CN104570200B - Utilize the improved silica base Arrayed Waveguide Grating device of silica-based waveguides and preparation - Google Patents
Utilize the improved silica base Arrayed Waveguide Grating device of silica-based waveguides and preparation Download PDFInfo
- Publication number
- CN104570200B CN104570200B CN201410795629.XA CN201410795629A CN104570200B CN 104570200 B CN104570200 B CN 104570200B CN 201410795629 A CN201410795629 A CN 201410795629A CN 104570200 B CN104570200 B CN 104570200B
- Authority
- CN
- China
- Prior art keywords
- silica
- waveguide
- input
- based waveguides
- array
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
- G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
A kind of improved silica base array waveguide grating and making, Waveguide array including inputting with output waveguide, planar waveguide and existing adjacent lengths difference, input and output waveguide using the second coupler connect silica-based waveguide part and silica-based waveguides part, wherein using the first coupler be connected with titanium dioxide silicon substrate planar waveguide Rowland circle for input or output waveguide silica-based waveguides part；The second coupler connected for silica-based waveguides and silica-based waveguide, input or output waveguide positioned at silica-based waveguides are after being drifted apart from enough distances.The channel spacing of silicon based array waveguide optical grating is directly proportional to the spacing of input or output waveguide.The crosstalk for avoid coupling between input or output waveguide as far as possible caused by, needs to keep distance decoupling enough between input or output waveguide.The input of silica base array waveguide grating or output waveguide are replaced with silica-based waveguides to reduce its channel spacing.Present invention process is ripe, simple to operate, low cost and other advantages.
Description
Technical field
The invention belongs to the wavelength-division multiplex field in fiber optic communication, it is related to titanium dioxide silicon substrate and silica-based waveguides, and in particular to
The device and preparation method for the silica base array waveguide grating that a kind of utilization silica-based waveguides are improved.
Background technology
In modern optical communication systems, people are growing day by day for the requirement of the rate of information throughput and device integration.Battle array
Train wave guide grating is typical integrated-type dense wave division multiplexer part, by input and output waveguide, planar waveguide and Waveguide array
Combine.It can make the transmission admixed together of multiple wavelength lights, can separate, greatly improve by wavelength after reaching home
The transmission capacity of optical fiber and it is easily integrated [1,2].Silica base array waveguide grating is right after the development of experience long period
The optimization of various aspects of performance has all developed very ripe [3-6], and its processing technology is compatible with traditional cmos process, experience
It is abundant.But be due to the input of silica base or output waveguide spacing need it is larger with crosstalk caused by avoiding coupling between waveguide.
And the channel spacing of array waveguide grating is directly proportional to input or output waveguide spacing, therefore silica base array waveguide grating
Channel spacing it is generally large, 200GHz, 100GHz etc. [7,8], i.e. wavelength point are common are under general technology and technical conditions
Resolution is poor.If reaching smaller resolution ratio, generally require and significantly increase the size of array waveguide grating, its cost
Corresponding to improve, this is unacceptable in many applications.Its size, this hair are not increased simultaneously to improve wavelength resolution performance
Bright utilization silica-based waveguides are improved to silica base array waveguide grating.Input or output waveguide are replaced with into silica-based waveguides
Waveguide spacing can greatly be reduced, so as to reduce channel spacing, wavelength resolution is improved.Replace with the input or output of silica-based waveguides
Waveguide is drifted apart from replacing back silica-based waveguide again after distance enough ensureing that the array waveguide grating after improving remains to use
In former application scenario.The invention can ensure that making full use of the performance of existing ripe silica base array waveguide grating to optimize
While technology and manufacturing technique method, its wavelength resolution performance is improved in relatively simple, conveniently, inexpensive method.
Prior art literature is referring to as follows：
[1]Smit,M.K.New focusing and dispersive planar component based on an
optical phased array.Electron.Lett.1988.24:385-386.
[2]Takahashi,H.S.Suzuki,K.Kato and I.Nishi.Arrayed-waveguide grating
for wavelength division multi/demultiplexer with nanometer
resolution.Electron.Lett.1990.26:87-88.
