CN208317091U - Dielectric material surface potential active control system under high vacuum environment - Google Patents
Dielectric material surface potential active control system under high vacuum environment Download PDFInfo
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- CN208317091U CN208317091U CN201721628977.3U CN201721628977U CN208317091U CN 208317091 U CN208317091 U CN 208317091U CN 201721628977 U CN201721628977 U CN 201721628977U CN 208317091 U CN208317091 U CN 208317091U
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Abstract
The utility model discloses dielectric material surface potential active control systems under a kind of high vacuum environment, including plasma source body, microwave system and air supply system, microwave system includes microwave power supply system and microwave transmission system, microwave power supply system will be in the plasma room of microwave transmission to plasma source body by microwave transmission system, air supply system includes gas storing system and gas control system, and it is 10 that the plasma that plasma source body generates, which imports vacuum degree,‑4In Pa vacuum chamber below, and working gas is punctured in plasma room by microwave co-axial antenna, form plasma, annular permanent magnet steel in plasma room is for generating magnetic field, and magnetic field strength be 0.0875 tesla at form highdensity Ecr plasma, it is formed by plasma and workpiece environment to be processed is diffused to by plasma adjustable plate comprising electronics and ion, realize that the active of barrier surface charge is adjusted.
Description
Technical field
The utility model belongs to plasma and material phase separation field of scientific study, and in particular to a kind of high vacuum environment
Lower dielectric material surface potential active control system.
Background technique
Spacecraft in orbit during, surface is by space plasma, high energy electron, solar radiation, spatial charging dirt
The influence of angstrom equal environment, it may occur however that the phenomenon that static charge accumulation and leakage.This charge and discharge process may cause space flight equipment
Breakdown, the material surface property decline of material make solar cell, electronic device and the decline of optical sensor performance or damage；
The strong electromagnetic pulse that this charge and discharge process generates simultaneously can severe jamming spacecraft interior instrument system, generate exception, failure,
Failure even results in spacecraft and scraps, and will seriously affect the execution of great space tasks.Therefore, to Satellite surface potential into
Row effectively control is for ensureing that spacecraft in-orbit safe and stable operation in China's has very important significance.
The adverse circumstances in space are (such as ultralow temperature, extremely low vacuum, high energy electron ion irradiation) complicated and changeable, conventional available
The mode (such as humidifying air, corona discharge) that destatics of ground will be unable to using.Presently, there are dielectric surface current potential control
Method processed is mainly divided to passive type control and active two kinds of control, the former the active control that compares is more flexible effectively and thorough
Bottom.There are mainly three types of the charged particle lines usually emitted: electron beam, ion beam and plasma beam, wherein electron beam and from
Beamlet is single electrical particle flux.International space station (ISS) uses the hollow cathode component of launching electronics, is emitted by it
Electronic beam current a kind of low impedance path is provided between space station and space plasma environment, reduce and control space station table
Face current potential, this hollow plasma source electron emissivity is strong, but ion is less, and power consumption is larger, and neutralization is not thorough.European Space Agency
A kind of ion source Active Control Method is proposed, accelerates to spray shape using the voltage of liquid metal evaporation, ionization and accelerated pole
At ion beam, but the structure of this ion source is complex, and can only neutralize negative potential, cannot neutralize positive potential, while can band
Carry out unfavorable material contamination etc..Because the severe changeable and position of aircraft of space environment changes often, aircraft table
The current potential amplitude of face dielectric material may change at any time with polarity, if aircraft surface faces south, and space plasma
When volume density and very low energy, aircraft surface can the lower positive potential of energy band；And if aircraft surface carries on the back sun, and space etc.
