CN206535799U - Wafer cleaning machine - Google Patents
Wafer cleaning machine Download PDFInfo
- Publication number
- CN206535799U CN206535799U CN201621277450.6U CN201621277450U CN206535799U CN 206535799 U CN206535799 U CN 206535799U CN 201621277450 U CN201621277450 U CN 201621277450U CN 206535799 U CN206535799 U CN 206535799U
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- Prior art keywords
- rinse bath
- cleaning
- hand basket
- ultrasonic
- starting switch
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn - After Issue
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Abstract
The utility model discloses a kind of wafer cleaning machine, it is desirable to provide the wafer cleaning machine that a kind of environmental pollution is small, cleaning performance is good.The utility model includes cleaning storehouse, ultrasonic wave NDK flower kings cleaning device, spray decontaminating apparatus and the pure water washing device of ultrasonic wave are disposed with the cleaning storehouse, the ultrasonic wave NDK flower kings cleaning device, the spray decontaminating apparatus and the pure water washing device of the ultrasonic wave are provided with several net cups, the net cup and are provided with chip.The utility model is applied to the technical field of wafer cleaning.
Description
Technical field
The utility model belongs to the technical field of wafer cleaning, more particularly to a kind of wafer cleaning machine.
Background technology
Chip in quartz-crystal resonator, is formed into the main body of Quartz crystal resonant element, and quartz crystal is cleaved fixed
To, it is thick in turn into quartz plate after the processing such as fine grinding, its material being dirt has the metallic of grease, wax, grounds travel, abrasive disk
Deng in order to remove these dirts, it is necessary to cleaned, so that corrosion is uniform, silver layer is firm, reduce resonant resistance, reduction aging
Rate.Thus the cleannes degree of wafer surface is to weigh the important ring that can product work reliably and with long-term on surface-mounted integrated circuit
Section.Because acid flux material can effectively remove the grease, wax, metallic particles class pickup material of wafer surface work in-process attachment,
Cleaning fluid based on acid flux material is used existing conventional wafer cleaning such as more：Sulfuric acid, nitric acid, hydrochloric acid etc., chip is immersed in
Heated on electric furnace in acidic cleaning solution, deionized water rinsing then passed through again, then by ultrasonic wave clean etc. step with up to
To the purpose for removing pickup material；Though this kind of cleaning way cleaning performance is more satisfactory, is boiled and washed in operation using electric furnace heating
There are potential safety hazard, Long Term Contact acid flux material to there is the volatilization gas produced in certain infringement, cleaning to have necessarily environment to human body
Pollution, thus can replace the new cleaning and cleaning equipment of acid cleaning in the urgent need to a kind of.
Utility model content
Technical problem to be solved in the utility model be overcome the deficiencies in the prior art there is provided a kind of environmental pollution it is small,
The good wafer cleaning machine of cleaning performance.
The technical scheme that the utility model is used is：The utility model includes setting in cleaning machine body, the body
There is the envelope door for being provided with cleaning storehouse, the body and being provided with and being adapted with the cleaning storehouse on control panel, the body,
Equal ultrasonic wave NDK flower kings cleaning device, the spray being electrically connected with the control panel is disposed with the cleaning storehouse to wash
Cleaning device and the pure water washing device of ultrasonic wave, ultrasonic wave NDK flower king cleaning device, the spray decontaminating apparatus and described
The pure water washing device of ultrasonic wave is provided with several net cups, the net cup and is provided with chip.
Further, the ultrasonic wave NDK flower kings cleaning device includes the first rinse bath, the first hand basket mechanism, the first liquid
Body container, the first ultrasonic instrument, the first accumulator tank, the first pipeline and NDK flower king's cleaning solvents, the first rinse bath peace
One end loaded on the cleaning storehouse, the first hand basket mechanism is adapted with first rinse bath and to be installed on described first clear
In washing trough, several net cups are provided with the first hand basket mechanism, first tank container is installed on described
One end of body and it is connected with first rinse bath by the first pipeline, first ultrasonic instrument is installed on described first
The bottom of rinse bath, first accumulator tank is installed on the outside of first rinse bath, and with first tank container
It is connected, first tank container spends king's cleaning solvent built with the NDK, NDK flowers king's cleaning solvent passes through institute
State the first pipeline and flow into first rinse bath from first tank container.
