CN207458609U - Transparent conducting film and touch screen - Google Patents
Transparent conducting film and touch screen Download PDFInfo
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- CN207458609U CN207458609U CN201721221175.0U CN201721221175U CN207458609U CN 207458609 U CN207458609 U CN 207458609U CN 201721221175 U CN201721221175 U CN 201721221175U CN 207458609 U CN207458609 U CN 207458609U
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Abstract
The utility model is related to a kind of transparent conducting films, the first hard conating, the first transparency conducting layer and the first metal layer including the first surface that is sequentially formed in base material and the second hard conating, the second transparency conducting layer and second metal layer for being sequentially formed in base material second surface.First hard conating and/or the second hard coating surface coining are in non-flat configuration, so that the surface of the first metal layer and/or second metal layer forms embossed surface structure.Embossed surface structure is identical with the surface texture of non-flat configuration.Therefore, when crimping above-mentioned transparent conducting film, multi-surface patterned structure can make to form point contact between two neighboring metal layer, so as to prevent that its is inter-adhesive.Moreover, when producing above-mentioned transparent conducting film, only need to non-flat configuration be formed by coining, without being added the operations such as particle.Therefore, the production efficiency of above-mentioned transparent conducting film is effectively promoted.In addition, the utility model also provides a kind of touch screen.
Description
Technical field
The utility model is related to capacitance type touch control screen technical field, more particularly to a kind of transparent conducting film and touch-control
Screen.
Background technology
Transparent conducting film is the core element of capacitance type touch control screen.With the rapid development of intelligent terminal, to transparent
The demand of conductive membrane is also increasingly to increase.Transparent conducting film generally comprises base material and is arranged at the hard of base material both sides
Coating, conductive layer and metal layer.At present, since amorphism thin polymer film is compared with crystalline polymer film, have two-fold
Penetrate the advantages of rate is less and uniform, therefore the base material that most of transparent conductive film is formed using armorphous polymer thin film.
Amorphism thin polymer film is more fragile than crystalline polymer film, and surface is easier to be damaged.It is crimping
Transparent conducting film makes it when being tubular, can there are the metal layers of adjacent transparent conductive film to generate adhesion and crimping each other
The problem of.Therefore, occur adding particle in hard conating, so that layer on surface of metal forms the transparent conducting film of protrusion.
Protrusion can make adjacent metal layer form point contact, so as to avoid sticking together and crimp.
Therefore, need to prepare particle in advance before conductive film preparation, and particle is added to hard painting in preparation process
In layer.However, protrusion distribution density and height of projection must be fulfilled for certain condition could be so that conductive film possesses resist blocking and that
Effect.Therefore, during particle is added to hard conating, it is also necessary to distribution density, height of projection to particle etc. into
Row control, this is complex by the production technology for causing conductive film, and production efficiency is not high.
Utility model content
Based on this, it is necessary to be asked for the existing transparent conducting film production efficiency with resist blocking and that is not high
Topic, provides a kind of transparent conducting film and touch screen that can effectively improve production efficiency.
A kind of transparent conducting film, including：
Base material, including the first surface and second surface being oppositely arranged；
It is sequentially formed in the first hard conating, the first transparency conducting layer and the first metal layer of the first surface；
It is sequentially formed in the second hard conating, the second transparency conducting layer and second metal layer of the second surface；
The surface imprint of first hard conating and/or second hard conating is in non-flat configuration, first metal
The surface of layer and/or the second metal layer forms embossed surface structure；
Wherein, the scope of the embossed surface structure covers the first metal layer and/or the table of the second metal layer
Face.
The non-flat configuration that coining is formed can make the surface of the first metal layer and/or second metal layer form embossed surface knot
Structure, so as to play the role of resist blocking and that.Moreover, when producing above-mentioned transparent conducting film, the need to be only made by way of coining
The surface of one hard conating and/or the second hard conating is in non-flat configuration, without being added the operations such as particle, so that
The production efficiency for obtaining transparent conducting film is effectively promoted.
In one of the embodiments, the embossed surface structure includes multiple protrusions being spaced apart, and the protrusion
Height be 0.05 to 2 μm.
