CN106950590B - A kind of micron dimension conversion target assembly for electron beam emittance measurement - Google Patents
A kind of micron dimension conversion target assembly for electron beam emittance measurement Download PDFInfo
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- CN106950590B CN106950590B CN201710316119.3A CN201710316119A CN106950590B CN 106950590 B CN106950590 B CN 106950590B CN 201710316119 A CN201710316119 A CN 201710316119A CN 106950590 B CN106950590 B CN 106950590B
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- ring seat
- lower ring
- electron beam
- annular recess
- target assembly
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
Abstract
The invention discloses a kind of micron dimensions for electron beam emittance measurement to convert target assembly, including a lower ring seat, the upper surface of lower ring seat has been recessed an annular recess along its axis, it further include the upper ring seat to match with lower ring seat, the lower surface of upper ring seat is provided with bulge loop that is downwardly projecting and matching with the annular recess of lower ring seat, after the bulge loop of upper ring seat is inserted into the annular recess of lower ring seat, the film being laid in lower ring seat to form mirror surface by expanding.Disadvantage that is small, being not easy to cleaning, easily breakage, installation inconvenience that the present invention overcomes quartzy lamina dimensions, achieve the purpose that using easy, easy to maintain, at low cost, and there is same high measurement accuracy within the scope of the various bores of 30~200mm of diameter, relative to quartzy thin slice the bore of adaptation can only be substantially increased for 50-60mm diameter.
Description
Technical field
The present invention relates to electron beam emittance field of measuring technique, and in particular to it is a kind of for electron beam emittance measurement
Micron dimension converts target assembly.
Background technique
Electron beam emittance measuring technique in accelerator field is the important test of one of accelerator development process
Technology, by the performance state of the available electron beam of measurement to electron beam emittance, this has the debugging of accelerator
And its important meaning.In the measuring technique of emittance, there are a kind of measuring technique based on Cerenkov radiation principle, but this
Kind of measuring technique requires conversion target thickness extremely thin, preferably up to micron dimension, and conversion target plane is required to reach mirror surface
Otherwise effect will bring the even false measurement result of great error to measurement.
Although certain thickness thin slice can be obtained by grinding to similar materials such as quartz, and also there is mirror surface
Effect, but the quartzy thin slice that 0.1mm thickness can be ground at present is extremely difficult, and that there are sizes is small, it is clear to be not easy to
Wash, easily damaged (installation is inconvenient) the shortcomings that, more major problem is that reach the quartzy thin slice of 0.1mm thickness still can't be
Meet measurement request in performance, need thinner thin slice, has been difficult to be further continued for toward thinner journey using the method for quartz grinding
Degree goes on, and needs to find conversion target material and the support construction of the new structure type of one kind to reach the thickness for obtaining and needing
The thin slice target of degree.
Summary of the invention
The purpose of the present invention is to provide a kind of micron dimensions for electron beam emittance measurement to convert target assembly, solves
Quartzy sheet thickness is difficult to after being less than 0.1mm in the prior art while performance is unsatisfactory for asking for electron beam emittance measurement
Topic achievees the effect that meet using while have using easy, easy to maintain.
The present invention is achieved through the following technical solutions:
A kind of micron dimension conversion target assembly for electron beam emittance measurement, including a lower ring seat, lower ring seat
Upper surface has been recessed an annular recess along its axis, further includes the upper ring seat to match with lower ring seat, upper ring seat
Lower surface be provided with bulge loop that is downwardly projecting and matching with the annular recess of lower ring seat, the bulge loop of upper ring seat is inserted into lower ring seat
Annular recess after, the film being laid in lower ring seat to form mirror surface by expanding.The present invention using the upper ring seat that is mutually matched and
Lower ring seat, is provided with annular groove in lower ring seat, and film is laid in lower ring seat, and the bulge loop of upper ring seat is entirely pushed into
In annular recess, during promotion, effect extension so that film is stretched of bulge loop forms mirror surface, the cooperation of lower ring seat sum
With preferable compressibility, thickness can be only had 0.9~2 micron of light passing, the good film extension of ductility reaches mirror surface
It is small, inconvenient to overcome quartzy lamina dimensions to realize that the micron dimension for electron beam emittance measurement converts target assembly for effect
In cleaning, disadvantage easily damaged, installation is inconvenient, achieve the purpose that using easy, easy to maintain, at low cost, and straight
There is same high measurement accuracy within the scope of the various bores of 30~200mm of diameter, relative to quartzy thin slice can only 50-60mm diameter and
Speech, substantially increases the bore of adaptation.
