CN207330382U - One kind is used for the deimpurity device of fume colloidal silica raw materials for production - Google Patents
One kind is used for the deimpurity device of fume colloidal silica raw materials for production Download PDFInfo
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- CN207330382U CN207330382U CN201721382186.7U CN201721382186U CN207330382U CN 207330382 U CN207330382 U CN 207330382U CN 201721382186 U CN201721382186 U CN 201721382186U CN 207330382 U CN207330382 U CN 207330382U
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- vaporizer
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- coil pipe
- inner coil
- stage carburetor
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- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Abstract
The utility model discloses one kind to be used for the deimpurity device of fume colloidal silica raw materials for production, including sequentially connected level-one vaporizer, two-stage carburetor and demister, level-one vaporizer and two-stage carburetor are heated using chuck and inner coil pipe, and distance of the inner coil pipe in level-one vaporizer apart from top is less than distance of the two-stage carburetor inner coil pipe apart from top.The utility model can realize continuous production steady in a long-term during the more silicon tetrachloride of fume colloidal silica production and application impurity, impurity directly is stayed in vaporizer bottom periodically to discharge, avoid phase feed entrainment impurity from entering follow-up system, product contaminant overstandard is resulted in blockage and caused to follow-up system.
Description
Technical field
The utility model belongs to fume colloidal silica technical field, and being used for fume colloidal silica more particularly to one kind produces
The device of impurity removing matter.
Background technology
A raw materials for production part for fume colloidal silica derives from the silicon tetrachloride as by-product of polysilicon industry, some producers
High-boiling components and solid impurity content are higher in silicon tetrachloride, and the rear impurity enrichment of silicon tetrachloride production a period of time can block follow-up
The venturi type mixer of flow, makes evaporator pressure go up, contaminant overstandard in product, at this moment needs parking cleaning mixer and vapour
Change device, the most three day time of short production just needs parking to clear up, and larger economic loss is caused to company, on the other hand utilizes destilling tower
Silicon tetrachloride is purified into energy consumption and operating cost is higher, production cost can be significantly increased.
The content of the invention
One kind provided by the utility model is used for the deimpurity device of fume colloidal silica raw materials for production, can not use it is high into
This distillating method purification silicon tetrachloride, directly cleans, realizes that the more raw material of impurity still can be continuous in process of production
Normal production, reduces purification of raw materials cost.
In order to solve the above technical problems, technical solution is used by the utility model：One kind is used for fume colloidal silica
The deimpurity device of raw materials for production, including sequentially connected level-one vaporizer, two-stage carburetor and demister, level-one vaporizer and
Two-stage carburetor is heated using chuck and inner coil pipe, and distance of the inner coil pipe in level-one vaporizer apart from top is less than two
Distance of the level vaporizer inner coil pipe apart from top.
Further, which further includes slurry tank, and the discharge gate of the bottom of level-one vaporizer and two-stage carburetor passes through
Pipeline and valve are connected to slurry tank.
Further, the demister is 304 woven wire demisters.
Further, the level-one vaporizer, the chuck of two-stage carburetor and inner coil pipe are all connected with steam pipeline.
Further, distance of the inner coil pipe in the level-one vaporizer apart from top is 50cm, two-stage carburetor inner disc
Distance at the top of pipe distance is 1100cm.It can increase gas and drop staying-time by increasing distance, be conducive to gas-liquid point
From.The invention has the advantages that：
1st, purification of raw materials cost is reduced.
2nd, except impurity positive effect.
3rd, process units is avoided because impurity excessively stops, and realizes that the more raw material of impurity still continuously can be produced normally.
4th, deslagging mode is simple, easy to operate.
Brief description of the drawings
Fig. 1 is the structure diagram of the utility model.
Embodiment
The utility model, but the scope of the requires of the utility model protection are further illustrated with reference to embodiment and attached drawing
It is not limited to the scope of embodiment statement.
As shown in Figure 1, a kind of be used for the deimpurity device of fume colloidal silica raw materials for production, including sequentially connected level-one
Vaporizer 1, two-stage carburetor 2 and demister 3, level-one vaporizer and two-stage carburetor are added using chuck and inner coil pipe 5
Heat, distance of the inner coil pipe apart from top in level-one vaporizer are less than distance of the two-stage carburetor inner coil pipe apart from top.
Preferably, which further includes slurry tank 4, and the discharge gate of the bottom of level-one vaporizer 1 and two-stage carburetor 2 passes through
Pipeline and valve are connected to slurry tank 4.
