CN206293404U - A kind of ring-type electron gun - Google Patents
A kind of ring-type electron gun Download PDFInfo
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- CN206293404U CN206293404U CN201621436968.XU CN201621436968U CN206293404U CN 206293404 U CN206293404 U CN 206293404U CN 201621436968 U CN201621436968 U CN 201621436968U CN 206293404 U CN206293404 U CN 206293404U
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- ring
- electron gun
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- muzzle
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Abstract
The utility model is related to electron gun technical field, more particularly to a kind of ring-type electron gun, inner round wall including filament and annular, the muzzle of installation even number launching electronics symmetrical on the inner round wall of annular, each muzzle sets a single transmitter electron beam device, the electron beam of neutralization is sent by single transmitter electron beam device simultaneously from the muzzle outflow of even, symmetric arrangement, the multiple filaments used by multi-point transmitting electron beam device are connected in parallel or serial fashion.The utility model relates to the use of ring-type electron gun to ion beam more comprehensively, more perfect, more effectively neutralization, so as to improve the ion beam spot dimensional accuracy of repairing positional precision or ion implantation apparatus；Make repairing machine secondary electron imaging definition and the uniformity higher.
Description
Technical field
The utility model is related to electron gun technical field, more particularly to a kind of ring-type electron gun.
Background technology
Semiconductor integrated circuit manufacturing process comes into 14-16 nanometers of volume production stage, it is therefore desirable to more advanced photoetching
Technology carves thinner line width and more complicated pattern., it is necessary to use a kind of template to transfer figure in photoetching process
And duplication, this template is referred to as optical mask plate (also known as light shield, hereafter referred to collectively as mask plate).Mask plate is a tie connection
Chevron Research Company (CRC) and brilliant garden manufacture, cannot also realize maskless lithography in wafer current factory photoetching process, therefore mask plate is integrated
Extremely the key link in circuit manufacture.Thus the line width of demand mask plate is more and more thinner, and deviation requirement is also more and more higher, phase
Corresponding cost of manufacture more and more higher.
The main Making programme of mask substrate is to expose, develop, etching, removing photoresist, detecting, repairing etc., and it is right to be needed during making
The defect for detecting is repaired, and this requires very high-precision repairing machine.
The ACCURA850 repairing machines for using at present are to utilize gallium (GALLIUM) with positively charged state in ion chamber body
Focused in the range of certain beam spot size by eight grades of prisms, with the energy for specifying and track bombardment base in the presence of accelerating stage
Plate.But any electric charge cannot be carried before bombardment substrate, can otherwise be struck sparks because of charge accumulation in substrate surface, damage base
The figure of plate surface；Therefore, it is necessary to electron gun is launched during a certain amount of negatively charged electronics goes before cation gallium bombardment substrate
With cation gallium, make gallium with unnecessary chromium metal on atom form bombardment substrate or and before being suspended in the organic metal of substrate surface
Driving body molecules strike carries out energy exchange.
The electron gun and ion implantation apparatus that current ACCURA850 repairing machines are used all use same plane launching electronics
Electron gun.Some launching electronics of plane formula are used for dot line (spot beam)；Band is used in wafer injection device
During shape line (ribbon bean), implanter uses the electron gun of former and later two launching electronics on the same plane.
The electronic beam current that current electron gun 1 is emitted all is perpendicular to the flow direction of ion beam path.As shown in figure 1,
It can be seen that neutralization electronics and positively charged cylindric ion beam current 2 are unable to comprehensive engagement all the time, there is following defect：
1) near the ion of electronic beam current section, what is be neutralized is relatively complete, and neutralized away from the ion of electronic beam current section
Not enough fully, produce charge accumulation away from the cation easily of electronics outflow section and struck sparks on the surface of substrate 3；
2) control is difficult from the appropriate electronic amount of the outflow of electron gun 1 to neutralize cation completely；
3) energy that the electron institute of the outflow of electron gun 1 possesses is somewhat insignificant relative to the ion of kinetic energy, but
Influence whether the size of the exigent ion beam spot of craft precision or ion beam spot is deformed and is influenceed its movement locus, from
And influence repairing precision；
4) image of substrate 3 is imaged using secondary electron, because electronics flows to another side from 2 sections of one side of ion beam current, though
Required imaging region can be so covered, but concentration of the secondary electron in overlay area is not uniform enough, so image definition receives shadow
Ring.
Utility model content
The utility model provides a kind of ring-type electron gun, uniformly can sufficiently neutralize cation.
