CN207164468U - A kind of pipeline configuration and photoresist developing equipment - Google Patents
A kind of pipeline configuration and photoresist developing equipment Download PDFInfo
- Publication number
- CN207164468U CN207164468U CN201720911929.9U CN201720911929U CN207164468U CN 207164468 U CN207164468 U CN 207164468U CN 201720911929 U CN201720911929 U CN 201720911929U CN 207164468 U CN207164468 U CN 207164468U
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- filter
- discharging
- triple valve
- pipeline
- waste liquid
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Abstract
The utility model discloses a kind of pipeline configuration and photoetching development equipment, suitable for photoresist developing equipment, belongs to semiconductor fabrication techniques field, including：Filter, including discharging opening and discard solution discharge port, the discharging opening connect discharge pipe, the logical discharging of waste liquid pipeline of discard solution discharge port connection；Nozzle, connected by the discharge pipe with the filter；Triple valve, it is arranged on the discharge pipe, the import of the triple valve connects with the discharging opening, and two outlets of the triple valve are respectively communicated with the nozzle and the discharging of waste liquid pipeline.The beneficial effect of above-mentioned technical proposal is：By setting a triple valve, after changing the filter, make the discharging opening and discharging of waste liquid pipeline communication of filter, by the air in discharging of waste liquid pipeline discharge filter, solving the problems, such as that the air in filter enters in feed liquid pipeline can not discharge from nozzle end.
Description
Technical field
It the utility model is related to semiconductor fabrication techniques field, more particularly to a kind of pipe suitable for photoresist developing equipment
Road structure and photoresist developing equipment.
Background technology
The chemicals supply line of photoresist developing equipment, chemicals caches from inlet into buffer tank, then passes through
The nozzle end of developing machine platform is sent to after filter filtering, nozzle end is higher than filter.In the case that chemicals is full of pipeline, development
The pressure difference of the nozzle of board and the discharging opening of filter is substantially little, and chemicals can normally be fed to nozzle end on request.But
The filter of all chemicals is all the consumptive material for having life time, has crossed the performance of useful life after-filter and has reduced, has further influenceed
Whole developing procedure, it is therefore desirable to regularly replaced to filter.After the filter more renewed, there is air in new filter,
It is discharged into by the discharging opening of filter in pipeline, then by nozzle discharge line, but due to air, nozzle in pipeline be present
The problems such as pressure difference of end and filter discharge end becomes big, and pipeline wiring is wound up and down so that air product can not in pipeline
Discharged from nozzle end.When having air in the duct, can directly result in chemicals from nozzle spray when instability of flow, Wu Faman
The normal production requirement of foot.In order to prevent air accumulation in pipeline, the clogging-preventing measures of existing equipment are that one is set before nozzle end
Individual three-way connection, a joint is turned on manually, make the air in chemical liquor from joint discharge line, although this method energy
Solve the problems, such as instability of flow, but chemicals may be made to be splashed to operating personnel during air is discharged,
Operating personnel are caused to be poisoned；Or the inside of developing machine platform is splashed to, leak sensor is triggered, causes developing machine platform to be alarmed.Cause
This above method potential risk is big, it is impossible to long-term to implement.
The content of the invention
According to the above-mentioned problems in the prior art, a kind of pipeline configuration and photoresist developing equipment is now provided, is applicable
In photoresist developing equipment, including：
Filter, including discharging opening and discard solution discharge port, the discharging opening connect discharge pipe, and the discard solution discharge port connects
Connect discharging of waste liquid pipeline；
Nozzle, connected by the discharge pipe with the filter；
Triple valve, it is arranged on the discharge pipe, the import of the triple valve connects with the discharging opening, the threeway
Two outlets of valve are respectively communicated with the nozzle and the discharging of waste liquid pipeline.
Preferably, in above-mentioned pipeline configuration, in addition to flow meters, it is arranged on the discharge pipe, the flowmeter
It is arranged between the triple valve and the nozzle.
Preferably, in above-mentioned pipeline configuration, the triple valve is the triple valve adjusted manually.
Preferably, in above-mentioned pipeline configuration, it is characterised in that the end of the discharging of waste liquid pipeline is provided with tapping valve.
Preferably, in above-mentioned pipeline configuration, in addition to a buffer tank, the outlet of the buffer tank pass through described in pipeline communication
The entrance of filter.
Also include, a kind of photoresist developing equipment, wherein, including any of the above-described described pipeline configuration.
The beneficial effect of above-mentioned technical proposal is：By setting a triple valve, after changing the filter, make filter
Discharging opening and discharging of waste liquid pipeline communication, by the air in discharging of waste liquid pipeline discharge filter, solves the sky in filter
Gas enters the problem of can not being discharged from nozzle end in feed liquid pipeline.
Brief description of the drawings
Fig. 1 is a kind of structural representation of pipeline configuration in preferred embodiment of the present utility model；
Fig. 2 is liquid flow direction schematic diagram in pipeline in preferred embodiment of the present utility model；
In Fig. 2, direction is shown in solid arrow, the flow direction of chemicals when normally producing；
The flow direction of waste liquid when air is is discharged in direction shown in dotted arrow.
Embodiment
The utility model is described in further detail with specific embodiment below in conjunction with the accompanying drawings, but not as of the present utility model
Limit.
