CN207552435U - A kind of gap control device, cleaning equipment for work-piece and vacuum coating equipment - Google Patents
A kind of gap control device, cleaning equipment for work-piece and vacuum coating equipment Download PDFInfo
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- CN207552435U CN207552435U CN201721644992.7U CN201721644992U CN207552435U CN 207552435 U CN207552435 U CN 207552435U CN 201721644992 U CN201721644992 U CN 201721644992U CN 207552435 U CN207552435 U CN 207552435U
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- housing
- connecting shaft
- gear
- filament
- swivel becket
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- 238000004140 cleaning Methods 0.000 title claims abstract description 26
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 239000002184 metal Substances 0.000 claims description 15
- 230000000694 effects Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- -1 i.e. Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
A kind of gap control device, including shutter, swivel becket, driving device, first gear and second gear, the shutter is an arc panel, its lower end is connect with swivel becket, the swivel becket is parallel with second gear and is coaxially disposed, the second gear is engaged with first gear, and first gear is fixed on the output shaft of driving device.First gear is driven to rotate by driving device, first gear drives second gear rotation, and second gear drives swivel becket rotation, so as to adjust the path clearance between filament and substrate, realize that cleaning or plated film precision are adjusted, the workpiece that can be required different accuracy is cleaned or plated film.The utility model additionally provides a kind of cleaning equipment for work-piece and a kind of vacuum coating equipment.
Description
Technical field
The utility model is related to material production field, particularly a kind of gap control device, cleaning equipment for work-piece and vacuum
Filming equipment.
Background technology
The mode that sputtering method makes nano material has：Magnetron sputtering, bias sputtering and reactive sputtering etc..Wherein magnetron sputtering
Principle be：Electronics collides during accelerating to fly to substrate under the action of electric field with ar atmo, ionizes out a large amount of
Argon ion and electronics, electronics fly to substrate.Argon ion accelerates to bombard target under the action of electric field, and it is former to sputter a large amount of target
Son, the target atom being in neutrality are deposited on substrate or workpiece and form a film.Secondary electron is during accelerating to fly to substrate by magnetic
The influence of field Loulun magnetism, is bound in the heating region of target surface, and plasma density is very high in the region, and two
Secondary electronics circles under the influence of a magnetic field around target surface.
Workpiece is cleaned sometimes for by cleaning equipment for work-piece using high-velocity electrons, separately has a kind of vacuum coating to set
It is standby.The cleaning equipment for work-piece or vacuum coating equipment are sent out by filament on electronics to substrate, realize to the workpiece on substrate into
Row cleaning or plated film.Path clearance between filament and substrate is larger, and the movement speed of electronics is slower, the shape on substrate or workpiece
Into certain concentration effect, i.e., the electronics that substrate or workpiece are just being accumulated facing towards the part of filament is more, in substrate or workpiece
Other parts accumulation is less, so cleans the in uneven thickness of plated film that is uneven or being formed, cleaning or plated film precision are relatively low, only
Workpiece that can be relatively low to plated film required precision carries out plated film.
Utility model content
In view of this, the utility model provide it is a kind of cleaning or plated film precision it is adjustable, can be to the work of different accuracy requirement
Part is cleaned or the gap control device of plated film, cleaning equipment for work-piece and vacuum coating equipment, to solve the above problems.
A kind of gap control device, including shutter, swivel becket, driving device, first gear and second gear, the screening
Baffle is an arc panel, and lower end is connect with swivel becket, and the swivel becket is parallel with second gear and is coaxially disposed, described second
Gear is engaged with first gear, and first gear is fixed on the output shaft of driving device.
Further, the swivel becket is fixedly and coaxially connected by fixing axle and second gear.
Further, the driving device is motor or cylinder.
Further, the gap control device further includes fixed block, lower fixed block and backplate, and the backplate is an arc
Shape plate, by being fixedly connected at the top of upper fixed block and housing, lower end is fixed by the bottom of lower fixed block and housing for the upper end
Connection.
The utility model also provides a kind of cleaning equipment for work-piece, has above-mentioned gap control device, further includes housing, base
Plate, filament, upper connecting shaft, lower connecting shaft, upper bearing (metal) and lower bearing, the filament, substrate, swivel becket are respectively positioned in housing, institute
Connecting shaft is stated across upper bearing (metal), the upper bearing (metal) passes through the top of housing, the lower connecting shaft pass through the bottom of housing and with
Lower bearing connects, and the filament is connected between connecting shaft and lower connecting shaft, and the swivel becket turning set is set on lower connecting shaft
Outside, the substrate is set between the top of housing and the bottom of housing, and the shutter is arc-shaped to be set around filament.
