impedance, the second antenna conductor to be formed as having for first antenna conducting wire and the second antenna conductor
There is sectional area same as first antenna conducting wire, and it is equal with first antenna conducting wire to be formed as entire length.
The entire length of each antenna conductor refers to when state in alignment is unfolded in each antenna conductor, from one end to another
The length of one end.
Second antenna conductor is equally comprising three conducting wires 141a, 141b, 141c being located in the first plane and positioned in phase
To two conducting wires 142a, 142b in second plane on top, and include perpendicular to the first plane and the second plane and to connect three
Four conducting wires (not shown) of root conducting wire 141a, 141b, 141c and two conducting wires 142a, 142b.
First plane of the second antenna conductor can be plane identical with the first plane P1 of first antenna conducting wire, but the
Second plane of two antenna conductors can also be the plane different from the second plane P2 of first antenna conducting wire.Or according to implementation
Example, the first plane of the second antenna conductor can also be the plane different from the first plane P1 of first antenna conducting wire.
In fig. 2, three conducting wires 141a, 141b, 141c being located in the first plane are indicated by the solid line, are located at the second plane
On two conducting wires 142a, 142b be represented by dashed line.
Only, as described above, because the first direction length L1 in first antenna portion 130 is formed as than the second antenna part 140
Second direction length L2 it is short, so first antenna portion 130 be located at the first plane P1 on three conducting wire 131a, 131b,
The length of 131c is shorter than the length for three conducting wires 141a, 141b, the 141c of the second antenna part 140 being located in the first plane.
As shown in Fig. 2, one end of the second antenna conductor is formed with the second power input end 140a, the other end is formed with second
Power output end 140b.A part in the RF power supplied by high frequency electric source 72 is applied by the second power input end 140a
Pass through the second power output end 140b outflows after to the second antenna conductor.
In the present embodiment, it is carried out by taking the second antenna part 140 formed by two circle of the second antenna conductor winding as an example
Illustrate, but the windings of the second antenna conductor can be changed according to embodiment.For example, when the second antenna conductor is wound
When one circle forms the second antenna part 140, it can be two to be located at the conducting wire in the first plane, and the conducting wire being located in the second plane can
Think one.Alternatively, when the windings of the second antenna conductor are more than two circles, it can be three to be located at the conducting wire in the first plane
More than root, it can be two or more to be located at the conducting wire in the second plane.
Fig. 5 is the comparison synoptic diagram for indicating first antenna portion and the second antenna part.
As shown in Fig. 2, the first antenna portion 130 of the present embodiment and the second antenna part 140 are mutually perpendicular to configuration, still
In order to carry out comparative illustration to first antenna portion 130 and the second antenna part 140, Fig. 5 has been shown side by side first antenna portion 130 and the
Two antenna parts 140.
As previously mentioned, the first direction length L1 in first antenna portion 130 is formed as the second direction than the second antenna part 140
Length L2 is short, so the length ratio of three conducting wires 131a, 131b, the 131c being located on the first plane P1 in first antenna portion 130
The length for three conducting wires 141a, 141b, the 141c of second antenna part 140 being located in the first plane is short.
Also, in order to keep first antenna portion 130 identical with the impedance of the second antenna part 140, first antenna conducting wire and second
It is equal that antenna conductor is formed as entire length.
To as shown in figure 5, four vertical with the first plane P1 and the second plane P2 in first antenna portion 130 are led
Line 133a, 133b, 133c, 133d, which are formed as four more vertical with the first plane and the second plane than in the second antenna part 140, to be led
Line 143a, 143b long.
In other words, the distance between two of first antenna portion 130 different imaginary plane Ps 1, P2 H2 are than the second antenna part
The distance between 140 two different virtual planes (non-reference symbol number) H3 long.
The electric current through flowing antenna conductor 142a, 142b for being located in the second plane is generated or reduced in order to prevent to plasma
The harmful effect of the generation of body, the second antenna part 140 is also, it is preferred that be formed as the distance between the first plane and the second plane H3
For twice or more the distance between below the first plane and window 50.