In order to realize the purpose of this utility model, the technical scheme for being used is：A kind of ring-type electron gun, including filament and
The inner round wall of annular, the symmetrical muzzle for installing even number launching electronics on the inner round wall of annular, each muzzle sets a list
Point launching electronics bundle device, the electron beam of neutralization has been sent by single transmitter electron beam device simultaneously from even, symmetric
The muzzle outflow of arrangement, the multiple filaments used by multi-point transmitting electron beam device are connected in parallel or serial fashion.
Used as prioritization scheme of the present utility model, even number muzzle is 4 or 6 or 8.
As prioritization scheme of the present utility model, ring-type electron gun of the ion beam path perpendicular to horizontal positioned.
As prioritization scheme of the present utility model, when multiple filaments are connected with parallel way, according to the quantity configuration of filament
The insulating ceramics part of corresponding anchored filament.
As prioritization scheme of the present utility model, when multiple filaments are connected in a series arrangement, annular insulating ceramics ring is set
Carry out anchored filament.
Used as prioritization scheme of the present utility model, the cavity of ring-type electron gun is seal cavity.
The utility model has positive effect：1) the utility model reforms original single point injection electronics for circular symmetric is more
The mode of point injection electronics, directly transforms simple and convenient in old equipment；This utility model can solve used equipment and set in itself
Meter defect is so as to improve craft precision.
2) cation line can be neutralized with perfection with this utility model circular symmetric multi-point injection electron gun, because each
The Electronic Control face of single-point electronics spout injection is reduced and is all directly contact, can be with precise control electrospray amount.For 14-
The injection of 16 nanoscale products, can effectively prevent from neutralizing not exclusively and causing potential to accumulate sparking.Multi-point injection electronics is reduced
Interference to cation line, therefore the uniformity of cation line is improved, to the big line of follow-up high request, the product of low energy
Product, great applying value in using electronics and in the equipment of cation line.
3) the utility model is more and more thinner in linewidth requirements, on the higher and higher repairing machine of required precision, what advantage embodied
It is more obvious.
4) the utility model makes electronics in each annular electro by improving the tightness of each independent ring-type electron gun cavity
Overflowed in sub- rifle cavity, allow the neutralization certain energy of electronic band to go to neutralize cation line rather than power-up potential, so may be used
To be reduced as far as neutralizing impact influence of the electronics on cation line, so as to improve the beam spot size precision of cation line
And positional precision.
Brief description of the drawings
The utility model is described in further detail with reference to the accompanying drawings and detailed description.
Fig. 1 is the electron gun schematic diagram of same plane launching electronics；
Fig. 2 is 4 filament schematic diagrames of the ring-type electron gun of muzzle；
Fig. 3 is the schematic diagram for carrying out anchored filament when multiple filaments are connected in a series arrangement using annular insulating ceramics ring；
Wherein：1st, electron gun, 2, ion beam current, 3, substrate.
Specific embodiment
As shown in figure 1, the utility model discloses a kind of ring-type electron gun, including filament and annular inner round wall, annular
Inner round wall on symmetrical installation even number launching electronics muzzle, each muzzle sets a single transmitter electron beam device,
The electron beam of neutralization has been sent by single transmitter electron beam device simultaneously from the muzzle outflow of even, symmetric arrangement, it is many
Multiple filaments used by point launching electronics bundle device are connected in parallel or serial fashion, wherein, multi-point transmitting electron beam device
It is made up of multiple single transmitter electron beam devices.
Even number muzzle is 4 or 6 or 8.Got one's things ready from 4,6 or 8 single transmitter electronics when neutralizing electron synchrotron
Middle transmitting is put, for being exported with electronics in isodose, influence of the utility model to ion beam current can be reduced to Min..
Single single transmitter electron beam device need to only cover the ion beam current part of 1/4 circular arc, uniformly can perfectly neutralize cation,
It is not on the high side on one side, the phenomenon of one side electronics on the low side, while ion beam spot will not be caused due to electron beam bombardment ion beam
And the change of movement locus；Due to equally distributed electron gun, the electronics of outflow will not be made due to the stop of cation line
Into the uneven of imaging region.
Ring-type electron gun of the ion beam path perpendicular to horizontal positioned.
When multiple filaments are connected with parallel way, according to the insulating ceramics part of the corresponding anchored filament of the quantity configuration of filament.
When multiple filaments are connected in a series arrangement, annular insulating ceramics ring is set and carrys out anchored filament.
Filament used by launching electronics can be provided with original power supply, and multiple filaments are connected in a series arrangement.
Filament used by launching electronics can be transformed and supplied using multiple independent current sources, and multiple filaments are connected with parallel way
Connect.
The invention also discloses a kind of application process of ring-type electron gun, the method can preferably neutralize cation
Line, under cation beam channel, the electronics of the low energy of muzzle outflow is used for neutralizing the direct horizontal setting of ring-type electron gun
Cation, to prevent from being struck sparks in substrate surface charge accumulation；Wherein, muzzle is 4 or 6 or 8.
Wherein, single transmitter electron beam device and casing insulation, and this single transmitter electron beam device is with negative potential and outward
Shell ground connection keeps an electrical potential difference, can take electronics out of.
Filament for ring-type electron gun is installed：It is divided to two kinds, a kind of filament series system, it is necessary to additional processing annular insulation
Ceramic ring fixes filament conducting rod, and filament is damaged with anti-loosening；Another filament parallel mode is, it is necessary to press filament number
The insulating ceramics part of the corresponding configuration anchored filament of amount.Each single transmitter electron beam device provides electricity by single corresponding filament
Support that amount of electrons needed for the cation beam cross section arc according to the covering of each electronics spout controls each corresponding power to launch in source
Go out corresponding electronics to meet neutralization cation, can with perfection neutralize cation in case substrate or crystal column surface potential accumulation beat
Fire.
Ring-type electron gun internal structure for series system is integral type；For parallel ring-type electron gun each
Electron emitting device is all freestanding.
The shell of ring-type electron gun, it is possible to use unified specification is used in series connection, in filaments connected in parallel structure.
The tightness of each independent ring-type electron gun cavity is improved, goes out electronics overflow in each ring-type electron gun cavity
Come, allow the neutralization certain energy of electronic band to go to neutralize cation line rather than power-up potential, in being so reduced as far as
Impact influence with electronics on cation line, so as to improve the beam spot size precision and positional precision of cation line.
Particular embodiments described above, has carried out entering one to the purpose of this utility model, technical scheme and beneficial effect
Step is described in detail, be should be understood that and be the foregoing is only specific embodiment of the utility model, is not limited to this
Utility model, all within spirit of the present utility model and principle, any modification, equivalent substitution and improvements done etc. all should be wrapped
It is contained within protection domain of the present utility model.
Claims (6)
1. a kind of ring-type electron gun, it is characterised in that：Inner round wall including filament and annular, it is symmetrical on the inner round wall of the annular
The muzzle of even number launching electronics is installed on ground, and each muzzle sets a single transmitter electron beam device, by single transmitter electronics
The electron beam for playing neutralization that bundle device sends simultaneously from the muzzle outflow of even, symmetric arrangement, get one's things ready by multi-point transmitting electronics
Multiple filaments used are put to connect in parallel or serial fashion.
2. a kind of ring-type electron gun according to claim 1, it is characterised in that：Even number muzzle is 4 or 6 or 8.
3. a kind of ring-type electron gun according to claim 2, it is characterised in that：Ion beam path is perpendicular to horizontal positioned
Ring-type electron gun.
4. a kind of ring-type electron gun according to claim 2, it is characterised in that：When multiple filaments are connected with parallel way,
According to the insulating ceramics part of the corresponding anchored filament of the quantity configuration of filament.
5. a kind of ring-type electron gun according to claim 2, it is characterised in that：When multiple filaments are connected in a series arrangement,
Annular insulating ceramics ring is set and carrys out anchored filament.
6. a kind of ring-type electron gun according to claim 2, it is characterised in that：The cavity of the ring-type electron gun is sealing
Cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621436968.XU CN206293404U (en) | 2016-12-26 | 2016-12-26 | A kind of ring-type electron gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621436968.XU CN206293404U (en) | 2016-12-26 | 2016-12-26 | A kind of ring-type electron gun |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206293404U true CN206293404U (en) | 2017-06-30 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201621436968.XU Active CN206293404U (en) | 2016-12-26 | 2016-12-26 | A kind of ring-type electron gun |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108242379A (en) * | 2016-12-26 | 2018-07-03 | 无锡中微掩模电子有限公司 | A kind of ring-type electron gun |
-
2016
- 2016-12-26 CN CN201621436968.XU patent/CN206293404U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108242379A (en) * | 2016-12-26 | 2018-07-03 | 无锡中微掩模电子有限公司 | A kind of ring-type electron gun |
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