Further, the spray decontaminating apparatus includes the mounting base being installed on the centre of the cleaning storehouse and is installed on
Second liquid container on one end of the body, the second liquid container is built with the first pure water, the installation bottom
Several net bottles being adapted with the net cup are provided with plate, the two ends of the mounting base, which are set, is provided with several sprays
Mechanism is spilt, the spraying mechanism is connected with the second liquid container by second pipe, the bottom of the mounting base
End is provided with discharging of waste liquid groove.
Further, the pure water washing device of the ultrasonic wave includes the second rinse bath, the second hand basket mechanism, the 3rd liquid
Container, the second ultrasonic instrument, the 3rd pipeline and the second accumulator tank, second rinse bath are installed on the another of the cleaning storehouse
One end, the second hand basket mechanism is adapted and is installed in second rinse bath, described second with second rinse bath
Several net cups are provided with hand basket mechanism, the 3rd tank container passes through the described 3rd with second rinse bath
Pipeline is connected, and the 3rd tank container is equipped with the second pure water, and second pure water is by the 3rd pipeline from described
3rd tank container flows into second rinse bath, and second ultrasonic instrument is installed on the bottom of second rinse bath
Portion, second accumulator tank is installed on the outside of second rinse bath, and second accumulator tank and the second liquid collection
Vanning is connected.
Further, the first hand basket mechanism and the second hand basket mechanism include cleaning frame, connecting rod and with control
The cleaning frame, institute are provided with the drive cylinder that panel is electrically connected with, first rinse bath and second rinse bath
State and be provided with several net cups on cleaning frame, the upper end both sides of the cleaning frame are connected with the connecting rod, the company
Bar is connected with the drive cylinder, and the drive cylinder is installed in the wall in the cleaning storehouse.
Further, the spraying mechanism includes support and sprinkler head, and the support is located at the two ends of the mounting base,
The sprinkler head is installed on the top of the support, and the sprinkler head is connected with the second pipe.
Further, the first negative suction device is provided with the connection outlet of first tank container and the first pipeline,
The second negative suction device, the 3rd tank container are provided with the connection outlet of the second liquid container and second pipe
With being provided with the 3rd negative suction device at the connection outlet of the 3rd pipeline.
Further, the described first negative device, the described second negative device, the described 3rd negative device of inhaling inhaled inhaled is to draw water
Pump, and it is described first it is negative inhale device, it is described second it is negative inhale device, it is described 3rd it is negative inhale device electrically connect with the control panel
Connect.
Further, the control panel includes MCU control module and opened with MCU control module is electrically connected with first
Dynamic switch, the second starting switch and the 3rd starting switch, first starting switch, second starting switch, the described 3rd
Starting switch is electrically connected with the described first negative device, the described second negative device, the described 3rd negative device of inhaling inhaled inhaled respectively, described
Control panel also includes electrical with first starting switch, second starting switch, the 3rd starting switch respectively
The drive in the first timing display, the second timing display, the 3rd timing display of connection, the first hand basket mechanism
The drive cylinder taken offence on cylinder and the second hand basket mechanism respectively with first starting switch and the 3rd startup
Switch be electrically connected with, the control panel be additionally provided with first ultrasonic instrument be electrically connected with the first ultrasonic switch and
The second ultrasonic switch being electrically connected with second ultrasonic instrument, first ultrasonic switch and second ultrasonic switch
It is electrically connected with the MCU control module.
The beneficial effects of the utility model are：Because the utility model includes being provided with cleaning machine body, the body
Clean on storehouse, the body and be provided with the envelope door for being provided with and being adapted with the cleaning storehouse on control panel, the body, institute
State and the equal ultrasonic wave NDK flower kings cleaning device being electrically connected with the control panel is disposed with cleaning storehouse, sprays and cleans
Device and the pure water washing device of ultrasonic wave, ultrasonic wave NDK flower king cleaning device, the spray decontaminating apparatus and described super
It is provided with the pure water washing device of sound wave in several net cups, the net cup and is provided with chip, so the utility model
Compared with existing acid flux material electric furnace heated wash wafer technique, a kind of new chip can be carried out using the wafer cleaning machine clear
Wash operation, make cleaning operation security improve, using special environment protection cleaning agent to human body go infringement, to environment almost without soiled；
And foreign matter attachment can be reduced by cleaning overall process；Confirm that it can by the inspection of cleaning effect under cleaning performance experiment and microscope
The effect of even above acid flux material is reached, the adhesive force of chip silver layer and quartz plate in plated film can also reach test stone.