[3]Uetsuka,H.,K.Akiba,H.Okano and Y.Kurosawa.Nove 1×N guide-wave
multi/demultiplexer for WDM.Proc.OFC’95 Tu07,p.276.
[4]Osamu Ishida,Hiroshi Takahashi.1995.Loss-Imbalance Equalization in
Arrayed-Waveguide-Grating(AWG)Multiplexer Cascades.Journal of Lightwave
Technology.June 1995.Vol.13,No.6,pp.1155-1163.
[5]Okamoto K.and A.Sugita.Flat spectral response arrayed-waveguide
grating multiplexer with parabolic waveguide horns.Electron.Lett.1996.32:
1661–1662.
[6]Y.Inoue,A.Kaneko,F.Hanawa,H.Takahashi,K.Hattori and
S.Sumida.Athermal silica-based arrayed-waveguide grating
multiplexer.Electron.Lett.6th November 1997.Vol.33,No.23,pp.1945-1947.
[7]LI Jian,AN Jun-ming,WANG Hong-jie,HU Xiong-wei.Silica based 16×
0.8nm arrayed waveguide grating multiplexer design,fabrication and
testing.Optical Technique.May 2005.Vol.31,No.3,pp.349-353.
[8]OU Hai-yan,LEI Hong-bing,YANG Qin-qing,YU Jin-zhong and WANG Qi-
ming.Simple Method for Designing 1×8 Arrayed-Waveguide Grating Multi/
Demultiplexers.Chinese Journal of Semiconductors.Aug 2000.Vol.21,No.8,pp.798-
802.
The content of the invention
The purpose of the present invention is, in order to solve the problem of silica base array waveguide grating wavelength resolution is poor, to carry
The device and preparation method of the improved silica base array waveguide grating of a kind of utilization silica-based waveguides gone out.
Technical scheme is for example following：
(1) a kind of improved silica base array waveguide grating, it is characterized in that including input and output waveguide, flat board ripple
Lead and exist the Waveguide array of adjacent lengths difference, the silica that input and output waveguide are connected using the second coupler
Based waveguides part and silica-based waveguides part, wherein using the first coupler with titanium dioxide silicon substrate planar waveguide Rowland circle is connected is
Input or the silica-based waveguides part of output waveguide；The second coupler connected for silica-based waveguides and silica-based waveguide, position
After the input of silica-based waveguides or output waveguide are drifted apart from enough distances.
For by between input or output waveguide strap Lai crosstalk try one's best suppression, input or output waveguide spacing need to protect
Hold sufficiently large.The decoupling distance of silica-based waveguides can as little as several microns, and the decoupling distance of silica-based waveguide is usually
More than ten microns even tens microns.The input of silica base array waveguide grating or output waveguide are replaced with from the above
After silica-based waveguides, wavelength resolution performance will be greatly improved.
After the distance between the silica-based waveguides part of input or output waveguide separates distance decoupling to SiO 2 waveguide,
Follow-up silica-based waveguide part is connected using above-mentioned second coupler, to keep silica base array waveguide grating
Former applicable situation.
Silica-based waveguides in the present invention refer to the siliceous waveguide of material component, and are not limited to the waveguide that sandwich layer is pure silicon.It is
High index waveguide or " siliceous waveguide ".
(2) a kind of improved silica base array waveguide grating described in (1), wherein for coupling input or exporting
Second coupler of the respective silicon substrate of waveguide and silica-based waveguide part uses following structure：The cross section of silica-based waveguides by
Decrescence small, the part that silica-based waveguides cross section is gradually reduced is doped the higher folding of at least one of the elements such as germanium, nitrogen, boron or phosphorus
The covering of rate silica is penetrated, covering is outer to be covered compared with low refractive index silica, the core of the silica-based waveguide subsequently connected
Layer size it is consistent with the high index silica cross sectional dimensions of above-mentioned silica-based waveguides outer covering, refractive index unanimously or phase
Closely.
