CN206721356U - A kind of workpiece with boron-richization tungsten coating - Google Patents
A kind of workpiece with boron-richization tungsten coating Download PDFInfo
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- CN206721356U CN206721356U CN201720311824.XU CN201720311824U CN206721356U CN 206721356 U CN206721356 U CN 206721356U CN 201720311824 U CN201720311824 U CN 201720311824U CN 206721356 U CN206721356 U CN 206721356U
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- tungsten
- boron
- richization
- workpiece
- coating
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 title claims abstract description 101
- 239000010937 tungsten Substances 0.000 title claims abstract description 101
- 229910052721 tungsten Inorganic materials 0.000 title claims abstract description 101
- 238000000576 coating method Methods 0.000 title claims abstract description 69
- 239000011248 coating agent Substances 0.000 title claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 41
- OFEAOSSMQHGXMM-UHFFFAOYSA-N 12007-10-2 Chemical compound [W].[W]=[B] OFEAOSSMQHGXMM-UHFFFAOYSA-N 0.000 claims abstract description 39
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052796 boron Inorganic materials 0.000 claims abstract description 28
- 239000011159 matrix material Substances 0.000 claims abstract description 28
- 239000013078 crystal Substances 0.000 claims abstract description 8
- 239000010935 stainless steel Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 67
- 230000008859 change Effects 0.000 abstract description 8
- 239000011229 interlayer Substances 0.000 abstract description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 54
- 238000004140 cleaning Methods 0.000 description 28
- 229910052786 argon Inorganic materials 0.000 description 27
- 239000007789 gas Substances 0.000 description 25
- 238000000151 deposition Methods 0.000 description 18
- KRQUFUKTQHISJB-YYADALCUSA-N 2-[(E)-N-[2-(4-chlorophenoxy)propoxy]-C-propylcarbonimidoyl]-3-hydroxy-5-(thian-3-yl)cyclohex-2-en-1-one Chemical compound CCC\C(=N/OCC(C)OC1=CC=C(Cl)C=C1)C1=C(O)CC(CC1=O)C1CCCSC1 KRQUFUKTQHISJB-YYADALCUSA-N 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 230000008021 deposition Effects 0.000 description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 238000000992 sputter etching Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229910052723 transition metal Inorganic materials 0.000 description 4
- 150000003624 transition metals Chemical class 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- 230000002000 scavenging effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000017105 transposition Effects 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000035772 mutation Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
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Abstract
The utility model provides a kind of workpiece with boron-richization tungsten coating, including workpiece substrate, and tungsten layer, tungsten boride gradient layer and the boron-richization tungsten coating being set in turn on the workpiece substrate；Thickness direction along from the workpiece substrate to the tungsten layer, the Boron contents in the tungsten boride gradient layer gradually increase；Crystal grain in the boron-richization tungsten coating is WBy, wherein, y is 2.5 4 numerical value.Unique coating structure in the utility model, the bond strength of each interlayer can be made by height, modulus of elasticity and thermal coefficient of expansion between each layer change in gradient from matrix to top film, and the stress of Bulk coat is down to and gone to zero, and improve the toughness and adhesion of boron-richization tungsten coating.
Description
Technical field
Diamond coatings preparing technical field is the utility model is related to, more particularly to a kind of with boron-richization tungsten coating
Workpiece.
Background technology
Transition metal boride has that fusing point is high, hardness is big, the premium properties such as wear-resisting.Can be used as cutter, mould and
The coating material of other workpiece.With the continuous development of modern manufacturing industry, the requirement to machining accuracy and processing efficiency is also continuous
Improve, high-speed cutting, DRY CUTTING are arisen at the historic moment, and many ordinary rigid coating materials have been difficult to meet processing request, and this is just
The research to novel super-hard coating material is expedited the emergence of.And the transition metal boride (the boron-rich compound of transition metal) that Boron contents are higher
Because having higher intensity, and favored by professional.However, the boron-rich compound of transition metal increases it with Boron contents
Hardness height, but corresponding film substrate bond strength reduces, it is difficult to go out the good coating of adhesiveness in substrate deposit, becomes
Its main bottleneck in industrial development.
Utility model content
In consideration of it, the utility model provides a kind of workpiece with boron-richization tungsten coating, it passes through on workpiece substrate
A metal tungsten layer is first deposited, the increased tungsten boride transition zone of a redeposited Boron contents gradient, Boron contents is finally deposited and immobilizes
Boron-richization tungsten coating, to solve the fracture toughness of boronation tungsten coating difference and the problems such as film substrate bond strength is low.
