CN207515999U - The device that a kind of large-area metal dielectric gratings diffraction efficiency measures - Google Patents
The device that a kind of large-area metal dielectric gratings diffraction efficiency measures Download PDFInfo
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- CN207515999U CN207515999U CN201721608951.2U CN201721608951U CN207515999U CN 207515999 U CN207515999 U CN 207515999U CN 201721608951 U CN201721608951 U CN 201721608951U CN 207515999 U CN207515999 U CN 207515999U
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Abstract
The utility model discloses the devices that a kind of large-area metal dielectric gratings diffraction efficiency measures, and including semiconductor laser, chopper, detect photosystem, with reference to photosystem and Electro-Optical Sensor Set, the Core Feature of device：Metal dielectric film grating surface, 1 order diffraction light of detection light system acquisition are incident on, and pass through two-dimensional scan large-area metal dielectric gratings using the semiconductor laser of multiple wavelength, complete the measurement of the diffraction efficiency in entire grating face.This new equipment employs double photo paths and chopper, inhibits laser power drift and the interference of environmental background light.
Description
Technical field
The utility model is related to optical instrument detection technique fields, and in particular to the measurement of dielectric gratings diffraction efficiency
Device.
Background technology
High power ultra-short pulse laser device based on chirped pulse amplification is laser machining and is studying light and substance phase
The fields such as interaction have a wide range of applications.Pulse compression grating plays the broadening and compression of pulse in ICF compresses pond,
Especially last block pulse compression grating carries superelevation laser power.Current gold-plated pulse compression grating has wide bandwidth
The advantages of, but laser damage threshold is low；Multilayer dielectric film pulse compression Compressed grating has the advantages that laser damage threshold is high,
But narrow bandwidth.The best pulse compression grating of performance in order to obtain, it is proposed that metal dielectric film grating.
Metal medium grating has the advantages that wide bandwidth and high laser damage, and the patent No. 201710271676.8 provides gold
Belong to the diffraction efficiency measuring method of dielectric gratings, it is continuous to provide wavelength using super continuous spectrums laser and acousto-optic filter combination
Adjustable monochromatic source, and two pacing amounts are used, elder generation's measuring environment bias light during grating to be measured is not added with, in addition being surveyed during grating to be measured
Measure -1 order diffraction light of grating.This scheme is used to measure to exist during the diffraction efficiency measurement of large-area metal dielectric gratings
The problem of time-consuming is measured, the measurement error brought into after being grown due to time of measuring to reduce light source stability, it is desirable in length
Keep stablizing the light source of output in time, and what kind of influence is long-time inner light source stable state bring testing result basic
It has no way of finding out about it.
Utility model content
The purpose of this utility model is to provide the device that a kind of large-area metal dielectric gratings diffraction efficiency measures, solutions
Certainly during the large-area metal dielectric gratings diffraction efficiency of the prior art measure time-consuming to light source stability requirement it is high the problem of.
Purpose according to the present utility model proposes the device that a kind of large-area metal dielectric gratings diffraction efficiency measures, tool
The apparatus structure of body is as follows：
A kind of measuring device of large-area metal dielectric gratings diffraction efficiency, including two-dimensional scan translation stage, rotatable
Light source bracket, driving motor, the semiconductor laser light resource of several different wave lengths, chopper, spectroscope, first integral ball,
One photodetector, second integral ball, the second photodetector；
The semiconductor laser light resource of several the wherein described different wave lengths is mounted on the rotatable light source bracket,
Rotatable light source bracket is connected by transmission mechanism with the driving motor, and the copped wave is set gradually in light path
Device, spectroscope, wherein the glazed area of the chopper and the area equation that is in the light, incident light transmitted light after the spectroscope
As flashlight with incidence angle θcIt is incident on large-area metal dielectric gratings surface to be measured, -1 order diffraction angular is θiInto
Enter the window that enters of first integral ball, the window that goes out of first integral ball places the first photodetector, and incident light is after spectroscope
Reflected light is used as with reference to light, and into the window that enters of second integral ball, second integral ball goes out the second photodetection of placement at window
Device, wherein large-area metal dielectric gratings to be measured are placed on the two-dimensional scan translation stage.
