CN206345809U - A kind of purifying of chipal compounds waste liquid and chiral resolution device - Google Patents
A kind of purifying of chipal compounds waste liquid and chiral resolution device Download PDFInfo
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- CN206345809U CN206345809U CN201621146435.8U CN201621146435U CN206345809U CN 206345809 U CN206345809 U CN 206345809U CN 201621146435 U CN201621146435 U CN 201621146435U CN 206345809 U CN206345809 U CN 206345809U
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- chipal compounds
- purifying
- waste liquid
- chiral
- chiral resolution
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Abstract
The utility model, which belongs to, isolates and purifies engineering device technique field, it particularly relates to purifying and chiral resolution device to a kind of chipal compounds waste liquid.The integrated apparatus includes collection device and removes system, active clapboard A, impurity removal unit, metal ion removal system and chiral separation film layer with the solvent set gradually from the top down in reactor；The solvent, which removes system, includes distillation unit and temperature, pressure adjustment unit；The metal ion, which is removed, forms indwelling region between system and active clapboard B.Compared with prior art, the purifying of chipal compounds waste liquid described in the utility model and chiral resolution integrated apparatus can effectively remove all kinds of impurity, expeditiously isolate and purify and obtain chipal compounds, technique is simple, can heavy industrialization operation, applied to all kinds of chipal compounds liquid waste processings.
Description
Technical field
The utility model, which belongs to, isolates and purifies engineering device technique field, it particularly relates to arrive a kind of chipal compounds waste liquid
Purifying and chiral resolution device.
Background technology
Chirality is the phenomenon of nature generally existing, and natural and synthesis chipal compounds are a lot, such as amino acid, carbohydrate
Also all it is chiral molecules.Because optically active compound and its bioactivity and pharmaceutical activity are closely related, effective ways are studied
Optically active compound is separated and prepares to receive significant attention.Wherein, the chiral separation method of enantiomter is included, i.e., in hand
Property auxiliary agent in the presence of, by racemate resolution be pure enantiomer.The large-scale chiral resolution of industrialization of racemic modification is system
The key of standby chipal compounds.
UF membrane is a kind of novel energy-conserving technology developed in recent years, and enantiomter is split in continuity by chiral film
There is remarkable advantage with Energy Efficient aspect.It is easy to operate continuously because the fractionation of solid film has, is easy to amplification, device design with being
System applies the outstanding advantages such as flexible, energy consumption is low, capacity usage ratio is high, thus the emphasis direction as film chiral resolution.Chirality choosing
The Selective recognition affinity difference for selecting agent enantiomer is crucial, and conventional chiral selector includes：It is protein, antibiotic, many
Sugar, amino acid and super molecular compound (such as cyclodextrin, crown ether), this kind of material have the specificity that can be acted on enantiomer
Binding site (including enantiomer binding site, chiral ring or hole), enantiomer and binding site number and the difference of adhesion
It is different to cause the gap between raceme infiltration capacity and infiltration rate.
At present, the widely using in natural product extraction and pharmaceutical synthesis due to chipal compounds, it is also largely present
In the waste liquid of part chipal compounds preparing craft.Because the technique being related to is different, metal ion is there may be in waste liquid,
Foreign pigment, solid impurity etc..Directly the waste liquid is split by chiral film, impurity present in it will influence the choosing of UF membrane
Selecting property and flux, but combined by substep purification kinds of processes and add processing step and equipment again, Recycling of waste liquid separation is carried
Flat cost is higher, it is impossible to large-scale application.
The content of the invention
In order to solve the above technical problems, the utility model provides purifying and the chiral resolution of a kind of chipal compounds waste liquid
Device.
A kind of purifying of chipal compounds waste liquid described in the utility model and chiral resolution device, the integrated apparatus
Solvent including being set gradually from the top down in collection device 11 and reactor 4 removes system, active clapboard A, impurity and removes list
Member, metal ion remove system, active clapboard B and chiral separation film layer 9；The solvent remove system include distillation unit 2 and
Temperature, pressure adjustment unit 3；The metal ion, which is removed, forms indwelling region 10 between system and active clapboard；It is described to collect dress
11 are put to connect with the bottom of reactor 4.
A kind of purifying of chipal compounds waste liquid described in the utility model and chiral resolution device, the solvent remove system
Solvent in system is water or organic solvent.