In a first aspect, this application provides a kind of workpiece with boron-richization tungsten coating, including workpiece substrate, and successively
Tungsten layer, tungsten boride gradient layer and the boron-richization tungsten coating being arranged on the workpiece substrate；Along the workpiece substrate to the tungsten
The thickness direction of layer, the Boron contents in the tungsten boride gradient layer gradually increase；Crystal grain in the boron-richization tungsten coating is
WBy, wherein, y is 2.5-4 numerical value.
Preferably, the y is 2.5,3,3.3 or 4.Further, the y is 3 or 4.
Alternatively, the thickness of the boron-richization tungsten coating is 0.3-1.5 μm.More preferably 0.6-1.2 μm.The richness
Crystallite dimension in boronation tungsten coating is 50-100 nanometers.
In the application, the crystal grain in the tungsten boride gradient layer is WBx, wherein, x span is 0~t, t is 2~
4.Preferably 2.5~4.More preferably 3 or 4.
Alternatively, the Boron contents (molar content) in the tungsten boride gradient layer are gradually increased to 75-80% by zero.
In the application, metal tungsten layer can improve tungsten boride and be firmly bonded on matrix as prime coat, its presence；Boron
Change in tungsten gradient layer, Boron contents gradually increase, its composition, hardness and the equal distribution gradient of thermal coefficient of expansion, the production without new interface
The interface of raw and composition mutation；The presence of tungsten boride gradient layer, make have gradual change between boron-richization tungsten coating and metal tungsten layer
The transitional link of change, effectively improves the bond strength of each interlayer, and the stress of Bulk coat is down to and gone to zero, and improves overall
Toughness and adhesion.
In the application, the thickness of tungsten layer, tungsten boride gradient layer and boron-richization tungsten coating can be set according to being actually needed, such as
Set according to the size of workpiece, purposes etc..
The material of the workpiece substrate can be hard alloy, stainless steel.Workpiece substrate can be cutter or other instruments
(such as mould), component of machine (such as Aero-Space, automotive field).
Alternatively, the thickness of the tungsten layer is 0.1-0.3 μm.
In the application, in order that boron-richization tungsten coating obtains more preferable film substrate bond strength, the setting of boron-richization tungsten coating
Thickness preferably no more than 4 times of tungsten boride gradient layers thickness, such as can be 1-3 times or 1-2 times the tungsten boride ladder
Spend the thickness of layer.
Alternatively, the thickness of the tungsten boride gradient layer is 0.3-0.5 μm.The tungsten boride gradient layer of suitable depth, favorably
In forming good intermediate layer, it can ensure that tungsten layer is perfectly adhered to matrix surface, and be subsequent deposition tungsten boride
Gradient layer and the boron-richization tungsten coating offer good basis, and will not cause and make boron-richization tungsten coating because transition zone is blocked up
The decrease of bond strength between matrix.
Further, in the tungsten boride gradient layer, WBxGrain size be Nano grade, can be specifically that 30-80 receives
Rice.
The workpiece with boron-richization tungsten coating that the application first aspect provides, by being applied in workpiece substrate and rich tungsten boride
Boron contents gradual increased tungsten boride gradient layer by zero is set between layer, while high rigidity is ensured so that boron-richization
The fracture toughness of tungsten coating is higher, improves the adhesion between boron-richization tungsten coating and workpiece substrate.
Correspondingly, the application second aspect provides a kind of preparation method of the workpiece with boron-richization tungsten coating, including
Following steps：
Workpiece substrate is provided, pre-treatment is carried out to the workpiece substrate；The pre-treatment includes ultrasonic cleaning, aura cleaning
One or more in being cleaned with ion etching；
Tungsten layer is deposited on the workpiece substrate；
Using tungsten target and boron target as target, tungsten boride gradient layer is first deposited on the tungsten layer by the way of magnetron sputtering
Redeposited boron-richization tungsten coating, keep the power of the tungsten target constant in deposition process, the power of the boron target is gradually increased,
Keep constant afterwards, obtain the workpiece with boron-richization tungsten coating；Wherein, the crystal grain in the boron-richization tungsten coating is WBy, its
In, y is 2.5-4 numerical value.
It in the embodiment of the application one, can be first cleaned by ultrasonic, the substrate after ultrasonic cleaning is placed in one afterwards
In the vacuum chamber of filming equipment, aura cleaning is first carried out, then carry out ion etching cleaning.It can so better ensure that pending
The cleannes of workpiece surface, to obtain the surface that more preferable deposition prepares diamond coatings.