It is provided with an annular seal pocket on the inside of the upper ring seat bulge loop, a side is provided in the annular seal pocket
Face extends sealing ring.Further, it in the drawing process of film, due to the direct effect of bulge loop and film, is likely to result in
Unbalance stress and the problem of damage film, after multiple experiment and theory analysis, by being set on the inside of upper ring seat bulge loop
It is equipped with an annular seal pocket, the mode of a sideways expansion sealing ring is provided in the annular seal pocket, film is free
Be laid in lower ring seat, by the bulge loop of upper ring seat uniformly, horizontal soil pressure into the annular groove of lower ring seat, side during being pressed into
The groove inner wall friction for extending ring under sealing ring and tensioning device, makes film be extended to the plane of mirror effect, by having one
The sideways expansion sealing ring of fixed elasticity acts on film, avoids damage of the film under very stiff and demanding tensional state.
End face on the inside of the lower ring seat annular recess has been recessed top groove along the axial direction of lower ring seat, recessed at top
Holding sealing ring is installed in slot.
Compression sealing ring is installed in the annular recess of the lower ring seat.
Further, by being equipped with holding sealing ring in top groove, being equipped in the annular recess of lower ring seat
Sealing ring is compressed, the sealing ring at two fixes film compression, so that everywhere deflecting has one to film during stretching
Compression is protected and sealed to sealing ring, makes the smooth fastening of micron dimension conversion target, meets electron beam emittance measurement.
The strip groove of ring seat bottom under extending downwardly and entering is provided on the compression sealing ring, in strip groove
Bottom is provided with the screw hole through lower ring seat.By the way that strip groove is arranged in lower ring seat bottom, strip groove is upwardly extended through compression
Sealing ring is arranged screw hole in bar shaped trench bottom, after upper ring seat matches connection with lower ring seat, needs to be fixed using screw,
It by the way that strip groove is arranged, is connected convenient for the operation of screw, is provided for spacious operating space, improve the fixed effect of assembly
Rate.
On the annular recess lateral wall of the lower ring seat, it is provided with multiple gas vents.By the way that multiple gas vents are arranged,
In assembling process, the pushing of bulge loop will necessarily compress the space of annular groove, the row of exhausting-gas hole that compressed gas passes through setting
Out, the reaction paved can be stretched to film to avoid compressed air, be conducive to the mirror effect for improving film.
A connection pedestal is additionally provided on the outside of the lower ring seat.Further, by the way that a connection pedestal is arranged,
Practicability is increased convenient for the subsequent installation of entire conversion target convenient for its replacement.
Compared with prior art, the present invention having the following advantages and benefits:
1, a kind of micron dimension for electron beam emittance measurement of the present invention converts target assembly, upper using what is be mutually matched
Ring seat and lower ring seat, are provided with annular groove in lower ring seat, film are laid in lower ring seat, and the bulge loop of upper ring seat is smooth
Ground be pushed into annular recess in, during promotion, effect extensions so that film is stretched of bulge loop, formed mirror surface, lower ring seat with
Cooperation have preferable compressibility, thickness can be only had 0.9~2 micron light passing, ductility it is good film extension reach
Quartzy lamina dimensions are overcome to mirror effect to realize that the micron dimension for electron beam emittance measurement converts target assembly
It is small, be not easy to cleaning, disadvantage easily damaged, installation is inconvenient, achieved the purpose that using easy, easy to maintain, at low cost, and
And there is same high measurement accuracy within the scope of the various bores of 30~200mm of diameter, it can only 50-60mm relative to quartzy thin slice
For diameter, the bore of adaptation is substantially increased；
2, a kind of micron dimension for electron beam emittance measurement of the present invention converts target assembly, by upper ring seat bulge loop
Inside be provided with an annular seal pocket, the mode of a sideways expansion sealing ring is provided in the annular seal pocket, will be thin
Film is freely laid in lower ring seat, by the bulge loop of upper ring seat uniformly, horizontal soil pressure into the annular groove of lower ring seat, be pressed into
In journey under sideways expansion sealing ring and tensioning device ring groove inner wall friction, so that film is extended to the plane of mirror effect, lead to
It crosses the sideways expansion sealing ring with certain elasticity to act on film, avoids damage of the film under very stiff and demanding tensional state
It is bad；
3, a kind of micron dimension for electron beam emittance measurement of the present invention converts target assembly, by lower ring seat bottom
Strip groove is set, and strip groove is upwardly extended through sealing ring is compressed, and screw hole is arranged in bar shaped trench bottom, when upper ring seat and lower ring seat
It after matching connection, needs to be fixed using screw, by the way that strip groove is arranged, connects, be provided for convenient for the operation of screw
Spacious operating space improves the fixed efficiency of assembly.
