CN206674287U - A kind of surface dielectric barrier discharge plasma material handling device - Google Patents
A kind of surface dielectric barrier discharge plasma material handling device Download PDFInfo
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- CN206674287U CN206674287U CN201720329786.0U CN201720329786U CN206674287U CN 206674287 U CN206674287 U CN 206674287U CN 201720329786 U CN201720329786 U CN 201720329786U CN 206674287 U CN206674287 U CN 206674287U
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- electrode
- circular hole
- dielectric barrier
- handling device
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Abstract
A kind of surface dielectric barrier discharge plasma material handling device, including：Integral type surface discharge electrode with fixation circular hole；For sealing and adjusting the silicagel pad in corona treatment gap；Base with fixation circular hole；Fixation screw and nut.The integral type surface discharge electrode of the band fixation circular hole, including：Grounding electrode, medium, high-field electrode, and the spring of connection high-field electrode and power supply；The silicagel pad for being used to sealing and adjusting corona treatment gap, to place the engraved structure of pending material, edge carries fixation circular hole for centre；The base carries air admission hole and venthole；The screw sequentially passes through base, the circular hole in silicagel pad and surface discharge electrode, is then tightened with nut, reaches sealing effectiveness.
Description
Technical field
The utility model belongs to nano material preparation and processing technology field, specifically a kind of to be used to realize nano material
The surface discharge plasma material handling device for decomposing, reducing, regenerate and being modified.
Background technology
Plasma is the state of material the 4th, be by equal number of electronics (also including electronegative ion sometimes) and just from
Son, and the molecule of other ground state and excitation state and former molecular quasi-electroneutrality state.Distinguished according to temperature, can be by plasma
Body is divided into high-temperature plasma and low temperature plasma.Low temperature plasma can be divided into hot plasma and cold plasma again.
Cold plasma has a higher electron temperature (1-10eV), and relatively low gas temperature (can as little as room temperature).Adopt
The preparation and modification of nano material are carried out with cold-island effect, has short preparation period, energy consumption low and environment-friendly etc. excellent
Point, wide application prospect is presented in fields such as the decomposition of nano material, reduction, regeneration and modifications.
Dielectric barrier discharge is the effective ways that cold plasma is produced under a kind of atmospheric pressure, can be divided into bulk phase media stop
Electric discharge and surface dielectric barrier discharge, the vacuum equipment that it need not be costly, and it is simple to operate.Bulk phase media barrier discharge
Material is prepared or handled, material need to be placed on heating region.For thin-film material, influenceed by material thickness, body
Certain limitation be present in the processing of phase medium barrier discharge.Surface dielectric barrier discharge, the thickness of material is not limited, in recent years
People are caused more and more to pay close attention to.
Prepared by surface dielectric barrier discharge and surface discharge electrode is fixed on by processing nano material, generally use insulating cement
On the material such as polytetrafluoroethylene (PTFE) or lucite, then itself and the base equipped with pending material are sealed.The type reactor,
Due to using the glue bond that insulate, resistance to temperature is relatively low, and because insulating cement aging, universal life-span are not grown.In addition, insulating cement etc. bonds
The use of agent, easily processing material is polluted.
In the prior art, the patent of Application No. 201210382439.6, be related to a kind of surface dielectric barrier discharge etc. from
Daughter unit, it need to be amplified using more complicated expressing technique article on plasma body unit.Number of patent application is
200510109717.0 patent, be related to a kind of surface discharge type air cleaning device, unsealing.Remaining surface dielectric impedance is put
Electric patent, the preparation of plasm display panel is focused primarily upon, the sealing of electric discharge device is not implemented.Such as：Patent Shen
Please number be 201310509742.2 and 200610100212.2 patent, relate separately to a kind of three-electrode surface discharge type plasma
Panel and a kind of surface discharge plasma display panel.In addition, paper (J.Phys.D:Appl.Phys.42(2009)
032001) TiO is prepared using surface dielectric barrier discharge electrode2Film, by the way that electrode is bonded on a certain material, and then with bottom
Seat realizes sealing.
Utility model content
Disadvantages mentioned above and deficiency be present for prior art, the utility model provides a kind of surface dielectric barrier discharge etc.
Gas ions material handling device.Punched on surface discharge electrode medium, be made of one the surface discharge electrode of formula structure, used
Silicagel pad plasma processing gap is adjusted, and device is sealed.The device service life is grown, and can avoid adhesive
Pollution, material preparation and processing can be carried out using the device.