Wherein, the ultrasonic cleaning is to carry out ultrasonic 5-30min in deionized water, acetone, ethanol successively.Ultrasonic clear
, it is necessary to which substrate is dried up after washing, then carry out other pretreatments.
The aura cleaning and ion etching cleaning are carried out in the vacuum chamber of a filming equipment；Aura cleaning and
It is 5.0 × 10 that the ion etching cleaning, which is required in vacuum,-3Below Pa carry out.
Specifically, the condition of the aura cleaning is:It is passed through argon gas into vacuum chamber, 300~500sccm of argon flow amount,
Operating air pressure is 1.0~1.7Pa, and the back bias voltage loaded on matrix frame is -500~-800V, and the time of aura cleaning is
10~30min.
Specifically, the condition of the ion etching cleaning is：Open ion gun, argon gas is passed through into vacuum chamber, control from
The voltage of component is 50~90V, and argon flow amount is 70~500sccm, and intracavitary air pressure is 0.5~1.2Pa, and matrix loading biases
For -100~-800V；The time of the ion etching cleaning is 10~30min.
In the embodiment of the application one, the depositional mode of the tungsten layer is magnetron sputtering method, is specifically included：Target is made with tungsten
Material, the power for applying tungsten target material are 1-2.4kW, and sputtering atmosphere is ar gas environment, and intracavitary pressure during sputtering is 0.2-1.3Pa,
Cavity temperature is 350~600 DEG C, and matrix frame is biased at -100~-300V.Alternatively, sedimentation time is 2~10min.This
The depositional mode that sputtering is not limited in application prepares tungsten layer.
In the application, during the redeposited boron-richization tungsten coating of the first deposition tungsten boride gradient layer, in control chamber
Pressure is 0.4-1.0Pa, and 350~500 DEG C of depositing temperature, matrix frame is biased at -30~-200V；Keep the power of tungsten target
For 300~500W, the power of the boron target is gradually increased to 1-2.4kW from zero.
Alternatively, the power increase rate of the boron target is 1~10W/s.Alternatively, kept not in the power of the boron target
After change, 40~100min of redeposition.
Alternatively, the thickness of the tungsten boride gradient layer is 0.3-0.5 μm.
Alternatively, the thickness of the boron-richization tungsten coating is 0.3-1.5 μm.More preferably 0.6-1.2 μm.
The preparation method for the workpiece with boron-richization tungsten coating that the application provides, by the complete metal tungsten layer of matrix deposition
Afterwards, the increased tungsten boride gradient layer of Boron contents is first deposited, the constant boron-richization tungsten coating of redeposited Boron contents, can be effectively improved
The bond strength of each interlayer, the modulus of elasticity between each layer and thermal coefficient of expansion is set to change in gradient from matrix to top film,
The stress of Bulk coat is down to and gone to zero, improves the toughness and adhesion of boron-richization tungsten coating.The application is heavy using same
Product equipment, you can realize tungsten layer, tungsten boride gradient layer, the continuity of boron-richization tungsten coating and prepare, whole process time
Greatly shorten, technological parameter is easily controllable, prepares cost and is greatly reduced, is highly suitable for large-scale industrial production.
The advantages of the application, will partly illustrate in the following description, and a part is apparent according to specification
, or can be known by the implementation of the embodiment of the present application.
Brief description of the drawings
Fig. 1 is the structural representation of the workpiece in the utility model embodiment with boron-richization tungsten coating.
Embodiment
As described below is the preferred embodiment of the embodiment of the present application, it is noted that for the common skill of the art
For art personnel, on the premise of the embodiment of the present application principle is not departed from, some improvements and modifications can also be made, these improvement
The protection domain of the embodiment of the present application is also considered as with retouching.
Embodiment 1
A kind of preparation method of the workpiece with boron-richization tungsten coating, comprises the following steps：
(1) substrate pretreated：
YG6X (WC-6wt.%Co) the hard alloy transposition blades sold using on domestic market are as matrix, first with steaming
The matrix is cleaned by ultrasonic 10min by distilled water, then is cleaned by ultrasonic 20min with acetone and absolute ethyl alcohol successively, then with nitrogen by base
Body dries up, and is put into air dry oven in 80-100 DEG C of drying；
Above-mentioned matrix after drying is fixed on ion gun/arc ion plating composite coating equipment (producer:Tie up titanium in Dalian
Gram, MF610/610 models) on pivoted frame in vacuum chamber；Door for vacuum chamber is closed, opens water cooling unit by ion gun, multiple arc target, molecule
Pump, the water route of vacuum chamber are connected, and open the general supply of air compressor machine and composite film coating machine, be then turned on mechanical pump and side take out valve with
And molecular pump, molecular pump is entered climb mode；After molecular pump reaches full speed, close side and take out valve, roughing valve is opened, to true
Empty room is slightly taken out；After vacuum chamber internal pressure reaches below 10Pa by force, it is again turned on side and takes out valve；When pressure in vacuum tank reaches 3Pa
After below, roughing valve is closed, opens high threshold to vacuum chamber pumping high vacuum.When pressure in vacuum tank is extracted into 5.0 × 10-3After Pa, beat
Open heating power supply and heated baking is carried out to vacuum chamber, heating-up temperature is 350 DEG C, and turret system is opened in heating process, makes sample
Public autobiography is carried out, matrix frame rotating speed is 20 revs/min；When vacuum reaches 3.0 × 10-3During Pa, aura cleaning is proceeded by；
After aura cleaning terminates, open ion gun and icon bombardment cleaning, ion source voltage 90V, argon gas are carried out to sample
Flow 200sccm, the operating air pressure of argon gas is 1.0Pa, and the bias of matrix loading is -200V；Ion gun scavenging period is
30min；
(2) deposition of metal tungsten layer：After above-mentioned ion etching cleaning terminates, argon gas is passed through into vacuum chamber, adjusts argon
Throughput makes the pressure of vacuum chamber be 1.3Pa, opening metal tungsten target, and the power for controlling W targets is 2.4KW, substrate bias for-
100V, sedimentation time 3min；The thickness of gained tungsten layer is 0.1 μm.
(3) after metal tungsten layer deposition terminates, argon gas is passed through into vacuum chamber, regulation mass flowmenter makes the pressure in vacuum chamber
Strong is 0.8Pa, and substrate bias is -150V, and using tungsten target and boron target as target, it is 600W to keep metal W target power output, by B targets
Power is started from scratch is gradually increased to 2.4kW with 1W/s speed, obtains Boron contents gradually increased tungsten boride gradient layer；
The power for keeping B targets afterwards is that 2.4kW and W target power outputs are 600W, continues to deposit 100min, obtains rich tungsten boride and applies
Layer；
(4) after coating deposition terminates, ion source current and grid bias power supply are closed, be then shut off gas mass flow gauge and
Gas cylinder main valve and pressure-reducing valve；Cooling process is set, after temperature is dropped to below 100 DEG C, high threshold is closed, opens vent valve, is treated true
When pressure is consistent with ambient pressure in empty room, door for vacuum chamber is opened, then takes out sample.
Fig. 1 is the structural representation of the workpiece with boron-richization tungsten coating prepared by the utility model embodiment 1；In figure,
101 be workpiece substrate, and 102 be tungsten layer, and 103 be Boron contents gradually increased tungsten boride gradient layer, and 104 be boron-richization tungsten coating.
In the present embodiment, the thickness of gained tungsten boride gradient layer 103 is 0.5 μm, along the workpiece substrate to the tungsten layer
Thickness direction, B content is gradually increased to 80% by zero in tungsten boride gradient layer；The thickness of boron-richization tungsten coating 104
For 1.2 μm, crystallite dimension is 80nm or so, crystal grain WB4。
Embodiment 2
A kind of preparation method of the workpiece with boron-richization tungsten coating, comprises the following steps：
(1) substrate pretreated：
YG8 (WC-8%Co) the hard alloy transposition blades sold using on domestic market use distilled water first as matrix
The matrix is cleaned by ultrasonic 5min, then is placed in acetone and is cleaned by ultrasonic 15 minutes, places into absolute ethyl alcohol be cleaned by ultrasonic afterwards
10min, then matrix is dried up with nitrogen, and be put into 100 DEG C of drying in air dry oven；
Above-mentioned matrix after drying is fixed in the vacuum chamber of ion gun/arc ion plating composite coating equipment, adopted
3.0 × 10 are evacuated to mode same as Example 1-3Pa, open argon bottle main valve, pressure-reducing valve, ion gun valve, arc valve and target valve
And mass flowmenter is passed through argon gas into vacuum chamber and carries out aura cleaning to matrix, wherein, the condition of aura cleaning is to true
It is passed through argon gas in empty room, argon flow amount 400sccm, operating pressure 1.4Pa, substrate bias -500V, aura scavenging period is
30min；
After aura cleaning terminates, open ion gun and icon bombardment cleaning is carried out to sample, Ion Cleaning condition is：Ion gun
Voltage is 50V, and argon flow amount 70sccm, the operating air pressure of argon gas is 0.5Pa, and substrate bias is -100V, and matrix frame rotating speed is 20
Rev/min；Ion gun scavenging period is 30min；
(2) deposition of metal tungsten layer：After above-mentioned Ion Cleaning terminates, argon gas is passed through into vacuum chamber, adjusts argon gas stream
Amount makes the pressure of vacuum chamber be 1.0Pa, and opening metal tungsten target, the power for controlling W targets is 2KW, and substrate bias is -150V, deposition
Time is 7min；The thickness of gained tungsten layer is 0.2 μm.
