CN206616052U - A kind of processing equipment of ITO etching waste liquids - Google Patents
A kind of processing equipment of ITO etching waste liquids Download PDFInfo
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- CN206616052U CN206616052U CN201720388072.7U CN201720388072U CN206616052U CN 206616052 U CN206616052 U CN 206616052U CN 201720388072 U CN201720388072 U CN 201720388072U CN 206616052 U CN206616052 U CN 206616052U
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- waste liquids
- ito etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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Abstract
The utility model discloses a kind of processing equipment of ITO etching waste liquids, including liquid caustic soda storage tank, retort and the first conveying mechanism；The first feeding pipe and the second feeding pipe are connected between the liquid caustic soda storage tank and the charging aperture and discharging opening of first conveying mechanism, the 3rd feeding pipe and the 4th feeding pipe are connected between the retort and the charging aperture and discharging opening of first conveying mechanism.The utility model can effectively handle the ITO etching waste liquids of LCD industries generation, improve the disposal ability of ITO etching waste liquids, saved processing cost, and valuable metal ions indium therein, tin are farthest collected into (the rate of recovery>99%), make product and realize the marketization, and the temperature in course of reaction and pH changes can be efficiently controlled, reduce the potential safety hazard in the production operation of reaction.
Description
Technical field
The utility model is related to the process field of waste liquid, relates in particular to a kind of processing equipment of ITO etching waste liquids.
Background technology
Liquid crystal display turns into technology-intensive, fund-intensive new high-tech industry, and transparent conducting glass is then
One of LCD three big main materials.Why liquid crystal display can show specific figure, be exactly using saturating on electro-conductive glass
Bright conducting film, the etched electrode that given shape is made, up and down electro-conductive glass be made after liquid crystal cell, it is on these electrodes plus appropriate
Voltage signal, arranges the specific aspect under electric field action of the liquid crystal molecule with even general square, and then show and electrode ripple
The corresponding figure of appearance.
In oxide conductive film, to mix the In of Sn (tin)2O3(ITO) the transmitance highest and electric conductivity of film are best, and
And the thin figures of Cheng are easily etched in acid solution, its transmitance is up to more than 90%., it is necessary to use in LCD production technologies
The immersion of high-temperature baking and the broken liquid of various acid, therefore generate the substantial amounts of ITO etching liquid waste liquids containing tin indium oxide.
Such ITO etching liquids are usually that two or more acid is mixed, typically sulfuric acid, hydrochloric acid or nitric acid etc., single
Acid content is less than 7%, adds up acid content and is no more than 20%.Because of the indium tin of etching after over etching workshop section, contain indium in its waste liquid
And tin ion.The content of indium tin is 50ppm or so.Such waste liquid be usually taken after neutralisation treatment again the method through biochemical system without
Evilization processing, indium tin therein enters to be wasted in sludge.
Equipment in current chemical industry for neutralisation treatment acidic and alkaline waste water is a lot, but for such ITO etching waste liquids
Neutralisation treatment equipment it is less, the metal ion content in ITO etching waste liquids is larger, and sour corrosivity and total acidity is very high,
Substantial amounts of heat can be released during neutralisation treatment, high temperature rises, it is difficult to control the temperature in course of reaction and pH changes, deposited
In certain risk.
Utility model content
Technical problem to be solved in the utility model is to provide a kind of temperature that can be efficiently controlled in course of reaction
And the processing equipment of the ITO etching waste liquids of pH changes.
In order to solve the above-mentioned technical problem, the utility model is adopted the following technical scheme that：A kind of processing of ITO etching waste liquids
Equipment, including liquid caustic soda storage tank, retort and the first conveying mechanism；The charging of the liquid caustic soda storage tank and first conveying mechanism
The first feeding pipe and the second feeding pipe, the retort and first conveyer are connected between mouth and discharging opening
The 3rd feeding pipe and the 4th feeding pipe are connected between the charging aperture and discharging opening of structure.
Further, in addition to outside supernatant one end of discharge pipe is plugged on the reaction outside discharge pipe, the supernatant
Tank is interior, the other end is connected with the charging aperture of first conveying mechanism.
Further, in addition to water pot up to standard, connect between the water pot up to standard and the discharging opening of first conveying mechanism
It is connected to supernatant delivery pipe.
Further, filter is installed in the supernatant delivery pipe.
Further, the filter is bag filter.
Further, in addition to outer discharge pipe, the discharging of the outer discharge pipe of the precipitation and first conveying mechanism are precipitated
Mouth connection.
Further, in addition to the charging aperture of the first conveying mechanism the liquid caustic soda feed pipe connected.
Further, first conveying mechanism includes two the first drawing liquid pumps parallel with one another.
Further, in addition to ITO etching waste liquids storage tank and second conveyor structure, the ITO etching waste liquids storage tank with
The 5th feeding pipe, the retort and the second conveyor structure are connected between the charging aperture of the second conveyor structure
The 6th feeding pipe is connected between discharging opening.
Further, the second conveyor structure includes two the second drawing liquid pumps parallel with one another.
The beneficial effects of the utility model are：
The utility model is simple in construction, and a pump is used, and saves resource, and liquid caustic soda storage tank is used to store liquid caustic soda, is carved in processing ITO
During etched waste liquid, the first conveying mechanism provides conveying power, and the liquid caustic soda in liquid caustic soda storage tank sequentially passes through the first feeding pipe, first defeated
Mechanism, the 4th feeding pipe is sent to enter in retort, after being diluted with water, then into retort in the progress of addition ITO etching waste liquids
And processing, adding water, during ITO etching waste liquids and neutralization reaction, the corresponding material in retort can be in the first conveying
In the presence of mechanism, discharged by the 3rd feeding pipe, then retort is come back to by the 4th feeding pipe, realize homologue
Material is in retort interior circulation, so that material can be sufficiently mixed reaction, in addition, when the liquid caustic soda in liquid caustic soda storage tank has precipitation to produce
When, likewise, liquid caustic soda can also be discharged by the first feeding pipe, then liquid caustic soda storage tank is come back to by the second feeding pipe, it is real
Existing liquid caustic soda is in liquid caustic soda storage tank interior circulation, to be dissolved to precipitation.
The utility model can effectively handle the ITO etching waste liquids of LCD industries generation, improve the processing of ITO etching waste liquids
Ability, has saved processing cost, and valuable metal ions indium therein, tin are farthest collected into (the rate of recovery>
99%), make product and realize the marketization, and the temperature in course of reaction and pH changes, reduction reaction can be efficiently controlled
Production operation in potential safety hazard.
Brief description of the drawings
Fig. 1 is the structural representation of the processing equipment of the embodiment ITO etching waste liquids of the utility model one.
In accompanying drawing the mark of each part for：1 liquid caustic soda storage tank, 2 retort, 3ITO etching waste liquids storage tank, 31IBC tons of buckets, 41
First drawing liquid pump, 42 first shunt valves, 43 first bypass valves, 51 second drawing liquid pumps, 52 second shunt valves, 53 second bypass valves,
61 first feeding pipes, 62 second feeding pipes, 63 the 3rd feeding pipes, 64 the 4th feeding pipes, 65 the 5th feeding pipes, 66
The outer discharge pipe of 6th feeding pipe, 661 flowmeters, 71 supernatants, 72 supernatant delivery pipes, the 73 outer discharge pipes of precipitation, 74 liquid caustic soda
Feed pipe, 75 tap water pipelines, 81 water pots up to standard, 82 water tanks, 83 waste tanks, 84 snap joints, 91 the 3rd drawing liquid pumps, 92
Water up to standard outer discharge pipe, 10 filters, 11 shower nozzles.
Embodiment
It should be noted that in the case where not conflicting, the feature in embodiment and embodiment in the application can phase
Mutually combination.Describe the utility model in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
Referring to Fig. 1.
The processing equipment of the utility model ITO etching waste liquids, including liquid caustic soda storage tank 1, the conveyer of retort 2 and first
Structure；The first feeding pipe is connected between the liquid caustic soda storage tank 1 and the charging aperture and discharging opening of first conveying mechanism
61 and second feeding pipe 62, connected respectively between the retort 2 and the charging aperture and discharging opening of first conveying mechanism
There are the 3rd feeding pipe 63 and the 4th feeding pipe 64.
Liquid caustic soda storage tank is used to store liquid caustic soda, when handling ITO etching waste liquids, and the first conveying mechanism provides conveying power, liquid
Liquid caustic soda in alkali storage tank sequentially passes through the first feeding pipe, the first conveying mechanism, the 4th feeding pipe and entered in retort, adds water
After dilution, then add ITO etching waste liquids into retort and carry out neutralisation treatment, adding water, ITO etching waste liquids and neutralization reaction
During, the corresponding material in retort can be discharged, then lead in the presence of the first conveying mechanism by the 3rd feeding pipe
Cross the 4th feeding pipe and come back to retort, corresponding material is realized in retort interior circulation, so that material can be mixed fully
Reaction is closed, in addition, when the liquid caustic soda in liquid caustic soda storage tank has precipitation to produce, likewise, liquid caustic soda can also be arranged by the first feeding pipe
Go out, then liquid caustic soda storage tank is come back to by the second feeding pipe, liquid caustic soda is realized in liquid caustic soda storage tank interior circulation, with molten to precipitation progress
Solution.
In specific implementation, the first feeding pipe 61 is connected to the lower end of liquid caustic soda storage tank 1, and the second feeding pipe 62 is connected to liquid
The top of alkali storage tank 1, the 3rd feeding pipe 63 is connected to the lower end of retort 2, and the 4th feeding pipe 64 is connected to retort 2
Top.
In one embodiment, equipment also includes the outer discharge pipe 71 of supernatant, and one end of the outer discharge pipe 71 of the supernatant is inserted
It is connected in the retort 2, the other end is connected with the charging aperture of first conveying mechanism.After completion of the reaction, one end is stood
Supernatant can be discharged by discharge pipe 71 outside the first conveying mechanism and supernatant in time, retort, and further, equipment is also wrapped
Include and be connected with supernatant delivery pipe between water pot 81 up to standard, the discharging opening of the water pot 81 up to standard and first conveying mechanism
72, the supernatant so discharged can be squeezed into directly in water pot up to standard by supernatant delivery pipe, the convenient processing for carrying out next step.
Further, in order to further purify supernatant, filter 10 is installed in supernatant delivery pipe 72.
In one embodiment, filter 10 selects tertiary filter, and specification is followed successively by 50 mesh, 100 mesh, 200 mesh；Filter
10 preferred bag filters, can periodic collection and cleaning indium hydroxide tin precipitation, be easy to reclaim, can specifically be gone out by filter
The pressure gauge of mouth judges, to stop liquid when pressure is higher than 2kg, clear up filter bag.
In one embodiment, in addition to outer discharge pipe 73, the outer discharge pipe 73 of the precipitation and first conveyer are precipitated
The discharging opening connection of structure.After completion of the reaction, precipitation is produced in retort, now, can be defeated by the 3rd feeding pipe 63, first
Send mechanism, the outer discharge pipe 73 of precipitation will be precipitated and neutralizer is discharged out of retort.
In one embodiment, in addition to the charging aperture of the first conveying mechanism the liquid caustic soda feed pipe 74 connected.Liquid caustic soda is not
When sufficient, can in the presence of the first conveying mechanism, by liquid caustic soda feed pipe, the second feeding pipe into liquid caustic soda storage tank replenisher
Alkali.
In specific implementation, the first feeding pipe 61, the second feeding pipe 62, the 3rd feeding pipe 63, the 4th feeding pipe
64th, the outer discharge pipe 71 of supernatant, supernatant delivery pipe 72, the outer discharge pipe 73 of precipitation, liquid caustic soda feed pipe 74 are defeated close to first
The charging aperture and discharge outlet of mechanism is sent to merge, it is convenient to connect, valve is installed on each pipeline, is easy to control material.
In one embodiment, first conveying mechanism includes two the first drawing liquid pumps 41 parallel with one another.Specific implementation
In, it is connected between the inlet and liquid outlet of each first drawing liquid pump 41 on the first shunt valve 42, the first shunt valve and is provided with
One bypass valve 43, plays regulation flow, prevents from suppressing the function of pump.
In one embodiment, in addition to ITO etching waste liquids storage tank 3 and second conveyor structure, the ITO etching waste liquids storage
It is connected with the 5th feeding pipe 65 between the charging aperture of tank 3 and the second conveyor structure, the retort 2 and described second defeated
The 6th feeding pipe 66 is connected between the discharging opening for sending mechanism.ITO etching waste liquids storage tank is used to store ITO etching waste liquids, plus
During material, under the dynamic action of second conveyor structure, ITO etching waste liquids are entered by the 5th feeding pipe, the 6th feeding pipe
Retort.
In one embodiment, equipment also includes water tank 82, and the charging aperture of water tank 82 and the second conveyor structure connects
It is logical, for being added water into retort.In specific implementation, the discharging opening of ITO etching waste liquids storage tank 3 and water tank 82, which is installed, quickly to be connect
First 84, quick for pipeline disconnects.
In addition, for convenience of the moisturizing of water tank 82, water tank 82 is connected with tap water pipeline 75；ITO etching waste liquid storage tanks
Bottom be lined with an IBC tons of buckets 31, the safety for ITO etching waste liquid storage tanks is placed and the charging of ITO etching waste liquids is stable.
In one embodiment, equipment also includes waste tank 83.React pot bottom neutralizer and precipitate it is regular handled,
Beat into waste tank temporary by precipitating outer discharge pipe.
In one embodiment, the second conveyor structure includes two the second drawing liquid pumps 51 parallel with one another.Similarly, have
During body is implemented, it is connected with the second shunt valve 52, the second shunt valve and pacifies between the inlet and liquid outlet of each second drawing liquid pump 51
Equipped with the second bypass valve 53, regulation flow is played, prevents from suppressing the function of pump.
In one embodiment, the 3rd drawing liquid pump 91 is installed in supernatant delivery pipe 72, for improving conveying power.Enter one
Step ground, water pot 81 up to standard is connected with the inlet of the 3rd drawing liquid pump 91, and equipment is also included outside the outer discharge pipe 92 of water up to standard, water up to standard
Discharge pipe 92 is connected with the liquid outlet of the 3rd drawing liquid pump 91., can be by the 3rd drawing liquid pump and up to standard when water is full in water pot up to standard
The outer discharge pipe of water discharges water.
In one embodiment, the port of export of 64 the 4th feeding pipes and 66 the 6th feeding pipes is provided with shower nozzle 11, for inciting somebody to action
Corresponding material is sprayed into retort, contributes to the mixing of corresponding material.
In one embodiment, flowmeter 661 is installed on the 6th feeding pipe 66, for detecting entering for corresponding material
Doses.
In one embodiment, the retort 2 is coiled reactor, and reactant can be cooled.
In one embodiment, sunk pH meter is installed in the retort 2, for monitoring pH.
The technique of ITO etching waste liquid processing is carried out using the processing equipment of above-mentioned ITO etching waste liquids, is comprised the following steps：
(1) using the first conveying mechanism, the first feeding pipe and the 4th feeding pipe, by the liquid caustic soda (liquid in liquid caustic soda storage tank
Alkali is from the NaOH aqueous solution that mass concentration is 32%) beat into retort, then utilize second conveyor structure, the 6th conveying pipeline
Running water in water tank is added in retort and liquid caustic soda is diluted by road, during adding water, and utilizes the first conveying
Mechanism, the 3rd feeding pipe and the 4th feeding pipe make material in retort interior circulation, liquid caustic soda is sufficiently mixed with running water, directly
3.2%, after the completion of dilution is reached to NaOH mass concentrations, temperature is essentially identical with outdoor environment temperature；
(2) using second conveyor structure, the 5th feeding pipe and the 6th feeding pipe, by ITO etching waste liquid storage tanks
ITO etching waste liquids are with 2m3/ h flow velocity is beaten into retort, when pH value is declined by 12, by controlling corresponding bypass valve, drop
The flow velocity of low ITO etching waste liquids is to 0.3m3/ h, during ITO etching waste liquids are added, utilizes the first conveying mechanism, the 3rd defeated
Pipe material and the 4th feeding pipe make material in retort interior circulation, to make the liquid caustic soda after dilution can be fully with ITO etching waste liquids
Reaction, the numerical value that pH meter show will not department area, until sunk pH meter show pH value be 9~10, stop add ITO etch
Waste liquid, then proceedes to make material in retort interior circulation 15 minutes；
(3) using second conveyor structure, the 5th feeding pipe and the 6th feeding pipe, by ITO etching waste liquid storage tanks
ITO etching waste liquids are with 0.1m3/ h flow velocity is beaten into retort, similarly, in the process, utilizes the first conveying mechanism,
Three feeding pipes and the 4th feeding pipe make material in retort interior circulation, until sunk pH meter shows that pH value is 7~7.5,
Stop plus ITO etching waste liquids, then proceed to make material in retort interior circulation 15 minutes；
During step (2) and step (3), when reaction temperature is more than 40 DEG C, in the coil pipe for starting retort
Water on condensed water, allows system to cool, and automatic start stops after 1 hour；When pH is less than 7.0, the second drawing liquid pump 51 is automatically stopped,
Stop the charging of ITO etching liquid waste liquids.By temperature and pH linkage, can effectively it prevent in course of reaction because of the rise of temperature
Cause the adverse effect to reaction vessel, it is ensured that the safely controllable property of course of reaction.
(4) retort stands 0.4~0.6h, then defeated using discharge pipe outside the first conveying mechanism, supernatant and supernatant
Send pipe to be discharged into water pot up to standard after the supernatant in retort is effectively filtered by filter, sewage disposal system is entered back into afterwards
Handled again, after the detection of COD ammonia nitrogens on-line computing model is up to standard, subsequent biochemical processing is carried out into sewage plant；
(5) neutralizer that last processing is formed, is discharged after a part of supernatant, remaining neutralizer is not discharged, and is used for
The liquid caustic soda that step (1) is added during to handling next time is diluted, and to reduce the consumption of the running water when diluting liquid caustic soda, reaches section
The purpose of energy, meets green non-pollution, the production theory of energy-saving and emission-reduction；It is defeated by the 3rd with the accumulation precipitated in retort
The neutralizer and precipitation of reacting pot bottom are beaten into waste tank temporary by pipe material, the first conveying mechanism, the outer discharge pipe of precipitation, are treated
After natural subsidence is complete, supernatant is discharged, remaining precipitation dries dry rear recycling.
Because the acidity of ITO etching waste liquids is stronger, it is equal to by being added in ITO etching waste liquids in liquid caustic soda to react to pH
7 are difficult to realize, and the utility model takes reverse regulation, are reacted by adding ITO etching waste liquids in liquid caustic soda, and substep is added
ITO etching liquid waste liquids, and the utility model is first diluted to liquid caustic soda, is then reacted with ITO etching waste liquids, temperature rises
Amplitude reduces, and temperature can reduce with the reduction of liquid caustic soda concentration and ITO etching waste liquid concentration, not result on high temperature
Rise, the temperature in course of reaction and pH changes can be efficiently controlled, it is 7 or so that can be readily adjusted reaction to pH value, peace
Quan Xinggao.Effluent quality analysis result is as shown in table 1 below：
Table 1
| Sequence number | Water outlet | COD(mg/L) | NH3-N(mg/L) | In3+(mg/L) | Sn4+(mg/L) | Colourity (degree) |
| 1 | Water outlet water sample 1 | <3000 | <5 | <0.005 | <0.005 | <5 |
| 2 | Water outlet water sample 2 | <3000 | <5 | <0.005 | <0.005 | <5 |
As can be seen that the utility model can effectively handle the ITO etching liquid waste liquids of LCD industries generation, ITO etchings are improved
Indium tin precipitation can reclaim (the rate of recovery in the disposal ability of liquid waste liquid, waste liquid>99%) processing cost, has been saved, and can
The temperature in course of reaction and pH changes are efficiently controlled, the potential safety hazard in the production operation of reaction is reduced.
The utility model simplifies complicated technological process, and the pump of the first drawing liquid pump one is used, and is respectively：Liquid caustic soda squeezes into liquid
Alkali storage tank；The circulation of liquid caustic soda in liquid caustic soda tank；Liquid caustic soda squeezes into retort；The circulation of material in retort；In retort supernatant and
What is precipitated gets；
The utility model can farthest reclaim indium hydroxide tin, using three-level filter system, and select pocket type
Filter, it is workable, it is proven, the indium Theil indices of water outlet are both less than 5ppb, and monitoring result is essentially 0；
The ph of the utility model reaction controlling is the most suitable, and the indium tin that can will be greater than 99% is reacted away, with reference to going out water filtration
System, so as to ensure that the indium Theil indices of water outlet；
The utility model ensure that the controllability and high efficiency of reaction using the combined control system of reaction temperature and pH；
The utility model solves the problem of resource waste of indium tin in liquid crystal display industry ITO etching liquids；
The utility model reuses to greatest extent, and obtaining ITO etching liquids waste liquid with coil pipe transformation built in old storage tank reacts
Settling tank, project investment is few, and treatment effeciency is higher, and an average class 12h can handle four batches, per batch processed ITO etchings
Liquid waste liquid 3m3。
It should be understood that example as described herein and embodiment are not limited to the utility model only for explanation, this
Art personnel can make various modifications or change according to it, all within spirit of the present utility model and principle, be made
Any modification, equivalent substitution and improvements etc., should be included within protection domain of the present utility model.
