CN206624915U - A kind of colloidal solution prepares and coating apparatus - Google Patents
A kind of colloidal solution prepares and coating apparatus Download PDFInfo
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- CN206624915U CN206624915U CN201720219571.3U CN201720219571U CN206624915U CN 206624915 U CN206624915 U CN 206624915U CN 201720219571 U CN201720219571 U CN 201720219571U CN 206624915 U CN206624915 U CN 206624915U
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- colloidal solution
- coating apparatus
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Abstract
A kind of colloidal solution preparation and coating apparatus are the utility model is related to, belongs to field of film preparation, including：Multigroup component solution storage container；The one-level component solution rate of titration controller of every group of component solution storage container connection；With the colloidal solution reactor of the outlet connection of every group of component solution rate of titration controller；The intergrade component solution rate of titration controller being connected with the colloidal solution reactor outlet；The colloidal solution memory being connected with intergrade component solution rate of titration controller；With the final stage component solution rate of titration controller of the outlet connection of the colloidal solution memory；With the conduit of final stage component solution rate of titration controller outlet connection；And the dipping coating apparatus that colloid is imported into by conduit carries out plated film.By being accurately controlled colloidal solution preparation and coating process, ensure chemical composition, thickness, optical property uniformity consistency, meet the preparation requirement of nanometer functional films.
Description
Technical field
The present invention relates to the preparation facilities of nanometer functional films, more particularly to a kind of sol-gel process colloidal solution system
It is standby, belong to field of film preparation.
Background technology
Sol-gel process (Sol-gel) method is the nanometer functional films preparation method to grow up the 1960s.It
Using metal alkoxide as presoma, homogeneous sol is configured to, then using colloidal sol be raw material to base materials such as glass, ceramics, metal and plastics
Carry out impregnating film forming or rotate film forming, assign base material special electrical property and magnetic property, can also improve base material optical property and
Chemical durability is improved, is widely used in the system of the nanometer functional films such as electrochomeric films, photochromic film, diaphragm
It is standby.
At present, sol-gel process coating process is to prepare colloidal sol using simple glassware manual operations, recycles machine
Tool coating machine completes coating process, and film preparation efficiency is low, and quality is very unstable, and it is very tired to prepare uniform, transparent film
It is difficult.Main cause includes：
(1) temperature and humidity of thin-film-coating environment has a great influence to film performance.Colloidal solution is in metastable state, ring
Border temperature and humidity, which changes, can cause colloidal solution viscosity to increase or reduce, so as to influence the thickness of film and uniformity.
In coating process, the film forming liquid of substrate surface is seldom, and the minor variations of colloidal solution performance can influence the uniformity of film.
(2) mechanical coating machine can serious shadow using the operating vibrations of the part such as dipping-lifting, motor of motor control substrate
Ring the uniformity of film surface.
(3) mechanical coating machine once can be only done the plated film of a plate substrate, and film preparation efficiency is low, have a strong impact on that film is ground
Study carefully process.
Therefore, for the film for obtaining (chemical composition, thickness, optical property etc.) uniformity, being firmly combined with base,
It is strict to thin-film-coating technique and equipment requirement, it is necessary to accurately control the concentration of each component of film precursor liquid, reaction speed and
Reaction temperature, and the thickness and speed of plated film.Colloidal solution preparation and coating apparatus are developed, it is uniform that strict control influences film
Property the factors such as environment, technique and equipment, play an important roll for the preparation and application for promoting thin-film material.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of colloidal solution preparation and coating apparatus, by accurate
Colloidal solution preparation and coating process are controlled, ensures chemical composition, thickness, optical property uniformity consistency, meets nano functional
The preparation requirement of film.
The present invention is achieved in that
A kind of colloidal solution prepares and coating apparatus, including：
Multigroup component solution storage container；
The one-level component solution rate of titration controller of every group of component solution storage container connection；
With the colloidal solution reactor of the outlet connection of every group of component solution rate of titration controller；
The intergrade component solution rate of titration controller being connected with the colloidal solution reactor outlet；
The colloidal solution memory being connected with intergrade component solution rate of titration controller；
With the final stage component solution rate of titration controller of the outlet connection of the colloidal solution memory；
With the conduit of final stage component solution rate of titration controller outlet connection；
And the dipping coating apparatus that colloid is imported into by conduit carries out plated film.
Further, multigroup component solution storage container includes at least two groups.
Further, the dipping coating apparatus includes plated film groove, and porous plate is set by plated film groove point in plated film trench bottom
It is segmented into two layers, the vertical direction on the vertically arranged multigroup parallel substrate support in the upper strata of plated film groove, the substrate support
Multigroup base material is installed, conduit is passed through the bottom of plated film groove, and coating process is completed using the inflow/outflow of colloidal solution.
Further, substrate support structure is multigroup parallel poly (methyl methacrylate) plate with asymmetrical grooves, and coating material is solid
It is scheduled in asymmetrical grooves.
Further, the component solution storage container is glass container, and upper vessel portion is drying tube, and component stream is arranged at bottom
Go out conduit.
Further, component solution rate of titration controller speed control range 2-12mL/min, control accuracy ±
0.1mL/min。
Further, agitator and temperature controller built in colloidal solution reactor, uniform stirring, heating, temperature are carried out
Degree measurement.
Further, the control range of colloid injection and rate of outflow controller is 1mm/min-10mm/min.
Compared with prior art, beneficial effect is the present invention：
1. component solution storage container, colloidal solution reactor, colloidal solution memory, plated film groove in apparatus of the present invention
It is made up of sealed glass container, is adequately isolated with environment, avoids influence of the ambient humidity to coated solution and coating process.
2. apparatus of the present invention accurately control colloidal solution reaction speed, reaction temperature using peristaltic pump and magnetic agitation water-bath
Degree and coating speed, ensure to obtain the film of the uniformities such as chemical composition, thickness, optical property.
3. apparatus of the present invention coating process uses fluid mechanics principle, porous plate of the colloidal solution through uniform pore openings slowly flows
Enter/flow out plated film groove, make membrane process it is steady, without bounce, it is thin to avoid the part such as motor operating vibration influence in film-forming apparatus
The uniformity of film.
4. apparatus of the present invention can complete the coating process of 40 plate substrates simultaneously, film preparation efficiency is substantially increased.
Brief description of the drawings
Fig. 1 is colloidal solution provided in an embodiment of the present invention preparation and coating apparatus schematic diagram；
Fig. 2 is dipping coating apparatus structure chart provided in an embodiment of the present invention；
Fig. 3 is Fig. 2 construction profile.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, with reference to embodiments, to the present invention
It is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, it is not used to
Limit the present invention.
Referring to Fig. 1, a kind of colloidal solution prepares and coating apparatus, including：Four groups of component solution storage containers 2；
The peristaltic pump that four groups of component solution storage containers, 2 every groups of component solution storage containers are all connected with is as one-level group
Divide solution rate of titration controller 3；The outlet of every group of component solution rate of titration controller is connected to a colloidal solution reaction
On device 4；Colloidal solution reactor is placed in magnetic agitation water-bath 5, and the solution of four groups of components controls speed by peristaltic pump
Flow into colloidal solution to react, on 4, it is drying tube 1 to set top for every group of component solution storage container closing, and group is arranged at bottom
Distribute conduit.With the peristaltic pump that colloidal solution reactor outlet is connected as speed control, in order to distinguish referred to herein as
Intergrade component solution rate of titration controller 6；What is be connected with intergrade component solution rate of titration controller is colloidal solution
Memory 8；Peristaltic pump is connected by the outlet of colloidal solution memory, titrated to distinguish referred to herein as final stage component solution
Speed control 9；With the conduit of the outlet of final stage component solution rate of titration controller 9 connection；The leaching that colloid is imported into by conduit
Stain coating apparatus carries out plated film 7.
Referring to Fig. 2 combination Fig. 3, dipping coating apparatus includes plated film groove 7, and porous plate 22 is set by plated film in plated film trench bottom
Groove is divided into two layers, vertical on the vertically arranged multigroup parallel substrate support 21 in the upper strata of plated film groove, substrate support 21
Multigroup base material is installed in direction, and coating process is completed using the inflow/outflow of colloidal solution.Substrate support structure is with symmetrical
Multigroup parallel poly (methyl methacrylate) plate 24 of groove 23, coating material is fixed in asymmetrical grooves.
Dipping coating apparatus is rectangular glass container, and internal structure includes substrate support and porous plate.Substrate support
Positioned at plated film groove top portion, structure is multigroup parallel poly (methyl methacrylate) plate with asymmetrical grooves, and coating material is fixed on symmetrical ditch
Coating process is completed in groove.Substrate support bottom is porous plate, open pore size 1cm, ensures that colloidal solution is uniformly flowed into, flowed out
Coating apparatus.After conduit is connected with plated film trench bottom, colloid up enters upper sheaf space by bottom by more hollow plates.
Component solution rate of titration controller speed control range 2-12mL/min, control accuracy ± 0.1mL/min.
Further, agitator and temperature controller built in colloidal solution reactor, uniform stirring, heating, temperature are carried out
Degree measurement.
Further, the control range of colloid injection and rate of outflow controller is 1mm/min-10mm/min.
The course of work is:
The each reactive component prepared needed for colloidal solution is stored respectively in component solution storage container, starts each component
The peristaltic pump of storage tank, each reactive component is set to be slowly injected into certain speed in colloidal solution reactor, through thermostat water bath
Stir, heat certain reaction time, obtain the precursor sol of homogeneous transparent.It is connected with colloidal solution reactor outlet compacted
Dynamic pump, the colloidal sol of preparation is placed in colloidal solution memory, is aged, is stand-by.
Cleaned base material is fixed in substrate support, final stage component solution rate of titration controller is opened, makes glue
Colloidal sol in liquid solution memory is slowly flowed into plated film groove through colloidal solution inflow/outflow conduit, when base material is immersed in colloidal sol
After certain altitude (film length prepared by needs determines), final stage component solution rate of titration controller is closed, base material is molten
A period of time is stood in glue.Final stage component solution rate of titration controller is again turned on, colloidal sol in plated film groove is slowly flow back into
In colloidal solution memory, one time plated film is completed.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
All any modification, equivalent and improvement made within refreshing and principle etc., should be included in the scope of the protection.
Claims (8)
1. a kind of colloidal solution prepares and coating apparatus, it is characterised in that including：
Multigroup component solution storage container；
The one-level component solution rate of titration controller of every group of component solution storage container connection；
With the colloidal solution reactor of the outlet connection of every group of component solution rate of titration controller；
The intergrade component solution rate of titration controller being connected with the colloidal solution reactor outlet；
The colloidal solution memory being connected with intergrade component solution rate of titration controller；
With the final stage component solution rate of titration controller of the outlet connection of the colloidal solution memory；
With the conduit of final stage component solution rate of titration controller outlet connection；
And the dipping coating apparatus that colloid is imported into by conduit carries out plated film.
2. according to the colloidal solution preparation described in claim 1 and coating apparatus, it is characterised in that multigroup component solution is deposited
Storage container includes at least two groups.
3. according to the colloidal solution preparation described in claim 1 and coating apparatus, it is characterised in that the dipping coating apparatus bag
Plated film groove is included, sets porous plate to be divided into plated film groove two layers in plated film trench bottom, it is vertically arranged multigroup on the upper strata of plated film groove
Parallel substrate support, vertical direction installs multigroup base material on the substrate support, and conduit is passed through the bottom of plated film groove, profit
Coating process is completed with the inflow/outflow of colloidal solution.
4. according to the colloidal solution preparation described in claim 3 and coating apparatus, it is characterised in that substrate support structure is band
There is multigroup parallel poly (methyl methacrylate) plate of asymmetrical grooves, coating material is fixed in asymmetrical grooves.
5. according to the colloidal solution preparation described in claim 1 and coating apparatus, it is characterised in that the component solution storage is held
Device is glass container, and upper vessel portion is drying tube, and bottom has component to flow out conduit.
6. according to the colloidal solution preparation described in claim 1 and coating apparatus, it is characterised in that component solution rate of titration control
Device speed control range 2-12mL/min processed, control accuracy ± 0.1mL/min.
7. according to the colloidal solution preparation described in claim 1 and coating apparatus, it is characterised in that built in colloidal solution reactor
Agitator and temperature controller, carry out uniform stirring, heating, temperature survey.
8. according to the colloidal solution preparation described in claim 1 and coating apparatus, it is characterised in that colloid injects and the rate of outflow
The control range of controller is 1mm/min-10mm/min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720219571.3U CN206624915U (en) | 2017-03-08 | 2017-03-08 | A kind of colloidal solution prepares and coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720219571.3U CN206624915U (en) | 2017-03-08 | 2017-03-08 | A kind of colloidal solution prepares and coating apparatus |
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| Publication Number | Publication Date |
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| CN206624915U true CN206624915U (en) | 2017-11-10 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201720219571.3U Withdrawn - After Issue CN206624915U (en) | 2017-03-08 | 2017-03-08 | A kind of colloidal solution prepares and coating apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106987828A (en) * | 2017-03-08 | 2017-07-28 | 沈阳工程学院 | A kind of colloidal solution is prepared and coating apparatus and film plating process |
-
2017
- 2017-03-08 CN CN201720219571.3U patent/CN206624915U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106987828A (en) * | 2017-03-08 | 2017-07-28 | 沈阳工程学院 | A kind of colloidal solution is prepared and coating apparatus and film plating process |
| CN106987828B (en) * | 2017-03-08 | 2019-05-17 | 沈阳工程学院 | A kind of preparation of colloidal solution and coating apparatus and film plating process |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20171110 Effective date of abandoning: 20190517 |
|
| AV01 | Patent right actively abandoned |