To achieve the above object, the utility model provides a kind of surface dielectric barrier discharge plasma material process dress
Put, including：Integral type surface discharge electrode with fixation circular hole；For sealing and adjusting the silica gel in corona treatment gap
Pad；Base with fixation circular hole；Screw and nut.The integral type surface discharge electrode of the band fixation circular hole, including：Connect
Ground electrode, medium, high-field electrode, and the spring of connection high-field electrode and power supply；It is described to be used to sealing and adjusting plasma
The silicagel pad in gap is handled, centre is provided with the engraved structure for being used for placing pending material, and the silicagel pad edge is used with fixed
Circular hole；The base is provided with air admission hole and venthole.
Further, the grounding electrode, medium and high-field electrode are close to place from top to bottom successively.
Further, the grounding electrode and high-field electrode are one kind in silver, aluminium and copper material.
Further, the medium is one kind in quartz and oxidation aluminium material.
Further, the high-field electrode is connected by penetrating the spring of base with power supply, and the spring is stainless steel
Matter.
Further, hollow out shape is more slightly larger than the region area that high-field electrode and passage surround among the silicagel pad,
The position of the circular hole at the edge of the silicagel pad is corresponding with the circular hole on integral type surface discharge electrode and base.
Further, the base is one kind in polytetrafluoroethylene (PTFE), lucite and bakelite material.
Further, the spring passes through base, and is sealed in base bottom with insulating cement.
Further, screw sequentially passes through the circular hole of base, silicagel pad and integral type surface discharge electrode, is twisted with nut
Tightly, realization device seals.
The utility model can obtain following technique effect due to using above technical scheme：Surface of the present utility model
Sparking electrode is integral type structure, and is adjusted and is sealed using silicagel pad plasma processing gap.The apparatus structure
Simply, manufacturing cost is low, service life length, can avoid adhesive contamination, can carry out material preparation and processing.
Brief description of the drawings
The utility model shares the width of accompanying drawing 1：
Fig. 1 is a kind of surface dielectric barrier discharge plasma material handling device structural representation；
Number explanation in figure：1st, grounding electrode；2nd, medium；3rd, high-field electrode；4th, plasma slab；5th, pending material；
6th, base；7th, spring；8th, screw；9th, silicagel pad；10th, nut.
Embodiment
For the ease of understanding the utility model, the utility model is more fully retouched below with reference to relevant drawings
State.Preferred embodiment of the present utility model is given in accompanying drawing.But the utility model can come in many different forms
Realize, however it is not limited to embodiment described herein.On the contrary, the purpose for providing these embodiments is made to of the present utility model
The understanding of disclosure more thorough and comprehensive.
Unless otherwise defined, all of technologies and scientific terms used here by the article is led with belonging to technology of the present utility model
The implication that the technical staff in domain is generally understood that is identical.Term used in specific embodiment of the present utility model herein
It is intended merely to describe the purpose of specific embodiment, it is not intended that in limitation the utility model.
Embodiment 1
The present embodiment provides a kind of surface dielectric barrier discharge plasma material handling device, including：Band fixation is justified
The integral type surface discharge electrode in hole, for sealing and adjusting the silicagel pad 9 in corona treatment gap；With fixation circular hole
Base 6；Screw 8 and nut 10 are used in fixation.
The integral type surface discharge electrode of the band fixation circular hole, including：Grounding electrode 1, medium 2, high-field electrode 3,
And the spring 7 of connection high-field electrode and power supply；The grounding electrode 1, medium 2 and high-field electrode 3 are close to respectively, sequentially for from
Under up to.The grounding electrode 1 and high-field electrode 3 are one kind in silver, aluminium and copper material, the preferably silver-colored material of the present embodiment.Institute
Give an account of matter 2 and preferably aoxidize aluminium material for one kind in quartz and oxidation aluminium material, the present embodiment.
The silicagel pad 9 for being used to sealing and adjusting corona treatment gap, centre, which is provided with, places pending material
Engraved structure, the shape of the engraved structure can be regular or irregular, and its area is more than high-field electrode and passage surrounds
Region, the edge of the silicagel pad 9 is provided with fixation circular hole；The high-field electrode 3 is by penetrating the spring 7 of base 6 and electricity
Source connects, and the spring 7 is stainless steel.The base 6 is one in polytetrafluoroethylene (PTFE), lucite and bakelite material
Kind, preferably polytetrafluoroethylene material.Sealed between spring 7 and base 6 by insulating cement.High-field electrode 3 is pectinate texture, at it
It is formed immediately below plasma slab 4.Described pending material 5 is placed on the underface of high-field electrode 3.Preferably, it is pending
Material 5 is thin-film material.
The middle hollow out shape of silicagel pad 9 is more slightly larger than the region area that high-field electrode and passage surround.The base 6
With air admission hole and venthole.On the fixation circular hole and integral type surface discharge electrode and base 6 at the edge of silicagel pad 9
Circular hole is corresponding, and its pore size is consistent with the size of screw 8.Screw 8 sequentially passes through base, silicagel pad and integral type surface and put
The circular hole of electrode, tightened with nut 10, realization device sealing.
