CN206635410U - Microwave plasma CVD diamond reaction unit - Google Patents
Microwave plasma CVD diamond reaction unit Download PDFInfo
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- CN206635410U CN206635410U CN201720392157.2U CN201720392157U CN206635410U CN 206635410 U CN206635410 U CN 206635410U CN 201720392157 U CN201720392157 U CN 201720392157U CN 206635410 U CN206635410 U CN 206635410U
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Abstract
The utility model is a kind of microwave plasma CVD diamond reaction unit, including resonant cavity, resonant cavity is made up of upper cylindrical cavity, middle circle arc cavity and lower cylindrical cavity, and the radius of curvature of middle circle arc cavity is equal to microwave wavelength；Upper cylindrical cavity top cover is provided with reaction gas inlet and is provided with quartz bell cover medium window and coaxial probe antenna, and blast pipe and exhaust vent are provided with coaxial probe antenna；Reflecting plate and cylinder lifting base station are provided with lower cylindrical chamber body, reflecting plate is provided with reaction gas outlet, and the bottom plate of lower cylindrical cavity is provided with reacting gas general export.The utility model device has that focusing power is strong, can accommodate higher input power, it is simple in construction easily manufactured the advantages that.
Description
Technical field
Chemical vapour deposition technique field is the utility model is related to, particularly one kind is used for plasma activated chemical vapour deposition
Microwave plasma CVD diamond reaction unit.
Background technology
Diamond has excellent physical and chemical performance, before all having wide application in many fields of national economy
Scape.The method of diamond is prepared numerous, microwave plasma CVD（MPCVD）Method utilizes microwave electromagnetic field energy
Measure to excite plasma, electrode fouling will not be produced, be to prepare the preferred method of high quality diamond.Improve the heavy of diamond
The target that product speed and quality are always scientific worker and enterprise is pursued.The density of plasma is to influence diamond deposition speed
The key factor of rate and quality, so to obtain highdensity plasma, it is necessary to which MPCVD devices possess strong microwave electromagnetic field
While focusing power, higher microwave input power can be accommodated.
Coaxial probe antenna and quartz bell cover because field uniformity simple in construction, easily manufactured, being formed is good, so the two
Combination obtains more application as microwave coupling mechanism and medium window in MPCVD devices.But quartz bell cover medium window
Use, the input of microwave power can be limited.Because on the one hand when input power is higher, the hydrogen in plasma is former
Sub easily etch quartz bell jar inwall, this can not only make the Si element pollution diamonds etched, will also result in bell jar damage；Separately
On the one hand, during MPCVD diamonds, to ensure that reacting gas can reach matrix and plasma slab, and obtain sufficiently
Utilize, typically entered using reaction chamber top, the mode of base station or cavity bottom discharge.But quartz bell cover is used as medium
During window, it is this enter outlet mode be not easily accomplished.This is because, setting air inlet pipe on quartz bell cover, connecting portion can be caused
Seal aging and the destruction in the presence of microwave electromagnetic field divided, while connector and connecting tube can also cause to Electric Field Distribution
Interference.So above two uses quartz bell cover as medium window device, increase quartz ampoule or quartz ring typically in bell jar,
Reacting gas is guided to by reaction chamber bottom to the position higher than chip bench or plasma.Due to quartz ampoule or quartz ring distance etc.
Gas ions are nearer, so pollution that also can be because of etching and to diamond.Therefore, in order to avoid the etching problem of quartz bell cover, frequency
The MPCVD devices that rate is 2.45 GHz are usually no more than 5 kW using power, and the device that frequency is 915 MHz uses power one
As be no more than 30 kW.
The content of the invention
To solve above technical problem, it is anti-that the utility model provides a kind of microwave plasma CVD diamond
Device is answered, to reach the purpose for avoiding quartz bell cover pollution, improving resonator focusing power, accommodating high microwave power.
