CN207452253U - A kind of thin-film material preparation facilities - Google Patents
A kind of thin-film material preparation facilities Download PDFInfo
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- CN207452253U CN207452253U CN201721512009.6U CN201721512009U CN207452253U CN 207452253 U CN207452253 U CN 207452253U CN 201721512009 U CN201721512009 U CN 201721512009U CN 207452253 U CN207452253 U CN 207452253U
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Abstract
The utility model is related to technology of thin film material preparation fields, more specifically, it is related to a kind of thin-film material preparation facilities, the device includes upper container, lower container and substrate support, the upper container passes through transfer device and lower reservoir, there are differences in height between the upper container and lower container, the transfer device includes transfer pipe and volume control device, the volume control device is arranged in transfer pipe, the substrate support is placed in upper container, the transfer pipe is equipped with draw-out device, the draw-out device includes the draw tube with piston rod, draw tube is equipped with inlet and outlet.The simple film formation device that the utility model prepares thin-film material based on collosol and gel builds principle and method, decline by gravity and liquid level, film formation device is formed by upper container, transfer device and lower container three parts, to realize that collosol and gel prepares thin-film material, and it can realize prepared by the thin-film material of different dimensions from assembling by modular combination.
Description
Technical field
The utility model is related to technology of thin film material preparation fields, more specifically, are related to a kind of thin-film material and prepare dress
It puts.
Background technology
Sol-gel technique be it is a kind of with metal organic or inorganic compound, or both mixture be research object, warp
Hydrolytie polycondensation process is crossed, by the gradual gelation of colloidal sol, and a kind of thin-film material for obtaining oxide or other compounds prepares work
Skill technology.Since the 1980s, sol-gel method begins to be widely used in dusty material, ceramic material, shine
The preparation etc. of material, ferroelectric material, magnetic material, coating material and the material of other structure types and functional characteristic.Wherein, apply
In terms of layer material, sol-gel technique can obtain the multi-component oxide coating of high uniformity and with narrow size distribution
Nanometer particle size coating, can easily adulterate trace element, can pass through a variety of methods change film table
Face structure and performance, can larger in volume, complex-shaped substrate surface formation coating material.On sol-gel legal system
Standby coating material aspect, the coating preparation being even more widely used among optics, electronic component and equipment.
In the prior art, sol-gel, which prepares thin-film material, mainly dip-coating and spin coating two ways.Dip coating is will to serve as a contrast
Bottom is dipped in liquid phase, then with certain pull rate in certain temperature and atmosphere pulling film forming, film thickness is by pull rate
It is determined with solid content in liquid phase and viscosity；Spin-coating method is to complete thin film deposition with evaporation by centrifugal force, main to include deposition, add
Speed rotation, whiz and evaporation four-stage, by liquid distribution, in substrate surface, acceleration rotation, liquid is acted in centrifugal force first
Under it is radial throw away, liquid flows to edges of substrate and departs from, and then makes film hardening by evaporation, dry, annealing mode.
Dip-coating and spin coating method prepare thin-film material, it is necessary to using special instruments such as dedicated pulling coating machine and sol evenning machines
Equipment is completed.The making of these instrument and equipments and maintenance cost are higher, and different dimensions films need mating specific dimensions rule
The substrate material of lattice, substrate material are more than the successful preparation that equipment size specification can not then complete thin-film material.It is carried for dip-coating
Daraf(reciprocal of farad), it is necessary to realize uniform pull rate, some manual operations make speed uneven, cause film thickness irregular, and different
The preparation of specification film needs the lifting instrument and equipment of different size, it is necessary to the substrate dimension of different size.For spin coating
Membrane formation process is present with the inhomogeneities of film beyond a certain range of substrate material of sol evenning machine specification in film forming procedure, and should
Colloidal sol is thrown away edges of substrate by method by centrifugal force, causes sol solutions recyclable, it is impossible to which secondary use causes raw material
Waste.