Surface discharge electrode is designed as integral structure by the application, is avoided and is caused electrode easily to come off using adhesive
The problem of.The design of the reactor, the simple preparation of surface discharge plasma material apparatus is realized, avoid adhesive dirt
Dye, and extend its service life.
It is described above, the only preferable embodiment of the utility model, but the scope of protection of the utility model is not
This is confined to, any one skilled in the art is in the technical scope that the utility model discloses, according to this practicality
New technical scheme and its utility model design are subject to equivalent substitution or change, should all cover in protection model of the present utility model
Within enclosing.
Claims (9)
- A kind of 1. surface dielectric barrier discharge plasma material handling device, it is characterised in that including：With fixation circular hole Integral type surface discharge electrode；For sealing and adjusting the silicagel pad (9) in corona treatment gap；Bottom with fixation circular hole Seat (6)；Screw (8) and nut (10)；The integral type surface discharge electrode of the band fixation circular hole, including：Grounding electrode (1), medium (2), high-field electrode (3), and connection high-field electrode and power supply spring (7)；The centre of the silicagel pad (9), which is provided with, to be used to place pending material Engraved structure, silicagel pad (9) edge carries fixation circular hole；The base (6) is provided with air admission hole and venthole.
- A kind of 2. surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that institute Grounding electrode (1), medium (2) and high-field electrode (3) is stated to be close to place from top to bottom successively.
- A kind of 3. surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that institute Grounding electrode (1) and high-field electrode (3) are stated as one kind in silver, aluminium and copper material.
- A kind of 4. surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that institute Matter (2) is given an account of as one kind in quartz and oxidation aluminium material.
- 5. a kind of surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that high Piezoelectricity pole (3) is connected by penetrating the spring (7) of base (6) with power supply, and the spring (7) is stainless steel.
- A kind of 6. surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that institute It can be rule or irregular to state hollow out shape among silicagel pad (9), and its area is more than the area that high-field electrode and passage surround Domain, the position of the circular hole on the edge of the silicagel pad (9) are relative with the circular hole on integral type surface discharge electrode and base (6) Should.
- A kind of 7. surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that institute Base (6) is stated as one kind in polytetrafluoroethylene (PTFE), lucite and bakelite material.
- A kind of 8. surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that institute State spring (7) and pass through base (6), and sealed in the bottom of base with insulating cement.
- A kind of 9. surface dielectric barrier discharge plasma material handling device according to claim 1, it is characterised in that spiral shell Silk (8) sequentially passes through the circular hole of base (6), silicagel pad (9) and integral type surface discharge electrode, is tightened with nut (10), realizes Device seals.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720329786.0U CN206674287U (en) | 2017-03-31 | 2017-03-31 | A kind of surface dielectric barrier discharge plasma material handling device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720329786.0U CN206674287U (en) | 2017-03-31 | 2017-03-31 | A kind of surface dielectric barrier discharge plasma material handling device |
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| Publication Number | Publication Date |
|---|---|
| CN206674287U true CN206674287U (en) | 2017-11-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201720329786.0U Expired - Fee Related CN206674287U (en) | 2017-03-31 | 2017-03-31 | A kind of surface dielectric barrier discharge plasma material handling device |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109905954A (en) * | 2019-03-26 | 2019-06-18 | 西安交通大学 | Surface discharge plasma device |
| CN110176366A (en) * | 2019-04-16 | 2019-08-27 | 中国科学院电工研究所 | A kind of double-sided plasma body processing system of capacitor film material |
| CN111389189A (en) * | 2020-03-11 | 2020-07-10 | 北京化工大学 | Wearable device and method for degrading dangerous chemicals by using plasma |
-
2017
- 2017-03-31 CN CN201720329786.0U patent/CN206674287U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109905954A (en) * | 2019-03-26 | 2019-06-18 | 西安交通大学 | Surface discharge plasma device |
| CN110176366A (en) * | 2019-04-16 | 2019-08-27 | 中国科学院电工研究所 | A kind of double-sided plasma body processing system of capacitor film material |
| CN110176366B (en) * | 2019-04-16 | 2021-07-02 | 中国科学院电工研究所 | Double-sided plasma processing system for capacitor film material |
| CN111389189A (en) * | 2020-03-11 | 2020-07-10 | 北京化工大学 | Wearable device and method for degrading dangerous chemicals by using plasma |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20171124 Termination date: 20190331 |
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| CF01 | Termination of patent right due to non-payment of annual fee |