A kind of purifying of chipal compounds waste liquid described in the utility model and chiral resolution device, the impurity remove single
Member includes filter layer 5 and adsorption layer 6 setting up and down, for removing foreign pigment and solid impurity.
A kind of purifying of chipal compounds waste liquid described in the utility model and chiral resolution device, the filter layer 5 is
Diatomite filter layer, the adsorption layer 6 is activated carbon adsorption layer.
A kind of purifying of chipal compounds waste liquid described in the utility model and chiral resolution device, the metal ion are gone
Except system is amberlite lipid layer 7.
A kind of purifying of chipal compounds waste liquid described in the utility model and chiral resolution device, the chiral separation film
Layer 9 is loaded with chiral recognition agent, and the chiral recognition agent is albumen, crown ether, polysaccharide or DNA.
A kind of purifying of chipal compounds waste liquid described in the utility model and chiral resolution device, the reactor 4 are pushed up
Provided with waste feedstock mouthful 1 on the left of portion, the indwelling region 10 is provided with reaction solution charging aperture 8 in left side.
Using when, for the waste liquid containing chipal compounds comprising a kind of chipal compounds, also comprising a small amount of moisture
Or the one or more in organic solvent, solid impurity, foreign pigment, metal ion.The waste liquid is passed through reactive tank, it is optional
Addition azeotropic solvent, temperature of reaction kettle and pressure are controlled by temperature and pressure adjustment unit, vacuum distillation or are azeotroped off
Moisture or solvent therein, it is to avoid itself and chipal compounds formation solvate, influence follow-up chiral separation effect, after processing
Reaction solution pass sequentially through foreign pigment and solid impurity removal unit and metal ion using Action of Gravity Field and remove system, according to
The content of impurity selects diatomite, activated carbon or amberlite in suitable filter layer, adsorption layer and amberlite lipid layer
The consumption of fat, also, the speed and separative efficiency that liquid passes through are controlled by the consumption, then, reaction solution enters indwelling region,
Be passed through chiral Recognition reagent, be identified reaction or inclusion form Inclusion Complexes, then, open seperation film before set every
Plate, makes reaction solution by seperation film, chiral recognition agent is further selected from：Albumen, crown ether, polysaccharide or DNA etc., its molecular dimension should be big
It in membrane aperture, can effectively be retained in seperation film, finally, collection device, chiral compound be entered by the solution of seperation film
The complex compound or inclusion compound of thing are then retained in indwelling region, through processing removing chiral recognition agent after taking-up, obtain optically pure
Chipal compounds.
Compared with prior art, the purifying of chipal compounds waste liquid described in the utility model and chiral resolution are integrally disguised
All kinds of impurity can effectively be removed by putting, and expeditiously isolated and purified and obtained chipal compounds, and technique is simple, can heavy industrialization behaviour
Make, applied to all kinds of chipal compounds liquid waste processings.
Brief description of the drawings
Fig. 1：Integrated apparatus schematic diagram described in the utility model；Charging aperture 1, distilling apparatus 2, adjustment unit 3, reaction
Kettle 4, filter layer 5, adsorption layer 6, amberlite lipid layer 7, chiral separation film 9, indwelling region 10, collection device 11.
Embodiment
The purifying to chipal compounds waste liquid described in the utility model and chiral resolution with reference to specific embodiment
Integrated apparatus is described further, but protection domain of the present utility model is not limited to this.
Embodiment 1
A kind of purifying of chipal compounds waste liquid and chiral resolution device, the integrated apparatus include the He of collection device 11
The solvent set gradually from the top down in reactor 4 removes system, active clapboard A, impurity removal unit, metal ion and removes system
System, active clapboard B and chiral separation film layer 9；The solvent, which removes system, includes distillation unit 2 and temperature, pressure adjustment unit 3；
The metal ion, which is removed, forms indwelling region 10 between system and active clapboard B；The collection device 11 and the bottom of reactor 4
Connection.Solvent in the solvent removal system is water or organic solvent.The impurity removal unit includes mistake setting up and down
Filtering layer 5 and adsorption layer 6, for removing foreign pigment and solid impurity.The filter layer 5 is diatomite filter layer, the absorption
Layer 6 is activated carbon adsorption layer.It is amberlite lipid layer 7 that the metal ion, which removes system,.The top left side of reactor 4 is provided with useless
Expect charging aperture 1, indwelling region 10 is provided with reaction solution charging aperture 8 in left side.Chiral separation film layer 9 is loaded with chiral recognition agent, should
Chiral recognition agent is albumen, crown ether, polysaccharide or DNA.
