CN107979910A - Active control method for surface potential of dielectric material in high vacuum environment - Google Patents
Active control method for surface potential of dielectric material in high vacuum environment Download PDFInfo
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- 239000003989 dielectric material Substances 0.000 title claims abstract description 27
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- 230000008569 process Effects 0.000 claims abstract description 30
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- 230000005611 electricity Effects 0.000 claims abstract description 7
- 239000007789 gas Substances 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 18
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- 238000010494 dissociation reaction Methods 0.000 claims description 8
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- 238000007789 sealing Methods 0.000 claims description 7
- 230000015556 catabolic process Effects 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 230000019643 circumnutation Effects 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 4
- 230000010287 polarization Effects 0.000 claims description 4
- 238000000338 in vitro Methods 0.000 claims description 3
- 230000000644 propagated effect Effects 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 230000006835 compression Effects 0.000 claims description 2
- 238000007906 compression Methods 0.000 claims description 2
- 239000001307 helium Substances 0.000 claims description 2
- 229910052734 helium Inorganic materials 0.000 claims description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 2
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- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052754 neon Inorganic materials 0.000 claims description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910052704 radon Inorganic materials 0.000 claims description 2
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052724 xenon Inorganic materials 0.000 claims description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 2
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B64—AIRCRAFT; AVIATION; COSMONAUTICS
- B64G—COSMONAUTICS; VEHICLES OR EQUIPMENT THEREFOR
- B64G1/00—Cosmonautic vehicles
- B64G1/22—Parts of, or equipment specially adapted for fitting in or to, cosmonautic vehicles
- B64G1/52—Protection, safety or emergency devices; Survival aids
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
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Abstract
The invention discloses a method for actively controlling the surface potential of a dielectric material in a high vacuum environment, wherein the electricity eliminating process is carried out in the high vacuum environment, the discharging process comprises the steps of using a microwave power supply to supply power to a magnetron to generate 2.45GHz electromagnetic waves, feeding the electromagnetic waves through a coaxial waveguide in a TEM mode, and feeding the electromagnetic waves into a microwave coaxial antenna through a microwave transmission system, wherein the lower end of the microwave coaxial antenna is positioned in a plasma chamber of a plasma source body, the microwave coaxial antenna finishes discharging in the plasma chamber, and finishes the electricity eliminating process in the vacuum chamber by means of the plasma source body; in a high vacuum environment, working gas is punctured in a plasma chamber through a microwave coaxial antenna to form plasma, annular permanent magnet steel positioned in the plasma chamber is used for generating a magnetic field with the strength of 0.0875 Tesla, high-density electron cyclotron resonance plasma is formed under the action of the magnetic field, and the plasma is diffused to the environment of a workpiece to be processed through a plasma adjusting plate, so that the active adjustment of the surface charge of a medium is realized.
Description
Technical field
The invention belongs to plasma and material phase separation field of scientific study, and in particular to be situated between under a kind of high vacuum environment
Material surface potential Active Control Method.
Background technology
Spacecraft in orbit during, its surface is by space plasma, high energy electron, solar radiation, spatial charging dirt
Angstrom wait environment influence, it may occur however that static charge accumulation and leakage phenomenon.This charge and discharge process may cause space flight equipment
The breakdown of material, material surface hydraulic performance decline, make solar cell, electronic device and optical sensor hydraulic performance decline or damage;
The strong electromagnetic pulse that this charge and discharge process produces at the same time can severe jamming spacecraft interior instrument system, produce exception, failure,
Failure even results in spacecraft and scraps, and will seriously affect the execution of great space tasks.Therefore, to Satellite surface potential into
Row effectively control is for ensureing that spacecraft in-orbit safe and stable operation in China's has very important significance.