The height of protrusion refers to the distance from wave crest to trough in embossed surface structure (in Fig. 2 shown in h).Wherein, it is convex
The height risen is related with coining degree.The height of protrusion is higher, then resist blocking and that effect is more preferable, but accordingly caused by hard conating
Damage is bigger, in turn results in the yield of product and reduces.When the height of protrusion is 0.05 to 2 μm, it can ensure resist blocking and that effect
Meanwhile make the production yield of transparent conducting film higher.
In one of the embodiments, the top surface of the protrusion is in plane, and the surface of the top surface and the base material is put down
Row.
When crimping transparent conducting film, raised top surface contacts with each other.Since it is in plane, therefore it is right to reduce protrusion
The pressure that layer on surface of metal generates, hinders transparent conducting film to prevent stopping loss.
In one of the embodiments, the protrusion is in cube shaped or prismatic table shape.
Cube shaped or prismatic table shape convex surfaces are regular plane, and are in the angle of the identical number of degrees between face and face.
Therefore, the deformation of light path is smaller when light passes through the embossed surface structure comprising multiple protrusions, so as to be conducive to improve transparent lead
The optical effect of electric thin film.
In one of the embodiments, the top surface of the protrusion is in cambered surface, and the top surface is backwards to the surface of the base material
Recess.
When crimping transparent conducting film, raised top surface contacts with each other.Since it is in cambered surface, therefore it is right to reduce protrusion
The pressure that layer on surface of metal generates, hinders transparent conducting film to prevent stopping loss.
In one of the embodiments, the protrusion is hemispherical.
The surface of hemispheric protrusion is hemisphere face, and hemisphere face is symmetrical structure.When light is through hemispheric protrusion,
The propagation path of its light is reflected with specific rule.And according to the specific rule, then it is convenient for the propagation road to light
Footpath is adjusted, and then is conducive to improve the optical effect of transparent conducting film.
In one of the embodiments, the distance between two neighboring described protrusion is more than the two of the raised lateral dimension
Times.
At this point, adjacent embossed surface structure can be prevented to be mutually twisted.Moreover, when the distance between two neighboring protrusion reaches
During to twice of own dimensions, the light that is emitted from two protrusions interfere it is smaller, so as to further improve optics effect
Fruit.
Above-mentioned transparent conducting film, the first metal layer and/or second metal layer can be made by imprinting the non-flat configuration of formation
Surface formed embossed surface structure.Embossed surface structure is identical with the surface texture of non-flat configuration.Therefore, it is above-mentioned in curling
During transparent conducting film, multi-surface patterned structure can make to form point contact between two neighboring metal layer, so as to prevent its phase
Mutual adhesion.Moreover, when producing above-mentioned transparent conducting film, the first hard conating and/or the need to be only made by way of coining
The surface of two hard conatings is in non-flat configuration, without being added the operations such as particle.Therefore, above-mentioned transparent conductivity is thin
The production efficiency of film is effectively promoted.
A kind of transparent conducting film, including：
Base material, including the first surface and second surface being oppositely arranged；
It is sequentially formed in the first hard conating, the first optical layer, the first transparency conducting layer and the first gold medal of the first surface
Belong to layer；
It is sequentially formed in the second hard conating, the second optical layer, the second transparency conducting layer and the second gold medal of the second surface
Belong to layer；
The surface imprint of first optical layer and/or second optical layer is in non-flat configuration, with described first
The surface of metal layer and/or the second metal layer forms embossed surface structure；
Wherein, the scope of the embossed surface structure covers the first metal layer and/or the table of the second metal layer
Face.
Above-mentioned transparent conducting film, the first metal layer and/or second metal layer can be made by imprinting the non-flat configuration of formation
Surface formed embossed surface structure.Embossed surface structure is identical with the surface texture of non-flat configuration.Therefore, it is above-mentioned in curling
During transparent conducting film, multi-surface patterned structure can make to form point contact between two neighboring metal layer, so as to prevent its phase
Mutual adhesion.Moreover, when producing transparent conducting film, the first hard conating and/or second need to be only made by way of coining firmly
The surface of coating is in non-flat configuration, without being added the operations such as particle.Therefore, the production of transparent conducting film
Efficiency is effectively promoted.
