CN206348594U - It is used for the marking device that inner layer circuit board is aligned in a kind of direct-write photoetching system - Google Patents
It is used for the marking device that inner layer circuit board is aligned in a kind of direct-write photoetching system Download PDFInfo
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- CN206348594U CN206348594U CN201621485709.6U CN201621485709U CN206348594U CN 206348594 U CN206348594 U CN 206348594U CN 201621485709 U CN201621485709 U CN 201621485709U CN 206348594 U CN206348594 U CN 206348594U
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- circuit board
- layer circuit
- inner layer
- light source
- marking device
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201621485709.6U CN206348594U (en) | 2016-12-31 | 2016-12-31 | It is used for the marking device that inner layer circuit board is aligned in a kind of direct-write photoetching system |
Applications Claiming Priority (1)
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CN201621485709.6U CN206348594U (en) | 2016-12-31 | 2016-12-31 | It is used for the marking device that inner layer circuit board is aligned in a kind of direct-write photoetching system |
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CN206348594U true CN206348594U (en) | 2017-07-21 |
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CN201621485709.6U Active CN206348594U (en) | 2016-12-31 | 2016-12-31 | It is used for the marking device that inner layer circuit board is aligned in a kind of direct-write photoetching system |
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CN (1) | CN206348594U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020124406A1 (en) * | 2018-12-19 | 2020-06-25 | 江苏影速集成电路装备股份有限公司 | Alignment device, method and equipment for double-sided exposure |
CN112965340A (en) * | 2021-02-04 | 2021-06-15 | 电子科技大学 | Compact maskless photoetching system and exposure method thereof |
-
2016
- 2016-12-31 CN CN201621485709.6U patent/CN206348594U/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020124406A1 (en) * | 2018-12-19 | 2020-06-25 | 江苏影速集成电路装备股份有限公司 | Alignment device, method and equipment for double-sided exposure |
CN112965340A (en) * | 2021-02-04 | 2021-06-15 | 电子科技大学 | Compact maskless photoetching system and exposure method thereof |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Zhang Qi Inventor after: Li Xiangbin Inventor after: Fan Yunrui Inventor before: Zhang Qi Inventor before: Li Xiangbin Inventor before: Fan Yunrui |
|
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 230088 the 11 level of F3 two, two innovation industrial park, No. 2800, innovation Avenue, Hi-tech Zone, Hefei, Anhui. Patentee after: Hefei Xinqi microelectronics equipment Co., Ltd Address before: Two, H2 building, No. 2800, Wangjiang Industrial Park, 230088 Wangjiang West Road, hi tech Zone, Anhui, Hefei, 533 Patentee before: HEFEI XINQI MICROELECTRONIC EQUIPMENT CO., LTD. |