CN207386118U - A kind of rinse bath leakage fluid dram filter device of crystal silicon etching device - Google Patents
A kind of rinse bath leakage fluid dram filter device of crystal silicon etching device Download PDFInfo
- Publication number
- CN207386118U CN207386118U CN201721200584.2U CN201721200584U CN207386118U CN 207386118 U CN207386118 U CN 207386118U CN 201721200584 U CN201721200584 U CN 201721200584U CN 207386118 U CN207386118 U CN 207386118U
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- CN
- China
- Prior art keywords
- leakage fluid
- fluid dram
- groove body
- rinse bath
- filter
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Abstract
The utility model discloses a kind of rinse bath leakage fluid dram filter devices of crystal silicon etching device, include the groove body of a rinse bath, the groove body bottom plate is equipped with a leakage fluid dram, and an inclined cleaning solution collecting board is respectively equipped between the inner wall and the groove body bottom plate at left and right sides of the groove body；The leakage fluid dram is connected with the drain pipe of the groove body bottom, and the leakage fluid dram is equipped with one for filtering the filter of broken silicon wafers, and the filter is equipped with equally distributed filter hole.The utility model is provided with inclined cleaning solution collecting board in etching device rinse bath, it is more convenient for collecting and has cleaned the acid and alkali cleansing solution after silicon chip, and it is additionally arranged filter in rinse bath slot bottom, it is fallen into keeping out broken silicon wafers in drain pipe, the drain pipe blockage problem because of caused by broken silicon wafers is avoided, preferably improves the production efficiency of crystal silicon etching device.The utility model employs articulation in the junction of groove body leakage fluid dram and drain pipe simultaneously, facilitates conventional maintenance and the dredging of leakage fluid dram.
Description
Technical field
The utility model belongs to photovoltaic solar cell technical field, and in particular to a kind of rinse bath of crystal silicon etching device
Leakage fluid dram filter device.
Background technology
For crystal silicon etching device as the capital equipment for making solar cell, its main purpose is by chemically reacting in silicon
Piece surface increases light-receiving area, reduces reflectivity.Multiple rinse baths can be usually provided in crystal silicon etching device, respectively to crystalline substance
Silicon chip carries out pickling, alkali cleaning and washing, to remove the substance of crystal silicon chip remained on surface.
At present, most rinse bath is all that the cleaning solution after cleaning silicon chip is drained into drain by line mode
Guan Zhong.And the broken silicon wafers that often drop during cleaning silicon chip, on silicon chip, these broken silicon wafers just together with cleaning solution by
Drain pipe has been discharged into, the blocking of drain pipe has been can frequently result in, greatly influences production efficiency.Also, the internal junction of etching device
Structure is compact, drain pipe bottom of rinse bath narrow space, dredging drain pipe be also a cumbersome thing in itself.
Utility model content
In view of the above problems, the utility model has been intended to provide a kind of rinse bath leakage fluid dram of crystal silicon etching device
Filter device can avoid broken silicon wafers from blocking the drain pipe of bottom of rinse bath, to improve the production efficiency of etching device.
To realize above-mentioned technical purpose and the technique effect, the utility model is achieved through the following technical solutions：
A kind of rinse bath leakage fluid dram filter device of crystal silicon etching device includes the groove body of a rinse bath, the groove body
It is set on bottom plate there are one leakage fluid dram, one piece is respectively arranged between the inner wall and the groove body bottom plate at left and right sides of the groove body
Inclined cleaning solution collecting board；The leakage fluid dram is connected with the drain pipe of the groove body bottom, and one is provided on the leakage fluid dram
Block is used to filter the filter of broken silicon wafers, and equally distributed filter hole is provided on the filter.
Further, the aperture of the filter hole is 2 ~ 3mm.
Further, the leakage fluid dram is connected with the drain pipe by an articulation, the first half of the articulation
Divide and be fixedly connected with the leakage fluid dram, the latter half of the articulation is fixedly connected with the drain pipe.
The beneficial effects of the utility model are：
The utility model is provided with inclined cleaning solution collecting board in etching device rinse bath, is more convenient for collecting and clean
Acid and alkali cleansing solution after silicon chip, and filter is additionally arranged in rinse bath slot bottom, it is fallen into drain pipe, avoided with keeping out broken silicon wafers
The drain pipe blockage problem because of caused by broken silicon wafers preferably improves the production efficiency of crystal silicon etching device.This practicality simultaneously
It is new to employ articulation in the junction of groove body leakage fluid dram and drain pipe, facilitate conventional maintenance and the dredging of leakage fluid dram.
Above description is only the general introduction of technical solutions of the utility model, in order to better understand the skill of the utility model
Art means, and being practiced according to the content of specification with the preferred embodiment of the utility model and coordinate attached drawing detailed below
It describes in detail bright as after.Specific embodiment of the present utility model is shown in detail by following embodiment and its attached drawing.