A kind of touch screen, the touch screen are made as the transparent conducting film any one of above preferred embodiment
Into the touch screen includes Touch Zone and lead district, and the first metal layer and the second metal layer are located at the lead district；
The Touch Zone include by first transparency conducting layer first electrode that forms of etching and by the etching of the second transparency conducting layer and
Into second electrode；The lead district is included by the first metal layer and the first transparency conducting layer quilt positioned at the lead district
It etches the first lead formed and is etched shape by the second metal layer and positioned at the second transparency conducting layer of the lead district
Into the second lead.
In above-mentioned touch screen, by the first metal layer, second metal layer, the first transparency conducting layer and the second transparency conducting layer
Directly etching obtains the first lead and the second lead.It is therefore not necessary to it is formed and first electrode and the second electricity by silk-screen mode again
The lead of pole electrical connection.Compared with traditional touch screen, due to without silk-screen, the contact conductor directly formed by yellow light processing procedure
Width can further reduce, therefore touch screen has narrow frame.
Description of the drawings
Fig. 1 is the stepped construction schematic diagram of transparent conducting film in the utility model embodiment one；
Fig. 2 is the enlarged drawing of the local A of transparent conducting film shown in Fig. 1；
Fig. 3 is the stepped construction schematic diagram of transparent conducting film in the utility model embodiment two；
Fig. 4 is the stepped construction schematic diagram of transparent conducting film in the utility model embodiment three；
Fig. 5 is the stepped construction schematic diagram of touch screen in the utility model preferred embodiment.
Specific embodiment
For the ease of understanding the utility model, the utility model is more fully retouched below with reference to relevant drawings
It states.The preferred embodiment of the utility model is given in attached drawing.But the utility model can come in many different forms
It realizes, however it is not limited to embodiment described herein.On the contrary, the purpose for providing these embodiments makes to the utility model
The understanding of disclosure more thorough and comprehensive.
It should be noted that when element is referred to as " being fixed on " another element, it can be directly on another element
Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it can be directly connected to
To another element or it may be simultaneously present centering elements.Term as used herein " vertical ", " horizontal ", " left side ",
" right side " and similar statement are for illustrative purposes only.
Unless otherwise defined, all of technologies and scientific terms used here by the article is led with belonging to the technology of the utility model
The normally understood meaning of technical staff in domain is identical.It is simply in the term used in the description of the utility model herein
The purpose of description specific embodiment, it is not intended that in limitation the utility model.Term as used herein " and/or " include
The arbitrary and all combination of one or more relevant Listed Items.
It please refers to Fig.1 and Fig. 2, the transparent conducting film 10 in the utility model embodiment one includes base material 11, first
Hard conating 12, the first transparency conducting layer 13, the first metal layer 14, the second hard conating 22, the second transparency conducting layer 23 and the second gold medal
Belong to layer 24.
Base material 11 includes the first surface (upper surface shown in Fig. 1) being oppositely arranged and second surface (lower surface shown in Fig. 1).
Base material 11 is formed by amorphism thin polymer film.Since amorphism thin polymer film is smaller simultaneously than crystalline polymer film birefringence
And uniformly, the uneven color in the transparent conducting film 10 of the utility model can be eliminated.For the amorphous of the utility model
Property thin polymer film face in birefringence be preferably 0~0.001, further preferably 0~0.0005.It is new for this practicality
The deviation of birefringence in the face of the amorphism thin polymer film of type is preferably less than 0.0005, and further preferably 0.0003
Below.
Foregoing birefringence and its deviation can be reached by selecting the amorphism thin polymer film of suitable species.Specifically
In the present embodiment, base material 11 is polycyclic alkene or makrolon or pet film.The two types
Film can meet the requirement of birefringence and its deviation.The thickness of the base material 11 formed by amorphism thin polymer film is 20 μm
~200 μm.
First hard conating 12, the first transparency conducting layer 13 and the first metal layer 14 are sequentially formed in the first table of base material 11
Face.Second hard conating 22, the second transparency conducting layer 23 and second metal layer 24 are sequentially formed in the second surface of base material 11.Its
In：
First hard conating 12 plays a protective role to the first surface of base material 11.First hard conating 12 includes binding agent tree
Fat.The binder resin includes the hardening resin composition for example based on ultraviolet light, electron ray.Hardening resin composition
Preferably comprise polymer obtained from glycidyl acrylate based polymer carries out addition reaction with acrylic acid.Alternatively, cure
Property resin combination preferably comprises polyfunctional acrylic ester polymer (pentaerythrite, dipentaerythritol etc.).Curable resin group
It closes object and also includes polymerization initiator.
