CN106865725A - A kind of handling process and processing equipment of ITO etching waste liquids - Google Patents
A kind of handling process and processing equipment of ITO etching waste liquids Download PDFInfo
- Publication number
- CN106865725A CN106865725A CN201710240883.7A CN201710240883A CN106865725A CN 106865725 A CN106865725 A CN 106865725A CN 201710240883 A CN201710240883 A CN 201710240883A CN 106865725 A CN106865725 A CN 106865725A
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- China
- Prior art keywords
- waste liquids
- ito etching
- etching waste
- caustic soda
- liquid
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- 239000007788 liquid Substances 0.000 title claims abstract description 178
- 238000005530 etching Methods 0.000 title claims abstract description 88
- 239000002699 waste material Substances 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims abstract description 22
- 230000008569 process Effects 0.000 title claims abstract description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 180
- 235000011121 sodium hydroxide Nutrition 0.000 claims abstract description 60
- 238000006243 chemical reaction Methods 0.000 claims abstract description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 43
- 230000007246 mechanism Effects 0.000 claims description 38
- 238000003860 storage Methods 0.000 claims description 37
- 239000006228 supernatant Substances 0.000 claims description 26
- 238000001556 precipitation Methods 0.000 claims description 19
- 238000007599 discharging Methods 0.000 claims description 17
- 238000001914 filtration Methods 0.000 claims description 5
- 239000010808 liquid waste Substances 0.000 abstract description 9
- 230000008859 change Effects 0.000 abstract description 7
- 230000033228 biological regulation Effects 0.000 abstract description 5
- 230000009467 reduction Effects 0.000 abstract description 3
- 230000000630 rising effect Effects 0.000 abstract description 3
- 239000000463 material Substances 0.000 description 20
- 238000006386 neutralization reaction Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000001376 precipitating effect Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- KVXKIRARVMGHKF-UHFFFAOYSA-G indium(3+);tin(4+);heptahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[In+3].[Sn+4] KVXKIRARVMGHKF-UHFFFAOYSA-G 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B25/00—Obtaining tin
- C22B25/06—Obtaining tin from scrap, especially tin scrap
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B58/00—Obtaining gallium or indium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Hydrology & Water Resources (AREA)
- Water Supply & Treatment (AREA)
- ing And Chemical Polishing (AREA)
Abstract
The invention discloses a kind of handling process and processing equipment of ITO etching waste liquids, handling process is comprised the following steps：(1) to liquid caustic soda is added in reaction vessel, then it is diluted treatment；(2) to ITO etching waste liquids are slowly added in the reaction vessel, 9~10, reaction a period of time are reached to pH value；(3) to ITO etching waste liquids are slowly added in the reaction vessel, 7~7.5, reaction a period of time are reached to pH value.The present invention takes reversely regulation, reacted by adding ITO etching waste liquids in liquid caustic soda, and substep adds ITO etching liquid waste liquids, and the present invention to be first diluted to liquid caustic soda, is then reacted with ITO etching waste liquids, temperature ascensional range reduces, and temperature can reduce with the reduction of liquid caustic soda concentration and ITO etching waste liquid concentration, high temperature rising is not resulted in, temperature and the pH change in course of reaction can be efficiently controlled, it is 7 or so that reaction to pH value can be readily adjusted, safe.
Description
Technical field
The present invention relates to the process field of waste liquid, handling process and the treatment of a kind of ITO etching waste liquids are related in particular to
Equipment.
Background technology
Liquid crystal display has turned into technology-intensive, fund-intensive new high-tech industry, and transparent conducting glass is then
One of three big main materials of LCD.Why liquid crystal display can show specific figure, be exactly using saturating on electro-conductive glass
Bright conducting film, the etched electrode for being made given shape is on these electrodes plus appropriate after upper and lower electro-conductive glass is made liquid crystal cell
Voltage signal, makes have the specific aspect arrangement under electric field action of the liquid crystal molecule of even general square, and then show and electrode ripple
The corresponding figure of appearance.
In oxide conductive film, to mix the In of Sn (tin)2O3(ITO) the transmitance highest and electric conductivity of film are best, and
And the thin figures of Cheng are easily etched in acid solution, its transmitance is up to more than 90%., it is necessary to use in LCD production technologies
The immersion of high-temperature baking and the broken liquid of various acid, therefore generate the substantial amounts of ITO etching liquid waste liquids containing tin indium oxide.
Such ITO etching liquids are usually two or more acid and mix, typically sulfuric acid, hydrochloric acid or nitric acid etc., single
Acid content is less than 7%, adds up acid content and is no more than 20%.Because of the indium tin for etching after over etching workshop section, indium is contained in its waste liquid
And tin ion.The content of indium tin is 50ppm or so.Such waste liquid be usually taken after neutralisation treatment again through biochemical system method without
Evilization treatment, indium tin therein is into being wasted in sludge.
Technique in current chemical industry for neutralisation treatment acidic and alkaline waste water is a lot, but is directed to such ITO etching waste liquids
Neutralisation treatment technique it is less, the metal ion content in ITO etching waste liquids is larger, acid corrosivity and total acidity it is very high,
Substantial amounts of heat can be released during neutralisation treatment, high temperature rises, it is difficult to temperature and the pH change in controlling course of reaction, deposit
In certain risk.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of temperature and pH that can be efficiently controlled in course of reaction
The handling process of the ITO etching waste liquids of change, and the processing equipment of the ITO etching waste liquids for implementing the technique can be used.
In order to solve the above-mentioned technical problem, the present invention is adopted the following technical scheme that：A kind of place's science and engineering of ITO etching waste liquids
Skill, comprises the following steps：
(1) to liquid caustic soda is added in reaction vessel, then it is diluted treatment；
(2) to ITO etching waste liquids are slowly added in the reaction vessel, 9~10, reaction a period of time are reached to pH value；
(3) to ITO etching waste liquids are slowly added in the reaction vessel, 7~7.5, reaction a period of time are reached to pH value.
Further, filtration treatment also is carried out to reaction solution including step (4).
A kind of processing equipment of ITO etching waste liquids, including liquid caustic soda storage tank, retort and the first conveying mechanism；The liquid
The first feeding pipe and the second conveying are connected between alkali storage tank and the charging aperture and discharging opening of first conveying mechanism
Be connected between the charging aperture and discharging opening of pipeline, the retort and first conveying mechanism the 3rd feeding pipe and
4th feeding pipe.
Further, also including the outer discharge pipe of supernatant, one end of the outer discharge pipe of the supernatant is plugged on the reaction
Tank is interior, the other end is connected with the charging aperture of first conveying mechanism.
Further, also including water pot up to standard, connect between the discharging opening of the water pot up to standard and first conveying mechanism
It is connected to supernatant delivery pipe.
Further, also including precipitating outer discharge pipe, the discharging of the precipitation discharge pipe and first conveying mechanism outward
Mouth connection.
Further, the liquid caustic soda feed pipe for also being connected including the charging aperture with the first conveying mechanism.
Further, first conveying mechanism includes two the first drawing liquid pumps parallel with one another.
Further, also including ITO etching waste liquids storage tank and second conveyor structure, the ITO etching waste liquids storage tank with
The 5th feeding pipe, the retort and the second conveyor structure are connected between the charging aperture of the second conveyor structure
The 6th feeding pipe is connected between discharging opening.
Further, the second conveyor structure includes two the second drawing liquid pumps parallel with one another.
Beneficial effects of the present invention are：
The handling process of ITO etching waste liquids of the present invention take reversely regulation, by liquid caustic soda add ITO etching waste liquids come
Reaction, and substep adds ITO etching liquid waste liquids, and the present invention to be first diluted to liquid caustic soda, is then carried out instead with ITO etching waste liquids
Should, temperature ascensional range reduces, and temperature can reduce, Bu Huizao with the reduction of liquid caustic soda concentration and ITO etching waste liquid concentration
Rise into high temperature, temperature and the pH change in course of reaction can be efficiently controlled, reaction to pH can be readily adjusted
It is 7 or so to be worth, safe.
The processing equipment simple structure of ITO etching waste liquids of the present invention a, pump is multiplex, save resources, and liquid caustic soda storage tank is used to store up
Liquid storage alkali, when ITO etching waste liquids are processed, the first conveying mechanism provides conveying power, and the liquid caustic soda in liquid caustic soda storage tank is sequentially passed through
First feeding pipe, the first conveying mechanism, the 4th feeding pipe enter in retort, after being diluted with water, then add in retort
Entering ITO etching waste liquids carries out neutralisation treatment, adding water, during ITO etching waste liquids and neutralization reaction, the phase in retort
Material is answered to be discharged by the 3rd feeding pipe, then returned again by the 4th feeding pipe in the presence of the first conveying mechanism
To retort, corresponding material is realized in retort interior circulation, so that material can be sufficiently mixed reaction, in addition, when liquid caustic soda storage
When liquid caustic soda in tank has precipitation to produce, likewise, liquid caustic soda can also be discharged by the first feeding pipe, then by the second feeding pipe
Liquid caustic soda storage tank is come back to, realizes that liquid caustic soda, in liquid caustic soda storage tank interior circulation, dissolves with to precipitation.
The processing equipment of ITO etching waste liquids of the present invention is combined with handling process, can effectively process the generation of LCD industries
ITO etching waste liquids, improve the disposal ability of ITO etching waste liquids, have saved processing cost, and by valuable metal ions therein
Indium, tin farthest collect the (rate of recovery>99%), make product and realize the marketization, and can efficiently control anti-
Temperature and pH change during answering, reduces the potential safety hazard in the production operation of reaction.
Brief description of the drawings
Fig. 1 is the structural representation of the processing equipment of one embodiment of the invention ITO etching waste liquids.
In accompanying drawing the mark of each part for：1 liquid caustic soda storage tank, 2 retort, 3ITO etching waste liquids storage tank, 31IBC tons of bucket, 41
First drawing liquid pump, 42 first shunt valves, 43 first bypass valves, 51 second drawing liquid pumps, 52 second shunt valves, 53 second bypass valves,
61 first feeding pipes, 62 second feeding pipes, 63 the 3rd feeding pipes, 64 the 4th feeding pipes, 65 the 5th feeding pipes, 66
The outer discharge pipe of 6th feeding pipe, 661 flowmeters, 71 supernatants, 72 supernatant delivery pipes, the 73 outer discharge pipes of precipitation, 74 liquid caustic soda
Feed pipe, 75 tap water pipelines, 81 water pots up to standard, 82 water tanks, 83 waste tanks, 84 snap joints, 91 the 3rd drawing liquid pumps, 92
Water up to standard outer discharge pipe, 10 filters, 11 shower nozzles.
Specific embodiment
It should be noted that in the case where not conflicting, the feature in embodiment and embodiment in the application can phase
Mutually combination.Describe the present invention in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
Referring to Fig. 1.
The processing equipment of ITO etching waste liquids of the present invention, including liquid caustic soda storage tank 1, the conveying mechanism of retort 2 and first；Institute
State and the first feeding pipe 61 and are connected between liquid caustic soda storage tank 1 and the charging aperture and discharging opening of first conveying mechanism
The 3rd is connected between the charging aperture and discharging opening of two feeding pipes 62, the retort 2 and first conveying mechanism
The feeding pipe 64 of feeding pipe 63 and the 4th.
Liquid caustic soda storage tank is used to store liquid caustic soda, and when ITO etching waste liquids are processed, the first conveying mechanism provides conveying power, liquid
Liquid caustic soda in alkali storage tank sequentially passes through the first feeding pipe, the first conveying mechanism, the 4th feeding pipe and enters in retort, adds water
After dilution, then to adding the ITO etching waste liquids to carry out neutralisation treatment in retort, adding water, ITO etching waste liquids and neutralization reaction
During, the corresponding material in retort can be discharged, then lead in the presence of the first conveying mechanism by the 3rd feeding pipe
Cross the 4th feeding pipe and come back to retort, corresponding material is realized in retort interior circulation, so that material can be mixed fully
Reaction is closed, in addition, when the liquid caustic soda in liquid caustic soda storage tank has precipitation to produce, likewise, liquid caustic soda can also be arranged by the first feeding pipe
Go out, then liquid caustic soda storage tank is come back to by the second feeding pipe, realize liquid caustic soda in liquid caustic soda storage tank interior circulation, it is molten to carry out to precipitation
Solution.
