CN206133061U

CN206133061U - Demultiplexer with waveguide lateral wall grating and inferior wavelength raster structure glitter

Info

Publication number: CN206133061U
Application number: CN201621194461.8U
Authority: CN
Inventors: 韩佳晖; 张艳; 梁家理
Original assignee: China Jiliang University
Current assignee: China Jiliang University
Priority date: 2016-11-02
Filing date: 2016-11-02
Publication date: 2017-04-26
Anticipated expiration: 2026-11-02

Abstract

The utility model provides a demultiplexer with waveguide lateral wall grating and inferior wavelength raster structure glitter, includes receiver waveguide array, inferior wavelength grating, the lateral wall grating that glitters, rowland circle, siO2 layer and si layer. The waveguide direction that receiver waveguide array glitters in the lateral wall grating on the rowland circle and with the input is tangent, inferior wavelength grating refracting index AR border with glitter the lateral wall grating parallel and be in the siO2 layer on, two sets of siO2 layers and si layer cover alternately, the si stratification is in below, the siO2 layer is in the superiors. The utility model discloses the diffraction light that can realize different wavelength is by the receiver intercepting, has the prospect very much to light interconnection and application among the coarse wavelength division multiplexing, has the advantage of size compactness, broadband operation and customization passband.

Description

A kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure

Technical field

The present invention relates to a kind of demultiplexer of optical grating construction, more particularly to it is a kind of have glitter waveguide sidewalls grating and The demultiplexer of sub-wavelength grate structure.

Background technology

In spectrum and sensory field, ripple is had been used to based on the wavelength demultiplexer of array waveguide grating and echelle grating The communication network of point multiplexing, the high refractive index contrast of silicon-on-insulator (SOI) platform allows the waveguide of submicron-scale and little To several microns of waveguide bend-radius, so as to significantly reduce the size of device.So far, it has been reported that using SOI ripples The several array waveguide gratings closely led, but array waveguide grating demultiplexer closely also has due to ripple Scattering loss and phase error that sidewall roughness causes are led, the two can all limit crosstalk performance, because Phase delay occurs In planar waveguide, and will not occur in waveguide array, that is to say, that the demultiplexer based on slab guide intermediate raster can Avoid subproblem.

A kind of important light-splitting device of diffraction grating is new in imaging, information processing, metering, integrated optics and optic communication etc. Emerging field is increasingly employed, and when the wire casing section of grating ruling toothing, the light energy of grating is just concentrated on On predetermined direction, i.e., balzed grating, one-level is spectrally.From this orientation detection when, the maximum intensity of spectrum is greatly carried High grating diffration efficiency.

Several demultiplexer devices based on waveguide scala media grating are recently also in silicon and silicon dioxide layer and SOI waveguides Manufacture, the significant challenge for manufacturing echelle grating demultiplexer is to make smooth vertical grating face, control polarization dependent wavelength drift Move, and reduce Polarization Dependent Loss, these problems successfully overcome in the echelle grating device based on glass waveguide, but It is not fully solved in the device based on SOI.

Because SOI has extremely low loss so that the fiber waveguide device based on SOI is developed rapidly. For common fiber waveguide, light can be propagated along the high sandwich layer of refractive index.But, with fiber waveguide answering in integration module With, waveguide dimensions are less and less, in the middle of waveguide man-ufacturing processes, the caused coarse damage that can greatly increase waveguide of etching Consumption.The appearance of sub-wave length grating waveguide reduces the coarse impact to waveguide loss of etching, while be also provided to one kind can With the waveguiding structure of custom materials refractive index.

The content of the invention

In order to solve the deficiencies in the prior art, this utility model provides a kind of with glitter waveguide sidewalls grating and sub-wavelength The demultiplexer of optical grating construction, the demultiplexer can realize the intercepting of different wave length, in light network and CWDM Application be it is especially promising, with compact dimensions, broadband operation and customization passband advantage.

This utility model solve the technical scheme that adopted of technical problem for：

A kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure, including receptor waveguide array (1), sub-wave length grating (7), side wall grating (3) of glittering, Rowland circle (4), SiO₂Layer (5) and Si layers (6), wherein receptor waveguide Array (1) radius for R Rowland circle (4) on and, sub-wavelength light tangent with the wave guide direction that input is glittered in side wall grating (3) Grid refractive index AR border (2) is parallel with side wall grating (3) of glittering, two groups of SiO₂Layer (5) and Si layers (6) interaction are covered, Si layers (6) It is placed in bottom, SiO₂Layer (5) is placed in the top, and glitter side wall grating (3) and sub-wave length grating (7) are in the top.

