CN207396404U - For the lasting monitoring device of silver concentration in electroplating solution - Google Patents
For the lasting monitoring device of silver concentration in electroplating solution Download PDFInfo
- Publication number
- CN207396404U CN207396404U CN201721233166.3U CN201721233166U CN207396404U CN 207396404 U CN207396404 U CN 207396404U CN 201721233166 U CN201721233166 U CN 201721233166U CN 207396404 U CN207396404 U CN 207396404U
- Authority
- CN
- China
- Prior art keywords
- plating
- sap cavity
- cooling chamber
- quantitative dosing
- probe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Chemically Coating (AREA)
Abstract
The utility model provides a kind of lasting monitoring device for silver concentration in electroplating solution, the monitoring device that continues includes measurement device, supplementing device and controller, wherein described measurement device includes plating sap cavity, cooling chamber and probe, pass through feed liquor fluid communication between the plating sap cavity and the cooling chamber, by fluid communication of infusing between the cooling chamber and probe, the probe is flowed back with plating sap cavity by plating solution and exhaust pipe in fluid connects；The supplementing device includes silver ion reservoir, quantitative dosing device, the second inlet tube for being in fluid communication between silver ion reservoir and quantitative dosing device, replenisher reflux and exhaust pipe and the quantitative dosing pipe for being in fluid communication between quantitative dosing device and plating sap cavity.The utility model strengthens statistical Process Control by utmostly reducing plating solution variation, and saves manual analysis required time.
Description
Technical field
The utility model is related to a kind of continue monitoring device, and in particular to a kind of to continue for silver concentration in electroplating solution
Monitoring device.
Background technology
In order to realize best product performance, chemical plating fluid is designed and formulated, and each component wherein in plating solution has tool
The concentration range of body.Optimal way is to control the concentration of each component in plating solution within the above range, to avoid product
There is inconsistent and variation.But in normal operating, otherwise the component in plating solution is consumed or is converted into by-product
Product, it is necessary to by supplementing consumption component into plating solution, concentration be made to come back in optimum range.Complement operation seems letter
It is single, but in fact need to realize by several steps.Firstly the need of definite consumption, and needs are calculated again to chemical plating
The number of components added in liquid.
Extensive electroplating device for producing as a trial or producing usually requires to work long hours.During this period, analyze and mend
Plating solution is filled to ensuring that it is most important that chemical reaction carries out under optium concentration.Automatic Dosage Controller is provided for specific components,
Same consideration is also in order at Simplified analysis and plating solution maintenance.
Utility model content
The utility model to solve the above-mentioned problems, so as to provide a kind of lasting monitoring for silver concentration in electroplating solution
Device.
In order to achieve the above objectives, the technical solution of the utility model is as follows：
The utility model provides a kind of lasting monitoring device for silver concentration in electroplating solution, the lasting monitoring dress
It puts including measurement device, supplementing device and controller, wherein
The measurement device includes plating sap cavity, cooling chamber and probe, passes through between the plating sap cavity and the cooling chamber
Feed liquor fluid communication, which is used for the plating solution plated in sap cavity being drawn into cooling chamber, to be cooled down, between the cooling chamber and probe
Concentration Testing is carried out for the plating solution in cooling chamber to be drawn into probe by infusing fluid communication, the probe and plating solution
Chamber is flowed back by plating solution and exhaust pipe in fluid connection is used for treating that the plating solution in probe is back to plating sap cavity after Concentration Testing
In, wherein, it is provided in the cooling chamber for the temperature sensor of bath temperature in test chamber；
The supplementing device includes silver ion reservoir, quantitative dosing device, for silver ion reservoir and quantitative dosing device
Between be in fluid communication the second inlet tube, replenisher reflux and exhaust pipe and for quantitative dosing device and plating sap cavity between flow
The quantitative dosing pipe of body connection, wherein, a liquid level gauge is also set up in the quantitative dosing device, for detecting liquid level therein in real time
Information.
In a preferred embodiment of the utility model, in the measurement device, first is connected on the inlet tube
Liquid feeding pump is connected with the second liquid feeding pump on the woven hose, the second control valve is connected on the plating solution reflux and exhaust pipe.
In a preferred embodiment of the utility model, in the supplementing device, it is connected on second inlet tube
3rd liquid feeding pump is connected with third control valve on replenisher reflux and exhaust pipe, the 3rd control is connected on the quantitative dosing pipe
Valve processed.
The beneficial effects of the utility model are：Work on the spot liquid can be directly mounted at, is tested without artificially sampling,
It can make addition supplement in time at any time, not add silver ion manually, mitigate operator's live load, reduce the hazardous of worker
Learn time of contact, safety and sanitation；Chemical plating fluid stability is made to be fluctuated in a smaller scope, it is ensured that plating piece quality it is consistent
Property；It is monitored by lasting silver ion, additionally it is possible to which realization is automatically replenished silver ion as needed；Become by utmostly reducing plating solution
Change to strengthen statistical Process Control, and save manual analysis required time.
Description of the drawings
It in order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, the accompanying drawings in the following description is only
It is some embodiments of the utility model, for those of ordinary skill in the art, in the premise not made the creative labor
Under, it can also be obtained according to these attached drawings other attached drawings.
Fig. 1 is the structure diagram of one embodiment of the utility model；
Fig. 2 is the liquid feeding pump, control valve, temperature sensor, silver/sulfide ionic selective electrode probe and control of the utility model
The cooperation schematic diagram of device processed.
Specific embodiment
In order to which the technical means, creative features, achievable purpose and effectiveness for realizing the utility model are easy to understand, under
Face combines and is specifically illustrating, and the utility model is expanded on further.
The utility model provides a kind of lasting monitoring device (as shown in Figure 1) for silver concentration in electroplating solution, should
Continuing monitoring device includes measurement device 25, supplementing device 20 and controller 9.
The measurement device 25 includes plating sap cavity 1, cooling chamber 3 and silver/sulfide ionic selective electrode probe 7.Plate sap cavity 1
It is in fluid communication between cooling chamber 3 by inlet tube 13, the first liquid feeding pump 2 is connected on inlet tube 13, for that will plates in sap cavity 1
Plating solution is drawn into cooling chamber 3 and is cooled down.3 top of cooling chamber is equipped with the first control valve 5, for the plating in it will plate sap cavity 1
Liquid is vented during being drawn into cooling chamber 3.Pass through woven hose 17 between cooling chamber 3 and silver/sulfide ionic selective electrode probe 7
It is in fluid communication, the second liquid feeding pump 6 is connected on woven hose 17 and is selected for the plating solution in cooling chamber 3 to be drawn into silver/sulphion
Property electrode catheter 7 in carry out Concentration Testing and silver/sulfide ionic selective electrode probe 7 and pass through plating solution reflux and row with plating sap cavity 1
Tracheae 14 is in fluid communication.The second control valve 8 is connected in plating solution reflux and exhaust pipe 14 to be used for treating to open after silver concentration detection
It opens the control valve plating solution in silver/sulfide ionic selective electrode probe 7 is back in plating sap cavity 1, and will be in cooling chamber 3
Plating solution be drawn into plating solution reflux and exhaust pipe 14 during silver/sulfide ionic selective electrode probe 7 and be used for being vented.Silver/sulphur
Ion selective electrode probe 7 can detect the concentration of silver ions of plating solution at this time, and by the numeric feedback to controller 9, control
Device 9 processed compared with the concentration threshold to prestore, judges whether to need to add silver ion into plating sap cavity 1 according to the numerical value.
Temperature sensor 4 is arranged in cooling chamber 3 for the temperature of plating solution in test chamber.Controller 9 can gather in real time
The data of temperature sensor 4 in cooling chamber 3.When the temperature for detecting plating solution in cooling chamber 3 is less than 25 degrees Celsius, second is opened
Liquid feeding pump 6 will be detected in the plating liquid pump in cooling chamber 3 to silver/sulfide ionic selective electrode probe 7；It is cooled down when detecting
When the temperature of plating solution is more than 25 degrees Celsius in chamber 3, continues cooling and wait, until just opening the second liquid feeding pump 6 less than 25 degrees Celsius.
Supplementing device 20 includes silver ion reservoir 24, quantitative dosing device 23, in silver ion reservoir 24 and quantitatively
The second inlet tube 16 and the replenisher reflux being in fluid communication between doser 23 and exhaust pipe 18, wherein quantitative dosing device 23 are logical
Cross conducting wire 15 be connected on controller 9 and the second inlet tube 16 be connected with for by silver ion replenisher 26 from silver ion save
Device 24 is input to the 3rd liquid feeding pump 27 in quantitative dosing device 23, and replenisher reflux and exhaust pipe 18 are for by quantitative dosing device
The silver ion replenisher 26 not supplemented in 23 is back in silver ion reservoir 24 and by the silver in silver ion reservoir 24
Ion replenisher 26 is vented during being input to quantitative dosing device 23, is connected with third control valve 22 thereon.
Supplementing device 20 further includes the quantitative dosing pipe for being in fluid communication between quantitative dosing device 23 and plating sap cavity 1
19, and the 4th control valve 21 is connected with thereon, for the silver ion replenisher 26 in quantitative dosing device 23 is added to plating sap cavity 1
In.
A liquid level gauge 28 is also set up in quantitative dosing device 23.Controller 9 can gather liquid level in quantitative dosing device 23 in real time
The data of meter 28, when the liquid level detected is higher than 2/3rds of liquid level in quantitative dosing device 23, controller 9 then controls the 3rd
Liquid feeding pump 27 is stopped；When the liquid level detected is less than 1/5th of liquid level in quantitative dosing device 23, controller 9 is then controlled
The 3rd liquid feeding pump 27 is made to start to work.After a period of time, when silver ion replenisher 26 need not be supplemented into plating sap cavity 1
When, staff can control third control valve 22 to open by controller 9, remaining silver ion replenisher in quantitative dosing device 23
26 are back to by replenisher reflux and exhaust pipe 18 in silver ion reservoir 24, cost-effective so convenient for recycling.In this reality
With in new lasting monitoring device, the 3rd liquid feeding pump 27 can be corrected, so as to which supplementing device 20 can be more accurately to plating
Silver ion replenisher 26 is added in sap cavity 1.
Controller 9 by conducting wire 15 respectively with cooling chamber 3, silver/sulfide ionic selective electrode probe 7 and quantitative dosing device 23
Connection.First liquid feeding pump 2, the second liquid feeding pump 6, the 3rd liquid feeding pump 27, the first control valve 5, the second control valve 8, third control valve
22 and the 4th the opening and closing of control valve 21 controlled by controller 9.
Liquid feeding pump, control valve, temperature sensor, silver/sulfide ionic selective electrode probe, controller, quantitative dosing device and
The cooperation schematic diagram of liquid level gauge is as shown in Figure 2.
The operating procedure for persistently monitoring silver concentration is as follows：
(1) 100mL plating solutions from plating sap cavity 1 are shifted and be pumped into cooling chamber 3；
(2) after plating solution cooling, plating solution after cooling is pumped into the stylet lumen of silver/sulfide ionic selective electrode probe 7；
(3) silver/sulfide ionic selective electrode probe 7 can detect the concentration of silver ions in plating solution at this time, and this is counted
Value feeds back to controller 9, and controller 9 compared with the concentration threshold to prestore, judges whether to need into plating sap cavity 1 according to the numerical value
Supplement silver ion.
(4) when need to plating sap cavity 1 in supplement silver ion when, controller 9 control the 4th control valve 21 unlatching for
Plate supplement silver ion in sap cavity 1.
The basic principle of the utility model and main feature and the advantages of the utility model has been shown and described above.One's own profession
The technical staff of industry is it should be appreciated that the present utility model is not limited to the above embodiments, described in above embodiments and description
Simply illustrate the principle of the utility model, on the premise of not departing from the spirit and scope of the utility model, the utility model is also
Various changes and modifications are had, these various changes and improvements fall within the scope of the claimed invention.The utility model
Claimed scope is defined by the appending claims and its equivalent thereof.
Claims (3)
1. for the lasting monitoring device of silver concentration in electroplating solution, which is characterized in that the monitoring device that continues includes measuring
Device, supplementing device and controller, wherein
The measurement device includes plating sap cavity, cooling chamber and probe, passes through feed liquor between the plating sap cavity and the cooling chamber
Fluid communication, which is used for the plating solution plated in sap cavity being drawn into cooling chamber, to be cooled down, and is passed through between the cooling chamber and probe
Infusion fluid communication carries out Concentration Testing for the plating solution in cooling chamber to be drawn into probe, and the probe leads to plating sap cavity
It crosses plating solution reflux and exhaust pipe in fluid connection is used for treating that the plating solution in probe is back in plating sap cavity after Concentration Testing,
Described in be provided with for the temperature sensor of bath temperature in test chamber in cooling chamber；
The supplementing device includes silver ion reservoir, quantitative dosing device, between silver ion reservoir and quantitative dosing device
Be in fluid communication the second inlet tube, replenisher reflux and exhaust pipe and for quantitative dosing device and plating sap cavity between fluid connect
Logical quantitative dosing pipe, wherein, a liquid level gauge is also set up in the quantitative dosing device, for detecting liquid level letter therein in real time
Breath.
2. according to claim 1 continue monitoring device, which is characterized in that in the measurement device, the inlet tube
On be connected with the first liquid feeding pump, be connected with the second liquid feeding pump on the woven hose, second be connected on the plating solution reflux and exhaust pipe
Control valve.
3. it is according to claim 1 continue monitoring device, which is characterized in that in the supplementing device, described second into
It is connected with the 3rd liquid feeding pump in liquid pipe, is connected with third control valve in the replenisher reflux and exhaust pipe, on the quantitative dosing pipe
It is connected with third control valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721233166.3U CN207396404U (en) | 2017-09-25 | 2017-09-25 | For the lasting monitoring device of silver concentration in electroplating solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721233166.3U CN207396404U (en) | 2017-09-25 | 2017-09-25 | For the lasting monitoring device of silver concentration in electroplating solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207396404U true CN207396404U (en) | 2018-05-22 |
Family
ID=62405034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721233166.3U Active CN207396404U (en) | 2017-09-25 | 2017-09-25 | For the lasting monitoring device of silver concentration in electroplating solution |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207396404U (en) |
-
2017
- 2017-09-25 CN CN201721233166.3U patent/CN207396404U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108934390B (en) | Automatic precision fertilizer applicator testing method based on automatic precision fertilizer applicator testing platform | |
| CN207672149U (en) | Lasting monitoring device for silver concentration in electroplating solution | |
| CN209117519U (en) | A kind of ammonium nitrate solution preparation system and its concentration detection apparatus | |
| CN207248808U (en) | Automatic adding device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability | |
| CN104677969A (en) | Online electroplate liquid detecting system and online electroplate liquid detecting method | |
| CN207672148U (en) | Measurement device for the lasting monitoring of silver concentration in electroplating solution | |
| CN107727559B (en) | A kind of corrosion testing apparatus and the method using the device | |
| CN207396404U (en) | For the lasting monitoring device of silver concentration in electroplating solution | |
| CN207397114U (en) | For the lasting monitoring device of silver concentration in electroplating solution | |
| CN207397113U (en) | For the lasting monitoring device of silver concentration in electroplating solution | |
| CN208366698U (en) | A kind of sample dilution device for core sampling system | |
| CN210647485U (en) | Automatic cleaning device for online detection pH meter | |
| CN209495901U (en) | A kind of fully-automatic supersonic biological tissue dyeing machine | |
| CN103454129B (en) | A kind of online sodium table | |
| CN101308115A (en) | Continuous annealing oven ammonia on-line testing device and method of use | |
| CN203455306U (en) | Online sodium ion monitoring device | |
| CN207248834U (en) | Automatic dripping device for the automatic Titration potentiometer for measuring chemical plating fluid stability | |
| CN207248813U (en) | Test reaction device for the potentiometric analyzer of on-line monitoring chemical plating fluid stability | |
| CN205295529U (en) | Automatic supplementary device of potassium aurous cyanide | |
| CN207248815U (en) | Test reaction device for the automatic Titration potentiometer for measuring chemical plating fluid stability | |
| CN110527991A (en) | EN liquid medicine adds system automatically | |
| CN207248816U (en) | Potentiometric analyzer for on-line monitoring chemical plating fluid stability | |
| CN204143234U (en) | A kind of Full-automatic circulation cooling water quality online monitoring system | |
| CN209841448U (en) | Establish real-time sampling device outside reation kettle | |
| CN206772382U (en) | A kind of device of precisely liquid quantitative |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |