CN206696440U - A kind of micron dimension conversion target assembly for electron beam emittance measurement - Google Patents
A kind of micron dimension conversion target assembly for electron beam emittance measurement Download PDFInfo
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- CN206696440U CN206696440U CN201720503582.4U CN201720503582U CN206696440U CN 206696440 U CN206696440 U CN 206696440U CN 201720503582 U CN201720503582 U CN 201720503582U CN 206696440 U CN206696440 U CN 206696440U
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- ring seat
- lower ring
- electron beam
- target assembly
- conversion target
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Abstract
The utility model discloses a kind of micron dimension for electron beam emittance measurement to change target assembly, including a lower ring seat, the upper surface of lower ring seat has been recessed an annular recess along its axis, also include a upper ring seat to match with lower ring seat, the lower surface of upper ring seat is provided with the bulge loop that downwardly projecting and with lower ring seat annular recess matches, after the annular recess of the lower ring seat of bulge loop insertion of upper ring seat, the film being laid in lower ring seat is expanded to form minute surface.The utility model overcomes that quartzy lamina dimensions are small, the shortcomings that being not easy to cleaning, be easily damaged, installation is inconvenient, purpose easy to use, easy to maintenance, that cost is low is reached, and there is same high measurement accuracy in the range of the various bores of 30~200mm of diameter, the bore of adaptation for 50 60mm diameters, can only be substantially increased relative to quartzy thin slice.
Description
Technical field
It the utility model is related to electron beam emittance field of measuring technique, and in particular to one kind is used for electron beam emittance and surveyed
The micron dimension conversion target assembly of amount.
Background technology
Electron beam emittance e measurement technology in accelerator field is a kind of important test in accelerator development process
Technology, the performance state of electron beam can be obtained by the measurement to electron beam emittance, this debugging for accelerator has
And its important meaning.In the e measurement technology of emittance, there are a kind of e measurement technology based on Cerenkov radiation principle, but this
Kind e measurement technology requires thin, the preferably up to micron dimension, and require that changing target plane reaches minute surface of conversion target thickness extremely
Effect, otherwise, the even false measurement result of great error will be brought to measurement.
Although certain thickness thin slice can be obtained by being ground to similar materials such as quartz, and also there is minute surface
Effect, but the quartzy thin slice that 0.1mm thickness can be ground at present is extremely difficult, and have that size is small, it is clear to be not easy to
Wash, easily damaged (installation inconvenience) the shortcomings that, more major problem is that reach the quartzy thin slice of 0.1mm thickness still can't be
Meet measurement request in performance, it is necessary to which thinner thin slice, the method using quartz grinding have been difficult to be further continued for toward thinner journey
Degree has gone on, it is necessary to find conversion target material and the supporting construction of a kind of new structure type to reach the thickness of acquisition needs
The thin slice target of degree.
Utility model content
The purpose of this utility model is that providing a kind of micron dimension for electron beam emittance measurement changes target assembly,
Solution is difficult to after quartzy sheet thickness is less than 0.1mm in the prior art while performance is unsatisfactory for electron beam emittance measurement
Problem, reach satisfaction and use while there is effect easy to use, easy to maintenance.
The utility model is achieved through the following technical solutions：
A kind of micron dimension conversion target assembly for electron beam emittance measurement, including a lower ring seat, lower ring seat
Upper surface has been recessed an annular recess, in addition to a upper ring seat to match with lower ring seat, upper ring seat along its axis
Lower surface be provided with the bulge loop that downwardly projecting and with lower ring seat annular recess matches, the lower ring seat of bulge loop insertion of upper ring seat
Annular recess after, the film being laid in lower ring seat is expanded to form minute surface.The present invention using the upper ring seat that is mutually matched and
Lower ring seat, annular groove is provided with lower ring seat, and film is laid in lower ring seat, and the bulge loop of upper ring seat is entirely pushed into
In annular recess, during promotion, the effect of bulge loop make it that film is stretched extension, forms minute surface, the cooperation of lower ring seat sum
With preferable compressibility, thickness can be only had 0.9~2 micron of thang-kng, the good film of ductility extends and reaches minute surface
Effect, to realize that the micron dimension for electron beam emittance measurement changes target assembly, it is small, inconvenient to overcome quartzy lamina dimensions
In cleaning, it is easily damaged, installation is inconvenient the shortcomings that, reached purpose easy to use, easy to maintenance, that cost is low, and straight
There is same high measurement accuracy in the range of the various bores of 30~200mm of footpath, relative to quartzy thin slice can only 50-60mm diameters and
Speech, substantially increase the bore of adaptation.
An annular seal pocket is provided with the inside of ring seat bulge loop on described, a side is provided with the annular seal pocket
Face extends sealing ring.Further, in the drawing process of film, due to the direct effect of bulge loop and film, it is likely to result in
Unbalance stress and the problem of damage film, after multiple experiment and theory analysis, by being set on the inside of upper ring seat bulge loop
An annular seal pocket is equipped with, the mode of a sideways expansion sealing ring is provided with the annular seal pocket, film is free
It is laid in lower ring seat, the bulge loop of upper ring seat uniformly, is flatly pressed into the annular groove of lower ring seat, side during being pressed into
The groove inner wall friction of ring under sealing ring and swelling device is extended, film is extended to the plane of mirror effect, by with one
The sideways expansion sealing ring of fixed elasticity is acted on film, avoids damage of the film under very stiff and demanding extended state.
Axial direction of the end face along lower ring seat on the inside of the lower ring seat annular recess has been recessed top groove, recessed at top
Holding sealing ring is installed in groove.
Compression sealing ring is installed in the annular recess of the lower ring seat.
Further, by being provided with holding sealing ring in top groove, being provided with the annular recess of lower ring seat
Sealing ring is compressed, the sealing ring at two fixes film compression so that film everywhere deflecting in drawing process has one
Compression is protected and sealed to sealing ring, makes the smooth fastening of micron dimension conversion target, meets that electron beam emittance measures.
The bar-shaped trough of ring seat bottom under extending downwardly and entering is provided with described compression sealing ring, in bar-shaped trough
Bottom is provided through the screw of lower ring seat.By setting bar-shaped trough in lower ring seat bottom, bar-shaped trough is upwardly extended through compression
Sealing ring, screw is set in bar shaped trench bottom, it is necessary to be fixed using screw after upper ring seat matches connection with lower ring seat,
By setting bar-shaped trough, it is easy to the operation of screw to connect, is provided for the operating space of spaciousness, improves the fixed effect of assembling
Rate.
On the annular recess lateral wall of the lower ring seat, multiple steam vents are provided with.By setting multiple steam vents,
In assembling process, bulge loop pushes the space that will necessarily compress annular groove, and the gas after compression is arranged by the steam vent of setting
Go out, the reaction that compressed air can be avoided to pave film stretching, be advantageous to improve the mirror effect of film.
A connection pedestal is additionally provided with the outside of the lower ring seat.Further, by setting a connection pedestal,
It is easy to the subsequent installation of whole conversion target, is easy to its replacing, adds practicality.
The utility model compared with prior art, has the following advantages and advantages：
1st, a kind of micron dimension conversion target assembly for electron beam emittance measurement of the utility model, using being mutually matched
Upper ring seat and lower ring seat, be provided with annular groove in lower ring seat, film be laid in lower ring seat, by the bulge loop of upper ring seat
Entirely it is pushed into annular recess, during promotion, the effect of bulge loop make it that film is stretched extensions, formation minute surface, lower ring
The cooperation of seat sum has preferable compressibility, thickness can be only had 0.9~2 micron of thang-kng, the good film of ductility prolongs
Exhibition reaches mirror effect, to realize that the micron dimension for electron beam emittance measurement changes target assembly, overcomes quartzy thin slice
Size is small, is not easy to cleaning, is easily damaged, installing the shortcomings that inconvenient, has reached mesh easy to use, easy to maintenance, that cost is low
, and there is same high measurement accuracy in the range of the various bores of 30~200mm of diameter, can only relative to quartzy thin slice
For 50-60mm diameters, the bore of adaptation is substantially increased；
2nd, a kind of micron dimension conversion target assembly for electron beam emittance measurement of the utility model, by upper ring seat
An annular seal pocket is provided with the inside of bulge loop, the mode of a sideways expansion sealing ring is provided with the annular seal pocket,
Film is freely laid in lower ring seat, the bulge loop of upper ring seat uniformly, is flatly pressed into the annular groove of lower ring seat, pressed
During entering under sideways expansion sealing ring and swelling device ring groove inner wall friction, film is extended to the flat of mirror effect
Face, by being acted on certain elastic sideways expansion sealing ring on film, film is avoided under very stiff and demanding extended state
Damage；
3rd, a kind of micron dimension conversion target assembly for electron beam emittance measurement of the utility model, by lower ring seat
Bottom sets bar-shaped trough, and bar-shaped trough is upwardly extended through sealing ring is compressed, and screw is set in bar shaped trench bottom, when upper ring seat is with
, it is necessary to be fixed using screw after ring seat matching connection, by setting bar-shaped trough, it is easy to the operation of screw to connect, is carried for it
The operating space of spaciousness has been supplied, has improved the fixed efficiency of assembling.
