CN206635414U - 一种去除cvd反应腔体内壁沉积膜的装置 - Google Patents
一种去除cvd反应腔体内壁沉积膜的装置 Download PDFInfo
- Publication number
- CN206635414U CN206635414U CN201720391476.1U CN201720391476U CN206635414U CN 206635414 U CN206635414 U CN 206635414U CN 201720391476 U CN201720391476 U CN 201720391476U CN 206635414 U CN206635414 U CN 206635414U
- Authority
- CN
- China
- Prior art keywords
- shower nozzle
- cvd reaction
- cover body
- pipeline
- removal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
Description
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201720391476.1U CN206635414U (zh) | 2017-04-14 | 2017-04-14 | 一种去除cvd反应腔体内壁沉积膜的装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201720391476.1U CN206635414U (zh) | 2017-04-14 | 2017-04-14 | 一种去除cvd反应腔体内壁沉积膜的装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN206635414U true CN206635414U (zh) | 2017-11-14 |
Family
ID=60245602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201720391476.1U Active CN206635414U (zh) | 2017-04-14 | 2017-04-14 | 一种去除cvd反应腔体内壁沉积膜的装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN206635414U (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106967961A (zh) * | 2017-04-14 | 2017-07-21 | 王宏兴 | 一种去除cvd反应腔体内壁沉积膜的方法 |
-
2017
- 2017-04-14 CN CN201720391476.1U patent/CN206635414U/zh active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106967961A (zh) * | 2017-04-14 | 2017-07-21 | 王宏兴 | 一种去除cvd反应腔体内壁沉积膜的方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN209104115U (zh) | 具有多层等离子体侵蚀保护的制品 | |
WO2006069085A3 (en) | An in-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber | |
WO2004082008A1 (ja) | Cvd装置及びcvd装置のクリーニング方法 | |
CN206635414U (zh) | 一种去除cvd反应腔体内壁沉积膜的装置 | |
CN106967961A (zh) | 一种去除cvd反应腔体内壁沉积膜的方法 | |
KR20130069396A (ko) | 성막 장치 및 성막 방법 | |
TW200307055A (en) | CVD apparatus and cleaning method for CVD apparatus using the same | |
CN102896113A (zh) | 一种新型的双介质阻挡常压等离子体自由基清洗喷枪 | |
JP2004296526A (ja) | プラズマcvd装置 | |
JPH08172083A (ja) | 副生成物トラップ装置及びその洗浄方法 | |
JP2007227501A (ja) | 半導体製造装置のクリーニング方法及びクリーニング機能付き半導体製造装置 | |
US9017487B2 (en) | Deposition chamber cleaning method including stressed cleaning layer | |
CN102615068B (zh) | Mocvd设备的清洁方法 | |
TW202109705A (zh) | 使用電漿及蒸氣之乾式清潔設備 | |
JP5888674B2 (ja) | エッチング装置およびエッチング方法およびクリーニング装置 | |
TWI754280B (zh) | 使用電漿及蒸氣之乾式清潔方法 | |
JP3979003B2 (ja) | 成膜装置 | |
KR100702063B1 (ko) | 3개의 세정 소스 배출 포트가 형성된 도파관을 구비하는 cvd 장비의 원격 플라즈마 세정 시스템 | |
KR20080062112A (ko) | 박막 증착 장비의 세정 방법 | |
JPH01286424A (ja) | 半導体製造装置の洗浄方法 | |
JPH11307521A (ja) | プラズマcvd装置及びその使用方法 | |
TW201343263A (zh) | 對象物洗淨系統及對象物洗淨方法 | |
JPH07110996B2 (ja) | プラズマcvd装置 | |
JPS6034633B2 (ja) | プラズマ気相反応装置 | |
JP2007067033A (ja) | 基板処理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20190924 Address after: 710049 Xianning West Road, Shaanxi, China, No. 28, No. Patentee after: Xi'an Jiaotong University Address before: 710049 Xianning West Road, Shaanxi, China, No. 28, No. Patentee before: Wang Hong Xing |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20211117 Address after: 710075 No. 4169, maker space, 1896, 4th floor, returnees building, No. 18, Gaoxin 1st Road, high tech Zone, Xi'an, Shaanxi Province Patentee after: Xi'an te te Semiconductor Technology Co.,Ltd. Address before: 710049 No. 28 West Xianning Road, Shaanxi, Xi'an Patentee before: XI'AN JIAOTONG University |
|
TR01 | Transfer of patent right |