The utility model is achieved by the following technical solution：
A kind of microwave plasma CVD diamond reaction unit, including resonant cavity, described resonator
Body is divided into cylindrical cavity, middle circle arc cavity and lower cylindrical cavity, wherein, the radius of curvature of middle circle arc cavity
R is equal to microwave wavelength λ（The cavity wall of middle circle arc cavity is the circular arc cavity wall of evagination, i.e. middle circle arc cavity is one
The spherical cavity of upper and lower part is clipped, radius of curvature R=microwave wavelength λ of its circular arc cavity wall）, upper cylindrical cavity it is straight
Footpath is more than the diameter of middle circle arc cavity（That is, the maximum that the diameter of upper cylindrical cavity is more than middle circle arc cavity is straight
Footpath）, the diameter of middle circle arc cavity is more than the diameter of lower cylindrical cavity（That is, the maximum gauge of middle circle arc cavity is big
In the diameter of lower cylindrical cavity）；Quartz bell cover medium window and coaxial probe day are installed on the top cover of upper cylindrical cavity
Line, quartz bell cover medium window are located at the underface of coaxial probe antenna, quartz bell cover medium window and upper cylindrical cavity top
The junction of lid is sealed set；The hollow inner wire of coaxial probe antenna is arranged to blast pipe, and the outer of coaxial probe antenna is led
Exhaust vent is provided with body sidewall；The reaction communicated with resonant cavity inner space is additionally provided with the top cover of upper cylindrical cavity
Gas access；Reflecting plate is provided with lower cylindrical chamber body, reaction gas outlet, the middle part peace of reflecting plate are provided with reflecting plate
Base station is lifted equipped with cylinder；Reacting gas general export is provided with the bottom plate of lower cylindrical cavity；Upper cylindrical cavity, centre
Circular arc cavity, lower cylindrical cavity, quartz bell cover medium window, coaxial probe antenna, reflecting plate and cylinder lifting base station
It is all located on same axis.
The utility model device is passed through compressed gas in the running, by the blast pipe of the hollow inner wire of coaxial antenna, then
Excluded by the exhaust vent on the outer conductor of coaxial probe antenna, so as to be cooled down to quartz bell cover medium window.It is anti-in device
The gas access for answering gas to be covered by upper cylindrical cavity enters in resonant cavity, first through the reaction gas outlet on reflecting plate,
Discharged again through the reacting gas general export on lower cylindrical chamber bottom plate, form the gas flow pattern of upper entering and lower leaving.
As preferable technical scheme, accent, quartz bell cover medium window are provided with the top cap central of upper cylindrical cavity
For bowl structure, rib is taken provided with extension in its rim of a bowl periphery, quartz bell cover medium window is placed in the direction of the rim of a bowl upward
In the accent of upper cylindrical cavity, and on quartz bell cover medium window take rib sealing be overlapped on cylindrical chamber coelomostome
On the top cover at place；Coaxial probe antenna is arranged on the opening position of face accent on the top cover of upper cylindrical cavity；Quartz bell cover is situated between
The bore of matter window is more than the diameter of coaxial probe antenna outer conductor.
As preferable technical scheme, take what rib mutually overlapped with quartz bell cover medium window on the top cover of upper cylindrical cavity
Position is provided with a circle seal groove, and sealing ring is provided with seal groove.
As preferable technical scheme, the quantity of the exhaust vent set in the outer conductor sidewall of coaxial probe antenna is 2-8
It is individual.
As preferable technical scheme, the quantity of the reaction gas outlet set on reflecting plate is 3-12.
As preferable technical scheme, microwave wavelength λ is 117.4-127.4mm, preferably 122.4mm, middle circle arc-shaped cavity
The radius of curvature R of body is equal to microwave wavelength λ, preferably a diameter of 270-300mm of upper cylindrical cavity, 284mm, lower cylindrical chamber
The diameter of body 3 takes 180-230mm, preferably 200mm.
As preferable technical scheme, microwave wavelength λ takes 317.9-337.9mm, preferably 327.9mm, middle circle arc-shaped cavity
The radius of curvature R of body is equal to microwave wavelength λ, preferably a diameter of 740-800mm of upper cylindrical cavity, 758mm, lower cylindrical chamber
The diameter of body takes 400-600mm, preferably 500mm.