(3) after silica-based waveguides cross section is gradually reduced to a certain extent (such as width is less than 100 nanometers), light field will largely divide
Cloth is in the silica that outer layer adulterates, and mould field size increase, effective refractive index reduces, thus with the silica that is subsequently connected
The sandwich layer matching of based waveguides, realizes coupling.
(4) the improved silica base array waveguide grating described in (1), comprising conveying type array waveguide grating and instead
Penetrate formula array waveguide grating.
(5) the improved silica base array waveguide grating described in (1), includes the Waveguide array of single input waveguide
The array waveguide grating of grating and multiple input waveguides.
(6) the improved silica base array waveguide grating described in (1), wherein silica-based waveguides sandwich layer include silicon, nitrogen
At least one of materials such as SiClx, silicon oxynitride.
(7) a kind of method for making improved silica base array waveguide grating, it is characterized in that：Make titanium dioxide silicon substrate
Planar waveguide, silica base Waveguide array, the silica-based waveguide part and silica-based waveguides part of input and output waveguide,
Make the second coupler for coupling input or the respective silicon substrate of output waveguide and silica-based waveguide part and for coupling
Close the first coupler of the silica-based waveguides part of titanium dioxide silicon substrate planar waveguide and input or output waveguide；Wherein the second coupler
Middle silica-based waveguides cross section is gradually reduced the high index two that part is doped at least one of the elements such as germanium, nitrogen, boron or phosphorus
Silica is covered, and covering is outer to be covered compared with low refractive index silica, the sandwich layer size of the silica-based waveguide subsequently connected
Consistent with the high index silica cross sectional dimensions of above-mentioned silica-based waveguides outer covering, refractive index is consistent or close.
(8) method of the improved silica base array waveguide grating of making described in (7), wherein titanium dioxide silicon substrate is put down
Board waveguide, silica base Waveguide array, the silica-based waveguide part of input and output waveguide are first machined；Then plus
Work completes input with the silica-based waveguides part of output waveguide, for coupling input or the respective silicon substrate of output waveguide and silica
Second coupler of based waveguides part and the silica-based waveguides for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
The first partial coupler.
(9) method of the improved silica base array waveguide grating of making described in (7), input and output waveguide
Silica-based waveguides part, the second coupler for coupling input or the respective silicon substrate of output waveguide and silica-based waveguide part
Add simultaneously with the first coupler of the silica-based waveguides part for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
Work is completed.Such as a kind of Method Of Accomplishment is：Deposit thin films of silicon completes the device surface of silica-based waveguide part first；
Then determine input with the silica-based waveguides part of output waveguide, for coupling with same step photoetching or same step electron beam exposure
Second coupler of input or the respective silicon substrate of output waveguide and silica-based waveguide part and for coupling titanium dioxide silicon substrate
The substantially planar pattern of first coupler of the silica-based waveguides part of planar waveguide and input or output waveguide；And then complete simultaneously
Etching input is with the silica-based waveguides part of output waveguide, for coupling input or the respective silicon substrate of output waveguide and titanium dioxide silicon substrate
Second coupler of waveguides sections and the silica-based waveguides portion for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
The first coupler divided.
(10) method of the improved silica base array waveguide grating of making described in (7), wherein input and output
The silica-based waveguides part of waveguide, second for coupling input or the respective silicon substrate of output waveguide and silica-based waveguide part
Coupler and for the first coupler of the silica-based waveguides part for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
First machine；Then titanium dioxide silicon substrate planar waveguide, silica base Waveguide array, input and output waveguide are machined
Silica-based waveguide part.Such as a kind of Method Of Accomplishment is：First silica-based waveguides are processed in a silicon-on-insulator substrate
Input is with the silica-based waveguides part of output waveguide, for coupling input or the respective silicon substrate of output waveguide and silica-based waveguide
Partial the second coupler and the silica-based waveguides part for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
First coupler.Described in a kind of processing method same (9), but because of the most upper existing monocrystalline silicon layer of silicon-on-insulator substrate, without heavy
Product silicon thin film.It is then followed by processing silica-based waveguide part.