Detailed description of the invention
Attached drawing described herein is used to provide to further understand the embodiment of the present invention, constitutes one of the application
Point, do not constitute the restriction to the embodiment of the present invention.In the accompanying drawings:
Fig. 1 is the semi-cutaway of assembling schematic diagram of the present invention.
Label and corresponding parts title in attached drawing:
The upper ring seat of 1-, ring seat under 2-, 4- compress sealing ring, and 3- keeps sealing ring, 5- sideways expansion sealing ring, 6- film,
7- strip groove, 8- gas vent, 9- connection pedestal.
Specific embodiment
To make the objectives, technical solutions, and advantages of the present invention clearer, the present invention is made below with reference to embodiment
Further to be described in detail, exemplary embodiment of the invention and its explanation for explaining only the invention, are not intended as to this
The restriction of invention.
Embodiment
As shown in Figure 1, a kind of micron dimension for electron beam emittance measurement of the present invention converts target assembly, including one
Lower ring seat 2, lower ring seat 2 are with reeded ring structure, outer diameter 92.2mm, internal diameter 73.9mm, the depth 9mm of groove, lower ring seat 2
Annular recess bottom be placed with compress sealing ring 4, the top of lower ring seat 2 have Radius 2mm half slot be used to place holding
Sealing ring 3, upper ring seat 1 are the ring structures with bulge loop, outer diameter 92mm, internal diameter 75mm, the depth 7mm of bulge loop, upper ring seat 1 it is convex
Ring internal diameter direction is provided with seal groove and is used to place sideways expansion sealing ring 5, seal groove outer diameter 79mm, width 3.2mm, upper 1 side of ring seat
The difference that face extends ring internal diameter under seal groove outer diameter and tensioning device is 5.1mm, is selected hereSideways expansion sealing
Circle 5 guarantees that 2 internal diameter of ring has certain frictional force under sideways expansion sealing ring 5 and tensioning device, can enable film 6 expand such as
Mirror surface, the present embodiment conversion target thickness extremely thin, preferably up to micron dimension, since Mylar film has preferable optics
Transparency also has preferable plane performance, compares with flexible relative and preferable ductility and be suitable for after support is open and flat
It needs to exert a force and carries out the occasion of support exhibition；And thickness can achieve a μm magnitude, it is smaller to the expansion effect of the angle of divergence of electron beam,
Also compare suitable for production conversion target is carried out, be based on These characteristics, Mylar film 6, thickness are used in the present embodiment device
Optional 0.9-3 microns, strip groove 7 is set in lower 2 bottom of ring seat, strip groove 7 is upwardly extended through sealing ring 4 is compressed, in bar shaped
Screw hole is arranged in 7 bottom of slot, after upper ring seat 1 matches connection with lower ring seat 2, provides spacious operation sky for the assembly of screw
Between, on the annular recess lateral wall of lower ring seat 2, multiple gas vents 8 are provided with, in assembling process, the pushing of bulge loop is inevitable
The space of annular groove can be compressed, compressed gas is discharged by the gas vent 8 of setting, can be to avoid compressed air to film
The reaction paved is stretched, is conducive to the mirror effect for improving film, is additionally provided with a connection pedestal in the outside of lower ring seat 2
9, convenient for the subsequent installation of entire conversion target.
Conversion target assembly installation steps: firstly, smooth being layered on of Mylar film 6, which is installed top, keeps sealing ring 3 and bottom
Portion compresses in the lower ring seat 2 of sealing ring 4, and guarantees that surrounding has more than the surplus of 50mm；Second step, it is close sideways expansion is installed
The bulge loop of the upper ring seat 1 of seal 5 is steady, is slowly pressed into the annular groove of lower ring seat 2, close using lower pressure and sideways expansion
The frictional force of seal 5 makes film stretching, extension smoothly such as mirror；Third step, when the bulge loop of upper ring seat 1 is pressed onto the bottom of lower 2 groove of ring seat,
Using compression sealing ring 4, sealing ring 3 is kept further to compress film, and guarantees that film discord extruding metal is broken；Finally, with
Screw passes through strip groove 7, and upper ring seat 1 and lower ring seat 2 are fixed.
Above-described specific embodiment has carried out further the purpose of the present invention, technical scheme and beneficial effects
It is described in detail, it should be understood that being not intended to limit the present invention the foregoing is merely a specific embodiment of the invention
Protection scope, all within the spirits and principles of the present invention, any modification, equivalent substitution, improvement and etc. done should all include
Within protection scope of the present invention.
Claims (5)
1. a kind of micron dimension for electron beam emittance measurement converts target assembly, it is characterised in that: including a lower ring seat
(2), the upper surface of lower ring seat (2) has been recessed an annular recess along its axis, further includes one and lower ring seat (2) phase
The upper ring seat (1) matched, the lower surface of upper ring seat (1) are provided with downwardly projecting and match with the annular recess of lower ring seat (2)
Bulge loop, after the bulge loop of upper ring seat (1) is inserted into the annular recess of lower ring seat (2), the film (6) being laid on lower ring seat (2) is expanded
It opens and forms mirror surface；
It is provided with an annular seal pocket on the inside of upper ring seat (1) bulge loop, a side is provided in the annular seal pocket
Face extends sealing ring (5)；On the annular recess lateral wall of the lower ring seat (2), it is provided with multiple gas vents (8).
2. a kind of micron dimension for electron beam emittance measurement according to claim 1 converts target assembly, feature
It is, the end face on the inside of lower ring seat (2) annular recess has been recessed top groove along the axial direction of lower ring seat (2), is pushing up
It is equipped in portion's groove and keeps sealing ring (3).
3. a kind of micron dimension for electron beam emittance measurement according to claim 1 converts target assembly, feature
It is, is equipped in the annular recess of the lower ring seat (2) and compresses sealing ring (4).
4. a kind of micron dimension for electron beam emittance measurement according to claim 3 converts target assembly, feature
It is, the strip groove (7) for extending downwardly and entering lower ring seat (2) bottom is provided on the compression sealing ring (4), in item
The bottom of shape slot (7) is provided with the screw hole through lower ring seat (2).
5. a kind of micron dimension for electron beam emittance measurement according to claim 1 converts target assembly, feature
It is, is additionally provided with a connection pedestal (9) on the outside of the lower ring seat (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710316119.3A CN106950590B (en) | 2017-05-08 | 2017-05-08 | A kind of micron dimension conversion target assembly for electron beam emittance measurement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710316119.3A CN106950590B (en) | 2017-05-08 | 2017-05-08 | A kind of micron dimension conversion target assembly for electron beam emittance measurement |
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| Publication Number | Publication Date |
|---|---|
| CN106950590A CN106950590A (en) | 2017-07-14 |
| CN106950590B true CN106950590B (en) | 2019-06-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710316119.3A Active CN106950590B (en) | 2017-05-08 | 2017-05-08 | A kind of micron dimension conversion target assembly for electron beam emittance measurement |
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| CN114047540B (en) * | 2021-09-28 | 2023-06-20 | 西北核技术研究所 | Measuring method and measuring system for beam current density distribution of high-current pulse electron beam |
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| CN204613045U (en) * | 2015-04-24 | 2015-09-02 | 昆山运城塑业有限公司 | Film impact resistance proving installation |
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| CN106950590A (en) | 2017-07-14 |
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