CN110139459B - High-density spherical plasma generating device based on rotating magnetic field - Google Patents
High-density spherical plasma generating device based on rotating magnetic field Download PDFInfo
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- CN110139459B CN110139459B CN201910535465.XA CN201910535465A CN110139459B CN 110139459 B CN110139459 B CN 110139459B CN 201910535465 A CN201910535465 A CN 201910535465A CN 110139459 B CN110139459 B CN 110139459B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/4645—Radiofrequency discharges
- H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
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Abstract
The invention discloses a high-density spherical plasma generating device based on a rotating magnetic field, belongs to the technical field of application of low-temperature plasma, and aims to solve the problems that existing plasma generating devices have defects and cannot meet various industrial requirements. The plasma generator comprises a vacuum system and a discharge system, wherein the vacuum system consists of a spherical plasma main generation area and T-shaped arms which are symmetrically communicated with the left side and the right side in a vacuum manner, the outer half sections of the horizontal arms of the two T-shaped arms are closed, and the ends of the vertical arms of the two T-shaped arms are connected with a vacuum pump through a quick-connection flange; a pre-ionization coil of the discharge system is wound on the inner half sections of the horizontal arms of the two T-shaped arms and is used for pre-ionizing gas in the spherical plasma main generation area to obtain seed electrons; the main discharge coil is composed of two groups of coils orthogonally arranged in an x-y plane and is used for generating a rotating magnetic field in the spherical plasma main generation area; the confinement coil is a coil arranged in the z-axis direction and used for confining electrons to improve the plasma density.
Description
Technical Field
The invention belongs to the technical field of low-temperature plasma application, and relates to a high-density plasma discharge device which can be used in various industrial application fields such as nano material processing, microelectronic element etching, special light sources and the like.
Background
Plasma has been widely used in various fields as a fourth type of substance. In low temperature plasmas, electron density and electron temperature are key parameters to fulfill various industrial technical requirements. In the field of semiconductors, such as the manufacturing industry of solar cells, high-density plasmas are utilized to effectively etch thin-film silicon crystals, so that the photoelectric conversion efficiency of the solar cells can be greatly improved; in the field of biomedicine, biological tissues, structures and cells can be induced by using jet plasma generated by a dielectric barrier discharge structure, so that the effects of modification and treatment are achieved; in the field of aerospace, when an ultra-high speed aircraft returns to the atmosphere, a high-density plasma sheath is generated by friction with the atmosphere, and can absorb and reflect electromagnetic waves, so that communication between the aircraft and the ground is attenuated and even interrupted, and the phenomenon is called a black barrier phenomenon. The blackout phenomenon causes immeasurable loss to real-time communication and measurement when the manned spacecraft returns. Currently, blackout communication is still one of the worldwide communication problems. In a ground-based simulation system for black barrier research, generating a high-density plasma sheath is one of the key technologies. In addition, research shows that in the process of transmitting high-frequency signals (gigahertz) in a specific frequency band, when the high-frequency signals pass through high-density plasma, the high-frequency signals can generate a signal radiation enhancement effect, which has great significance for the application of electromagnetic communication and is also one of the key breakthrough points for solving the black barrier problem in the future; in the field of propellers, the weight of chemical fuel carried by a conventional propeller represents more than 90% of the total weight of the system, with a payload of only 1% to 1.5%, and the cost of putting a 1 kg load on track is up to ten thousand dollars, making propeller launch cost generally expensive. Meanwhile, the chemical propulsion cannot accelerate the spacecraft to a sufficient speed, so that the requirement of deep space exploration cannot be met. In order to solve the above-mentioned problems, an electric propulsion technology has been developed. The electric propeller is used for bringing rare gases such as krypton gas, xenon and the like into space in a solid state form and then converting the rare gases into high-density plasma in an ionization mode to serve as propeller fuel, so that the size of the propeller can be effectively reduced, the cost of the propeller can be reduced, and meanwhile, the conversion efficiency of the propeller can be greatly improved.
In summary, how to effectively generate high density plasma is one of the common major problems facing various industries.
The low temperature plasma sources currently used to generate high density are mainly: a radio frequency Capacitively Coupled Plasma source (CCP), an Electron Cyclotron Resonance Plasma source (ECR), a helicon Plasma source (HR), and a radio frequency Inductively Coupled Plasma source (ICP), etc. Wherein the RF capacitively coupled plasma source applies an external power source to the two plate electrodesAn even electric field distribution is formed between the two electrodes, thereby generating large-area uniform and stable plasma. However, for a single frequency capacitively coupled discharge plasma source, the density of the plasma produced is low, typically 109～1010cm-3. In addition, independent control of plasma density and ion energy cannot be achieved for a single-frequency capacitively coupled plasma source; although the dual-frequency capacitively coupled plasma source can well realize the independent control of plasma parameters, an extremely complex nonlinear synergistic effect and an electromagnetic effect exist between the dual frequencies, and if the parameters of the dual frequencies are not properly selected, the plasma parameters cannot be independently controlled, and even the generation and distribution of the plasma can be seriously influenced.
The electron cyclotron resonance plasma can generate high-density plasma under lower air pressure, and the pressure can reach 10 DEG11～1012cm-3. The method has the advantages of higher etching rate and independent control of ion energy. However, the ECR plasma source device requires an external magnetic field coil, which results in a significant increase in device cost and complicated control. In addition, due to the introduction of a magnetic field, the electron cyclotron resonance plasma source is difficult to generate large-area uniform plasma; helicon plasma sources also require the introduction of an externally applied magnetic field, which, while lower in cost than ECR plasma sources, still make it difficult to produce large area uniform plasmas.
The RF inductively coupled plasma source is a device capable of generating high-density plasma in a wide air pressure range, and is characterized in that one or more turns of coils are wound outside a discharge chamber, and the RF inductively coupled plasma source mainly has two types according to different winding modes of the coils: one is a planar coil type radio frequency inductive plasma source, namely a planar coil similar to a mosquito coil is positioned on a dielectric window at the top of a discharge chamber; another is a cylindrical coil rf inductively coupled plasma source, with the coil wound around the sidewall of a cylindrical quartz discharge chamber. The traditional radio frequency induction coupling plasma has the advantages of simple source structure, simple and convenient operation, uniform and stable discharge and high density of generated plasma of 1010～1012cm-3But is widely applied to the fields of semiconductor manufacturing, material science and the like. However, there is a natural upper limit to the plasma density produced by an RF inductively coupled plasma source, ne<1013cm-3Therefore, for applications with higher requirements for plasma parameters, the rf inductively coupled plasma source cannot achieve its function.
Disclosure of Invention
The invention aims to solve the problems that the existing plasma generating devices have respective defects and cannot meet various industrial requirements, and provides a high-density spherical plasma generating device based on a rotating magnetic field.
The invention relates to a high-density spherical plasma generating device based on a rotating magnetic field, which comprises a vacuum system and a discharging system, wherein the vacuum system consists of a spherical plasma main generating area 101 and T-shaped arms 102 which are symmetrically arranged at the left side and the right side and are communicated with the spherical plasma main generating area in a vacuum mode, the outer half sections of the horizontal arms of the two T-shaped arms 102 are closed, and the vertical arm ends of the two T-shaped arms 102 are connected with a vacuum pump set through a quick-connection flange 109; an axial diagnostic channel 104 for communicating the spherical plasma main generation area 101 with the horizontal arm of the T-shaped arm 102 is in the z-axis direction;
the discharge system is composed of a pre-ionization coil 106, a main discharge coil 107 and a restriction coil 108; the preionization coil 106 is wound on the inner half section of the horizontal arm of the two T-shaped arms 102 and is used for preionizing the gas in the spherical plasma main generation area 101 to obtain seed electrons; the main discharge coil 107 is composed of two sets of coils which are orthogonally arranged and used for generating a rotating magnetic field in the spherical plasma main generation area 101; the confinement coils 108 are placed orthogonal to both sets of coils of the main discharge coil 107 for confining electrons to increase plasma density.
Preferably, the main discharge coil 107 and the restriction coil 108 are both circular coils.
Preferably, two groups of coils of the main discharge coil 107 are a horizontally placed main coil 107-1 and a vertically placed main coil 107-2 respectively, the two horizontally placed main coils 107-1 are symmetrically positioned above and below the spherical plasma main generation area 101, and the axis of the horizontally placed main coil 107-1 is along the y-axis direction; the two vertically placed main coils 107-2 are symmetrically positioned in front of and behind the spherical plasma main generation area 101, and the axis of the vertically placed main coil 107-2 is along the x-axis direction;
the two confinement coils 108 are symmetrically positioned at the left side and the right side of the spherical plasma main generation region 101, and are suspended and sleeved outside the pre-ionization coil 106, and the axis of the confinement coil 108 is along the z-axis direction.
Preferably, the two sets of coils of the main discharge coil 107 are respectively connected to a radio frequency power source having a frequency of 2 MHz.
Preferably, the confinement coil 108 is connected to a pulsed power source.
Preferably, the rear end of the spherical plasma main generation region 101 is provided with an intake valve 105 for introducing a rare gas.
Preferably, the front end of the spherical plasma main generation region 101 is embedded with a porous ceramic block 103 for diagnosing the generated plasma.