First transparency conducting layer 13 is formed at the surface of the first hard conating 12.First transparency conducting layer 13 is by visible region
Sheet resistance value (the unit of transmissivity height (more than 80%) and per unit area in domain (380nm~780nm)：Ω/m2) be
500Ω/m2Following layer is formed.Preferred 15nm~the 100nm of thickness of first transparency conducting layer 13, more preferably 15nm~
50nm.First transparency conducting layer 13 is for example by indium tin oxide (ITO), indium tin oxide or indium oxide-zinc oxide composites
Any formation.
The first metal layer 14 is formed on the surface of the first transparency conducting layer 13.The first metal layer 14 is in the utility model
When transparent conducting film is used for such as touch panel, connected up for being formed in the outside of touch input area.On forming the
The material of one metal layer 15, representational is copper, silver, it is possible to use the arbitrary metal of excellent electric conductivity in addition.
The thickness of the first metal layer 14 is preferably 50nm~500nm, more preferably 100nm~300nm.
Further, the second hard conating 22, the second transparency conducting layer 23 and second metal layer 24 respectively with the first hard conating
12nd, the film layer structure of the first transparency conducting layer 13 and the first metal layer 14, function and material composition are identical, therefore no longer superfluous herein
It states.
In addition, the surface imprint of the first hard conating 12 and/or the second hard conating 22 is in non-flat configuration 15, the first metal layer
14 and/or the surface of second metal layer 24 form embossed surface structure 16.
Wherein, the scope covering the first metal layer 14 of embossed surface structure 16 and/or the surface of second metal layer 24.
Specifically, non-flat configuration 15 refers to that surface has the region of concave-convex relief fabric.By on 11 surface of base material
Applied adhesive resin simultaneously makes its curing, can obtain the first hard conating 12 and the second hard conating 22 (being collectively referred to as hard conating below).When
It when hard conating is in semi-cured state, is imprinted using corresponding mold, it is in non-flat configuration 15 that can make hard coating surface.
Due to the surface that the scope of non-flat configuration 15 is entire first hard conating, 12 or second hard conating 22, therefore surface is pressed
The scope covering the first metal layer 14 of floral structure 16 and/or the surface of second metal layer 24.Wherein, non-flat configuration 15 can only shape
Into in the surface of the first hard conating 12 or the second hard conating 22, the transparent of embossed surface structure 16 is formed with so as to obtaining single side and is led
Electric thin film 10；Non- flat configuration 15 also can be formed at the surface of the first hard conating 12, be also formed in the second hard conating 22
Surface, so as to obtain the two-sided transparent conducting film 10 for being formed with embossed surface structure 16.
It is illustrated by taking the first hard conating 12 as an example：
It is in non-flat configuration 15 by the surface for imprinting the first hard conating 12.Due to the first transparency conducting layer 13 and
One metal layer 14 is cascading the surface with the first hard conating 12, therefore the surface shape of the two and the table of the first hard conating 12
Face shape is identical.Therefore, embossed surface structure 16 can be formed on the surface of the first metal layer 14.Wherein, embossed surface structure 16
Identical with the structure of non-flat configuration 15, surface is respectively provided with concave-convex relief fabric.
Similarly, when the surface of the second hard conating 22 is in non-flat configuration 15, the surface of second metal layer 24 can also be formed
Embossed surface structure 16.
Using roll-to-roll process (roll to roll process) come when manufacturing the transparent conductive film 10 of strip, by
In non-flat configuration 15 surface of the first metal layer 14 and/or second metal layer 24 is made to form embossed surface structure 16, and surface
The scope covering the first metal layer 14 of patterned structure 16 and/or the surface of second metal layer 24.Therefore, in curling transparent conductivity
During film 10, embossed surface structure 16 can make to form point contact between two neighboring metal layer, so as to prevent its inter-adhesive, pressure
It connects.
Moreover, when producing transparent conducting film 10, the first hard conating 12 and/or the need to be only made by way of coining
The surface of two hard conatings 22 is in non-flat configuration 15, without being added the operations such as particle.Therefore, above-mentioned electrically conducting transparent
The production efficiency of property film 10 is effectively promoted.
In the present embodiment, the surface of the first hard conating 12 and the second hard conating 22 is imprinted in non-flat configuration 15, with
Embossed surface structure 16 is respectively formed on the surface of the first metal layer 14 and second metal layer 24.
That is, the two-sided of obtained transparent conducting film 10 is each formed with embossed surface structure 16.Therefore, exist
When crimping transparent conducting film 10, the point position of point contact is increased between adjacent two metal layers, therefore its resist blocking and that, resistance to compression connect
Effect it is more preferable.
In the present embodiment, embossed surface structure 16 includes multiple protrusions 161 being spaced apart, and the height of protrusion 161
For 0.05 to 2 μm.
Specifically, the height of protrusion 161 refers to distance (the h institutes in Fig. 2 in embossed surface structure 16 from wave crest to trough
Show).The formation of protrusion 161 can be with the various shapes such as indention, square, truncated cone-shaped.Wherein, the height and coining of protrusion 161
Degree is related.The height of protrusion 161 is higher, then resist blocking and that effect is more preferable, but damage accordingly caused by hard conating it is bigger, into
And the yield of product is caused to reduce.When the height of protrusion 161 is 0.05 to 2 μm, can make while resist blocking and that effect is ensured
The production yield of bright conductive membrane 10 is higher.
In the present embodiment, the top surface of protrusion 161 is in plane, and top surface is parallel with 11 surfaces of base material.
Specifically, the top surface of protrusion 161 refers to protrusion 161 backwards to the surface of base material 11.Since top surface is in plane.Cause
This, when crimping transparent conducting film 10, can reduce the pressure that 161 pairs of layer on surface of metal of protrusion generate, saturating to prevent stopping loss wound
Bright conductive membrane 10.
Further, protrusion 161 is in cube shaped or prismatic table shape.
Cube can be square, rectangle, and prismatic table shape can be truncated rectangular pyramids, six terrace with edges etc..Cube shaped or rib
The protrusion 161 of platform shape can meet the condition for making the top surface of protrusion 161 in plane.It is simultaneously as cube shaped or prismatic table shape convex
Plane of 161 surfaces for rule is played, and is in the angle of the identical number of degrees between face and face.Therefore, light passes through and includes multiple protrusions
Embossed surface structure 16 when light path deformation it is smaller, so as to be conducive to improve transparent conducting film 10 optical effect.
In another embodiment, the top surface of protrusion 161 is in cambered surface, and top surface is backwards to the surface indentation of base material 11.
When crimping transparent conducting film 10, the top surface of protrusion 161 contacts with each other.Since it is in cambered surface, therefore can reduce
The pressure that 161 pairs of layer on surface of metal of protrusion generate, hinders transparent conducting film 10 to prevent stopping loss.
In one of the embodiments, protrusion 161 is hemispherical.
Hemispheric raised 161 surface is hemisphere face, and hemisphere face is symmetrical structure.Light passes through hemispheric protrusion
When, the propagation path of light is reflected with specific rule.And according to the specific rule, then convenient for the propagation to light
Path is adjusted, and then is conducive to improve the optical effect of transparent conducting film 10.
In the present embodiment, two neighboring raised the distance between 161 are more than twice of raised 161 lateral dimensions.
Specifically, the lateral dimension of protrusion 161 refers to the size on raised 161 directions.Two protrusions 161 it
Between distance when being more than twice of its lateral dimension, adjacent embossed surface structure 16 can be prevented to be mutually twisted.Moreover, from two
The light that is emitted interferes smaller in protrusion 161, so as to further improve optical effect.
Referring to Fig. 3, in embodiment two, the surface imprint of any of the first hard conating 12 and second hard conating 22 is in
Non- flat configuration 15, to form embossed surface structure 16 on the surface of the first metal layer 14 or second metal layer 24.
That is, in process, it is only necessary to any one in the first metal layer 14 or second metal layer 24 into
Row coining manipulation, so as to further promote processing efficiency.Moreover, even if only single side is formed with embossed surface structure 16,
Transparent conducting film 10 still has preferable resist blocking and that effect.
Wherein, 10 other structures of transparent conducting film in embodiment two and the transparent conducting film in embodiment one
10 is identical, therefore details are not described herein.
Above-mentioned transparent conducting film 10, the first metal layer 14 and/or second can be made by imprinting the non-flat configuration 15 of formation
The surface of metal layer 24 forms embossed surface structure 16.Embossed surface structure 16 is identical with the surface texture of non-flat configuration 15.
Therefore, when crimping above-mentioned transparent conducting film 10, multi-surface patterned structure 16 can make to be formed between two neighboring metal layer
Point contact, so as to prevent that its is inter-adhesive.Moreover, when producing transparent conducting film 10, need to only be made by way of coining
The surface of first hard conating 12 and/or the second hard conating 24 is in non-flat configuration 15, without being added the behaviour such as particle
Make.Therefore, the production efficiency of transparent conducting film 10 is effectively promoted.
Referring to Fig. 4, the transparent conducting film 20 in the utility model embodiment three includes base material 201, sequentially forms
In the first hard conating 212 of 201 first surface of base material, the first optical layer 213, the first transparency conducting layer 214 and the first metal layer
215th, the second hard conating 222, the second optical layer 223, the second transparency conducting layer 224 of 201 second surface of base material are sequentially formed in
And second metal layer 225.
The surface imprint of first optical layer 213 and/or the second optical layer 223 is in non-flat configuration 25, in the first metal
The surface of layer 215 and/or second metal layer 225 forms embossed surface structure 26.
Wherein, the scope covering the first metal layer 215 of embossed surface structure 26 and/or the surface of second metal layer 225.
Transparent conducting film 20 and the difference of the transparent conducting film 10 in embodiment one in embodiment three only exist
In：Have additional the first optical layer 213 and the second optical layer 223, and non-flat configuration 25 be formed at the first optical layer 213 and/or
The surface of second optical layer 223.
Wherein, the first hard conating 212, the first transparency conducting layer 214,215 and second hard conating 222 of the first metal layer,
Second transparency conducting layer 224 and structure, composition and the layered relationship of second metal layer 225 and the electrically conducting transparent in embodiment one
Property film 10 is identical, therefore details are not described herein.
Above-mentioned transparent conducting film 20, the first metal layer 215 and/or second can be made by imprinting the non-flat configuration 25 of formation
The surface of metal layer 225 forms embossed surface structure 26.Embossed surface structure 26 is identical with the surface texture of non-flat configuration 25.
Therefore, when crimping above-mentioned transparent conducting film 20, multi-surface patterned structure 26 can make to be formed between two neighboring metal layer
Point contact, so as to prevent that its is inter-adhesive.Moreover, when producing transparent conducting film 20, need to only be made by way of coining
The surface of first hard conating 212 and/or the second hard conating 222 is in non-flat configuration 25, without being added particle etc.
Operation.Therefore, the production efficiency of transparent conducting film 20 is effectively promoted.
In addition, the utility model also provides a kind of touch screen.Please refer to fig. 5, in the utility model preferred embodiment
Touch screen 200 as made by the transparent conducting film 10 in above-described embodiment.Wherein：
Touch screen 200 includes Touch Zone 210 and lead district 220.Specifically, Touch Zone 210 is located in touch screen 200
Portion, and lead district 220 is then around the circumferentially disposed of Touch Zone 210.The first metal layer 14 and second metal layer 24 are located at lead district
220。
Touch Zone 210 includes first electrode 211 and second electrode 212.Wherein, first electrode 211 is by the first electrically conducting transparent
Layer 13 etches；Second electrode 212 is etched by the second transparency conducting layer 23.First electrode 211 and second electrode 212 are lost
It is carved into electrode pattern.Specifically, electrode pattern is general elongated and intersects vertically in latticed, opposite first electrode 211
And second electrode 212 forms the two poles of the earth of capacitance structure.