The utility model device compared with prior art, has the advantages that：
（1）The actual circular arc cavity that the utility model device proposes is the spherical cavity for clipping upper and lower part, simultaneously
Set diameter to be more than the upper cylindrical cavity of circular arc cavity on device top and set diameter to be less than circular arc in device bottom
The lower cylindrical cavity of cavity.The utility model using electromagnetic wave reflection and principle of interference and it is spherical can preferably focus on it is micro-
The characteristics of ripple electric field, by the diameter for adjusting upper and lower cylindrical cavity so that microwave after coaxial antenna is coupled into resonator,
It can form that intensity is high, equally distributed focusing electric field in circular arc cavity centre of sphere opening position on the lower side, as shown in Figure 1；
（2）The utility model device tips upside down on bowl-shape quartz bell cover medium window below coaxial probe antenna, makes it
Away from heating region, plasma is avoided to pollution caused by quartz bell cover medium opening etch, is advantageous to prepare height
The diamond product of quality.In addition, by the way that the hollow inner wire of coaxial probe antenna is arranged into blast pipe, and in its outer conductor
Upper setting exhaust vent, it is passed through compressed gas and quartz bell cover medium window is cooled down, hot environment can be avoided to quartz clock
The damage of cover medium window, the service life of quartz bell cover medium window is improved, reduce production cost.
（3）Reaction gas inlet is arranged on the top cover of upper cylindrical cavity by the utility model device, by reacting gas
Outlet is arranged on the reflecting plate of bottom of device, finally sets reacting gas general export in the bottom of lower cylindrical cavity so that
Reacting gas forms top-down gas flow pattern after being passed through resonator, can be in substrate for diamond deposition
Top persistently provides the active group needed for diamond film, and forms uniform gas flowfield, is advantageous to improve diamond
Growth efficiency and uniformity.
Brief description of the drawings
Fig. 1 is the structural representation of the utility model device.
Fig. 2 is the microwave electric field analog result figure of the utility model device.
Fig. 3 is the micromorphology figure for the diamond film prepared using the utility model device.
Fig. 4 is the Raman line for the diamond film prepared using the utility model device.
In figure：Cylindrical cavity, 4- quartz clocks under the upper cylindrical cavities of 1-, 1-1- accents, 2- middle circles arc cavity, 3-
Cover medium window, 4-1- take rib, 5- coaxial probes antenna, 6- blast pipes, 7- exhaust vents, 8- reaction gas inlets, 9- reflecting plates,
10- reaction gas outlets, 11- cylinder liftings base station, 12- reacting gas general export, 13- seal grooves, 14- sealing rings, 15- bases
Piece, 16- plasmas.
Embodiment
In order that those skilled in the art are better understood from the utility model, below in conjunction with refer to the attached drawing and in conjunction with the embodiments
Further clear, complete explanation is made to the utility model.It should be noted that in the case where not conflicting, in the application
Feature in embodiment and embodiment can be mutually combined.