Preferably, the spherical plasma main generation region 101 and the T-shaped arm 102 constituting the vacuum system are made of pyrex glass.
The invention has the beneficial effects that: the device of the invention forms a closed rotating magnetic field in a limited space through a current driving technology to drive electrons, so that the electrons are constrained in the space, and the collision with the wall of the device is avoided to dissipate energy, thereby generating high-density plasma. Compared with other plasma sources, the plasma generated under the same working condition is higher and can reach 10 DEG13cm-3(ii) a The air compressor can stably work in a wider air pressure range (0.1-100 Pa), so that the working air pressure range is greatly increased; simple structure, cost reduction is fit for multiple industry demand.
Drawings
FIG. 1 is a schematic structural diagram of a high-density spherical plasma generating device based on a rotating magnetic field according to the present invention;
FIG. 2 is a schematic plan view of the main plasma generating area and the discharge system of the present invention;
FIG. 3 is a schematic view of a plasma discharge coil of the present invention;
FIG. 4 is a graph of plasma density and electron temperature with power produced by the present invention;
fig. 5 is a graph comparing the plasma density produced by the present invention and a conventional ICP under the same operating conditions.
The figure is as follows: 101 plasma main generation area, 102T-shaped arm, 103 porous ceramic block, 104 axial diagnosis channel, 105 air inlet valve, 106 preionization coil, 107 main discharge coil, wherein 107-1 is horizontally placed coil, 107-2 is vertically placed coil, 108 restriction coil, 109 quick-connection flange, 110 fixed support, 111 support platform.
Detailed Description
The following detailed description of the embodiments of the present invention will be provided with reference to the drawings and examples, so that how to apply the technical means to solve the technical problems and achieve the technical effects can be fully understood and implemented. It should be noted that, as long as there is no conflict, the embodiments and the features of the embodiments of the present invention may be combined with each other, and the technical solutions formed are within the scope of the present invention.
Referring to fig. 1, the spherical plasma generator of the present invention is a plasma generator capable of meeting various industrial requirements, and mainly comprises a vacuum system and a discharge system. The vacuum system is made of a material including a T-shaped arm 102 connected with a vacuum pump set and a spherical plasma main generation area 101, which are made of Pyrex glass with super heat resistance. Wherein: the diameter of the spherical plasma main generation area 101 is 28 cm; the sealing end of the T-shaped arm 102 is 10cm, the inner half section is 25cm, and the vertical arm length is 20 cm; the T-shaped arms 102 connected with the vacuum pump set are positioned at two ends of the spherical plasma main generation area 101, two ends of the T-shaped arms 102 are sealed, and the lower ends of the T-shaped arms are connected with the molecular pump through the quick-connection flange 109 to meet the requirement of sufficient vacuum degree. An intake valve 105 is disposed at the rear end of the spherical plasma main generation region 101 to introduce a rare gas for generating plasma. The front end is connected with a porous ceramic block 103, the length and width of the porous ceramic block are respectively 26cm and 3cm, 21 circular holes with the diameter of 1cm are uniformly distributed at the central position, and the porous ceramic block is used for measuring plasma parameters at the radial position. In practical application, the ceramic block can be removed. The discharge system consists of four sets of coils, wherein the pre-ionization coil 106 is used for pre-ionizing the gas to obtain higher-density seed electrons; the horizontally placed main coil 107-1 and the vertically placed main coil 107-2 are main discharge coils, the two groups of coils are orthogonally placed and are respectively connected with a radio frequency power supply with the frequency of 2MHz for generating a rotating magnetic field, and the other end of the radio frequency power supply is connected with a matching network and a phase controller; the restraint coil 108 is respectively orthogonally arranged with the horizontally-arranged main coil 107-1 and the vertically-arranged main coil 107-2, is connected with a pulse power source and is used for restraining electrons to improve the plasma density, and the restraint coil 108 is fixed on a supporting table surface 111 through a fixing bracket 110.
The vacuum pump group comprises a mechanical pump and a molecular pump, the molecular pump is connected to the lower end of the T-shaped arm 102, the mechanical pump is started to pump air pressure to be below 10Pa, and then the molecular pump is started to enable the vacuum degree to be the lowest. In this embodiment, a molecular pump is used to pump the vacuum to 10-4After Pa, introducing argon required by the experiment through an air inlet valve 105, and adjusting a gate valve to keep the air pressure at 2 Pa; the pre-ionization coil 106 is turned on to pre-ionize the argon and then the main discharge coil 107 is turned on to generate a rotating magnetic field. In the embodiment, the frequency of the radio frequency source connected with the main discharge coil 107 is 2MHz, and the power is adjustable within 0-5000W; when the rotating magnetic field is formed, the strength of the rotating magnetic field is B with reference to FIG. 2ωThe rotational angular velocity is ω, and the confinement coil 108 is triggered by a pulsed power source controlled by a synchronous trigger to generate a high density plasma. The pulse power source used in this embodiment has a pulse width of 30 mus, a voltage of 20V, and a current Iz40A. After the plasma generation, the plasma generated is diagnosed through the holes of the porous ceramic block 103 by using a Langmuir probe, and the plasma density n obtained through the probe diagnosis ise>1013cm-3Electron temperature of about Te2 eV. The generation of high-density plasma is realized.