Brief description of the drawings
Fig. 1 is schematic diagram of the present utility model；
Fig. 2 is the top view for cleaning storehouse；
Fig. 3 is the schematic diagram of hand basket mechanism.
Embodiment
As shown in Figure 1 to Figure 3, in the present embodiment, the utility model includes setting in cleaning machine body 1, the body 1
Have to be provided with control panel 3, the body 1 on cleaning storehouse 2, the body 1 and be provided with the envelope being adapted with the cleaning storehouse 2
The equal ultrasonic wave NDK flower king's cleaning devices being electrically connected with the control panel 3 are disposed with door 4, the cleaning storehouse 2
5th, spray decontaminating apparatus 6 and the pure water washing device 7 of ultrasonic wave, the ultrasonic wave NDK flower kings cleaning device 5, the spray are washed
Cleaning device 6 and the pure water washing device 7 of the ultrasonic wave, which are provided with several net cups 8, the net cup 8, is provided with crystalline substance
Piece.
In the present embodiment, the ultrasonic wave NDK flower kings cleaning device 5 includes the first rinse bath 51, the first hand basket mechanism
52nd, the first tank container 53, the first ultrasonic instrument, the first accumulator tank 54, the first pipeline 55 and NDK flower king's cleaning solvents,
First rinse bath 51 is arranged at the one end in the cleaning storehouse 2, the first hand basket mechanism 52 and first rinse bath 51
It is adapted and is installed in first rinse bath 51, several net cups 8, institute is provided with the first hand basket mechanism 52
The first tank container 53 is stated to be installed on one end of the body 1 and with first rinse bath 51 by the first pipeline 55 be connected
It is logical, the first negative suction device is provided with the connection outlet of the pipeline 55 of the first tank container 53 and first, it is described the first to surpass
Acoustic wave apparatus are installed on the bottom of first rinse bath 51, and first accumulator tank 54 is installed on first rinse bath 51
Outside, and be connected with first tank container 53, first tank container 53 spends Wang Qingxi built with the NDK
Solvent, this design can be by the described first negative device of inhaling by the NDK flowers Wang Qingxi in first tank container 53
Solvent flows into first rinse bath 51 by first pipeline 55, when NDK flower king's cleaning solvents are clear from described first
When washing trough 51 is overflowed, the NDK flower king's cleaning solvents overflowed out can flow into first accumulator tank 54, so as to flow back to described the
In one tank container 53, so that the effect that NDK flowers king's cleaning solvent is recycled is reached, and NDK flowers Wang Qingxi
Solvent uses a period of time follow-up NDK flower king's cleaning solvents updated newly.
In the present embodiment, the spray decontaminating apparatus 6 includes the mounting base 61 being installed on the centre of cleaning storehouse 2
With the second liquid container being installed on one end of the body 1, the second liquid container is built with the first pure water, institute
State and several net bottles 62 being adapted with the net cup 8 are provided with mounting base 61, the two ends of the mounting base 61 are set
Several spraying mechanisms 63 are provided with, the spraying mechanism 63 includes support 631 and sprinkler head 632, and the support 631 is located at
The two ends of the mounting base 61, the sprinkler head 632 is installed on the top of the support 631, the spraying mechanism 63 with
The second liquid container is connected by second pipe, and the bottom of the mounting base 61 is provided with discharging of waste liquid groove 64,
The second negative suction device, one end of the second pipe are provided with the connection outlet of the second liquid container and second pipe
It is connected with the second liquid container, the other end of the second pipe is provided with several and the phase of sprinkler head 632
The branched pipe of connection；This design can be pure by described first in the second liquid container by the described second negative suction device
Water is transported on each described sprinkler head 632, and is installed on by 632 pairs of the sprinkler head some on the mounting base 61
The individual net cup 8 carries out continuous shower, and first pure water after shower is complete is flowed into discharge in the discharging of waste liquid groove 64.
In the present embodiment, the pure water washing device 7 of the ultrasonic wave includes the second rinse bath 71, the second hand basket mechanism
72nd, the 3rd tank container, the second ultrasonic instrument, the 3rd pipeline 73 and the second accumulator tank 74, second rinse bath 71 are pacified
The other end loaded on the cleaning storehouse 2, the second hand basket mechanism 72 is adapted with second rinse bath 71 and is installed on institute
State in the second rinse bath 71, several net cups 8, the 3rd tank container are provided with the second hand basket mechanism 72
It is connected with second rinse bath 71 by the 3rd pipeline 73, the 3rd tank container and the company of the 3rd pipeline 73
The 3rd negative suction device is provided with exit, the 3rd tank container is equipped with the second pure water, and second pure water passes through institute
State the 3rd pipeline 73 and flow into second rinse bath 71 from the 3rd tank container, second ultrasonic instrument is installed on
The bottom of second rinse bath 71, second accumulator tank 74 is installed on the outside of second rinse bath, and described second
Accumulator tank 74 is connected with the second liquid container, and this design can be by the described 3rd negative device of inhaling by the 3rd liquid
Second pure water in body container flows into second rinse bath 71 by the 3rd pipeline 73, when second pure water
When being overflowed from second rinse bath 71, second pure water overflowed out can flow into second accumulator tank 74, so as to flow into
, can be again so as to make second pure water after second rinse bath 71 has been utilized in the second liquid container
It is used on the spray decontaminating apparatus 6.
In the present embodiment, the first hand basket mechanism 52 and the second hand basket mechanism 72 include cleaning frame 9, connecting rod
10 and the drive cylinder 11 that is electrically connected with control panel 3, it is all provided with first rinse bath 51 and second rinse bath 71
Be equipped with the cleaning frame 9, the cleaning frame 9 and be provided with several net cups 8, the upper end both sides of the cleaning frame 9 with
The connecting rod 10 is connected, and the connecting rod 10 is connected with the drive cylinder 11, and the drive cylinder 11 is installed on described clear
Bring down stocks in 2 wall, this design can drive the connecting rod 10 to move up and down by the drive cylinder, so that being positioned over described clear
Wash the cup of the net on frame 98 to move up and down, so that the chip being positioned in the net cup 8 fluctuates, imitate wafer cleaning
Fruit is more preferably.
In the present embodiment, the described first negative device, the described second negative device, the described 3rd negative device of inhaling inhaled inhaled is to take out
Water pump, and the first negative suction device, the second negative suction device, the 3rd negative suction device are electric with the control panel 3
Property connection.
In the present embodiment, the control panel 3 includes MCU control module and is electrically connected with MCU control module
First starting switch 31, the second starting switch 32 and the 3rd starting switch 33, first starting switch 31, described second start
Switch 32, the 3rd starting switch 33 respectively with described first it is negative inhale device, it is described second it is negative inhale device, it is described 3rd it is negative inhale
Device be electrically connected with, the control panel 3 also include respectively with first starting switch 31, second starting switch
32nd, the first timing display 34 of the 3rd starting switch 33 electric connection, the second timing display 35, the 3rd timing are shown
The drive cylinder on the drive cylinder and the second hand basket mechanism 72 point in device 36, the first hand basket mechanism 52
It is not electrically connected with first starting switch 31 and the 3rd starting switch 33, the control panel 3 is additionally provided with and institute
State the first ultrasonic switch 37 of the first ultrasonic instrument electric connection and be electrically connected with second ultrasonic instrument second
Ultrasonic switch 38, first ultrasonic switch 37 and second ultrasonic switch 38 are electrically connected with the MCU control module.
In the present embodiment, its job step includes：
A. place a wafer into the net cup 8, then will be equipped with the net cup 8 of chip and be put into the first hand basket mechanism 52,
Press first starting switch 31 and first ultrasonic switch 37, first ultrasonic instrument is started working and described the
One timing display 34 starts to show timing time, and first tank container 53 begins through first pipeline 55 to institute
State the first rinse bath 51 and flow into the NDK flower king's cleaning solvents for replacing acid flux material, the first hand basket mechanism 52 drives institute
State net cup 8 is spending first rinse bath 51 of king's cleaning solvent to move up and down full of the NDK, and chip can be in the net cup 8
It is interior to float, make wafer cleaning effect more preferably, the step a is at least cleaned 30 minutes；
B. the net cup 8 for completing step a is transferred to the spray decontaminating apparatus 6, presses second starting switch
32, second timing display 35 starts to show timing time, by the spraying mechanism 63 to the continuous shower of the net cup 8
Loaded on first pure water in the second liquid container, first pure water is below the μ of conductance 1.0 pure water, institute
State step b at least showers 30 minutes；
C. the net cup 8 for completing step b is transferred to the pure water washing device 7 of the ultrasonic wave, presses the described 3rd
Starting switch 33 and second ultrasonic switch 38, second ultrasonic instrument are started working and the 3rd timing display
36 start to show timing time, and the 3rd tank container begins through the 3rd pipeline 73 to second rinse bath 71
Flow into conductance 1.0 below μ second pure water, the second hand basket mechanism 72 drives the net cup 8 full of described the
Second rinse bath 71 of two pure water moves up and down, and chip can float in the net cup 8, makes wafer cleaning effect more preferably,
The step c is at least cleaned 30 minutes；
Above step carries out operation in the inner sealing of cleaning storehouse 2.