In specific implementation, the first feeding pipe 61 is connected to the lower end of liquid caustic soda storage tank 1, and the second feeding pipe 62 is connected to liquid
The top of alkali storage tank 1, the 3rd feeding pipe 63 is connected to the lower end of retort 2, and the 4th feeding pipe 64 is connected to retort 2
Top.
In one embodiment, equipment also includes the outer discharge pipe 71 of supernatant, and one end of the outer discharge pipe 71 of the supernatant is inserted
It is connected in the retort 2, the other end is connected with the charging aperture of first conveying mechanism.After completion of the reaction, one end is stood
Time, supernatant can be discharged by the first conveying mechanism and the outer discharge pipe 71 of supernatant in retort, and further, equipment is also wrapped
Water pot up to standard 81 is included, supernatant delivery pipe is connected between the water pot up to standard 81 and the discharging opening of first conveying mechanism
72, the supernatant of so discharge can be squeezed into directly in water pot up to standard by supernatant delivery pipe, conveniently carry out the treatment of next step.
Further, in order to further purify supernatant, filter 10 is installed in supernatant delivery pipe 72.
In one embodiment, filter 10 selects tertiary filter, and specification is followed successively by 50 mesh, 100 mesh, 200 mesh；Filter
10 preferred bag filters, can periodic collection and cleaning indium hydroxide tin precipitation, be easy to reclaim, can specifically be gone out by filter
The pressure gauge of mouth judges, to stop liquid, cleaning filter bag when pressure is higher than 2kg.
In one embodiment, also including precipitating outer discharge pipe 73, the outer discharge pipe 73 of the precipitation and first conveyer
The discharging opening connection of structure.After completion of the reaction, precipitation is produced in retort, now, can be defeated by the 3rd feeding pipe 63, first
Send mechanism, the outer discharge pipe 73 of precipitation will be precipitated and neutralizer is discharged from retort.
In one embodiment, the liquid caustic soda feed pipe 74 for also being connected including the charging aperture with the first conveying mechanism.Liquid caustic soda is not
When sufficient, can be in the presence of the first conveying mechanism, by liquid caustic soda feed pipe, the second feeding pipe to replenisher in liquid caustic soda storage tank
Alkali.
In specific implementation, the first feeding pipe 61, the second feeding pipe 62, the 3rd feeding pipe 63, the 4th feeding pipe
64th, the outer discharge pipe 71 of supernatant, supernatant delivery pipe 72, the outer discharge pipe 73 of precipitation, liquid caustic soda feed pipe 74 are defeated close to first
The charging aperture and discharge outlet of mechanism is sent to merge, convenient connection installs valve on each pipeline, is easy to control material.
In one embodiment, first conveying mechanism includes two the first drawing liquid pumps 41 parallel with one another.Specific implementation
In, the first shunt valve 42 is connected between the inlet and liquid outlet of each first drawing liquid pump 41, is provided with the first shunt valve
One bypass valve 43, plays regulation flow, prevents from suppressing the function of pump.
In one embodiment, also including ITO etching waste liquids storage tank 3 and second conveyor structure, the ITO etching waste liquids storage
The 5th feeding pipe 65 is connected between the charging aperture of tank 3 and the second conveyor structure, the retort 2 is defeated with described second
The 6th feeding pipe 66 is connected between the discharging opening for sending mechanism.ITO etching waste liquids storage tank is used to store ITO etching waste liquids, plus
During material, under the dynamic action of second conveyor structure, ITO etching waste liquids are entered by the 5th feeding pipe, the 6th feeding pipe
Retort.
