CN107846768A

CN107846768A - Inductive couple plasma processing device

Info

Publication number: CN107846768A
Application number: CN201710851380.3A
Authority: CN
Inventors: 崔正秀
Original assignee: Invenia Co Ltd
Current assignee: Invenia; Invenia Co Ltd
Priority date: 2016-09-19
Filing date: 2017-09-19
Publication date: 2018-03-27
Also published as: KR20170123566A; KR101848908B1

Abstract

Inductive couple plasma processing device in one embodiment of the present of invention includes the multiple antenna parts being separated from each other, apply the main supply lines for the RF power for being supplied to the multiple antenna part, multiple secondary supply lines that branch is connected in the main supply lines and each with the multiple antenna part, the multiple secondary supply lines is respectively connected on to export multiple delivery outlets of the information of the RF power on being applied separately to the multiple antenna part by each secondary supply lines and be connected to the multiple delivery outlet to show the monitoring portion of the information on the RF power.

Description

Inductive couple plasma processing device

Technical field

The present invention relates to a kind of inductive couple plasma processing device, particularly generate inductively coupled plasma so as to The inductive couple plasma processing device of processing is implemented to the substrate of display panel etc..

Background technology

In the device of the processing such as CVD, etching is implemented to substrate using plasma, use more to comprising antenna Device apply RF power, so as to form induction field around antenna and produce the mode of plasma.

On the other hand, as the maximization of processed substrate, processing unit also gradually maximize, for the base to maximization Plate implements uniform processing, becomes universal gradually using the substrate board treatment with multiple antennas.

In the case of with multiple antennas, due to the impedance of antenna is unbalanced or processing unit in environmental problem, can The RF power for being applied to each antenna can be caused different, so that plasma unevenly generates in each region, even if It is applied to that the RF power of each antenna is almost identical, also due to environmental problem in processing unit etc., and cause plasma Unevenly generated in each region or cause the processing to substrate uneven.

The content of the invention

Technical problem

It is an object of the present invention to provide it is a kind of can be applied to each antenna part RF power carry out in real time monitoring and The inductive couple plasma processing device of control.

The purpose of the present invention is not limited to the above-mentioned purpose referred to, and those of ordinary skill in the art can be bright by following record Really understand the other purposes not referred to.

Technical scheme

In order to solve the above technical problems, the inductive couple plasma processing device in one embodiment of the present of invention includes A pair of first antenna portions being configured in parallel to each other in a manner of the long side for forming rectangle, to form the side of the short side of the rectangle A pair of second antenna parts that formula configures in parallel to each other, to be configured in a manner of forming the angle of the rectangle in the first antenna portion Third antenna portion, application between second antenna part are supplied to the first antenna portion, second antenna part and institute State the main supply lines of the RF power in third antenna portion, branch in the main supply lines and with the first antenna portion and described First secondary supply lines of two antenna parts connection, branch are in the main supply lines and the second secondary confession for be connected with the third antenna portion Electric wire, the described first secondary supply lines is connected to export on being applied to the first antenna portion by the described first secondary supply lines And the information of the first RF power of second antenna part the first delivery outlet, be connected to the described second secondary supply lines to export The second delivery outlet on the information of the second RF power that the third antenna portion is applied to by the described second secondary supply lines And be connected to first delivery outlet and second delivery outlet with show on first RF power information and on The monitoring portion of the information of second RF power.

Information on first RF power can at least include voltage, electric current and the phase of first RF power One in potential difference, the information on second RF power can at least include voltage, the electricity of second RF power One in stream and phase difference.

It can also include and be connected in series to the described first secondary supply lines with the side independently of second RF power The first variable condenser and be connected in series to the described second secondary supply lines that formula is controlled to first RF power The second variable condenser being controlled in a manner of independently of first RF power to second RF power.

The inner side for being configured at the first antenna portion, second antenna part and the third antenna portion can also be included Central antenna portion, branch in the main supply lines and the 3rd secondary supply lines that is connected with the central antenna portion and are connected to described 3rd secondary supply lines is to export the 3rd RF power on being applied to the central antenna portion by the 3rd secondary supply lines Information the 3rd delivery outlet, the monitoring portion can be connected with the 3rd secondary supply lines to show on the 3rd high frequency The information of electric power.

Information on the 3rd RF power can at least include voltage, electric current and the phase of the 3rd RF power One in potential difference.

It can also include and be connected in series to the 3rd secondary supply lines with independently of first RF power and institute State the 3rd variable condenser that the mode of the second RF power is controlled to the 3rd RF power.

The central antenna portion can include at least one central antenna wire spirally configured, the described 3rd secondary confession Electric wire can be in a manner of flowing through the electric current of the central antenna wire and be flowed from the inside side in the outside in the central antenna portion It is connected with the central antenna wire.

The 3rd secondary supply lines can be connected with being located at the end of opposite exterior lateral sides in the both ends of the central antenna wire.

Can also include be configured at the first antenna portion, second antenna part and the third antenna portion and it is described in Intermediate antenna portion, branch between the antenna part of centre power in the main supply lines and the fourth officer that be connected with the intermediate antenna portion Line and the fourth officer supply lines is connected to export on being applied to the intermediate antenna portion by the fourth officer supply lines The 4th RF power information the 4th delivery outlet, the monitoring portion can be connected with the fourth officer supply lines with show close In the information of the 4th RF power.

Information on the 4th RF power can at least include voltage, electric current and the phase of the 4th RF power One in potential difference.

It can also include and be connected in series to the fourth officer supply lines with independently of first RF power, described The 4th variable capacitance that the mode of second RF power and the 3rd RF power is controlled to the 4th RF power Device.

The intermediate antenna portion can include it is at least one by surround the central antenna portion it is at least one of in a manner of The intermediate antenna wire of configuration, the fourth officer supply lines can be to flow through the electric current of the intermediate antenna wire from described Between the mode of the inside side in outside flowing of antenna part be connected with the intermediate antenna wire.

The fourth officer supply lines can be connected with being located at the end of opposite exterior lateral sides in the both ends of the intermediate antenna wire.

In order to solve the above technical problems, the inductive couple plasma processing device in one embodiment of the present of invention includes A pair of first antenna portions being configured in parallel to each other in a manner of the long side for forming rectangle, to form the side of the short side of the rectangle A pair of second antenna parts that formula configures in parallel to each other, to be configured in a manner of forming the angle of the rectangle in the first antenna portion Third antenna portion, application between second antenna part are supplied to the first antenna portion, second antenna part and institute State the main supply lines of the RF power in third antenna portion, branch in the main supply lines and be connected with the first antenna portion One secondary supply lines, branch in the main supply lines and be connected with second antenna part the second secondary supply lines, branch is in described Main supply lines and be connected with the third antenna portion the 3rd secondary supply lines, be connected to the described first secondary supply lines with export on The first delivery outlet, the connection of the information of first RF power in the first antenna portion are applied to by the described first secondary supply lines In the described second secondary supply lines to export on being applied to the second high of second antenna part by the described second secondary supply lines Second delivery outlet of the information of frequency electric power, the 3rd secondary supply lines is connected to export on by the 3rd secondary supply lines It is applied to the 3rd delivery outlet of the information of the 3rd RF power in the third antenna portion and is connected to first delivery outlet, institute State the second delivery outlet and the 3rd delivery outlet to show the information on first RF power, on second high frequency The monitoring portion of the information of electric power and information on the 3rd RF power.

