CN207303057U - A kind of device for detecting wafer in pre-alignment system curvature - Google Patents

Abstract

It the utility model is related to a kind of device for detecting wafer in pre-alignment system curvature, described device is arranged on the wafer prealigning system of exposure desk, the wafer prealigning system includes turntable, include laser emitter and receiver including detection device described in control system and detection device, the laser emitter and receiver are symmetricly set on sabot both sides, and the receiver is connected to control system；The control system includes warning device and processor, the processor connection receiver and warning device；The turntable is used to place wafer.After wafer is prevented on turntable, sabot is rotated, receiver carries out the laser of laser transmitter projects, the curvature for the voltage signal change calculating wafer that laser produces is received by receiver, when the curvature of wafer is excessive, then the voltage signal that receiver produces is too low, warning device sends alarm, wafer is exited production procedure by operator, optimizes testing process, improves the production efficiency of wafer.

Description

A kind of device for detecting wafer in pre-alignment system curvature

Technical field

Exposing wafer technical field is the utility model is related to, more particularly to a kind of detection wafer is in pre-alignment system curvature Device.

Background technology

With the development of the times, manufacture of semiconductor line width is more and more thinner, and the production efficiency requirement to equipment is also higher and higher, As the exposure bench of one of semiconductor manufacturing facility key equipment, its working performance directly affects whole semiconductor fabrication process Precision and efficiency.Wafer prealigning system is the important component of exposure bench, and wafer is sent to before exposure stage, The positioning of special angle is carried out to wafer, calculates the deviation of wafer and predeterminated position, then mobile platform by the center of circle of wafer and Notch is moved to default position.The gap position of wafer is random in cassette before exposure is entered, and center location is because transmit During have a different degrees of offset, can be that exposure bench determine wafer center location and notch position after wafer prealigning system Put, meet requirement of the technique for particular exposure angle.And pre-alignment system can only carry out the notch of wafer and the center of circle at present Positioning, whether can meet generation require, if the curvature of wafer is excessive, can cause to expose if can not judge the curvature of wafer The vacuum alarm of board, focusing failure, is unable to reach the pattern precision of technological requirement, is delayed manufacturing schedule, reduce yield.

Utility model content

The notch of wafer and the center of circle are positioned and can not be sentenced for this reason, it may be necessary to provide a kind of solution current pre-alignment system intelligence Device of the detection wafer of the curvature of disconnected wafer in pre-alignment system curvature.

To achieve the above object, a kind of device for detecting wafer in pre-alignment system curvature is inventor provided, it is described Device is arranged on the wafer prealigning system of exposure desk, and the wafer prealigning system includes turntable, including control system and inspection Survey device；

The detection device includes laser emitter and receiver, and the laser emitter and receiver are symmetricly set on Sabot both sides, the receiver are connected to control system；

The control system includes warning device and processor, the processor connection receiver and warning device；

The turntable is used to place wafer.

Further optimization, the warning device is buzzer.

Further optimization, the wafer prealigning system further include prealignment device, and the prealignment device is optical profile type Prealignment device.

Further optimization, the optical profile type prealignment device include optical detection elements.

Further optimization, the optical detection elements are photoelectric sensor, front's sensor or camera.

The prior art is different from, above-mentioned technical proposal, after wafer is prevented on turntable, opens laser emitter, Sabot is rotated, and receiver carries out the laser of laser transmitter projects, and the voltage that laser generation is received by receiver is believed Number variable quantity calculate the curvature of wafer, and when the curvature of wafer is excessive, then the voltage signal that receiver receives can mistake Low, warning device sends alarm, and wafer is exited production procedure by operator, optimizes testing process, improves the production of wafer Efficiency.

Brief description of the drawings

Fig. 1 is a kind of structure diagram of exposure bench described in embodiment；

Fig. 2 is that a kind of structural representation of the wafer in the device of pre-alignment system curvature is detected described in embodiment Figure；

Fig. 3 is that another structural representation of the wafer in the device of pre-alignment system curvature is detected described in embodiment Figure；

Fig. 4 shows for detection wafer described in embodiment in a kind of operation principle of the device of pre-alignment system curvature It is intended to.

Description of reference numerals：

110th, cassette,

120th, mechanical arm,

130th, heavy burden sliding block,

140th, prealignment device,

141st, notched wafer detector,

142nd, turntable,

143rd, wafer position detector,

151st, laser emitter,

152nd, receiver.

Embodiment

To describe the technology contents of technical solution, construction feature, the objects and the effects in detail, below in conjunction with specific reality Apply example and coordinate attached drawing to be explained in detail.