Preferred embodiment：In above-mentioned technical proposal diaphragm is placed between chopper and the spectroscope.It can after placement diaphragm
To control the size of laser facula, prevent the sampled point that diffraction efficiency measures from having the overlapping of hot spot, cause measurement result inaccurate.
Spectroscope described in above-mentioned technical proposal is polarization splitting prism, in the polarization splitting prism and large area to be measured gold
Half-wave plate is also placed between category dielectric gratings.It places after polarization spectroscope with the polarization of laser can be modulated after half-wave plate
State can measure broadband grating corresponding diffraction efficiency under two kinds of polarization states of TE and TM.
First integral ball and the first photodetector are placed on automatically controlled angle turntable in above-mentioned technical proposal, different waves
During long semiconductor laser light resource, meet dsin θ alwaysc-dsinθi=m λi, periods of the wherein d for grating, m=-1, λiIt is half
Conductor Laser optical source wavelength.Automatically controlled angle turntable can facilitate the posture of adjustment first integral ball so that switching different wave length
The window that enters of first integral ball can face diffraction light during light source.
The thang-kng frequency of chopper described in above-mentioned technical proposal is f, the first photodetector and the second photodetector
It is connected on same switch, and the sample frequency of the first photodetector and the second electric explorer is all 2f., the first photoelectricity herein
Detector and the second photodetector are connected on same switch, facilitate realization synchronized sampling, the first photodetector of setting and
Second photodetector sample frequency is that the thang-kng frequency of chopper is 2 times of f, exactly needs to rotate a cycle in chopper
It is middle completion to being in the light when with light transmission when data sampling.
Since above-mentioned preparation facilities uses, the technical program has following advantages compared with prior art：Using multi-wavelength
Semiconductor laser replaces wideband light source, and measuring device is cheap；Using chopper light and dark measurement in real time, half is saved
Time of measuring, reduce the requirement to light source long-time stability, improve large-area metal dielectric gratings diffraction efficiency
Measurement efficiency.
Description of the drawings
Fig. 1：The device that large-area metal dielectric gratings diffraction efficiency measures；
Wherein 1：Driving motor, 2:Rotatable light source bracket, 3:Chopper, 4:Spectroscope, 5:First integral ball,
6:First photodetector, 7:Second integral ball, 8:Second photodetector, 9:Large-area metal deielectric-coating to be measured
Grating.
Specific embodiment
The technical solution of the utility model is described further with reference to the accompanying drawings and embodiments.
Embodiment one：A kind of measuring device of large-area metal dielectric gratings diffraction efficiency is translated including two-dimensional scan
Platform, rotatable light source bracket 2, driving motor 1, the semiconductor laser light resource of several different wave lengths, chopper 3, spectroscope 4,
First integral ball 5, the first photodetector 6, second integral ball 7, the second photodetector 8；
The semiconductor laser light resource of several the wherein described different wave lengths is mounted on the rotatable light source bracket,
Rotatable light source bracket 2 is connected by transmission mechanism with the driving motor 1, and the copped wave is set gradually in light path
Device, spectroscope, wherein the glazed area of the chopper and the area equation that is in the light, incident light transmitted light after the spectroscope
As test light with incidence angle θcIt is incident on large-area metal dielectric gratings surface to be measured, -1 order diffraction angular is θiInto
Enter the window that enters of first integral ball, the window that goes out of first integral ball places the first photodetector, and incident light is after spectroscope
Reflected light is used as with reference to light, and into the window that enters of second integral ball, second integral ball goes out the second photodetection of placement at window
Device, wherein large-area metal dielectric gratings to be measured are placed on the two-dimensional scan translation stage.