As shown in figure 1, a kind of microwave plasma CVD diamond reaction unit, including resonant cavity, institute
The resonant cavity stated is divided into cylindrical cavity 1, middle circle arc cavity 2 and lower cylindrical cavity 3, wherein, middle circular arc
Cavity 2 is the spherical cavity for clipping upper and lower part, and the radius of curvature R of middle circle arc cavity 2 is equal to microwave wavelength λ, upper circle
The diameter of cylindrical cavity 1 is more than the maximum gauge of middle circle arc cavity 2, under the maximum gauge of middle circle arc cavity 2 is more than
The diameter of cylindrical cavity 3；Quartz bell cover medium window 4 and coaxial probe antenna are installed on the top cover of upper cylindrical cavity 1
5, quartz bell cover medium window 4 is located at the underface of coaxial probe antenna 5, quartz bell cover medium window 4 and upper cylindrical cavity 1
The junction of top cover is sealed set, is specially：Accent 1-1 is provided with the top cap central of upper cylindrical cavity 1, quartz bell cover is situated between
Matter window 4 is bowl structure, rib 4-1 is taken what its rim of a bowl periphery was provided with extension, quartz bell cover medium window 4 with the rim of a bowl upward
Direction is placed in the accent 1-1 of cylindrical cavity 1, and now, the bowl body of quartz bell cover medium window 4 is partially disposed in cylinder
In shape cavity, and the top being overlapped at the accent 1-1 of cylindrical cavity 1 for taking rib 4-1 sealings on quartz bell cover medium window 4
Cover, wherein, the overlap joint of described sealing is：On the top cover of upper cylindrical cavity 1 rib 4-1 is taken with quartz bell cover medium window 4
Mutually the position of overlap joint is provided with a circle seal groove 13, and sealing ring 14 is provided with seal groove 13；Coaxial probe antenna 5 is arranged on upper circle
The opening position of face accent 1-1 and quartz bell cover medium window 4 on the top cover of cylindrical cavity 1, and quartz bell cover medium window 4
Bore be more than the outer conductor of coaxial probe antenna 5 diameter；The hollow inner wire of coaxial probe antenna 5 is arranged to blast pipe 6, together
Exhaust vent 7 is provided with the outer conductor sidewall of axle probe antenna 5；It is additionally provided with the top cover of upper cylindrical cavity 1 and resonator
The reaction gas inlet 8 that body inner space communicates；Reflecting plate 9 is provided with lower cylindrical cavity 3, is provided with reflecting plate 9 anti-
Gas vent 10 is answered, the middle part of reflecting plate 9 is provided with cylinder lifting base station 11, superfine product is provided with cylinder lifting base station 11
Substrate 15, plasma 16 are placed on substrate 15；Reacting gas general export 12 is provided with the bottom plate of lower cylindrical cavity 3；On
It is cylindrical cavity 1, middle circle arc cavity 2, lower cylindrical cavity 3, quartz bell cover medium window 4, coaxial probe antenna 5, anti-
Penetrate plate 9 and cylinder lifting base station 11 is all located on same axis.
In the art, common industrial microwave frequency has two kinds, is 2.45GHz and 915MHz respectively, frequency
For wavelength X corresponding to 2.45GHz microwave1=122.4mm, it is allowed to which deviation range is ± 5mm, i.e. microwave wavelength λ1Desirable 117.4-
127.4mm, wherein it is preferred that 122.4mm；Frequency is wavelength X corresponding to 915MHz microwave2=327.9mm, it is allowed to which deviation range is
± 10mm, i.e. microwave wavelength λ2Desirable 317.9-337.9mm, wherein it is preferred that 327.9mm.
In the utility model device, when microwave wavelength λ takes 117.4-127.4mm, the curvature half of middle circle arc cavity 2
Footpath R is equal to microwave wavelength λ, and the diameter of upper cylindrical cavity 1 takes 270-300mm, and the diameter of lower cylindrical cavity 3 takes 180-
230m.In above-mentioned each parameter, the preferred 122.4mm of microwave wavelength λ, the preferred 122.4mm of radius of curvature R of middle circle arc cavity 2,
The preferred 284mm of diameter of upper cylindrical cavity 1, the preferred 200mm of diameter of lower cylindrical cavity 3.When microwave wavelength λ takes 317.9-
During 337.9mm, the radius of curvature R of middle circle arc cavity 2 is equal to microwave wavelength λ, and the diameter of upper cylindrical cavity 1 takes 740-
800mm, the diameter of lower cylindrical cavity 3 take 400-600 mm.In above-mentioned each parameter, the preferred 327.9mm of microwave wavelength λ are middle
The preferred 327.9mm of radius of curvature R of circular arc cavity 2, the preferred 758mm of diameter of upper cylindrical cavity 1, lower cylindrical cavity 3
The preferred 500mm of diameter.In addition, in the utility model device, the exhaust vent that is set in the outer conductor sidewall of coaxial probe antenna 5
7 quantity takes the arbitrary value in 2-8, and the quantity of the reaction gas outlet 10 set on reflecting plate 9 takes any in 3-12
Value.