In preferred embodiment of the present utility model, as depicted in figs. 1 and 2, a kind of pipeline configuration, show suitable for photoresist
Shadow equipment, including：
Filter 1, including discharging opening and discard solution discharge port, discharging opening connection discharge pipe 2, discard solution discharge port connection are logical useless
Liquid discharge tube 3；
Nozzle 4, connected by discharge pipe 2 with filter 1；
Triple valve 5, it is arranged on discharge pipe 2, the import of triple valve connects with discharging opening, two outlets point of triple valve
Lian Tong not nozzle 4 and discharging of waste liquid pipeline 3.
In the present embodiment, as shown in Fig. 2 when equipment is in production status, regulating three-way valve 5, make the discharging of filter 1
Mouth connects with discharge pipe 2, while the discharging opening of filter 1 blocks with discharging of waste liquid pipeline 3, and chemicals goes out from filter 1
Material mouth flows to nozzle 4 through discharge pipe 2；After equipment replacement new filter, in emptying gaseity when, regulating three-way valve
5, the discharging opening of filter 1 is connected with discharging of waste liquid pipeline 3, while the discharging opening of filter 1 blocks with discharge pipe, filtering
Air in device is discharged with waste liquid from discharging of waste liquid pipeline 3.
In above-mentioned technical proposal, by setting a triple valve 5, after filter 1 is changed, make the discharging opening of filter 1
Connected with discharging of waste liquid pipeline 3, by the air in the discharge filter 1 of discharging of waste liquid pipeline 3, solve the air in filter 1
The problem of can not being discharged in into feed liquid pipeline from the end of nozzle 4.
In preferred embodiment of the present utility model, in addition to flow meters 6, it is arranged on discharge pipe 2, flowmeter 6
It is arranged between triple valve 5 and nozzle 4.For measuring the flow velocity of material in discharge pipe, staff is facilitated to understand equipment
Working condition.
In preferred embodiment of the present utility model, triple valve 5 is the triple valve adjusted manually.In general, filter 1
Service life be 1 year or so, filter 1 one years is just changed once, low to the frequency of pipeline air exhaust water, it is not necessary to using additionally
Control device carrys out automatic control tee valve, is advantageous to cost-effective, the control system of simplified equipment using the triple valve adjusted manually
System.
In preferred embodiment of the present utility model, the end of the pipeline of discharging of waste liquid 3 is provided with tapping valve 7, for controlling
The discharge of waste liquid.
In preferred embodiment of the present utility model, in addition to a buffer tank 8, the outlet of buffer tank 8 pass through pipeline communication
The entrance of filter 1.Material is being that flow velocity can reduce by filter 1, can cause the pipeline internal pressure of the porch of filter 1
Power is excessive, influences the service life of pipeline, therefore sets buffer tank 8 in filter for molten front end, reduces the pressure of the front-end pipelines of filter 1
Power, extend the service life of pipeline.
In the technical solution of the utility model, in addition to, a kind of photoresist developing equipment, the photoresist developing equipment uses
Above-mentioned pipeline configuration.
The foregoing is only the utility model preferred embodiment, not thereby limit embodiment of the present utility model and
Protection domain, to those skilled in the art, it should can appreciate that all with the utility model specification and diagram
Hold the scheme obtained by made equivalent substitution and obvious change, should be included in protection model of the present utility model
In enclosing.
Claims (6)
- A kind of 1. pipeline configuration, suitable for photoresist developing equipment, it is characterised in that including：Filter, including discharging opening and discard solution discharge port, the discharging opening connect discharge pipe, and the discard solution discharge port connection is logical Discharging of waste liquid pipeline；Nozzle, connected by the discharge pipe with the filter；Triple valve, it is arranged on the discharge pipe, the import of the triple valve connects with the discharging opening, the triple valve Two outlets are respectively communicated with the nozzle and the discharging of waste liquid pipeline.
- 2. pipeline configuration as claimed in claim 1, it is characterised in that also including flow meters, be arranged at the discharge pipe On, the flowmeter is arranged between the triple valve and the nozzle.
- 3. pipeline configuration as claimed in claim 1, it is characterised in that the triple valve is the triple valve adjusted manually.
- 4. pipeline configuration as claimed in claim 1, it is characterised in that the end of the discharging of waste liquid pipeline is provided with discharge opeing Valve.
- 5. pipeline configuration as claimed in claim 1, it is characterised in that also lead to including a buffer tank, the outlet of the buffer tank Piping connects the entrance of the filter.
- 6. a kind of photoresist developing equipment, it is characterised in that including the pipeline configuration as described in any in claim 1-5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720911929.9U CN207164468U (en) | 2017-07-26 | 2017-07-26 | A kind of pipeline configuration and photoresist developing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720911929.9U CN207164468U (en) | 2017-07-26 | 2017-07-26 | A kind of pipeline configuration and photoresist developing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207164468U true CN207164468U (en) | 2018-03-30 |
Family
ID=61714168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720911929.9U Active CN207164468U (en) | 2017-07-26 | 2017-07-26 | A kind of pipeline configuration and photoresist developing equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207164468U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111090220A (en) * | 2018-10-23 | 2020-05-01 | 长鑫存储技术有限公司 | Supply system |
-
2017
- 2017-07-26 CN CN201720911929.9U patent/CN207164468U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111090220A (en) * | 2018-10-23 | 2020-05-01 | 长鑫存储技术有限公司 | Supply system |
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