Lead district 220 includes the first lead 221 and the second lead 222.First lead 221 is by the first metal layer 14 and is located at
First transparency conducting layer 13 of lead district 220 is etched to form；Second lead 222 is then by second metal layer 24 and positioned at lead district
220 the second transparency conducting layer 23 is etched to form.First lead 221 and the second lead 222 are double-layer structure, so as to fulfill with
First electrode 211 and second electrode 212 are electrically connected.
It is transparent by the first metal layer 14, second metal layer 24, the first transparency conducting layer 13 and second in above-mentioned touch screen
The directly etching of conductive layer 23 obtains the first lead 221 and the second lead 222.Therefore, because without silk-screen, directly by yellow light processing procedure
The width of the contact conductor of formation can further reduce, therefore touch screen has narrow frame.
Each technical characteristic of embodiment described above can be combined arbitrarily, to make description succinct, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, the scope that this specification is recorded all is considered to be.
Embodiment described above only expresses the several embodiments of the utility model, and description is more specific and detailed,
But therefore it can not be interpreted as the limitation to utility model patent scope.It should be pointed out that the common skill for this field
For art personnel, without departing from the concept of the premise utility, various modifications and improvements can be made, these are belonged to
The scope of protection of the utility model.Therefore, the protection domain of the utility model patent should be determined by the appended claims.
Claims (9)
1. a kind of transparent conducting film, including：
Base material, including the first surface and second surface being oppositely arranged；
It is sequentially formed in the first hard conating, the first transparency conducting layer and the first metal layer of the first surface；
It is sequentially formed in the second hard conating, the second transparency conducting layer and second metal layer of the second surface；
It is characterized in that, the surface imprint of first hard conating and/or second hard conating is in non-flat configuration, described the
The surface of one metal layer and/or the second metal layer forms embossed surface structure；
Wherein, the scope of the embossed surface structure covers the surface of the first metal layer and/or the second metal layer.
2. transparent conducting film according to claim 1, which is characterized in that the embossed surface structure includes multiple
Every the protrusion of distribution, and the height of the protrusion is 0.05 to 2 μm.
3. transparent conducting film according to claim 2, which is characterized in that the top surface of the protrusion is in plane, and institute
It is parallel with the surface of the base material to state top surface.
4. transparent conducting film according to claim 3, which is characterized in that the protrusion is in cube shaped or terrace with edge
Shape.
5. transparent conducting film according to claim 2, which is characterized in that the top surface of the protrusion is in cambered surface, and institute
State surface indentation of the top surface backwards to the base material.
6. transparent conducting film according to claim 3, which is characterized in that the protrusion is hemispherical.
7. transparent conducting film according to claim 2, which is characterized in that the distance between two neighboring described protrusion
More than twice of the raised lateral dimension.
8. a kind of transparent conducting film, including：
Base material, including the first surface and second surface being oppositely arranged；
It is sequentially formed in the first hard conating, the first optical layer, the first transparency conducting layer and the first metal layer of the first surface；
It is sequentially formed in the second hard conating, the second optical layer, the second transparency conducting layer and the second metal layer of the second surface；
It is characterized in that, the surface imprint of first optical layer and/or second optical layer is in non-flat configuration, in institute
The surface for stating the first metal layer and/or the second metal layer forms embossed surface structure；
Wherein, the scope of the embossed surface structure covers the surface of the first metal layer and/or the second metal layer.
9. a kind of touch screen, which is characterized in that the touch screen is by 1 to 8 any one of them electrically conducting transparent of the claims
Property film made by, the touch screen include Touch Zone and lead district, the first metal layer and the second metal layer are located at
The lead district；The Touch Zone is included by first transparency conducting layer first electrode that forms of etching and transparent by second
The second electrode that Conductive Layer Etch forms；The lead district is included by the first metal layer and first positioned at the lead district
It the first lead that transparency conducting layer is etched to form and transparent is led by the second metal layer and positioned at the second of the lead district
The second lead that electric layer is etched to form.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721221175.0U CN207458609U (en) | 2017-09-22 | 2017-09-22 | Transparent conducting film and touch screen |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721221175.0U CN207458609U (en) | 2017-09-22 | 2017-09-22 | Transparent conducting film and touch screen |
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| CN207458609U true CN207458609U (en) | 2018-06-05 |
Family
ID=62283774
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2017
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