CN205982437U - Electromagnetic wave propagation characteristic testing arrangement among low temperature plasma - Google Patents
Electromagnetic wave propagation characteristic testing arrangement among low temperature plasma Download PDFInfo
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- CN205982437U CN205982437U CN201620855612.3U CN201620855612U CN205982437U CN 205982437 U CN205982437 U CN 205982437U CN 201620855612 U CN201620855612 U CN 201620855612U CN 205982437 U CN205982437 U CN 205982437U
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Abstract
The utility model discloses an electromagnetic wave propagation characteristic testing arrangement among low temperature plasma, including the plasma generating chamber body, still including setting up internal cyclic annular high voltage electrode and the cyclic annular ground electrode in plasma generating chamber, cyclic annular high voltage electrode and cyclic annular ground electrode are insulating to be connected, the inner wall fixed connection of cyclic annular ground electrode and the plasma generating chamber body. The device utilizes the technique of the inside no electrical potential difference of plasma that glow discharge produced under the low pressure, make the plasma pot stability extension that produces, do benefit to each frequency channel electromagnetic wave propagation characteristics in plasma of research, for electromagnetic absorption and the scattering effect of research plasma to incident, to the atmospheric tracing identification of the aircraft reentry technique of exploring the space field, the plasma stealth technology, plasma disappears noise technique and plasma antenna technology etc. Provides a good experimental environment, very high scientific experiments using value and market prospect have.
Description
Technical field
This utility model belongs to radio wave propagation experimental test technical field, electricity in more particularly, to a kind of low temperature plasma
Electromagnetic wave propagation characteristic test device.
Background technology
Plasma is made up of the free electron with charge equivalence, cation and neutral atom, be material exist the
Four kinds of states.Plasma, as a kind of special dispersive medium, has absorption, reflection and the scattering of uniqueness special to electromagnetic wave
Property；When electromagnetic wave is propagated in the plasma, its electric field will produce active force to free electron and cation, thus affecting electricity
Magnetic wave propagation characteristic in the plasma, especially plasma for the absorption of incident plane wave, scattering process, to exploration
The reentry body Tracking Recognition technology of space field, Plasma Stealth Technology are with, plasma de-noising audio technology and plasma
Body antenna technical elements etc. all have great importance.
Research low temperature plasma is mainly on the plasma producing method of the ground experiment that electromagnetic wave propagation affects at present
Sharp tube method and artificial plasma.Sharp tube method, by the way of blast, produces the shock wave of hypersonic, by compression test section
Thus producing plasma, it is hundreds of micro- that this high speed shock wave containing plasma passes through the time of electromagnetic wave trial zone to only have to gas
Second, wherein stable phase is only capable of maintaining about tens of microseconds；Measurement due to propagation properties must complete in stable phase, this
Sample be accomplished by by high-speed sampling and clocked flip mechanism so that test that difficulty is big, inefficiency and repeatability is poor；This
Outward, the cavity that sharp tube method adopts mostly is quartzy tube chamber, and this cavity is fragile, and experimental repeatability is poor.On the other hand, artificial etc.
The plasma that gas ions are produced using microwave, electric arc and plasma jet is although can work long hours, also more steady
Fixed, but there is high temperature due in environment, its electron density is difficult to measure, and control accuracy is low.
Utility model content
For the defect in the presence of above-mentioned background technology and problem, this utility model purpose be provide a kind of low temperature etc. from
Propagation properties test device in daughter.This device utilizes no electric inside the plasma that under low pressure, glow discharge produces
The technology of potential difference, makes the plasma stability phase of generation extend, beneficial to research multiple frequency range electromagnetic wave biography in the plasma
Broadcast characteristic, and the argon-arc plasma field producing evenly, density and energy higher.
In order to achieve the above object, this utility model provides following technical scheme：
Propagation properties test device in a kind of low temperature plasma of the present utility model, including plasma generation cavity
Body, also includes ring-type high-field electrode and the ring-type ground electrode being arranged in plasma generation cavity body, described ring-type high-field electrode and
Annularly electrode insulation connects, and the inwall that described ring-type ground electrode occurs cavity with plasma is fixedly connected.
Further, described annularly electrode includes inner ring ring-type ground electrode and outer ring ring-type ground electrode, described interior ring
Shape ground electrode and outer ring ring-type ground electrode concentric locking collar set；Wherein, to be arranged on described inner ring annularly electric for described ring-type high-field electrode
Between pole and outer ring ring-type ground electrode, and annularly electrode insulation is connected with described inner ring ring-type ground electrode and outer ring respectively.