Wherein input is with the silica-based waveguides part of output waveguide, for coupling input or the respective silicon substrate of output waveguide and two
Aoxidize the second coupler of silica-based waveguides part and the silicon for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
First coupler of based waveguides part is first machined；Then titanium dioxide silicon substrate planar waveguide, silica basic matrix are machined
Train wave leads, input and output waveguide silica-based waveguide part.
Input is with the silica-based waveguides part of output waveguide, for coupling input or the respective silicon substrate of output waveguide and titanium dioxide
Second coupler of silica-based waveguides part and the silicon substrate ripple for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
The first coupler of part is led while machining.
(11) method of the improved silica base array waveguide grating of making described in (7), includes conveying type array
Waveguide optical grating and reflection type array wave-guide grating.
(12) method of the improved silica base array waveguide grating of making described in (7), includes single incoming wave
The array waveguide grating and the array waveguide grating of multiple input waveguides led.
(13) method of the improved silica base array waveguide grating of making described in (7), wherein silica-based waveguides core
Layer includes at least one of materials such as silicon, silicon nitride, silicon oxynitride.
(14) linear dispersion of array waveguide grating
Array waveguide grating is made up of input and output waveguide, planar waveguide and Waveguide array, and is integrated in same substrate
On.As shown in figure 3, the input of array waveguide grating, the port distribution of output waveguide are respectively R in diameteriAnd RoRowland circle
On, and adjacent waveguide spacing is Δ xiWith Δ xo.The port of Waveguide array is respectively distributed in a more great circle (generally, half
Footpath is 2 times of Rowland circle), spacing is respectively diAnd do.Waveguide array adjacent waveguide difference Δ L length, is imported by a certain incoming wave
The light for the different wave length penetrated there will be different phase differences in Waveguide array outlet.The focal length of planar waveguide is respectively fiAnd fo(one
As in the case of, fi=Ri, fo=Ro).If by the port distribution of output waveguide on the focal line of planar waveguide, different wave length
Light will be in the relevant enhancing in different output waveguide porch.Rowland circle is defined as follows：Delineated on concave spherical mirror face
A series of reflecting grating that equidistant parallel lines are constituted, it has light splitting ability and light gathering.If light source will be stitched and recessed
Concave grating is placed on diameter and is equal on the circumference of concave grating radius of curvature, and the circle and grating midpoint G are tangent, then by concave surface light
The spectrum of grid formation is in that the circle is referred to as Rowland circle on this circumference.
According to multiple-beam interference principle, the light demultiplexed using AWG should meet following grating equation：
nsdisinθi+ncΔL+nsdosinθo=m λ,
Section 1 is the optical path difference that i-th input waveguide is transferred to adjacent two Waveguide array on the left of equation, and Section 2 is light
The optical path difference introduced when two neighboring Waveguide array is transmitted, Section 3 is that two neighboring Waveguide array is transferred to jth root waveguide
Optical path difference.
N in formulasAnd ncThe respectively effective refractive index of planar waveguide and Waveguide array, m is diffraction progression, θiAnd θoCorrespondence
The angle of input, output waveguide and central waveguide.
θi=i Δs xi/fi=xi/fi,
θo=j Δs xo/fo=xo/fo,
ΔxiWith Δ xoFor input and output waveguide spacing, fiAnd foRespectively two planar waveguide focal lengths；I and j are respectively
Input and the waveguide sequence of output waveguide.diAnd doIt is Waveguide array spacing, Δ L is the length difference of adjacent array waveguide.
Typically enter θ corresponding with output waveguideiAnd θoAll very little, can make approximate：sinθi=θi, sin θo=θo.Therefore,
Grating equation can be approximately：
nsdiθi+ncΔL+nsdoθo=m λ,
For central wavelength lambda0, when it is by the incidence of center input waveguide and is exported from center output waveguide, i.e. θi=θo=0
When, Huo Bucong centers input waveguide is incident, but meets diθi=-doθoWhen, Section 1 and Section 3 and it is on the left of equal sign in above formula
0, therefore central wavelength lambda0Meet：
ncΔ L=m λ0,
I.e.：Δ L=m λ0/nc=mc/ (ncν0),
In formula, λ0It is the centre wavelength in vacuum, ν0It is the centre frequency in vacuum.Therefore, when it is determined that after diffraction progression m,
Δ L also determines that generally large m can produce higher resolution ratio.