When the density and high energy of gas ions, satellite surface can the very high negative potential of energy band.It therefore will using the plasma beam of low energy
Current potential active control mode than electron beam and ion beam is more effective, by can the current potential to dielectric surface effectively adjusted
Control.Russian's Mir space station realizes barrier surface charge in space using a kind of pulsed plasma source, has structure letter
It is single, neutralize the features such as high-efficient, the operation is stable, but the pulsed plasma source is divided by high-temperature electric arc ablation working medium surfacing
It solves and ionization generates plasma, energy consumption is high and consumes solid material.
Utility model content
The technical problem to be solved by the utility model is to provide dielectric material surface potential masters under a kind of high vacuum environment
Autocontrol system, 10-4Under Pa high vacuum environment below, 2.45GHz microwave is fed by coaxial waveguide in a tem mode
Puncture working gas in plasma room positioned at the indoor plasma source body of vacuum, and by microwave co-axial antenna, is formed
Plasma, the annular permanent magnet steel in plasma room are used to generate magnetic field, and are 0.0875 tesla in magnetic field strength
Electron cyclotron resonace, which occurs, for place accelerates electronics, to make gas ionization, forms highdensity Ecr plasma,
It is formed by plasma and workpiece environment to be processed is diffused to by plasma adjustable plate comprising electronics and ion, realize medium
The active of surface charge is adjusted.
In order to solve the above technical problems, the technical solution adopted in the utility model is: medium material under a kind of high vacuum environment
Expect surface potential active control system, including plasma source body, microwave system, air supply system and vacuum system, the microwave
System includes the microwave generator and microwave transmission system for generating 2.45GHz microwave, and the microwave generator is by microwave electricity
Source and magnetron are constituted；Its microwave generated of the microwave generator is transmitted to plasma source body by microwave transmission system
In plasma room；The air supply system include gas storing system and for control enter plasma room in gas air pressure
With the gas control system of flow, the gas of the gas storing system is passed through the plasma of plasma source body by air inlet pipe
Body room, the vacuum system include vacuum chamber, and the vacuum chamber is provided with the potentiometer for tested media material surface current potential
With the dielectric material and dielectric material placement platform of surface potential to be controlled, its vacuum degree of vacuum chamber is 10-4Pa or less；It is described
Its plasma generated of plasma source body imports in vacuum chamber, and acts on the dielectric material table of surface potential to be controlled
Face.
Further, the plasma source body includes that air inlet pipe, microwave co-axial antenna, annular permanent magnet steel, magnet steel are fixed
Sleeve and plasma adjustable plate, the magnet steel fixes sleeve are the open tubular structure in lower end, microwave co-axial antenna and into
Tracheae is inserted into its inner cavity from the closed end of magnet steel fixes sleeve, and the annular permanent magnet steel is fixedly mounted in magnet steel fixes sleeve
Side, and be centered around on the outside of microwave co-axial antenna, the plasma adjustable plate is fixedly mounted on the open end of magnet steel fixes sleeve,
The annular permanent magnet steel, magnet steel fixes sleeve, plasma adjustable plate and microwave co-axial antenna constitute plasma chamber.
Interior occurs for adjusting plasma still further, being provided at least one on the plasma adjustable plate
The reaction gas particle beams, and adjust the plasma parameter that Driftdiffusion goes out, including plasma density, plasma body temperature
The adjustment hole of degree and plasma potential；The adjustment hole is rounded, triangle, diamond shape, square, pentagon, hexagon
Or other polygonized structures；The plasma adjustable plate is by aluminium, magnetism-free stainless steel, copper, polyfluortetraethylene plate, plastic plate or ring
Oxygen plate is made.
It is set in vacuum chamber still further, the plasma source body helps sealing through the remote operating bar of vacuum chamber,
Plasma source body is mounted on remote operating boom end, the plasma source body by means of fixed ring and plasma source body case
Shell is connected by means of fixed ring with remote operating bar, and the plasma source body is mounted on plasma source body case lower end, institute
Stating remote operating bar, it is fixedly mounted away from a side end of plasma source body and potentiometer.
Further, the current potential is calculated as contactless electrometer.