In order to solve the above technical problems, the inductive couple plasma processing device in one embodiment of the present of invention includes Multiple antenna parts for being separated from each other, the main supply lines for applying the RF power for being supplied to the multiple antenna part, branch are in described Main supply lines and be each connected with the multiple antenna part multiple secondary supply lines, be respectively connected on the multiple secondary supply lines with Export the information on RF power that the multiple antenna part is applied separately to by each secondary supply lines multiple delivery outlets and The multiple delivery outlet is connected to show the monitoring portion of the information on the RF power.

Other details of the present invention include in the detailed description and the accompanying drawings.

Beneficial effect

At least there is following effects according to an embodiment of the invention.

Implementation monitoring and control can be carried out to the RF power for being applied to each antenna part, can generate and be suitable at substrate Manage the plasma with optimal distribution/density of environment.

The effect of the present invention is not limited to the above-mentioned content referred to, and this specification will include other technique effects with a greater variety.

Brief description of the drawings

Fig. 1 is the synoptic diagram for the inductive couple plasma processing device for representing one embodiment of the present of invention.

Fig. 2 is the summary plane for being used to produce the antenna of inductively coupled plasma for representing the first embodiment of the present invention Figure.

Fig. 3 is the stereogram in the first antenna portion for the antenna for representing Fig. 2.

Fig. 4 is the stereogram in the third antenna portion for the antenna for representing Fig. 2.

Fig. 5 is the stereogram for the other embodiments for representing third antenna portion.

Fig. 6 is to represent to be used for the figure for generating the electric current flowing of the effective coverage of plasma in Fig. 2 antenna.

Fig. 7 is the electric power monitoring structure for the inductive couple plasma processing device for representing one embodiment of the present of invention Synoptic diagram.

Fig. 8 is the synoptic diagram of a part for the electric power monitoring structure for representing the other embodiment of the present invention.

Fig. 9 is the summary plane for being used to produce the antenna of inductively coupled plasma for representing the second embodiment of the present invention Figure.

Figure 10 is that the summary for the antenna for producing inductively coupled plasma for representing the third embodiment of the present invention is put down Face figure.

Figure 11 is that the summary for the antenna for producing inductively coupled plasma for representing the fourth embodiment of the present invention is put down Face figure.

Figure 12 is that the summary for the antenna for producing inductively coupled plasma for representing the fifth embodiment of the present invention is put down Face figure.

Figure 13 is that the summary for the antenna for producing inductively coupled plasma for representing the sixth embodiment of the present invention is put down Face figure.

Figure 14 is that the summary for the antenna for producing inductively coupled plasma for representing the seventh embodiment of the present invention is put down Face figure.

【Reference】

1：Inductive couple plasma processing device 10：Chamber

20：Base support part 30：Base

50：Window 61：Bottom supply lines

62、72：High frequency electric source 63,73：Adaptation

71：Main supply lines 71a, 71b, 71c, 71d, 71e：Secondary supply lines

80：Monitoring portion 90：Control unit

100、200、300、400、500、600、700：Antenna

110、710：Central antenna portion

110a、711a、712a、713a、714a、：Central power input

110b、710a：Central power output end

111、112、113、114、711、712、713、714：Central antenna wire

120、220、720：Intermediate antenna portion

121、122、123、124、721、722、723、724：Intermediate antenna wire

121a、122a、123a、124a、721a、722a、723a、724a：Intervening power input

121b、122b、123b、124b、721b、722b、723b、724b：Intervening power output end

130、230、330、430：First antenna portion

130a、331f：First power input end 130b, 331g：First power output end

140、340：Second antenna part 140a, 341f：Second power input end

140b、341g：Second power output end 150,150 ', 250：Third antenna portion

150a、250a：3rd power input end 150b, 250b：3rd power output end

221：First intermediate antenna section 222：Second intermediate antenna section

251：Third antenna wire

331、332、333、344、345：First antenna section

341、342、343：Second antenna segment C1, C2, C3, C4, C5：Variable condenser

D1：First direction D2：Second direction

L1：First direction length L2：Second direction length

P1：First plane P2：Second plane

T1、T2、T3、T4、T5：Delivery outlet

Embodiment

The embodiment described referring to the drawings and in detailed below, it can more clearly understand advantages of the present invention and feature and reach These method.But the invention is not limited in embodiments disclosed below, but other various changes can be made to it Shape, below multiple embodiments be intended to intactly disclose the present invention, provide complete invention category for those skilled in the art, this The category of invention is only defined by the claims.Same reference marks specifies same inscape in specification full text.

In addition, the embodiment that this specification is described can be with reference to the sectional view and/or summary of the exemplary plot as the present invention Figure illustrates.Therefore, the form of exemplary plot can deform according to manufacturing technology and/or allowable error.In addition, in order to just In each element of explanation, the how rare situation about expanding or shrinking of accompanying drawing illustrated in the present invention.It is same in the specification Reference marks specifies same inscape.

Hereinafter, by with reference to illustrating the inductive couple plasma processing device of one embodiment of the present of invention and be used for Multiple embodiments of the device be used for produce inductively coupled plasma antenna and be supplied to antenna electric power monitoring knot The accompanying drawing of structure, the present invention will be described.

Fig. 1 is the synoptic diagram for the inductive couple plasma processing device for representing one embodiment of the present of invention.The present invention The inductive couple plasma processing device 1 of one embodiment be by being generated to the inside supply step gas of chamber 10 etc. Gas ions, it is pointed to the device that the substrate S inside chamber 10 carries out treatment process.

As shown in figure 1, the inductive couple plasma processing device 1 of one embodiment of the present of invention includes chamber 10, bottom Seat 30, window 50, antenna 100.Antenna 100 refers to the antenna for producing inductively coupled plasma.

Chamber 10 is internally formed as the sealing structure formed with the space that can set base 30, window 50 and antenna 100. Chamber 10 can be that the aluminium being anodized by inwall is formed.

As shown in figure 1, base 30 is located at the bottom inside chamber 10.Base 30 is configured to supporting and is moved to inside chamber 10 Substrate S, electrically connected by bottom supply lines 61 with the high frequency electric source 62 of biasing, by plasma ion introduce substrate S.The high frequency electric source 62 of biasing can apply 6MHz RF power to base 30.

Can be with configurations match device 63 between the high frequency electric source 62 and base 30 of biasing.Adaptation 63 passes through bottom supply lines 61 can be in biasing with carrying out impedance matching between high frequency electric source 62 and base 30.

The thermoregulation mechanism of having heaters and/or refrigerant flow path etc. can be set in base 30, to control process In substrate S temperature.

Base 30 can be supported by base support part 20, and base support part 20 can maintain the airtight shape of chamber 10 The bottom surfaces of chamber 10 are penetrated under state, and to the Outer elongate of chamber 10.Base support part 20 can be by configuring in chamber Elevating mechanism outside 10, in the inside lifting pedestal 30 of chamber 10.

In order to which even if base 30 lifts, the airtight conditions being also able to maintain that inside chamber 10 simultaneously prevent foreign to be flowed into Inside chamber 10, bellows can be configured in a manner of surrounding base support part 20 between the bottom surfaces of base 30 and chamber 10 40。

On the other hand, the top inside chamber 10 sets fenestrate 50.Window 50 can be by the upper space zoning in chamber 10 Into the antenna installation space for being provided with antenna 100 and the processing space of generation plasma.So as to which window 50 is both that antenna sets sky Between bottom, while be also processing space top.

Window 50 can be made up of dielectrics such as ceramics, quartz, or be made up of the electric conductor of such as aluminum or aluminum alloy.

The top of window 50 is provided with antenna 100.

Antenna 100 obtains the supply of RF power by main supply lines 71 from high frequency electric source 72.High frequency electric source 72 can be to Antenna supplies 13.56MHz RF power.