In summary, it is necessary to which the deficiency in the presence of the prior art is improved.
Utility model content
In the presence of overcoming the shortcomings of the prior art, the utility model provides a kind of thin-film material preparation facilities, solution
Certainly existing sol-gel prepare instrument and equipment expense used in the dip coating and spin-coating method of thin-film material it is relatively high, rule
The problem of lattice are single and application range is relatively narrow.
In order to solve the above-mentioned technical problem, technical solution is used by the utility model：
A kind of thin-film material preparation facilities, including upper container, lower container and substrate support, the upper container is filled by shifting
Put with lower reservoir, there are difference in height between the upper container and lower container, the transfer device includes transfer pipe and stream
Amount control device, the volume control device are arranged in transfer pipe, and the substrate support is placed in upper container.
The shape of the substrate support is L fonts or concave character type, for fixing substrate.
The upper container is arranged to multiple, can realize the preparation of same type thin-film material batch or different type film material
Material is prepared simultaneously.
Described transfer pipe one end nozzle is placed in substrate lower edge in upper container and is placed in lower container with lower portion, one end nozzle
In.
The transfer pipe is equipped with draw-out device, is convenient for the emptying of air by draw-out device, so as to control transfer pipe
The circulation of colloidal sol in road.
The draw-out device includes the draw tube with piston rod, and the draw tube is equipped with inlet and outlet, passes through piston rod
Mobile change transfer pipe in atmospheric pressure.
The volume control device is infusion apparatus, plastic tube or peristaltic pump with flow control valve, controls transfer pipe
Middle colloidal sol is with a constant flow rate Uniform Flow, upper container liquid level to be controlled steadily to decline, so that colloidal sol is uniform in substrate surface
Film forming.
According to different sol solution ingredients, glass container, plastic containers, gold can be selected in the upper container and lower container
Belong to container or other materials container；It is prepared according to the thin-film material of different sizes and quantity, different size and quantity can be selected
Container.
Compared with prior art, had the beneficial effect that possessed by the utility model：
The simple film formation device that the utility model prepares thin-film material based on sol-gel builds principle and method, by
Gravity and liquid level decline, and film formation device is formed by upper container, transfer device and lower container three parts, come realize colloidal sol-
Gel prepares thin-film material, and can realize prepared by the thin-film material of different dimensions from assembling by modular combination.
The utility model is replaced by the size of upper container and lower container, realizes the film forming of the substrate of different dimensions；Flow control
The setting of device realizes that upper container liquid level uniformly declines；By the setting of upper container and lower container, the multiple anti-of sol solutions is realized
It is multiple to utilize；Device is combined by free arrangement, and realization prepares the thin-film material of different component, can also prepare thin-film material in batches.
A kind of thin-film material preparation facilities of the utility model is a kind of quick, efficient device for preparing thin-film material so that film material
The performance and film-forming process uniformity of material are studied, and the preparation for the membrane element device material in optoelectronic information equipment provides
Necessary selection, small-scale wet chemical for micro-nanometer thin film material is standby and batch production provides important support, together
Shi Jieyue development costs simultaneously improve the efficient utilization to sol solutions.
Description of the drawings
Fig. 1 is the structure diagram of the utility model；
Fig. 2 is the structure diagram of the utility model embodiment；
Fig. 3 is the structure diagram of another embodiment of the utility model；
Fig. 4 is the utility model L font substrate support structure diagrams；
Fig. 5 is the utility model concave character type substrate support structure diagram；
Fig. 6 is the utility model draw-out device structure diagram；
Wherein：1 is upper container, and 2 be lower container, and 3 be substrate support, and 4 be transfer device, and 5 be transfer pipe, and 6 be flow
Control device, 7 be draw-out device, and 8 be piston rod, and 9 be draw tube, and 10 be import, and 11 be outlet.