Referring to Fig. 1, a kind of exposure bench, including wafer prealigning system, wafer prealigning system are filled including prealignment 140 and turntable 142 are put, when wafer is put into the cassette 110 of exposure machine, by mechanical arm 120 and heavy burden sliding block 130 by wafer It is sent into prealignment device 140, prealignment device 140 includes wafer position detector 143 and notched wafer detector 141； After wafer is put into turntable 142, by notched wafer detector 141 find the notch (notch) of wafer, and The edge of wafer is found by wafer position detector 143, after the centralized positioning to wafer is successful, carries out the bending to wafer Degree is detected.

Fig. 2, Fig. 3 and Fig. 4, a kind of device for detecting wafer in pre-alignment system curvature are referred to, described device is set In the wafer prealigning system of exposure desk, the wafer prealigning system includes turntable 142, including control system and detection dress Put.

The detection device includes laser emitter 151 and receiver 152, the laser emitter 151 and receiver 152 Sabot both sides are symmetricly set on, the receiver 152 is connected to control system；

The control system includes warning device and processor, the processor connection receiver 152 and warning device；

The turntable 142 is used to place wafer.

When wafer is positioning successfully on turntable 142 after, by the both sides for being arranged on wafer prealigning system turntable 142 Laser emitter 151 and receiver 152 curvature of wafer is detected；First, laser emitter 151 starts work Make, laser takes place in laser emitter 151, and receiver 152 receives the laser launched from laser emitter 151, turntable 142 Start to rotate, the variable quantity that the voltage signal for the laser generation that laser emitter 151 is launched is received by receiver 152 carries out Calculate the curvature of wafer；And when the curvature of wafer is excessive, and the curvature of wafer does not meet production requirement, then receiver 152 voltages for receiving the laser of laser emitters 151 and producing can be too low, and at this moment, processor receives the generation of receiver 152 After the signal of brownout, carry out exiting production procedure into wafer is about to by staff by warning device, by curvature After excessive wafer abandons, exposure is detected to next wafer again；And when the curvature for detecting wafer meets the requirements When, wafer feeding next stage is exposed.

The curvature of wafer is detected by detection device, avoids and enters exposure since the curvature of wafer is excessive Cause the vacuum of exposure bench to be alarmed during the stage, avoid the pattern precision that focusing unsuccessfully leads to not reach technological requirement, from And testing process is optimized, it is that production efficiency is improved.

Wherein, warning device can be buzzer, and sending sound by buzzer carries out reminding staff to carry out to curved The undesirable wafer of curvature is handled.

Wherein, prealignment device 140 is optical profile type prealignment device 140, and the wafer position inspection in prealignment device 140 It is optical detection elements to survey device 143 and notched wafer detector 141, its optical detection elements is photoelectric sensor, front senses Device or camera, are detected the edge of wafer using optical detection elements, and the center of circle by parameter preset to wafer And notch is positioned.The effect in the center of circle for quickly and accurately positioning wafer can be reached.

Wherein, processor can be microcontroller, microcontroller or CPU etc., and wherein microcontroller can use 51 series AT89C51 microcontrollers.

It should be noted that although the various embodiments described above have been described herein, but not thereby limit The scope of patent protection of the utility model.Therefore, the innovative idea based on the utility model, carries out embodiment described herein Change and modification, or equivalent structure or equivalent flow shift made based on the specification and figures of the utility model, directly Connect or above technical scheme is used in other related technical areas indirectly, be included in the protection of the utility model patent Within the scope of.

Claims (5)

1. a kind of device for detecting wafer in pre-alignment system curvature, described device are arranged on the wafer prealigning system of exposure desk System, the wafer prealigning system include turntable, it is characterised in that including control system and detection device；

The detection device includes laser emitter and receiver, and the laser emitter and receiver are symmetricly set on sabot two Side, the receiver are connected to control system；

The control system includes warning device and processor, the processor connection receiver and warning device；

The turntable is used to place wafer.

2. device of the wafer in pre-alignment system curvature is detected according to claim 1, it is characterised in that the alarm dress It is set to buzzer.

3. device of the wafer in pre-alignment system curvature is detected according to claim 1, it is characterised in that the wafer is pre- Prealignment device is further included to Barebone, the prealignment device is optical profile type prealignment device.

4. device of the wafer in pre-alignment system curvature is detected according to claim 3, it is characterised in that the optical profile type Prealignment device includes optical detection elements.

5. device of the wafer in pre-alignment system curvature is detected according to claim 4, it is characterised in that the optics inspection Survey element is photoelectric sensor, front's sensor or camera.