CN207072969U - A kind of filming equipment of flexible parent metal coating thick film - Google Patents
A kind of filming equipment of flexible parent metal coating thick film Download PDFInfo
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- CN207072969U CN207072969U CN201720973195.7U CN201720973195U CN207072969U CN 207072969 U CN207072969 U CN 207072969U CN 201720973195 U CN201720973195 U CN 201720973195U CN 207072969 U CN207072969 U CN 207072969U
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Abstract
The utility model discloses a kind of filming equipment of flexible parent metal coating thick film, room, ion processing room, multiple coating chambers and winding room are unreeled including what is be sequentially connected, the periphery of ion processing room and multiple coating chambers along plated film water cooled rolls is distributed, and is unreeled room and is wound the both sides that room is respectively arranged on plated film water cooled rolls；In multiple coating chambers, continous way evaporation coating source is set in the coating chamber at middle part, intermediate frequency magnetic control target is set in remaining each coating chamber.Its method is after flexible parent metal completes ion processing, it is sequentially sent to along the rotation of plated film water cooled rolls in each coating chamber, sputter coating at least once first is carried out to flexible parent metal surface by intermediate frequency magnetic control target, then plated film is evaporated to flexible parent metal by continous way evaporation coating source, sputter coating at least once is carried out to flexible parent metal surface by intermediate frequency magnetic control target again, finally sent out.The utility model can realize being coated with for flexible parent metal surface thick film layers, plated film efficiency high, and film surface uniformity is also high.
Description
Technical field
Flexible parent metal coating technique field is the utility model is related to, more particularly to a kind of plated film of flexible parent metal coating thick film
Equipment.
Background technology
With the development of modern industrial technology, the plated film demand of flexible parent metal is increasing.Flexible parent metal film not only has
The photoelectric characteristic of hard lining counterdie, and with it is in light weight, foldable, non-breakable, be readily transported, that equipment investment is few etc. is excellent
Point.It is widely used in the fields such as high-performing car pad pasting, plasm TV FPD, touch-screen, solar cell.According to
Different application demands, it is also different to the Functional Requirement of institute's film plating layer, but generally, every profession and trade is to flexible parent metal film at present
Functional Requirement have higher and higher trend, film structure also tends to become increasingly complex.
At present, magnetron sputtering method prepare fexible film technics comparing is ripe, production efficiency is also higher.But pure magnetic control
Sputtering method is only applicable to the flexible parent metal plated film of metallic diaphragm relatively thin (its thickness is usually no more than 2 μm), can not be applied to metal
The flexible parent metal plated film of film layer thicker (its thickness is generally 3-5 μm).In actual production, magnetron sputtering method prepares fexible film
Production line in still suffer from problem following prominent：
(1) in magnetron sputtering mode, metal material evaporation capacity is fairly small, when metallic diaphragm needs larger thickness, it is necessary to
Using repeatedly plated film repeatedly, this just extends the plated film cycle, and needs to set multiple identical vacuum film coating chambers to be plated
Film, equipment cost is at a relatively high, and production efficiency is also low.Simultaneously as needing to carry out multiple plated film, easily divide metallic diaphragm
Layer phenomenon, influences its membrane uniformity and performance.But replaced according to electron gun evaporation mode, then electron gun evaporation source is made
Valency is too high, is unfavorable for equipment cost control, and the less stable of electron gun, easily produces failure and influences normally to produce.
(2) generally required before flexible parent metal plated film and first carry out ion processing, anode is used in existing magnetically controlled sputter method
Linear ion source, hall ion source or Kaufman ion source, during using anode linear ion source, anode ion source type it out from
Son can contain the metal ion from negative electrode, and metal ion and ion beam current mix injection, the film to plating preparing high-purity
Layer has large effect.And using when hall ion source or Kaufman ion source, it is necessary to set heat conduction filament to produce electronics, and
Hot filament is easily burnt out, and causes equipment usually to need maintenance shut-downs because of failure, influences to plate membrane efficiency and film quality.
(3) existing flexible parent metal plated film is to complete plated film, the plated film of the structure by being wound in same coating chamber
In room, whole coating chamber is in same atmosphere, and film surface is difficult to multiple material plated film.
