CN206015072U - A kind of evaporation process mask plate - Google Patents
A kind of evaporation process mask plate Download PDFInfo
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- CN206015072U CN206015072U CN201521047084.0U CN201521047084U CN206015072U CN 206015072 U CN206015072 U CN 206015072U CN 201521047084 U CN201521047084 U CN 201521047084U CN 206015072 U CN206015072 U CN 206015072U
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- magnetic
- elastomeric film
- metal mask
- mask matrix
- magnetic elastomeric
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Abstract
This utility model provides a kind of evaporation process mask plate, including：Metal mask matrix, with multiple open regions forming specific figure；Magnetic elastomeric film, the magnetic elastomeric film have opening corresponding with metal mask matrix phase and figure, and are formed at metal mask matrix away from the side of vapor deposition source, and the opening range of metal mask matrix is in the corresponding opening range of magnetic elastomeric film.The magnetic elastomeric film is made up of magnetic polymer material.In the mask plate that this utility model is provided; polymeric membrane is due to magnetic; there can be firm combination with metal mask matrix; additionally, due to the elasticity of film; the particulate matter of greater particle size on glass substrate can be accommodated; ensure that glass substrate is brought into close contact with mask plate, effectively prevent during evaporation that colour mixture is deposited with caused by glass substrate and mask plate not close fit-state.
Description
Technical field
This utility model is related to the manufacturing process area of OLED, more particularly to a kind of mask of evaporation
Version.
Background technology
Organic Light Emitting Diode (Organic Light Emitting Diode, abbreviation OLED) display is a kind of organic
Membrane electro luminescent device, its have the advantages that preparation process is simple, low cost, easily form flexible structure, visual angle width.Therefore,
A kind of important Display Technique is become using the Display Technique of Organic Light Emitting Diode.
Organic light emitting diode display core component is the organic luminous layer in each sub-pixel.Organic in sub-pixel
The formation of luminescent layer is general by the way of evaporation, as shown in figure 1, evaporated device includes the parts such as vapor deposition source 5 ', mask plate 2 '.
During evaporation, glass substrate 1 ' is overlaped with mask plate 2 ', under vacuum high-temperature state (temperature can reach 650 DEG C), is needed
Material to be deposited with from below heated gasification and be deposited in the specific region that substrate is not blocked by mask plate 2 '.Conventional mask
Plate material is iron-nickel alloy, and with magnetic, and thermal coefficient of expansion is low.
Fig. 1 shows the principle of the colour mixture evaporation that evaporation process causes because of particulate matter.During evaporation, when glass substrate 1 '
On there is small particulate matter 6 ' (particle diameter is 5～10 μm), mask plate 2 ' and glass substrate 1 ' can be caused to produce not parallel state,
There is space between subregion mask plate 2 ' and glass substrate 1 '；When evaporation, sub-pixel a 3 ' a or 4 ' a can because
The presence in gap, produces unnecessary part 3 ' b or 4 ' b, and in addition organic material by interstitial diffusion, and can be deposited with and arrive its adjacent son
Pixel region, causes a kind of organic material of color to be formed in adjacent subpixel area, and the 3 ' c or 4 ' c such as in figure, so as to lead
Cause colour mixture.
Utility model content
In order to solve above-mentioned problem, this utility model embodiment provides a kind of evaporation process mask plate, including：
Metal mask matrix, with multiple open regions forming specific figure；Magnetic elastomeric film, the magnetic elastomeric film have and gold
The corresponding opening of category mask substrate and figure, and para-position is formed at metal mask matrix away from the side of vapor deposition source.
The magnetic elastomeric film is chosen as magnetic polymer material, the magnetic polymer material be chosen as magnetic material with
The polymer composite of the formation of macromolecular material, the wherein macromolecular material as matrix be chosen as can photoetching height
Molecular material.The opening of magnetic elastomeric film is corresponding with metal mask matrix, and the opening range of metal mask matrix is in magnetic bullet
In the property corresponding opening range of film.Magnetic elastomeric film is combined by magnetic attracting force or cohesive force with metal mask matrix, or with
When combined by both the above active force.
In the mask plate that this utility model is provided, polymeric membrane is due to magnetic, having jail with metal mask matrix
Solid combination, additionally, due to the elasticity of film, the particulate matter of greater particle size on glass substrate can be accommodated, it is ensured that glass substrate and mask
Version is brought into close contact, and so as to effectively prevent during evaporation, caused by glass substrate and mask plate not close fit-state, colour mixture is steamed
Plating.
Description of the drawings
In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art, below will be to embodiment
Or accompanying drawing to be used is briefly described needed for description of the prior art, it should be apparent that, drawings in the following description are only
It is some embodiments of the present utility model, for those of ordinary skill in the art, in the premise for not paying creative work
Under, can be with according to these other accompanying drawings of accompanying drawings acquisition.
Fig. 1 is the schematic diagram for being deposited with the colour mixture evaporation that process causes because of particulate matter in prior art；
Fig. 2 is the evaporation mask plate structure schematic diagram of an embodiment of the present utility model；
Fig. 3 is a kind of composition structural representation of the magnetic elastomeric membrane material of an embodiment of the present utility model；
Fig. 4 is another kind of composition structural representation of the magnetic elastomeric membrane material of an embodiment of the present utility model；
Fig. 5 is the of the para-position attaching process of magnetic elastomeric film and metal mask matrix in an embodiment of the present utility model
One step；
Fig. 6 is the of the para-position attaching process of magnetic elastomeric film and metal mask matrix in an embodiment of the present utility model
Two steps；
Fig. 7 is the of the para-position attaching process of magnetic elastomeric film and metal mask matrix in an embodiment of the present utility model
Three steps；
Fig. 8 is the of the para-position attaching process of magnetic elastomeric film and metal mask matrix in an embodiment of the present utility model
Four steps；
Fig. 9 is the of the para-position attaching process of magnetic elastomeric film and metal mask matrix in an embodiment of the present utility model
Five steps；
Figure 10 is the para-position attaching process of magnetic elastomeric film and metal mask matrix in an embodiment of the present utility model
6th step；
Figure 11 is the position of the opening of magnetic elastomeric film and metal mask matrix, chi in another embodiment of the present utility model
Very little relation schematic diagram；
Specific embodiment
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out
Clearly and completely describe.Obviously, described embodiment is only a part of embodiment of this utility model, rather than whole
Embodiment.Embodiment in based on this utility model, those of ordinary skill in the art are not under the premise of creative work is made
The every other embodiment for being obtained, belongs to the scope of this utility model protection.
A lot of details are elaborated in the following description in order to fully understand this utility model, but this practicality is new
Type can also be different from alternate manner described here using other to implement, and those skilled in the art can be without prejudice to this reality
With similar popularization is done in the case of new intension, therefore this utility model is not limited by following public specific embodiment.
As described in the background section, the particulate matter on substrate can cause metal mask matrix with glass substrate in injustice
Row state, causes Organic Ingredientss evaporation to other pixel regions, produces colour mixture.In view of this, this utility model embodiment is provided
A kind of evaporation process mask plate 11, as shown in Fig. 2 mask plate 11 includes metal mask matrix 2 and magnetic elastomeric film 7, magnetic
Property elastica 7 be formed at metal mask matrix 2 away from vapor deposition source 5 side, during evaporation metal mask matrix 2 pass through magnetic
Elastica 7 is contacted with glass substrate 1.
Magnetic elastomeric film 7 has and 2 identical opening of metal mask matrix, i.e. magnetic elastomeric film and metal mask matrix
Be open its shape, size, position all same, and the opening according to magnetic elastomeric film 7 with metal mask matrix 2 enters to the two
Row para-position is fitted.Identical opening is arranged and ensures that magnetic elastomeric film 7 does not change the position in evaporation region and scope.
Magnetic elastomeric film 7 is made up of magnetic polymer material.Specifically, the magnetic polymer material is by magnetic material
With the composite of macromolecule matrix material composition, magnetic material is magnetic polybutadiene alkyne derivatives, and macromolecule matrix material is
Polyimide based resin material, Fig. 3 are the structural representation of the composite.Polybutadiene alkyne derivatives are high molecular polymer,
Itself is same with elasticity and preferable with the compatibility of polyimide based resin, in preparation process can mix more equal
Even so that elastica has more uniform mechanical property.
Polybutadiene alkyne derivatives can be prepared by way of thermal polymerization or solid phase, optionally, by trityl freedom
Base or NO free radical replace the H of diacetylene to obtain composition for the double (2,2,6,6- tetramethyl -4- hydroxyl -1- oxygen-derived free radicals of 1,4-
Piperidyl) diacetylene black magnetic polymer powder, in this utility model embodiment prepare polybutadiene alkyne derivatives raw material
And method and product are not limited.With regard to the preparation of magnetic composite, polybutadiene alkynes made above can be spread out
Biological powder is mixed with polyimide prepolymer, by molding or injection moulding, by resin or polyimide coating in substrate
On, through a series of photothermal treatments, make polyimide prepolymer that polymerizing curable to occur, make the magnetic containing polybutadiene alkyne derivatives
High polymer elastic film.For ensureing polybutadiene alkyne derivatives and the mixed mobility of polyimide prepolymer, the mixture viscous
Degree is chosen as 5～3500CPS, and (polybutadiene alkyne derivatives and polyimide prepolymer account for the ratio of gross weight to the solid content of the mixture
Example) it is chosen as 10～30wt%.The drying mode of polyimide curing technique can adopt infrared drying or hot air drying, process temperature
Spend for 90～140 DEG C, can be with the hardness of regulation elasticity film, elasticity by the regulation of drying mode, baking temperature.
Consideration impact of the magnetic elastomeric film thickness to evaporation effect, for prevent thickness too little effectively can not accommodate particulate matter or
Or thickness is too big produces evaporation shadow region, in the present embodiment can by the adjustment of the preparation technology of film, magnetic elastomeric film film forming it
The thickness d of dry film afterwards is controlled in 15-40 μ ms, but is not limited.
The thermal expansion of consideration magnetic elastomeric film, shrink impact to opening size, for prevent magnetic elastomeric film thermal expansion,
Shrink and change opening size, and its caused consequence for blocking opening, the thermal coefficient of expansion scope of magnetic elastomeric membrane material can
Elect 30～40ppm/k as, but be not limited.
Consideration magnetic elastomeric film accommodates impact of the deformation extent of the effect of particulate matter, film to effect of fitting, and magnetic
The requirement of elastica mechanical property itself, is destroyed by particulate matter for preventing magnetic elastomeric film too soft, or magnetic elastomeric film is too hard
And effectively cannot accommodate particulate matter and cause colour mixture, the adjustment of the preparation technology of film can be passed through, by the Young mould of magnetic elastomeric film
Amount control, but is not limited by Hardness Control in the scope of 0.35～0.45GPa in the scope of 6～7Gpa.
Additionally, for preventing the circuit components during being deposited with glass substrate to be subject to electrostatic damage, used magnetic is elastic
Film has a conducting or dissipation effect to electrostatic, and the dielectric constant of magnetic elastomeric membrane material is chosen as 3.3～3.5/KHz, but not with
This is limited.
Preparation and with the photoetching and para-position of metal mask matrix 2 fit process of Fig. 4～Fig. 9 for magnetic elastomeric film.
Metal mask matrix 2 is provided with alignment mark with glass substrate 10.Magnetic elastomeric film 7 is prepared first on the glass substrate 10, such as
Shown in Fig. 4.Then, process is exposed using 22 pairs of magnetic elastomeric films 7 for being formed of metal mask matrix, as shown in Figure 5.Right
Magnetic elastomeric film after exposure is developed, and removes the part that is irradiated by light, one a pair of the part for staying and metal mask matrix
Should, formed and metal mask matrix identical opening and figure, as shown in Figure 6.For magnetic elastomeric film corresponds to metal mask
The forming method of the figure of matrix, in addition to photoetching, can also not done to this in embodiment of the present invention using the method for laser ablation
Limit.
Such as Fig. 7, optical registration is carried out to metal mask matrix 2 and glass substrate 10 with alignment mark, then the two is entered
The para-position of row pressure is fitted, and metal mask matrix 2 is combined together with magnetic elastomeric film 7.Metal mask matrix 2 and magnetic elastomeric film
7 have cohesive force and magnetic attracting power simultaneously.Then, deviate from magnetic elastomeric film with the laser of 308nm wavelength from glass substrate
Side carries out laser irradiation to magnetic elastomeric film, and radiation modality is chosen as linear scanning formula, and the time is chosen as 5～30 seconds, such as Fig. 8
Shown.As the polyimide material in magnetic elastomeric film is big to the laser absorption amount of the wavelength, scission of link or heat, distance is produced
Macromolecule within the 100nm of top layer generates heat rapidly softening, departs from glass substrate, so as to obtain as shown in Figure 9 being pasted with magnetic
The mask plate 11 of property elastica.
In the present embodiment, magnetic elastomeric film also can carry out the macromolecule of photoetching by magnetic polybutadiene alkyne derivatives with other
The composite of material composition is constituted, including phenolic resin, polyethylene terephthalate, Merlon, poly- naphthalenedicarboxylic acid second
Any one or arbitrarily several mixture of diol ester, polyacrylate, Polyetherimide, but be not limited.
The magnetic polymer material for preparing magnetic elastomeric film may also be employed other kinds of same material in macromolecule
Composite is formed in material.As shown in Figure 10, magnetic material can also be magnetic nano-particle, such as inorganic magnetic nanoparticle
Son, high molecular nano-microsphere etc..For ensureing the compatibility of particle or microsphere and macromolecular material, can pass through to control size or
To particle, microsphere in addition surface modification strengthening its compatibility with macromolecular material.This utility model used magnetic material is not
It is limited to above species, every magnetic material for being filled in macromolecular material and forming elastica, of the present utility model
In protection domain.
In addition, the magnetic polymer material for preparing magnetic elastomeric film may also be employed structure type magnetic macromolecule materials material, i.e., originally
Body has magnetic macromolecular material, such as Organic Ferromagnet, polymer-metal complex and charge-transfer complex.Equally, tie
Configuration magnetic polymer material is not limited to species listed above, in addition to magnetic polymer material, embodiment of the present utility model
In, magnetic elastomeric membrane material is not limited to composition described above, structure, composition, as long as using the magnetic elastomeric material of tool
The magnetic elastomeric film of preparation, in protection domain of the present utility model.
In the present embodiment, due to the effect of pressure para-position laminating, magnetic elastomeric film and metal mask parent metal mask
There is bonding force between matrix, while itself is inhaled with magnetic between magnetic elastomeric film and metal mask parent metal mask substrate
Gravitation, i.e. magnetic elastomeric film have double reaction plus with metal mask parent metal mask substrate, are firmly combined with, structural stability
By force.Due to having cohesive force and magnetic attracting force, magnetic elastomeric film to be brought into close contact with metal mask matrix by which each other,
Prevent the combination of the particulate matter in technical process and other interference effect magnetic elastomeric films and metal mask matrix and cause film
Damaged displacement.
With regard to magnetic elastomeric film and the combination of metal mask matrix, or magnetic elastomeric film magnetic sticker is together in gold
Category mask substrate is away from the side of vapor deposition source.Specifically, with metal mask matrix phase with figure magnetic elastomeric film with gold
Category mask substrate is pulled together by magnetic attracting force each other.In this kind of combination, due to being pressed
Power para-position laminating step, magnetic elastomeric film pass through there was only magnetic attracting force each other with metal mask matrix, but compared to pressure
Power para-position is fitted, and this kind of combination simple process is workable.
Generally during evaporation process, can there is a small amount of particulate matter 6 on glass substrate, in the present embodiment, due to elasticity
The presence of film, particulate matter cause elastica to be deformed, and particulate matter is included, or is at least partially contained in inside elastica.
As particulate matter is comprised in inside elastica, the position beyond particulate matter, glass substrate can still keep tight with elastica
Closely connected conjunction, so as to prevent diffusion of the deposition material from a sub-pixel 3 to adjacent subpixels 4, reduces particulate matter to vapor deposition accuracy
Affect, alleviate the colour mixture color offset phenomenon in the display panels, reduce display panels and colour mixture color offset phenomenon occur
Probability.
In another embodiment of the present utility model as shown in figure 11, it is with the difference of previous embodiment, magnetic bullet
Property film have opening corresponding with metal mask matrix, and the opening of magnetic elastomeric film laminating plane projection include the gold
Projection of the opening of category mask substrate in laminating plane.On arbitrary section of laminating plane, magnetic elastomeric film is opened
Opening size L2 of mouth size L1 more than the metal mask matrix.
During evaporation, magnetic elastomeric film can be produced certain expansion, be caused magnetic due to the heat effect of evaporation environment
Elastica lateral dimension increases, so as to produce certain blocking to the opening of mask plate 11.Therefore, magnetic elastomeric in the present embodiment
Opening size L2s of the opening size L1 of film more than the metal mask matrix, so as in open region metal mask matrix and magnetic
Elastica has certain interval, to compensate the expansion of magnetic elastomeric film, it is to avoid the expansion of magnetic elastomeric film is blocked to open region.
In an optional embodiment, opening size L1 0.2～3 μ bigger than the opening size L2 of metal mask matrix of magnetic elastomeric film
m.
In this specification, various pieces are described by the way of going forward one by one, and what each some importance was illustrated is and other parts
Difference, between various pieces identical similar portion mutually referring to.
The foregoing description of the disclosed embodiments, enables professional and technical personnel in the field to realize or using the present invention.
Multiple modifications of these embodiments will be apparent for those skilled in the art, as defined herein
General Principle can be realized without departing from the spirit or scope of the present invention in other embodiments.Therefore, the present invention
Embodiment illustrated herein is not intended to be limited to, and is to fit to consistent with principles disclosed herein and features of novelty
Most wide scope.
Claims (14)
1. a kind of evaporation process mask plate, it is characterised in that include：
Metal mask matrix, with multiple open regions forming specific figure；
Magnetic elastomeric film, is formed at metal mask matrix away from the side of vapor deposition source；
Wherein, the magnetic elastomeric film has and metal mask matrix identical opening, and magnetic elastomeric film para-position laminating
In metal mask matrix away from the side of vapor deposition source；Or the magnetic elastomeric film has opening corresponding with metal mask matrix,
And para-position fits in metal mask matrix away from the side of vapor deposition source, the opening of the metal mask matrix is in the throwing of plane of fitting
The opening that shadow falls in the magnetic elastomeric film is in the drop shadow spread of laminating plane.
2. mask plate as claimed in claim 1, it is characterised in that magnetic elastomeric film is bonded in metal mask matrix away from evaporation
The side in source.
3. mask plate as claimed in claim 1, it is characterised in that magnetic elastomeric film is by magnetic sticker together in metal mask matrix
Side away from vapor deposition source.
4. mask plate as claimed in claim 1, it is characterised in that the magnetic elastomeric film is magnetic polymer material.
5. mask plate as claimed in claim 4, it is characterised in that the magnetic polymer material is magnetic material and macromolecule
The composite of material.
6. mask plate as claimed in claim 5, it is characterised in that the magnetic material is polybutadiene alkyne derivatives.
7. mask plate as claimed in claim 5, it is characterised in that the macromolecular material in the magnetic elastomeric film is sense
Luminescent material.
8. mask plate as claimed in claim 1, it is characterised in that the magnetic elastomeric film thickness is 15-40 μm.
9. mask plate as claimed in claim 1, it is characterised in that the magnetic elastomeric film has corresponding with metal mask matrix
Opening, and para-position fits in metal mask matrix away from the side of vapor deposition source, and the opening of the metal mask matrix is in laminating
Plane projection fall the magnetic elastomeric film opening laminating plane drop shadow spread in；
On arbitrary section of laminating plane, the opening size of the magnetic elastomeric film is more than the metal mask matrix
Opening size.
10. mask plate as claimed in claim 9, it is characterised in that on arbitrary section of laminating plane, the magnetic
The opening size of property elastica is bigger than the opening size of the metal mask matrix 0.2～3 μm.
11. mask plates as claimed in claim 1, it is characterised in that the thermal coefficient of expansion of the magnetic elastomeric film be 30～
40ppm/k.
12. mask plates as claimed in claim 1, it is characterised in that the Young's moduluss of the magnetic elastomeric film are 6～7Gpa.
13. mask plates as claimed in claim 1, it is characterised in that the hardness of the magnetic elastomeric film be 0.35～
0.45GPa.
14. mask plates as claimed in claim 1, it is characterised in that the dielectric constant of the magnetic elastomeric film is 3.3～3.5/
KHz.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521047084.0U CN206015072U (en) | 2015-12-15 | 2015-12-15 | A kind of evaporation process mask plate |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521047084.0U CN206015072U (en) | 2015-12-15 | 2015-12-15 | A kind of evaporation process mask plate |
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| CN206015072U true CN206015072U (en) | 2017-03-15 |
Family
ID=58240955
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| CN201521047084.0U Active CN206015072U (en) | 2015-12-15 | 2015-12-15 | A kind of evaporation process mask plate |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106929797A (en) * | 2017-03-23 | 2017-07-07 | 京东方科技集团股份有限公司 | Vacuum evaporation mask, mask preparation method and evaporation pattern |
| CN107574408A (en) * | 2017-08-18 | 2018-01-12 | 武汉华星光电半导体显示技术有限公司 | A kind of high polymer mask version and preparation method thereof and application |
| CN108396285A (en) * | 2018-03-19 | 2018-08-14 | 京东方科技集团股份有限公司 | Mask plate, display base plate and preparation method thereof, display device |
| CN109097727A (en) * | 2018-08-01 | 2018-12-28 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof and display device |
| CN110048026A (en) * | 2018-01-17 | 2019-07-23 | 上海视涯信息科技有限公司 | Oled panel manufacturing system, the device for being used to form interim pairing unit |
| CN110453173A (en) * | 2019-07-29 | 2019-11-15 | 京东方科技集团股份有限公司 | The production method of mask plate and preparation method thereof, oled display substrate |
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2015
- 2015-12-15 CN CN201521047084.0U patent/CN206015072U/en active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106929797A (en) * | 2017-03-23 | 2017-07-07 | 京东方科技集团股份有限公司 | Vacuum evaporation mask, mask preparation method and evaporation pattern |
| CN106929797B (en) * | 2017-03-23 | 2019-04-19 | 京东方科技集团股份有限公司 | Vacuum evaporation exposure mask, exposure mask preparation method and vapor deposition pattern |
| CN107574408A (en) * | 2017-08-18 | 2018-01-12 | 武汉华星光电半导体显示技术有限公司 | A kind of high polymer mask version and preparation method thereof and application |
| WO2019033481A1 (en) * | 2017-08-18 | 2019-02-21 | 武汉华星光电半导体显示技术有限公司 | Polymer mask and manufacturing method therefor and use thereof |
| CN107574408B (en) * | 2017-08-18 | 2019-06-25 | 武汉华星光电半导体显示技术有限公司 | A kind of high polymer mask version and preparation method thereof and application |
| CN110048026A (en) * | 2018-01-17 | 2019-07-23 | 上海视涯信息科技有限公司 | Oled panel manufacturing system, the device for being used to form interim pairing unit |
| CN108396285A (en) * | 2018-03-19 | 2018-08-14 | 京东方科技集团股份有限公司 | Mask plate, display base plate and preparation method thereof, display device |
| CN109097727A (en) * | 2018-08-01 | 2018-12-28 | 京东方科技集团股份有限公司 | Mask plate and preparation method thereof and display device |
| CN110453173A (en) * | 2019-07-29 | 2019-11-15 | 京东方科技集团股份有限公司 | The production method of mask plate and preparation method thereof, oled display substrate |
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Effective date of registration: 20211104 Address after: No.8, liufangyuan Henglu, Donghu New Technology Development Zone, Wuhan City, Hubei Province Patentee after: WUHAN TIANMA MICRO-ELECTRONICS Co.,Ltd. Patentee after: Wuhan Tianma Microelectronics Co.,Ltd. Shanghai Branch Patentee after: Tianma Micro-Electronics Co.,Ltd. Address before: 201201, 889, Qing Qing Road, Shanghai, Pudong New Area Patentee before: SHANGHAI TIANMA AM-OLED Co.,Ltd. Patentee before: Tianma Micro-Electronics Co.,Ltd. |