Further, described ring-type high-field electrode and ring-type ground electrode are metal electrode；Wherein, ring-type high-field electrode table
Face is network structure.
Further, described plasma occurs the cavity shape of cavity is cylinder, its side wall opens up air inlet, gives vent to anger
Mouth, observation window and plasma concentration detection mouth.
Further, propagation properties test device in described low temperature plasma, also includes chamber door, described etc.
It is chamber door that ion occurs a bottom surface of cavity；Wherein, described chamber door arranges anchor switch.
Further, propagation properties test device in described low temperature plasma, also includes vacuum system, institute
State the vacuum orifice of vacuum system and described plasma occurs cavity to connect.
Further, propagation properties test device in described low temperature plasma, also includes plasma and occurs
Power supply and high-voltage connecting line box, described plasma occurs power supply to be connected with described ring-type high-field electrode by described high-voltage connecting line box.
Further, propagation properties test device in described low temperature plasma, also includes control system, institute
State control system and include control main frame and control panel, described control panel is electrically connected with described control main frame；Described control is led
Machine occurs power supply and the control end control of described vacuum system to be connected respectively with described plasma.
Preferably, propagation properties test device in described low temperature plasma, also includes switch board, described etc.
Gas ions occur cavity to be fixed on described switch board, and described plasma occurs power supply, vacuum system and control main frame to be arranged on
Inside described switch board, described control panel is embedded the surface in described switch board.
Preferably, propagation properties test device in described low temperature plasma, also includes footing, described footing
It is connected to the bottom of described switch board.
In a kind of low temperature plasma of the present utility model radio wave propagation experimental device compared with prior art, its beneficial effect
It is really：This test device utilizes the technology of the plasma that under low pressure, glow discharge produces internal potential-free difference, by high-tension electricity
Pole and ground electrode are set to the circulus of concentric, by additional power source energisation mode, produce high-power and stable height
Frequency high voltage electric field, and high-field electrode is input to by high-head, the gas that the plasma of certain vacuum degree is occurred inside cavity hits
Wear, produce plasmon, ensure the presence steady in a long-term of its plasma field simultaneously；This plasma field not only stable and uniform,
And density is high, energy high.Therefore, this device produce long lasting for plasma, largely reduce electromagnetism
The difficulty of wave propagation characteristic test experiments research, and beneficial to research multiple frequency range electromagnetic wave, propagation in the plasma is special
Property, substantial amounts of and reproducible experimental data can be obtained at short notice.On the other hand, this characteristic test device energy
Enough produce unmagnetized and internal potential-free is poor, uncharged plasma, by the circle of ring-type high-field electrode surface mesh structure
Hole uniformly diffuses to whole plasma and inside cavity occurs, and does not have metal barrier on the electromagnetic wave propagation path in cavity simultaneously
Thing, can avoid the interference phenomenon that electromagnetic wave occurs in communication process.This device is research plasma for plane of incidence
The absorption of ripple and scattering process, the aircraft to exploration space field reenter air Tracking Recognition technology, Plasma Stealth skill
Art, plasma de-noising audio technology and plasma antenna technology provide a good experimental situation, have very high section
Learn experimental applications to be worth and market prospect.
Brief description
Below in conjunction with the accompanying drawings this utility model is further illustrated.
Propagation properties test device structural representation in a kind of low temperature plasma that Fig. 1 provides for this utility model
Figure；
Propagation properties test device side-looking structure in a kind of low temperature plasma that Fig. 2 provides for this utility model
Schematic diagram；
Propagation properties test device part knot in a kind of low temperature plasma that Fig. 3 provides for this utility model
Structure schematic diagram.
Description of reference numerals：
1st, switch board, 2, footing, 3, plasma there is cavity, 4, control panel, 5, plasma there is power supply, 6, vacuum system
System, 7, ring-type high-field electrode, 8, inner ring ring-type ground electrode, 81, outer ring ring-type ground electrode, 9, gas outlet, 10, high-voltage connecting line box,
11st, insulated column, 12, observation window, 13, plasma concentration survey meter interface, 14, air inlet, 15, anchor switch.