Using when, the waste liquid comprising chipal compounds enters reactor by charging aperture, passes through temperature and pressure regulation single
Temperature and pressure in member regulation kettle, distills out the moisture in reaction solution by distilling apparatus, filter layer top provided with activity every
Plate A, stops that reaction solution is directly entered filter layer, and question response liquid opens active clapboard A, the reaction solution after above-mentioned processing
First by filter layer, the effective filtering solid contaminants of diatomite therein, then by adsorption layer, wherein activated carbon is further adsorbed
Foreign pigment therein, then by amberlite lipid layer, removes the metal ion in reaction solution, and then, reaction solution enters
Indwelling region, the chiral Recognition reagent solution containing cyclodextrin, the solution and the medicine point in reaction solution are passed through by charging aperture
Sub- chlorthalidone selective complexation, increase be separated chipal compounds volume, reaction terminate after, open seperation film before activity every
Plate B, makes solution enter collection device by seperation film, and the seperation film is NF membrane or milipore filter, separated chipal compounds
Indwelling region is then retained in cyclodextrin-complex, through processing removing cyclodextrin after taking-up, the chiral compound after being split
Thing.The chiral recognition agent of other large volumes, such as albumen, crown ether, polysaccharide or DNA can also be selected as needed.
Compared with prior art, the purifying of chipal compounds waste liquid described in the utility model and chiral resolution are integrally disguised
All kinds of impurity can effectively be removed by putting, and expeditiously isolated and purified and obtained chipal compounds, and technique is simple, can heavy industrialization behaviour
Make, applied to all kinds of chipal compounds liquid waste processings.
Claims (7)
1. purifying and the chiral resolution device of a kind of chipal compounds waste liquid, it is characterised in that the chipal compounds waste liquid
The solvent that purifying and chiral resolution device include setting gradually from the top down in collection device (11) and reactor (4) removes system
System, active clapboard A, impurity removal unit, metal ion remove system, active clapboard B and chiral separation film layer (9)；It is described molten
Agent, which removes system, includes distillation unit (2) and temperature, pressure adjustment unit (3)；Metal ion is removed between system and active clapboard
Formed indwelling region (10)；Collection device (11) is connected with reactor (4) bottom.
2. purifying and the chiral resolution device of a kind of chipal compounds waste liquid according to claim 1, it is characterised in that institute
It is water or organic solvent to state the solvent in solvent removal system.
3. purifying and the chiral resolution device of a kind of chipal compounds waste liquid according to claim 2, it is characterised in that institute
Stating impurity removal unit includes filter layer (5) and adsorption layer (6) setting up and down, for removing foreign pigment and solid impurity.
4. purifying and the chiral resolution device of a kind of chipal compounds waste liquid according to claim 3, it is characterised in that institute
Filter layer (5) is stated for diatomite filter layer, the adsorption layer (6) is activated carbon adsorption layer.
5. purifying and the chiral resolution device of a kind of chipal compounds waste liquid according to claim 4, it is characterised in that institute
It is amberlite lipid layer (7) to state metal ion and remove system.
6. purifying and the chiral resolution device of a kind of chipal compounds waste liquid according to claim 5, it is characterised in that institute
State chiral separation film layer (9) and be loaded with chiral recognition agent, the chiral recognition agent is albumen, crown ether, polysaccharide or DNA.
7. purifying and the chiral resolution device of a kind of chipal compounds waste liquid according to claim 6, it is characterised in that institute
Reactor (4) top left side is stated provided with waste feedstock mouthful (1), the indwelling region (10) is provided with reaction solution charging aperture in left side
(8)。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621146435.8U CN206345809U (en) | 2016-10-21 | 2016-10-21 | A kind of purifying of chipal compounds waste liquid and chiral resolution device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621146435.8U CN206345809U (en) | 2016-10-21 | 2016-10-21 | A kind of purifying of chipal compounds waste liquid and chiral resolution device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206345809U true CN206345809U (en) | 2017-07-21 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621146435.8U Expired - Fee Related CN206345809U (en) | 2016-10-21 | 2016-10-21 | A kind of purifying of chipal compounds waste liquid and chiral resolution device |
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|---|---|
| CN (1) | CN206345809U (en) |
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2016
- 2016-10-21 CN CN201621146435.8U patent/CN206345809U/en not_active Expired - Fee Related
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170721 Termination date: 20181021 |