CN206921860U - dodging device - Google Patents
dodging device Download PDFInfo
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- CN206921860U CN206921860U CN201720755477.XU CN201720755477U CN206921860U CN 206921860 U CN206921860 U CN 206921860U CN 201720755477 U CN201720755477 U CN 201720755477U CN 206921860 U CN206921860 U CN 206921860U
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Abstract
The utility model discloses a kind of dodging device, the dodging device includes：First electrode plate, second electrode plate, the 3rd battery lead plate, the 4th battery lead plate, substrate and liquid lens, first electrode plate, second electrode plate, the 3rd battery lead plate and the 4th battery lead plate are provided with substrate, first electrode plate and second electrode plate form first group of plane-parallel capacitor, 3rd battery lead plate and the 4th electrode plate groups are into second group of plane-parallel capacitor, and the bottom of liquid lens is embedded in substrate and liquid lens are between first group of plane-parallel capacitor and second group of plane-parallel capacitor.The mode that uneven light distribution is vibrated using liquid lens can be converted into uniform light distribution by the utility model, have the advantages that controllability is strong, sustainable use.
Description
Technical field
The even optical arena of LED, LD is the utility model is related to, more particularly to a kind of dodging device.
Background technology
With the fast development of semiconductive luminescent materials and technique, just gradually substitution conventional light source turns into New Generation Optical to LED
Source, be widely used with projection lamp, automobile headlamp etc..Although LED has the advantages that high-efficiency environment friendly, its output intensity is in big
The cosine distribution of cause.Such spatial light intensity distribution, if directly applied, most cases without the processing of suitable optical system
Under be all difficult to meet device or the light fixture performance indications to be reached, while can also reduce effect because of the presence of a large amount of invalid light
Rate.For LED secondary optical design, the light distribution characteristic of LED light source can be effectively modulated.
In actual illumination, projection lamp, reading lamp, room lighting etc. require Uniform Illumination.As long as and realize Uniform Illumination
There are two methods：Overlay method and cutting-out method.The light that overlay method sends light source is subdivided into some.Then in illumination region
It is overlapped to eliminate the inhomogeneities of light source totality light beam, such as compound eye illumination, light pipe illumination and microlens array illumination.Cut out
The method of cutting be on the basis of known luminaire light distribution, by cutting speculum or lens face shape deflection come the trend before controls ripple,
Realize uniform energy or intensity distribution.However, these methods not only manufacture cumbersome costliness, and optical element production with
Afterwards, its spectrophotometric data cannot change again.
Utility model content
The utility model mainly solving the technical problems that provide a kind of dodging device, be simple to manufacture, cost it is cheap, control tool
Have that controllability is strong, sustainable use advantage.
In order to solve the above technical problems, the technical scheme that the utility model uses is：A kind of dodging device is provided, wrapped
Include：First electrode plate, second electrode plate, the 3rd battery lead plate, the 4th battery lead plate, substrate and liquid lens, is provided with substrate
One battery lead plate, second electrode plate, the 3rd battery lead plate and the 4th battery lead plate, first electrode plate and second electrode plate form first group and put down
Parallel plate capacitor, the 3rd battery lead plate and the 4th electrode plate groups are panelized into second group of plane-parallel capacitor, the bottom of liquid lens
In substrate and liquid lens are between first group of plane-parallel capacitor and second group of plane-parallel capacitor.
In one preferred embodiment of the utility model, described substrate is silicon chip, quartz glass or K9 glass.
In one preferred embodiment of the utility model, liquid is glycerine or dimethyl-silicon in described liquid lens
Oil.
In one preferred embodiment of the utility model, be provided with described substrate hydrophilic-hydrophobic separately it is hydrophilic dredge
Water surface.
In one preferred embodiment of the utility model, the bottom of described liquid lens is embedded in the hydrophilic portion of substrate
Point.
The beneficial effects of the utility model are：The utility model is simple to manufacture, cost is cheap, can be by uneven light intensity
Distribution is converted into uniform light distribution using the mode of liquid lens vibration, has the strong, sustainable use of controllability etc. excellent
Point.
Brief description of the drawings
, below will be to needed for embodiment description in order to illustrate more clearly of the technical scheme in the embodiment of the utility model
The accompanying drawing to be used is briefly described, it should be apparent that, drawings in the following description are only some realities of the present utility model
Example is applied, for those of ordinary skill in the art, on the premise of not paying creative work, can also be according to these accompanying drawings
Other accompanying drawings are obtained, wherein：
Fig. 1 is the structural representation of the preferred embodiment of the utility model dodging device one；
Fig. 2 is the principle static state schematic diagram of the utility model dodging device；
Fig. 3 is the principle dynamic schematic diagram of the utility model dodging device.
Embodiment
The technical scheme in the embodiment of the utility model will be clearly and completely described below, it is clear that described
Embodiment is only part of the embodiment of the present utility model, rather than whole embodiments.Based on the implementation in the utility model
Example, all other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, is belonged to
The scope of the utility model protection.
Refer to Fig. 1 to Fig. 3, embodiment 1
A kind of two-dimentional condenser type low-frequency shock transducer, including：First electrode plate 1-1, second electrode plate 1-2, the 3rd electricity
Pole plate 2-1, the 4th battery lead plate 2-2, substrate 3 and liquid lens 4, first electrode plate 1-1, second electrode plate are provided with substrate 3
1-2, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2, first electrode plate 1-1 and second electrode plate 1-2 form first group of parallel-plate
Capacitor, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2 form second group of plane-parallel capacitor, and the bottom of liquid lens 4 is inlayed
In substrate 3, and liquid lens 4 are between first group of plane-parallel capacitor and second group of plane-parallel capacitor, described
Substrate 3 is silicon chip, and the hydrophilic-hydrophobic surface of hydrophilic-hydrophobic separately is provided with described substrate 3, described liquid lens 4
Bottom is embedded in the hydrophilic segment of substrate 3, and described liquid lens 4 are dimethicone；
The preparation method of described two-dimentional condenser type low-frequency shock transducer, specifically includes following steps：
（1）Photoresist is graphical in substrate 3：Silicon chip is selected as substrate 3, it is even in substrate after substrate 3 cleans up
Glue, thickness are 2.2 μm；90 DEG C of front baking 60s；After its natural cooling, 7s is exposed under contact uv-exposure litho machine；110
2.5min is dried in DEG C；It is 5 ‰ NaOH developments 35s that mass percent concentration is used after natural cooling；2.5min is dried after 110 DEG C, from
So cooling, finally produces photoetching offset plate figure layer in substrate；
（2）Sputter ZnO layer：It is 65nm ZnO Seed Layers in photoetching offset plate figure layer surface sputtering thickness using sputter,
Radio-frequency power is 120W, and Ar air pressure is 20Sccm；
（3）Water-bath grows ZnO nano-structure：Using the method for heating water bath, in heating water bath stove, surface there is into ZnO
The substrate of Seed Layer, into 75 ° of angles, adds the six hydration nitre that concentration is 30 mMs every liter with the bottom faces of heating water bath stove
Sour zinc solution and hexamethylenetetramine solution mixed liquor, the volume ratio of two kinds of solution is 1:1, received in 90 DEG C of constant temperature 3h, growth ZnO
Rice structure.
（4）Fluorine is surface-treated：Immerse 16h in silicon fluoride surface processing solution, high-purity N2After drying, vacuum furnace is placed in
In 195 DEG C of high-temperature baking 7h；
（5）Residual photoresist removes：Substrate after fluorine is surface-treated is immersed in acetone or alcohol organic solvent, and dissolving is residual
Remaining photoresist, so as to obtain the hydrophilic-hydrophobic surface of hydrophilic-hydrophobic separately, it is 5 μ that hydrophilic region surface, which retains liquid volume,
L；
（6）Sensor encapsulates：Liquid lens 4 are added dropwise on above-mentioned hydrophilic-hydrophobic surface, are provided with the surrounding of substrate 3
First electrode plate 1-1, second electrode plate 1-2, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2, first electrode plate 1-1 and second
Battery lead plate 1-2 forms first group of plane-parallel capacitor, and the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2 form second group of parallel-plate
Capacitor, the bottom of liquid lens 4 are embedded in substrate 3, and liquid lens 4 are located at first group of plane-parallel capacitor and second
Between group plane-parallel capacitor, first electrode plate 1-1, second electrode plate 1-2 battery lead plates can not contact with each other in encapsulation, and the 3rd
Battery lead plate 2-1 and the 4th battery lead plate 2-2 can not contact with each other in encapsulation.
When applying alternating voltage between two pieces of plane-parallel capacitors, due to Wen Zeer effects, the bottom of liquid lens 4 is glued
The hydrophilic region 5 on the surface of substrate 3 is attached to, remainder is rapidly of reciprocating vibration with direction of vibration in super hydrophobic surface 6, so that will
LED（Light emitting diode）、LD（Laser diode）Uniform light intensity 7 is dispersed into etc. the uneven light intensity 8 sent.
Refer to Fig. 1 to Fig. 3, embodiment 2
A kind of two-dimentional condenser type low-frequency shock transducer, including：First electrode plate 1-1, second electrode plate 1-2, the 3rd electricity
Pole plate 2-1, the 4th battery lead plate 2-2, substrate 3 and liquid lens 4, first electrode plate 1-1, second electrode plate are provided with substrate 3
1-2, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2, first electrode plate 1-1 and second electrode plate 1-2 form first group of parallel-plate
Capacitor, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2 form second group of plane-parallel capacitor, and the bottom of liquid lens 4 is inlayed
In substrate 3, and liquid lens 4 are between first group of plane-parallel capacitor and second group of plane-parallel capacitor, described
Substrate 3 is quartz glass, and the hydrophilic-hydrophobic surface of hydrophilic-hydrophobic separately is provided with described substrate 3, and described liquid is saturating
The bottom of mirror 4 is embedded in the hydrophilic segment of substrate 3, and described liquid lens 4 are glycerine；
The preparation method of described two-dimentional condenser type low-frequency shock transducer, specifically includes following steps：
（1）Photoresist is graphical in substrate 3：Quartz glass is selected as substrate 3, after substrate 3 cleans up, in substrate
Spin coating, thickness are 1.5 μm；85 DEG C of front baking 65s；After its natural cooling, 7s is exposed under contact uv-exposure litho machine；
3min is dried in 105 DEG C；It is 5 ‰ NaOH developments 30s that mass percent concentration is used after natural cooling；3min is dried after 105 DEG C, it is natural
Cooling, finally produces photoetching offset plate figure layer in substrate；
（2）Sputter ZnO layer：It is 50nm ZnO Seed Layers in photoetching offset plate figure layer surface sputtering thickness using sputter,
Radio-frequency power is 120W, and Ar air pressure is 20Sccm；
（3）Water-bath grows ZnO nano-structure：Using the method for heating water bath, in heating water bath stove, ZnO Seed Layers with
The bottom surface of heating water bath stove adds zinc nitrate hexahydrate solution and hexamethylenetetramine that concentration is 30mmol/L into 70 ° of angles
Solution mixed liquor, the volume ratio of two kinds of solution is 1:1, in 85 DEG C of constant temperature 3.5h, grow ZnO nano-structure.
（4）Fluorine is surface-treated：Immerse 10h in silicon fluoride surface processing solution, high-purity N2After drying, vacuum furnace is placed in
In 180 DEG C of high-temperature baking 10h；
（5）Residual photoresist removes：Substrate after fluorine is surface-treated is immersed in acetone or alcohol organic solvent, and dissolving is residual
Remaining photoresist, so as to obtain the hydrophilic-hydrophobic surface of hydrophilic-hydrophobic separately, the liquid volume that hydrophilic region surface retains is 5
μL；
（6）Sensor encapsulates：Liquid lens 4 are added dropwise on above-mentioned hydrophilic-hydrophobic surface, are provided with the surrounding of substrate 3
First electrode plate 1-1, second electrode plate 1-2, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2, first electrode plate 1-1 and second
Battery lead plate 1-2 forms first group of plane-parallel capacitor, and the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2 form second group of parallel-plate
Capacitor, the bottom of liquid lens 4 are embedded in substrate 3, and liquid lens 4 are located at first group of plane-parallel capacitor and second
Between group plane-parallel capacitor, first electrode plate 1-1, second electrode plate 1-2 battery lead plates can not contact with each other in encapsulation, and the 3rd
Battery lead plate 2-1 and the 4th battery lead plate 2-2 can not contact with each other in encapsulation.
When applying alternating voltage between two pieces of plane-parallel capacitors, due to Wen Zeer effects, the bottom of liquid lens 4 is glued
The hydrophilic region 5 on the surface of substrate 3 is attached to, remainder is rapidly of reciprocating vibration with direction of vibration in super hydrophobic surface 6, so that will
LED（Light emitting diode）、LD（Laser diode）Uniform light intensity 7 is dispersed into etc. the uneven light intensity 8 sent.
Refer to Fig. 1 to Fig. 3, embodiment 3
A kind of two-dimentional condenser type low-frequency shock transducer, including：First electrode plate 1-1, second electrode plate 1-2, the 3rd electricity
Pole plate 2-1, the 4th battery lead plate 2-2, substrate 3 and liquid lens 4, first electrode plate 1-1, second electrode plate are provided with substrate 3
1-2, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2, first electrode plate 1-1 and second electrode plate 1-2 form first group of parallel-plate
Capacitor, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2 form second group of plane-parallel capacitor, and the bottom of liquid lens 4 is inlayed
In substrate 3, and liquid lens 4 are between first group of plane-parallel capacitor and second group of plane-parallel capacitor, described
Substrate 3 is K9 glass, and the hydrophilic-hydrophobic surface of hydrophilic-hydrophobic separately, described liquid lens 4 are provided with described substrate 3
Bottom be embedded in the hydrophilic segment of substrate 3, described liquid lens 4 are dimethicone；
The preparation method of described two-dimentional condenser type low-frequency shock transducer, specifically includes following steps：
（1）Photoresist is graphical in substrate 3：K9 glass is selected as substrate 3, it is even in substrate after substrate 3 cleans up
Glue, thickness are 3 μm；95 DEG C of front baking 55s；After its natural cooling, 8s is exposed under contact uv-exposure litho machine；115℃
Middle baking 2min；It is 5 ‰ NaOH developments 40s that mass percent concentration is used after natural cooling；Dry 2min after 115 DEG C, natural cooling,
Photoetching offset plate figure layer is finally produced in substrate；
（2）Sputter ZnO layer：It is 80nm ZnO Seed Layers in photoetching offset plate figure layer surface sputtering thickness using sputter,
Radio-frequency power is 120W, and Ar air pressure is 20Sccm；
（3）Water-bath grows ZnO nano-structure：Using the method for heating water bath, in heating water bath stove, ZnO Seed Layers with
The bottom surface of heating water bath stove adds zinc nitrate hexahydrate solution and hexamethylenetetramine that concentration is 30mmol/L into 80 ° of angles
Solution mixed liquor, the volume ratio 1 of two kinds of solution:2, in 95 DEG C of constant temperature 2.5h, grow ZnO nano-structure.
（4）Fluorine is surface-treated：24h in silicon fluoride surface processing solution is immersed, after high-purity N 2 dries up, is placed in vacuum furnace
In 200 DEG C of high-temperature baking 3h；
（5）Residual photoresist removes：Substrate after fluorine is surface-treated is immersed in acetone or alcohol organic solvent, and dissolving is residual
Remaining photoresist, so as to obtain the hydrophilic-hydrophobic surface of hydrophilic-hydrophobic separately, the liquid volume that hydrophilic region surface retains is 5
μL；
（6）Sensor encapsulates：Liquid lens 4 are added dropwise on above-mentioned hydrophilic-hydrophobic surface, are provided with the surrounding of substrate 3
First electrode plate 1-1, second electrode plate 1-2, the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2, first electrode plate 1-1 and second
Battery lead plate 1-2 forms first group of plane-parallel capacitor, and the 3rd battery lead plate 2-1 and the 4th battery lead plate 2-2 form second group of parallel-plate
Capacitor, the bottom of liquid lens 4 are embedded in substrate 3, and liquid lens 4 are located at first group of plane-parallel capacitor and second
Between group plane-parallel capacitor, first electrode plate 1-1, second electrode plate 1-2 battery lead plates can not contact with each other in encapsulation, and the 3rd
Battery lead plate 2-1 and the 4th battery lead plate 2-2 can not contact with each other in encapsulation.
When applying alternating voltage between two pieces of plane-parallel capacitors, due to Wen Zeer effects, the bottom of liquid lens 4 is glued
The hydrophilic region 5 on the surface of substrate 3 is attached to, remainder is rapidly of reciprocating vibration with direction of vibration in super hydrophobic surface 6, so that will
LED（Light emitting diode）、LD（Laser diode）Uniform light intensity 7 is dispersed into etc. the uneven light intensity 8 sent.
The beneficial effect of the utility model dodging device and preparation method thereof is：The utility model proposes one kind manufacture letter
List, cost are cheap, the dodging device of real-time, tunable control, and the liquid of liquid lens can vibrate under electric field driven, and electric field drives
The focal length and focus of dynamic lower liquid lens constantly change, by the amplitude and frequency of AC field added by control, so as to realize LED
（Light emitting diode）、LD（Laser diode）The even light action of secondary light-distribution.
Embodiment of the present utility model is the foregoing is only, not thereby limits the scope of the claims of the present utility model, it is every
The equivalent structure or equivalent flow conversion made using the utility model description, or directly or indirectly it is used in other phases
The technical field of pass, similarly it is included in scope of patent protection of the present utility model.
Claims (5)
- A kind of 1. dodging device, it is characterised in that including：First electrode plate, second electrode plate, the 3rd battery lead plate, the 4th electrode Plate, substrate and liquid lens, first electrode plate, second electrode plate, the 3rd battery lead plate and the 4th battery lead plate are provided with substrate, One battery lead plate and second electrode plate form first group of plane-parallel capacitor, and the 3rd battery lead plate and the 4th electrode plate groups are put down into second group Parallel plate capacitor, the bottom of liquid lens is embedded in substrate and liquid lens are located at first group of plane-parallel capacitor and second Between group plane-parallel capacitor.
- 2. dodging device according to claim 1, it is characterised in that described substrate is silicon chip, quartz glass or K9 glass Glass.
- 3. dodging device according to claim 1, it is characterised in that liquid used is glycerine in described liquid lens Or dimethicone.
- 4. dodging device according to claim 1, it is characterised in that hydrophilic-hydrophobic is provided with described substrate separately Hydrophilic-hydrophobic surface.
- 5. dodging device according to claim 4, it is characterised in that the bottom of described liquid lens is embedded in substrate Hydrophilic segment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720755477.XU CN206921860U (en) | 2017-06-27 | 2017-06-27 | dodging device |
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|---|---|---|---|
| CN201720755477.XU CN206921860U (en) | 2017-06-27 | 2017-06-27 | dodging device |
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| CN206921860U true CN206921860U (en) | 2018-01-23 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107195764A (en) * | 2017-06-27 | 2017-09-22 | 常州瑞丰特科技有限公司 | dodging device and preparation method thereof |
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2017
- 2017-06-27 CN CN201720755477.XU patent/CN206921860U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107195764A (en) * | 2017-06-27 | 2017-09-22 | 常州瑞丰特科技有限公司 | dodging device and preparation method thereof |
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