The outgoing position of centre wavelength meets following formula：
I.e.
When the light of a certain wavelength is incident from i-th input waveguide, incidence angle θi=i Δs θiFor constant.
When the light of the wavelength is exported from j-th strip output waveguide, output angle θo=j Δs θo, θoIt is relevant with wavelength X, it is designated as θo
=θo(λ)。
The effective refractive index n of planar waveguide and Waveguide arraysAnd ncIt is also the function of wavelength X, is designated as ns=ns(λ), nc=
nc(λ)。
Grating equation is differentiated to wavelength X to be obtained：
Thus obtain：
It can turn to：
mfiAnd mfoTypically very big, last can ignore in bracket in formula, and above formula is approximately：
Above formula bracket mean terms is the group index of Waveguide array, then angle dispersion equation is：
Corresponding linear dispersion equation is easily pushed away：
Similarly, it can be derived from the angle dispersion for input waveguide and linear dispersion equation be respectively：
Said process by taking conveying type array waveguide grating as an example, reflection type array wave-guide grating principle with it is above-mentioned consistent, only
It is that a planar waveguide is changed into input and output waveguide is public, Waveguide array end adds a reflection unit, adjacent lengths difference becomes
For original half.
As can be seen here, the token state Δ λ of array waveguide grating wavelength resolution performance and input or the spacing of output waveguide
It is directly proportional：
As can be seen that Δ λ and Δ x from above formulai/oProportional relation.Notice that reduce Δ λ (can also increase by increasing m
Big Δ L) or increase fi/oTo complete, but these methods can all significantly increase the size of array waveguide grating, and its cost is also corresponding bright
Aobvious to improve, this is unacceptable in many applications.
Beneficial effect：Because the decoupling distance of silica-based waveguides is far below silica-based waveguide, therefore can be by titanium dioxide silicon substrate
The input of array waveguide grating or output waveguide replace with silica-based waveguides to reduce its channel spacing.Treat its be drifted apart from enough away from
From rear, silicon substrate and silica-based waveguide coupler is recycled to convert back silica-based waveguide.This improvement maintains dioxy
The original advantage of SiClx base array waveguide grating and the scope of application, take full advantage of its existing ripe Performance Optimization technique and production
Process, and effectively increase its wavelength resolution performance or reduce its size.Input or output waveguide are replaced with into silicon
The method of based waveguides is compatible with Conventional CMOS technology, with technical maturity, simple to operate, low cost and other advantages.Especially 1) have
Effect improves the wavelength resolution performance of silica base array waveguide grating or reduces its size.2) input or output waveguide are replaced
The technology for being changed to silica-based waveguides is simple, and technical maturity, cost is low, compatible with Conventional CMOS technology.3) titanium dioxide silicon substrate is still kept
The original advantage of array waveguide grating and the scope of application, can still make full use of existing ripe silica base array waveguide grating
Performance Optimization technique and manufacturing technique method.
Brief description of the drawings
Fig. 1 is to utilize the improved titanium dioxide silicon substrate conveying type array waveguide grating schematic diagram of silica-based waveguides；
Fig. 2 is to utilize the improved titanium dioxide silicon substrate reflection type array wave-guide grating schematic diagram of silica-based waveguides；
Fig. 3 is array waveguide grating planar waveguide Rowland circle schematic diagram；
Fig. 4 is the second coupler for coupling input or the respective silicon substrate of output waveguide and silica-based waveguide part
Schematic diagram；
Fig. 5 is the silicon chip cross-sectional view after the processing used in the present invention (by the section of waveguide axis in Fig. 4)；
Embodiment
The invention will be further described with reference to the accompanying drawings and examples.
The basic thought of the present invention is that realization pair is improved to silica base array waveguide grating using silica-based waveguides
The optimization of wavelength resolution performance.