Specific embodiment
Below in conjunction with the accompanying drawings, a specific embodiment of the present utility model is described in detail, these accompanying drawings are
Simplify schematic diagram, only in a schematic way illustrate utility model basic structure, therefore its only show relevant with this utility model
Composition.
Propagation properties test device in a kind of low temperature plasma, specifically as Figure 1-3, including：By controlling
Cabinet 1 occurs cavity 3 to constitute with the plasma being fixedly installed on cabinet upper center position；Plasma occurs to set in cavity 3
There are ring-type high-field electrode 7, inner ring ring-type ground electrode 8 and outer ring ring-type ground electrode 81, inner ring ring-type ground electrode 8 and outer ring annularly
Electrode 81 is sheathed with one heart；Wherein, ring-type high-field electrode 7 is arranged on above-mentioned inner ring ring-type ground electrode 8 and outer ring ring-type ground electrode 81
Between, and be connected by insulated column 11 with inner ring ring-type ground electrode and outer ring ring-type ground electrode respectively；Ring-type high-field electrode 7, interior
Loop ground electrode 8 and outer ring ring-type ground electrode 81 are metal ring electrode, and the surface of ring-type high-field electrode 7 is netted knot
Structure；The inwall that above-mentioned inner ring ring-type ground electrode 8 occurs cavity 3 with plasma respectively with outer ring ring-type ground electrode 81 is fixedly connected；
Occur, below cavity 3, to be provided with high-voltage connecting line box 10 with switch board 1 connecting portion in above-mentioned plasma；Set in above-mentioned switch board 1
There is plasma that power supply 5 occurs, plasma occurs power supply 5 to be connected with ring-type high-field electrode 7 by high-voltage connecting line box 10；Plasma is sent out
The side of raw power supply 5 is provided with vacuum system 6, and the present embodiment is preferably vacuum pump, the vacuum orifice of vacuum pump and above-mentioned plasma
Body occurs cavity 3 to connect；It is provided with control main frame, switch board 1 surface is embedded control panel 4, above-mentioned control panel 4 in switch board 1
Electrically connect with control main frame；Control main frame occurs power supply 5 and the control end control of vacuum pump to be connected respectively with above-mentioned plasma.
Ground wire is drawn respectively on above-mentioned inner ring ring-type ground electrode 8 and outer ring ring-type ground electrode 81 and is connected to plasma generation
On cavity 3, making between the plasma window region of generation is zero point position, is easy to arrange electron probe；Control main frame in switch board 1
Occur power supply 5, vacuum pump 6 to be connected with plasma respectively, and then be easy to arrange test parameterss by control panel 4, carry out man-machine
Interactive controlling.
Wherein, plasma occurs cavity 3 surface also to open up air inlet 14, gas outlet 9, observation window 12 and plasma concentration
Survey meter interface 13；Before producing plasma, by vacuum pump 6 by plasma generation cavity 3 evacuation, then by air inlet
14 to inside cavity be passed through argon, helium, etc. noble gases, simulate the stable atmosphere of different plasma fields, be convenient for
Subsequent experimental；Plasma concentration survey meter is connected on plasma concentration survey meter interface 13 by standard CF35 flange, surveys
Determine plasma density when different electrical power voltage, different vacuum and gas with various atmosphere.
It is cylinder that the plasma of this device occurs cavity 3 inner chamber, and one bottom surface is chamber door, and chamber door is provided with lock
Plasma cavity 3 freely to open and close by anchor switch 15 by switch 15 can occur；The bottom of switch board 1 is additionally provided with footing 2,
Make whole experimental provision safety and stability.
In carrying out low temperature plasma during electromagnetic wave propagation experiment, electromagnetic radiation and receiving device are placed on control
There are cavity 3 both sides in the plasma on cabinet；Switch on power, open this experimental provision, on controlling liquid crystal display screen, set electricity
Vacuum in source voltage and cavity, after low temperature plasma to be extracted into setting vacuum in cavity 3 by vacuum pump 6 occurs, etc.
Ion power supply generator 5 produces high-frequency high-voltage, is input to high-field electrode 7 by high-head, by plasma generation cavity 3
Gas breakdown, produces poor, the unmagnetized plasma of potential-free between high-field electrode 7 and ground electrode, then by between electrode
Interstitial diffusion to whole cavity, form uniform and stable plasma medium field, now can carry out in low temperature plasma
Electromagnetic wave propagation experimentation.
Discussed above is enlightenment according to desirable embodiment of the present utility model, by above-mentioned discussion explanation, operator
Various change and modification can be carried out in the range of without departing from this utility model technological thought completely.This practicality
The content that new technical scope is not limited in description it is necessary to determine its technical scope according to scope.
Claims (10)
1. propagation properties test device in a kind of low temperature plasma, including plasma occur cavity it is characterised in that
Also include ring-type high-field electrode and the ring-type ground electrode being arranged in plasma generation cavity body, described ring-type high-field electrode and ring-type
Ground electrode insulation connects, and the inwall that described ring-type ground electrode occurs cavity with plasma is fixedly connected.
2. in a kind of low temperature plasma according to claim 1 propagation properties test device it is characterised in that
Described annularly electrode includes inner ring ring-type ground electrode and outer ring ring-type ground electrode, described inner ring ring-type ground electrode and outer loop
Ground electrode is sheathed with one heart；Wherein, described ring-type high-field electrode is arranged on described inner ring ring-type ground electrode and outer ring ring-type ground electrode
Between, and annularly electrode insulation is connected with described inner ring ring-type ground electrode and outer ring respectively.
3. in a kind of low temperature plasma according to claim 1 propagation properties test device it is characterised in that
Described ring-type high-field electrode and ring-type ground electrode are metal electrode；Wherein, ring-type high-field electrode surface is network structure.
4. in a kind of low temperature plasma according to claim 1 propagation properties test device it is characterised in that
It is cylinder that described plasma occurs the cavity shape of cavity, and its side wall opens up air inlet, gas outlet, observation window and plasma
Concentration Testing mouth.
5. in a kind of low temperature plasma according to claim 4 propagation properties test device it is characterised in that
Also include chamber door, it is chamber door that described plasma occurs a bottom surface of cavity；Wherein, described chamber door arranges anchor switch.
6. propagation properties test device in a kind of low temperature plasma according to any one of claim 1 to 5,
It is characterized in that, also include vacuum system, the vacuum orifice of described vacuum system occurs cavity to connect with described plasma.
7. in a kind of low temperature plasma according to claim 6 propagation properties test device it is characterised in that
Also include plasma and power supply and high-voltage connecting line box occur, described plasma occurs power supply by described high-voltage connecting line box and described ring
Shape high-field electrode connects.
8. in a kind of low temperature plasma according to claim 7 propagation properties test device it is characterised in that
Also include control system, described control system includes control main frame and control panel, described control panel and described control main frame
Electrical connection；Described control main frame occurs power supply and the control end control of described vacuum system to be connected respectively with described plasma.
9. in a kind of low temperature plasma according to claim 8 propagation properties test device it is characterised in that
Also include switch board, described plasma occurs cavity to be fixed on described switch board, and described plasma occurs power supply, vacuum system
System and control main frame are arranged on inside described switch board, and described control panel is embedded the surface in described switch board.
10. propagation properties test device in a kind of low temperature plasma according to claim 9, its feature exists
In also including footing, described footing is connected to the bottom of described switch board.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620855612.3U CN205982437U (en) | 2016-08-09 | 2016-08-09 | Electromagnetic wave propagation characteristic testing arrangement among low temperature plasma |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620855612.3U CN205982437U (en) | 2016-08-09 | 2016-08-09 | Electromagnetic wave propagation characteristic testing arrangement among low temperature plasma |
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| CN205982437U true CN205982437U (en) | 2017-02-22 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106124868A (en) * | 2016-08-09 | 2016-11-16 | 南京苏曼等离子科技有限公司 | Propagation properties test device in a kind of low temperature plasma |
| CN108957162A (en) * | 2017-05-24 | 2018-12-07 | 罗德施瓦兹两合股份有限公司 | For testing the anechoic chamber, of equipment under test |
-
2016
- 2016-08-09 CN CN201620855612.3U patent/CN205982437U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106124868A (en) * | 2016-08-09 | 2016-11-16 | 南京苏曼等离子科技有限公司 | Propagation properties test device in a kind of low temperature plasma |
| CN108957162A (en) * | 2017-05-24 | 2018-12-07 | 罗德施瓦兹两合股份有限公司 | For testing the anechoic chamber, of equipment under test |
| CN108957162B (en) * | 2017-05-24 | 2022-06-28 | 罗德施瓦兹两合股份有限公司 | Anechoic chamber for testing device under test |
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