CN207542192U - For generating the antenna structure of plasma - Google Patents
For generating the antenna structure of plasma Download PDFInfo
- Publication number
- CN207542192U CN207542192U CN201721455007.8U CN201721455007U CN207542192U CN 207542192 U CN207542192 U CN 207542192U CN 201721455007 U CN201721455007 U CN 201721455007U CN 207542192 U CN207542192 U CN 207542192U
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- outer side
- side edges
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/12—Supports; Mounting means
- H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
- H01Q1/26—Supports; Mounting means by structural association with other equipment or articles with electric discharge tube
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
The utility model for generate plasma antenna structure include comprising in the first plane and be formed as central portion formed warpage,So that one end is parallel with first direction,And the first corner antenna conductor that the other end is parallel with second direction,The the second corner antenna conductor extended to form from the one end of the first corner antenna conductor to the second plane,Extend from the second corner antenna conductor and be located in the second plane and be formed as central portion and form warpage,So that one end is parallel with first direction,And the third corner antenna conductor that the other end is parallel with second direction,Fourth angle portion antenna conductor from the other end of third corner antenna conductor to the first plane that extended to form from and extend from fourth angle portion antenna conductor and be located in the first plane with the state being separated by with the first corner antenna conductor and be formed as central portion formation warpage,So that one end is parallel with first direction,And the corner antenna part of the other end fiveth corner antenna conductor parallel with second direction.
Description
Technical field
The utility model is related to a kind of for generating the antenna structure of plasma, plasma and right is particularly generated
Display panel when substrate implement processing when it is used for generating the antenna structure of plasma.
Background technology
In plasma is used to implement the device of the processing such as CVD, etching to substrate, used more to comprising antenna
Device apply RF power, so as to form induction field around antenna and generate the mode of plasma.
On the other hand, with the enlargement of the substrate of processing, processing unit also gradually maximizes, for the base to enlargement
Plate implements uniform processing, becomes universal gradually using the substrate board treatment with mutiple antennas.
In the case of with mutiple antennas, due to the impedance of antenna is unbalanced or processing unit in environmental problem, can
The RF power for being applied to each antenna can be caused different, so that plasma unevenly generates in each region, i.e.,
Make the RF power for being applied to each antenna almost the same, also due to environmental problem in processing unit etc., and cause etc. from
Daughter unevenly generates or causes the processing to substrate uneven.
Utility model content
Technical problem to be solved
The purpose of the utility model is to provide it is a kind of can generate more uniform plasma for generate etc. from
The antenna structure of daughter.
The purpose of this utility model is not limited to the above-mentioned purpose referred to, and those skilled in the art can be bright by following record
Really understand the other purposes not referred to.
Solve the scheme of technical problem
In order to solve the above technical problems, the antenna structure for being used to generate plasma in the embodiment of the utility model
Including corner antenna part, the corner antenna part includes:First corner antenna conductor in the first plane and is formed as central
Portion forms warpage, so that one end is parallel with first direction, and the other end is parallel with second direction;Second corner antenna is led
Line is extended to form from the one end of first corner antenna conductor to the second plane;Third corner antenna conductor, from described
Two corner antenna conductors extensions and in second plane and be formed as central portion and form warpage so that one end with it is described
First direction is parallel, and the other end is parallel with the second direction;Fourth angle portion antenna conductor, from the third corner antenna
The other end of conducting wire is extended to form to first plane;5th corner antenna conductor, from fourth angle portion antenna conductor
Extend and be located in first plane with the state being separated by with first corner antenna conductor and be formed as central portion and formed
Warpage, so that one end is parallel with the first direction, and the other end is parallel with the second direction.
The third corner antenna conductor can the 5th corner antenna conductor top warpage formed.
The one end of the third corner antenna conductor can be formed as the one end than first corner antenna conductor
It is long.
The one end of first corner antenna conductor can be Chong Die with the one end of the third corner antenna conductor.
It the other end of the third corner antenna conductor can be with the other end with first corner antenna conductor
Same length is formed.
It the other end of the third corner antenna conductor can be with the other end of the 5th corner antenna conductor weight
It is folded.
The outer side edges antenna part with the first direction or the second direction configured in parallel, the outside can also be included
Continuous vertically warpage is formed between the plane that side antenna part is mutually parallel by outer side edges antenna conductor at two.
The both sides of the outer side edges antenna part can be each configured with the corner antenna part.
The outer side edges antenna part can include with the first outer side edges antenna part of the first direction configured in parallel and with
Second outer side edges antenna part of the second direction configured in parallel, the first direction length of the first outer side edges antenna part can be with
It is shorter than the second direction length of the second outer side edges antenna part.
It can include and the first outer side edges antenna part of the first direction configured in parallel and parallel with the second direction
Second outer side edges antenna part of configuration, the number of turn of the first outer side edges antenna part can be than the second outer side edges antenna part
The number of turn is more.
Other details of the utility model are included in detailed description and attached drawing.
Advantageous effect
Embodiment according to the present utility model, at least with following effects.
More uniform plasma can be generated.
The effect of the utility model is not limited to the above-mentioned content referred to, and this specification will include other technology effects with a greater variety
Fruit.