Still further, the microwave transmission system includes coaxial waveguide, tuner, directional coupler, air load, inspection
Wave device, coaxial cable and microwave co-axial antenna, the coaxial waveguide are connect by coaxial plug with isolator, and isolator passes through same
Axis waveguide is connect with directional coupler, and wave detector air load is mounted on directional coupler, and directional coupler passes through coaxial
Cable is connect with three pin tuners of the impedance matching for adjusting microwave transmission route, and three pin tuners are same by sealing
Axis connection end is docked with vacuum chamber, and three its output end of pin tuner are same by the microwave that coaxial cable connects plasma source body
Axis antenna, and working gas is punctured in plasma room by microwave co-axial antenna and forms plasma, plasma passes through
Plasma adjustable plate Driftdiffusion acts on the dielectric material surface of surface potential to be controlled to vacuum chamber.
Still further, the coaxial cable is to be used for transmission microwave, realize that the flexible radio frequency of a wide range of remote operating is same
Shaft cable line.
Further, its working gas of the gas storing system is inert gas, active gases or mixed gas；Institute
Its working gas of the gas storing system stated is carried by pressure vessel or compressor is compressed from exterior space and obtained.
Still further, the inert gas is one of helium, neon, argon, krypton, xenon, radon, the active gases or mixing
Gas is one of nitrogen, oxygen, air, hydrogen.
Further, the microwave generator is continuous operation mode or pulse working mode；The pulsed operation mould
Its pulsewidth, duty ratio, run duration are adjustable under formula.
Still further, the plasma source body completes remote sensing operation, the plasma tune by remote operating bar
Save distance of the plate apart from sample placement platform, adjustable angle.
The beneficial effects of adopting the technical scheme are that 10-4It, will under Pa high vacuum environment below
2.45GHz microwave passes through coaxial waveguide in a tem mode and is fed into positioned at the indoor plasma source body of vacuum, and same by microwave
Axis antenna punctures working gas in plasma room, forms plasma, and the annular permanent magnet steel in plasma room is used
It is that electron cyclotron resonace occurs at 0.0875 tesla to accelerate electronics in generation magnetic field, and in magnetic field strength, to make gas
Ionization, forms highdensity Ecr plasma, be formed by plasma include electronics and ion by etc. from
Daughter adjustable plate diffuses to workpiece environment to be processed, realizes that the active of barrier surface charge is adjusted；Still further aspect, plasma
Magnetic field size and bit-type required for source body is generated using annular permanent magnet steel greatly reduce the size and again of plasma source body
Amount, convenient for being used in the particular surroundings of maximum weight；Using the radio frequency coaxial-cable of high-flexibility by microwave transmission to plasma
Body source body, plasma source body are mounted on remote operating bar, and the large spatial scale for effectively increasing plasma source body can operate
Property；Generated plasma stable discharging and can work under extremely low air pressure in the utility model；By in plasma
Plasma adjustable plate is installed in source body lower end, one or more plasma diffusion hole is arranged on plasma adjustable plate, can
Effectively to adjust the parameters such as plasma density and plasma electron temperature, and then Effective Regulation clamp voltage；This is practical new
Plasma source body running temperature used in type is low, and melted material is not present, pollution-free, the service life is long.
Detailed description of the invention
Fig. 1 is the structural block diagram of the utility model.
Fig. 2 is the partial schematic diagram of microwave generation and Transmission system.
Fig. 3 is the partial schematic diagram of microwave generation and Transmission system.
Fig. 4 is action of plasma in sample stage surface sample schematic diagram.
Fig. 5 microwave ECR plasma source body structural schematic diagram.
Fig. 6 microwave ECR electric discharge schematic diagram.
The magnetic field amplitude and distribution map of Fig. 7 annular permanent magnet.
Fig. 8 permanent magnetism microwave ECR plasma density simulation result diagram.
Fig. 9 is saturated ion stream and plasma density with microwave current variation diagram.