Utility model content
The purpose of this utility model is overcome the deficiencies in the prior art, there is provided a kind of plated film of flexible parent metal coating thick film
Equipment, the equipment can realize being coated with for flexible parent metal surface thick film layers, plated film efficiency high, and film surface uniformity is also high.
The technical solution of the utility model is：A kind of filming equipment of flexible parent metal coating thick film, along the defeated of flexible parent metal
Direction is sent, including what is be sequentially connected unreel room, ion processing room, multiple coating chambers and winding room, ion processing room and multiple platings
Periphery of the film room along plated film water cooled rolls is distributed, and is unreeled room and is wound the both sides that room is respectively arranged on plated film water cooled rolls；Multiple platings
In film room, continous way evaporation coating source is set in the coating chamber at middle part, intermediate frequency magnetic control target is set in remaining each coating chamber；
Continous way evaporation coating source includes evaporator, evaporator baffle and plating material silk feeding machanism, evaporator and is located at plated film
Room bottom, for the opening of evaporator towards the surface of flexible parent metal, evaporator baffle is located at the overthe openings of evaporator, and plating material silk supplies
Expect that mechanism is located at the side of evaporator, plating material silk feeding machanism supplies plating material silk into evaporator.
The evaporator includes evaporation source Water-cooling seat, evaporation source input electrode, evaporation boat, evaporation electrode insulation sleeve and electrode
Cooling water connects nozzle, and evaporation source Water-cooling seat is the box-like structure of upper opening, and evaporation boat is in evaporation source Water-cooling seat, evaporation boat
Bottom sets evaporation source input electrode, is provided with cooling duct in evaporation source input electrode, the porch of cooling duct is provided with electrode
Cooling water connects nozzle, and evaporation source input electrode and the joint of plated film chamber outer wall are provided with evaporation electrode insulation sleeve.
The plating material silk feeding machanism includes plating material silk reel, wire feed rolls and wire feed nozzle, and plating material silk is wound in plating material silk volume
On disk, the output end of plating material silk reel sets wire feed rolls, and wire feed nozzle is installed on evaporation source Water-cooling seat, and plating material silk is defeated along wire feed rolls
After going out, it is sent into by wire feed nozzle in evaporation source Water-cooling seat.
When plated film starts, evaporator baffle separates evaporator and flexible parent metal, is blocked flexible parent metal, and evaporation source is defeated
Enter after electrode is powered and evaporation boat is heated, evaporator temperature is raised to after can melting plating material silk, opens evaporator baffle, plating material
Plating material silk reel in silk feeding machanism continuously releases plating material silk, is sent into by wire feed rolls by wire feed nozzle in evaporation source Water-cooling seat,
Formula plated film is evaporated to flexible parent metal surface.The coating evaporation amount of vaporation-type plated film is big, and obtained thicknesses of layers can reach 5 μ
M, and continous way plated film, plated film efficiency high can be carried out.
Cold cathode linear ion source is provided with the ion processing room, cold cathode linear ion source includes cold-cathode source
Seat, gas connect nozzle, magnet, negative electrode, cathode insulation set, impressed current anode, anodized insulation set and screen component；Cold cathode ion source(-)holder
For the box-like structure of upper opening, gas connects nozzle through the bottom of cold cathode ion source(-)holder, nozzle periphery is connect positioned at gas
Cold cathode ion source(-)holder bottom surface is provided with magnet, and negative electrode connects the upper end of nozzle located at gas, and gas connects nozzle and cold cathode ion source(-)holder
Junction is provided with cathode insulation set, and the cold cathode ion source(-)holder inwall above negative electrode is provided with impressed current anode, impressed current anode with
The junction of cold cathode ion source(-)holder is provided with anodized insulation set；Screen component is provided with the top of cold cathode ion source(-)holder.
The screen component includes screen fixed block, interior gate hole plate, outer gate hole plate, screen briquetting and the insulation of screen briquetting
Set, at the top of cold cathode ion source(-)holder, interior gate hole plate and outer gate hole plate are sequentially arranged in above screen fixed block screen fixed block,
Screen briquetting is set at the top of outer gate hole plate, and screen briquetting periphery sets screen briquetting insulation sleeve.