Description of the drawings
Fig. 1 is the synoptic diagram of the plasma processing apparatus of the one embodiment for representing the utility model.
Fig. 2 is to represent that the first embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.
Fig. 3 is the stereogram of the outer side edges antenna part for the antenna structure for representing Fig. 2.
Fig. 4 is the stereogram of the corner antenna part for the antenna structure for representing Fig. 2.
Fig. 5 is to represent to be used for the figure for generating the electric current flowing of the effective coverage of plasma in the antenna structure of Fig. 2.
Fig. 6 is the summary of the power supply structure of the plasma processing apparatus of the one embodiment for representing the utility model
Figure.
Fig. 7 is to represent that the second embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.
Fig. 8 is to represent that the 3rd embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.
Fig. 9 is to represent that the fourth embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.
【Reference numeral】
1:Inductive couple plasma processing device 10:Chamber
20:Base support component 30:Pedestal
50:Window 61,71:Supply lines
62、72:High frequency electric source 63,73:Adaptation
100、200、300:Antenna structure 110:Central antenna portion
110a:Central power input terminal 110b:Central power output terminal
111、112、113、114:Central antenna conducting wire
120、220:Intermediate antenna portion
121、122、123、124:Intermediate antenna conducting wire
121a、122a、123a、124a:Intervening power input terminal
121b、122b、123b、124b:Intervening power output terminal
130、330、430:Outer side edges antenna part
130a、331f:Outer side edges power input end
130b、331g:Outer side edges power output end
150:Corner antenna part
150a:Corner power input end 150b:Corner power output end
151:First corner antenna conductor 152:Second corner antenna conductor
153:Third corner antenna conductor 154:Fourth angle portion antenna conductor
155:5th corner antenna conductor 156:Hexagonal portion antenna conductor
157:Heptangle portion antenna conductor 158:Illiciumverum portion antenna conductor
159:9th corner antenna conductor 221:Intermediate antenna section
331、332、333:Outer side edges antenna segment
C1、C2、C3、C4:Variable condenser
D1:First direction D2:Second direction
L1:First direction length L2:Second direction length
P1:First plane P2:Second plane
T1、T2、T3、T4:Delivery outlet
Specific embodiment
The embodiment described with reference to attached drawing and in detailed below, the advantages of more clearly understanding the utility model and feature are simultaneously
Reach these method.But the utility model is not limited to embodiments disclosed below, but other can be made to it
Various deformation, below multiple embodiments be intended to completely disclose the utility model, provided completely for those skilled in the art
Utility model scope, the scope of the utility model is only defined by the claims.Same reference marks refers in specification full text
Determine same inscape.
In addition, the embodiment that is described of this specification can with reference to the exemplary plot as the utility model sectional view and/or
Synoptic diagram illustrates.Therefore, the form of exemplary plot can be deformed according to manufacturing technology and/or allowable error.In addition, it is
Convenient for illustrating each element, how much the utility model illustrated attached drawing has situation about expanding or shrinking.It is complete in specification
Same reference marks specifies same inscape in text.
Hereinafter, by with reference to the plasma processing apparatus for illustrating the embodiment of the utility model and for the device
The attached drawing for being used to generate the antenna structure of plasma of multiple embodiments, illustrates the utility model.
Fig. 1 is the synoptic diagram of the plasma processing apparatus of the one embodiment for representing the utility model.
The plasma processing apparatus 1 of one embodiment of the utility model is by being used to 10 inside supply step of chamber
Gas generates plasma, to being located at the device that treatment process is carried out by processing substrate S inside chamber 10.
As shown in Figure 1, the plasma processing apparatus 1 of one embodiment of the utility model include chamber 10, pedestal 30,
Window 50 and antenna structure 100.
The inside of chamber 10 is formed as being formed with the close of the space that can set pedestal 30, window 50 and antenna structure 100
Seal structure.Chamber 10 can be made of the aluminium that inner wall was anodized.
As shown in Figure 1, pedestal 30 is located at the lower part inside chamber 10.Pedestal 30 is configured to bearing and is moved to inside chamber 10
Substrate S, be electrically connected by supply lines 61 with biasing high frequency electric source 62, the ion in plasma introduced into substrate S.Partially
Pedestal 30 can be applied with high frequency electric source 62 RF power of 6MHz by putting.
It can be with configurations match device 63 between biasing high frequency electric source 62 and pedestal 30.Adaptation 63 can be with by supply lines 61
In biasing with carrying out impedance matching between high frequency electric source 62 and pedestal 30.
The temperature control device of having heaters and/or refrigerant flow path etc. can be set in pedestal 30, to control process
In substrate S temperature.
Pedestal 30 can be supported by base support component 20, and base support component 20 can be in the airtight shape for maintaining chamber 10
The bottom surfaces of chamber 10 are penetrated through under state, and are extended to the external of chamber 10.Base support component 20 can be by being configured in chamber
Elevating mechanism outside 10, in 10 inside lifting pedestal 30 of chamber.
In order to which even if pedestal 30 lifts, the airtight conditions being also able to maintain that inside chamber 10 simultaneously prevent foreign to be flowed into
Inside chamber 10, bellows can be configured in a manner of base support component 20 to surround between the bottom surfaces of pedestal 30 and chamber 10
40。
On the other hand, the top setting fenestrate 50 inside chamber 10.Window 50 can be by the upper space zoning in chamber 10
Into the antenna installation space and the processing space of generation plasma for being provided with antenna structure 100.So as to which window 50 is both antenna
The bottom of installation space, while be also the top of processing space.
Window 50 can be made of dielectrics such as ceramics, quartz or is made of the electric conductor of such as aluminum or aluminum alloy.
The top of window 50 is provided with antenna structure 100.
Antenna structure 100 obtains the supply of RF power by supply lines 71 from high frequency electric source 72.High frequency electric source 72 can
To supply the RF power of 13.56MHz to antenna structure.
It is configured with adaptation 73 between antenna structure 100 and high frequency electric source 72, adaptation 73 can be with by supply lines 71
Impedance matching is carried out between high frequency electric source 72 and antenna structure 100.
When the RF power supplied by high frequency electric source 72 is applied to antenna structure 100, by window 50 in processing space
Interior generation induction field is supplied to the processing gas of processing space by induction field by plasma, so as in process chamber
Generate plasma.
The processing gas that will be externally supplied can be provided with although not showing in Fig. 1, in chamber 10 to be transmitted to
The gas flow path and spray head of processing space.In addition, the side wall of chamber 10 could be formed with the carrying-in/carrying-out for substrate S
Mouthful.
Hereinafter, antenna structure is specifically described.
Fig. 2 is to represent that the first embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.
As shown in Fig. 2, the first embodiment of the utility model includes for generating the antenna structure 100 of plasma
Central antenna portion 110, intermediate antenna portion 120, outer side edges antenna part 130 and corner antenna part 150.
Central antenna portion 110 is located at the center of antenna structure 100, and intermediate antenna portion 120 is to surround central antenna portion 110
The centrally located antenna part 110 of mode outside, outer side edges antenna part 130 and corner antenna part 150 are to surround intermediate antenna portion
120 mode is located at the outside in intermediate antenna portion 120.
Central antenna portion 110 includes the multiple central antenna conducting wires extended in the shape of a spiral from central power input end 110a
111、112、113、114.It is configured to Fig. 2 shows multiple central antenna conducting wires 111,112,113,114 defeated from central power
Enter to hold the spiral-shaped example that 110a is rotated in a clockwise direction.
It is formed twice as shown in Fig. 2, each central antenna conducting wire 111,112,113,114 can have vertically to be bent
Three sides surrounded shape, and be configured to be separated by 90 degree centered on central power input terminal 110a respectively.
Because the present embodiment is illustrated that the example using four central antenna conducting wires 111,112,113,114, so in each
Centre antenna conductor 111,112,113,114 is configured to be separated by 90 degree, but with central antenna conducting wire 111,112,113,114
Quantity variation, the configuration space between each central antenna conducting wire 111,112,113,114 can also change therewith.
The end of each central antenna conducting wire 111,112,113,114 be formed with central power output terminal 110b, 110c,
110d, 110e, by central power input terminal 110a supply electric power can along each central antenna conducting wire 111,112,113,
114 flow through.
On the other hand, intermediate antenna portion 120 includes the four intermediate antenna conducting wires 121,122,123,124 being separated from each other.
As shown in Fig. 2, each intermediate antenna conducting wire 121,122,123,124 have vertically be bent form twice it is three sides surrounded
Shape, and it is Chong Die with other two intermediate antenna conducting wire 121,122,123,124 to be configured to part of it, so that central antenna
Portion 110 is surrounded by intermediate antenna portion 120.
One end of each intermediate antenna conducting wire 121,122,123,124 be formed with intervening power input terminal 121a, 122a,
123a, 124a, the other end are formed with intervening power output terminal 121b, 122b, 123b, 124b.So as to defeated by each intervening power
Entering to hold the electric power that 121a, 122a, 123a, 124a are supplied can flow through along each intermediate antenna conducting wire 121,122,123,124.
As shown in Fig. 2, intervening power input terminal 121a, 122a, 123a, 124a and intervening power output terminal 121b, 122b,
123b, 124b are formed as flowing through the flowing of the electric current of each intermediate antenna conducting wire 121,122,123,124 integrally in side clockwise
To.
On the other hand, as shown in Fig. 2, four outer side edges antenna parts 130 and four corners antenna part 150 are to be integrally formed four
The mode of angular frame is configured, to surround intermediate antenna portion 120.
D1 or second direction D2 is arranged in parallel and with each side of the tetragonal frame of formation along the first direction for outer side edges antenna part 130
Mode be configured, corner antenna part 150 is configured in a manner of forming the corner of tetragonal frame.So as to each outer side edges antenna
The both sides in portion 130 are each configured with corner antenna part 150.
When being rectangle by processing substrate S, four outer side edges antenna parts 130 and four corners antenna part 150 is whole can be with
Form the frame of rectangle.For this purpose, two outer side edges antenna parts and other two outer side edges antenna in four outer side edges antenna parts 130
Portion can be formed with mutually different length.