Claims (10)
1. a kind of processing equipment of ITO etching waste liquids, it is characterised in that：Including liquid caustic soda storage tank (1), retort (2) and first
Conveying mechanism；First is connected between the liquid caustic soda storage tank (1) and the charging aperture and discharging opening of first conveying mechanism
Feeding pipe (61) and the second feeding pipe (62), charging aperture and discharging of the retort (2) with first conveying mechanism
The 3rd feeding pipe (63) and the 4th feeding pipe (64) are connected between mouthful.
2. the processing equipment of ITO etching waste liquids as claimed in claim 1, it is characterised in that：Also include the outer discharge pipe of supernatant
(71), one end of the outer discharge pipe (71) of the supernatant is plugged on the interior retort (2), the other end and first conveyer
The charging aperture connection of structure.
3. the processing equipment of ITO etching waste liquids as claimed in claim 1 or 2, it is characterised in that：Also include water pot up to standard
(81), it is connected with supernatant delivery pipe (72) between the water pot up to standard (81) and the discharging opening of first conveying mechanism.
4. the processing equipment of ITO etching waste liquids as claimed in claim 3, it is characterised in that：The supernatant delivery pipe (72)
On filter (10) is installed.
5. the processing equipment of ITO etching waste liquids as claimed in claim 4, it is characterised in that：The filter (10) is pocket type
Filter.
6. the processing equipment of ITO etching waste liquids as claimed in claim 1 or 2, it is characterised in that：Also include precipitating outer discharge pipe
(73), the outer discharge pipe (73) of the precipitation is connected with the discharging opening of first conveying mechanism.
7. the processing equipment of ITO etching waste liquids as claimed in claim 1 or 2, it is characterised in that：Also include and the first conveyer
The liquid caustic soda feed pipe (74) of the charging aperture connection of structure.
8. the processing equipment of ITO etching waste liquids as claimed in claim 1 or 2, it is characterised in that：The first conveying mechanism bag
Include two the first drawing liquid pumps (41) parallel with one another.
9. the processing equipment of ITO etching waste liquids as claimed in claim 1 or 2, it is characterised in that：Also include ITO etching waste liquids
Storage tank (3) and second conveyor structure, between the ITO etching waste liquids storage tank (3) and the charging aperture of the second conveyor structure
The 5th feeding pipe (65) is connected with, the 6th is connected between the retort (2) and the discharging opening of the second conveyor structure
Feeding pipe (66).
10. the processing equipment of ITO etching waste liquids as claimed in claim 9, it is characterised in that：The second conveyor structure includes
Two the second drawing liquid pumps (51) parallel with one another.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720388072.7U CN206616052U (en) | 2017-04-13 | 2017-04-13 | A kind of processing equipment of ITO etching waste liquids |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720388072.7U CN206616052U (en) | 2017-04-13 | 2017-04-13 | A kind of processing equipment of ITO etching waste liquids |
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| Publication Number | Publication Date |
|---|---|
| CN206616052U true CN206616052U (en) | 2017-11-07 |
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ID=60223357
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| CN201720388072.7U Active CN206616052U (en) | 2017-04-13 | 2017-04-13 | A kind of processing equipment of ITO etching waste liquids |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106865725A (en) * | 2017-04-13 | 2017-06-20 | 合肥茂腾环保科技有限公司 | A kind of handling process and processing equipment of ITO etching waste liquids |
| CN113504340A (en) * | 2021-06-21 | 2021-10-15 | 北京是卓科技有限公司 | Nitrogen oxide gas detection system |
-
2017
- 2017-04-13 CN CN201720388072.7U patent/CN206616052U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106865725A (en) * | 2017-04-13 | 2017-06-20 | 合肥茂腾环保科技有限公司 | A kind of handling process and processing equipment of ITO etching waste liquids |
| CN113504340A (en) * | 2021-06-21 | 2021-10-15 | 北京是卓科技有限公司 | Nitrogen oxide gas detection system |
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