Adaptation 73 is configured between antenna 100 and high frequency electric source 72, adaptation 73 can be in height by main supply lines 71 Impedance matching is carried out between frequency power 72 and antenna 100.

When the RF power supplied by high frequency electric source 72 is applied to antenna 100, is generated and felt in processing space by window 50 Electric field is answered, the processing gas in processing space is supplied to by induction field by plasma, so as to generate inductive couple plasma Body.

It can be provided with although not shown in Fig. 1, in chamber 10 from outside transmission processing gas to processing space Gas flow path and spray head.In addition, the side wall of chamber 10 could be formed with the mouth of the carrying-in/carrying-out for substrate S.

Hereinafter, antenna is specifically described.

As shown in Fig. 2 the antenna 100 for being used to produce inductively coupled plasma of the first embodiment of the present invention includes one To first antenna portion 130, a pair of second antenna parts, 140, four third antenna portions 150, central antenna portion 110 and intermediate antenna portion 120。

Central antenna portion 110 includes the multiple central antenna wires extended in the shape of a spiral from central power input end 110a 111、112、113、114.Fig. 2 shows that multiple central antenna wires 111,112,113,114 are configured to input from central power The spiral-shaped example that end 110a is rotated in a clockwise direction.

Formed twice as shown in Fig. 2 each central antenna wire 111,112,113,114 can have vertically to bend Three sides surrounded shape, and be configured to be separated by 90 degree centered on central power input 110a respectively.Because the present embodiment shows What is gone out is the example using four central antenna wires 111,112,113,114, thus each central antenna wire 111,112, 113rd, 114 it is configured to be separated by 90 degree, but with the change of the quantity of central antenna wire 111,112,113,114, each central day Configuration space between line wire 111,112,113,114 can also change therewith.

The end of each central antenna wire 111,112,113,114 formed with central power output end 110b, 110c, 110d, 110e, by central power input 110a supply electric power can along each central antenna wire 111,112,113, 114 flow through.

On the other hand, intermediate antenna portion 120 includes the four intermediate antenna wires 121,122,123,124 being separated from each other. As shown in Fig. 2 each intermediate antenna wire 121,122,123,124 have vertically bend form twice it is three sides surrounded Shape, and it is overlapping with two other intermediate antenna wire 121,122,123,124 to be configured to one part, makes central antenna portion 110 are surrounded by intermediate antenna portion 120.

One end of each intermediate antenna wire 121,122,123,124 formed with intervening power input 121a, 122a, 123a, 124a, the other end is formed with intervening power output end 121b, 122b, 123b, 124b.So as to defeated by each intervening power The electric power for entering to hold 121a, 122a, 123a, 124a to supply can flow through along each intermediate antenna wire 121,122,123,124.

As shown in Fig. 2 intervening power input 121a, 122a, 123a, 124a and intervening power output end 121b, 122b, 123b, 124b are formed as flowing through the flowing of the electric current of each intermediate antenna wire 121,122,123,124 integrally in side clockwise To.

On the other hand, a pair of first antenna portions 130, a pair of second antenna parts 140 and four third antenna portions 150 are with entirety The mode for forming dimetric frame is configured to surround intermediate antenna portion 120.

As shown in Fig. 2 D1 is configured in parallel to each other in the first direction in a pair of first antenna portions 130, a pair of second antenna parts 140 configure in parallel to each other in a second direction, and at least form the part on dimetric each side.

In addition, four third antenna portions 150 are configured in a manner of forming dimetric each angle.

As shown in Fig. 2 the first direction length L1 in first antenna portion 130 is formed as the second party than the second antenna part 140 It is short to length L2.The second direction length L2 of the first direction length L1 in first antenna portion 130 and the second antenna part 140 ratio Can be 1：1.2 to 1：Between 1.8.

So as to four formed by a pair of first antenna portions 130, a pair of second antenna parts 140 and four third antenna portions 150 Angular to turn into rectangle, first antenna portion 130 can be located at the short brink of rectangle, and the second antenna part can be located at rectangle with 140 Long side.

In order to more effectively be handled the substrate S of rectangle, the plasma distribution in preferred process room is same overall It is upper that there is the rectangular shape similar with substrate S-shaped shape.

Therefore, participation generation is made corresponding to the first antenna portion 130 of the plasma of substrate S fringe region and second day The length in line portion 140, the outline shape of antenna 100 is set to form rectangle on the whole.

As shown in figure 3, first antenna portion 130 by first antenna wire along with parallel to first direction D1 and second direction D2 Imaginary plane P 1, the vertical radially winding curls of P2 and formed.

More particularly, first antenna wire is in the first virtual plane parallel to first direction D1 and second direction D2 Continuously vertically bent to form first antenna portion 130 between P1 and the second plane P2.

Fig. 3 shows the first antenna portion 130 enclosed and formed by first antenna Wire-wound two.

First antenna wire winds two circles between the first plane P1 and the second plane P2, so that one end and the other end are located at First plane P1.

So as to as shown in figure 3, first antenna wire is included positioned at three wires on the first plane P1 of opposing lower portions 131a, 131b, 131c and positioned at two wires 132a, 132b on the second plane P2 of opposite upper parts.Also, comprising vertical In the first plane P1 and the second plane P2 and connect four of three wires 131a, 131b, 131c and two wires 132a, 132b Wire 133a, 133b, 133c, 133d.

Three wires 131a, 131b, 131c on the first plane P1 are formed as linear in being parallel to each other.Although Two wires 132a, 132b on the second plane P2 be similarly formed as it is linear in being parallel to each other, but can be with the The position of three wire 131a, 131b, 131c obliques on one plane P1.

In fig. 2, three wires 131a, 131b, 131c on the first plane P1 are indicated by the solid line, flat positioned at second Two wires 132a, 132b on the P2 of face are represented by dashed line.

As shown in Fig. 2 one end of first antenna wire, formed with the first power input end 130a, the other end is formed with first Power output end 130b.A part in the RF power supplied by high frequency electric source 72 is applied by the first power input end 130a Flowed out after to first antenna wire by the first power output end 130b.

In the present embodiment, carried out by taking the first antenna portion 130 enclosed and formed by first antenna Wire-wound two as an example Illustrate, but the windings of first antenna wire can be changed according to embodiment.For example, work as first antenna Wire-wound When one circle forms first antenna portion 130, the wire on the first plane P1 can be two, leading on the second plane P2 Line can be one.Or when the windings of first antenna wire are more than two circles, the wire on the first plane P1 can Think more than three, the wire on the second plane P2 can be more than two.

Second antenna part 140 is equally similarly formed with first antenna portion 130.

That is, the second antenna part 140 is equally parallel to first direction D1 and second direction D2 by the second antenna conductor Between virtual the first plane and the second plane it is continuous vertically bend to the helical form with the radial direction vertical with each plane and Formed.

Preferably, first antenna wire and the second antenna conductor have same impedance, so the second antenna conductor can be with Be formed as that there is the sectional area same with first antenna wire, and it is equal with first antenna wire to be formed as entire length.

When the entire length of each antenna conductor refers to each antenna conductor deploying state in alignment, from one end to another The length of one end.

Second antenna conductor is equally comprising three wires 141a, 141b, 141c in the first plane and positioned in phase To two wires 142a, 142b in second plane on top, and comprising perpendicular to the first plane and the second plane and connection three Root wire 141a, 141b, 141c and two wires 142a, 142b four wires (not shown).

In fig. 2, three wires 141a, 141b, 141c in the first plane are indicated by the solid line, positioned at the second plane On two wires 142a, 142b be represented by dashed line.