The adverse circumstances in space are complicated and changeable(Such as ultralow temperature, extremely low vacuum, high energy electron ion irradiation), it is conventional available
The mode that destatics of ground(Such as humidifying air, corona discharge)It will be unable to use.The dielectric surface current potential control that presently, there are
Method processed is mainly divided to passive type control and active two kinds of control, the former the active control that compares is more flexible effectively and thorough
Bottom.The charged particle line usually launched mainly has three kinds:Electron beam, ion beam and plasma beam, wherein electron beam and from
Beamlet is single electrical particle flux.International space station(ISS)Using the hollow cathode component of launching electronics, pass through its transmitting
Electronic beam current a kind of low impedance path is provided between space station and space plasma environment, reduce and control space station table
Face current potential, this hollow cathode component electron emissivity is strong, but ion is less, and power consumption is larger, and neutralization is not thorough.European Space Agency carries
A kind of ion gun Active Control Method is gone out, has been evaporated using liquid metal, ionization and the voltage acceleration of accelerated pole are sprayed and formed
Ion beam, but the structure of this ion gun is complex, and negative potential can only be neutralized, it is impossible to positive potential is neutralized, while can be brought
Unfavorable material contamination etc..Because the severe changeable and position of aircraft of space environment changes often, aircraft surface
The current potential amplitude of dielectric material may change with polarity with the time, if aircraft surface faces south, and space plasma
When density and very low energy, aircraft surface may be with relatively low positive potential;And if aircraft surface the back of the body sun, and space etc. from
When the density and high energy of daughter, satellite surface may the very high negative potential of band.Therefore will be compared using the plasma beam of low energy
The current potential active control mode of electron beam and ion beam is more effective, and the current potential of dielectric surface effectively be able to will be adjusted
Control.Russian's Mir space station realizes space neutralization medium material surface electric charge using a kind of pulsed plasma source, has
It is simple in structure, neutralize the features such as efficient, working stability, but the pulsed plasma source passes through high-temperature electric arc ablation working medium surface
Material decomposes and ionization produces plasma, high energy consumption and the solid material of consumption.
The content of the invention
The technical problems to be solved by the invention are to provide dielectric material surface potential under a kind of high vacuum environment and actively control
Method processed, 10-4Under the high vacuum environment of below Pa, 2.45GHz microwaves are fed into by coaxial waveguide in a tem mode and are located at
The indoor plasma source body of vacuum, and working gas is punctured in plasma room by microwave co-axial antenna, form plasma
Body, it is 0.0875 Tesla magnetic fields that annular permanent magnet steel in plasma room, which is used to producing intensity, the shape under magnetic fields
Into highdensity Ecr plasma, the plasma formed includes electronics and ion is adjusted by plasma
Plate diffuses to pending workpiece environment, realizes that the active of barrier surface charge is adjusted.
In order to solve the above technical problems, the technical solution adopted by the present invention is:Dielectric material table under a kind of high vacuum environment
The method of face current potential active control, the described method includes discharge process and electric eliminating process;
The discharge process is specific as follows:
Powered by microwave power supply system to microwave system and produce 2.45GHz electromagnetic waves, electromagnetic wave passes through on-axis wave in a tem mode
Feeding is led, and plasma source body is located at by microwave transmission system feed-in microwave co-axial antenna, microwave co-axial antenna lower end
In plasma room, plasma source body is located at vacuum for 10-4In the vacuum chamber of below Pa, microwave co-axial antenna is in plasma
Discharge process is completed in body room, and electric eliminating process is completed in vacuum chamber by means of plasma source body;
The electric eliminating process is specific as follows:
Discharged by microwave co-axial antenna in plasma room, and puncture working gas and form plasma, working gas profit
It is sent into air supply system by sebific duct and air supply pipe in plasma room, annular magnetic steel, annular is set in the body of pdp body source
Magnet steel forms the magnetic field bit-type that intensity is 0.0875 tesla, plane of the plasma in vertical magnetic field in plasma discharge region
On acted on by Lorentz force and do circumnutation, in the position that magnetic field intensity is 0.0875 tesla, electron gyro-frequency and edge
The right-handed circular polarization microwave frequency that magnetic field is propagated is equal to 2.45GHz, and the energy that electron resonance absorbs microwave is more than gas particle
Ionization energy, ionization by collision, molecular dissociation and particle irradiation are produced after energy of molecular dissociation, plasma discharge simultaneously obtains active anti-
Particle is answered, forms Ecr plasma, by electronics included in plasma and ion and dielectric-slab
Positive charge and electronics mutually neutralize.
As preferred embodiment, the electric eliminating process is 10-4Carried out under the vacuum environment of below Pa.
As preferred embodiment, the air supply system includes gas storing system and enters plasma for controlling
The air pressure of indoor gas and the gas control system of flow, the gas of the gas storing system are passed through plasma by air inlet pipe
The plasma chamber of body source body, the vacuum system include vacuum chamber, and the vacuum chamber is built-in to be useful for tested media material table
The dielectric material and dielectric material placement platform of the potentiometer of face current potential and surface potential to be controlled, its vacuum of vacuum chamber exist
10-4Below Pa;Its plasma produced of the plasma source body is imported in vacuum chamber, and acts on surface potential to be controlled
Dielectric material surface.