The improved silica base array waveguide grating of silica-based waveguides is utilized 1. making
Using scheme as illustrated in fig. 1 or fig. 2, make guide-lighting using the improved silica basic matrix train wave of silica-based waveguides
Grid.
Using the silicon chip after the processing of cross section as shown in Figure 5, wherein for making the processing of silica-based waveguide part
For Fig. 5 left side structures, Fig. 5 right side structures are processed as making silica-based waveguides part.
Titanium dioxide silicon substrate planar waveguide, silica are produced in the doping silicon dioxide surface part of silicon chip shown in Fig. 5
The silica-based waveguide part of base Waveguide array, input and output waveguide；Produced in the silicon surface part of silicon chip shown in Fig. 5
The cross section of silica-based waveguides shown in the silica-based waveguides part and Fig. 4 of input and output waveguide constantly reduces part.Produce
For the first coupler of the silica-based waveguides part for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide.Such as Fig. 4 institutes
Show, constantly reduce the higher folding of at least one of the elements such as part covering doped germanium, nitrogen, boron or phosphorus in the cross section of silica-based waveguides
The silica of rate is penetrated, then as shown in Figure 5, thereon and in the waveguide produced of doping silicon dioxide surface part of silicon chip
Structure etc. is sentenced the relatively low silica of refractive index and covered, and (unspecified is equal for the making of the second coupler of completion and waveguide
It is prior art processes).
2. utilize the wavelength resolution of the improved silica base array waveguide grating of silica-based waveguides
If a certain silica base array waveguide grating parameter is：
λ0=1.55 μm,
Port number N=8,
Input waveguide spacing：Δxi=28 μm,
Output waveguide spacing：Δxo=28 μm,
Channel spacing Δ λ=1.6nm.
Using the above-mentioned input of silica-based waveguides replacement or output waveguide, input or output waveguide spacing can be reduced into：
Δxi=Δ xo=3 μm,
Other specification can keep constant, according to
Understand in the case where keeping other specification permanence condition, channel separation can be reduced in theory：
Effectively improve wavelength resolution performance；
If Δ λ keeps constant, m (determining Δ L) or fi/oCan accordingly it diminish, so as to effectively reduce its size.
Described above is only the preferred embodiment of the present invention, it should be pointed out that：For the ordinary skill people of the art
For member, under the premise without departing from the principles of the invention, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as protection scope of the present invention.
Claims (8)
1. a kind of improved silica base array waveguide grating, it is characterized in that including input and output waveguide, planar waveguide and
There is the Waveguide array of adjacent lengths difference, the silica fundamental wave that input and output waveguide are connected using the second coupler
Lead part and silica-based waveguides part, wherein using the first coupler be connected with titanium dioxide silicon substrate planar waveguide Rowland circle for input
Or the silica-based waveguides part of output waveguide；The second coupling connected for silica-based waveguides part and silica-based waveguide part
Device, the distance between the silica-based waveguides part of input or output waveguide is separated to the decoupling distance of silica-based waveguide；
Wherein it is used for the second coupling for coupling input or the respective silica-based waveguides part of output waveguide and silica-based waveguide part
Clutch uses following structure：The cross section of silica-based waveguides is gradually reduced, silica-based waveguides cross section be gradually reduced part be doped germanium,
The high index silica covering of at least one of nitrogen, boron or P elements, covering is outer to be covered compared with low refractive index silica
Lid, the high index dioxy of the sandwich layer size of the silica-based waveguide part subsequently connected and above-mentioned silica-based waveguides outer covering
SiClx cross sectional dimensions is consistent, and refractive index is consistent.
2. improved silica base array waveguide grating according to claim 1, it is characterized in that array waveguide grating bag
Array waveguide grating containing conveying type or reflection type array wave-guide grating.
3. improved silica base array waveguide grating according to claim 1, it is characterized in that array waveguide grating bag
The array waveguide grating of array waveguide grating or multiple input waveguides containing single input waveguide.
4. improved silica base array waveguide grating according to claim 1, it is characterized in that wherein silica-based waveguides portion
Sandwich layer is divided to include at least one of silicon, silicon nitride, silicon oxy-nitride material.