Simply, as described above, the first direction length L1 in first antenna portion 130 is formed as than the second antenna part 140 Two direction length L2 are short, so three wires 131a, 131b, the 131c on the first plane P1 in first antenna portion 130 Length is shorter than three wires 141a, 141b, 141c in the first plane of the second antenna part 140 length.

Preferably, three wires 131a, 131b, the 131c and second on the first plane P1 in first antenna portion 130 Three wires 141a, 141b, 141c in the first plane of antenna part 140 are generally aligned in the same plane on P1.

But two wires 132a, the 132b and the second antenna part on the second plane P2 in first antenna portion 130 140 two wires 142a, 142b in the second plane can not be in the same plane.

When the entire length of first antenna wire is identical with the entire length of the second antenna conductor, first antenna portion 130 Two wires 132a, 132b where the second plane P2 can be located at the second antenna part 140 two wire 142a, 142b institutes The second plane top.

As shown in Fig. 2 one end of the second antenna conductor, formed with the second power input end 140a, the other end is formed with second Power output end 140b.A part in the RF power supplied by high frequency electric source 72 is applied by the second power input end 140a Flowed out after to the second antenna conductor by the second power output end 140b.

In the present embodiment, carried out by taking the second antenna part 140 formed by the circle of the second antenna conductor winding two as an example Illustrate, but the windings of the second antenna conductor can be changed according to embodiment.For example, when the second antenna conductor is wound When one circle forms the second antenna part 140, the wire in the first plane can be two, and the wire in the second plane can Think one.Or when the windings of the second antenna conductor are more than two circles, the wire in the first plane can be three More than root, the wire in the second plane can be more than two.

As shown in figure 4, third antenna portion 150 is with the antenna part 140 of first antenna portion 130 or second is bent to after 90 degree Shape it is similar.

Third antenna portion 150 is in virtual the parallel to first direction D1 and second direction D2 by third antenna wire Continuously integral L-shaped helical form is vertically bent between one plane P1 and the second plane P2 to form.

Third antenna wire winds two circles between the first plane P1 and the second plane P2, so that one end and the other end are located at First plane P1.

So as to as shown in figure 4, third antenna wire is included positioned at three wires on the first plane P1 of opposing lower portions 151a, 151b, 151c and positioned at two wires 152a, 152b on the second plane P2 of opposite upper parts.Also, comprising vertical In the first plane P1 and the second plane P2 and connect four of three wires 151a, 151b, 151c and two wires 152a, 152b Wire 153a, 153b, 153c, 153d.

Each comfortable center section of three wires 151a, 151b, 151c on the first plane P1 is bent approximately in 90 degree And a part, parallel to first direction D1, another part is parallel to second direction D2.Also, three wires 151a, 151b, 151c Configuration is concentrically.

Equally, each comfortable center section of two wires 152a, 152b on the second plane P2 is bent approximately in 90 degree And a part is configured to together parallel to first direction D1, another part parallel to second direction D2, two wires 152a, 152b The heart.

In fig. 2, three wires 151a, 151b, 151c on the first plane P1 are indicated by the solid line, flat positioned at second Two wires 152a, 152b on the P2 of face are represented by dashed line.

As shown in Figures 2 and 4, the wire 152a in two wires 152a, 152b positioned at inner side can be with a part (with the Part parallel one direction D1) it is parallel and overlapping with the wire 151a being located in three wires 151a, 151b, 151c on the inside of most, Another part (part parallel with second direction D2) and wire 151b centrally located in three wires 151a, 151b, 151c Parallel and overlapping mode is formed.

Also, the wire 152b in two wires 152a, 152b positioned at outside (can be put down with a part with first direction D1 Capable part) it is parallel and overlapping with wire 151b centrally located in three wires 151a, 151b, 151c, another part is (with Part parallel two direction D2) it is parallel and overlapping positioned at outermost wire 151c with three wires 151a, 151b, 151c Mode is formed.

As shown in Fig. 2 one end of third antenna wire, formed with the 3rd power input end 150a, the other end is formed with the 3rd Power output end 150b.A part in the RF power supplied by high frequency electric source 72 is applied by the 3rd power input end 150a Flowed out after to third antenna wire by the 3rd power output end 150b.

In the present embodiment, carried out by taking the third antenna portion 150 enclosed and formed by third antenna Wire-wound two as an example Illustrate, but the windings of third antenna wire can be changed according to embodiment.For example, work as third antenna Wire-wound When one circle forms third antenna portion 150, the wire on the first plane P1 can be two, leading on the second plane P2 Line can be one.Or when the windings of third antenna wire are more than two circles, the wire on the first plane P1 can Think more than three, the wire on the second plane P2 can be more than two.

As shown in figure 5, third antenna portion 150 ' in other embodiment is compared to the third antenna portion 150 shown in Fig. 4, its Two wire 152a ', 152b ' shape on the second plane P2 are different.

Two wire 152a ', 152b ' on the second plane P2 be different from two wire 152a illustrated in fig. 4, 152b, intermediate portion is not bent and overall linear shape.

Therefore, two wire 152a ', 152b ' on the second plane P2 be in three wire 151a, 151b, The position of 151c obliques.

More particularly, as shown in figure 5, the wire 152a ' in two wire 152a ', 152b ' positioned at inner side is with most short The other end of the distance connection positioned at the most wire 151a of inner side from three wires 151a, 151b, 151c vertically extends Wire 153a and one end of centrally located wire 151b from three wires 151a, 151b, 151c vertically extend Wire 153b.

Also, the wire 152b ' in two wire 152a ', 152b ' positioned at outside is led with most short distance connection from three The centrally located wire 151b other end vertically extends in line 151a, 151b, 151c wire 153c and from three The wire 153d vertically extended positioned at outermost wire 151c one end in wire 151a, 151b, 151c.

Be used to generating plasma in antenna 100 is the antenna conductor positioned at the first plane P1.Therefore, for generating The effective coverage of plasma is the bottom of antenna 100, i.e. the region with the first plane P1 at grade.

As shown in fig. 6, in effective coverage first antenna portion 130, the second antenna part 140 and third antenna portion 150 electricity Stream flowing is overall in clockwise.

Also, the electric current flowing in central antenna portion 110 and intermediate antenna portion 120 is equally integrally in clockwise.

So as to, flowed along clockwise direction because the electric current that is flowed through in effective coverage interior edge antenna conductor is whole, so wait from Daughter can integrally be formed uniformly (when exist electric current be in reverse flow part when, the induction field of appropriate section mutually supports Disappear, therefore occur and to form the problem of hardly generating plasma or generating the region of low density plasmas).

Fig. 7 is the electric power monitoring structure for the inductive couple plasma processing device for representing one embodiment of the present of invention Synoptic diagram.In the inductive couple plasma processing device 1 of the present embodiment, the main power supply to the supply high frequency electric power of antenna 100 Line 71 is branched off into each antenna part 110,120,130,140,150 after adaptation 73.

As shown in fig. 7, main supply lines 71 is branched to be connected to the first of the antenna part 140 of first antenna portion 130 and second Secondary supply lines 71a, the second secondary supply lines 71b for being connected to third antenna portion 150, the 3rd pair for being connected to central antenna portion 110 The supply lines 71c and fourth officer supply lines 71d for being connected to intermediate antenna portion 120.

First secondary supply lines 71a is connected with to first day with the first power input end 130a and the second power input end 140a The supply high frequency electric power of 130 and second antenna part of line portion 140, the second secondary supply lines 71b be connected with the 3rd power input end 150a with To the supply high frequency electric power of third antenna portion 150, the 3rd secondary supply lines 71c is connected with central power input 110a with to central day The supply high frequency electric power of line portion 110, fourth officer supply lines 71d be connected with intervening power input 121a, 122a, 123a, 124a with To the supply high frequency electric power of intermediate antenna portion 120.