Described side wall grating (3) of glittering is formed by the silicon waveguide for bending and is able to provide focusing, is with demultiplexer center Centered on wavelength focus, radius is the arc of 2R.

Described demultiplexer device area occupied is 140 μm of 90 μ m and device wavelength spacing is 25nm, and totally 15 lead to Road, the operating bandwidth for having 375nm.

Described sub-wave length grating (7) using lance tooth sub-wave length grating refractive index AR border (2).

The beneficial effects of the utility model：The border being placed between the groove of silicon waveguide sections and plate like region for being adopted The Fresnel reflection rate on the sub-wave length grating refractive index AR border (2) of the triangular tooth at place is reduced, the sub-wavelength property quilt of grating Suppress.Compared with monolayer AR coatings, sub-wave length grating refractive index AR border (2) production is more prone to, and also provides bigger light Bands of a spectrum width.Moreover, designed multiplexer can also expand to intensive multiplexed optical wave by increasing the radius of Rowland circle (4) With the application in field, so that producing bigger channel spacing on focal plane, different from echelle grating, this equipment allows logical The modification of spacing and grating apodization is crossed so as to change the phase place and intensity of derivative field, additionally, another advantage of design is need not Waveguide phased array, it means that the obvious advantage of less device size compared with AWG, because light is passed in single waveguide Broadcast, therefore reduce the impact of caused total losses and phase error accumulation effect due to waveguide imperfection.

Description of the drawings

Below in conjunction with the accompanying drawings and concrete mode the invention will be further described.

Fig. 1 is a kind of balzed grating, waveguide sidewalls of this utility model and sub-wavelength grate structure demultiplexer structural representation Figure.

Fig. 2 be a kind of balzed grating, waveguide sidewalls of this utility model and sub-wavelength grate structure demultiplexer grating side wall with Sub-wave length grating schematic diagram.

In figure, 1 is receiver array waveguide；2 is sub-wave length grating refractive index AR border；3 is balzed grating, side wall；4 are Rowland circle；5 is SiO₂Layer；6 is Si layers；7 is sub-wave length grating.

Specific embodiment

In Fig. 1, a kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure includes receptor ripple Lead array 1, sub-wave length grating refractive index AR border 2, glitter side wall grating 3, Rowland circle 4, SiO₂Layer 5, Si layers 6 and sub-wavelength light Grid 7.Receptor waveguide array 1 is on Rowland circle 4 and, sub-wavelength light tangent with the wave guide direction that input is glittered in side wall grating 3 Grid refractive index AR border 2 is almost parallel with the side wall grating 3 that glitters, and the described side wall grating 3 that glitters is formed by the silicon waveguide for bending It is able to provide focusing, is that centered on demultiplexer centre wavelength focus, radius is the arc of 2R.

In Fig. 2, in a kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure of this utility model The three-dimensional cross-section of sub-wave length grating 7 and the side wall grating 3 that glitters, wherein sub-wave length grating refractive index AR border 2 and the side wall that glitters Grating 3 is parallel, two groups of SiO₂The layer interaction of 5 and Si layer 6 is covered, and Si layers 6 are placed in bottom, SiO₂Layer 5 brings to Front, and glitter side wall Grating 3 and sub-wave length grating 7 are in the top.

Claims

1. a kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure, it is characterised in that including reception Device waveguide array, sub-wave length grating, glitter side wall grating, Rowland circle, SiO₂Layer and Si layers, wherein receptor waveguide array are half Footpath be it is on the Rowland circle of R and tangent with the wave guide direction glittered in the wall grating of side of input, sub-wave length grating refractive index AR border with Glitter side wall parallel gratings, two groups of SiO₂Layer and the interaction of Si layers are covered, and Si is placed on bottom, SiO₂Layer in the superiors, side of glittering Wall grating and sub-wave length grating are in the top.

2. a kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure according to claim 1, It is characterized in that：The described side wall grating that glitters is formed by the silicon waveguide for bending and is able to provide focusing, is with demultiplexer center Centered on wavelength focus, radius is the arc of 2R.

3. a kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure according to claim 1, It is characterized in that：It is 25nm that described demultiplexer device area occupied is 140 μm of 90 μ m and device wavelength spacing, totally 15 Passage, the operating bandwidth for having 375nm.

4. a kind of demultiplexer with glitter waveguide sidewalls grating and sub-wavelength grate structure according to claim 1, It is characterized in that：Described sub-wave length grating adopts lance tooth.