5. a kind of method for making improved silica base array waveguide grating, it is characterized in that：Make titanium dioxide silicon substrate flat board
Waveguide, silica base Waveguide array, the silica-based waveguide part and silica-based waveguides part of input and output waveguide, make
The second coupler and use for coupling input or the respective silica-based waveguides part of output waveguide and silica-based waveguide part
The first coupler in coupling titanium dioxide silicon substrate planar waveguide and the silica-based waveguides part of input or output waveguide；Wherein the second coupling
The cross section of silica-based waveguides is gradually reduced in clutch, and silica-based waveguides cross section is gradually reduced part and is doped germanium, nitrogen, boron or phosphorus member
The high index silica covering of at least one of element, covering is outer to be covered compared with low refractive index silica, follow-up connection
Silica-based waveguide part sandwich layer size and above-mentioned silica-based waveguides outer covering high index silica cross section
Size is consistent, and refractive index is consistent.
6. the method according to claim 5 for making improved silica base array waveguide grating, it is characterized in that：Wherein
Titanium dioxide silicon substrate planar waveguide, silica base Waveguide array, the silica-based waveguide part of input and output waveguide first add
Work is completed；Then machine input and output waveguide silica-based waveguides part, for couple input or output waveguide it is respective
Second coupler of silica-based waveguides part and silica-based waveguide part and for coupling titanium dioxide silicon substrate planar waveguide and defeated
Enter or output waveguide silica-based waveguides part the first coupler.
7. the method according to claim 5 for making improved silica base array waveguide grating, it is characterized in that：Input
Silica-based waveguides part with output waveguide, for coupling input or the respective silica-based waveguides part of output waveguide and titanium dioxide silicon substrate
Second coupler of waveguides sections and the silica-based waveguides portion for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
The first coupler divided is machined simultaneously.
8. the method according to claim 5 for making improved silica base array waveguide grating, it is characterized in that：Wherein
Input is with the silica-based waveguides part of output waveguide, for coupling input or the respective silica-based waveguides part of output waveguide and titanium dioxide
Second coupler of silica-based waveguides part and the silicon substrate ripple for coupling titanium dioxide silicon substrate planar waveguide and input or output waveguide
The first coupler for leading part is first machined；Then processing titanium dioxide silicon substrate planar waveguide, silica base Waveguide array, defeated
Enter the silica-based waveguide part with output waveguide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410795629.XA CN104570200B (en) | 2014-12-19 | 2014-12-19 | Utilize the improved silica base Arrayed Waveguide Grating device of silica-based waveguides and preparation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410795629.XA CN104570200B (en) | 2014-12-19 | 2014-12-19 | Utilize the improved silica base Arrayed Waveguide Grating device of silica-based waveguides and preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104570200A CN104570200A (en) | 2015-04-29 |
| CN104570200B true CN104570200B (en) | 2017-08-11 |
Family
ID=53086709
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410795629.XA Active CN104570200B (en) | 2014-12-19 | 2014-12-19 | Utilize the improved silica base Arrayed Waveguide Grating device of silica-based waveguides and preparation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104570200B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106443879B (en) * | 2016-10-21 | 2022-09-23 | 浙江工业大学 | Low-crosstalk arrayed waveguide grating |
| CN109239940B (en) | 2018-11-02 | 2021-05-07 | 京东方科技集团股份有限公司 | Light splitting device and manufacturing method thereof, light dispersion method and spectrometer |
| CN111323120A (en) * | 2018-12-17 | 2020-06-23 | 绍兴图聚光电科技有限公司 | High-resolution spectrometer based on etched diffraction grating |