Fig. 2 is the microwave electric field analog result figure of the utility model device.It can be seen that the resonant cavity of device
In, the electric field region only formed with an amplitude maximum above substrate 15, show that the utility model device has very strong gather
The ability of burnt electric field；Quartz bell cover medium window 4 nearby without obvious electric field exist, therefore can avoid excited grade from
Son produces etching to quartz bell cover medium window 4, and then avoids its pollution to diamond；Other region electric field magnitudes are not enough to
Plasma is excited, avoids the appearance of secondary plasma.
Fig. 3 is the micromorphology figure for the diamond film prepared using the utility model device.Can from figure
Go out, it is continuous between the crystal grain on prepared diamond film surface, fine and close, there is no obvious gap between diamond crystal boundary, do not deposit yet
The obvious second nucleation particle the defects of.
Fig. 4 is the Raman line for the diamond film prepared using the utility model device.It can be seen that Buddha's warrior attendant
There was only 1332.1cm in the Raman spectrum of stone film-1A neighbouring diamond characteristic peak, and without obvious graphite and other
The characteristic peak of impurity occurs, and the halfwidth of diamond raman characteristic peak is 2.2cm-1, this shows that prepared diamond film has
Excellent quality.
General principle and principal character of the present utility model has been shown and described above.The technical staff of the industry should
Solution, the utility model are not restricted to the described embodiments, and simply illustrate that this practicality is new described in above-described embodiment and specification
The principle of type, on the premise of the spirit and scope of the utility model is not departed from, the utility model also has various changes and modifications,
These changes and improvements are both fallen within claimed the scope of the utility model.The utility model requires protection scope is by appended
Claims and its equivalent thereof.
Claims (9)
1. a kind of microwave plasma CVD diamond reaction unit, including resonant cavity, it is characterised in that：It is described
Resonant cavity be divided into cylindrical cavity（1）, middle circle arc cavity（2）With lower cylindrical cavity（3）, wherein, middle circle
Arc cavity（2）Radius of curvature R be equal to microwave wavelength λ, upper cylindrical cavity（1）Diameter be more than middle circle arc cavity
（2）Diameter, middle circle arc cavity（2）Diameter be more than lower cylindrical cavity（3）Diameter；Upper cylindrical cavity（1）'s
Quartz bell cover medium window is installed on top cover（4）With coaxial probe antenna（5）, quartz bell cover medium window（4）Positioned at coaxial
Probe antenna（5）Underface, quartz bell cover medium window（4）With upper cylindrical cavity（1）The junction of top cover sets for sealing
Put；Coaxial probe antenna（5）Hollow inner wire be arranged to blast pipe（6）, coaxial probe antenna（5）Outer conductor sidewall on set
It is equipped with exhaust vent（7）；Upper cylindrical cavity（1）Top cover on be additionally provided with the reacting gas communicated with resonant cavity inner space
Entrance（8）；Lower cylindrical cavity（3）Inside it is provided with reflecting plate（9）, reflecting plate（9）On be provided with reaction gas outlet（10）, instead
Penetrate plate（9）Middle part be provided with cylinder lifting base station（11）；Lower cylindrical cavity（3）Bottom plate on to be provided with reacting gas total
Outlet（12）；Upper cylindrical cavity（1）, middle circle arc cavity（2）, lower cylindrical cavity（3）, quartz bell cover medium window
（4）, coaxial probe antenna（5）, reflecting plate（9）And cylinder lifting base station（11）It is all located on same axis.
2. microwave plasma CVD diamond reaction unit according to claim 1, it is characterised in that：On
Cylindrical cavity（1）Top cap central at be provided with accent（1-1）, quartz bell cover medium window（4）For bowl structure, in its rim of a bowl
Periphery takes rib provided with extension（4-1）, quartz bell cover medium window（4）Upper cylindrical cavity is placed in the direction of the rim of a bowl upward
（1）Accent（1-1）It is interior, and quartz bell cover medium window（4）On take rib（4-1）Sealing is overlapped on cylindrical cavity
（1）Accent（1-1）On the top cover at place；Coaxial probe antenna（5）Installed in upper cylindrical cavity（1）Top cover on face accent
（1-1）Opening position；Quartz bell cover medium window（4）Bore be more than coaxial probe antenna（5）The diameter of outer conductor.
3. microwave plasma CVD diamond reaction unit according to claim 2, it is characterised in that：On
Cylindrical cavity（1）Top cover on quartz bell cover medium window（4）Take rib（4-1）Mutually the position of overlap joint is provided with a circle seal groove
（13）, seal groove（13）Inside it is provided with sealing ring（14）.
4. microwave plasma CVD diamond reaction unit according to claim 1 or 2, its feature exist
In：Coaxial probe antenna（5）Outer conductor sidewall on the exhaust vent that sets（7）Quantity be 2-8.
5. microwave plasma CVD diamond reaction unit according to claim 1 or 2, its feature exist
In：Reflecting plate（9）The reaction gas outlet of upper setting（10）Quantity be 3-12.
6. microwave plasma CVD diamond reaction unit according to claim 1 or 2, its feature exist
In：Microwave wavelength λ is 117.4-127.5mm, middle circle arc cavity（2）Radius of curvature R be equal to microwave wavelength λ, upper cylinder
Shape cavity（1）A diameter of 270-300mm, lower cylindrical cavity（3）A diameter of 180-230mm.
7. microwave plasma CVD diamond reaction unit according to claim 6, it is characterised in that：It is micro-
Ripple wavelength X is 122.4mm, middle circle arc cavity（2）Radius of curvature R be 122.4mm, upper cylindrical cavity（1）Diameter
For 284mm, lower cylindrical cavity（3）A diameter of 200mm.
8. microwave plasma CVD diamond reaction unit according to claim 1 or 2, its feature exist
In：Microwave wavelength λ is 317.9-337.9mm, middle circle arc cavity（2）Radius of curvature R be equal to microwave wavelength λ, upper cylinder
Shape cavity（1）A diameter of 740-800mm, lower cylindrical cavity（3）A diameter of 400-600mm.
9. microwave plasma CVD diamond reaction unit according to claim 8, it is characterised in that：It is micro-
Ripple wavelength X is 327.9mm, middle circle arc cavity（2）Radius of curvature R be 327.9mm, upper cylindrical cavity（1）Diameter
For 758mm, lower cylindrical cavity（3）A diameter of 500mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720392157.2U CN206635410U (en) | 2017-04-14 | 2017-04-14 | Microwave plasma CVD diamond reaction unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720392157.2U CN206635410U (en) | 2017-04-14 | 2017-04-14 | Microwave plasma CVD diamond reaction unit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206635410U true CN206635410U (en) | 2017-11-14 |
Family
ID=60245429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720392157.2U Withdrawn - After Issue CN206635410U (en) | 2017-04-14 | 2017-04-14 | Microwave plasma CVD diamond reaction unit |
Country Status (1)
| Country | Link |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106835070A (en) * | 2017-04-14 | 2017-06-13 | 于宗旭 | Microwave plasma CVD diamond reaction unit |
| CN110913556A (en) * | 2018-09-18 | 2020-03-24 | 清华大学 | Microwave plasma reaction device |
-
2017
- 2017-04-14 CN CN201720392157.2U patent/CN206635410U/en not_active Withdrawn - After Issue
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106835070A (en) * | 2017-04-14 | 2017-06-13 | 于宗旭 | Microwave plasma CVD diamond reaction unit |
| CN106835070B (en) * | 2017-04-14 | 2019-04-26 | 于宗旭 | Microwave plasma CVD diamond reaction unit |
| CN110913556A (en) * | 2018-09-18 | 2020-03-24 | 清华大学 | Microwave plasma reaction device |
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Legal Events
| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20171114 Effective date of abandoning: 20190426 |
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| AV01 | Patent right actively abandoned |