Brief description of the drawings
Accompanying drawing described herein is used for providing further understanding the utility model embodiment, forms the one of the application
Part, the restriction to the utility model embodiment is not formed.In the accompanying drawings：
Fig. 1 is the semi-cutaway of the utility model assembling schematic diagram.
Mark and corresponding parts title in accompanying drawing：
The upper ring seats of 1-, ring seat under 2-, 3- compress sealing ring, and 4- keeps sealing ring, 5- sideways expansion sealing rings, 6- films,
7- bar-shaped troughs, 8- steam vents, 9- connection pedestals.
Embodiment
For the purpose of this utility model, technical scheme and advantage is more clearly understood, with reference to embodiment to this reality
It is described in further detail with new, exemplary embodiment of the present utility model and its explanation are only used for explaining that this practicality is new
Type, it is not intended as to restriction of the present utility model.
Embodiment
As shown in figure 1, a kind of micron dimension conversion target assembly for electron beam emittance measurement of the utility model, including
One lower ring seat 2, lower ring seat 2 be with reeded loop configuration, external diameter 92.2mm, internal diameter 73.9mm, the deep 9mm of groove, under
The annular recess bottom of ring seat 2, which is placed with, compresses sealing ring 3, and the half slot that Radius 2mm is arranged at the top of lower ring seat 2 is used for placing
Sealing ring 4 is kept, upper ring seat 1 is to carry the loop configuration of bulge loop, external diameter 92mm, internal diameter 75mm, the deep 7mm of bulge loop, upper ring seat 1
Bulge loop internal diameter direction be provided with seal groove be used for place sideways expansion sealing ring 5, seal groove external diameter 79mm, wide 3.2mm, upper ring seat
The difference of ring internal diameter is 5.1mm under 1 sideways expansion seal groove external diameter and swelling device, is selected hereSideways expansion it is close
Seal 5, ensure that the internal diameter of ring 2 has certain frictional force under sideways expansion sealing ring 5 and swelling device, can enable film 6 expand
Such as minute surface, the present embodiment conversion target thickness extremely thin, preferably up to micron dimension, because Mylar films have preferable light
Transparency is learned, also there is preferable plane performance after support is open and flat, there is flexible relative and preferable ductility to be relatively adapted to use for it
The occasion of support exhibition is carried out in needing to exert a force；And thickness can reach a μm magnitude, the expansion effect of the angle of divergence of electron beam is compared
It is small, also than being more suitable for carrying out making conversion target, based on These characteristics, Mylar films 6 are used in the present embodiment device,
Optional 0.9-3 microns of thickness, bar-shaped trough 7 is set in the lower bottom of ring seat 2, bar-shaped trough 7 is upwardly extended through compression sealing ring 3,
The bottom of bar-shaped trough 7 sets screw, and after upper ring seat 1 matches connection with lower ring seat 2, the operation of spaciousness is provided for the assembling of screw
Space, on the annular recess lateral wall of lower ring seat 2, multiple steam vents 8 are provided with, in assembling process, pushing for bulge loop must
The space of annular groove can be so compressed, the gas after compression is discharged by the steam vent 8 of setting, can avoid compressed air to thin
The reaction that film stretching is paved, be advantageous to improve the mirror effect of film, a linker is additionally provided with the outside of lower ring seat 2
Seat 9, it is easy to the subsequent installation of whole conversion target.