| CN110031466A (en) * | 2019-04-25 | 2019-07-19 | 山东大学 | A kind of contact-type linear concentration sensor and its fluid detection method based on array wave-guide grating structure |
| CN110989079B (en) * | 2019-12-23 | 2021-01-01 | 湖北工业大学 | Air cladding SU8 array waveguide grating |
| CN112305668B (en) * | 2020-10-21 | 2022-04-19 | 浙江大学 | Array waveguide grating with double-layer structure |
| CN112327409B (en) * | 2020-11-19 | 2021-09-07 | 西南交通大学 | Low-crosstalk silicon-based array waveguide grating |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1423140A (en) * | 2001-12-04 | 2003-06-11 | 中国科学院半导体研究所 | Integrated structure of array waveguide grating and optical fiber array and manufacture method thereof |
| CN101419313A (en) * | 2008-10-31 | 2009-04-29 | 武汉光迅科技股份有限公司 | Method for manufacturing afebrile array wave-guide grating based on flat-plate wave-guide movement |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003227948A (en) * | 2002-02-04 | 2003-08-15 | Ntt Electornics Corp | Optical multiplexer/demultiplexer and method of manufacturing the same |
-
2014
- 2014-12-19 CN CN201410795629.XA patent/CN104570200B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1423140A (en) * | 2001-12-04 | 2003-06-11 | 中国科学院半导体研究所 | Integrated structure of array waveguide grating and optical fiber array and manufacture method thereof |
| CN101419313A (en) * | 2008-10-31 | 2009-04-29 | 武汉光迅科技股份有限公司 | Method for manufacturing afebrile array wave-guide grating based on flat-plate wave-guide movement |
Non-Patent Citations (2)
| Title |
|---|
| Developing arrayed waveguide grating spectrographs for multi-object astronomical spectroscopy;Nick Cvetojevic et al.;《OPTICS EXPRESS》;20120130;第20卷(第3期);全文 * |
| 阵列波导光栅器件及应用;陈巧红等;《激光与光电子学进展》;20050430;第42卷(第4期);全文 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104570200A (en) | 2015-04-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104570200B (en) | Utilize the improved silica base Arrayed Waveguide Grating device of silica-based waveguides and preparation | |
| JP3338356B2 (en) | Optical device | |
| CN103645540B (en) | Etched diffraction grating-type wavelength division multiplexing/demultiplexing device | |
| CN113885137B (en) | Wavelength demultiplexing device based on-chip super lens structure | |
| CN104570208B (en) | One kind is based on three-dimensional straight array waveguide grating interleaver and power splitter | |
| CN205427236U (en) | Plane single scale intergration wavelength devision multiplex - demultiplexer | |
| KR20200038278A (en) | Echelt grid multiplexer or demultiplexer | |
| CN104101952A (en) | Array raster waveguide type wavelength division multiplexer | |
| US6539158B2 (en) | Optical waveguide circuit | |
| Bidnyk et al. | Novel architecture for design of planar lightwave interleavers | |
| CN106877169A (en) | A kind of insensitive laser structure of hetero-junctions heat and manufacture method based on SOI | |
| WO2023035380A1 (en) | Polarization diversity demultiplexer | |
| CN102692681A (en) | Reflection type arrayed waveguide grating with temperature polarization compensation | |
| CN109991700A (en) | A kind of arrayed waveguide grating multiplexer that micro-loop is integrated | |
| WO2019153225A1 (en) | Wavelength division multiplexing/demultiplexing optical fiber coupling module and optical apparatus thereof | |
| CN109541753A (en) | A kind of Mux, Demux filter of flattening filter and its composition | |
| CN109644064A (en) | Wavelength division multiplexing equipment and method | |
| CN106443880B (en) | Demultiplexer with blazed waveguide side wall grating and sub-wavelength grating structures | |
| CN113359236A (en) | Grating coupling structure based on back process and preparation method | |
| CN209248084U (en) | A kind of Mux, Demux filter of flattening filter and its composition | |
| CN105911642A (en) | Method for designing multi-mode multiplexing device | |
| JP2557966B2 (en) | Optical multiplexer / demultiplexer | |
| Suzuki et al. | Ultrasmall arrowhead arrayed-waveguide grating with V-shaped bend waveguides | |
| CN111025464A (en) | Etched diffraction grating type wavelength division multiplexer/demultiplexer based on SU8 glue | |
| CN206133061U (en) | Demultiplexer with waveguide lateral wall grating and inferior wavelength raster structure glitter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |