CN209016425U - A kind of optical mirror slip for carbon dioxide laser laser output mirror - Google Patents
A kind of optical mirror slip for carbon dioxide laser laser output mirror Download PDFInfo
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- CN209016425U CN209016425U CN201820792295.4U CN201820792295U CN209016425U CN 209016425 U CN209016425 U CN 209016425U CN 201820792295 U CN201820792295 U CN 201820792295U CN 209016425 U CN209016425 U CN 209016425U
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Abstract
The utility model discloses a kind of optical mirror slips for carbon dioxide laser laser output mirror, including using lens substrate (1) and glasses lens plated layer (2) made of zinc selenide, glasses lens plated layer (2) is by the first filming layer (21) that is set in sequence, second film plating layer (22), third film plating layer (23), 4th film plating layer (24) is constituted, the first filming layer (21) with a thickness of 5168nm ± 100nm, second film plating layer (22) with a thickness of 2801nm ± 100nm, third film plating layer (23) with a thickness of 5168nm ± 100nm, 4th film plating layer (24) with a thickness of 2801nm ± 100nm, so that the overall thickness of the glasses lens plated layer (2) is 15938nm ± 400nm.The optical mirror slip of the utility model can be realized the starting of oscillation and output of 10.2 mum wavelength laser, can carry out clearer marking to plastic material.
Description
Technical field
The utility model relates to optical mirror slip field, specifically one kind can export specific wavelength laser, improve and swash
The optical mirror slip for carbon dioxide laser laser output mirror of light mark clarity on covering material.
Background technique
Carbon dioxide laser output optical maser wavelength be to be determined by the outgoing mirror on laser, laser output mirror it is interior
Side is coated with optical film layer, opens the laser that multi-wavelength can be generated in the initial stage laser resonator of laser, these laser
The optical film layer of capital directive laser output mirror, the optical film layer can have higher reflectivity to the laser of a certain specific wavelength,
Such as existing laser output mirror generally has higher reflectivity to 10.6 mum wavelength laser, in the initial stage meeting that laser is opened
The laser reflection of more 10.6 mum wavelengths is returned into laser resonator, 10.6 waves being reflected back according to laser occurring principle
Long laser meeting excitation laser medium in resonant cavity generates the laser of more 10.6 mum wavelengths, when the laser function of 10.6 mum wavelengths
Laser beam can be broken through outside the optical film layer output cavity on laser output mirror when rate reaches a certain level, and realize 10.6 mum wavelengths
The starting of oscillation and output of laser.Since 10.6 μm of laser of wavelength is not easy to be absorbed by the material of plastic material, by 10.6 μm
When laser is used for the mark of covering material, just will appear coating layer blistering can not mark the case where, such as be covered with plastics to surface
When the carton mark of film, it is just unable to complete mark with 10.6 μm of laser, influences laser in the application in mark field.
Summary of the invention
The purpose of this utility model be in view of the problems of the existing technology, provide one kind can export 10.2 mum wavelengths swash
Light, the optical mirror slip for carbon dioxide laser laser output mirror for improving laser mark clarity on covering material.
The purpose of this utility model solves by the following technical programs:
A kind of optical mirror slip for carbon dioxide laser laser output mirror, including using eyeglass base made of zinc selenide
Material and glasses lens plated layer, glasses lens plated layer the first filming layer made of the use fluorination ytterbium being sequentially arranged on lens substrate,
It is plated using the second film plating layer made of zinc selenide, using third film plating layer made of fluorination ytterbium, using the made of zinc selenide the 4th
Film layer constitute, it is characterised in that: the first filming layer with a thickness of 5168nm ± 100nm, the second film plating layer with a thickness of
2801nm ± 100nm, third film plating layer with a thickness of 5168nm ± 100nm, the 4th film plating layer with a thickness of 2801nm ±
100nm, so that the overall thickness of the glasses lens plated layer is 15938nm ± 400nm.
The optical mirror slip that the glasses lens plated layer and lens substrate are constituted can output wavelength be 10.2 μm laser.
The laser transmittance ratio that the optical mirror slip that the glasses lens plated layer and lens substrate are constituted is 10.2 μm to wavelength should
Optical mirror slip to wavelength be 10.6 μm laser transmittance low 10% or more and than the optical mirror slip be 9.3 μm to wavelength laser
Transmitance low 3% or more.
The laser transmittance that the optical mirror slip that the glasses lens plated layer and lens substrate are constituted is 10.2 μm to wavelength is
15%±1%。
The laser transmittance that the optical mirror slip that the glasses lens plated layer and lens substrate are constituted is 10.6 μm to wavelength >=
26%±1%。
The laser transmittance that the optical mirror slip that the glasses lens plated layer and lens substrate are constituted is 9.3 μm to wavelength >=
19%。
Theoretically to why to limit, " optical mirror slip is 10.2 μm of laser transmittance than the optics to wavelength below
Eyeglass to wavelength be 10.6 μm laser transmittance low 10% or more and than the optical mirror slip be 9.3 μm to wavelength laser light
Low 3% or more " of rate is illustrated.
Carbon dioxide laser should be able to export the laser of four kinds of wavelength in theory, from the easier to the more advanced according to laser output
Sequence arrangement optical maser wavelength be 10.6 μm, 9.3 μm, 10.2 μm and 9.6 μm respectively, therefore the output wave in titanium dioxide laser
Long 10.2 μm of laser is technically than relatively difficult to achieve.
In order to guarantee that output wavelength that laser can be stable is 10.2 μm of laser, laser output mirror swashs different wave length
The transmitance of light must satisfy the following conditions: (1) eyeglass should be saturating to 10.2 μm of laser compared with it to 10.6 μm of laser transmittance
Cross that rate is big by 10% or more, such as when the transmitance of 10.2 μm of laser is 15%, the transmitance of 10.6 μm of laser will reach 25% with
On, it is otherwise possible to the bad problem of laser unicity occur during laser is run, that is, is mixed in the laser exported
The laser for having 10.2 μm and 10.6 μm, and the accounting meeting dynamic change of different wave length laser are closed, when will lead to mark in this way
And fuzzy quality problems when clear, because same material is constant to the absorptivity of some wavelength laser, if laser
The wavelength mark clarity that changes will change, so the unicity of optical maser wavelength is extremely important, in order to avoid the problem,
The transmitance difference of 10.2 μm of laser and 10.6 μm of laser has to be larger than 10% or more, can just guarantee to stablize 10.2 μ of output wavelength
M laser.(2) eyeglass should be big to 10.2 μm of laser transmittance by 3% or more compared with it to 9.3 μm of laser transmittance, such as when 10.2
When the transmitance of μm laser is 15%, the transmitance of 9.3 μm of laser will reach 18% or more, otherwise in the process of laser operation
In be possible to the bad problem of laser unicity occur, that is, the laser of 10.2 μm and 9.3 μm is mixed in the laser exported, and
And the accounting of different wave length laser can dynamic change, fuzzy quality problems when clear when will lead to mark in this way, because
Be for absorptivity of the same material to some wavelength laser it is constant, if optical maser wavelength changes, mark clarity will become
Change, so the unicity of optical maser wavelength is extremely important, in order to avoid the problem, the transmitance of 10.2 μm of laser and 9.3 μm of laser
Difference has to be larger than 3% or more, can just guarantee to stablize 10.2 μm of laser of output wavelength.In order to stable output wavelength
10.2 μm of laser should just meet above-mentioned two condition simultaneously, i.e. eyeglass should be compared with it to 10.2 μm to 10.6 μm of laser transmittance
Laser transmittance it is big by 10% or more, eyeglass to 9.3 μm of laser transmittance should compared with its to 10.2 μm of laser transmittance big 3% with
On.Because 9.6 μm of laser are more difficult to export than 10.2 μm, when designing 10.2 μm of laser output mirror pieces without the concern for
The transmitance of 9.6 μm of laser will be squeezed by the laser of other three kinds of wavelength in 9.6 μm of laser of laser starting of oscillation stage and eliminate,
It can not export.
The utility model has the following advantages compared with prior art:
The optical mirror slip of the utility model can output wavelength be 10.2 μm of laser, open after laser in laser generation
To have more multi-wavelength be that 10.2 μm of laser is reflected back resonant cavity by laser output mirror initial stage, make 10.2 μm to become dominant wave
Long, excitation laser medium generates the laser that more multi-wavelength is 10.2 μm, when the laser power of 10.2 mum wavelengths reaches a certain level
When, laser beam is broken through outside the optical film layer output cavity on laser output mirror, realizes the starting of oscillation of 10.2 mum wavelength laser and defeated
Out, 10.2 μm of laser can preferably be absorbed by plastic material compared with 10.6 μm of laser, can be carried out to the material of plastic material apparent
Marking, the material for being especially covered with plastic film to surface is able to achieve clearer mark.
The Coating Materials fluorination ytterbium yttrium fluoride more in the prior art that the utility model uses is with higher density and more
Fine and close structure, can make the granularity of film surface smaller, smoothness and the uniformity are higher, the film of more smooth even in plated film
Layer surface can be reduced the scattering loss and absorption loss water of laser；Simultaneously as overall thickness 15938nm ± 400nm of glasses lens plated layer
51.6 μm of glasses lens plated layer overall thickness than in the prior art are -52.4 μm thin, and thinner glasses lens plated layer can also be reduced to sharp
The absorption loss water of light, therefore the loss to laser can be reduced by using fluorination ytterbium as the laser of the optical mirror slip of Coating Materials,
Improve the electric light conversion ratio of laser.
Detailed description of the invention
Attached drawing 1 is the optical lens structure schematic diagram of the utility model；
Attached drawing 2 is the glasses lens plated layer partial enlargement diagram of the optical mirror slip of the utility model.
Wherein: 1-lens substrate；2-glasses lens plated layers；21-the first filming layers；22-the second film plating layer；23-thirds
Film plating layer；24-the four film plating layer.
Specific embodiment
The utility model is further described with embodiment with reference to the accompanying drawing.
It is as shown in Figs. 1-2: a kind of optical mirror slip for carbon dioxide laser laser output mirror, including use zinc selenide
Manufactured lens substrate 1 and glasses lens plated layer 2, glasses lens plated layer 2 use fluorination ytterbium system by being sequentially arranged on lens substrate 1
At the first filming layer 21, using the second film plating layer 22 made of zinc selenide, using fluorination ytterbium made of third film plating layer 23, adopt
The 4th film plating layer 24 made of zinc selenide is constituted, specifically, the first filming layer 21 with a thickness of 5168nm ± 100nm, the
Two film plating layers 22 with a thickness of 2801nm ± 100nm, third film plating layer 23 with a thickness of 5168nm ± 100nm, the 4th film plating layer
24 with a thickness of 2801nm ± 100nm so that the overall thickness of the glasses lens plated layer 2 be 15938nm ± 400nm.According to above-mentioned mirror
The optical mirror slip that piece film plating layer 2 and lens substrate 1 are constituted can output wavelength be 10.2 μm laser.And the glasses lens plated layer 2
The laser transmittance that the optical mirror slip constituted with lens substrate 1 is 10.2 μm to wavelength than the optical mirror slip is 10.6 μm to wavelength
Laser transmittance low 10% or more and than the optical mirror slip to wavelength be 9.3 μm laser transmittance it is low by 3% or more, wherein light
Learning eyeglass is 15% ± 1% to the laser transmittance that wavelength is 10.2 μm, the laser transmittance that optical mirror slip is 10.6 μm to wavelength
>=26% ± 1%, laser transmittance >=19% that optical mirror slip is 9.3 μm to wavelength.Therefore the optical mirror slip can after being used for laser
Output wavelength be 10.2 μm laser and be able to maintain unicity.
| Lens structure | Material | Thickness |
| 4th film plating layer | ZnSe | 2801nm±100nm |
| Third film plating layer | YbF3 | 5168nm±100nm |
| Second film plating layer | ZnSe | 2801nm±100nm |
| The first filming layer | YbF3 | 5168nm±100nm |
| Lens substrate | ZnSe | 4mm-5mm |
The optical mirror slip of the utility model is 15% ± 1% to 10.2 μm of laser transmittances of wavelength, to 10.6 μm of laser of wavelength
Transmitance >=26% ± 1% to 9.3 μm of laser transmittance >=19% of wavelength, therefore knows the optical mirror slip of the utility model to wavelength
For the transmitance of 10.2 μm of laser compared with 10.6 μm of laser of wavelength about low 10%, i.e. reflectivity is about high by 10%, while swashing to 10.2 μm of wavelength
For the transmitance of light compared with 9.3 μm of laser of wavelength about low 3%, i.e. reflectivity is about high by 3%.In the initial rank of laser generation after unlatching laser
Duan Yougeng multi-wavelength is that 10.2 μm of laser is reflected back resonant cavity by laser output mirror, makes 10.2 μm to become advantage wavelength, excitation
Laser medium generates the laser that more multi-wavelength is 10.2 μm, when the laser power of 10.2 mum wavelengths reaches a certain level, laser
Beam is broken through outside the optical film layer output cavity on laser output mirror, realizes the starting of oscillation and output of 10.2 mum wavelength laser, 10.2 μ
M laser is easier to be absorbed by plastic material compared with 10.6 μm of laser, can carry out clearer marking to plastic material.
The Coating Materials fluorination ytterbium yttrium fluoride more in the prior art that the utility model uses is with higher density and more
Fine and close structure, can make the granularity of film surface smaller, smoothness and the uniformity are higher, the film of more smooth even in plated film
Layer surface can be reduced the scattering loss and absorption loss water of laser；Simultaneously as overall thickness 15938nm ± 400nm of glasses lens plated layer
51.6 μm of glasses lens plated layer overall thickness than in the prior art are -52.4 μm thin, and thinner glasses lens plated layer can also be reduced to sharp
The absorption loss water of light, therefore the loss to laser can be reduced by using fluorination ytterbium as the laser of the optical mirror slip of Coating Materials,
Improve the electric light conversion ratio of laser.
Above embodiments are only to illustrate the technical idea of the utility model, and the protection model of the utility model cannot be limited with this
Enclose, it is all according to the utility model proposes technical idea, any changes made on the basis of the technical scheme each falls within this reality
Within the scope of novel protected；The technology that the utility model is not directed to can be realized by the prior art.
Claims (4)
1. a kind of optical mirror slip for carbon dioxide laser laser output mirror, including using lens substrate made of zinc selenide
(1) and glasses lens plated layer (2), glasses lens plated layer (2) be sequentially arranged on lens substrate (1) using made of fluorination ytterbium the
One film plating layer (21), using the second film plating layer (22) made of zinc selenide, using fluorination ytterbium made of third film plating layer (23), adopt
The 4th film plating layer (24) made of zinc selenide constitute, it is characterised in that: the first filming layer (21) with a thickness of 5168nm
± 100nm, the second film plating layer (22) with a thickness of 2801nm ± 100nm, third film plating layer (23) with a thickness of 5168nm ±
100nm, the 4th film plating layer (24) with a thickness of 2801nm ± 100nm so that the overall thickness of the glasses lens plated layer (2) is
15938nm±400nm；The optical mirror slip that the glasses lens plated layer (2) and lens substrate (1) are constituted can output wavelength be 10.2
μm laser；The laser light that the optical mirror slip that the glasses lens plated layer (2) and lens substrate (1) are constituted is 10.2 μm to wavelength
Rate than the optical mirror slip to wavelength be 10.6 μm laser transmittance it is low by 10% or more and be 9.3 μm to wavelength than the optical mirror slip
Laser transmittance low 3% or more.
2. the optical mirror slip according to claim 1 for carbon dioxide laser laser output mirror, it is characterised in that: institute
The optical mirror slip that the glasses lens plated layer (2) and lens substrate (1) stated are constituted to the laser transmittance that wavelength is 10.2 μm be 15% ±
1%。
3. the optical mirror slip according to claim 1 for carbon dioxide laser laser output mirror, it is characterised in that: institute
Laser transmittance >=26% that the optical mirror slip that the glasses lens plated layer (2) and lens substrate (1) stated are constituted is 10.6 μm to wavelength ±
1%。
4. the optical mirror slip according to claim 1 for carbon dioxide laser laser output mirror, it is characterised in that: institute
Laser transmittance >=19% that the optical mirror slip that the glasses lens plated layer (2) and lens substrate (1) stated are constituted is 9.3 μm to wavelength.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820792295.4U CN209016425U (en) | 2018-05-25 | 2018-05-25 | A kind of optical mirror slip for carbon dioxide laser laser output mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820792295.4U CN209016425U (en) | 2018-05-25 | 2018-05-25 | A kind of optical mirror slip for carbon dioxide laser laser output mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209016425U true CN209016425U (en) | 2019-06-21 |
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ID=66828506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820792295.4U Active CN209016425U (en) | 2018-05-25 | 2018-05-25 | A kind of optical mirror slip for carbon dioxide laser laser output mirror |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209016425U (en) |
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2018
- 2018-05-25 CN CN201820792295.4U patent/CN209016425U/en active Active
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