CN206069388U - A kind of silicon tetrachloride vaporization device - Google Patents
A kind of silicon tetrachloride vaporization device Download PDFInfo
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- CN206069388U CN206069388U CN201621117670.2U CN201621117670U CN206069388U CN 206069388 U CN206069388 U CN 206069388U CN 201621117670 U CN201621117670 U CN 201621117670U CN 206069388 U CN206069388 U CN 206069388U
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- silicon tetrachloride
- vaporization
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- static mixer
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Abstract
The utility model discloses a kind of silicon tetrachloride vaporization device, including hydrogen heater, Silicon chloride. heater, static mixer and silicon tetrachloride vaporization tower, wherein, the bottom of the static mixer is connected with the top or top of silicon tetrachloride vaporization tower by pipeline；The top of the static mixer is connected with hydrogen heater by pipeline；The middle part of static mixer is connected with Silicon chloride. heater by pipeline.Using silicon tetrachloride vaporization device provided by the utility model, liquid phase Silicon chloride. can realize 40% vaporization in static mixer with hydrogen, then realize completely vaporizing in carburator, the equipment improves silicon tetrachloride vaporization speed, significantly reduce the load of vaporization tower in subsequent processing, ensure vaporization tower operation more high throughput, while greatly reducing the energy consumption of polysilicon.
Description
Technical field
This utility model is related to field of polysilicon production, and in particular to a kind of silicon tetrachloride vaporization device.
Background technology
Polycrystalline silicon material is the raw material of semiconductor integrated circuit and solar cell, in information industry and renewable
Energy industry chain is foremost.Polysilicon enterprise generally produces polysilicon using improved Siemens both at home and abroad, and the method can
Production High Purity Polycrystalline silicon materials, however, it is necessary to 18～25 times of trichlorosilane is consumed, while producing 15～20 times of by-product four
Silicon chloride, Silicon chloride. easily generate hydrogen chloride with water reaction, directly discharge serious environment pollution.
The common methods of recycling by-produced tetrachlorosilane are exactly to be translated into using chlorine hydrogenation or cold hydrogenation technology
Production of polysilicon raw material trichlorosilane, can also realize the closed cycle of production system, optimization technological process, dirt of reducing the link
Dye.Therefore, chlorine hydrogenation apparatuss are the keys that by-product material is recycled, and usual Silicon chloride. is first preheated, then using electricity plus
Heat or high temperature heat conductive oil participate in reaction after being heated vaporization.In prior art, polysilicon enterprise major part is added using conduction oil
Hot Silicon chloride., conduction oil plant investment are larger, and will regularly replace part conduction oil, and operation expense is higher.And lead
Hot oil furnace uses natural gas as thermal source, and by combustion heating conduction oil, conduction oil supplies each Silicon chloride. vapour by circulating pump
Change tower reboiler, this heating belongs to indirectly heat, and efficiency of energy utilization is relatively low, and Gas Prices are higher, causes the life of device
Producing cost increases.As Silicon chloride. is vaporized in the way of evaporating, so work as
During thing, the blocking of silicon tetrachloride vaporization tower reboiler is easily caused, the long-period stable operation of device is affected.
The Chinese patent of Publication No. 205187884U discloses a kind of silicon tetrachloride vaporization device, and the device is added with U-shaped
Thermoelectric stick, the Silicon chloride. air inlet pipe to being nested on sealing barrel mast are heated, and Silicon chloride. is fully vaporized, but vaporize dress
Put complex structure, it is impossible to high-boiling components are solved in vaporization tower and the blockage problem of reboiler, produced wayward.Publication No.
The Chinese patent of 202400856U discloses a kind of silicon tetrachloride vaporization device, and the device is vaporized with conduction oil as thermal source in autoclave
The vaporization of Silicon chloride. is carried out in device, substantial amounts of high temperature heat conductive oil need to be consumed, vaporize high cost, thermal losses is larger, and leads
Deep fat pollution is larger, needs strict seal, environmental pollution is easily caused after leakage, once leakage people's system, will cause whole system
Pollution, it is difficult to clear up.Accordingly, it would be desirable to existing silicon tetrachloride vaporization device is correspondingly improved and is optimized.
Utility model content
This utility model is directed to problems of the prior art, there is provided a kind of improved new silicon tetrachloride vaporization dress
Put, by increasing static mixer before silicon tetrachloride vaporization device, and multistage filler is set in vaporization tower, it is ensured that the four of charging
Silicon chloride being capable of high-efficient gasification.
To realize above-mentioned technique effect, this utility model employs following technical scheme：
A kind of silicon tetrachloride vaporization device, including hydrogen heater, Silicon chloride. heater, static mixer and four chlorinations
Silicon vaporization tower, wherein, the bottom of the static mixer is connected with the top or top of silicon tetrachloride vaporization tower by pipeline；
The top of the static mixer is connected with hydrogen heater by pipeline；The middle part of static mixer passes through pipeline and tetrachloro
SiClx heater is connected.
Wherein, the static mixer top or top are provided with 1～5 shower nozzle.It is preferred that 1～3 shower nozzle.It is further excellent
Choosing, shower nozzle number is 1.
It is further preferred that the shower nozzle that the static mixer top or top are arranged is spiral nozzle.
Wherein, the vaporization tower upper and lower is provided with filler.
It is further preferred that the filler that the vaporization tower upper and lower is arranged is structured packing.
Wherein, the tower reactor connection recirculation heater of the silicon tetrachloride vaporization tower, between vaporization tower and recirculation heater also
Silicon chloride. circulating pump can be set up.
Wherein, the top of described recirculation heater is connected with the top of silicon tetrachloride vaporization tower by pipeline, described
The bottom of recirculation heater be connected with the bottom of silicon tetrachloride vaporization tower by pipeline.
Wherein, the heating source of the hydrogen heater, Silicon chloride. heater, static mixer and silicon tetrachloride vaporization tower
It is steam.
It is further preferred that the hydrogen heater, Silicon chloride. heater, static mixer and silicon tetrachloride vaporization tower
Heating source be low-pressure steam.
Compared with original vaporization flow process and device, this utility model increases static mixer, by the hydrogen and tetrachloro of preheating
SiClx is first passed through static mixer, is sufficiently mixed in static mixer, and part Silicon chloride. occurs vaporization, and mixed material enters again
Enter vaporization tower, during gas-liquid is mixed, the Silicon chloride. of charging is all changed into gas phase, the Jing vaporizations tower top together with hydrogen
Into subsequent cell.Vaporization tower tower reactor is equipped with Silicon chloride. Matter Transfer pump, is that the vaporization of Silicon chloride. constantly provides thermal source, protects
Whole vaporizations of card charging Silicon chloride..
Beneficial effect：
This utility model set up improved static mixer before vaporization tower, and the top/top of static mixer is arranged
Multiple spiral nozzles, make the high-pressure liquid phase Silicon chloride. of entrance after shower nozzle, are converted into misty liquid droplets, vapor phase hydrogen with it is vaporific
Drop can quickly occur mix homogeneously in static mixer, it is possible to realize the part vaporization of Silicon chloride..Therefore, have
High pressure drop, high flux and efficient feature.
Multistage filler is set in this utility model vaporization tower, and the change of combination temperature gradient occurs hydronic
Gas-to-liquid contact mass-and heat-transfer process, can realize that gas-liquid two-phase is contacted in filler at short notice, and diabatic process occurs, and then
Realize whole high-efficient gasifications of Silicon chloride..
Additionally, the shower nozzle and filler of this utility model employing are anti-stifled, wear-resisting, the ability to ward off risks is stronger, significantly extends vapour
The cycle of operation that makeup is put.
Description of the drawings
Fig. 1 is silicon tetrachloride vaporization schematic device described in the utility model.
Wherein, 1- Silicon chloride. heater；2- hydrogen heaters；3- static mixers；4- silicon tetrachloride vaporization towers；5- is followed
Ring heater.
Specific embodiment：
Below in conjunction with the accompanying drawings this utility model is described in detail, it is necessary to explanation, protection model of the present utility model
Enclose and do not limited by following specific embodiments, following involved specific configurations and annexation are to illustrate that this practicality is new
Type and enumerate, be not to any restriction of the present utility model.
As shown in figure 1, this utility model silicon tetrachloride vaporization device includes hydrogen heater, Silicon chloride. heater, quiet
State blender and silicon tetrachloride vaporization tower, wherein, the bottom of the static mixer is by pipeline and silicon tetrachloride vaporization tower
Top or top are connected；The top of the static mixer is connected with hydrogen heater by pipeline；Static mixer
Middle part is connected with Silicon chloride. heater by pipeline.Static mixer top or top are provided with 1～5 shower nozzle, and preferably 1
～3.It is further preferred that the shower nozzle that the static mixer top or top are arranged is spiral nozzle.In the vaporization tower
Portion and bottom are provided with filler.It is further preferred that the filler that the vaporization tower upper and lower is arranged is structured packing.Institute
The tower reactor for stating silicon tetrachloride vaporization tower is provided with recirculation heater, and Silicon chloride. circulation is provided between vaporization tower and recirculation heater
Pump.The top of described recirculation heater is connected with the top of silicon tetrachloride vaporization tower by pipeline, described circulating-heating
The bottom of device is connected with the bottom of silicon tetrachloride vaporization tower by pipeline.It is the hydrogen heater, Silicon chloride. heater, quiet
The heating source of state blender and silicon tetrachloride vaporization tower is steam.It is further preferred that the hydrogen heater, Silicon chloride.
The heating source of heater, static mixer and silicon tetrachloride vaporization tower is low-pressure steam.
In practical operation, the workflow of silicon tetrachloride vaporization device provided by the utility model is as follows：First, follow
Ring hydrogen sends into recycle hydrogen heater Jing after compressor pressurization.Then from the top of static mixer/top enters static mixer.Separately
On the one hand, from head tank Silicon chloride. Jing feed pump pressurization after send into feed preheater chilling gas heat-exchanger carry out it is pre-
Heat, enters back into Silicon chloride. heater feed preheater, then enters from the middle part of static mixer, with the hydrogen after the completion of heating
It is sufficiently mixed, during mixing, part Silicon chloride. occurs vaporization, and unclassified stores goes out from static mixer bottom
Material, then enter from silicon tetrachloride vaporization tower top, additionally, the liquid silicon tetrachloride material that vaporization tower tower reactor is collected is through circulating pump
After sending into vaporization tower kettle material heat exchanger circulating-heating, it is back to silicon tetrachloride vaporization column overhead and is sprayed, with rising
Continue vaporization in filler after air-flow mixing, until Silicon chloride. is completely vaporized, the mode of the hydronic is four
The vaporization of silicon chloride further provides for thermal source.Silicon chloride. gas phase after vaporization is discharged, is collected, into next from vaporization column overhead
Workshop section.
Not only there is the process of material mixing, the vaporization also comprising a part of material in improved static mixer
Journey, wherein, the Silicon chloride. of high pressure forms misty liquid droplets through spiral nozzle, after being mixed with hydrogen, can realize part
The vaporescence of Silicon chloride., can averagely realize 40% vaporization, significantly improve the vaporization rate of Silicon chloride. material, pole
The earth reduces the load of vaporization tower in subsequent processing, it is ensured that vaporization tower can run bigger treating capacity, while greatly dropping
The low energy consumption of production of polysilicon.
The technique being vaporized using conduction oil in prior art, overall startup procedure need more than 24 hours, and original
Vaporization be usually common and evaporate, be related to mass transport process；And silicon tetrachloride vaporization device provided by the utility model is adopted, and
Coordinate by the use of low-pressure steam as heating source, gas-liquid two-phase mixing is vaporized, the driving time only needs to 4 hours, and single unit system is carried
Amount (process, collection material) is more steady.And the vaporescence in vaporization tower is gas-to-liquid contact, the liquid reflux of tower reactor is to tower
Interior, upper and lower adopts structured packing, the change of combination temperature gradient to realize that gas-liquid two-phase is contacted in filler, occurs
Diabatic process, and then realize whole vaporizations of Silicon chloride..
Although be described in detail to specific embodiment of the present utility model above in conjunction with the embodiments, however it is necessary that
It is intended that, protection domain of the present utility model is not limited to these specific embodiments, but is come by claims
It is determined that.
Claims (9)
1. a kind of silicon tetrachloride vaporization device, it is characterised in that including hydrogen heater, Silicon chloride. heater, static mixing
Device and silicon tetrachloride vaporization tower, wherein, the bottom of the static mixer by the top of pipeline and silicon tetrachloride vaporization tower or
Top is connected；The top of the static mixer is connected with hydrogen heater by pipeline；The middle part of static mixer leads to
Piping is connected with Silicon chloride. heater.
2. silicon tetrachloride vaporization device according to claim 1, it is characterised in that the static mixer top or top
It is provided with 1～5 shower nozzle.
3. silicon tetrachloride vaporization device according to claim 2, it is characterised in that the static mixer top or top
The shower nozzle of setting is spiral nozzle, and number is 1～3.
4. the silicon tetrachloride vaporization device according to any one of claim 1-3, it is characterised in that the vaporization tower top and
Bottom is provided with filler.
5. silicon tetrachloride vaporization device according to claim 4, it is characterised in that the vaporization tower internal upper part and bottom set
The filler put is structured packing.
6. silicon tetrachloride vaporization device according to claim 1, it is characterised in that the tower reactor of the silicon tetrachloride vaporization tower
Connection recirculation heater.
7. silicon tetrachloride vaporization device according to claim 6, it is characterised in that the top of the recirculation heater passes through
Pipeline is connected with the top of silicon tetrachloride vaporization tower, and the bottom of described recirculation heater passes through pipeline and silicon tetrachloride vaporization
The bottom of tower is connected.
8. silicon tetrachloride vaporization device according to claim 1, it is characterised in that the hydrogen heater, Silicon chloride.
The heating source of heater, static mixer and silicon tetrachloride vaporization tower is steam.
9. silicon tetrachloride vaporization device according to claim 8, it is characterised in that the steam is low-pressure steam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621117670.2U CN206069388U (en) | 2016-10-13 | 2016-10-13 | A kind of silicon tetrachloride vaporization device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621117670.2U CN206069388U (en) | 2016-10-13 | 2016-10-13 | A kind of silicon tetrachloride vaporization device |
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| CN206069388U true CN206069388U (en) | 2017-04-05 |
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| CN201621117670.2U Active CN206069388U (en) | 2016-10-13 | 2016-10-13 | A kind of silicon tetrachloride vaporization device |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108394910A (en) * | 2018-05-15 | 2018-08-14 | 湖北兴瑞硅材料有限公司 | The method of gas-phase silica raw materials for production mixture |
| CN117654065A (en) * | 2024-02-02 | 2024-03-08 | 浙江赛勒新能源材料有限公司 | Silicon tetrachloride vaporization system and vaporization process for polysilicon cold hydrogenation device |
-
2016
- 2016-10-13 CN CN201621117670.2U patent/CN206069388U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108394910A (en) * | 2018-05-15 | 2018-08-14 | 湖北兴瑞硅材料有限公司 | The method of gas-phase silica raw materials for production mixture |
| CN108394910B (en) * | 2018-05-15 | 2020-02-14 | 湖北兴瑞硅材料有限公司 | Method for mixing raw materials for producing fumed silica |
| CN117654065A (en) * | 2024-02-02 | 2024-03-08 | 浙江赛勒新能源材料有限公司 | Silicon tetrachloride vaporization system and vaporization process for polysilicon cold hydrogenation device |
| CN117654065B (en) * | 2024-02-02 | 2024-04-26 | 浙江赛勒新能源材料有限公司 | Silicon tetrachloride vaporization system and vaporization process for polysilicon cold hydrogenation device |
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