Change target assembly installation steps：First, smooth being layered on of Mylar films 6 is installed top and keeps sealing ring 4 and bottom
Portion is compressed in the lower ring seat 2 of sealing ring 3, and ensures that surrounding has more than 50mm surplus；Second step, it is close sideways expansion is installed
The bulge loop of the upper ring seat 1 of seal 5 is steady, is slowly pressed into the annular groove of lower ring seat 2, close using lower pressure and sideways expansion
The frictional force of seal 5 makes film stretching, extension smoothly such as mirror；3rd step, when the bulge loop of upper ring seat 1 is pressed onto the bottom of the lower groove of ring seat 2,
Using compress sealing ring 3, keep sealing ring 4 further compress film, and ensure film discord extruding metal fracture；Finally, use
Screw passes through bar-shaped trough 7, and upper ring seat 1 and lower ring seat 2 are fixed.
Above-described embodiment, the purpose of this utility model, technical scheme and beneficial effect are entered
One step describes in detail, should be understood that and the foregoing is only specific embodiment of the present utility model, is not used to limit
Determine the scope of protection of the utility model, it is all within the spirit and principles of the utility model, any modification for being made, equally replace
Change, improve, should be included within the scope of protection of the utility model.
Claims (7)
- A kind of 1. micron dimension conversion target assembly for electron beam emittance measurement, it is characterised in that：Including a lower ring seat (2), the upper surface of lower ring seat (2) has been recessed an annular recess along its axis, in addition to one with lower ring seat (2) phase The upper ring seat (1) matched somebody with somebody, the lower surface of upper ring seat (1) are provided with what downwardly projecting and with lower ring seat (2) annular recess matched Bulge loop, under the bulge loop insertion of upper ring seat (1) after the annular recess of ring seat (2), the film (6) being laid in lower ring seat (2) is expanded Open and form minute surface.
- 2. a kind of micron dimension conversion target assembly for electron beam emittance measurement according to claim 1, its feature It is, is provided with an annular seal pocket on the inside of ring seat (1) bulge loop on described, a side is provided with the annular seal pocket Face extension sealing ring (5).
- 3. a kind of micron dimension conversion target assembly for electron beam emittance measurement according to claim 1, its feature It is, axial direction of the end face on the inside of lower ring seat (2) annular recess along lower ring seat (2) has been recessed top groove, is pushing up It is provided with portion's groove and keeps sealing ring (4).
- 4. a kind of micron dimension conversion target assembly for electron beam emittance measurement according to claim 1, its feature It is, is provided with the annular recess of the lower ring seat (2) and compresses sealing ring (3).
- 5. a kind of micron dimension conversion target assembly for electron beam emittance measurement according to claim 4, its feature It is, is provided with and extends downwardly and into the bar-shaped trough (7) of lower ring seat (2) bottom on described compression sealing ring (3), in bar The bottom of shape groove (7) is provided through the screw of lower ring seat (2).
- 6. a kind of micron dimension conversion target assembly for electron beam emittance measurement according to claim 1, its feature It is, on the annular recess lateral wall of the lower ring seat (2), is provided with multiple steam vents (8).
- 7. a kind of micron dimension conversion target assembly for electron beam emittance measurement according to claim 1, its feature It is, a connection pedestal (9) is additionally provided with the outside of the lower ring seat (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720503582.4U CN206696440U (en) | 2017-05-08 | 2017-05-08 | A kind of micron dimension conversion target assembly for electron beam emittance measurement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720503582.4U CN206696440U (en) | 2017-05-08 | 2017-05-08 | A kind of micron dimension conversion target assembly for electron beam emittance measurement |
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| Publication Number | Publication Date |
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| CN206696440U true CN206696440U (en) | 2017-12-01 |
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| CN201720503582.4U Active CN206696440U (en) | 2017-05-08 | 2017-05-08 | A kind of micron dimension conversion target assembly for electron beam emittance measurement |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106950590A (en) * | 2017-05-08 | 2017-07-14 | 中国工程物理研究院流体物理研究所 | A kind of micron dimension conversion target assembly measured for electron beam emittance |
-
2017
- 2017-05-08 CN CN201720503582.4U patent/CN206696440U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106950590A (en) * | 2017-05-08 | 2017-07-14 | 中国工程物理研究院流体物理研究所 | A kind of micron dimension conversion target assembly measured for electron beam emittance |
| CN106950590B (en) * | 2017-05-08 | 2019-06-04 | 中国工程物理研究院流体物理研究所 | A kind of micron dimension conversion target assembly for electron beam emittance measurement |
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