External 100~1000V power supply between the negative electrode and impressed current anode, it is external between outer gate hole plate and interior gate hole plate
100~500V power supply.
When carrying out ion processing to flexible parent metal surface, working gas connects nozzle access from gas, then pass to 100~
1000V voltage, glow discharge is formed between negative electrode and impressed current anode, produce ion, in the presence of magnet, the magnetic force of formation
Line passes through from cold cathode ion source(-)holder center, and this is the voltage that 100~500V is passed through between outer gate hole plate and interior gate hole plate, excessively electric
Pressure can pull out ion caused by glow discharge on negative electrode, and be sprayed from inside to outside with certain energy, and formation has
The ion beam directive flexible parent metal surface of certain energy.The ion energy that the cold cathode linear ion source outwards projects is higher,
And other harmful substances such as metal ion are will be free from the ion projected, the film layer that can effectively improve flexible parent metal surface is pure
Degree.
The junction for unreeling room and ion processing room is really unlocked provided with isolated from atmosphere, multiple coating chambers and winding room
Junction also is provided with isolated from atmosphere vacuum lock；
Isolated from atmosphere vacuum lock includes compression cylinder, cylinder seal seat, isolating seal seat and compresses sealing rubber roll, and isolation is close
Seal seat bottom be provided with flexible parent metal by using substrate passageway, and set positioned at the isolating seal seat bottom of substrate passageway both sides up and down
Have a cylindrical grooves, cylindrical grooves bottom is located at below substrate passageway, cylindrical grooves top be located at substrate passageway top and
Come round with the inner space of isolating seal seat, compress sealing rubber roll in the inner space of isolating seal seat, compress fluid sealant
It is connected at the top of roller with the output end of compression cylinder, compression cylinder is installed on above isolating seal seat by cylinder seal seat；Air
When isolated vacuum locking closes, in the bottom insertion cylindrical grooves for compressing sealing rubber roll.
As a kind of preferred scheme, the both ends for compressing sealing rubber roll are arranged with two compression cylinders.
Isolated from atmosphere vacuum lock is in use, when needing isolation to unreel room and ion processing room or need isolate coating chamber and receipts
When rolling up room, closing isolated from atmosphere vacuum lock, compression cylinder pushes, and drives compression sealing rubber roll to move downward, to compression fluid sealant
In the bottom insertion cylindrical grooves of roller, now compress sealing rubber roll and separate substrate passageway, play buffer action.If desired beat
When driving isolated from atmosphere vacuum lock, carried in compression cylinder, drive compression sealing rubber roll to rise to above substrate passageway, make substrate passageway
Connection.The isolated from atmosphere vacuum lock can isolate the inlet side of its both sides and atmospheric side, make ion processing room and coating chamber
Interior to be put into air without each work period, institute's containing water vapor, dust and other pernicious gases are to coating chamber in reduction air
Pollution, so as to improve the purity of film layer and quality, meanwhile, the external cylindrical surface for compressing sealing rubber roll is flexible surface, and it seals effect
Fruit is good, can ensure isolation effect.
In the multiple coating chamber, division board is provided between two coating chambers of arbitrary neighborhood, division board is close to plating film water
The side of chilling roller is provided with division board Water-cooling seat, and the gap between division board Water-cooling seat and plated film water cooled rolls is substrate passageway, and
Gap width is no more than 1mm；The cooling water channel connected with division board Water-cooling seat is provided with division board, the width of division board Water-cooling seat is big
In 100mm.
In coating process, the operating pressure of intermediate frequency magnetic control target is generally 5 × 10-1Pa, the work in continous way evaporation coating source
5 × 10 are generally as pressure-3Pa, 2 orders of magnitude are differed between the two, so after using above-mentioned division board, in coating process
The coating process of multilayer difference vacuum pressure range can be achieved.Gap width between division board Water-cooling seat and plated film water cooled rolls does not surpass
1mm is crossed, the width of division board Water-cooling seat is more than 100mm, under vacuum conditions, can effectively prevent gas corresponding from intermediate frequency magnetic control target
Coating chamber be flowed into corresponding to continous way evaporation coating source in coating chamber, to continuously once plate multilayer film coating process for
Just it is easily achieved.
In above-mentioned filming equipment, according to being actually needed, transition chamber can be also provided between multiple coating chambers and winding room, if setting
There is transition chamber, then isolated from atmosphere vacuum lock is set between transition chamber and winding room, can not be set between transition chamber and coating chamber big
Air bound is unlocked from true.
A kind of film plating process of flexible parent metal coating thick film is realized by the said equipment, comprised the following steps：
(1) after flexible parent metal is released by the room of unreeling, ion processing room is introduced into, ion roughening is carried out to flexible parent metal surface
And degassing processing；
(2) flexible parent metal complete ion processing after, be sequentially sent to along the rotation of plated film water cooled rolls in each coating chamber, first by
Intermediate frequency magnetic control target carries out sputter coating at least once to flexible parent metal surface, then by continous way evaporation coating source to flexible base
Material is evaporated plated film, then carries out sputter coating at least once to flexible parent metal surface by intermediate frequency magnetic control target；
(3) after completing plated film, flexible parent metal is sent into winding room and wound.
The utility model has the advantages that relative to prior art：
In the filming equipment of this flexible parent metal coating thick film, by setting continous way evaporation coating source, profit in coating chamber
With the plating material silk feeding machanism and evaporator of continous way, larger coating evaporation amount can be achieved, obtained thicknesses of layers can reach 5
μm, and continous way plated film can be carried out, and its plated film efficiency high, compared with pure magnetron sputtering plating mode, its evaporation coating
Amount can improve more than 10 times.Meanwhile compared with electron gun evaporation source, the low cost in continous way evaporation coating source, stability is preferable.
In the filming equipment of this flexible parent metal coating thick film, ion processing is carried out using cold cathode linear ion source, outwards
The ion energy of injection is higher, and will be free from other harmful substances such as metal ion in the ion projected, can effectively improve soft
The film layer purity of property substrate surface.Meanwhile filament need not be set in cold cathode linear ion source, cold cathode linear ion source damage
Bad rate is relatively low, can ensure the normal operation of coating process.
In the filming equipment of this flexible parent metal coating thick film, by setting isolated from atmosphere true between inlet side and atmospheric side
Sky lock, can be effectively isolated inlet side and atmospheric side, make to be put into greatly without each work period in ion processing room and coating chamber
Gas, reduce air in institute's containing water vapor, dust and other pernicious gases to plated film chamber contamination, so as to improve the purity of film layer and matter
Amount, meanwhile, the external cylindrical surface for compressing sealing rubber roll is flexible surface, its good sealing effect, can ensure isolation effect.
In the filming equipment of this flexible parent metal coating thick film, by between two coating chambers of arbitrary neighborhood, or plating
Division board and division board Water-cooling seat are set between film room and other vacuum chambers, under vacuum conditions, can effectively prevent gas therefrom
Coating chamber corresponding to frequency magnetic control target is flowed into corresponding to continous way evaporation coating source in coating chamber, to continuously once plating multilayer film
Just it is easily achieved for coating process.
Brief description of the drawings
Fig. 1 is the overall structure diagram of this filming equipment.
Fig. 2 is the structural representation in continous way evaporation coating source in this filming equipment.
Fig. 3 is the structural representation of cold cathode linear ion source in this filming equipment.
Fig. 4 is the structural representation that isolated from atmosphere is really unlocked in this filming equipment.
Fig. 5 is that structural representation when sealing rubber roll both ends are arranged with two compression cylinders is compressed during isolated from atmosphere is really unlocked
Figure.
Fig. 6 is structural representation when setting division board in this filming equipment between two neighboring coating chamber.
Embodiment
With reference to embodiment, the utility model is described in further detail, but embodiment of the present utility model
Not limited to this.