(3) after metal tungsten layer deposition terminates, argon gas is passed through into vacuum chamber, regulation mass flowmenter makes the pressure in vacuum chamber
Strong is 0.9Pa, and substrate bias is -80V, and depositing temperature is 400 DEG C, using tungsten target and boron target as target, keeps metal W target power output
For 500W, the power of B targets is started from scratch 2.0kW is gradually increased to 10W/s speed, obtain Boron contents gradually increased boron
Change tungsten gradient layer；
The power for keeping B targets afterwards is that 2.0kW and W target power outputs are 500W, continues to deposit 100min, obtains rich tungsten boride and applies
Layer；
(4) after coating deposition terminates, ion source current and grid bias power supply are closed, be then shut off gas mass flow gauge and
Gas cylinder main valve and pressure-reducing valve；Cooling process is set, after temperature is dropped to below 100 DEG C, high threshold is closed, opens vent valve, is treated true
When pressure is consistent with ambient pressure in empty room, door for vacuum chamber is opened, then takes out sample.
In the present embodiment, the thickness of gained tungsten boride gradient layer is 0.3 μm, the thickness along the workpiece substrate to the tungsten layer
Direction is spent, B content is gradually increased to 80% by zero in tungsten boride gradient layer；The thickness of boron-richization tungsten coating is 0.9 μm,
Crystallite dimension is 90 rans, crystal grain WB4。
Embodiment 3
A kind of preparation method of the workpiece with boron-richization tungsten coating, comprises the following steps：
(1) substrate pretreated：
YT15 (WC-15%TiC) the hard alloy transposition blades sold using on domestic market are as matrix, first with distillation
The matrix is cleaned by ultrasonic 20min by water, then is placed in acetone and is cleaned by ultrasonic 10 minutes, and it is clear to place into ultrasound in absolute ethyl alcohol afterwards
15min is washed, is then dried up matrix with nitrogen, and is put into 120 DEG C of drying in air dry oven；
Above-mentioned matrix after drying is fixed in the vacuum chamber of ion gun/arc ion plating composite coating equipment, adopted
2.0 × 10 are evacuated to mode same as Example 1-3Pa, open argon bottle main valve, pressure-reducing valve, ion gun valve, arc valve and target valve
And mass flowmenter is passed through argon gas into vacuum chamber and carries out aura cleaning to matrix, wherein, the condition of aura cleaning is to true
Argon gas is passed through in empty room, argon flow amount 500sccm, operating pressure 1.5Pa, substrate bias -600V, it is clear that aura is carried out to substrate
Wash 20min；
After aura cleaning terminates, open ion gun and icon bombardment cleaning is carried out to sample, ion etching cleaning condition is：From
Component voltage is 70V, and argon flow amount 150sccm, the operating air pressure of argon gas is 0.9Pa, and substrate bias is -550V；Matrix frame turns
Speed is 20 revs/min, Ion Cleaning time 20min；
(2) deposition of metal tungsten layer：After above-mentioned Ion Cleaning terminates, argon gas is passed through into vacuum chamber, adjusts argon gas stream
Amount makes the pressure of vacuum chamber be 0.7Pa, and opening metal tungsten target, the power for controlling W targets is 2KW, and substrate bias is -200V, deposition
Time is 10min；The thickness of gained tungsten layer is 0.3 μm.
(3) after metal tungsten layer deposition terminates, argon gas is passed through into vacuum chamber, regulation mass flowmenter makes the pressure in vacuum chamber
Strong is 0.4Pa, and substrate bias is -200V, and depositing temperature is 500 DEG C；Using tungsten target and boron target as target, metal W target work(is kept
Rate is 300W, and the power of B targets is started from scratch and is gradually increased to 1.0kW with 5W/s speed, it is gradually increased to obtain Boron contents
Tungsten boride gradient layer；
The power for keeping B targets afterwards is that 1.0kW and W target power outputs are 300W, continues to deposit 40min, obtains rich tungsten boride and applies
Layer；
(4) after coating deposition terminates, ion source current and grid bias power supply are closed, be then shut off gas mass flow gauge and
Gas cylinder main valve and pressure-reducing valve；Cooling process is set, after temperature is dropped to below 100 DEG C, high threshold is closed, opens vent valve, is treated true
When pressure is consistent with ambient pressure in empty room, door for vacuum chamber is opened, then takes out sample.
In the present embodiment, the thickness of gained tungsten boride gradient layer is 0.4 μm, the thickness along the workpiece substrate to the tungsten layer
Direction is spent, B content is gradually increased to 75% by zero in tungsten boride gradient layer；The thickness of boron-richization tungsten coating is 0.6 μm,
Crystallite dimension is 50 rans, crystal grain WB3。
It should be noted that according to the above description the announcement of book and with illustrate, the application those skilled in the art also
Above-mentioned embodiment can be changed and changed.Therefore, the application is not limited to disclosed and described above specific real
Mode is applied, some equivalent modifications and change to the application should also be as within the protection domain of claims hereof.This
Outside, although having used some specific terms in this specification, these terms merely for convenience of description, not to the application
Form any restrictions.
Claims (8)
1. a kind of workpiece with boron-richization tungsten coating, it is characterised in that including workpiece substrate, and be set in turn in the work
Tungsten layer, tungsten boride gradient layer and boron-richization tungsten coating on part matrix；Thickness direction along from the workpiece substrate to the tungsten layer,
Boron contents in the tungsten boride gradient layer gradually increase；Crystal grain in the boron-richization tungsten coating is WBy, wherein, y 2.5-
4 numerical value.
2. there is the workpiece of boron-richization tungsten coating as claimed in claim 1, it is characterised in that the thickness of the tungsten layer is 0.1-
0.3μm。
3. there is the workpiece of boron-richization tungsten coating as claimed in claim 1, it is characterised in that the thickness of the boron-richization tungsten coating
4 times of degree no more than the thickness of the tungsten boride gradient layer.
4. there is the workpiece of boron-richization tungsten coating as claimed in claim 1, it is characterised in that the thickness of the tungsten boride gradient layer
Spend for 0.3-0.5 μm.
5. there is the workpiece of boron-richization tungsten coating as claimed in claim 1, it is characterised in that the thickness of the boron-richization tungsten coating
Spend for 0.3-1.5 μm.
6. there is the workpiece of boron-richization tungsten coating as claimed in claim 1, it is characterised in that in the boron-richization tungsten coating
Crystallite dimension is 50-100 nanometers.
7. there is the workpiece of boron-richization tungsten coating as claimed in claim 1, it is characterised in that the workpiece substrate closes for hard
Gold or stainless steel.
8. there is the workpiece of boron-richization tungsten coating as claimed in claim 1, it is characterised in that the y is 2.5,3,3.3 or 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720311824.XU CN206721356U (en) | 2017-03-28 | 2017-03-28 | A kind of workpiece with boron-richization tungsten coating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720311824.XU CN206721356U (en) | 2017-03-28 | 2017-03-28 | A kind of workpiece with boron-richization tungsten coating |
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| Publication Number | Publication Date |
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| CN206721356U true CN206721356U (en) | 2017-12-08 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720311824.XU Withdrawn - After Issue CN206721356U (en) | 2017-03-28 | 2017-03-28 | A kind of workpiece with boron-richization tungsten coating |
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| Country | Link |
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| CN (1) | CN206721356U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108660424A (en) * | 2017-03-28 | 2018-10-16 | 深圳先进技术研究院 | A kind of workpiece and preparation method thereof with boron-richization tungsten coating |
-
2017
- 2017-03-28 CN CN201720311824.XU patent/CN206721356U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108660424A (en) * | 2017-03-28 | 2018-10-16 | 深圳先进技术研究院 | A kind of workpiece and preparation method thereof with boron-richization tungsten coating |
| CN108660424B (en) * | 2017-03-28 | 2023-12-19 | 深圳先进技术研究院 | Workpiece with tungsten boride-rich coating and preparation method thereof |
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