As preferred embodiment, the plasma source body includes air inlet pipe, coaxial microwave antenna, annular permanent magnet
Steel, magnet steel fixes sleeve and plasma adjustable plate, the magnet steel fixes sleeve are the tubular structure that lower end opens, and microwave is same
Axis antenna and the blind end of air inlet pipe from magnet steel fixes sleeve are inserted into its inner cavity, and the annular permanent magnet steel is fixedly mounted on magnet steel and consolidates
Determine on the inside of sleeve, and be centered around on the outside of microwave co-axial antenna, the in vitro adjustable plate of grade is fixedly mounted on magnet steel fixes sleeve
Open end, the annular permanent magnet steel, magnet steel fixes sleeve, plasma adjustable plate and microwave co-axial antenna form plasma
Room.
As preferred embodiment, the air inlet pipe is used to working gas being passed through in plasma room, and microwave passes through
Microwave co-axial antenna feed-in plasma chamber, annular permanent-magnet steel are used to produce 0.0875 Tesla magnetic fields in plasma room.
As preferred embodiment, the plasma source body is arranged on by means of the remote operating bar sealed through vacuum chamber
In vacuum chamber, plasma source body is installed on remote operating boom end by means of retainer ring and plasma source body case, described etc.
Plasma source body case is connected by means of retainer ring with remote operating bar, and the plasma source body is installed on plasma source body case
Lower end, the remote operating bar its be fixedly mounted away from a side end and the potentiometer of plasma source body.
As preferred embodiment, the microwave power supply system includes microwave power supply and magnetron, and microwave passes through microwave
Transmission system is coupled into plasma source body, the microwave transmission system include coaxial waveguide, tuner, directional coupler,
Air load, wave detector, coaxial cable and coaxial microwave antenna, the microwave coaxial waveguide are connected by coaxial plug and isolator
Connect, isolator is connected by coaxial waveguide with directional coupler, and wave detector air load is installed on directional coupler, orientation
Coupler is connected by coaxial cable with three pin tuners of the impedance matching for adjusting microwave transmission circuit, three pin tune
Orchestration is docked by sealing coaxially connected end with vacuum chamber, and three pin tuner its output terminal connect plasma by coaxial cable
The microwave co-axial antenna of body source body, and working gas is punctured in plasma room by microwave co-axial antenna and forms plasma
Body, plasma, to vacuum chamber, and act on the medium material of surface potential to be controlled by plasma adjustable plate Driftdiffusion
Expect surface.
As preferred embodiment, the gas storing system its working gas is inert gas, active gases or
Mixed gas;Its working gas of the gas storing system is carried by pressure vessel or compressor takes from exterior space compression
.
As preferred embodiment, the inert gas is helium, one kind in neon, argon, krypton, xenon, radon, the activity gas
Body or mixed gas are nitrogen, one kind in oxygen, air, hydrogen.
As preferred embodiment, the microwave system include be used for produce 2.45GHz microwaves microwave generator and
Microwave transmission system, the microwave generator are made of microwave power supply and magnetron;The microwave of its generation of the microwave generator
It is transmitted to by microwave transmission system in the plasma room of plasma source body;The microwave generator is continuous work mould
Formula or pulse working mode;Its pulsewidth, duty cycle, run duration are adjustable under the pulse working mode.
It is using beneficial effect caused by above-mentioned technical proposal:Using ecr plasma to dielectric material surface electricity
Lotus is eliminated, and is avoided and is used single electron gun(Ion beam or electron beam)The polarity of dielectric material surface charge is selected;Adopt
Magnetic field size and bit-type required for being produced with annular permanent magnet steel, avoid using coil and power-supply system and the water that may be needed
Cooling system, greatly reduces the size and weight of plasma source body, is used beneficial to the particular surroundings of maximum weight is needed;Use
The coaxial waveguide transmission line of high-flexibility effectively increases the large spatial scale operability of plasma source body;ECR plasmas
Body stable discharging and can work under extremely low air pressure;It is close that plasma can effectively be adjusted by using plasma adjustable plate
The parameters such as degree, plasma electron temperature, and then Effective Regulation clamp voltage;Used plasma source temperature is low, no
There are melted material, pollution-free, long lifespan, surface potential controls more stably and controllable.