Specific embodiment
The following is a combination of the drawings in the embodiments of the present utility model, and the technical scheme in the embodiment of the utility model is carried out
It clearly and completely describes, it is clear that the described embodiments are only a part of the embodiments of the utility model rather than whole
Embodiment.Based on the embodiment in the utility model, those of ordinary skill in the art are without making creative work
All other embodiments obtained shall fall within the protection scope of the present invention.
As shown in figures 1 to 6, a kind of thin-film material preparation facilities, the device include upper container 1, lower container 2 and substrate support
3, the upper container 1 is connected by transfer device 4 with lower container 2, and there are difference in height, institutes between the upper container 1 and lower container 2
Stating transfer device 4 includes transfer pipe 5 and volume control device 6, and the volume control device 6 is arranged in transfer pipe 5, institute
3 shape of substrate support to be stated as L fonts or concave character type, is placed in upper container 1, the transfer pipe 5 is equipped with draw-out device 7,
The draw-out device 7 includes the draw tube 9 with piston rod 8, and draw tube 9 is equipped with import 10 and outlet 11, in the transfer pipe
One end nozzle is placed in substrate lower edge in upper container and is placed in lower portion, one end nozzle in lower container.
Embodiment 1（One upper container, a lower container）
For the present embodiment by taking most basic film formation device as an example, build process is as follows：
As shown in Figure 1, preparing a kind of thin-film material, the dimensions of coating problems substrate is determined according to required film specification,
It selects more than the beaker of substrate dimension or other containers as upper container 1, the substrate of placement suitable construction specification in upper container 1
The substrate cleaned up is put into the upper container 1 for fill enough sol solutions and is placed on substrate support 3 by stent 3；It is suitable to select
The transfer device 4 of specification, and 5 one end nozzle of transfer pipe is made to immerse in upper container 1 substrate lower edge with lower portion, another end pipe
Mouth is placed in the lower container 2 of appropriate size size, completes film formation device installation.
The effect of draw-out device 7 is to discharge the air in transfer pipe 5, so as to meet siphon condition, piston rod 8 to
The movement of 11 directions is exported, pipe 9 is taken out and 5 inside of transfer pipe generates negative pressure, draw fluid into transfer pipe 5, and pass through outlet
11 outflows using the difference in height of upper container 1 and lower container 2, flow to lower container 2 from upper container 1 so as to fulfill sol solutions, pass through tune
For throttling amount control device 6 to ensure in transfer pipe 5 colloidal sol with a constant flow rate Uniform Flow, the liquid level in upper container 1 is steady
Decline, the liquid level constantly declined homogeneous film formation on the face with substrate contact；Finally, substrate the rear place such as be dried to, annealed
Reason process forms certain thickness uniform thin-film material in substrate surface.
Embodiment 2（Two upper containers, once container）
For the present embodiment exemplified by preparing the thin-film material of different component structure simultaneously, build process is as follows：
As shown in Fig. 2, preparing the thin-film material of different component structure simultaneously, 1 quantity of upper container is determined according to composition quantities,
The dimensions of coating problems substrate is determined according to required film specification, selects the beaker more than substrate dimension or other container conducts
Upper container 1 places the substrate support 3 of respective numbers appropriate size, the substrate that respective numbers are cleaned up in each upper container 1
It is put into the upper container 1 for respectively fill enough sol solutions and is placed on substrate support 3；Select the transfer of the appropriate size of respective numbers
Device 4, and 5 one end nozzle of transfer pipe is made to immerse substrate lower edge in upper container 1 and is placed in properly with lower portion, other end nozzle
In the lower container 2 of specification size, film formation device installation is completed.To reuse sol solutions, then need that different numbers are respectively adopted
The lower container 2 of amount.