It is referred to as the first outside in four outer side edges antenna parts 130 with the outer side edges antenna part of first direction D1 configured in parallel
Side antenna part is referred to as the second outer side edges antenna part with the outer side edges antenna part of second direction D2 configured in parallel, as shown in Fig. 2,
The first direction length L1 of first outer side edges antenna part can be formed as the second direction length L2 than the second outer side edges antenna part
It is short.
In this case, the second party of the first direction length L1 of the first outer side edges antenna part and the second outer side edges antenna part
It can be 1 to the ratio of length L2:1.2 to 1:Between 1.8.
The first direction length L1 of the first outer side edges antenna part is made to be configured to the second direction than the second outer side edges antenna part
Length L2 is short so that the outline shape of antenna structure 100 becomes rectangle, so as to make the plasma generated by antenna structure 100
The distribution of body is formed to correspond to the shape of rectangular substrate S.
Fig. 3 is the stereogram of the outer side edges antenna part for the antenna structure for representing Fig. 2.
As shown in figure 3, outer side edges antenna part 130 by outer side edges antenna conductor along with being parallel to first direction D1 and second party
Vertical radially winding spiral of imaginary plane P 1, P2 to D2 and formed.
More particularly, outer side edges antenna conductor between virtual the first plane P1 and the second plane P2 it is continuous vertically
It is bent to form outer side edges antenna part 130.
Fig. 3 shows the outer side edges antenna part 130 formed by two circle of outer side edges antenna conductor winding.As shown in figure 3, outside
Side antenna conductor winds two circles between the first plane P1 and the second plane P2, so that one end and the other end are located at the first plane
P1。
So as to as shown in figure 3, outer side edges antenna conductor includes three days being located on the first plane P1 of opposing lower portions
Line conducting wire 131a, 131b, 131c and positioned at two antenna conductors 132a, 132b on the second plane P2 of opposite upper parts.And
And comprising perpendicular to the first plane P1 and the second plane P2 and three conducting wires 131a, 131b, 131c of connection and two conducting wires
Four antenna conductors 133a, 133b, 133c, 133d of 132a, 132b.
Three antenna conductors 131a, 131b, 131c on the first plane P1 are formed as linear in being mutually parallel.
Although two antenna conductors 132a, 132b on the second plane P2 are similarly formed as, in being mutually parallel linear, but may be used
With in the position with three antenna conductor 131a, 131b, 131c obliques on the first plane P1.
In fig. 2, three antenna conductors 131a, 131b, 131c on the first plane P1 are indicated by the solid line, positioned at
Two antenna conductors 132a, 132b on two plane P2 are represented by dashed line.
As shown in Fig. 2, one end of outer side edges antenna conductor is formed with outer side edges power input end 130a, the other end is formed with
Outer side edges power output end 130b.A part in the RF power supplied by high frequency electric source 72 passes through outer side edges power input end
130a is flowed out after being applied to outer side edges antenna conductor by outer side edges power output end 130b.
In the present embodiment, by by two circle of outer side edges antenna conductor winding and for the outer side edges antenna part 130 that is formed into
Explanation is gone, but the windings of outer side edges antenna conductor can be changed according to embodiment.For example, when outer side edges antenna
When the circle of Wire-wound one forms outer side edges antenna part 130, the conducting wire on the first plane P1 can be two, flat positioned at second
Conducting wire on the P2 of face can be one.Alternatively, when the windings of outer side edges antenna conductor are more than two circles, positioned at the first plane
Antenna conductor on P1 can be three or more, and the antenna conductor on the second plane P2 can be two or more.
On the other hand, Fig. 4 is the stereogram of the corner antenna part for the antenna structure for representing Fig. 2.
Corner antenna part 150 is to be parallel to virtual the of first direction D1 and second direction D2 by corner antenna conductor
Integral L-shaped helical form is continuously perpendicularly bent toward between one plane P1 and the second plane P2 to form.
Fig. 4 shows that one end in order to make corner antenna conductor and the other end are located at the first plane P1, and in the first plane
The corner antenna part 150 that winding two is enclosed and formed between P1 and the second plane P2.
So as to as shown in figure 4, corner antenna part 150 includes three days being located on the first plane P1 of opposing lower portions
It line conducting wire 151a, 151b, 155a, 155b, 159a, 159b and is led positioned at two antennas on the second plane P2 of opposite upper parts
Line 153a, 153b, 157a, 157b.Also, comprising perpendicular to three antenna conductors of the first plane P1 and the second plane P2 and connection
Four antenna conductors of 151a, 151b, 155a, 155b, 159a, 159b and two antenna conductors 153a, 153b, 157a, 157b
152、154、156、158。
Three antenna conductors 151a, 151b, 155a, 155b, 159a, 159b on the first plane P1 are the first corners
Antenna conductor 151 (151a, 151b), the 5th corner antenna conductor 155 (155a, 155b) and the 9th corner antenna conductor 159
(159a、159b)。
In addition, two antenna conductors 153a, 153b, 157a, 157b on the second plane P2 are third corner antennas
Conducting wire 153 (153a, 153b) and heptangle portion antenna conductor 157 (157a, 157b).
In fig. 2, the first corner antenna conductor 151 on the first plane P1, the 5th corner antenna conductor 155 and
Nine corner antenna conductors 159 are indicated by the solid line, third corner antenna conductor 153 and heptangle portion day on the second plane P2
Line conducting wire 157 is represented by dashed line.
First corner antenna conductor 151 is formed as central portion and forms warpage, so that one end 151a and first direction D1 is put down
Row, and the other end 151b is parallel with second direction D2.
Also, the second corner antenna conductor 152 is formed as from the one end 151a of the first corner antenna conductor 151 to second
Plane D2 extends and is connect with the one end 153a of third corner antenna conductor 153.
Third corner antenna conductor 153 is formed as central portion and forms warpage, so that one end 153a and first direction D1 is put down
Row, and the other end 153b is parallel with second direction D2.As shown in Figures 2 and 4, the one end of third corner antenna conductor 153
153a is formed as the one end 151a long than the first corner antenna conductor 151, so that third corner antenna conductor 153 is at the 5th jiao
Formed to the top warpage of portion's antenna conductor 155.The one end 151a of first corner antenna conductor 151 is led with third corner antenna
The one end 153a of line 153 is overlapped with parallel state.
Also, the other end 153b of third corner antenna conductor 153 is with the other end with the first corner antenna conductor 151
Length roughly the same portion 151b is formed, and with the other end 155b of the 5th corner antenna conductor 155 with parallel state weight
It is folded.
Fourth angle portion antenna conductor 154 is formed as flat to first from the other end 153b of third corner antenna conductor 153
Face D1 extends and is connect with the other end 155b of the 5th corner antenna conductor 155.
As shown in Figures 2 and 4, mode bit of the 5th corner antenna conductor 155 to be separated by with the first corner antenna conductor 151
In on the first plane D1.5th corner antenna conductor 155 is formed as central portion and forms warpage, so that one end 155a and first party
It is parallel to D1, and the other end 155b is parallel with second direction D2.
As shown in Figures 2 and 4, the one end 155a of the 5th corner antenna conductor 155 is formed as leading than the first corner antenna
The one end 151a long of line 151, the other end 155b of the 5th corner antenna conductor 155 are formed as than the first corner antenna conductor
151 the other end 151b long.The one end 155a of 5th corner antenna conductor 155 can with third corner antenna part 153
The roughly the same length of one end 153a formed, the other end 155b of the 5th corner antenna conductor 155 with heptangle portion
The length that the other end 157b of antenna conductor 157 is roughly the same is formed.
Hexagonal portion antenna conductor 156 is formed as from the one end 155a of the 5th corner antenna conductor 155 to the second plane
D2 extends and is connect with the one end 157a of heptangle portion antenna conductor 157.
Heptangle portion antenna conductor 157 is located at the state being separated by with third corner antenna conductor 153 on the second plane D2.
Heptangle portion antenna conductor 157 is formed as central portion and forms warpage, so that one end 157a parallel with first direction D1, and it is another
End 157b is parallel with second direction D2.
As shown in Figures 2 and 4, the one end 157a of heptangle portion antenna conductor 157 is formed as leading than the 5th corner antenna
The one end 155a long of line 155, so that top warpage of the heptangle portion antenna conductor 157 in the 9th corner antenna conductor 159
It is formed.The one end 155a and the one end 157a of heptangle portion antenna conductor 157 of 5th corner antenna conductor 155 are with parallel
State is overlapped.
Also, the other end 157b of heptangle portion antenna conductor 157 is with the other end with the 5th corner antenna conductor 155
Length roughly the same portion 155b is formed, and with the other end 159b of the 9th corner antenna conductor 159 with parallel state weight
It is folded.
Illiciumverum portion antenna conductor 158 is formed as flat to first from the other end 157b of heptangle portion antenna conductor 157
Face D1 extends and is connect with the other end 159b of the 9th corner antenna conductor 159.
As shown in Figures 2 and 4, mode bit of the 9th corner antenna conductor 159 to be separated by with the 5th corner antenna conductor 155
In on the first plane D1.9th corner antenna conductor 159 is formed as central portion and forms warpage, so that one end 159a and first party
It is parallel to D1, and the other end 159b is parallel with second direction D2.
As shown in Figures 2 and 4, the one end 159a of the 9th corner antenna conductor 159 is formed as leading than the 5th corner antenna
The one end 155a long of line 155, the other end 159b of the 9th corner antenna conductor 159 are formed as than the 5th corner antenna conductor
155 the other end 155b long.The one end 159a of 9th corner antenna conductor 159 with heptangle portion antenna conductor 157
Length roughly the same one end 157a is formed.
The present embodiment is illustrated in case of first direction D1 and second direction D2 is mutually orthogonal, but basis
The obtuse angle more than 90 degree can be formed between embodiment first direction D1 and second direction D2.
As shown in Fig. 2, the other end of the first corner antenna conductor 151 is formed with corner power input end 150a, the 9th jiao
One end of portion's antenna conductor 159 is formed with corner power output end 150b.One in the RF power supplied by high frequency electric source 72
Part is applied to 150 rear overhang angle portion power output end 150b of corner antenna part outflows by corner power input end 150a.
In the present embodiment, it is carried out by taking the corner antenna part 150 formed by two circle of corner antenna conductor winding as an example
Illustrate, but the windings of corner antenna conductor can be changed according to embodiment.For example, when corner antenna conductor is wound
When one circle forms corner antenna part 150, the conducting wire on the first plane P1 can be two, leading on the second plane P2
Line can be one.Alternatively, when the windings of corner antenna conductor are more than two circles, the conducting wire on the first plane P1 can
Think three or more, the conducting wire on the second plane P2 can be two or more.
Fig. 5 is to represent to be used for the figure for generating the electric current flowing of the effective coverage of plasma in the antenna structure of Fig. 2.
For generate plasma it is antenna conductor positioned at the first plane P1 in antenna structure 100.Therefore, it uses
In the effective coverage of generation plasma be the lower part of antenna structure 100, i.e. the area with the first plane P1 in the same plane
Domain.
As shown in figure 5, the electric current flowing of outer side edges antenna part 130 and corner antenna part 150 is in integrally in effective coverage
Clockwise.Also, the electric current flowing in central antenna portion 110 and intermediate antenna portion 120 is equally integrally in clockwise.
So as to, flowed along clockwise direction because the electric current that is flowed through in effective coverage along antenna conductor is whole, so wait from
Daughter integrally can be generated equably (when there are during the part that electric current is in reverse flow, the induction field of corresponding portion mutually supports
Disappear, therefore will appear and to form the problem of hardly generating plasma or generating the region of low density plasmas).
Fig. 6 is the summary of the power supply structure of the plasma processing apparatus of the one embodiment for representing the utility model
Figure.
In the plasma processing apparatus 1 of the present embodiment, to the supply lines 71 of 100 supply high frequency electric power of antenna structure
After adaptation 73, it is branched off into each antenna part 110,120,130,150.
As shown in fig. 6, supply lines 71 is branched to be connected to the first supply lines of outer side edges antenna part 130, is connected to angle
Second supply lines of portion's antenna part 150, the third supply lines for being connected to central antenna portion 110 and it is connected to intermediate antenna portion 120
The 4th supply lines.
In addition, variable condenser C1, C2, C3, C4 and output are connected on each supply lines about the electricity for flowing to each supply lines
Delivery outlet T1, T2, T3, T4 of the information of power.
User can adjust the capacitance of variable condenser C1, C2, C3, C4, and outer side edges day is supplied to be independently adjusted
Line portion 130, corner antenna part 150, central antenna portion 110, intermediate antenna portion 120 electric power.
Furthermore it is possible to outer side edges antenna part 130, corner antenna part 150, central antenna portion 110 will be supplied to due to adjusting
And any one of intermediate antenna portion 120 antenna part electric power and the influence of the electric power to being supplied to other antenna parts that generates
It is preferably minimized.
Furthermore it is possible to it is supplied to each antenna part using the delivery outlet for being connected to each supply lines T1, T2, T3, T4 real-time confirmation
Electric power state.Can be voltage, electric current, frequency by each delivery outlet T1, T2, T3, T4 information about electric power exported
Deng.
It can be by additional display device (not shown) with picture by each delivery outlet T1, T2, T3, T4 information exported
Information exports, and user can be with real-time confirmation about being supplied to outer side edges antenna part 130, corner antenna part 150, central antenna portion
110 and intermediate antenna portion 120 electric power information, and the electricity of variable condenser C1, C2, C3, C4 can be adjusted as needed
Hold to adjust the density of plasma generated in the field corresponding to each antenna part.
The other embodiment of the utility model will be illustrated for generating the antenna structure of plasma below.
For convenience of description, the part similar to first embodiment has used same symbol, and is omitted and pair is total to first embodiment
The explanation of logical part.
Fig. 7 is to represent that the second embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.
As shown in fig. 7, the antenna structure of the antenna structure 200 of the second embodiment of the utility model and first embodiment
Body 100 is compared, and the shape of in-between antenna part 220 is had any different.
In antenna structure 100 in aforementioned first embodiment, intermediate antenna portion 120 is by having vertically
The four of the three sides surrounded shape intermediate antenna conducting wires 121,122,123,124 formed twice are bent to form.
But the antenna structure 400 in the fourth embodiment of the utility model, in-between antenna part 220 and outer side edges
Antenna part 130 similarly, be by antenna conductor in the first virtual plane for being parallel to first direction D1 and second direction D2 and
The intermediate antenna section that the helical form with the radial direction vertical with each plane is continuously perpendicularly bent toward between second plane and is formed
221 are formed.
One circle of antenna conductor winding of intermediate antenna section 221 is formed, and includes two conducting wires in the first plane
221a, 221b, a conducting wire 221c in the second plane and connection are located at two conducting wires 221a, 221b in the first plane
With two conducting wires (not shown) of a conducting wire 221c in the second plane.
In the figure 7, two conducting wires 221a, 221b in the first plane are indicated by the solid line, in the second plane
A piece conducting wire 221c is represented by dashed line.
The one end and the other end for forming the antenna conductor of intermediate antenna section 221 is located in the first plane, during one end is formed with
Between power input end 221d, the other end is formed with intervening power output terminal 221e.In the RF power supplied by high frequency electric source 72
A part be applied to after intermediate antenna section 221 by intervening power input terminal 221d and flowed by intervening power output terminal 221e
Go out.
Preferably, intermediate antenna section 221 be configured to flow through intermediate antenna conducting wire 221a in the first plane,
The electric current of 221b is integrally in clockwise.
Fig. 8 is to represent that the 3rd embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.Although Fig. 8 is not shown, the central antenna portion 110 of the antenna structure 100 in first embodiment and intermediate antenna portion
120th, the central antenna portion 110 of the antenna structure 200 in second embodiment and intermediate antenna portion 220 are readily applicable to this reality
With the antenna structure 300 in novel 3rd embodiment.
As shown in figure 8, the antenna structure of the antenna structure 300 of the 3rd embodiment of the utility model and first embodiment
Body 100 is compared, and outer side edges antenna part 330 is had any different.
As shown in figure 8, outer side edges antenna part 330 includes the multiple outer side edges antenna segments 331,332,333 to form a line.
Multiple outer side edges antenna segments 331,332,333 have the outer side edges with the antenna structure 100 in first embodiment
The similar shape of antenna part 130.
Each outer side edges antenna segment 331,332,333 is substantially the same, as shown in figure 8, each outer side edges antenna segment 331,332,
333 comprising three conducting wires 331a, 331b, 331c on the first plane P1 being located at and positioned at the second plane P2 in opposite upper parts
On two conducting wires 331d, 331e.Also, comprising perpendicular to three conducting wires of the first plane P1 and the second plane P2 and connection
Four conducting wires (not shown) of 331a, 331b, 331c and two conducting wires 331d, 331e.
In fig. 8, three conducting wires 331a, 331b, 331c on the first plane P1 are indicated by the solid line, flat positioned at second
Two conducting wires 331d, 331e on the P2 of face are represented by dashed line.
In addition, one end of each outer side edges antenna segment 331,332,333 is formed with outer side edges power input end 331f, the other end
It is formed with outer side edges power output end 331g.A part in the RF power supplied by high frequency electric source 72 passes through outer side edges electric power
Input terminal 331f is flowed out after being applied to each outer side edges antenna segment 331,332,333 by outer side edges power output end 331g.
Antenna structure 300 in the present embodiment can be used for handling the plasma processing apparatus of large substrate.With
The size of substrate becomes larger, and the size of antenna should also become larger therewith, but outer due to the antenna structure 100 in first embodiment
Antenna part 130 each one antenna conductor of freedom in side is formed, thus when suitable for large substrate, fragile structure, manufacture difficulty
Raising, and exist positioned at the second plane antenna conductor sink due to own wt and with the antenna conductor weight positioned at the first plane
The possibility of conjunction.
Therefore, it is preferably constituted in the plasma processing apparatus of processing large substrate such as the day knot in the present embodiment
Structure body 300, i.e. outer side edges antenna part 330 are respectively divided into mutiple antennas section 331~333.
Fig. 9 is to represent that the fourth embodiment of the utility model is put down for the summary of antenna structure that generates plasma
Face figure.
As shown in figure 9, the fourth embodiment of the utility model for generating the antenna structure 400 of plasma its shape
Into the first outer side edges antenna part 430 of short side and the first outer side edges antenna with first direction D1 configured in parallel of first embodiment
Portion's different from.
Antenna structure 100 in first embodiment is formed by two circle of antenna conductor winding of outer side edges antenna part 130,
And the antenna structure 400 in fourth embodiment is different, is formed as being formed the first outer side edges antenna part 430 of short side
The number of turn that the turn ratio of antenna conductor forms the antenna conductor of the second outer side edges antenna part 130 of long side is more.
As shown in figure 9, the first outer side edges antenna part 430 can be wound three circles by antenna conductor and be formed.
The situation of first outer side edges antenna part 430 and aforementioned first embodiment similarly, antenna conductor is being parallel to
It continuously perpendicularly bends toward and is formed between virtual the first plane P1 and the second plane P2 of first direction D1 and second direction D2
First outer side edges antenna part 430.
Only, since the first outer side edges antenna part 430 is formed by three circle of antenna conductor winding, there are four conducting wires
431a, 431b, 431c, 431d are located on the first plane P1, have three conducting wires 432a, 432b, 432c to be located on the second plane P2.
Preferably, day of the antenna conductor of the first outer side edges antenna part 430 with forming the second outer side edges antenna part 130 is formed
Line conducting wire has same impedance.Therefore, when two antenna conductors have same sectional area, preferably two antenna conductors
Entire length is equal.When the entire length of each antenna conductor refers to each antenna conductor state in alignment is unfolded, from one
Hold the length of the other end.
Antenna structure 400 in the present embodiment forms short side by the first outer side edges antenna part 430, by the second outer side edges day
Line portion 130 forms long side.But the number of turn for forming the first outer side edges antenna part 430 of short side be formed as than form long side the
The number of turn of two outer side edges antenna parts 130 is more, even if to form the entire length phase of the antenna conductor of each antenna part 130,430
Deng the first outer side edges antenna part 430 can still form short side, and the second outer side edges antenna part 130 can still form long side.
