CN206293763U - A kind of optical mirror slip for carbon dioxide laser - Google Patents
A kind of optical mirror slip for carbon dioxide laser Download PDFInfo
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- CN206293763U CN206293763U CN201621444968.4U CN201621444968U CN206293763U CN 206293763 U CN206293763 U CN 206293763U CN 201621444968 U CN201621444968 U CN 201621444968U CN 206293763 U CN206293763 U CN 206293763U
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Abstract
The utility model discloses a kind of optical mirror slip for carbon dioxide laser, including lens substrate（1）With glasses lens plated layer（2）, lens substrate（1）It is made of zinc selenide, glasses lens plated layer（2）By the first filming layer for sequentially setting（21）, the second film plating layer（22）, the 3rd film plating layer（23）, the 4th film plating layer（24）Constitute, it is characterised in that：Described the first filming layer（21）It is made of fluorination ytterbium, the second film plating layer（22）Be made of zinc selenide, the 3rd film plating layer（23）Using fluorination ytterbium be made, the 4th film plating layer（24）It is made of zinc selenide.Optical mirror slip of the present utility model can realize the starting of oscillation and output of 9.3 mum wavelength laser, can carry out apparent marking to rapidoprint；The use of Coating Materials fluorination ytterbium can reduce the thickness of glasses lens plated layer, reduce the loss to laser, improve the electric light conversion ratio of laser.
Description
Technical field
The utility model is related to optical mirror slip field, and specifically one kind can export shorter wavelength laser, improve and swash
The definition of light mark simultaneously reduces the optical mirror slip for carbon dioxide laser of laser loss.
Background technology
Carbon dioxide laser output optical maser wavelength be to be determined by the outgoing mirror on laser, laser output mirror it is interior
Side is coated with optical film, and the laser of multi-wavelength, these laser can be produced in the starting stage laserresonator for opening laser
The optical film of capital directive laser output mirror, the optical film can have reflectivity higher to the laser of a certain specific wavelength,
Such as existing laser output mirror typically has reflectivity higher to 10.6 mum wavelength laser, in the starting stage meeting that laser is opened
The laser reflection of more 10.6 mum wavelengths is returned into laserresonator, according to 10.6 ripples that laser occurring principle understands to be reflected back
Laser long meeting exciting laser medium in resonator produces the laser of more 10.6 mum wavelengths, when the laser work(of 10.6 mum wavelengths
Rate is reached outside the optical film output cavity that laser beam can be broken through on laser output mirror when to a certain degree, realizes 10.6 mum wavelengths
The starting of oscillation and output of laser.Because the wavelength of 10.6 μm of laser is more long, mark occurs when for laser marking and laser engraving
Carve the shortcomings of the handwriting is blurred and laser loss is big.
The eyeglass of laser output mirror is constituted in the prior art：Including lens substrate and glasses lens plated layer, lens substrate is selenium
Change zinc（ZnSe）, thickness 4mm-5mm.Glasses lens plated layer one has four layers, is successively up by lens substrate：Ground floor yttrium fluoride
（YF3）, 18.9 μm -19.1 μm of thickness；Second layer zinc selenide（ZnSe）, 8.9 μm -9.1 μm of thickness；Third layer yttrium fluoride（YF3）,
18.9 μm -19.1 μm of thickness；4th layer of zinc selenide（ZnSe）, 8.9 μm -9.1 μm of thickness.
| Lens structure | Material | Thickness |
| 4th film plating layer | ZnSe | 8.9μm-9.1μm |
| 3rd film plating layer | 18.9μm-19.1μm | |
| Second film plating layer | ZnSe | 8.9μm-9.1μm |
| The first filming layer | 18.9μm-19.1μm | |
| Lens substrate | ZnSe | 4mm-5mm |
The content of the invention
The purpose of this utility model is directed to the problem of prior art presence, there is provided one kind can export shorter wavelength and swash
Light, the optical mirror slip for carbon dioxide laser for improving the definition of laser marking and reducing laser loss.
The purpose of this utility model is solved by the following technical programs：
A kind of optical mirror slip for carbon dioxide laser, including lens substrate and glasses lens plated layer, lens substrate are adopted
It is made of zinc selenide, glasses lens plated layer is by the first filming layer, the second film plating layer, the 3rd film plating layer, the 4th plated film that sequentially set
Layer is constituted, it is characterised in that：Described the first filming layer is made of fluorination ytterbium, and the second film plating layer is made of zinc selenide, the
Using fluorination, ytterbium is made three film plating layers, the 4th film plating layer is made of zinc selenide.
