CN206399810U - A kind of blood analyser liquid fluid system flow chamber - Google Patents
A kind of blood analyser liquid fluid system flow chamber Download PDFInfo
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- CN206399810U CN206399810U CN201720067653.0U CN201720067653U CN206399810U CN 206399810 U CN206399810 U CN 206399810U CN 201720067653 U CN201720067653 U CN 201720067653U CN 206399810 U CN206399810 U CN 206399810U
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- polishing substrate
- polishing
- substrate
- flow chamber
- fluid system
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Abstract
The utility model discloses a kind of blood analyser liquid fluid system flow chamber, including the first polishing substrate and the second polishing substrate being arranged on the first polishing substrate, 3rd polishing substrate, second polishing substrate and the 3rd polishing substrate are provided with the 4th polishing substrate, first polishing substrate, second polishing substrate, provided with the gap hole for constituting flow chamber endoporus between 3rd polishing substrate and the 4th polishing substrate, after grinding and polishing second polishing substrate and the 3rd polishing substrate thickness and between reserve distance be respectively gap hole height and width, first polishing substrate, second polishing substrate, 3rd polishing substrate and the 4th polishing substrate bond together to form an entirety by high temperature, the two ends in gap hole are provided with circular reaming, provided with the transition tapered hole being connected with gap hole in circular reaming；The utility model is bonded together to form the flow chamber of an entirety by four polishing substrate high temperature, and process precision is controllable, and steady quality, precision are high after fusion, intensity is good, acid-proof alkaline is good.
Description
Technical field
The utility model is related to optics processing technique field, more particularly to a kind of flowing of blood analyser liquid fluid system
Room.
Background technology
Blood analyser is also known as automatic blood analyzer（Automated hematology analyzer AHA）, blood
Auto-counting of Cells instrument（Automated blood cell counter, ABCC）, it is the conventional inspection of modern clinic blood test
Instrument is surveyed, the analysis of whole blood cells and the detection of relevant item can be carried out.Blood analyser includes optical system, liquid stream system
System, automatic loading system, signal detection Transmission system and software analysis system etc..Core component in liquid fluid system is referred to as flowing
Room, when blood is flowed into flow chamber under certain pressure conditions, the laser that laser is sent vertically is worn from flow chamber penetrate after energy
Different colours are enough showed, the component content that blood can be distinguished using color judges dysemia situation to analyze.
Flow chamber is generally made up of silica glass material, and conventional was monoblock type flow chamber, flow chamber hole size in the past
Small, required precision is high, and its difficulty of processing is big, is easily deformed during processing, causes domestic many producers can not all mass-produce conjunction
The flow chamber of lattice, most flow chamber product is required for from external import.
The content of the invention
To overcome the deficiencies in the prior art, the utility model is there is provided a kind of precision is high, intensity is good, acid-proof alkaline is good
Blood analyser liquid fluid system flow chamber.
The utility model is to reach that the technical scheme that above-mentioned technical purpose is used is：A kind of blood analyser liquid fluid system
Flow chamber, including the first polishing substrate, the first polishing substrate is provided with two the second parallel polishing substrates, the 3rd polishings
Substrate, the second polishing substrate and the 3rd polishing substrate are thrown provided with the 4th polishing substrate, the first polishing substrate, second
Provided with the gap hole for constituting flow chamber endoporus between light substrate, the 3rd polishing substrate and the 4th polishing substrate, second polishing
The distance reserved between substrate and the 3rd polishing substrate is the width in gap hole, the second polishing substrate after grinding and polishing and
3rd polishing substrate thickness be gap hole height, it is described first polishing substrate, second polishing substrate, the 3rd polishing substrate and
4th polishing substrate is joined together to form an entirety by high temperature bonding, and the two ends in the gap hole are provided with circular reaming,
Provided with the transition tapered hole being connected with the gap hole in the circular reaming.
Each plane in the first polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate
Flatness error is less than λ/8, and wherein λ is 632.8nm；It is described first polishing substrate, second polishing substrate, the 3rd polishing substrate and
The parallelism error of opposite face is less than 0.0005mm in 4th polishing substrate；The first polishing substrate, the second polishing substrate, the
The error of perpendicularity of adjacent surface is less than 0.001mm in three polishing substrates and the 4th polishing substrate.
The gap hole size for constituting flow chamber endoporus is less than 0.2x0.2mm.
It is described first polishing substrate, second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate surface cut and
The quality requirement of pit is<20-10.
The beneficial effects of the utility model are：
1st, by using the first polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate high temperature key
The flow chamber for forming an entirety is closed, optical cement bonding and polishing grinding are processed flow chamber in batches by four substrates, processed
Cheng Jingdu is controllable, and steady quality, precision are high after fusion；
2nd, the first polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate are all slab construction, its
Precision is easily worked guarantee, is adapted to large quantities of steady productions；
3rd, by using the first polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate high-temperature molten
Conjunction uses bonding technology, and bonding technology passes through continuous Improvement, and the overall flow chamber precision of the formation after bonding fusion is high, strong
Spend, acid-proof alkaline it is good.
Brief description of the drawings
The utility model is described in further detail with reference to the accompanying drawings and examples.Wherein：
Fig. 1 is the end view of the utility model blood analyser liquid fluid system flow chamber；
Fig. 2 is the schematic cross-sectional view of the utility model blood analyser liquid fluid system flow chamber.
Embodiment
To describe technology contents of the present utility model, construction feature, the objects and the effects in detail, below in conjunction with implementation
Mode simultaneously coordinates accompanying drawing to describe in detail.