Further, the driving device is set in a fixed plate, and the lower bearing is fixedly connected with fixed plate, described
The bottom of fixed plate and housing connects.
Further, the upper end of the filament is by upper connector and upper connection axis connection, lower end by lower connector with
Lower connection axis connection.
The utility model also provides a kind of vacuum coating equipment, has above-mentioned gap control device, further includes housing, base
Plate, filament, upper connecting shaft, lower connecting shaft, upper bearing (metal) and lower bearing, the filament, substrate, swivel becket are respectively positioned in housing, institute
Connecting shaft is stated across upper bearing (metal), the upper bearing (metal) passes through the top of housing, the lower connecting shaft pass through the bottom of housing and with
Lower bearing connects, and the filament is connected between connecting shaft and lower connecting shaft, and the swivel becket turning set is set on lower connecting shaft
Outside, the substrate is set between the top of housing and the bottom of housing, and the shutter is arc-shaped to be set around filament.
Compared with prior art, the gap control device of the utility model, cleaning equipment for work-piece and vacuum coating equipment lead to
Over-driving device driving first gear rotation, first gear drive second gear rotation, and second gear drives swivel becket rotation, from
And the path clearance between filament and substrate is adjusted, realize that cleaning or plated film precision are adjusted, the workpiece that can be required different accuracy
It is cleaned or plated film.
Description of the drawings
The embodiment of the utility model is described below in conjunction with attached drawing, wherein：
Fig. 1 is the cleaning equipment for work-piece of the utility model embodiment or the side sectional view of vacuum coating equipment.
Fig. 2 is part A ground enlarged diagram in Fig. 1.
Fig. 3 be backplate in Fig. 1, shutter and filament relative position relation schematic top plan view.
Fig. 4 is in schematic diagram during another state for backplate, shutter and the filament in Fig. 1.
Specific embodiment
Specific embodiment of the utility model is further elaborated below based on attached drawing.It should be understood that
The explanation of the utility model embodiment is not used to herein to limit the scope of protection of the utility model.
It please refers to Fig.1 and Fig. 2, the cleaning equipment for work-piece that is provided for the utility model embodiment or vacuum coating equipment
Side schematic view.
The cleaning equipment for work-piece or vacuum coating equipment that the utility model embodiment provides include housing 110, (figure is not for substrate
Show) and filamentray structure.
Filamentray structure include filament 130, the first connector 310, upper connecting shaft 171, lower connecting shaft 172, upper bearing (metal) 181,
Lower bearing 182 and gap control device.
Gap control device include shutter 140, swivel becket 150, upper fixed block 161, lower fixed block 162, backplate 120,
Driving device 210, first gear 220,230 and second connector 320 of second gear.
Backplate 120, filament 130, shutter 140, upper fixed block 161, lower fixed block 162 are respectively positioned in housing 110.
Upper connecting shaft 171 passes through upper bearing (metal) 181, and upper bearing (metal) 181 passes through the top of housing 110 and closely connects with housing 110
It connects.Lower connecting shaft 172 is connect with lower bearing 182, and lower connecting shaft 172 passes through the bottom of housing 110.130 company of being connected to of filament
Between spindle 171 and lower connecting shaft 172.
In present embodiment, filament 130 is connect by upper connector 132 with upper connecting shaft 171, passes through lower connector 134
It is connect with lower connecting shaft 172.The upper end of upper connector 132 is connect with upper connecting shaft 171, and lower end is connect with the upper end of filament 130.
The upper end of filament 130 is fixedly connected with the first screw, and is partially wound around on the second screw.First screw and the second screw are equal
It is threadedly coupled with upper connector 132.
The lower end of lower connector 134 is connect with lower connecting shaft 172, and upper end is connect with the lower end of filament 130.Pass through rotation the
The rate of tension of filament 130 is adjusted in one screw.
In other embodiment, the first screw and the second screw may also set up on lower connector 134.
Backplate 120 is set between the top of housing 110 and the bottom of housing 110.Backplate 120 is an arc panel, is justified
The heart is located on filament 130, i.e., backplate 120 is arc-shaped is set around filament 130.The upper end of backplate 120 by upper fixed block 161 with
The top of housing 110 is fixedly connected, and lower end is fixedly connected by lower fixed block 162 with the bottom of housing 110.
150 turning set of swivel becket is set in lower connecting shaft 172.