Embodiment 3（Three upper containers, once container）
For the present embodiment exemplified by preparing the identical thin-film material of multigroup component structure simultaneously, build process is as follows：
As shown in figure 3, preparing the identical thin-film material of multigroup component structure simultaneously, upper container 1 is determined according to composition quantities
Quantity determines the dimensions of coating problems substrate according to required film specification, selects more than the beaker of substrate dimension or other appearances
Device places the substrate support 3 of respective numbers appropriate size in each upper container 1, respective numbers is cleaned up as upper container 1
Substrate be put into the upper container 1 for respectively fill enough sol solutions and be placed on substrate support 3；Select the appropriate size of respective numbers
Transfer device 4, and 5 one end nozzle of transfer pipe is made to immerse substrate lower edge in upper container 1 and is put with lower portion, other end nozzle
In the lower container 2 of appropriate size size, film formation device installation is completed.
Embodiment 4
For the present embodiment exemplified by preparing the identical thin-film material of multigroup component structure simultaneously, build process is as follows：
The identical thin-film material of multigroup component structure is prepared simultaneously, the ruler of coating problems substrate is determined according to required film specification
Very little specification selects beaker or other containers to place appropriate number of lining according to density degree in upper container 1 as upper container 1
Lower supporter 3, the substrate that respective numbers are cleaned up, which is put into the upper container 1 for fill enough sol solutions, is placed in each substrate support
On 3；The transfer device 4 of appropriate size is selected, and 5 one end nozzle of transfer pipe is made to immerse in upper container 1 below substrate lower edge
Position, other end nozzle are placed in the lower container 2 of appropriate size size, complete film formation device installation.
Certainly, the quantity of upper container 1 and lower container 2 can be set according to design conditions, so as to form different combinations.It is logical
Upper container, transfer device and lower container three parts composition film formation device are crossed, realizes that prepared by sol-gel thin by siphon principle
Membrane material.Volume control device 6 may be employed device of the prior art and realize, such as infusion apparatus switch or flow valve, only
The flow of the transfer pipe 5 of flow can be adjusted.
Only the preferred embodiment of the utility model is explained in detail above, but the utility model be not limited to it is above-mentioned
Embodiment within the knowledge of a person skilled in the art, can also not depart from the utility model aims
Under the premise of various changes can be made, various change should be included within the scope of protection of this utility model.
Claims (5)
1. a kind of thin-film material preparation facilities, it is characterised in that：Including upper container（1）, lower container（2）And substrate support（3）, institute
State upper container（1）Pass through transfer device（4）With lower container（2）Connection, the upper container（1）With lower container（2）Between exist height
Spend poor, the transfer device（4）Including transfer pipe（5）And volume control device（6）, the volume control device（6）It sets
In transfer pipe（5）On, the substrate support（3）It is placed on upper container（1）It is interior.
2. a kind of thin-film material preparation facilities according to claim 1, it is characterised in that：The substrate support（3）Shape
Shape is L fonts or concave character type.
3. a kind of thin-film material preparation facilities according to claim 1, it is characterised in that：The upper container（1）It is arranged to
It is multiple, it can realize that prepared by same type thin-film material batch or different type thin-film material is prepared simultaneously.
4. a kind of thin-film material preparation facilities according to claim 1, it is characterised in that：The transfer pipe（5）On set
There is draw-out device（7）, pass through draw-out device（7）Convenient for the emptying of air.
5. a kind of thin-film material preparation facilities according to claim 4, it is characterised in that：The draw-out device（7）Including
With piston rod（8）Draw tube（9）, the draw tube（9）It is equipped with import（10）And outlet（11）, pass through piston rod（8）Shifting
The dynamic emptying for realizing air.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721512009.6U CN207452253U (en) | 2017-11-14 | 2017-11-14 | A kind of thin-film material preparation facilities |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721512009.6U CN207452253U (en) | 2017-11-14 | 2017-11-14 | A kind of thin-film material preparation facilities |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207452253U true CN207452253U (en) | 2018-06-05 |
Family
ID=62279292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721512009.6U Active CN207452253U (en) | 2017-11-14 | 2017-11-14 | A kind of thin-film material preparation facilities |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207452253U (en) |
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2017
- 2017-11-14 CN CN201721512009.6U patent/CN207452253U/en active Active
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