CN107966276B - A kind of method and device of large-area wide grating belt diffraction efficiency measurement - Google Patents
A kind of method and device of large-area wide grating belt diffraction efficiency measurement Download PDFInfo
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- CN107966276B CN107966276B CN201711205141.7A CN201711205141A CN107966276B CN 107966276 B CN107966276 B CN 107966276B CN 201711205141 A CN201711205141 A CN 201711205141A CN 107966276 B CN107966276 B CN 107966276B
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Abstract
The invention discloses the measurement method and device of a kind of large-area wide grating belt diffraction efficiency, including semiconductor laser, chopper, detection photosystem, with reference to photosystem and Electro-Optical Sensor Set；The device uses double photo paths and chopper and the semiconductor laser light resource of multiple wavelength is incident on broadband grating surface, -1 grade of diffraction light of detection light system acquisition, and pass through two-dimensional scanning large-area wide grating belt, complete the measurement of the diffraction efficiency on entire large-area wide grating belt to be measured surface, inhibit laser power drift and the interference of environmental background light, while substantially increasing detection efficiency.
Description
Technical field
The present invention relates to the measurement methods and device of a kind of spectroscopy element, and in particular to arrives large-area wide grating belt diffraction
The measuring technique of efficiency.
Background technique
Large-area wide grating belt is widely used in strong laser system, super in the high power based on chirped pulse amplification technique
It plays a key effect in short-pulse laser.Large-area wide grating belt carries superelevation laser power in pulse compression process,
In order to reduce raster unit area laser power, it is necessary to increase the area of grating and increase the bandwidth of grating, usually require that broadband
The entire clear aperture of grating diffraction efficiency in bandwidth range is all larger than 90%.
The patent No. 201710271676.8 provides a kind of diffraction efficiency measurement method of broadband grating, using super continuous spectrums
Laser and acousto-optic filter combination provide wavelength continuously adjustable monochromatic source, and use two pacing amounts, and grating to be measured is not added
When first measure environmental background light, in addition when grating to be measured measure grating -1 grade of diffraction light.This scheme is for measuring large area
There are problems that measurement when the diffraction efficiency measurement of broadband grating, time-consuming, due to reducing light source stability after time of measuring length
The measurement error brought into, it is desirable to keep stablizing the light source of output, and long-time inner light source stable state in a long time
What kind of brings influence to have no way of finding out about it at all testing result.
Summary of the invention
The purpose of the present invention is to provide the test methods and device of a kind of large-area wide grating belt diffraction efficiency, solve existing
Time-consuming to the demanding problem of light source stability for measurement when having the large-area wide grating belt diffraction efficiency of technology.
The committed step of specific technical solution of the present invention is successively as follows:
A kind of measurement method of large-area wide grating belt diffraction efficiency, includes the following steps:
1) the step of building multi-wavelength testing light source: in the bandwidth range of large-area wide grating belt to be measured, by several
The semiconductor laser light resource of different wave length is mounted on rotatable light source bracket；Rotatable light source bracket is by transmission mechanism and driving
Motor is connected；
2) the step of building light path: setting gradually chopper, spectroscope in optical path, wherein the transparent surface of chopper
Long-pending and light-blocking area equation, incident light after spectroscope transmitted light as signal light with incidence angle θcIt is incident on large area to be measured
On the grating surface of broadband, -1 grade of diffraction angular is θiInto the window that enters of first integral ball, the window that goes out of first integral ball is put
The first photodetector is set, for incident light by spectroscope back reflection light as reference light, be directly entered second integral ball enters window
Mouthful, the second photodetector is placed in going out for second integral ball at window, wherein large-area wide grating belt to be measured is placed on two dimension and sweeps
It retouches on translation stage；
3) two-dimensional scanning measuring process: adjusting rotatable light source bracket, by the semiconductor laser light resource of several different wave lengths
In a light source incidence to chopper, the light passing frequency that chopper is arranged is f, the first photodetector and the second electric explorer
Sample frequency be all 2f；When chopper light transmission, the first photodetector is surveyed and the second photodetector measures simultaneously, the
One photodetector test result is denoted as Vis+Vib, the second photodetector test result is denoted as Vic+Vibc, when chopper is light-blocking,
First photodetector is surveyed and the second photodetector still measures simultaneously, and the first photodetector test result is letter at this time
The bias light of number light is denoted as Vib, the second photodetector test result is that the bias light of reference light is denoted as Vibc, pass through control two dimension
Translation stage point by point scanning on large-area wide grating belt surface is scanned, until all samplings in large-area wide grating belt bore to be measured
The all scanned record of point；
Spectroscopical reflectivity is denoted as R, VisTo reject the letter light intensity after signal background light, VicTo reject reference
Reference light light intensity after light bias light,
Vis=(Vis+Vib)-Vib；Vic=(Vic+Vibc)-Vibc；
Then on large-area wide grating belt to be measured surface any point diffraction efficiency are as follows:
4) driving motor controls rotatable light source bracket rotation, successively switches the semiconductor laser light resource of different wave length, weight
On multiple
The two-dimensional scanning measuring process stated completes the large-area wide grating belt under the semiconductor laser light source of different wave length
Diffraction
The measurement of efficiency.
Preferred embodiment: diaphragm is placed between chopper and spectroscope in above-mentioned technical proposal step 2).After placing diaphragm
The size that can control laser facula, the sampled point for preventing diffraction efficiency from measuring have the overlapping of hot spot, cause measurement result inaccurate
Really.
Spectroscope in above-mentioned technical proposal step 2) is polarization splitting prism, in the polarization splitting prism and big face to be measured
Half-wave plate is also placed between product broadband grating.Place after polarization spectroscope with polarization state that laser can be modulated after half-wave plate,
Broadband grating corresponding diffraction efficiency under two kinds of polarization states of TE and TM can be measured.
First integral ball and the first photodetector in above-mentioned technical proposal step 2) are placed on automatically controlled angle turntable
On, electronic angle turntable is controlled, so that meeting dsin θ always when the semiconductor laser light resource of switching different wave lengthc-dsinθi
=m λi, wherein d is the period of grating, m=-1, λiFor semiconductor laser light resource wavelength.Automatically controlled angle turntable can be convenient tune
The posture of whole first integral ball, so that the window that enters of first integral ball can face diffraction light when switching light sources with different wavelengths.
In step 3) described in above-mentioned technical proposal through control two-dimensional scanning translation stage on large-area wide grating belt surface
When point by point scanning, first horizontal sweep after having swept a line, continues to scan on, until large area broadband light to be measured after vertical direction line feed
The all scanned record of all sampled points in grid bore, when horizontal sweep, guarantee that each sample frequency using point reaches 2f.
Based on above-mentioned measurement method, a kind of measuring device of large-area wide grating belt diffraction efficiency is also provided.Concrete scheme
It is as follows: a kind of measuring device of large-area wide grating belt diffraction efficiency, including two-dimensional scanning translation stage, rotatable light source bracket,
Driving motor, the semiconductor laser light resource of several different wave lengths, chopper, spectroscope, first integral ball, the first photodetection
Device, second integral ball, the second photodetector；
Wherein the semiconductor laser light resource of several different wave lengths is mounted on the rotatable light source bracket,
Rotatable light source bracket is connected by transmission mechanism with the driving motor, and the copped wave is set gradually in light path
Device, spectroscope, wherein the glazed area of the chopper and light-blocking area equation, incident light transmitted light after the spectroscope
As signal light with incidence angle θcIt is incident on large-area wide grating belt to be measured surface, -1 grade of diffraction angular is θiInto first
Integrating sphere enters window, and the window that goes out of first integral ball places the first photodetector, and incident light passes through spectroscope back reflection light
As reference light, into the window that enters of second integral ball, the second photodetector is placed in going out for second integral ball at window, wherein
Large-area wide grating belt to be measured is placed on the two-dimensional scanning translation stage.
Preferred embodiment: diaphragm is placed between chopper and the spectroscope in above-mentioned technical proposal.
Spectroscope described in above-mentioned technical proposal is polarization splitting prism, in the polarization splitting prism and large-area wide to be measured
Half-wave plate is also placed between grating belt.
First integral ball and the first photodetector are placed on automatically controlled angle turntable in above-mentioned technical proposal, different waves
When long semiconductor laser light resource, meet dsin θ alwaysc-dsinθi=m λi, wherein d is the period of grating, m=-1, λiIt is half
Conductor Laser optical source wavelength.
The light passing frequency of chopper described in above-mentioned technical proposal is f, the first photodetector and the second photodetector
It is connected on same switch, and the sample frequency of the first photodetector and the second electric explorer is all 2f.First photoelectricity herein
Detector and the second photodetector are connected on same switch, facilitate realization synchronized sampling, the first photodetector of setting and
Second photodetector sample frequency is that the light passing frequency of chopper is 2 times of f, exactly needs to rotate a cycle in chopper
It is middle complete to it is light-blocking when with light transmission when data sampling.
Since above-mentioned preparation facilities uses, compared with the prior art, the invention has the following advantages: partly being led using multi-wavelength
Body laser replaces wideband light source, and measuring device price is cheap；Using chopper light and dark measurement in real time, the survey of half is saved
The time is measured, the requirement to light source long-time stability is reduced, improves the measurement efficiency of large-area wide grating belt diffraction efficiency.
Detailed description of the invention
Fig. 1: the device of large-area wide grating belt diffraction efficiency measurement；
Wherein 1: driving motor, 2: rotatable light source bracket, 3: chopper, 4: spectroscope, 5: first integral ball,
6: the first photodetectors, 7: second integral ball, 8: the second photodetectors, 9: large-area wide grating belt to be measured.
Specific embodiment
In order to illustrate more clearly of the technical solution of invention, it is further described with reference to the accompanying drawings and embodiments
Embodiment one:
A kind of measurement method of large-area wide grating belt diffraction efficiency, as shown in Figure 1,1) building multi-wavelength testing light source
Step: in the bandwidth range of large-area wide grating belt, by power be 100mw-1000mw and wavelength is respectively 730nm,
The semiconductor laser light resource of 760nm, 785nm, 808nm, 830nm, 880nm are mounted on rotatable light source bracket 2, rotatable light
Source bracket 2 is connected by transmission mechanism with driving motor 1；
2) the step of building light path: chopper 3, spectroscope 4 are set gradually in optical path, wherein the light transmission of chopper
Area and light-blocking area equation, incident light after spectroscope transmitted light as signal light with incidence angle θcIt is incident on big face to be measured
On product broadband grating surface 9, -1 grade of diffraction angular is θiInto the window that enters of first integral ball 5, the exit window of first integral ball
Mouth places the first photodetector 6, and incident light, as reference light, is directly entered second integral ball 7 by spectroscope back reflection light
Enter window, the second photodetector 8 is placed in going out for second integral ball at window, wherein large-area wide grating belt to be measured is placed on
On two-dimensional scanning translation stage；
3) two-dimensional scanning measuring process: adjusting rotatable light source bracket, by the semiconductor laser light resource of several different wave lengths
In a light source incidence to chopper, the light passing frequency that chopper is arranged is f, and wherein f=50~100Hz, the first photoelectricity are visited
The sample frequency for surveying device and the second electric explorer is all 2f；When chopper light transmission, the first photodetector is surveyed and the second photoelectricity is visited
It surveys device and carries out luminous intensity measurement simultaneously, the first photodetector test result is denoted as Vis+Vib, the second photodetector test result
It is denoted as Vic+Vibc；When chopper is light-blocking, the first photodetector is surveyed and the second photodetector still carries out luminous intensity measurement simultaneously, this
When the first photodetector test result be the bias light hypermnesia of signal light be Vib, the second photodetector test result is reference
The bias light hypermnesia of light is Vibc, by controlling the point by point scanning on large-area wide grating belt surface of two-dimensional scanning translation stage, until
The all scanned record of all sampled points in large-area wide grating belt bore to be measured；Spectroscopical reflectivity is denoted as R, VisTo pick
Except the letter light intensity after signal background light, VicTo reject the reference light light intensity after reference light bias light,
Vis=(Vis+Vib)-Vib；Vic=(Vic+Vibc)-Vibc；
Then on large-area wide grating belt to be measured surface any point diffraction efficiency are as follows:
4) driving motor controls rotatable light source bracket rotation, successively switches the semiconductor laser light resource of different wave length, weight
Multiple above-mentioned two-dimensional scanning measuring process, completes the large-area wide grating belt diffraction under the semiconductor laser light source of different wave length
The measurement of efficiency.