Preferably, the demister is 304 woven wire demisters.
Further, the level-one vaporizer, the chuck of two-stage carburetor and inner coil pipe are all connected with steam pipeline.
Further, distance of the inner coil pipe in the level-one vaporizer apart from top is 50cm, in two-stage carburetor
Distance of the coil pipe apart from top is 1100cm.
In processing procedure, liquid material enters from level-one vaporizer lower part, and vaporizer chuck and coil pipe are heated using steam,
Make feed vaporization, most high-boiling components and solid impurity stay in level-one vaporizer, and small part high-boiling components and solid impurity are by vapour
The raw material of change brings two-stage carburetor into, is heated more than inner coil pipe with level-one vaporizer, steam since two-stage carburetor structure is different
Cavity body is higher, and the diameter of equipment sets larger, and the raw material for entering two-stage carburetor from level-one vaporizer has the part unboiled complete
Entirely, exist in droplets, further heated in two-stage carburetor, completely vaporize raw material, unboiled height boiling thing liquid
Drop and the solid impurity brought on a small quantity by droplets of feed separate in cavity, stay in conical lower portion, the raw material after vaporization and a small amount of
Enter demister for the drop of vaporization, demister catches the micro drop carried secretly in phase feed, makes into follow-up anti-
The raw material answered is essentially phase feed, observes slurry amount by the liquid level gauge of level-one vaporizer and two-stage carburetor, reaches certain
After liquid level, drain into slurry tank, focus on manually.The utility model can realize that fume colloidal silica production and application impurity is more
Silicon tetrachloride when continuous production steady in a long-term, impurity is directly stayed in into vaporizer bottom and is periodically discharged, avoids phase feed
Entrainment impurity enters follow-up system, and product contaminant overstandard is resulted in blockage and caused to follow-up system.
Claims (5)
1. one kind is used for the deimpurity device of fume colloidal silica raw materials for production, it is characterised in that：Including sequentially connected level-one
Vaporizer（1）, two-stage carburetor（2）And demister（3）, level-one vaporizer and two-stage carburetor use chuck and inner coil pipe
（5）Heated, distance of the inner coil pipe in level-one vaporizer apart from top is less than two-stage carburetor inner coil pipe apart from top
Distance.
2. device according to claim 1, it is characterised in that：The device further includes slurry tank（4）, level-one vaporizer（1）
And two-stage carburetor（2）The discharge gate of bottom slurry tank is connected to by pipeline and valve（4）.
3. device according to claim 1, it is characterised in that：The demister is 304 woven wire demisters.
4. device according to claim 1, it is characterised in that：The level-one vaporizer, the chuck of two-stage carburetor and interior
Coil pipe is all connected with steam pipeline.
5. device according to claim 1, it is characterised in that：Inner coil pipe in the level-one vaporizer apart from top away from
From for 50cm, distance of the two-stage carburetor inner coil pipe apart from top is 1100cm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721382186.7U CN207330382U (en) | 2017-10-25 | 2017-10-25 | One kind is used for the deimpurity device of fume colloidal silica raw materials for production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721382186.7U CN207330382U (en) | 2017-10-25 | 2017-10-25 | One kind is used for the deimpurity device of fume colloidal silica raw materials for production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207330382U true CN207330382U (en) | 2018-05-08 |
Family
ID=62366230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721382186.7U Active CN207330382U (en) | 2017-10-25 | 2017-10-25 | One kind is used for the deimpurity device of fume colloidal silica raw materials for production |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207330382U (en) |
-
2017
- 2017-10-25 CN CN201721382186.7U patent/CN207330382U/en active Active
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CB03 | Change of inventor or designer information | ||
| CB03 | Change of inventor or designer information |
Inventor after: Wu Hao Inventor after: Sun Dongjun Inventor after: Hu Dan Inventor after: Wang Chenggang Inventor after: Wang Jie Inventor before: Wu Hao Inventor before: Sun Dongjun Inventor before: Gao Ying Inventor before: Hu Dan Inventor before: Wang Chenggang |
|
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 66-2 No. 443007 Hubei city of Yichang province located in Xiaoting District Road Patentee after: Hubei HuiFu nano materials Co., Ltd Address before: The Yangtze River Road 443007 Hubei city of Yichang province in Xiaoting District No. 66-2 Patentee before: YICHANG HUIFU SILICON MATERIAL Co.,Ltd. |