The positive and negative current potential electric eliminating temporal evolution analogous diagram of Figure 10 medium plate surface.
In the accompanying drawings: 1, magnetron；2, first segment coaxial waveguide；3, isolator；4, second segment coaxial waveguide；5, coupling is oriented
Clutch；6, wave detector；9, coaxially connected end is sealed；10, remote operating bar；11, air load；12, flexible coaxial cable line；13,
Three pin tuners；14, rubber tube；15, vacuum chamber；16, potentiometer；17, fixed ring；18, plasma source body case；19,
Plasma source body；20, dielectric material；21, air inlet pipe；22, microwave co-axial antenna；24, annular permanent magnet steel；25, magnet steel is fixed
Sleeve；27, plasma chamber；28, plasma adjustable plate；29, adjustment hole.
Specific embodiment
Below with reference to the attached drawing in the utility model embodiment, the technical scheme in the embodiment of the utility model is carried out clear
Chu is fully described by, it is clear that and described embodiment is only a part of the embodiment of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
Many details are explained in the following description in order to fully understand the utility model, but this is practical new
Type can also be implemented using other than the one described here other way, and those skilled in the art can be without prejudice to this reality
With doing similar popularization in the case where novel intension, therefore the utility model is not limited by the specific embodiments disclosed below.
Referring to attached drawing 1-3 and attached drawing 5, the utility model discloses dielectric material surface potential masters under a kind of high vacuum environment
Autocontrol system, including plasma source body, microwave system, air supply system and vacuum system, the microwave system include being used for
The microwave generator and microwave transmission system of 2.45GHz microwave are generated, the microwave generator is by microwave power supply and magnetron structure
At；Its microwave generated of the microwave generator is transmitted to the plasma chamber of plasma source body 19 by microwave transmission system
In 27；The microwave generator is continuous operation mode or pulse working mode；Its pulsewidth under the pulse working mode accounts for
It is empty than, run duration is adjustable；The air supply system includes gas storing system and enters plasma chamber 27 for controlling
The gas of the air pressure of interior gas and the gas control system of flow, the gas storing system is passed through plasma by air inlet pipe 21
The plasma chamber 27 of body source body, its working gas of the gas storing system are inert gas, active gases or gaseous mixture
Body；Its working gas of the gas storing system is carried by pressure vessel or compressor is compressed from exterior space and obtained；Institute
Stating inert gas is one of helium, neon, argon, krypton, xenon, radon, the active gases or mixed gas be nitrogen, oxygen, air,
One of hydrogen；The vacuum system includes vacuum chamber 15, and the vacuum chamber is provided with for tested media material surface electricity
The potentiometer 16 of position and the dielectric material 20 and dielectric material placement platform of surface potential to be controlled, its vacuum degree of vacuum chamber exist
10-4Pa or less；Its plasma generated of the plasma source body imports in vacuum chamber 15, and acts on control surface electricity to be controlled
The dielectric material surface of position.
Referring to attached drawing 4-5, the plasma source body 19 includes air inlet pipe 21, microwave co-axial antenna 22, annular permanent magnet steel
24, magnet steel fixes sleeve 25 and plasma adjustable plate 28, the magnet steel fixes sleeve 25 are the open tubular structure in lower end,
Microwave co-axial antenna 22 and air inlet pipe 21 are inserted into its inner cavity from the closed end of magnet steel fixes sleeve 25, and the annular permanent magnet steel 24 is solid
Dingan County is centered around 22 outside of microwave co-axial antenna mounted in 25 inside of magnet steel fixes sleeve, and the plasma adjustable plate 28 is solid
Dingan County is mounted in the open end of magnet steel fixes sleeve 25, the annular permanent magnet steel 24, magnet steel fixes sleeve 25, plasma adjustable plate
28 constitute plasma chamber 27 with microwave co-axial antenna 22；It is set by the use and compact microwave antenna structure of annular permanent magnet
Meter, the plasma source body 19 addressed is 4cm long, diameter about 2.5cm, weight 1kg, the power consumption in the course of discharge 20W~100W, plasma
Permanent magnetism steel dimensions in body source body 19 are small light-weight, and structure can be annular permanent magnet steel, are also possible to bar shaped permanent-magnet steel composition
Magnetic steel array, the material of permanent-magnet steel can be high temperature resistant rubidium iron boron (NdFeB), SmCo (SmCo), alnico (AlNiCo) etc..