Embodiment
A kind of filming equipment of flexible parent metal coating thick film of the present embodiment, as shown in figure 1, the conveying side along flexible parent metal 5
To, including what is be sequentially connected unreel room 1, ion processing room 2, multiple coating chambers 3 and winding room 4, ion processing room and multiple platings
Periphery of the film room along plated film water cooled rolls is distributed, and is unreeled room and is wound the both sides that room is respectively arranged on plated film water cooled rolls 6；Multiple platings
In film room, continous way evaporation coating source 7 is set in the coating chamber at middle part, intermediate frequency magnetic control target 8 is set in remaining each coating chamber；
Wherein, coating chamber shares five, and for the coating chamber provided with continous way evaporation coating source positioned at centre, its front and rear sides is respectively provided with two
Coating chamber provided with intermediate frequency magnetic control target, transition chamber 9 is additionally provided between coating chamber and winding room, each plated film chamber outer wall is provided with molecule
Pump 40.
As shown in Fig. 2 continous way evaporation coating source includes evaporator 10, evaporator baffle 11 and plating material silk feeding machanism
12, evaporator is located at coating chamber bottom, and the opening of evaporator is towards the surface of flexible parent metal, and evaporator baffle is located at evaporator
Overthe openings, plating material silk feeding machanism are located at the side of evaporator, and plating material silk feeding machanism supplies plating material silk into evaporator.Steam
Hair device includes evaporation source Water-cooling seat 13, evaporation source input electrode 14, evaporation boat 15, evaporation electrode insulation sleeve 16 and cooling of electrode water
Nozzle 17 is connect, evaporation source Water-cooling seat is the box-like structure of upper opening, and evaporation boat is in evaporation source Water-cooling seat, evaporation boat bottom
Evaporation source input electrode is set, is provided with cooling duct in evaporation source input electrode, the porch of cooling duct is provided with cooling of electrode
Water connects nozzle, and evaporation source input electrode and the joint of plated film chamber outer wall are provided with evaporation electrode insulation sleeve.Plating material silk feeding machanism bag
Plating material silk reel 18, wire feed rolls 19 and wire feed nozzle 20 are included, plating material silk is wound on plating material silk reel, the output end of plating material silk reel
Wire feed rolls is set, and wire feed nozzle is installed on evaporation source Water-cooling seat, after plating material silk exports along wire feed rolls, is sent into and evaporated by wire feed nozzle
In the Water-cooling seat of source.When plated film starts, evaporator baffle separates evaporator and flexible parent metal, is blocked flexible parent metal, evaporation
Source input electrode is heated after being powered to evaporation boat, and evaporator temperature is raised to after can melting plating material silk, opens evaporator baffle,
Plating material silk reel in plating material silk feeding machanism continuously releases plating material silk, and evaporation source Water-cooling seat is sent into by wire feed nozzle by wire feed rolls
In, formula plated film is evaporated to flexible parent metal surface.The coating evaporation amount of vaporation-type plated film is big, and obtained thicknesses of layers can reach
5 μm, and continous way plated film, plated film efficiency high can be carried out.
Cold cathode linear ion source is provided with ion processing room, as shown in figure 3, cold cathode linear ion source includes cold cathode
Ion source(-)holder 21, gas connect nozzle 22, magnet 23, negative electrode 24, cathode insulation set 25, impressed current anode 26, anodized insulation set 27 and grid
Board component；Cold cathode ion source(-)holder is the box-like structure of upper opening, and gas connects nozzle through the bottom of cold cathode ion source(-)holder
Portion, the cold cathode ion source(-)holder bottom surface that nozzle periphery is connect positioned at gas are provided with magnet, and negative electrode connects the upper end of nozzle located at gas, and gas connects
The junction of nozzle and cold cathode ion source(-)holder is provided with cathode insulation set, and the cold cathode ion source(-)holder inwall above negative electrode is provided with
Impressed current anode, the junction of impressed current anode and cold cathode ion source(-)holder are provided with anodized insulation set；Set at the top of cold cathode ion source(-)holder
There is screen component.Screen component includes screen fixed block 28, interior gate hole plate 29, outer gate hole plate 30, screen briquetting 31 and screen pressure
Block insulation sleeve 32, at the top of cold cathode ion source(-)holder, interior gate hole plate and outer gate hole plate are sequentially arranged in screen and consolidated screen fixed block
Determine above block, screen briquetting is set at the top of outer gate hole plate, screen briquetting periphery sets screen briquetting insulation sleeve.Negative electrode and auxiliary sun
External 100~1000V power supply between pole, external 100~500V power supply between outer gate hole plate and interior gate hole plate.To flexible base
When material surface carries out ion processing, working gas connects nozzle access from gas, then passes to 100~1000V voltage, negative electrode and auxiliary
Glow discharge is formed between supporing yang pole, produces ion, in the presence of magnet, the magnetic line of force of formation is from cold cathode ion source(-)holder
The heart passes through, and this is the voltage that 100~500V is passed through between outer gate hole plate and interior gate hole plate, and overvoltage can put aura on negative electrode
Ion pulls out caused by electricity, and is sprayed from inside to outside with certain energy, forms the ion gun beam with certain energy
To flexible parent metal surface.The ion energy that the cold cathode linear ion source outwards projects is higher, and will not contain in the ion projected
There are other harmful substances such as metal ion, the film layer purity on flexible parent metal surface can be effectively improved.