In addition, be connected with each secondary supply lines 71a, 71b, 71c, 71d variable condenser C1, C2, C3, C4 and output on Flow to delivery outlet T1, T2, T3, T4 of the information of each secondary supply lines 71a, 71b, 71c, 71d electric power.

More specifically, the first variable condenser C1 and the first delivery outlet T1 are connected with the first secondary supply lines 71a.

First variable condenser C1 is connected in series with the first secondary supply lines 71a, by changing the first variable condenser C1's Electrostatic capacitance, the first high of the antenna part 140 of first antenna portion 130 and second can will be applied to by the first secondary supply lines 71a Frequency electric power is controlled independently of the RF power for being applied to other antenna parts (110,120,150).

From the first delivery outlet T1 output the information on the first RF power can include the first RF power voltage, Electric current and phase difference.Can be the relative to benchmark electric power by the first delivery outlet T1 the first RF power phase differences exported The phase difference of one RF power, benchmark electric power can be pre-set a reference value or be exported from high frequency electric source 72 Electric power or through flowing any one RF power in each secondary supply lines 71a, 71b, 71c, 71d.

The second variable condenser C2 and the second delivery outlet T2 are connected with second secondary supply lines 71b.

Second variable condenser C2 is connected in series with the second secondary supply lines 71b, by changing the second variable condenser C2's Electrostatic capacitance, second RF power in third antenna portion 150 can will be applied to independently of application by the second secondary supply lines 71b It is controlled to the RF power of other antenna parts 110,120,130,140.

From the second delivery outlet T2 output the information on the second RF power can include the second RF power voltage, Electric current and phase difference.Can be the relative to benchmark electric power by the second delivery outlet T2 the second RF power phase differences exported The phase difference of two RF powers.

The 3rd variable condenser C3 and the 3rd delivery outlet T3 is connected with 3rd secondary supply lines 71c.

3rd variable condenser C3 is connected in series with the 3rd secondary supply lines 71c, by changing the 3rd variable condenser C3's Electrostatic capacitance, the 3rd RF power in central antenna portion 110 can will be applied to independently of application by the 3rd secondary supply lines 71c It is controlled to the RF power of other antenna parts 120,130,140,150.

From the 3rd delivery outlet T3 output the information on the 3rd RF power can include the 3rd RF power voltage, Electric current and phase difference.Can be the relative to benchmark electric power by the 3rd delivery outlet T3 the 3rd RF power phase differences exported The phase difference of three RF powers.

The 4th variable condenser C4 and the 4th delivery outlet T4 is connected with fourth officer supply lines 71d.

4th variable condenser C4 and fourth officer supply lines 71d is connected in series, by changing the 4th variable condenser C4's Electrostatic capacitance, the 4th RF power in intermediate antenna portion 120 can will be applied to by fourth officer supply lines 71d independently of application It is controlled to the RF power of other antenna parts 110,130,140,150.

From the 4th delivery outlet T4 output the information on the 4th RF power can include the 4th RF power voltage, Electric current and phase difference.Can be the relative to benchmark electric power by the 4th delivery outlet T4 the 4th RF power phase differences exported The phase difference of four RF powers.

On the other hand, as shown in fig. 7, the inductive couple plasma processing device 1 in one embodiment of the present of invention wraps Containing the monitoring portion 80 being connected with each delivery outlet T1, T2, T3, T4.

Monitoring portion 80 can by from each delivery outlet T1, T2, T3, T4 export on the first RF power, the second high-frequency electrical Show the visualization of information of power, the 3rd RF power and the 4th RF power.

In order to allow user to monitor the information on each RF power by monitoring portion 80, monitoring portion 80 not only can be with It will be presented, can also be showed in a manner of picture, the picture can scheme with numerical value on the information of each RF power On the antenna diagram for having shown the relative position relation of each antenna part 110,120,130,140,150, used according to the size of voltage/current The flowing or distribution of each RF power is presented in different colors.

In addition, as shown in fig. 7, inductive couple plasma processing device 1 in one embodiment of the present of invention include with The control unit 90 that each variable condenser C1, C2, C3, C4 are connected.

Control unit 90 is according to operational control each variable condenser C1, C2, C3, C4 of user electrostatic capacitance.

User can be confirmed by monitoring portion 80 on each high frequency through flowing each antenna part 110,120,130,140,150 The information of electric power, each variable condenser C1, C2, C3, C4 electrostatic capacitance are controlled by control unit 90 and independently control first RF power, the second RF power, the 3rd RF power and the 4th RF power.

Due to that can confirm to flow through the antenna part 140 of first antenna portion 130/ second, third antenna portion 150, center in real time Antenna part 110, the RF power in intermediate antenna portion 120, and each RF power is immediately controlled, handled so controlling in real time The distribution of caused plasma, density are possibly realized in space.

Particularly, the first RF power for flowing through the antenna part 140 of first antenna portion 130 and second is with handling substrate S The density of the plasma of the rim portion at edge is related, and the second RF power for flowing through third antenna portion 150 is with handling substrate S Edge angle part plasma density it is related, the 3rd RF power for flowing through central antenna portion 110 is and processing base The density of the plasma of plate S central portion is related, and the 4th RF power for flowing through intermediate antenna portion 120 is with handling substrate S The part between central portion and edge plasma density it is related.

Therefore, because the inductive couple plasma processing device 1 in one embodiment of the present of invention can be to substrate S's The distribution of the plasma in each region, density are controlled in real time, it is possible to change plasma according to substrate processing environment The distribution of body, density, the plasma of optimization is generated in processing space.

It is that main supply lines 71 is branched off into four secondary supply lines 71a, 71b, 71c, 71d with the electric power monitoring structure shown in Fig. 7, The antenna part 140 of first antenna portion 130 and second share the first secondary supply lines 71a situation on the contrary, as shown in figure 8, the present invention The electric power monitoring structure of other embodiment form for main supply lines 71 be branched off into five secondary supply lines 71a, 71b, 71c, 71d, 71e, the antenna part 140 of first antenna portion 130 and second are connected with mutually different secondary supply lines 71a, 71b.

Therefore, in the embodiment in fig. 8, main supply lines 71 branches into the secondary confession of first to be connected with first antenna portion 130 Electric wire 71a, the second secondary supply lines 71b being connected with the second antenna part 140, the 3rd pair being connected with third antenna portion 150 Supply lines 71c, the fourth officer supply lines 71d being connected with central antenna portion 110 and the 5th secondary confession being connected with intermediate antenna portion 120 Electric wire 71e.

The first RF power for being applied to first antenna portion 130 flows to the first secondary supply lines 71a, is applied to the second antenna part 140 the second RF power flows to the second secondary supply lines 71b, and the 3rd RF power for being applied to third antenna portion 150 flows to Three secondary supply lines 71c, the 4th RF power for being applied to central antenna portion 110 flow to fourth officer supply lines 71d, are applied to centre 5th RF power of antenna part 120 flows to the 5th secondary supply lines 71e.

As shown in figure 8, it is connected with each secondary supply lines 71a, 71b, 71c, 71d, 71e for each RF power of independent control Variable condenser C1, C2, C3, C4, C5 and output electric power on flowing to each secondary supply lines 71a, 71b, 71c, 71d, 71e Delivery outlet T1, T2, T3, T4, T5 of information.

Although Fig. 8 is not shown, with foregoing Fig. 7 embodiment similarly, the present embodiment can equally include connection In each delivery outlet T1, T2, T3, T4, T5 so as to the monitoring portion 80 that will be showed on the visualization of information of each RF power, and Comprising being connected for controlling with each variable condenser C1, C2, C3, C4, C5, each variable condenser C1, C2, C3, C4, C5's is quiet The control unit 90 of electric capacity.

Because similar with foregoing content, in order to avoid repeat specification, omit herein relevant on each RF power Information, monitoring portion 80 and control unit 90, utilize the monitoring to each RF power of these progress and the explanation of control.

In the inductive couple plasma processing device of Fig. 8 embodiment, because first antenna can be flowed through with independent control First RF power in portion 130 and the second RF power for flowing through the second antenna part 140, it is possible to which independent control handles rectangle The plasma of the plasma of substrate S short brink and processing rectangular substrate S long side.

Fig. 9 is the summary plane for being used to produce the antenna of inductively coupled plasma for representing the second embodiment of the present invention Figure.For convenience of description, the part similar to first embodiment has used same symbol, and eliminates pair and first embodiment The explanation of common part.

As shown in figure 9, the second embodiment of the present invention be used for produce the antenna 200 of inductively coupled plasma, it the How much otherwise varied one antenna part 230 and the first antenna portion 130 of first embodiment be.

Antenna 100 in first embodiment winds two by each antenna conductor of the antenna part 140 of first antenna portion 130 and second Enclose and formed, and the antenna 200 in second embodiment is in contrast, it is formed as the circle of the antenna conductor in first antenna portion 230 Number is more than the number of turn of the antenna conductor of the second antenna part 140.

As shown in figure 9, first antenna portion 230 can be enclosed and be formed by first antenna Wire-wound three.

The situation of first antenna portion 230 and foregoing first embodiment similarly, its first antenna wire is parallel to Continuous vertically bend between one direction D1 and second direction D2 virtual the first plane P1 and the second plane P2 and form the One antenna part 230.

Simply, because first antenna portion 230 is to be enclosed by first antenna Wire-wound three and formed, therefore there are four wires 231a, 231b, 231c, 231d are located on the first plane P1, have three wires 232a, 232b, 232c to be located on the second plane P2.

In foregoing first embodiment, when the entire length of first antenna wire and the entire length of the second antenna conductor When identical, the second plane P2 where two wires 132a, the 132b in first antenna portion 130 is located at the two of the second antenna part 140 The top of the second plane where root wire 142a, 142b.

But in a second embodiment, first antenna portion 230 is formed as its second antenna part of turn ratio more than 140, therefore Second plane P2 of one antenna part 230 and the second plane of the second antenna part 140 can be formed at grade.Or according to Need, the position that the second plane P2 in first antenna portion 230 can be formed below the second plane of the second antenna part 140.

Fig. 9 illustrates first antenna portion 230 and is enclosed by first antenna Wire-wound three and formed, and the second antenna part 140 is by The example that two antenna conductors winding two is enclosed and formed, still, in the number of turn of the antenna conductor of turn ratio second of first antenna wire On the premise of more, the number of turn of the number of turn of first antenna wire and the second antenna conductor can change according to different embodiments.

Figure 10 is that the summary for the antenna for producing inductively coupled plasma for representing the third embodiment of the present invention is put down Face figure.For convenience of description, the part similar to first embodiment has used same symbol, and eliminates pair and to implement with first The explanation of the common part of example.

As shown in Figure 10, the antenna 300 of the third embodiment of the present invention is compared with the antenna 100 of first embodiment, and it The shape in triantennary portion 250 is had any different.

In the antenna 100 of foregoing first embodiment, third antenna portion 150 is parallel to by third antenna wire Continuous vertically bend integral is in L between one direction D1 and second direction D2 virtual the first plane P1 and the second plane P2 The helical form of shape forms.

But the third antenna portion 250 of the antenna 300 in the third embodiment of the present invention, its third antenna wire 251 have Have be rotated in a clockwise direction on the first plane P1 from the 3rd power input end 250a it is spiral-shaped.

3rd power input end 250a is formed and formed in one end of third antenna wire 251, the other end of antenna conductor 251 There is the 3rd power output end 250b.

The first antenna portion 230 of antenna 200 in second embodiment is readily applicable in the third embodiment of the present invention Antenna 300.

Figure 11 is that the summary for the antenna for producing inductively coupled plasma for representing the fourth embodiment of the present invention is put down Face figure.For convenience of description, the part similar to first embodiment has used same symbol, and eliminates pair and to implement with first The explanation of the common part of example.

As shown in figure 11, the antenna 400 of the fourth embodiment of the present invention is compared with the antenna 100 of first embodiment, wherein Between the shape of antenna part 220 have any different.

In antenna 100 in foregoing first embodiment, intermediate antenna portion 120 is by with vertically bending two Four intermediate antenna wires 121,122,123,124 of the secondary three sides surrounded shape formed are formed.

But the antenna 400 in the fourth embodiment of the present invention, in-between antenna part 220, which includes, is located at first antenna portion The first intermediate antenna section 221 between 130 and central antenna portion 110 and positioned at the second antenna part 140 and central antenna portion 110 it Between the second intermediate antenna section 222.

First intermediate antenna section 221 is parallel to first direction D1 by antenna conductor similarly with first antenna portion 130 And continuously vertically bent to vertical with each plane between second direction D2 virtual the first plane and the second plane The helical form of radial direction forms.

The circle of antenna conductor winding one of the first intermediate antenna section 221 is formed, and is led comprising two in the first plane Two wire 221a in the first plane of line 221a, 221b, a wire 221c in the second plane and connection, A 221b and wire 221c in the second plane two wires (not shown).

In fig. 11, two wires 221a, 221b in the first plane are indicated by the solid line, in the second plane A piece wire 221c is represented by dashed line.

The one end and the other end for forming the antenna conductor of the first intermediate antenna section 221 are located in the first plane, and one end is formed There is the first intervening power input 221d, the other end is formed with the first intervening power output end 221e.Supplied by high frequency electric source 72 RF power in a part be applied to by the first intervening power input 221d after the first intermediate antenna section 221 by One intervening power output end 221e flows out.

As shown in figure 11, the second intermediate antenna section 222 is similarly formed with the first intermediate antenna section 221.

The circle of antenna conductor winding one of the second intermediate antenna section 222 is formed, and is led comprising two in the first plane Two wire 222a in the first plane of line 222a, 222b, a wire 222c in the second plane and connection, A 222b and wire 222c in the second plane two wires (not shown).

In fig. 11, two wires 222a, 222b in the first plane are indicated by the solid line, in the second plane A piece wire 222c is represented by dashed line.

The one end and the other end for forming the antenna conductor of the second intermediate antenna section 222 are located in the first plane, and one end is formed There is the second intervening power input 222d, the other end is formed with the second intervening power output end 222e.Supplied by high frequency electric source 72 RF power in a part be applied to by the second intervening power input 222d after the second intermediate antenna section 222 by Two intervening power output end 222e flow out.

Preferably, the first intermediate antenna section 221 and the second intermediate antenna section 222 are configured to flow through in the first plane Antenna conductor 221a, 221b, 222a, 222b electric current integrally in clockwise.

As shown in figure 11, the second intermediate antenna section 222 can be formed as longer than the first intermediate antenna section 221.This is with second The situation that antenna part 140 is formed as longer than first antenna portion 130 is similar.

The 3rd of antenna 300 in the first antenna portion 230 of antenna 200 in second embodiment and/or 3rd embodiment Antenna part 250 is readily applicable to the antenna 400 in the fourth embodiment of the present invention.

Figure 12 is that the summary for the antenna for producing inductively coupled plasma for representing the fifth embodiment of the present invention is put down Face figure.Although Figure 12 is not shown, the central antenna portion 110 and intermediate antenna portion 120 of the antenna 100 in first embodiment, It is real that the central antenna portion 110 and intermediate antenna portion 220 of antenna 400 in fourth embodiment are readily applicable to of the invention the 5th Apply the antenna 500 in example.

As shown in figure 12, the antenna 500 of the fifth embodiment of the present invention is compared with the antenna 100 of first embodiment, and it One antenna part 330 and the second antenna part 340 are had any different.

As shown in figure 12, first antenna portion 330 includes formed a line (with reference to figure 2) multiple first days of D1 in the first direction Line segment 331,332,333, the second antenna part 340 include multiple second antennas that D2 forms a line (with reference to figure 2) in a second direction Section 341,342,343.

Multiple first antenna sections 331,332,333 have the class of first antenna portion 130 with the antenna 100 in first embodiment As shape.Difference is, compared to first antenna portion 130, the first direction length L1a of each first antenna section 331,332,333 Formed shorterly.

The first direction length L1 in the first antenna portion 330 of the antenna 500 in the present embodiment and each first antenna section 331, 332nd, 333 first direction length L1a summation is equal or similar.

Each first antenna section 331,332,333 is substantially the same, as shown in figure 12, each first antenna section 331,332,333 Comprising positioned at the first plane P1 on three wires 331a, 331b, 331c and positioned on the second plane P2 of opposite upper parts Two wires 331d, 331e.Also, comprising perpendicular to the first plane P1 and the second plane P2 and connect three wire 331a, 331b, 331c and two wires 331d, 331e four wires (not shown).

In fig. 12, three wires 331a, 331b, 331c on the first plane P1 are indicated by the solid line, positioned at second Two wires 331d, 331e on plane P2 are represented by dashed line.

In addition, one end of each first antenna section 331,332,333 is formed formed with the first power input end 331f, the other end There is the first power output end 331g.A part in the RF power supplied by high frequency electric source 72 passes through the first power input end 331f is flowed out after being applied to each first antenna section 331,332,333 by the first power output end 331g.

On the other hand, multiple second antenna segments 341,342,343 equally have the with the antenna 100 in first embodiment The similar shape of two antenna parts 140.Difference is, compared to the second antenna part 140, the of each second antenna segment 341,342,343 Two direction length L2a are formed shorterly.

Each second antenna segment 341,342,343 is substantially the same, as shown in figure 12, each second antenna segment 341,342,343 Comprising positioned at the first plane P1 on three wires 341a, 341b, 341c and positioned on the second plane P2 of opposite upper parts Two wires 341d, 341e.Also, comprising perpendicular to the first plane P1 and the second plane P2 and connect three wire 341a, 341b, 341c and two wires 341d, 341e four wires (not shown).

In fig. 12, three wires 341a, 341b, 341c on the first plane P1 are indicated by the solid line, positioned at second Two wires 341d, 341e on plane P2 are represented by dashed line.

In addition, one end of each second antenna segment 341,342,343 is formed formed with the second power input end 341f, the other end There is the second power output end 341g.A part in the RF power supplied by high frequency electric source 72 passes through the second power input end 341f is flowed out after being applied to each second antenna segment 341,342,343 by the second power output end 341g.

As shown in figure 12, in the present embodiment, the first direction length L1a of first antenna section 331,332,333 is than second The second direction length L2a of antenna segment 341,342,343 is formed shorterly.

So as to even if forming the quantity of 330 first antenna section 331,332,333 in first antenna portion with forming second day The quantity of second antenna segment 341,342,343 in line portion 340 is equal, and the first direction length L1 in first antenna portion 330 is also than The second direction length L2 of two antenna parts 340 is short.

The third antenna portion 250 of antenna 300 in 3rd embodiment is readily applicable in the fifth embodiment of the present invention Antenna 500.

Antenna 500 in the present embodiment can be used for the plasma processing apparatus for handling large substrate.With substrate Size becomes big, and the size of antenna also should become big therewith, but due to the first antenna portion 130 of the antenna 100 in first embodiment And 140 each one antenna conductor of freedom of the second antenna part is formed, thus when suitable for large substrate, fragile structure, manufacture hardly possible Degree rise, and exist positioned at the second plane antenna conductor sink because of own wt and with the antenna conductor positioned at the first plane The possibility of coincidence.

Therefore, preferably constituted in the plasma processing apparatus of processing large substrate such as the antenna in the present embodiment 500, i.e. the antenna part 340 of first antenna portion 330 and second is each divided into multiple antenna segments 331~333,341~343.

Figure 13 is that the summary for the antenna for producing inductively coupled plasma for representing the sixth embodiment of the present invention is put down Face figure.For convenience of description, the part similar to the 5th embodiment has used same symbol, and eliminates pair and to implement with the 5th The explanation of the common part of example.

As shown in figure 13, the antenna 600 of the sixth embodiment of the present invention is compared with the antenna 500 of the 5th embodiment, and it How much otherwise varied one antenna part 430 is.

The antenna 500 of the 5th foregoing embodiment, the first direction length L1a ratios of its first antenna section 331,332,333 The second direction length L2a of second antenna segment 341,342,343 is formed shorterly.

But the antenna 600 in the present embodiment, as shown in figure 13, its first antenna section 344,345 and the second antenna segment 341st, 342,343 is substantially the same.

Therefore, the second of the first direction length L1a of first antenna section 344,345 and the second antenna segment 341,342,343 Direction length L2a is identical.

But as shown in figure 13, the antenna 600 of the present embodiment, the first antenna section 344 in its composition first antenna portion 430, The quantity of second antenna segment 341,342,343 of 345 quantity than forming the second antenna part 340 is few.

Therefore, even if the first direction length L1a of first antenna section 344,345 and the second antenna segment 341,342,343 Second direction length L2a is equal, and the first direction length L1 in first antenna portion 430 is also than the second direction of the second antenna part 340 Length L2 is short.

Figure 14 is that the summary for the antenna for producing inductively coupled plasma for representing the seventh embodiment of the present invention is put down Face figure.For convenience of description, the part similar to first embodiment has used same symbol, and eliminates pair and to implement with first The explanation of the common part of example.

As shown in figure 14, the antenna 700 and for being used to produce inductively coupled plasma of the seventh embodiment of the present invention The antenna 100 of one embodiment is compared, and the shape in its central antenna part 710 and intermediate antenna portion 720 is had any different.

The central antenna portion 110 of the antenna 100 of foregoing first embodiment, its multiple central antenna wire 111,112, 113rd, 114 be configured to be rotated in a clockwise direction from central power input end 110a it is spiral-shaped.

In contrast, the center for being used to produce the antenna 700 of inductively coupled plasma of the seventh embodiment of the present invention Antenna part 710, its center are matched somebody with somebody formed with central power output end 710a, its multiple central antenna wire 711,712,713,714 Be set to rotated in the counterclockwise direction from central power output end 710a it is spiral-shaped.

Also, the end of each central antenna wire 711,712,713,714 formed with central power input 711a, 712a、713a、714a。

So as to make the electric power for being supplied to central antenna portion 710 pass through the center electricity for extending out side of centrally located antenna part 710 Power input 711a, 712a, 713a, 714a apply and integrally be in clockwise along central antenna wire 711,712,713, 714 flowings.