Fig. 6 is the stereogram in the third antenna portion for indicating Fig. 2.
As shown in fig. 6, third antenna portion 150 and first antenna portion 130 or the second antenna part 140 are bent to after 90 degree
Shape it is similar.
Third antenna portion 150 is to be parallel to virtual the of first direction D1 and second direction D2 by third antenna conducting wire
Integral L-shaped spiral-shaped form continuously is perpendicularly bent toward between one plane P1 and the second plane P2.
Third antenna conducting wire winds two circles between the first plane P1 and the second plane P2, so that one end and the other end are located at
On first plane P1.
To as shown in fig. 6, third antenna conducting wire includes three conducting wires being located on the first plane P1 of opposing lower portions
151a, 151b, 151c and positioned at two conducting wires 152a, 152b on the second plane P2 of opposite upper parts.Also, including vertical
In the first plane P1 and the second plane P2 and connect four of three conducting wires 151a, 151b, 151c and two conducting wires 152a, 152b
Conducting wire 153a, 153b, 153c, 153d.
Each comfortable middle section three conducting wires 151a, 151b, 151c on the first plane P1 is bent approximately in 90 degree
And a part is parallel to first direction D1, another part is parallel to second direction D2.Also, three conducting wires 151a, 151b, 151c
It configures concentric.
Equally, each comfortable middle section two conducting wires 152a, 152b on the second plane P2 is bent approximately in 90 degree
And a part is parallel to first direction D1, another part is parallel to second direction D2, and two conducting wires 152a, 152b are configured to together
The heart.
In fig. 2, three conducting wires 151a, 151b, 151c being located on the first plane P1 are indicated by the solid line, and it is flat to be located at second
Two conducting wires 152a, 152b on the P2 of face are represented by dashed line.
It as shown in Figures 2 and 6, can be with a part (with the positioned at the conducting wire 152a of inside in two conducting wires 152a, 152b
Part parallel one direction D1) and overlapping parallel with innermost conducting wire 151a is located in three conducting wires 151a, 151b, 151c,
Another part (part parallel with second direction D2) and conducting wire 151b centrally located in three conducting wires 151a, 151b, 151c
Parallel and overlapping mode is formed.
Also, it can be (flat with first direction D1 with a part positioned at the conducting wire 152b in outside in two conducting wires 152a, 152b
Capable part) it is parallel with conducting wire 151b centrally located in three conducting wires 151a, 151b, 151c and be overlapped, another part is (with the
Part parallel two direction D2) it is parallel with conducting wire 151c on the outermost side in three conducting wires 151a, 151b, 151c and overlapping
Mode is formed.
As shown in Fig. 2, one end of third antenna conducting wire is formed with third power input end 150a, the other end is formed with third
Power output end 150b.A part in the RF power supplied by high frequency electric source 72 is applied by third power input end 150a
It is flowed out by third power output end 150b after to third antenna conducting wire.
In the present embodiment, it is carried out for the third antenna portion 150 formed by being enclosed by third antenna Wire-wound two
Illustrate, but the windings of third antenna conducting wire can be changed according to embodiment.For example, working as third antenna Wire-wound
When one circle forms third antenna portion 150, it can be two to be located at the conducting wire on the first plane P1, leading on the second plane P2
Line can be one.Alternatively, when the windings of third antenna conducting wire are more than two circles, the conducting wire being located on the first plane P1 can
Think three or more, it can be two or more to be located at the conducting wire on the second plane P2.
In order to prevent generate or reduce through flow be located at the second plane P2 on antenna conductor 152a, 152b electric current equity from
The harmful effect of the generation of daughter, third antenna portion 150 is also, it is preferred that be formed as between the first plane P1 and the second plane P2
Distance is twice or more the distance between below the first plane P1 and window 50.
Fig. 7 is the stereogram for the other embodiments for indicating third antenna portion.
As shown in fig. 7, the third antenna portion 150 ' in other embodiment is compared with third antenna portion 150 shown in fig. 6,
The shape of two conducting wire 152a ', 152b ' on the second plane P2 are different.
Two conducting wire 152a ', 152b ' on the second plane P2 be different from two conducting wire 152a illustrated in fig. 6,
152b, intermediate portion is not bent and whole linear shape.
Therefore, be located at the second plane P2 on two conducting wire 152a ', 152b ' be in three conducting wire 151a, 151b,
The position of 151c obliques.
More particularly, as shown in fig. 7, positioned at the conducting wire 152a ' of inside with shortest in two conducting wire 152a ', 152b '
The other end of the distance connection positioned at innermost conducting wire 151a from three conducting wires 151a, 151b, 151c vertically extends
Conducting wire 153a and one end of centrally located conducting wire 151b from three conducting wires 151a, 151b, 151c vertically extend
Conducting wire 153b.
Also, it is led from three with shortest distance connection positioned at the conducting wire 152b ' in outside in two conducting wire 152a ', 152b '
The vertically extended conducting wire 153c of the other end of centrally located conducting wire 151b and from three in line 151a, 151b, 151c
The vertically extended conducting wire 153d in one end of conducting wire 151c on the outermost side in conducting wire 151a, 151b, 151c.
Fig. 8 is the figure for the electric current flowing for indicating the effective coverage in the antenna structure of Fig. 2 for generating plasma.
Be used to generate plasma in antenna structure 100 is the antenna conductor positioned at the first plane P1.Therefore, it uses
In the effective coverage for generating plasma be the lower part of antenna structure 100, the i.e. area with the first plane P1 in the same plane
Domain.
As shown in figure 8, in effective coverage first antenna portion 130, the second antenna part 140 and third antenna portion 150 electricity
Stream flowing is whole in clockwise.
Also, the electric current flowing in central antenna portion 110 and intermediate antenna portion 120 is equally in integrally clockwise.
To, flowed along clockwise direction because the electric current flowed through along antenna conductor in effective coverage is whole, so wait from
Daughter can integrally be formed uniformly (when there are electric current be in reverse flow part when, the induction field of corresponding portion mutually supports
Disappear, therefore will appear and to form the problem of hardly generating plasma or generating the region of low density plasmas).
On the other hand, Fig. 9 is the power supply of the plasma processing apparatus of the one embodiment for indicating the utility model
The synoptic diagram of structure.
In the plasma processing apparatus 1 of the present embodiment, to the supply lines 71 of 100 supply high frequency electric power of antenna structure
After adaptation 73, it is branched off into each antenna part 110,120,130,140,150.
As shown in figure 9, supply lines 71 is branched to be connected to the first confession of first antenna portion 130 and the second antenna part 140
It electric wire, the second supply lines for being connected to third antenna portion 150, the third supply lines for being connected to central antenna portion 110 and is connected to
4th supply lines in intermediate antenna portion 120.
In addition, being connected with variable condenser C1, C2, C3, C4 and output on each supply lines about the electricity for flowing to each supply lines
Delivery outlet T1, T2, T3, T4 of the information of power.
User can adjust the capacitance of variable condenser C1, C2, C3, C4, be supplied to first and second day with being independently adjusted
Line portion 130,140, the electric power in third antenna portion 150, central antenna portion 110, intermediate antenna portion 120.
Furthermore it is possible to the first and second antenna part 130,140, third antenna portion 150, central antenna will be supplied to due to adjusting
The electric power of any one of portion 110 and intermediate antenna portion 120 antenna part and the electric power to being supplied to other antenna parts generated
Influence be preferably minimized.
Furthermore it is possible to be supplied to each antenna part using the delivery outlet for being connected to each supply lines T1, T2, T3, T4 real-time confirmation
Electric power situation.Can be voltage, electric current, frequency by each delivery outlet T1, T2, T3, T4 information about electric power exported
Deng.
It can be by additional display device (not shown) with picture by each delivery outlet T1, T2, T3, T4 information exported
Information exports, and user can be with real-time confirmation about being supplied to the first and second antenna part 130,140, third antenna portion 150, center
The information of antenna part 110 and the electric power in intermediate antenna portion 120, and can be adjusted according to the needs variable condenser C1, C2, C3,
The capacitance of C4 is to adjust the density of the plasma generated in the field corresponding to each antenna part.
The present embodiment uses the example of 140 common power supply line of first antenna portion 130 and the second antenna part, but can basis
Embodiment by the supply lines for being connected to first antenna portion 130 and is connected to the supply lines of the second antenna part 140 independently and separately.
The antenna structure for generating plasma of the other embodiment of the utility model will be illustrated below.
For convenience of description, part similar with first embodiment has used same symbol, and is omitted pair total with first embodiment
The explanation of logical part.
Figure 10 is the summary of the antenna structure for generating plasma for the second embodiment for indicating the utility model
Plan view.
As shown in Figure 10, the antenna structure 200 for generating plasma of the second embodiment of the utility model,
130 how many different from of first antenna portion in first antenna portion 230 and first embodiment.
Antenna structure 100 in first embodiment forms 130 He of first antenna portion by two circle of each antenna conductor winding
Second antenna part 140, and the antenna structure 200 in second embodiment is in contrast, is formed as the day in first antenna portion 230
The number of turns of the antenna conductor of the second antenna part of turn ratio 140 of line conducting wire is more.
As shown in Figure 10, first antenna portion 230 can be enclosed by first antenna Wire-wound three and be formed.
First antenna portion 230 with the case where first embodiment above-mentioned similarly, first antenna conducting wire is being parallel to
It is continuously perpendicularly bent toward between virtual the first plane P1 and the second plane P2 of one direction D1 and second direction D2 and forms the
One antenna part 230.
Only, since first antenna portion 230 is to be enclosed by first antenna Wire-wound three and formed, there are four conducting wires
231a, 231b, 231c, 231d are located on the first plane P1, have three conducting wires 232a, 232b, 232c to be located on the second plane P2.
In first embodiment above-mentioned, first antenna conducting wire and the second antenna conductor are formed as equal turn numbers, therefore,
When the entire length of first antenna conducting wire and the second antenna conductor is equal, two different virtual planes in first antenna portion 130
The distance between P1, P2 H2 be formed as between two different virtual planes (non-reference symbol number) than the second antenna part 140 away from
From H3 long.
In contrast, in the present embodiment, first antenna portion 230 is formed as its second antenna part of turn ratio more than 140, therefore
The distance between two different imaginary plane Ps 1, P2 of one antenna part 230 H2 may not necessarily be formed as than the second antenna part 140
The distance between two different virtual planes (non-reference symbol number) H3 long.According to embodiment, two of first antenna portion 230 are not
With imaginary plane P 1, the distance between P2 H2 can be formed as from two different virtual planes of the second antenna part 140 (not
Reference symbol number) the distance between two identical or than the second antenna part 140 H3 different virtual planes (non-reference symbol number)
Distance H3 it is short.
Figure 10 illustrates first antenna portion 230 and is enclosed by first antenna Wire-wound three and formed, and the second antenna part 140 is by the
Two antenna conductors winding two encloses and the example of formation, still, in the number of turns of the second antenna conductor of turn ratio of first antenna conducting wire
Under the premise of more, the number of turns of the number of turns of first antenna conducting wire and the second antenna conductor can change according to different embodiments.
Figure 11 is the summary of the antenna structure for generating plasma for the 3rd embodiment for indicating the utility model
Plan view.
As shown in figure 11, the day knot of the antenna structure 300 of the 3rd embodiment of the utility model and first embodiment
Structure body 100 is compared, and the shape in third antenna portion 250 is had any different.
In the antenna structure 100 of first embodiment above-mentioned, third antenna portion 150 is by third antenna conducting wire flat
Row is continuously perpendicularly bent toward between virtual the first plane P1 and the second plane P2 of first direction D1 and second direction D2
It is whole L-shaped spiral-shaped to form.
But the third antenna portion 250 of the antenna structure 300 in the 3rd embodiment of the utility model, third day
Line conducting wire 251 is spiral-shaped with being rotated in a clockwise direction from third power input end 250a on the first plane P1.
Third power input end 250a is formed in one end of third antenna conducting wire 251, and the other end of antenna conductor 251 is formed
There is third power output end 250b.
The first antenna portion 230 of antenna structure 200 in second embodiment is readily applicable to the of the utility model
Antenna structure 300 in three embodiments.
Figure 12 is the summary of the antenna structure for generating plasma for the fourth embodiment for indicating the utility model
Plan view.
As shown in figure 12, the day knot of the antenna structure 400 of the fourth embodiment of the utility model and first embodiment
Structure body 100 is compared, and the shape of in-between antenna part 220 is had any different.
In antenna structure 100 in first embodiment above-mentioned, intermediate antenna portion 120 is by having vertically
Four intermediate antenna conducting wires 121,122,123,124 of three sides surrounded shape made of bending twice are constituted.
But the antenna structure 400 in the fourth embodiment of the utility model, in-between antenna part 220 include to be located at
The first intermediate antenna section 221 between first antenna portion 130 and central antenna portion 110 and it is located at the second antenna part 140 and center
The second intermediate antenna section 222 between antenna part 110.
First intermediate antenna section 221 is to be parallel to first direction D1 by antenna conductor similarly with first antenna portion 130
And it is continuously perpendicularly bent toward into vertical with each plane between virtual the first plane and the second plane of second direction D2
Radial helical form forms.
One circle of antenna conductor winding of the first intermediate antenna section 221 is formed, and includes that two in the first plane lead
Line 221a, 221b, a conducting wire 221c in the second plane and connection be located at the first plane on two conducting wire 221a,
Two conducting wires (not shown) of a 221b and conducting wire 221c in the second plane.
In fig. 12, two conducting wires 221a, 221b being located in the first plane are indicated by the solid line, are located in the second plane
A piece conducting wire 221c is represented by dashed line.
The one end and the other end for forming the antenna conductor of the first intermediate antenna section 221 is located in the first plane, and one end is formed
There are the first intervening power input terminal 221d, the other end to be formed with the first intervening power output end 221e.It is supplied by high frequency electric source 72
RF power in a part be applied to after the first intermediate antenna section 221 by by the first intervening power input terminal 221d
One intervening power output end 221e outflows.
As shown in figure 12, the second intermediate antenna section 222 is similarly formed with the first intermediate antenna section 221.
One circle of antenna conductor winding of the second intermediate antenna section 222 is formed, and includes that two in the first plane lead
Line 222a, 222b, a conducting wire 222c in the second plane and connection be located at the first plane on two conducting wire 222a,
Two conducting wires (not shown) of a 222b and conducting wire 222c in the second plane.
In fig. 12, two conducting wires 222a, 222b being located in the first plane are indicated by the solid line, are located in the second plane
A piece conducting wire 222c is represented by dashed line.
The one end and the other end for forming the antenna conductor of the second intermediate antenna section 222 is located in the first plane, and one end is formed
There are the second intervening power input terminal 222d, the other end to be formed with the second intervening power output end 222e.It is supplied by high frequency electric source 72
RF power in a part be applied to after the second intermediate antenna section 222 by by the second intervening power input terminal 222d
Two intervening power output end 222e outflows.
Preferably, the first intermediate antenna section 221 and the second intermediate antenna section 222 are configured to flow through in the first plane
Antenna conductor 221a, 221b, 222a, 222b electric current integrally be in clockwise.
As shown in figure 12, the second intermediate antenna section 222 can be formed as longer than the first intermediate antenna section 221.This is with second
The situation that antenna part 140 is formed as longer than first antenna portion 130 is similar.
Generate or reduce in order to prevent the electric current plasma through flowing the antenna conductor 221c being located in the second plane
The harmful effect of generation, the first intermediate antenna section 221 is also, it is preferred that being formed as the distance between the first plane and the second plane and being
Twice or more the distance between below first plane and window 50.
In addition, generating or reducing the electric current through flowing the antenna conductor 222c being located in the second plane in order to prevent to plasma
The harmful effect of the generation of body, the second intermediate antenna section 222 also, it is preferred that be formed as between the first plane and the second plane away from
From for twice or more the distance between below the first plane and window 50.
In addition, working as to make 222 impedance having the same of the first intermediate antenna section 221 and the second intermediate antenna section, each day
Line segment 221,222 be formed as antenna conductor entire length it is equal when, two different virtual planes of the first intermediate antenna section 221
The distance between can be formed as longer than the distance between two different virtual planes of the second intermediate antenna section 222.
The first antenna portion 230 of antenna structure 200 in second embodiment and/or the antenna structure in 3rd embodiment
The third antenna portion 250 of body 300 is readily applicable to the antenna structure 400 in the fourth embodiment of the utility model.
Figure 13 is the summary of the antenna structure for generating plasma for the 5th embodiment for indicating the utility model
Plan view.Although Figure 13 is not shown, the central antenna portion 110 of the antenna structure 100 in first embodiment and intermediate day
The central antenna portion 110 and intermediate antenna portion 220 of antenna structure 400 in line portion 120, fourth embodiment are readily applicable to
Antenna structure 500 in 5th embodiment of the utility model.
As shown in figure 13, the day knot of the antenna structure 500 and first embodiment of the 5th embodiment of the utility model
Structure body 100 is compared, and first antenna portion 330 and the second antenna part 340 are had any different.
As shown in figure 13, first antenna portion 330 includes multiple first days to form a line (with reference to figure 2) along first direction D1
Line segment 331,332,333, the second antenna part 340 include multiple second antennas that D2 forms a line (with reference to figure 2) in a second direction
Section 341,342,343.
Multiple first antenna sections 331,332,333 have the first antenna with the antenna structure 100 in first embodiment
The similar shape in portion 130.Difference lies in compare first antenna portion 130, the first direction of each first antenna section 331,332,333
Length L1a is formed shorterly.Other features can include the feature in the first antenna portion 130 of first embodiment.
The first direction length L1 in the first antenna portion 330 of the antenna structure 500 in the present embodiment and each first antenna
The summation of the first direction length L1a of section 331,332,333 is equal or similar.
Each first antenna section 331,332,333 is substantially the same, as shown in figure 13, each first antenna section 331,332,333
Including positioned at the first plane P1 on three conducting wires 331a, 331b, 331c and positioned on the second plane P2 of opposite upper parts
Two conducting wires 331d, 331e.Also, including perpendicular to the first plane P1 and the second plane P2 and connect three conducting wire 331a,
Four conducting wires (not shown) of 331b, 331c and two conducting wires 331d, 331e.
In fig. 13, three conducting wires 331a, 331b, 331c being located on the first plane P1 are indicated by the solid line, are located at second
Two conducting wires 331d, 331e on plane P2 are represented by dashed line.
In addition, one end of each first antenna section 331,332,333 is formed with the first power input end 331f, the other end is formed
There is the first power output end 331g.A part in the RF power supplied by high frequency electric source 72 passes through the first power input end
331f is applied to after each first antenna section 331,332,333 through the first power output end 331g outflows.
On the other hand, multiple second antenna segments 341,342,343 equally have and the antenna structure in first embodiment
The similar shape of 100 the second antenna part 140.Difference lies in, compare the second antenna part 140, each second antenna segment 341,342,
343 second direction length L2a is formed shorterly.Other features can include the spy of the second antenna part 140 of first embodiment
Sign.
Each second antenna segment 341,342,343 is substantially the same, as shown in figure 13, each second antenna segment 341,342,343
Including positioned at the first plane P1 on three conducting wires 341a, 341b, 341c and positioned on the second plane P2 of opposite upper parts
Two conducting wires 341d, 341e.Also, including perpendicular to the first plane P1 and the second plane P2 and connect three conducting wire 341a,
Four conducting wires (not shown) of 341b, 341c and two conducting wires 341d, 341e.
In fig. 13, three conducting wires 341a, 341b, 341c being located on the first plane P1 are indicated by the solid line, are located at second
Two conducting wires 341d, 341e on plane P2 are represented by dashed line.
In addition, one end of each second antenna segment 341,342,343 is formed with the second power input end 341f, the other end is formed
There is the second power output end 341g.A part in the RF power supplied by high frequency electric source 72 passes through the second power input end
341f is applied to after each second antenna segment 341,342,343 through the second power output end 341g outflows.
As shown in figure 13, in the present embodiment, the first direction length L1a of first antenna section 331,332,333 is than second
The second direction length L2a of antenna segment 341,342,343 is formed shorterly.
To even if constituting the quantity of 330 first antenna section 331,332,333 in first antenna portion and constituting second day
The quantity of second antenna segment 341,342,343 in line portion 340 is equal, and the first direction length L1 in first antenna portion 330 is also than
The second direction length L2 of two antenna parts 340 is short.
The third antenna portion 250 of antenna structure 300 in 3rd embodiment is readily applicable to the of the utility model
Antenna structure 500 in five embodiments.
Antenna structure 500 in the present embodiment can be used for handling the plasma processing apparatus of large substrate.With
The size of substrate becomes larger, and the size of antenna should also become larger therewith, but due to of the antenna structure 100 in first embodiment
One antenna part 130 and the second antenna part 140 each freedom, one antenna conductor are formed, so when suitable for large substrate, structure
Fragility, manufacture difficulty increase, and exist positioned at the second plane antenna conductor sink because of own wt and with it is flat positioned at first
The possibility that the antenna conductor in face overlaps.
Therefore, it is preferably constituted such as the day knot in the present embodiment in the plasma processing apparatus of processing large substrate
Structure body 500, i.e. first antenna portion 330 and the second antenna part 340 are respectively divided into mutiple antennas section 331~333,341~343.
Figure 14 is the summary of the antenna structure for generating plasma for the sixth embodiment for indicating the utility model
Plan view.For convenience of description, part similar with the 5th embodiment has used same symbol, and be omitted pair with it is the 5th real
Apply the explanation of the common part of example.
As shown in figure 14, the day knot of the antenna structure 600 and the 5th embodiment of the sixth embodiment of the utility model
Structure body 500 is compared, shape how many different from first antenna portion 430.
The antenna structure 500 of 5th embodiment above-mentioned, the first direction length of first antenna section 331,332,333
L1a is formed more shorterly than the second direction length L2a of the second antenna segment 341,342,343.
But the antenna structure 600 in the present embodiment, as shown in figure 14, first antenna section 344,345 and second day
Line segment 341,342,343 is substantially the same.
Therefore, the second of the first direction length L1a of first antenna section 344,345 and the second antenna segment 341,342,343
Direction length L2a is identical.
But as shown in figure 14, the antenna structure 600 of the present embodiment constitutes the first antenna in first antenna portion 430
The quantity of second antenna segment 341,342,343 of the quantity of section 344,345 than constituting the second antenna part 340 is few.
Therefore, even if the first direction length L1a of first antenna section 344,345 and the second antenna segment 341,342,343
Second direction length L2a is equal, and the first direction length L1 in first antenna portion 430 is also than the second direction of the second antenna part 340
Length L2 is short.
Possess the common sense of the utility model technical field it is to be understood by the skilled artisans that the utility model can be not
Under the premise of changing its technical thought and Essential features, implement in the form of other are specific.It is therefore to be understood that describe above
Embodiment is all exemplary in all aspects, and non-limiting.The scope of the utility model will in detail in the claims
It emerges from rather than above-mentioned detailed description, and by the meaning and range and from concept impartial therewith in claim
The form for having altered or deforming obtained, all should be interpreted that the scope for belonging to the utility model.
Claims (10)
1. a kind of plasma processing apparatus, which is characterized in that
Including：
Process chamber is accommodated by processing substrate；
Antenna structure, and is housed in that the processing is indoor described to be arranged as opposed to by processing substrate；And
Window configures between the antenna structure and the process chamber,
The antenna structure include by antenna conductor between two opposite different virtual planes of the upper surface of the window
The antenna part spirally formed,
The antenna part is formed as, and the distance between described two different virtual planes are described two different virtual
Twice or more in plane the distance between below the plane neighbouring with the window and the window.
2. plasma processing apparatus according to claim 1, which is characterized in that
The antenna part includes second day with the first antenna portion of first direction configured in parallel and with second direction configured in parallel
Line portion,
The first direction length in the first antenna portion is shorter than the second direction length of second antenna part.
3. plasma processing apparatus according to claim 2, which is characterized in that
The second direction length ratio of the first direction length in the first antenna portion and second antenna part is 1：1.2 to 1：
Between 1.8.
4. plasma processing apparatus according to claim 2, which is characterized in that
Described two of the distance between described two different virtual planes in the first antenna portion than second antenna part
The distance between a different virtual plane is long.
5. plasma processing apparatus according to claim 2, which is characterized in that
The number of turns of the antenna conductor of second antenna part described in the turn ratio of the antenna conductor in the first antenna portion is more.
6. plasma processing apparatus according to claim 5, which is characterized in that
The distance between described two different virtual planes in the first antenna portion and described the two of second antenna part
The distance between a different virtual plane is equal.
7. plasma processing apparatus according to claim 2, which is characterized in that
The antenna conductor in the first antenna portion is launched into the day of the entire length and second antenna part after straight line
It is equal that line conducting wire is launched into the entire length after straight line.
8. plasma processing apparatus according to claim 2, which is characterized in that
The first antenna portion is configured in a manner of forming the short side of virtual rectangle, and second antenna part is to form the void
The mode of the long side of quasi- rectangle configures.
9. plasma processing apparatus according to claim 8, which is characterized in that
The antenna part also includes third antenna portion of the configuration in the corner of the virtual rectangle.
10. plasma processing apparatus according to claim 9, which is characterized in that
The third antenna portion, the antenna being located in plane neighbouring with the window in described two different virtual planes
A part in conducting wire is parallel with the first direction, and another part is parallel with the second direction.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020160152590A KR101866212B1 (en) | 2016-11-16 | 2016-11-16 | Plasma processing apparatus |
| KR10-2016-0152590 | 2016-11-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207638963U true CN207638963U (en) | 2018-07-20 |
Family
ID=62299393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721533870.0U Expired - Fee Related CN207638963U (en) | 2016-11-16 | 2017-11-16 | Plasma processing apparatus |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR101866212B1 (en) |
| CN (1) | CN207638963U (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6237526B1 (en) * | 1999-03-26 | 2001-05-29 | Tokyo Electron Limited | Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
| JP5597071B2 (en) * | 2010-09-06 | 2014-10-01 | 東京エレクトロン株式会社 | Antenna unit and inductively coupled plasma processing apparatus |
| JP5666991B2 (en) * | 2011-06-08 | 2015-02-12 | 東京エレクトロン株式会社 | Inductively coupled plasma antenna unit and inductively coupled plasma processing apparatus |
| US9282624B2 (en) * | 2011-09-16 | 2016-03-08 | Semes Co., Ltd. | Antenna structure and plasma generating device |
| JP6010305B2 (en) * | 2012-02-07 | 2016-10-19 | 東京エレクトロン株式会社 | Inductively coupled plasma antenna unit, inductively coupled plasma processing apparatus, and inductively coupled plasma processing method |
| KR101640092B1 (en) | 2014-07-25 | 2016-07-18 | 인베니아 주식회사 | A plasma generating module and plasma process apparatus comprising the same |
-
2016
- 2016-11-16 KR KR1020160152590A patent/KR101866212B1/en active IP Right Grant
-
2017
- 2017-11-16 CN CN201721533870.0U patent/CN207638963U/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR101866212B1 (en) | 2018-06-12 |
| KR20180055145A (en) | 2018-05-25 |
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