The utility model is applied to the technical field of wafer cleaning.
Although embodiment of the present utility model is described with practical solution, do not constitute and the utility model is contained
The limitation of justice, for those skilled in the art, the group according to this specification to the modification of its embodiment and with other schemes
Conjunction will be apparent from.
Claims (9)
1. a kind of wafer cleaning machine, it is characterised in that：It includes cleaning machine body（1）, the body（1）Inside it is provided with cleaning storehouse
（2）, the body（1）On be provided with control panel（3）, the body（1）On be provided with and the cleaning storehouse（2）It is adapted
Seal door（4）, the cleaning storehouse（2）Inside it is disposed with the equal and control panel（3）The ultrasonic wave NDK flower kings of electric connection
Cleaning device（5）, spray decontaminating apparatus（6）With the pure water washing device of ultrasonic wave（7）, the ultrasonic wave NDK flowers Wang Qingxi dresses
Put（5）, the spray decontaminating apparatus（6）With the pure water washing device of the ultrasonic wave（7）It is provided with several net cups（8）,
The net cup（8）Inside it is provided with chip.
2. wafer cleaning machine according to claim 1, it is characterised in that：The ultrasonic wave NDK spends king's cleaning device（5）Bag
Include the first rinse bath（51）, the first hand basket mechanism（52）, the first tank container（53）, the first ultrasonic instrument, first reclaim
Groove（54）, the first pipeline（55）King's cleaning solvent, first rinse bath are spent with NDK（51）It is installed on the cleaning storehouse（2）'s
One end, the first hand basket mechanism（52）With first rinse bath（51）It is adapted and is installed on first rinse bath（51）
It is interior, the first hand basket mechanism（52）Inside it is provided with several net cups（8）, first tank container（53）It is installed on
The body（1）One end and with first rinse bath（51）Pass through the first pipeline（55）It is connected, first ultrasonic wave
Instrument is installed on first rinse bath（51）Bottom, first accumulator tank（54）It is installed on first rinse bath（51）
Outside, and with first tank container（53）It is connected, first tank container（53）Built with NDK flowers
King's cleaning solvent, NDK flowers king's cleaning solvent passes through first pipeline（55）From first tank container（53）Stream
Enter first rinse bath（51）.
3. wafer cleaning machine according to claim 2, it is characterised in that：The spray decontaminating apparatus（6）Including being installed on
The cleaning storehouse（2）Mounting base on centre（61）Be installed on the body（1）One end on second liquid container,
The second liquid container is built with the first pure water, the mounting base（61）On be provided with several and the net cup（8）
The net bottle being adapted（62）, the mounting base（61）Two ends set be provided with several spraying mechanisms（63）, the spray
Spill mechanism（63）It is connected with the second liquid container by second pipe, the mounting base（61）Bottom set
There is discharging of waste liquid groove（64）.
4. wafer cleaning machine according to claim 3, it is characterised in that：The pure water washing device of ultrasonic wave（7）Bag
Include the second rinse bath（71）, the second hand basket mechanism（72）, the 3rd tank container, the second ultrasonic instrument, the 3rd pipeline（73）
With the second accumulator tank（74）, second rinse bath（71）It is installed on the cleaning storehouse（2）The other end, the second hand basket machine
Structure（72）With second rinse bath（71）It is adapted and is installed on second rinse bath（71）It is interior, the second hand basket mechanism
（72）Inside it is provided with several net cups（8）, the 3rd tank container and second rinse bath（71）By described
3rd pipeline（73）It is connected, the 3rd tank container is equipped with the second pure water, second pure water passes through the described 3rd pipe
Road（73）Second rinse bath is flowed into from the 3rd tank container（71）, second ultrasonic instrument is installed on described
Second rinse bath（71）Bottom, second accumulator tank（74）It is installed on the outside of second rinse bath, and described second
Accumulator tank（74）It is connected with the second liquid container.