The thickness of the first filming layer is 16.9 μm -17.1 μm, the thickness of the second film plating layer is 8.9 μm -9.1 μm, the
The thickness of three film plating layers is 16.9 μm -17.1 μm, the thickness of the 4th film plating layer is 8.9 μm -9.1 μm so that the glasses lens plated layer
Gross thickness be 51.6 μm -52.4 μm.
The optical mirror slip that described glasses lens plated layer and lens substrate are constituted can output wavelength be 9.3 μm of laser.
The optical mirror slip that described glasses lens plated layer and lens substrate are constituted is 18%- to the laser transmittance of 9.3 μm of wavelength
20%。
The utility model has the following advantages compared to existing technology：
Optical mirror slip of the present utility model can output wavelength be 9.3 μm of laser, open after laser in laser generation
The starting stage laser that there is more multi-wavelength to be 9.3 μm resonator is reflected back by laser output mirror, make 9.3 μm to turn into dominant wave
Long, exciting laser medium produces the laser that more multi-wavelength is 9.3 μm, when the laser power of 9.3 mum wavelengths reaches to a certain degree,
Outside the optical film output cavity that laser beam is broken through on laser output mirror, the starting of oscillation and output of 9.3 mum wavelength laser are realized,
9.3 μm of laser have shorter wavelength compared with 10.6 μm of laser, can carry out apparent marking to rapidoprint.
The Coating Materials fluorination ytterbium yttrium fluoride more of the prior art that the utility model is used has density higher and more
Fine and close structure, can make the granularity of film surface smaller in plated film, and smoothness and the uniformity are higher, the film of more smooth even
Layer surface can reduce the scattering loss and absorption loss water of laser；Simultaneously as 51.6 μm -52.4 μm of the gross thickness of glasses lens plated layer
Than 55.6 μm -56.4 μm thin of glasses lens plated layer gross thickness of the prior art, thinner glasses lens plated layer can also be reduced to swashing
The absorption loss water of light, therefore use fluorination ytterbium can reduce the loss to laser as the laser of the optical mirror slip of Coating Materials,
Improve the electric light conversion ratio of laser.
Brief description of the drawings
Accompanying drawing 1 is optical lens structure schematic diagram of the present utility model；
Accompanying drawing 2 is the glasses lens plated layer close-up schematic view of optical mirror slip of the present utility model.
Wherein：1-lens substrate；2-glasses lens plated layer；21-the first filming layer；22-the second film plating layer；23-the three
Film plating layer；24-the four film plating layer.
Specific embodiment
The utility model is further described with embodiment below in conjunction with the accompanying drawings.
As shown in Figure 1-2：A kind of optical mirror slip for carbon dioxide laser, including lens substrate 1 and glasses lens plated
Layer 2, lens substrate 1 is made of zinc selenide, glasses lens plated layer 2 by sequentially set the first filming layer the 21, second film plating layer 22,
3rd film plating layer 23, the 4th film plating layer 24 are constituted, it is characterised in that：Described the first filming layer 21 is made of fluorination ytterbium, the
Two film plating layers 22 are made of zinc selenide, the 3rd film plating layer 23 is made of fluorination ytterbium, the 4th film plating layer 24 uses zinc selenide system
Into；Specifically, the thickness of the first filming layer 21 be 16.9 μm -17.1 μm, the thickness of the second film plating layer 22 be 8.9 μm of -9.1 μ
M, the thickness of the 3rd film plating layer 23 are 16.9 μm -17.1 μm, the thickness of the 4th film plating layer 24 is 8.9 μm -9.1 μm so that the mirror
The gross thickness of piece film plating layer 2 is 51.6 μm -52.4 μm.According to the optical frames that above-mentioned glasses lens plated layer 2 and lens substrate 1 are constituted
Piece can output wavelength be 9.3 μm of laser and be 18%-20% to the laser transmittance of 9.3 μm of wavelength, therefore the optical mirror slip is used
In after laser can output wavelength be 9.3 μm of laser.