Description of the drawings
Attached drawing described herein is used to provide a further understanding of the present invention, and forms the part of the application,
The schematic description and description of the utility model is not formed for explaining the utility model to the improper of the utility model
It limits.In the accompanying drawings：
Fig. 1 is that the utility model rinse bath leakage fluid dram filter device removes the three-dimensional structure diagram after front apron；
Fig. 2 is that the utility model rinse bath leakage fluid dram filter device removes the front view after front apron.
Drawing reference numeral in figure：1st, groove body；2nd, cleaning solution collecting board；3rd, filter；4th, articulation.
Specific embodiment
Below with reference to the accompanying drawings and in conjunction with the embodiments, the utility model is described in detail.
Ginseng is seen figure 1 and figure 2, a kind of rinse bath leakage fluid dram filter device of crystal silicon etching device, including a cleaning
The groove body 1 of slot, sets that there are one leakage fluid dram, the inner walls and the groove body 1 of 1 left and right sides of groove body on 1 bottom plate of groove body
One piece of inclined cleaning solution collecting board 2 is respectively arranged between bottom plate；The leakage fluid dram and the drain pipe of 1 bottom of groove body connect
It connects, one piece is provided on the leakage fluid dram for filtering the filter 3 of broken silicon wafers, is provided with and is uniformly distributed on the filter 3
Filter hole.
Further, the aperture of the filter hole is 2 ~ 3mm.
Further, the leakage fluid dram is connected with the drain pipe by an articulation 4, the upper half of the articulation 4
Part is fixedly connected with the leakage fluid dram, and the latter half of the articulation 4 is fixedly connected with the drain pipe.
The above is only the preferred embodiment of the utility model only, is not intended to limit the utility model, for this
For the technical staff in field, various modifications and changes may be made to the present invention.It is all in the spirit and principles of the utility model
Within, any modifications, equivalent replacements and improvements are made should be included within the scope of protection of this utility model.
Claims (3)
1. a kind of rinse bath leakage fluid dram filter device of crystal silicon etching device, it is characterised in that：Include the groove body of a rinse bath
（1）, the groove body（1）Leakage fluid dram there are one being set on bottom plate, the groove body（1）The inner wall of the left and right sides and the groove body（1）
One piece of inclined cleaning solution collecting board is respectively arranged between bottom plate（2）；The leakage fluid dram and the groove body（1）The drain of bottom
Pipe connects, and one piece is provided on the leakage fluid dram for filtering the filter of broken silicon wafers（3）, the filter（3）On be provided with
Equally distributed filter hole.
2. the rinse bath leakage fluid dram filter device of crystal silicon etching device according to claim 1, it is characterised in that：The mistake
The aperture of filter opening is 2 ~ 3mm.
3. the rinse bath leakage fluid dram filter device of crystal silicon etching device according to claim 1, it is characterised in that：The row
Liquid mouth passes through an articulation with the drain pipe（4）Connection, the articulation（4）Top half fixed with the leakage fluid dram
Connection, the articulation（4）The latter half be fixedly connected with the drain pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721200584.2U CN207386118U (en) | 2017-09-19 | 2017-09-19 | A kind of rinse bath leakage fluid dram filter device of crystal silicon etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721200584.2U CN207386118U (en) | 2017-09-19 | 2017-09-19 | A kind of rinse bath leakage fluid dram filter device of crystal silicon etching device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207386118U true CN207386118U (en) | 2018-05-22 |
Family
ID=62404585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721200584.2U Expired - Fee Related CN207386118U (en) | 2017-09-19 | 2017-09-19 | A kind of rinse bath leakage fluid dram filter device of crystal silicon etching device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207386118U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109390262A (en) * | 2018-11-30 | 2019-02-26 | 江苏润阳悦达光伏科技有限公司 | The making herbs into wool groove-type cleaning machine unhook gaily decorated basket cleans purpose airing cart |
| CN109433725A (en) * | 2018-11-24 | 2019-03-08 | 江门市先泰机械制造有限公司 | A kind of groove type ultrasonic wave cleaning machine |
-
2017
- 2017-09-19 CN CN201721200584.2U patent/CN207386118U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109433725A (en) * | 2018-11-24 | 2019-03-08 | 江门市先泰机械制造有限公司 | A kind of groove type ultrasonic wave cleaning machine |
| CN109390262A (en) * | 2018-11-30 | 2019-02-26 | 江苏润阳悦达光伏科技有限公司 | The making herbs into wool groove-type cleaning machine unhook gaily decorated basket cleans purpose airing cart |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180522 Termination date: 20180919 |