Embodiment two:
On the basis of example 1, spectroscope is polarization splitting prism, and transmitted light is TM polarised light, chopper with it is described
It is placed with diaphragm between polarization splitting prism, half is also placed between the polarization splitting prism and large-area wide grating belt to be measured
Wave plate, TM light wave are converted into TE wave by half-wave plate.Device can be used for detecting TE type large-area wide grating belt diffraction efficiency at this time.
Embodiment three:
On the basis of example 1, first integral ball and the first photodetector are placed on automatically controlled angle turntable,
When the semiconductor laser light resource of different wave length, meet dsin θ alwaysc-dsinθi=m λi, wherein signal light incidence angle θc=53 °,
D is the period of grating, m=-1, λiFor semiconductor laser light resource wavelength.Signal light incidence angle θc=53 ° are to enter through Littrow angle
It penetrates, diffraction efficiency at this time is higher, and signal light and diffraction light separation will not be light-blocking.
Example IV:
A kind of measuring device of large-area wide grating belt diffraction efficiency, including two-dimensional scanning translation stage, rotatable light source branch
Frame 2, driving motor 1, the semiconductor laser light resource of several different wave lengths, chopper 3, spectroscope 4, first integral ball 5, first
Photodetector 6, second integral ball 7, the second photodetector 8；
Wherein the semiconductor laser light resource of several different wave lengths is mounted on the rotatable light source bracket,
Rotatable light source bracket 2 is connected by transmission mechanism with the driving motor 1, and the copped wave is set gradually in light path
Device, spectroscope, wherein the glazed area of the chopper and light-blocking area equation, incident light transmitted light after the spectroscope
As test light with incidence angle θcIt is incident on large-area wide grating belt to be measured surface, -1 grade of diffraction angular is θiInto first
Integrating sphere enters window, and the window that goes out of first integral ball places the first photodetector, and incident light passes through spectroscope back reflection light
As reference light, into the window that enters of second integral ball, the second photodetector is placed in going out for second integral ball at window, wherein
Large-area wide grating belt to be measured is placed on the two-dimensional scanning translation stage.
Embodiment five:
On the basis of example IV, spectroscope is polarization splitting prism, between chopper and the polarization splitting prism
It is placed with diaphragm, is also placed with half-wave plate between the polarization splitting prism and large-area wide grating belt to be measured.
Embodiment six:
On the basis of example IV, first integral ball and the first photodetector are placed on automatically controlled angle turntable,
When the semiconductor laser light resource of different wave length, meet dsin θ alwaysc-dsinθi=m λi, wherein d be grating period, m=-1,
λiFor semiconductor laser light resource wavelength.
Embodiment seven:
The light passing frequency of the chopper described in example IV is f, and the sample frequency of the first photodetector is 2f, second
The sample frequency of electric explorer is 2f.
Claims (9)
1. a kind of measurement method of large-area wide grating belt diffraction efficiency, includes the following steps:
1) semiconductor laser light resource of several different wave lengths the step of building multi-wavelength testing light source: is mounted on rotatable light
On the bracket of source, rotatable light source bracket is connected by transmission mechanism with driving motor；
2) the step of building light path: setting gradually chopper, spectroscope in optical path, wherein the glazed area of chopper and
Light-blocking area equation, incident light transmitted light after spectroscope as signal light are incident on large-area wide grating belt to be measured surface
On, -1 grade of diffraction light enters the window that enters of first integral ball, and the window that goes out of first integral ball places the first photodetector, incident
Light, as reference light, is directly entered the window that enters of second integral ball by spectroscope back reflection light, and second integral ball goes out window
The second photodetector is placed at place, wherein large-area wide grating belt to be measured is placed on two-dimensional scanning translation stage；
3) two-dimensional scanning measuring process: adjusting rotatable light source bracket, will be in the semiconductor laser light resource of several different wave lengths
For one light source incidence to chopper, the light passing frequency that chopper is arranged is f, and the first photodetector and the second electric explorer are adopted
Sample frequency is all 2f；When chopper light transmission, the first photodetector is surveyed and the second photodetector is simultaneously to position light intensity
It measures, when chopper is light-blocking, the first photodetector is surveyed and the second photodetector simultaneously carries out position light intensity
Measurement is surveyed and the survey in chopper light transmission and when chopper is light-blocking respectively of the second photodetector by the first photodetector
Test result finds out the diffraction efficiency of any point on large-area wide grating belt to be measured surface；By adjusting two-dimensional scanning translation stage,
Point by point scanning on large-area wide grating belt surface, until all scanned note of all sampled points in large-area wide grating belt bore to be measured
Record；
4) driving motor controls rotatable light source bracket rotation, successively switches the semiconductor laser light resource of different wave length, repeats to walk
It is rapid 3), complete the measurement of the large-area wide grating belt diffraction efficiency under the semiconductor laser light source of different wave length.
2. the measurement method of large-area wide grating belt diffraction efficiency according to claim 1, it is characterised in that the step
2) diaphragm is placed between the chopper and spectroscope in.
3. the measurement method of large-area wide grating belt diffraction efficiency according to claim 1, it is characterised in that the step
2) spectroscope in is polarization splitting prism, and half is also placed between the polarization splitting prism and large-area wide grating belt to be measured
Wave plate.
4. the measurement method of large-area wide grating belt diffraction efficiency described according to claim 1~one of 3, it is characterised in that institute
The first integral ball and the first photodetector stated in step 2) are placed on automatically controlled angle turntable, switch the half of different wave length
When conductor Laser light source, meet dsin θ alwaysc-dsinθi=m λi, wherein d is the period of grating, θcFor signal light be incident to
Survey the incident angle on large-area wide grating belt surface, θiFor -1 grade of diffraction angular, m=-1, λiFor semiconductor laser light resource wave
It is long.
5. the measurement method of large-area wide grating belt diffraction efficiency described according to claim 1~one of 3, it is characterised in that institute
When stating chopper light transmission in step 3): the first photodetector test result is denoted as Vis+Vib, the second photodetector test knot
Fruit is denoted as Vic+Vibc；When chopper is light-blocking: the first photodetector test result is that the bias light of signal light is denoted as Vib, second
Photodetector test result is that the bias light of reference light is denoted as Vibc；Spectroscopical reflectivity is denoted as R, VisTo reject letter
Letter light intensity after number bias light, VicTo reject the reference light light intensity after reference light bias light,
Vis=(Vis+Vib)-Vib；Vic=(Vic+Vibc)-Vibc；
Then on large-area wide grating belt to be measured surface any point diffraction efficiency are as follows:
6. a kind of measuring device of large-area wide grating belt diffraction efficiency, including two-dimensional scanning translation stage, rotatable light source bracket,
Driving motor, the semiconductor laser light resource of several different wave lengths, chopper, spectroscope, first integral ball, the first photodetection
Device, second integral ball, the second photodetector；
Wherein the semiconductor laser light resource of several different wave lengths is mounted on the rotatable light source bracket, can be revolved
Turn light source bracket and be connected by transmission mechanism with the driving motor, the chopper is set gradually in light path, is divided
Light microscopic, wherein the glazed area of the chopper and light-blocking area equation, incident light transmitted light conduct after the spectroscope
Signal light is incident on large-area wide grating belt to be measured surface, and -1 grade of diffraction light enters the window that enters of first integral ball, the first product
The window that goes out of bulb separation places the first photodetector, and incident light passes through spectroscope back reflection light as reference light, into the second product
Bulb separation enters window, and the second photodetector is placed in going out for second integral ball at window, wherein large-area wide grating belt to be measured is put
It sets on the two-dimensional scanning translation stage；
The light passing frequency of the chopper is f, and the first photodetector and the second photodetector are connected on same switch, and
The sample frequency of first photodetector and the second electric explorer is all 2f.
7. the measuring device of large-area wide grating belt diffraction efficiency according to claim 6, it is characterised in that the copped wave
Diaphragm is placed between device and the spectroscope.
8. the measuring device of large-area wide grating belt diffraction efficiency according to claim 6, it is characterised in that the light splitting
Mirror is polarization splitting prism, is also placed with half-wave plate between the polarization splitting prism and large-area wide grating belt to be measured.
9. the measuring device of large-area wide grating belt diffraction efficiency according to one of claim 6~8, it is characterised in that the
One integrating sphere and the first photodetector are placed on automatically controlled angle turntable, switch the semiconductor laser light resource of different wave length
When, meet dsin θ alwaysc-dsinθi=m λi, wherein d is the period of grating, θcLarge-area wide band to be measured is incident to for signal light
The incident angle of grating surface, θiFor -1 grade of diffraction angular m=-1, λiFor semiconductor laser light resource wavelength.
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