Test philosophy, a kind of measuring method of large-area metal dielectric gratings diffraction efficiency, such as Fig. 1 are analyzed in detail below
It is shown, for 100mw-1000mw and wavelength it is respectively 730nm, 760nm, 785nm by power, 808nm, 830nm, the half of 880nm
Conductor Laser light source is mounted on rotatable light source bracket 2, and rotatable light source bracket 2 is connected by transmission mechanism with driving motor 1
It connects；Adjustment rotation light source bracket, by a light source incidence in the semiconductor laser light resource of several different wave lengths to chopper, if
The thang-kng frequency of chopper is put as f, wherein f=50~100Hz, the sample frequency of the first photodetector and the second electric explorer
All it is 2f；During chopper light transmission, the first photodetector is surveyed and the second photodetector is carried out at the same time luminous intensity measurement, the first photoelectricity
Detector test result is denoted as Vis+Vib, the second photodetector test result is denoted as Vic+VibcChopper is in the light；When, the first light
Electric explorer is surveyed and the second photodetector is still carried out at the same time luminous intensity measurement, and the first photodetector test result is signal at this time
The bias light hypermnesia of light is Vib, the second photodetector test result is that the bias light hypermnesia of reference light is Vibc, by adjusting two
Dimension scanning translation stage, the point by point scanning on large-area metal dielectric gratings surface, until sampled points all in bore are all swept
Trace record；Spectroscopical reflectivity is denoted as R, VisFor the letter light intensity after rejecting signal background light, VicTo reject reference light
Reference light light intensity after bias light,
Vis=(Vis+Vib)-Vib；Vic=(Vic+Vibc)-Vibc；
Then the diffraction efficiency of any point is on large-area metal dielectric gratings surface to be measured：
Driving motor controls rotatable light source bracket rotation, switches the semiconductor laser light resource of different wave length successively, repeats
Above-mentioned two-dimensional scan measuring process completes the large-area metal dielectric gratings under the semiconductor laser light source of different wave length
The measurement of diffraction efficiency.
Embodiment two：On the basis of embodiment one, spectroscope is polarization splitting prism, and transmitted light is TM polarised lights, is cut
Diaphragm is placed between wave device and the polarization splitting prism, in the polarization splitting prism and large-area metal deielectric-coating light to be measured
Half-wave plate is also placed between grid, TM light waves are converted into TE waves by half-wave plate.Device can be used for detection TE type large area at this time
Metal dielectric film grating diffraction efficiency.
Embodiment three：On the basis of embodiment one, first integral ball and the first photodetector are placed on automatically controlled angle
On turntable, during the semiconductor laser light resource of different wave length, meet dsin θ alwaysc-dsinθi=m λi, wherein flashlight incidence
Angle θc=53 °, periods of the d for grating, m=-1, λiFor semiconductor laser light resource wavelength.Flashlight incidence angle θc=53 ° are through profit
Special sieve angle is incident, and diffraction efficiency at this time is higher, and flashlight and diffraction light separation will not be in the light.
Example IV：The thang-kng frequency of the chopper described in embodiment one be f, the sample frequency of the first photodetector
For 2f, the sample frequency of the second electric explorer is 2f.
Claims (6)
1. a kind of device that large-area metal dielectric gratings diffraction efficiency measures, including two-dimensional scan translation stage, rotatable light
Source stent, driving motor, the semiconductor laser light resource of several different wave lengths, chopper, spectroscope, first integral ball, first
Photodetector, second integral ball, the second photodetector；
The semiconductor laser light resource of several the wherein described different wave lengths is mounted on the rotatable light source bracket, can be revolved
Turn light source bracket by transmission mechanism with the driving motor to be connected, the chopper is set gradually in light path, is divided
Light microscopic, wherein the glazed area of the chopper and the area equation that is in the light, incident light transmitted light conduct after the spectroscope
Flashlight is incident on large-area metal dielectric gratings surface to be measured, and what -1 order diffraction light entered first integral ball enters window,
The window that goes out of first integral ball places the first photodetector, and incident light is used as with reference to light by spectroscope back reflection light, enters
Second integral ball enters window, and second integral ball goes out the second photodetector of placement at window, wherein large-area metal to be measured
Dielectric gratings are placed on the two-dimensional scan translation stage.