The junction for unreeling room and ion processing room is really unlocked provided with isolated from atmosphere, transition chamber and the junction of winding room
Provided with isolated from atmosphere vacuum lock；As shown in figure 4, isolated from atmosphere vacuum lock is close including compression cylinder 33, cylinder seal seat 34, isolation
Seal seat 35 and compress sealing rubber roll 36, isolating seal seat bottom be provided with flexible parent metal by using substrate passageway 37, and be located at base
The isolating seal seat bottom of both sides is provided with cylindrical grooves above and below material passage, and cylindrical grooves bottom is located at below substrate passageway,
Cylindrical grooves top is located above substrate passageway and come round with the inner space of isolating seal seat, compress sealing rubber roll be located at every
It is connected from the inner space of seal receptacle, compressing at the top of sealing rubber roll with the output end of compression cylinder, compression cylinder passes through cylinder
Seal receptacle is installed on above isolating seal seat；When isolated from atmosphere vacuum lock closes, the bottom insertion for compressing sealing rubber roll is cylindric
In groove.The present embodiment is as a kind of preferred scheme, as shown in figure 5, the both ends for compressing sealing rubber roll are arranged with two compressions
Cylinder.Isolated from atmosphere vacuum lock is in use, when needing isolation to unreel room and ion processing room or need isolate coating chamber and wind
During room, isolated from atmosphere vacuum lock is closed, compression cylinder pushes, and drives compression sealing rubber roll to move downward, extremely compresses sealing rubber roll
Bottom insertion cylindrical grooves in, now compress sealing rubber roll substrate passageway is separated, play buffer action.If desired open
During isolated from atmosphere vacuum lock, carried in compression cylinder, drive compression sealing rubber roll to rise to above substrate passageway, connect substrate passageway
It is logical.The isolated from atmosphere vacuum lock can isolate the inlet side of its both sides and atmospheric side, make in ion processing room and coating chamber
Air is put into without each work period, it is dirty to coating chamber to reduce institute's containing water vapor, dust and other pernicious gases in air
Dye, so as to improve the purity of film layer and quality, meanwhile, the external cylindrical surface for compressing sealing rubber roll is flexible surface, its sealing effectiveness
It is good, isolation effect can be ensured.
In multiple coating chambers, as shown in fig. 6, being provided with division board 38 between two coating chambers of arbitrary neighborhood, division board leans on
The side of nearly plated film water cooled rolls is provided with division board Water-cooling seat 39, and the gap R between division board Water-cooling seat and plated film water cooled rolls is base
Material passage, and gap width is no more than 1mm；The cooling water channel connected with division board Water-cooling seat is provided with division board (in figure not show
Go out), the width of division board Water-cooling seat is more than 100mm.In coating process, the operating pressure of intermediate frequency magnetic control target is generally 5 × 10- 1Pa, the operating pressure in continous way evaporation coating source are generally 5 × 10-3Pa, 2 orders of magnitude is differed between the two, so using upper
After stating division board, the coating process of multilayer difference vacuum pressure range can be achieved in coating process.Division board Water-cooling seat and plating
Gap width between film water chilling roller is no more than 1mm, and the width of division board Water-cooling seat is more than 100mm, under vacuum conditions, can be effective
Coating chamber corresponding to gas from intermediate frequency magnetic control target is prevented to be flowed into corresponding to continous way evaporation coating source in coating chamber, to continuous one
Just it is easily achieved for the coating process of secondary plating multilayer film.