In one embodiment, equipment also includes water tank 82, and water tank 82 connects with the charging aperture of the second conveyor structure
It is logical, for being added water in retort.In specific implementation, the discharging opening of ITO etching waste liquids storage tank 3 and water tank 82 is installed and quickly connect
First 84, quick for pipeline disconnects.
In addition, for convenience of the moisturizing of water tank 82, water tank 82 is connected with tap water pipeline 75；ITO etching waste liquid storage tanks
Bottom be lined with an IBC tons of bucket 31, for ITO etching waste liquid storage tanks safety place and ITO etching waste liquids charging stabilization.
In one embodiment, equipment also includes waste tank 83.The neutralizer and precipitation for reacting pot bottom are periodically processed,
Beat into waste tank temporary by precipitating outer discharge pipe.
In one embodiment, the second conveyor structure includes two the second drawing liquid pumps 51 parallel with one another.Similarly, have
During body is implemented, the second shunt valve 52 is connected between the inlet and liquid outlet of each second drawing liquid pump 51, pacified on the second shunt valve
Equipped with the second bypass valve 53, regulation flow is played, prevent from suppressing the function of pump.
In one embodiment, the 3rd drawing liquid pump 91 is installed in supernatant delivery pipe 72, for improving conveying power.Enter one
Step ground, water pot up to standard 81 is connected with the inlet of the 3rd drawing liquid pump 91, and equipment also includes the outer discharge pipe 92 of water up to standard, outside water up to standard
Discharge pipe 92 is connected with the liquid outlet of the 3rd drawing liquid pump 91.When water is full in water pot up to standard, can be by the 3rd drawing liquid pump and up to standard
The outer discharge pipe of water discharges water.
In one embodiment, the port of export of 64 the 4th feeding pipes and 66 the 6th feeding pipes is provided with shower nozzle 11, for inciting somebody to action
Corresponding material is sprayed into retort, contributes to the mixing of corresponding material.
In one embodiment, flowmeter 661 is installed on the 6th feeding pipe 66, for detecting entering for corresponding material
Doses.
In one embodiment, the retort 2 is coiled reactor, and reactant can be lowered the temperature.
In one embodiment, sunk pH meter is installed in the retort 2, for monitoring pH.
The present invention also provides a kind of processing equipment using above-mentioned ITO etching waste liquids carries out the work of ITO etching waste liquid treatment
Skill, comprises the following steps：
(1) using the first conveying mechanism, the first feeding pipe and the 4th feeding pipe, by the liquid caustic soda (liquid in liquid caustic soda storage tank
Alkali is from the NaOH aqueous solution that mass concentration is 32%) beat into retort, then using second conveyor structure, the 6th conveying pipeline
Be added to running water in water tank in retort liquid caustic soda be diluted by road, during adding water, using the first conveying
Mechanism, the 3rd feeding pipe and the 4th feeding pipe make material in retort interior circulation, liquid caustic soda is sufficiently mixed with running water, directly
3.2%, after the completion of dilution is reached to NaOH mass concentrations, temperature is essentially identical with outdoor environment temperature；
(2) using second conveyor structure, the 5th feeding pipe and the 6th feeding pipe, by ITO etching waste liquid storage tanks
ITO etching waste liquids are with 2m3The flow velocity of/h is beaten into retort, in pH value when 12 decline, by controlling corresponding bypass valve, and drop
The flow velocity of low ITO etching waste liquids is to 0.3m3/ h, plus ITO etching waste liquids during, using the first conveying mechanism, the 3rd defeated
Pipe material and the 4th feeding pipe make material in retort interior circulation, to make the liquid caustic soda after dilution with ITO etching waste liquids energy fully
Reaction, the numerical value that pH meter show will not department area, until sunk pH meter display pH value be 9~10, stop add ITO etch
Waste liquid, then proceedes to make material in retort interior circulation 15 minutes；
(3) using second conveyor structure, the 5th feeding pipe and the 6th feeding pipe, by ITO etching waste liquid storage tanks
ITO etching waste liquids are with 0.1m3The flow velocity of/h is beaten into retort, similarly, in the process, using the first conveying mechanism,
Three feeding pipes and the 4th feeding pipe make material in retort interior circulation, until sunk pH meter display pH value is 7~7.5,
Stop plus ITO etching waste liquids, then proceed to make material in retort interior circulation 15 minutes；
During step (2) and step (3), when reaction temperature is more than 40 DEG C, in the coil pipe of startup retort
Water on condensed water, allows system to lower the temperature, and automatic stops after 1 hour；When pH is less than 7.0, the second drawing liquid pump 51 is automatically stopped,
Stop the charging of ITO etching liquid waste liquids.By the linkage of temperature and pH, can effectively prevent in course of reaction because of the rising of temperature
Cause the adverse effect to reaction vessel, it is ensured that the safely controllable property of course of reaction.
(4) retort stands 0.4~0.6h, then defeated using the first conveying mechanism, the outer discharge pipe of supernatant and supernatant
Send pipe by the supernatant in retort by entering water pot up to standard after filter effectively filtering, sewage disposal system is entered back into afterwards
Processed again, after the detection of COD ammonia nitrogens on-line computing model is up to standard, subsequent biochemical treatment is carried out into sewage plant；
(5) neutralizer that last treatment is formed, after discharging a part of supernatant, remaining neutralizer is not discharged, and is used for
The liquid caustic soda that step (1) is added during to processing next time is diluted, and to reduce the consumption of the running water when liquid caustic soda is diluted, reaches section
The purpose of energy, meets the production theory of green non-pollution, energy-saving and emission-reduction；It is defeated by the 3rd with the accumulation precipitated in retort
The neutralizer and precipitation that pipe material, the first conveying mechanism, the outer discharge pipe of precipitation will react pot bottom beat into waste tank temporary, treat
After natural subsidence is complete, supernatant is discharged, remaining precipitation dries dry rear recycling.
Because the acidity of ITO etching waste liquids is relatively strong, it is equal to by being reacted to pH in addition liquid caustic soda in ITO etching waste liquids
7 are difficult to realize, and the present invention takes reversely regulation, are reacted by adding ITO etching waste liquids in liquid caustic soda, and substep adds ITO
Etching liquid waste liquid, and the present invention is first diluted to liquid caustic soda, is then reacted with ITO etching waste liquids, temperature ascensional range subtracts
It is small, and temperature can reduce with the reduction of liquid caustic soda concentration and ITO etching waste liquid concentration, not result in high temperature rising, energy
Temperature and the pH change in course of reaction are enough efficiently controlled, it is 7 or so, security that can be readily adjusted reaction to pH value
It is high.Effluent quality analysis result is as shown in table 1 below：
Table 1
| Sequence number | Water outlet | COD(mg/L) | NH3-N(mg/L) | Colourity (degree) | ||
| 1 | Water outlet water sample 1 | <3000 | <5 | <0.005 | <0.005 | <5 |
| 2 | Water outlet water sample 2 | <3000 | <5 | <0.005 | <0.005 | <5 |
As can be seen that the processing equipment of ITO etching liquids waste liquid of the present invention is combined with handling process, LCD can be effectively processed
The ITO etching liquid waste liquids that industry is produced, improve the disposal ability of ITO etching liquid waste liquids, and indium tin precipitation can be reclaimed and (returned in waste liquid
Yield>99%) processing cost, has been saved, and the temperature in course of reaction and pH changes can have been efficiently controlled, reduced reaction
Production operation in potential safety hazard.
The present invention simplifies complicated technological process, and the pump of the first drawing liquid pump one is multiplex, is respectively：Liquid caustic soda squeezes into liquid caustic soda storage
Tank；The circulation of liquid caustic soda in liquid caustic soda tank；Liquid caustic soda squeezes into retort；The circulation of material in retort；Supernatant and precipitation in retort
Get；
The present invention can farthest reclaim indium hydroxide tin, using three-level filter system, and select bag type filtering
Device, it is workable, it is proven, the indium Theil indices of water outlet are both less than 5ppb, and monitoring result is essentially 0；
The ph of reaction controlling of the present invention is the most suitable, and the indium tin that can will be greater than 99% is reacted away, with reference to going out water filtering system,
So as to ensure that the indium Theil indices of water outlet；
The present invention ensure that the controllability and high efficiency of reaction using the combined control system of reaction temperature and pH；
The present invention solves the problem of resource waste of indium tin in liquid crystal display industry ITO etching liquids；
This technique of the invention reuses to greatest extent, and it is anti-to obtain ITO etching liquid waste liquids with the old built-in coil pipe transformation of storage tank
Settling tank is answered, project investment is few, and treatment effeciency is higher, an average class 12h can process four batches, carved per batch processed ITO
Erosion liquid waste liquid 3m3。
It should be understood that example as herein described and implementation method are not intended to limit the invention, this area only for explanation
Technical staff can make various modifications or change according to it, all any modifications within the spirit and principles in the present invention, made,
Equivalent, improvement etc., should be included within the scope of the present invention.
Claims (10)
1. a kind of handling process of ITO etching waste liquids, it is characterised in that comprise the following steps：
(1) to liquid caustic soda is added in reaction vessel, then it is diluted treatment；
(2) to ITO etching waste liquids are slowly added in the reaction vessel, 9~10, reaction a period of time are reached to pH value；
(3) to ITO etching waste liquids are slowly added in the reaction vessel, 7~7.5, reaction a period of time are reached to pH value.
2. the handling process of ITO etching waste liquids as claimed in claim 1, it is characterised in that：Also include step (4) to reaction solution
Carry out filtration treatment.
3. a kind of processing equipment of ITO etching waste liquids, the place's science and engineering for implementing the ITO etching waste liquids described in claim 1 or 2
Skill, it is characterised in that：Including liquid caustic soda storage tank (1), retort (2) and the first conveying mechanism；The liquid caustic soda storage tank (1) with it is described
The first feeding pipe (61) and the second feeding pipe (62) are connected between the charging aperture and discharging opening of the first conveying mechanism,
The 3rd feeding pipe (63) is connected between the retort (2) and the charging aperture and discharging opening of first conveying mechanism
With the 4th feeding pipe (64).
4. the processing equipment of ITO etching waste liquids as claimed in claim 3, it is characterised in that：Also include the outer discharge pipe of supernatant
(71), one end of the outer discharge pipe (71) of the supernatant is plugged on the interior retort (2), the other end and first conveyer
The charging aperture connection of structure.
5. the processing equipment of the ITO etching waste liquids as described in claim 3 or 4, it is characterised in that：Also include water pot up to standard
(81), it is connected with supernatant delivery pipe (72) between the water pot up to standard (81) and the discharging opening of first conveying mechanism.
6. the processing equipment of the ITO etching waste liquids as described in claim 3 or 4, it is characterised in that：Also include the outer discharge pipe of precipitation
(73), the outer discharge pipe (73) of the precipitation is connected with the discharging opening of first conveying mechanism.
7. the processing equipment of the ITO etching waste liquids as described in claim 3 or 4, it is characterised in that：Also include and the first conveyer
The liquid caustic soda feed pipe (74) of the charging aperture connection of structure.
8. the processing equipment of the ITO etching waste liquids as described in claim 3 or 4, it is characterised in that：The first conveying mechanism bag
Include two the first drawing liquid pumps (41) parallel with one another.
9. the processing equipment of the ITO etching waste liquids as described in claim 3 or 4, it is characterised in that：Also include ITO etching waste liquids
Storage tank (3) and second conveyor structure, between the ITO etching waste liquids storage tank (3) and the charging aperture of the second conveyor structure
The 5th feeding pipe (65) is connected with, the 6th is connected between the retort (2) and the discharging opening of the second conveyor structure
Feeding pipe (66).
10. the processing equipment of ITO etching waste liquids as claimed in claim 9, it is characterised in that：The second conveyor structure includes
Two the second drawing liquid pumps (51) parallel with one another.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN113504340A (en) * | 2021-06-21 | 2021-10-15 | 北京是卓科技有限公司 | Nitrogen oxide gas detection system |
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