Shutter 140 is fixed on the arc panel on swivel becket 150 for a lower end, and the center of circle is located on filament 130, that is, blocks
Plate 140 is arc-shaped to be set around filament 130.The upper end of shutter 140 is abutted with upper fixed block 161, and lower end is solid with swivel becket 150
Fixed connection.Outer diameter of the shutter 140 apart from filament 130, less than internal diameter of the backplate 120 apart from filament 130, as shown in Figure 3.
In present embodiment, upper fixed block 161 is equipped with the collets 1612 of arc, shutter towards the side of filament 130
140 upper end is abutted with collets 1612.
Swivel becket 150 is parallel with second gear 230 and is coaxially disposed, and pass through fixing axle 190 and be fixedly connected.
Second gear 230 is engaged with first gear 220, and first gear 220 is fixed on the output shaft of driving device 210.
In present embodiment, driving device 210 is motor or cylinder.
Driving device 210 is set in fixed plate 240, and fixed plate 240 is connect with the bottom of housing 110.
Lower bearing 182 is fixedly connected with fixed plate 240.
First connector 310 is electrically connected with lower connecting shaft 172, and lower connecting shaft 172 passes through lower connector 134 and filament
130 are electrically connected.
Second connector 320 is electrically connected with fixing axle 190, and fixing axle 190 is electrically connected with shutter 140.
After energization, 130 and first connector 310 of filament has the first current potential, and 140 and second connector 320 of shutter has
There is the second current potential, housing 110 is public terminal potential.
After filament 130 is lighted, filament 130 launches electronics, and electronics is directed away from the direction movement of filament 130, and electronics is high
The workpiece on substrate in speed impact housing 110, realizes the cleaning to workpiece or plated film.
Shutter 140 is rotated to can be used for adjusting the path clearance between filament 130 and substrate, the electronics that filament 130 is sent out
It is moved in the path clearance.The rotation of shutter 140 drives first gear 220 to rotate by driving device 210, first gear
220 drive second gears 230 rotate, and second gear 230 drives swivel becket 150 to rotate by fixing axle 190,150 band of swivel becket
The dynamic rotation of shutter 140 is realized.When shutter 140 is turned between filament 130 and substrate, path clearance is by 140 He of shutter
Width between the housing 110 of 140 both sides of shutter is determined by the gap between shutter 140 and backplate 120.
Please refer to Fig.3, when shutter 140 is fully rotated into side of the filament 130 far from substrate, i.e., shutter 140 with
When backplate 120 is respectively positioned on the same side of filament 130, gap between filament 130 and substrate is maximum, the movement speed of electronics compared with
Slowly, can form certain concentration effect on substrate, i.e., substrate front side towards the part of filament 130 by the electronics impacted compared with
More, other parts are less by the electronics impacted, and so part cleaning performance or electroplating effect are bad.
It please refers to Fig.4, when shutter 140 is turned to partially or fully between filament 130 and substrate, i.e. shutter
During 140 both sides for being partially or fully located at filament 130 respectively with backplate 120, path clearance reduces, and mobility increases
Greatly, unordered movement is speeded, electronics more difficult formation concentration effect on substrate so that the electronics of the various pieces impact of substrate is more
Add uniformly, so cleaning or plating is more uniform, and effect is more preferable.
On shutter 140 there is certain current potential, certain repulsive interaction is generated with electronics, so that electronics is from shutter
Gap between 140 and housing 110 or backplate 120 passes through, without bulk deposition on shutter 140.
Compared with prior art, the gap control device of the utility model, cleaning equipment for work-piece and vacuum coating equipment lead to
Over-driving device 210 drives first gear 220 to rotate, and first gear 220 drives second gear 230 to rotate, 230 band of second gear
Turn rotating ring 150 rotates, and so as to adjust the path clearance between filament 130 and substrate, realizes that the precision of cleaning or plated film is adjusted,
The workpiece that can be required different accuracy is cleaned or plated film.
It these are only the preferred embodiment of the utility model, be not used to limitation the scope of protection of the utility model, it is any
Modification, equivalent replacement or improvement within the spirit of the present invention etc. are all covered in the right of the utility model.
Claims (8)
1. a kind of gap control device, it is characterised in that：The gap control device include shutter, swivel becket, driving device,
First gear and second gear, the shutter are an arc panel, and lower end is connect with swivel becket, the swivel becket and the second tooth
It takes turns parallel and is coaxially disposed, the second gear is engaged with first gear, and first gear is fixed on the output shaft of driving device.
2. gap control device as described in claim 1, it is characterised in that：The swivel becket passes through fixing axle and second gear
It is fixedly and coaxially connected.
3. gap control device as described in claim 1, it is characterised in that：The driving device is motor or cylinder.
4. gap control device as described in claim 1, it is characterised in that：The gap control device further includes fixation
Block, lower fixed block and backplate, the backplate be an arc panel, the upper end by being fixedly connected at the top of upper fixed block and housing,
Lower end is fixedly connected by lower fixed block with the bottom of housing.
5. a kind of cleaning equipment for work-piece, it is characterised in that：With such as claim 1-4 any one of them gap control device,
The cleaning equipment for work-piece further includes housing, substrate, filament, upper connecting shaft, lower connecting shaft, upper bearing (metal) and lower bearing, the lamp
Silk, substrate, swivel becket are respectively positioned in housing, and the upper connecting shaft passes through upper bearing (metal), and the upper bearing (metal) passes through the top of housing, institute
Lower connecting shaft to be stated across the bottom of housing and is connect with lower bearing, the filament is connected between connecting shaft and lower connecting shaft,
The swivel becket turning set is set on the outside of lower connecting shaft, and the substrate is set between the top of housing and the bottom of housing,
The shutter is arc-shaped to be set around filament.
6. cleaning equipment for work-piece as claimed in claim 5, it is characterised in that：The driving device is set in a fixed plate,
The lower bearing is fixedly connected with fixed plate, the bottom connection of the fixed plate and housing.
7. cleaning equipment for work-piece as claimed in claim 5, it is characterised in that：The upper end of the filament by upper connector with it is upper
Axis connection is connected, lower end passes through lower connector and lower connection axis connection.
8. a kind of vacuum coating equipment, it is characterised in that：With such as claim 1-4 any one of them gap control device,
The vacuum coating equipment further includes housing, substrate, filament, upper connecting shaft, lower connecting shaft, upper bearing (metal) and lower bearing, the lamp
Silk, substrate, swivel becket are respectively positioned in housing, and the upper connecting shaft passes through upper bearing (metal), and the upper bearing (metal) passes through the top of housing, institute
Lower connecting shaft to be stated across the bottom of housing and is connect with lower bearing, the filament is connected between connecting shaft and lower connecting shaft,
The swivel becket turning set is set on the outside of lower connecting shaft, and the substrate is set between the top of housing and the bottom of housing,
The shutter is arc-shaped to be set around filament.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721644992.7U CN207552435U (en) | 2017-11-30 | 2017-11-30 | A kind of gap control device, cleaning equipment for work-piece and vacuum coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721644992.7U CN207552435U (en) | 2017-11-30 | 2017-11-30 | A kind of gap control device, cleaning equipment for work-piece and vacuum coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207552435U true CN207552435U (en) | 2018-06-29 |
Family
ID=62678689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721644992.7U Active CN207552435U (en) | 2017-11-30 | 2017-11-30 | A kind of gap control device, cleaning equipment for work-piece and vacuum coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207552435U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108863096A (en) * | 2018-08-16 | 2018-11-23 | 重庆市渝大节能玻璃有限公司 | The cathode bottom plate of coating film on glass Anti-splash |
| CN114318267A (en) * | 2021-12-31 | 2022-04-12 | 湘潭宏大真空技术股份有限公司 | Vacuum sputtering coating device |
-
2017
- 2017-11-30 CN CN201721644992.7U patent/CN207552435U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108863096A (en) * | 2018-08-16 | 2018-11-23 | 重庆市渝大节能玻璃有限公司 | The cathode bottom plate of coating film on glass Anti-splash |
| CN108863096B (en) * | 2018-08-16 | 2021-02-26 | 重庆市渝大节能玻璃有限公司 | Anti-sputtering cathode base plate for glass coating |
| CN114318267A (en) * | 2021-12-31 | 2022-04-12 | 湘潭宏大真空技术股份有限公司 | Vacuum sputtering coating device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of utility model: The utility model relates to a gap control device, a workpiece cleaning device and a vacuum coating device Effective date of registration: 20201201 Granted publication date: 20180629 Pledgee: Zhejiang Jiashan rural commercial bank Limited by Share Ltd. science and technology sub branch Pledgor: JIAXING DAIYUAN VACUUM TECHNOLOGY Co.,Ltd. Registration number: Y2020990001397 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Granted publication date: 20180629 Pledgee: Zhejiang Jiashan rural commercial bank Limited by Share Ltd. science and technology sub branch Pledgor: JIAXING DAIYUAN VACUUM TECHNOLOGY Co.,Ltd. Registration number: Y2020990001397 |