In addition, the intermediate antenna portion 120 with the antenna 100 of foregoing first embodiment, in-between power input end 121a, 122a, 123a, 124a are located at the situation of inner side on the contrary, this hair compared to in-between power output end 121b, 122b, 123b, 124b The intermediate antenna portion 720 for being used to produce the antenna 700 of inductively coupled plasma of the 7th bright embodiment, in-between electric power are defeated Enter to hold 721a, 722a, 723a, 724a to be located at outside compared to in-between power output end 721b, 722b, 723b, 724b.

Also, as shown in figure 14, intervening power input 721a, 722a, 723a, 724a and intervening power output end 721b, 722b, 723b, 724b are formed as making to be applied to middle day by intervening power input 721a, 722a, 723a, 724a The electric power in line portion 720 is integrally in clockwise along the flowing of intermediate antenna wire 721,722,723,724.

Possess the general knowledge of the technical field of the invention it is to be understood by the skilled artisans that the present invention can not change its skill On the premise of art thinking and Essential features, implement in the form of other are specific.It is therefore to be understood that the embodiment described above exists All aspects are all exemplary, and non-limiting.The scope of the present invention will be able to body in following claims It is existing, rather than specification described above, and drawn by the meaning in claim and scope and from concept impartial therewith The form for having altered or deforming, it all should be interpreted that and belong to scope of the invention.

Claims

A kind of 1. inductive couple plasma processing device, it is characterised in that

Comprising：

A pair of the first antenna portions configured in parallel to each other in a manner of the long side for forming rectangle；

By a pair of second antenna parts configured in parallel to each other in a manner of forming the short side of the rectangle；

To be configured in a manner of forming the angle of the rectangle the between the first antenna portion and second antenna part the 3rd day Line portion；

Apply the main power supply for the RF power for being supplied to the first antenna portion, second antenna part and the third antenna portion Line；

Branch is in the main supply lines and the first secondary supply lines for being connected with the first antenna portion and second antenna part；

Branch is in the main supply lines and the second secondary supply lines for being connected with the third antenna portion；

The described first secondary supply lines is connected to export on being applied to the first antenna portion by the described first secondary supply lines And the first delivery outlet of the information of the first RF power of second antenna part；

The described second secondary supply lines is connected to export on being applied to the third antenna portion by the described second secondary supply lines The second RF power information the second delivery outlet；And

First delivery outlet and second delivery outlet are connected to show information and the pass on first RF power In the monitoring portion of the information of second RF power.
2. inductive couple plasma processing device according to claim 1, it is characterised in that

Information on first RF power is comprised at least in the voltage, electric current and phase difference of first RF power One,

Information on second RF power is comprised at least in the voltage, electric current and phase difference of second RF power One.
3. inductive couple plasma processing device according to claim 1, it is characterised in that

Also include and be connected in series to the described first secondary supply lines in a manner of independently of second RF power to described The first variable condenser that first RF power is controlled and with the described second secondary supply lines be connected in series to independently of The second variable condenser that the mode of first RF power is controlled to second RF power.
4. inductive couple plasma processing device according to claim 1, it is characterised in that

Also include the central antenna for the inner side for being configured at the first antenna portion, second antenna part and the third antenna portion Portion；

Branch is in the main supply lines and the 3rd secondary supply lines that is connected with the central antenna portion；And

The 3rd secondary supply lines is connected to export on being applied to the central antenna portion by the 3rd secondary supply lines The 3rd RF power information the 3rd delivery outlet,

The monitoring portion is connected with the 3rd secondary supply lines to show the information on the 3rd RF power.
5. inductive couple plasma processing device according to claim 4, it is characterised in that

Information on the 3rd RF power is comprised at least in the voltage, electric current and phase difference of the 3rd RF power One.
6. inductive couple plasma processing device according to claim 4, it is characterised in that

Also include and be connected in series to the 3rd secondary supply lines with independently of first RF power and described second high The 3rd variable condenser that the mode of frequency electric power is controlled to the 3rd RF power.
7. inductive couple plasma processing device according to claim 4, it is characterised in that

The central antenna portion includes at least one central antenna wire spirally configured,

The 3rd secondary supply lines is inside from the outside in the central antenna portion to flow through the electric current of the central antenna wire The mode of side flowing is connected with the central antenna wire.
8. inductive couple plasma processing device according to claim 7, it is characterised in that

The 3rd secondary supply lines is connected with being located at the end of opposite exterior lateral sides in the both ends of the central antenna wire.
9. inductive couple plasma processing device according to claim 4, it is characterised in that

Also include and be configured at the first antenna portion, second antenna part and the third antenna portion and the central antenna portion Between intermediate antenna portion；

Branch is in the main supply lines and the fourth officer supply lines that is connected with the intermediate antenna portion；And

The fourth officer supply lines is connected to export on being applied to the intermediate antenna portion by the fourth officer supply lines The 4th RF power information the 4th delivery outlet,

The monitoring portion is connected with the fourth officer supply lines to show the information on the 4th RF power.
10. inductive couple plasma processing device according to claim 9, it is characterised in that

Information on the 4th RF power is comprised at least in the voltage, electric current and phase difference of the 4th RF power One.
11. inductive couple plasma processing device according to claim 9, it is characterised in that

Also include and be connected in series to the fourth officer supply lines with independently of first RF power, second high frequency The 4th variable condenser that the mode of electric power and the 3rd RF power is controlled to the 4th RF power.
12. inductive couple plasma processing device according to claim 9, it is characterised in that

The intermediate antenna portion include it is at least one by surround central antenna portion it is at least one of in a manner of the middle day that configures Line wire,

The fourth officer supply lines is inside from the outside in the intermediate antenna portion to flow through the electric current of the intermediate antenna wire The mode of side flowing is connected with the intermediate antenna wire.
13. inductive couple plasma processing device according to claim 12, it is characterised in that

The fourth officer supply lines is connected with being located at the end of opposite exterior lateral sides in the both ends of the intermediate antenna wire.
A kind of 14. inductive couple plasma processing device, it is characterised in that

Comprising；

A pair of the first antenna portions configured in parallel to each other in a manner of the long side for forming rectangle；

By a pair of second antenna parts configured in parallel to each other in a manner of forming the short side of the rectangle；

To be configured in a manner of forming the angle of the rectangle the between the first antenna portion and second antenna part the 3rd day Line portion；

Apply the main power supply for the RF power for being supplied to the first antenna portion, second antenna part and the third antenna portion Line；

Branch is in the main supply lines and the first secondary supply lines for being connected with the first antenna portion；

Branch is in the main supply lines and the second secondary supply lines for being connected with second antenna part；

Branch is in the main supply lines and the 3rd secondary supply lines that is connected with the third antenna portion；

The described first secondary supply lines is connected to export on being applied to the first antenna portion by the described first secondary supply lines The first RF power information the first delivery outlet；

The described second secondary supply lines is connected to export on being applied to second antenna part by the described second secondary supply lines The second RF power information the second delivery outlet；

The 3rd secondary supply lines is connected to export on being applied to the third antenna portion by the 3rd secondary supply lines The 3rd RF power information the 3rd delivery outlet；And

First delivery outlet, second delivery outlet and the 3rd delivery outlet are connected to show on first RF power Information, the monitoring portion of the information on second RF power and the information on the 3rd RF power.
A kind of 15. inductive couple plasma processing device, it is characterised in that

Comprising：

The multiple antenna parts being separated from each other；

Apply the main supply lines for the RF power for being supplied to the multiple antenna part；

Multiple secondary supply lines that branch is connected in the main supply lines and each with the multiple antenna part；

The multiple secondary supply lines is respectively connected on to export on being applied separately to the multiple antenna by each secondary supply lines Multiple delivery outlets of the information of the RF power in portion；And

The multiple delivery outlet is connected to show the monitoring portion of the information on the RF power.