2. the device that large-area metal dielectric gratings diffraction efficiency according to claim 1 measures, it is characterised in that institute
It states and is placed with diaphragm between chopper and the spectroscope.
3. the device that large-area metal dielectric gratings diffraction efficiency according to claim 1 measures, it is characterised in that institute
Spectroscope is stated as polarization splitting prism, is also placed between the polarization splitting prism and large-area metal dielectric gratings to be measured
Half-wave plate.
4. the device that the large-area metal dielectric gratings diffraction efficiency according to one of claims 1 to 3 measures, feature
It is that first integral ball and the first photodetector are placed on automatically controlled angle turntable, switches the semiconductor laser of different wave length
During light source, meet dsin θ alwaysc-dsinθi=m λi, periods of the wherein d for grating, θcLarge area to be measured is incident to for flashlight
The incident angle on metal dielectric film grating surface, θiFor -1 order diffraction angular m=-1, λiFor semiconductor laser light resource wavelength.
5. the device that the large-area metal dielectric gratings diffraction efficiency according to one of claims 1 to 3 measures, feature
The thang-kng frequency for being the chopper is f, and the sample frequency of the first photodetector is 2f, and the sampling of the second electric explorer is frequently
Rate is 2f.
6. the device that the large-area metal dielectric gratings diffraction efficiency according to one of claims 1 to 3 measures, feature
It is between first photodetector and the second photodetector to be connected by same switch.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107966276A (en) * | 2017-11-27 | 2018-04-27 | 苏州大学 | A kind of method and device of large-area wide grating belt diffraction efficiency measurement |
| CN109407365A (en) * | 2018-12-13 | 2019-03-01 | 中国科学院上海光学精密机械研究所 | The measuring device and method of liquid crystal grating device diffraction efficiency under laser action |
| CN110095948A (en) * | 2019-05-03 | 2019-08-06 | 南昌航空大学 | A kind of optical fibre device digital photolithography method based on combination DMD |
| CN110523656A (en) * | 2019-08-02 | 2019-12-03 | 深圳奥比中光科技有限公司 | A kind of DOE detection device and method |
| CN111006854A (en) * | 2019-12-25 | 2020-04-14 | 中国科学院光电技术研究所 | Device and method for testing diffraction efficiency of micro-nano structure lens |
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2017
- 2017-11-27 CN CN201721608951.2U patent/CN207515999U/en active Active
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107966276A (en) * | 2017-11-27 | 2018-04-27 | 苏州大学 | A kind of method and device of large-area wide grating belt diffraction efficiency measurement |
| CN107966276B (en) * | 2017-11-27 | 2019-08-02 | 苏州大学 | A kind of method and device of large-area wide grating belt diffraction efficiency measurement |
| CN109407365A (en) * | 2018-12-13 | 2019-03-01 | 中国科学院上海光学精密机械研究所 | The measuring device and method of liquid crystal grating device diffraction efficiency under laser action |
| CN110095948A (en) * | 2019-05-03 | 2019-08-06 | 南昌航空大学 | A kind of optical fibre device digital photolithography method based on combination DMD |
| CN110523656A (en) * | 2019-08-02 | 2019-12-03 | 深圳奥比中光科技有限公司 | A kind of DOE detection device and method |
| CN111006854A (en) * | 2019-12-25 | 2020-04-14 | 中国科学院光电技术研究所 | Device and method for testing diffraction efficiency of micro-nano structure lens |
| CN111006854B (en) * | 2019-12-25 | 2022-04-19 | 中国科学院光电技术研究所 | Device and method for testing diffraction efficiency of micro-nano structure lens |
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