A kind of film plating process of flexible parent metal coating thick film can be realized by the said equipment, comprised the following steps：
(1) after flexible parent metal is released by the room of unreeling, ion processing room is introduced into, ion roughening is carried out to flexible parent metal surface
And degassing processing；
(2) flexible parent metal complete ion processing after, be sequentially sent to along the rotation of plated film water cooled rolls in each coating chamber, first by
Intermediate frequency magnetic control target carries out sputter coating at least once to flexible parent metal surface, then by continous way evaporation coating source to flexible base
Material is evaporated plated film, then carries out sputter coating at least once to flexible parent metal surface by intermediate frequency magnetic control target；
(3) after completing plated film, flexible parent metal is sent into winding room and wound.
As described above, the utility model can be realized preferably, above-described embodiment is only preferably implementation of the present utility model
Example, not it is used for limiting practical range of the present utility model；I.e. all equivalent changes and modifications made according to the utility model content,
All covered by the utility model claims scope claimed.
Claims (9)
1. a kind of filming equipment of flexible parent metal coating thick film, it is characterised in that along the conveying direction of flexible parent metal, including successively
Connection unreels room, ion processing room, multiple coating chambers and winding room, and ion processing room and multiple coating chambers are along plated film water cooled rolls
Periphery be distributed, unreel room and wind room and be respectively arranged on the both sides of plated film water cooled rolls；In multiple coating chambers, positioned at middle part
Continous way evaporation coating source is set in coating chamber, intermediate frequency magnetic control target is set in remaining each coating chamber；
Continous way evaporation coating source includes evaporator, evaporator baffle and plating material silk feeding machanism, evaporator and is located at coating chamber bottom
Portion, for the opening of evaporator towards the surface of flexible parent metal, evaporator baffle is located at the overthe openings of evaporator, plating material silk feeding machine
Structure is located at the side of evaporator, and plating material silk feeding machanism supplies plating material silk into evaporator.
A kind of 2. filming equipment of flexible parent metal coating thick film according to claim 1, it is characterised in that the evaporator bag
Include evaporation source Water-cooling seat, evaporation source input electrode, evaporation boat, evaporation electrode insulation sleeve and cooling of electrode water and connect nozzle, evaporation source water
Cold seat is the box-like structure of upper opening, and for evaporation boat in evaporation source Water-cooling seat, evaporation boat bottom sets evaporation source to input
Electrode, evaporation source input electrode is interior to be provided with cooling duct, and the porch of cooling duct connects nozzle provided with cooling of electrode water, and evaporation source is defeated
The joint for entering electrode and plated film chamber outer wall is provided with evaporation electrode insulation sleeve.
3. a kind of filming equipment of flexible parent metal coating thick film according to claim 2, it is characterised in that the plating material silk supplies
Expect that mechanism includes plating material silk reel, wire feed rolls and wire feed nozzle, plating material silk is wound on plating material silk reel, the output of plating material silk reel
End sets wire feed rolls, and wire feed nozzle is installed on evaporation source Water-cooling seat, after plating material silk exports along wire feed rolls, is sent into and steamed by wire feed nozzle
Rise in Water-cooling seat.
A kind of 4. filming equipment of flexible parent metal coating thick film according to claim 1, it is characterised in that the ion processing
Cold cathode linear ion source is provided with room, cold cathode linear ion source includes cold cathode ion source(-)holder, gas connects nozzle, magnet, the moon
Pole, cathode insulation set, impressed current anode, anodized insulation set and screen component；Cold cathode ion source(-)holder is the case shape of upper opening
Structure, gas connect nozzle through the bottom of cold cathode ion source(-)holder, and the cold cathode ion source(-)holder bottom surface of nozzle periphery is connect positioned at gas
Provided with magnet, negative electrode connects the upper end of nozzle located at gas, and the junction that gas connects nozzle and cold cathode ion source(-)holder is provided with cathode insulation
Set, the cold cathode ion source(-)holder inwall above negative electrode are provided with impressed current anode, the company of impressed current anode and cold cathode ion source(-)holder
Meet place and be provided with anodized insulation set；Screen component is provided with the top of cold cathode ion source(-)holder.