5. wafer cleaning machine according to claim 4, it is characterised in that：The first hand basket mechanism（52）With described second
Hand basket mechanism（72）Include cleaning frame（9）, connecting rod（10）With with control panel（3）The drive cylinder of electric connection（11）, institute
State the first rinse bath（51）With second rinse bath（71）Inside it is provided with the cleaning frame（9）, the cleaning frame（9）It is upper equal
It is provided with several net cups（8）, the cleaning frame（9）Upper end both sides and the connecting rod（10）It is connected, the connecting rod
（10）It is connected with the drive cylinder, the drive cylinder is installed on the cleaning storehouse（2）Wall in.
6. a kind of wafer cleaning machine according to claim 3, it is characterised in that：The spraying mechanism（63）Including support
（631）And sprinkler head（632）, the support（631）Positioned at the mounting base（61）Two ends, the sprinkler head（632）Peace
Loaded on the support（631）Top, the sprinkler head（632）It is connected with the second pipe.
7. wafer cleaning machine according to claim 5, it is characterised in that：First tank container（53）With the first pipe
Road（55）Connection outlet at be provided with the first negative suction device, the connection outlet of the second liquid container and second pipe
It is provided with the second negative suction device, the 3rd tank container and the 3rd pipeline（73）Connection outlet at be provided with the 3rd it is negative suction
Device.
8. wafer cleaning machine according to claim 7, it is characterised in that：The first negative suction device, the second negative suction
Device, the described 3rd negative device of inhaling are suction pump, and the first negative suction device, the second negative suction device, the described 3rd
It is negative inhale device with the control panel（3）It is electrically connected with.
9. wafer cleaning machine according to claim 7, it is characterised in that：The control panel（3）Including MCU control module
With the first starting switch being electrically connected with MCU control module（31）, the second starting switch（32）With the 3rd starting switch
（33）, first starting switch（31）, second starting switch（32）, the 3rd starting switch（33）Respectively with it is described
The first negative device, the described second negative device, the described 3rd negative device of inhaling inhaled inhaled is electrically connected with, the control panel（3）Also include
Have respectively with first starting switch（31）, second starting switch（32）, the 3rd starting switch（33）Electrically connect
The first timing display connect（34）, the second timing display（35）, the 3rd timing display（36）, the first hand basket mechanism
（52）On the drive cylinder and the second hand basket mechanism（72）On the drive cylinder respectively with described first start
Switch（31）With the 3rd starting switch（33）It is electrically connected with, the control panel（3）It is additionally provided with and the described first ultrasound
The first ultrasonic switch that ripple instrument is electrically connected with（37）With the second ultrasonic switch being electrically connected with second ultrasonic instrument
（38）, first ultrasonic switch（37）With second ultrasonic switch（38）It is electrically connected with the MCU control module.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621277450.6U CN206535799U (en) | 2016-11-26 | 2016-11-26 | Wafer cleaning machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621277450.6U CN206535799U (en) | 2016-11-26 | 2016-11-26 | Wafer cleaning machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206535799U true CN206535799U (en) | 2017-10-03 |
Family
ID=59937206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621277450.6U Withdrawn - After Issue CN206535799U (en) | 2016-11-26 | 2016-11-26 | Wafer cleaning machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206535799U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106583302A (en) * | 2016-11-26 | 2017-04-26 | 珠海东精大电子科技有限公司 | Wafer cleaning machine and wafer cleaning method |
-
2016
- 2016-11-26 CN CN201621277450.6U patent/CN206535799U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106583302A (en) * | 2016-11-26 | 2017-04-26 | 珠海东精大电子科技有限公司 | Wafer cleaning machine and wafer cleaning method |
| CN106583302B (en) * | 2016-11-26 | 2022-12-06 | 珠海东精大电子科技有限公司 | Wafer cleaning machine and wafer cleaning method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20171003 Effective date of abandoning: 20221206 |
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| AV01 | Patent right actively abandoned |
Granted publication date: 20171003 Effective date of abandoning: 20221206 |