Referring to attached drawing 4, the plasma source body 19 is by means of sealing the remote operating bar 10 through vacuum chamber 15 set on true
In empty room 15, plasma source body 19 is mounted on 10 end of remote operating bar by means of fixed ring 17 and plasma source body case 18
Portion, the plasma source body case 18 are connected by means of fixed ring 17 and remote operating bar 10, the plasma source body installation
In 18 lower end of plasma source body case, its side end and potentiometer away from plasma source body 19 of the remote operating bar 10
16 are fixedly mounted；Plasma source body case 18 is fixed on distant behaviour to fixed plasma source body 19, and by fixed ring 17
Make on bar 10, fixed ring 17 is simultaneously in 19 other side fixed potentiometer 16 of plasma source body, to monitor dielectric material 20
Surface potential, plasma source body 19 generate plasma diffusion when being passed through microwave to 20 surface of dielectric material, by it is equal from
Neutralization reaction occurs for electronics, ion included in daughter and positive charge, the negative electrical charge of the attachment of dielectric material surface etc., eliminates sample
Product surface charge amount reduces its surface potential, wherein the potentiometer 16 is contactless electrometer.
Referring to attached drawing 5, it is provided at least one on the plasma adjustable plate 28 for adjusting plasma, room occurs
The interior reaction gas particle beams, and adjust the plasma parameter that Driftdiffusion goes out, including plasma density, plasma
The adjustment hole 29 of temperature and plasma potential；The adjustment hole 29 is rounded, triangle, diamond shape, square, pentagon,
Hexagon or other polygonized structures；The plasma adjustable plate 28 is by aluminium, magnetism-free stainless steel, copper, polyfluortetraethylene plate, modeling
Flitch or epoxy plate are made.
Referring to attached drawing 1-2, the microwave power supply system includes microwave power supply and magnetron 1, the microwave transmission system packet
Coaxial waveguide, tuner, directional coupler 5, air load 11, wave detector 6, coaxial cable 12 and microwave co-axial antenna 22 are included,
The coaxial waveguide is connect by coaxial plug with isolator 3, and isolator 3 is connect by coaxial waveguide with directional coupler 5,
6 air load 11 of wave detector is mounted on directional coupler 5, and directional coupler 5 is by coaxial cable 12 and for adjusting microwave
Three pin tuners 13 of the impedance matching of transmission line connect, and three pin tuners 13 are by the coaxially connected end 9 of sealing and very
Empty room 15 is docked, and three its output end of pin tuner 13 connect the microwave co-axial antenna of plasma source body by coaxial cable
22, and working gas is punctured in plasma chamber 27 by microwave co-axial antenna 22 and forms plasma, plasma passes through
28 Driftdiffusion of plasma adjustable plate acts on the dielectric material surface 20 of surface potential to be controlled to vacuum chamber.
Specifically, the first segment coaxial waveguide 2 being connected with magnetron 1, coaxial waveguide 2 passes through coaxial plug and isolator
3 connections, isolator 3 are connected by second segment coaxial waveguide 4, and then second segment coaxial waveguide 4 is connect with directional coupler 5, fixed
The microwave power that wave detector 6 is transmitted with real-time detection positive direction is installed on coupler 5, installation air is negative on directional coupler 5
11 are carried to absorb microwave reflection, protection magnetron 1 is not reflected microwave and smashes, and directional coupler 5 passes through flexible coaxial cable 12
It is connect with three pin tuners 13, three pin tuners 13 are mainly used for adjusting the impedance of microwave transmission route to meet maximum effect
The output of rate, three pin tuners 13 are connect by sealing coaxially connected end 9 with the vacuum chamber 15 of electric eliminating simulation system, and sealing is same
Axis connecting pin 9 is mainly used for microwave transmission entering vacuum chamber while guaranteeing the vacuum degree of vacuum chamber, and 15 vacuum of vacuum chamber is extremely
10-4Pa hereinafter, remote operating bar 10 in vacuum chamber 15 for fixing plasma source body case 18 and being adjusted to its position,
10 vertical portion of remote operating bar passes through magnet fluid sealing to guarantee the vacuum degree of vacuum chamber 15, while allowing the rotation of remote operating bar 10
Turn operation；Plasma source body 19 completes remote sensing operation by remote operating bar, and the plasma adjustable plate 28 is put apart from sample
The distance of horizontalization platform, adjustable angle.
Fig. 6 provides the plasma discharge schematic diagram based on above structure.
Fig. 7 gives the simulation knot of magnetic field size and bit-type that the annular permanent magnets that above structure is addressed generate in space
Fruit.
Fig. 8 gives the plasma density size and distribution simulation result of the generation of above structure plasma source body 19.
Fig. 9 gives the saturation ion stream and plasma density analysis experimental result obtained using Single probe measurement, gas
Body flow and corresponding operating air pressure are respectively 0.1sccm, 0.15sccm, 0.2sccm and 2.6mPa, 2.8mPa, 3.0mPa, with
Microwave current increases to 37mA from 22mA, and plasma density is from 1013m-3Increase to 6 × 1013m-3(electron temperature is taken to be
1.25eV)。
It is respectively positive and negative 28.5 μ C/m that Figure 10, which gives in medium samples surface attachment surface density of charge,2Shi Jiezhi plate surface
Potential time Evolution Simulation result, it can be seen that the microwave ECR plasma source based on above structure can effectively, quickly be eliminated
The positive and negative charge of medium plate surface, to about 1 millisecond of the elimination time of the positive charge (6500V) of medium plate surface, and to dielectric-slab
The negative electrical charge (negative 6500V) on surface is eliminated the time about 0.25 second.
In the specific application process, the working principle of the utility model is:
Control system involved in the utility model can be divided into two processes at work, one is discharge process, secondly
It is electric eliminating process；Plasma discharge processes are to power to generate 2.45GHz microwave, the electricity to magnetron by using microwave power supply
Magnetic wave passes through coaxial waveguide (rectangular waveguide) in a tem mode and is fed into plasma room, is transferred through tuner (rectangle
Three pin of waveguide or four pins, three pin of coaxial line etc.) and circulator, load (water load or air load) etc.；
The main function of tuner is the impedance matching for adjusting microwave transmission route (including transmission line and microwave antenna etc.)
To achieve the purpose that microwave most preferably inputs；The main function of circulator is to make electromagnetic wave one-way transmission, makes the microwave of reflective portion
It will not be back to circulator entrance, and be transferred to load port, (water load or air are negative for the load that load port is installed
Carry) it can then will reflect back into the electromagnetic wave come all absorptions, and then protect electromagnetic wave that end occurs；
Electromagnetic wave is passing through microwave after three pin tuners, circulator, waveguide (rectangular waveguide or coaxial line waveguide)
Antenna is fed into plasma discharge region, and breakdown working gas forms plasma；
The main function of annular permanent-magnet steel in plasma room is to form intensity in plasma discharge region to be
The magnetic field bit-type of 0.0875 tesla, electronics are acted on by Lorentz force in the plane of vertical magnetic field and do circumnutation；In magnetic
Field intensity is the position of 0.0875 tesla, and electron gyro-frequency and the right-handed circular polarization microwave frequency along magnetic field propagation are equal to
2.45GHz, electronics will obtain energy by continuous synchronous, acceleration in microwave electric field, when electron resonance absorbs the energy of microwave
Greater than the excitation energy of the ionization energy of gas particle, energy of molecular dissociation or a certain state, then ionization by collision, molecular dissociation will be generated
And particle irradiation forms highdensity electron cyclotron resonace to realize plasma discharge and obtain active reaction particle
(ECR) plasma；Because electronics can resonance obtains energy constantly from microwave electromagnetic field under magnetic fields, effectively increase
The effective cross section of collision of electronics, increases the probability of ionization by collision, so high density ecr plasma can be in extremely low gas
Pressure (10-4Pa or less) stablize generation；The working principle of plasma electric eliminating process is by electricity included in plasma
Son, ion are mutually neutralized with positive charge, the electronics on dielectric-slab, to achieve the purpose that electric eliminating；After ecr plasma generation
It is formed by plasma beam and diffuses to workpiece environment to be processed by plasma adjustable plate, when material surface carries positive charge
When, electronics in plasma outward direction electric field caused by positive charge will be accelerated on the surface of the material, reach material table
It is neutralized when face with positive charge entrained by its surface；When material surface carries negative electrical charge, the cation in plasma will be in material
Material surface negative charge caused by inward direction electric field accelerated, when cation reaches material surface and surface entrained by negative electricity
Lotus neutralizes；By the two processes, plasma will be carried out effectively eliminating the positive or negative charge in dielectric material surface.
Claims (11)
1. dielectric material surface potential active control system under a kind of high vacuum environment, it is characterised in that: including plasma source
Body, microwave system, air supply system and vacuum system, the microwave system include occurring for generating the microwave of 2.45GHz microwave
Device and microwave transmission system, the microwave generator are made of microwave power supply and magnetron；Its generation of the microwave generator
Microwave is transmitted in the plasma chamber (27) of plasma source body (19) by microwave transmission system；The air supply system includes
Gas storing system and the gas control system for being used to control the air pressure and flow into plasma chamber (27) interior gas, it is described
The gas of gas storing system is passed through the plasma chamber (27) of plasma source body, the vacuum system by air inlet pipe (21)
Including vacuum chamber (15), the vacuum chamber is provided with for the potentiometer (16) of tested media material surface current potential and tabulation to be controlled
The dielectric material (20) and dielectric material placement platform of face current potential, its vacuum degree of vacuum chamber is 10-4Pa or less；The plasma
Its plasma generated of source body (19) imports in vacuum chamber (15), and acts on the dielectric material table of surface potential to be controlled
Face.
2. dielectric material surface potential active control system under high vacuum environment according to claim 1, it is characterised in that:
The plasma source body (19) includes air inlet pipe (21), microwave co-axial antenna (22), annular permanent magnet steel (24), magnet steel fixing sleeve
Cylinder (25) and plasma adjustable plate (28), the magnet steel fixes sleeve (25) are the open tubular structure in lower end, and microwave is same
Axis antenna (22) and air inlet pipe (21) are inserted into its inner cavity, the annular permanent magnet steel (24) from the closed end of magnet steel fixes sleeve (25)
It is fixedly mounted on the inside of magnet steel fixes sleeve (25), and is centered around on the outside of microwave co-axial antenna (22), the plasma is adjusted
Plate (28) is fixedly mounted on the open end of magnet steel fixes sleeve (25), the annular permanent magnet steel (24), magnet steel fixes sleeve (25),
Plasma adjustable plate (28) and microwave co-axial antenna (22) constitute plasma chamber (27).
3. dielectric material surface potential active control system under high vacuum environment according to claim 2, it is characterised in that:
It is provided at least one on the plasma adjustable plate (28), indoor reaction gas particle occurs for adjusting plasma
Beam, and adjust the plasma parameter that Driftdiffusion goes out, including plasma density, plasma temperature and plasma
The adjustment hole (29) of potential；The adjustment hole (29) is rounded, triangle, diamond shape, square, pentagon, hexagon or other
Polygonized structure；The plasma adjustable plate (28) is by aluminium, magnetism-free stainless steel, copper, polyfluortetraethylene plate, plastic plate or epoxy
Plate is made.
4. dielectric material surface potential active control system under high vacuum environment according to claim 2, it is characterised in that:
The plasma source body (19) is interior set on vacuum chamber (15) by means of sealing the remote operating bar (10) for running through vacuum chamber (15), etc.
Plasma source body (19) is mounted on remote operating bar (10) end, institute by means of fixed ring (17) and plasma source body case (18)
It states plasma source body case (18) to be connected by means of fixed ring (17) and remote operating bar (10), the plasma source body (19)
It is mounted on plasma source body case (18) lower end, its side for deviating from plasma source body (19) of the remote operating bar (10)
Portion and potentiometer (16) are fixedly mounted.
5. dielectric material surface potential active control system under high vacuum environment according to claim 1, it is characterised in that:
The potentiometer (16) is contactless electrometer.
6. dielectric material surface potential active control system under high vacuum environment according to claim 2, it is characterised in that:
The microwave transmission system includes coaxial waveguide, tuner, directional coupler (5), air load (11), wave detector (6), coaxial
Cable (12) and microwave co-axial antenna (22), the coaxial waveguide are connect by coaxial plug with isolator (3), isolator (3)
It being connect by coaxial waveguide with directional coupler (5), wave detector (6) air load (11) is mounted on directional coupler (5),
The three pin tuners that directional coupler (5) passes through coaxial cable (12) and the impedance matching for adjusting microwave transmission route
(13) it connects, three pin tuners (13) are docked by sealing coaxially connected end (9) with vacuum chamber (15), three pin tuners
(13) its output end connects the microwave co-axial antenna (22) of plasma source body by coaxial cable, and passes through microwave co-axial antenna
(22) breakdown working gas forms plasma in plasma chamber (27), and plasma passes through plasma adjustable plate (28)
Driftdiffusion acts on dielectric material (20) surface of surface potential to be controlled to vacuum chamber.
7. dielectric material surface potential active control system under high vacuum environment according to claim 6, it is characterised in that:
The coaxial cable (12) is the flexible radio-frequency coaxial cable line for being used for transmission microwave, realizing a wide range of remote operating.
8. dielectric material surface potential active control system under high vacuum environment according to claim 1, it is characterised in that:
Its working gas of the gas storing system is inert gas, active gases or mixed gas；The gas storing system
Its working gas is carried by pressure vessel or compressor is compressed from exterior space and obtained.
9. dielectric material surface potential active control system under high vacuum environment according to claim 8, it is characterised in that:
The inert gas is one of helium, neon, argon, krypton, xenon, radon, and the active gases or mixed gas are nitrogen, oxygen, sky
One of gas, hydrogen.
10. dielectric material surface potential active control system, feature exist under high vacuum environment according to claim 1
In: the microwave generator is continuous operation mode or pulse working mode；Its pulsewidth, duty under the pulse working mode
Than, run duration is adjustable.
11. dielectric material surface potential active control system, feature exist under high vacuum environment according to claim 2
In: the plasma source body completes remote sensing operation by remote operating bar, and the plasma adjustable plate is placed apart from sample
The distance of platform, adjustable angle.
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| CN201721628977.3U CN208317091U (en) | 2017-11-29 | 2017-11-29 | Dielectric material surface potential active control system under high vacuum environment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107734826A (en) * | 2017-11-29 | 2018-02-23 | 中国人民解放军陆军工程大学 | Dielectric material surface potential active control system under high vacuum environment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107734826A (en) * | 2017-11-29 | 2018-02-23 | 中国人民解放军陆军工程大学 | Dielectric material surface potential active control system under high vacuum environment |
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