Refer to shown in Fig. 1 and Fig. 2, the utility model blood analyser liquid fluid system flow chamber includes the first polishing substrate
1, the first polishing substrate 1 is provided with two the second parallel polishing polishing substrates 3 of substrate the 2, the 3rd, the second polishing base
The polishing substrate 3 of piece 2 and the 3rd is thrown provided with the 4th polishing substrate 4, the first polishing substrate 1, second polishing substrate the 2, the 3rd
Provided with the gap hole 5 for constituting flow chamber endoporus between the polishing substrate 4 of light substrate 3 and the 4th, the second polishing substrate 2 and the 3rd
The second polishing substrate 2 and the 3rd after the width that the distance reserved between substrate 3 is gap hole 5, grinding and polishing is polished to throw
The thickness of light substrate 2 is the height in gap hole 5, the first polishing substrate 1, second polishing polishing substrate 3 of substrate the 2, the 3rd and
4th polishing substrate 4 is joined together to form an entirety by high temperature bonding, and the two ends in the gap hole 5 are provided with circular reaming
6, provided with the transition tapered hole 61 being connected with the gap hole 5 in the circular reaming 6.
Each put down in first polishing substrate 1, second polishing substrate the 2, the 3rd polishing polishing substrate 4 of substrate 3 and the 4th
The flatness error in face is less than λ/8, and wherein λ is 632.8nm；First polishing substrate 1, the second polishing substrate the 2, the 3rd is polished
The parallelism error of opposite face is less than 0.0005mm in the polishing substrate 4 of substrate 2 and the 4th；The first polishing substrate 1, second is thrown
The error of perpendicularity of adjacent surface is less than 0.001mm in the polishing polishing substrate 4 of substrate 3 and the 4th of light substrate the 2, the 3rd.
The size of gap hole 5 for constituting flow chamber endoporus is less than 0.2x0.2mm.
Stroke on the first polishing substrate 1, second polishing polishing polishing substrate 3 of substrate 3 and the 4th of substrate the 2, the 3rd surface
Trace and the quality requirement of pit are<20-10, its examination criteria refers to MILSTD MIL-PRF-13830B.
Embodiment of the present utility model is the foregoing is only, the scope of the claims of the present utility model is not thereby limited, it is every
The equivalent structure transformation made using the utility model specification and accompanying drawing content, or directly or indirectly it is used in other correlations
Technical field, is similarly included in scope of patent protection of the present utility model.
Claims (4)
1. a kind of blood analyser liquid fluid system flow chamber, it is characterised in that：Including the first polishing substrate, the first polishing base
Piece is polished on substrate provided with two the second parallel polishing substrates, the 3rd polishing substrates, the second polishing substrate and the 3rd
Provided with the 4th polishing substrate, between the first polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate
Provided with the gap hole for constituting flow chamber endoporus, the distance reserved between the second polishing substrate and the 3rd polishing substrate is gap
The thickness of the second polishing substrate and the 3rd polishing substrate after the width in hole, grinding and polishing is the height in gap hole, described
First polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate are bonded the shape that links together by high temperature
Into an entirety, the two ends in the gap hole are provided with circular reaming, are provided with what is be connected with the gap hole in the circular reaming
Transition tapered hole.
2. a kind of blood analyser liquid fluid system flow chamber according to claim 1, it is characterised in that：First polishing
The flatness error of each plane is less than λ/8 in substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate, its
Middle λ is 632.8nm；Opposite face in the first polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing substrate
Parallelism error be less than 0.0005mm；The first polishing substrate, the second polishing substrate, the 3rd polishing substrate and the 4th polishing
The error of perpendicularity of adjacent surface is less than 0.001mm in substrate.
3. a kind of blood analyser liquid fluid system flow chamber according to claim 1, it is characterised in that：Constitute in flow chamber
The gap hole size in hole is less than 0.2x0.2mm.
4. a kind of blood analyser liquid fluid system flow chamber according to claim 1, it is characterised in that：First polishing
Substrate, the second polishing substrate, the 3rd polishing substrate and the cut of the 4th polishing substrate surface and the quality requirement of pit are<20-
10。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720067653.0U CN206399810U (en) | 2017-01-18 | 2017-01-18 | A kind of blood analyser liquid fluid system flow chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720067653.0U CN206399810U (en) | 2017-01-18 | 2017-01-18 | A kind of blood analyser liquid fluid system flow chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206399810U true CN206399810U (en) | 2017-08-11 |
Family
ID=59519366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720067653.0U Expired - Fee Related CN206399810U (en) | 2017-01-18 | 2017-01-18 | A kind of blood analyser liquid fluid system flow chamber |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206399810U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108318429A (en) * | 2017-01-18 | 2018-07-24 | 福州荣德光电科技有限公司 | A kind of blood analyser liquid fluid system flow chamber |
| CN108318429B (en) * | 2017-01-18 | 2024-05-10 | 福建荣德光电科技有限公司 | Flow chamber of liquid flow system of blood analyzer |
-
2017
- 2017-01-18 CN CN201720067653.0U patent/CN206399810U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108318429A (en) * | 2017-01-18 | 2018-07-24 | 福州荣德光电科技有限公司 | A kind of blood analyser liquid fluid system flow chamber |
| CN108318429B (en) * | 2017-01-18 | 2024-05-10 | 福建荣德光电科技有限公司 | Flow chamber of liquid flow system of blood analyzer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170811 Termination date: 20190118 |