A kind of 5. filming equipment of flexible parent metal coating thick film according to claim 4, it is characterised in that the screen component
Including screen fixed block, interior gate hole plate, outer gate hole plate, screen briquetting and screen briquetting insulation sleeve, screen fixed block is located at cold the moon
At the top of the ion source(-)holder of pole, interior gate hole plate and outer gate hole plate are sequentially arranged in above screen fixed block, and screen is set at the top of outer gate hole plate
Briquetting, screen briquetting periphery set screen briquetting insulation sleeve.
A kind of 6. filming equipment of flexible parent metal coating thick film according to claim 5, it is characterised in that the negative electrode and auxiliary
External 100~1000V power supply between supporing yang pole, external 100~500V power supply between outer gate hole plate and interior gate hole plate.
A kind of 7. filming equipment of flexible parent metal coating thick film according to claim 1, it is characterised in that it is described unreel room with
The junction of ion processing room is really unlocked provided with isolated from atmosphere, and multiple coating chambers and the junction of winding room also are provided with isolated from atmosphere
Vacuum lock；
Isolated from atmosphere vacuum lock includes compression cylinder, cylinder seal seat, isolating seal seat and compresses sealing rubber roll, isolating seal seat
Bottom be provided with flexible parent metal by using substrate passageway, and positioned at substrate passageway up and down both sides isolating seal seat bottom be provided with circle
Cylindrical recesses, cylindrical grooves bottom are located at below substrate passageway, cylindrical grooves top be located at substrate passageway top and with every
Inner space from seal receptacle is come round, and compresses sealing rubber roll in the inner space of isolating seal seat, compresses sealing rubber roll top
The output end of portion and compression cylinder is connected, and compression cylinder is installed on above isolating seal seat by cylinder seal seat；Isolated from atmosphere
When vacuum lock closes, in the bottom insertion cylindrical grooves for compressing sealing rubber roll.
8. a kind of filming equipment of flexible parent metal coating thick film according to claim 7, it is characterised in that described to compress sealing
The both ends of rubber roll are arranged with two compression cylinders.
A kind of 9. filming equipment of flexible parent metal coating thick film according to claim 1, it is characterised in that the multiple plated film
In room, division board is provided between two coating chambers of arbitrary neighborhood, division board is provided with division board close to the side of plated film water cooled rolls
Water-cooling seat, the gap between division board Water-cooling seat and plated film water cooled rolls is substrate passageway, and gap width is no more than 1mm；Isolation
The cooling water channel connected with division board Water-cooling seat is provided with plate, the width of division board Water-cooling seat is more than 100mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720973195.7U CN207072969U (en) | 2017-08-03 | 2017-08-03 | A kind of filming equipment of flexible parent metal coating thick film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720973195.7U CN207072969U (en) | 2017-08-03 | 2017-08-03 | A kind of filming equipment of flexible parent metal coating thick film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207072969U true CN207072969U (en) | 2018-03-06 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107236933A (en) * | 2017-08-03 | 2017-10-10 | 肇庆市科润真空设备有限公司 | The filming equipment and method of a kind of flexible parent metal coating thick film |
| CN108456867A (en) * | 2018-06-22 | 2018-08-28 | 广东腾胜真空技术工程有限公司 | Configure the low temperature depositing equipment of impressed current anode |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107236933A (en) * | 2017-08-03 | 2017-10-10 | 肇庆市科润真空设备有限公司 | The filming equipment and method of a kind of flexible parent metal coating thick film |
| CN107236933B (en) * | 2017-08-03 | 2024-02-02 | 肇庆市科润真空设备有限公司 | Coating equipment and method for thick film coating of flexible substrate |
| CN108456867A (en) * | 2018-06-22 | 2018-08-28 | 广东腾胜真空技术工程有限公司 | Configure the low temperature depositing equipment of impressed current anode |
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