Possess the common sense of the utility model technical field it is to be understood by the skilled artisans that the utility model can be not
Under the premise of changing its technical thought and Essential features, implement in the form of other are specific.It is therefore to be understood that describe above
Embodiment is all exemplary in all aspects, and non-limiting.The scope of the utility model will be wanted in following rights
It asks and is emerged from book rather than above-mentioned specification, and by the meaning in claim and range and from impartial general therewith
The form for having altered or deforming obtained is read, all should be interpreted that the scope for belonging to the utility model.
Claims (10)
1. it is a kind of for generating the antenna structure of plasma, it is described to be applied in for generating the antenna structure of plasma
RF power simultaneously generates plasma in process chamber, which is characterized in that including corner antenna part,
The corner antenna part includes:
First corner antenna conductor in the first plane and is formed as central portion formation warpage, down to one end and first party
To parallel, and the other end is parallel with second direction;
Second corner antenna conductor is extended to form from the one end of first corner antenna conductor to the second plane;
Third corner antenna conductor extends from second corner antenna conductor and in second plane and in being formed as
Centre portion forms warpage, so that one end is parallel with the first direction, and the other end is parallel with the second direction;
Fourth angle portion antenna conductor is extended to form from the other end of the third corner antenna conductor to first plane;
And
5th corner antenna conductor extends from fourth angle portion antenna conductor and to be separated by with first corner antenna conductor
State be located in first plane and be formed as central portion and form warpage so that one end is parallel with the first direction,
And the other end is parallel with the second direction.
2. the antenna structure according to claim 1 for being used to generate plasma, which is characterized in that the third corner
Antenna conductor the 5th corner antenna conductor top warpage formed.
3. the antenna structure according to claim 1 for being used to generate plasma, which is characterized in that
The one end of the third corner antenna conductor is formed as one end minister than first corner antenna conductor.
4. the antenna structure according to claim 1 for being used to generate plasma, which is characterized in that
The one end of first corner antenna conductor is Chong Die with the one end of the third corner antenna conductor.
5. the antenna structure according to claim 1 for being used to generate plasma, which is characterized in that
It is similarly grown with the other end with first corner antenna conductor the other end of the third corner antenna conductor
Degree is formed.
6. the antenna structure according to claim 1 for being used to generate plasma, which is characterized in that
The other end of the third corner antenna conductor is Chong Die with the other end of the 5th corner antenna conductor.
It is 7. according to claim 1 for generating the antenna structure of plasma, which is characterized in that also include with it is described
The outer side edges antenna part of first direction or the second direction configured in parallel,
Continuous vertically flexagon between the plane that the outer side edges antenna part is mutually parallel at two by outer side edges antenna conductor
Into.
8. the antenna structure according to claim 7 for being used to generate plasma, which is characterized in that
The both sides of the outer side edges antenna part are each configured with the corner antenna part.
9. the antenna structure for being used to generate plasma according to claim 7 or 8, which is characterized in that
The outer side edges antenna part includes with the first outer side edges antenna part of the first direction configured in parallel and with described second
Second outer side edges antenna part of direction configured in parallel,
The first direction length of the first outer side edges antenna part is longer than the second direction of the second outer side edges antenna part
It spends short.
10. the antenna structure for being used to generate plasma according to claim 7 or 8, which is characterized in that
Comprising the first outer side edges antenna part with the first direction configured in parallel and with the second direction configured in parallel
Two outer side edges antenna parts,
The number of turn of the second outer side edges antenna part is more described in the turn ratio of the first outer side edges antenna part.
Applications Claiming Priority (2)
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KR1020160146787A KR101866210B1 (en) | 2016-11-04 | 2016-11-04 | Antenna structure for plasma |
KR10-2016-0146787 | 2016-11-04 |
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Cited By (1)
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CN111491433A (en) * | 2019-04-17 | 2020-08-04 | 吉佳蓝科技股份有限公司 | Plasma antenna and plasma processing device comprising same |
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JP7403348B2 (en) * | 2020-02-21 | 2023-12-22 | 東京エレクトロン株式会社 | Antenna segment and inductively coupled plasma processing equipment |
JP7403347B2 (en) * | 2020-02-21 | 2023-12-22 | 東京エレクトロン株式会社 | Inductively coupled antenna and plasma processing equipment |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0850998A (en) * | 1994-08-04 | 1996-02-20 | Kokusai Electric Co Ltd | Plasma processing device |
US6237526B1 (en) * | 1999-03-26 | 2001-05-29 | Tokyo Electron Limited | Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
JP6010305B2 (en) * | 2012-02-07 | 2016-10-19 | 東京エレクトロン株式会社 | Inductively coupled plasma antenna unit, inductively coupled plasma processing apparatus, and inductively coupled plasma processing method |
KR20150110851A (en) * | 2014-03-20 | 2015-10-05 | 엘아이지인베니아 주식회사 | Antenna of controlling field intensity distribution in inductively coupled plasma processing apparatus |
-
2016
- 2016-11-04 KR KR1020160146787A patent/KR101866210B1/en active IP Right Grant
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CN111491433A (en) * | 2019-04-17 | 2020-08-04 | 吉佳蓝科技股份有限公司 | Plasma antenna and plasma processing device comprising same |
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KR101866210B1 (en) | 2018-06-11 |
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