| Lens structure | Material | Thickness |
| 4th film plating layer | ZnSe | 8.9μm-9.1μm |
| 3rd film plating layer | 16.9μm-17.1μm | |
| Second film plating layer | ZnSe | 8.9μm-9.1μm |
| The first filming layer | 16.9μm-17.1μm | |
| Lens substrate | ZnSe | 4mm-5mm |
Optical mirror slip of the present utility model is 18%-20%, saturating to 10.6 μm of laser of wavelength to 9.3 μm of laser transmittances of wavelength
Rate is crossed for 27%-33%, optical mirror slip of the prior art is 27%-33% to 9.3 μm of laser transmittances of wavelength, to 10.6 μm of wavelength
Laser transmittance is 18%-20%, therefore understands optical mirror slip of the present utility model to 9.3 μm of transmitances of laser of wavelength compared with wavelength
10.6 μm of laser are about low by 10%, i.e., reflectivity is about high by 10%.There is more multi-wavelength in the starting stage of laser generation after opening laser
Laser for 9.3 μm is reflected back resonator by laser output mirror, makes 9.3 μm to turn into advantage wavelength, and exciting laser medium is produced more
Multi-wavelength is 9.3 μm of laser, and when the laser power of 9.3 mum wavelengths reaches to a certain degree, laser beam breaks through laser output mirror
On optical film output cavity outside, realize the starting of oscillation and output of 9.3 mum wavelength laser, 9.3 μm of laser are compared with 10.6 μm of laser
There is shorter wavelength, apparent marking can be carried out to rapidoprint.
The Coating Materials fluorination ytterbium yttrium fluoride more of the prior art that the utility model is used has density higher and more
Fine and close structure, can make the granularity of film surface smaller in plated film, and smoothness and the uniformity are higher, the film of more smooth even
Layer surface can reduce the scattering loss and absorption loss water of laser；Simultaneously as 51.6 μm -52.4 μm of the gross thickness of glasses lens plated layer
Than 55.6 μm -56.4 μm thin of glasses lens plated layer gross thickness of the prior art, thinner glasses lens plated layer can also be reduced to swashing
The absorption loss water of light, therefore use fluorination ytterbium can reduce the loss to laser as the laser of the optical mirror slip of Coating Materials,
Improve the electric light conversion ratio of laser.
Above example is only explanation technological thought of the present utility model, it is impossible to limit protection model of the present utility model with this
Enclose, it is every according to the utility model proposes technological thought, any change done on the basis of technical scheme each falls within this reality
Within the scope of novel protected；The technology that the utility model is not directed to can be realized by prior art.
Claims (4)
1. a kind of optical mirror slip for carbon dioxide laser, including lens substrate（1）With glasses lens plated layer（2）, eyeglass base
Material（1）It is made of zinc selenide, glasses lens plated layer（2）By the first filming layer for sequentially setting（21）, the second film plating layer（22）,
Three film plating layers（23）, the 4th film plating layer（24）Constitute, it is characterised in that：Described the first filming layer（21）Using fluorination ytterbium system
Into the second film plating layer（22）Be made of zinc selenide, the 3rd film plating layer（23）Using fluorination ytterbium be made, the 4th film plating layer（24）Adopt
It is made of zinc selenide.
2. the optical mirror slip for carbon dioxide laser according to claim 1, it is characterised in that：The first filming
Layer（21）Thickness be 16.9 μm -17.1 μm, the second film plating layer（22）Thickness be 8.9 μm -9.1 μm, the 3rd film plating layer（23）
Thickness be 16.9 μm -17.1 μm, the 4th film plating layer（24）Thickness be 8.9 μm -9.1 μm so that the glasses lens plated layer（2）'s
Gross thickness is 51.6 μm -52.4 μm.
3. the optical mirror slip for carbon dioxide laser according to claim 1, it is characterised in that：Described eyeglass plating
Film layer（2）And lens substrate（1）The optical mirror slip of composition can output wavelength be 9.3 μm of laser.
4. the optical mirror slip for carbon dioxide laser according to claim 1 or 3, it is characterised in that：Described mirror
Piece film plating layer（2）And lens substrate（1）The optical mirror slip of composition is 18%-20% to the laser transmittance of 9.3 μm of wavelength.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621444968.4U CN206293763U (en) | 2016-12-27 | 2016-12-27 | A kind of optical mirror slip for carbon dioxide laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621444968.4U CN206293763U (en) | 2016-12-27 | 2016-12-27 | A kind of optical mirror slip for carbon dioxide laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206293763U true CN206293763U (en) | 2017-06-30 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201621444968.4U Active CN206293763U (en) | 2016-12-27 | 2016-12-27 | A kind of optical mirror slip for carbon dioxide laser |
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| Country | Link |
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| CN (1) | CN206293763U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110004408A (en) * | 2019-04-15 | 2019-07-12 | 南京波长光电科技股份有限公司 | A kind of CO resistant to high temperature2Laser anti-reflection film and preparation method thereof |
-
2016
- 2016-12-27 CN CN201621444968.4U patent/CN206293763U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110004408A (en) * | 2019-04-15 | 2019-07-12 | 南京波长光电科技股份有限公司 | A kind of CO resistant to high temperature2Laser anti-reflection film and preparation method thereof |
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