As can be seen from the experimental diagnosis results of fig. 4 and 5, the plasma density generated by the plasma generator of the present embodiment is increased by about 1 order of magnitude compared with the plasma density generated by the conventional plasma generator under the same working condition. Meanwhile, as can be seen from the electron density and electron temperature curves in fig. 4, the plasma generator can maintain stable discharge at a wide radio frequency.
Although the embodiments of the present invention have been described above, the above descriptions are only for the convenience of understanding the present invention, and are not intended to limit the present invention. It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (8)
1. A high-density spherical plasma generating device based on a rotating magnetic field is characterized by comprising a vacuum system and a discharging system, wherein the vacuum system is composed of a spherical plasma main generating area (101) and T-shaped arms (102) which are symmetrically arranged on the left side and the right side and are communicated with the spherical plasma main generating area in a vacuum mode, the ends of the outer half sections of the horizontal arms of the two T-shaped arms (102) are sealed, and the ends of the vertical arms of the two T-shaped arms (102) are connected with a vacuum pump set through a quick-connection flange (109); an axial diagnostic channel (104) of the spherical plasma main generation area (101) communicated with the horizontal arm of the T-shaped arm (102) is in the z-axis direction;
the discharge system is composed of a pre-ionization coil (106), a main discharge coil (107) and a restriction coil (108); the preionization coil (106) is wound on the inner half sections of the horizontal arms of the two T-shaped arms (102) and is used for preionizing gas in the spherical plasma main generation area (101) to obtain seed electrons; the main discharge coil (107) is composed of two groups of coils which are orthogonally arranged and used for generating a rotating magnetic field in the spherical plasma main generation area (101); the confinement coil (108) is placed orthogonal to both sets of coils of the main discharge coil (107) for confining electrons to increase plasma density.
2. The high-density spherical plasma generating device based on the rotating magnetic field as claimed in claim 1, wherein the main discharge coil (107) and the restriction coil (108) are circular coils.
3. The high-density spherical plasma generating device based on the rotating magnetic field according to claim 2, characterized in that two groups of coils of the main discharge coil (107) are a horizontally placed main coil (107-1) and a vertically placed main coil (107-2), respectively, the two horizontally placed main coils (107-1) are symmetrically positioned above and below the spherical plasma main generating area (101), and the axis of the horizontally placed main coil (107-1) is along the y-axis direction; the two vertically placed main coils (107-2) are symmetrically positioned in the front and back of the spherical plasma main generation area (101), and the axis of the vertically placed main coil (107-2) is along the x-axis direction;
the two restraint coils (108) are symmetrically positioned at the left side and the right side of the spherical plasma main generation area (101) and are suspended and sleeved outside the preionization coil (106), and the axis of the restraint coil (108) is along the direction of a z axis.
4. The high-density spherical plasma generating device based on the rotating magnetic field as claimed in claim 3, wherein two groups of coils of the main discharge coil (107) are respectively connected with a radio frequency power supply with the frequency of 2 MHz.
5. The high-density spherical plasma generating device based on the rotating magnetic field as claimed in claim 4, wherein the confinement coil (108) is connected with a pulse power source.
6. The high-density spherical plasma generating device based on the rotating magnetic field as claimed in claim 1, wherein the rear end of the spherical plasma main generating region (101) is provided with an air inlet valve (105) for introducing rare gas.
7. The high-density spherical plasma generating device based on the rotating magnetic field as claimed in claim 6, wherein the front end of the spherical plasma main generating area (101) is embedded with a porous ceramic block (103) for diagnosing the generated plasma.
8. The high-density spherical plasma generating device based on the rotating magnetic field according to claim 1, wherein the spherical plasma main generating region (101) and the T-shaped arm (102) constituting the vacuum system are made of pyrex glass.
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| CN110545612B (en) * | 2019-09-04 | 2021-12-28 | 北京航空航天大学 | Multi-stage ionization rotating magnetic field acceleration helicon plasma source |
| CN114071849B (en) * | 2021-11-15 | 2023-11-14 | 上海无线电设备研究所 | Ultra-high sound velocity target ablation diffuser plasma generator |
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