Brief description of the drawings
Fig. 1 is the structure diagram of the present invention.
Fig. 2 is the partial schematic diagram of microwave generation and Transmission system.
Fig. 3 is the partial schematic diagram of microwave generation and Transmission system.
Fig. 4 is action of plasma in sample stage surface sample schematic diagram.
Fig. 5 microwave ECR plasmas source body structure diagram.
Fig. 6 microwave ECRs electric discharge schematic diagram.
The magnetic field amplitude and distribution map of Fig. 7 annular permanent magnets.
Fig. 8 permanent magnetism microwave ECR plasma density simulation result figures.
Fig. 9 saturations ion stream and plasma density are with microwave current variation diagram.
The positive and negative current potential electric eliminating temporal evolution analogous diagram of Figure 10 medium plate surfaces.
In the accompanying drawings:1st, magnetron;2nd, first segment coaxial waveguide;3rd, isolator;4th, second segment coaxial waveguide;5th, coupling is oriented
Clutch;6th, wave detector;9th, coaxially connected end is sealed;10th, remote operating bar;11st, air load;12nd, flexible coaxial cable line;13、
Three pin tuners;14th, rubber tube;15th, vacuum chamber;16th, potentiometer;17th, retainer ring;18th, plasma source body case;19、
Plasma source body;20th, sample;21st, air inlet pipe;22nd, microwave co-axial antenna;24th, annular permanent magnet steel;25th, magnet steel fixing sleeve
Cylinder;27th, plasma chamber;28th, plasma adjustable plate;29th, adjustment hole.
Embodiment
With reference to the attached drawing in the embodiment of the present invention, the technical solution in the embodiment of the present invention is carried out clear, complete
Ground describes, it is clear that described embodiment is only the part of the embodiment of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other without making creative work
Embodiment, belongs to the scope of protection of the invention.
Many details are elaborated in the following description to facilitate a thorough understanding of the present invention, still the present invention can be with
Implemented using other different from other manner described here, those skilled in the art can be without prejudice to intension of the present invention
In the case of do similar popularization, therefore the present invention is from the limitation of following public specific embodiment.
The invention discloses a kind of method of dielectric material surface potential active control under high vacuum environment, including plasma
Body discharge process and plasma electric eliminating process, plasma discharge processes are to power to produce to magnetron by using microwave power supply
Raw 2.45GHz electromagnetic waves, electromagnetic wave are fed into plasma room by coaxial waveguide in a tem mode, be transferred through tuner,
Circulator and load, the main function of tuner are the impedance matchings for adjusting microwave transmission circuit, and the main function of circulator is
Make electromagnetic wave one-way transmission, making the microwave transmission of reflecting part, the load that load port is installed will reflect back into load port
The electromagnetic wave come all absorbs, and electromagnetic wave is being fed into plasma after tuner, circulator and waveguide by microwave antenna
Body region of discharge, breakdown working gas form plasma, the main function of the annular permanent-magnet steel in plasma chamber body be
Plasma discharge region forms the magnetic field bit-type that intensity is 0.0875 tesla, and electronics is in the plane of vertical magnetic field by Lorentz
Power act on and do circumnutation, magnetic field intensity be 0.0875 tesla position, electron gyro-frequency and along magnetic field propagate
Right-handed circular polarization microwave frequency is equal to 2.45GHz, and the energy that electron resonance absorbs microwave is more than the ionization energy of gas particle, divides
Ionization by collision, molecular dissociation and particle irradiation, plasma discharge are produced after sub- dissociation energy and simultaneously obtains active reaction particle, is formed
Ecr plasma;Plasma electric eliminating process is by electronics included in plasma and ion and medium
Positive charge and electronics on plate mutually neutralize.
As shown in Figure 1, air supply system includes gas storing system and gas control system, the gas of gas storing system leads to
The plasma chamber 27 that sebific duct is passed through plasma source body is crossed, gas control system is used to control and enters in plasma chamber 27
Gas pressure and flow, it is 10 that the plasma that plasma source body produces, which imports vacuum,-4In the vacuum chamber 15 of below Pa, and
Act on the material surface of surface potential to be controlled.
Referring to attached drawing 4-5, the plasma source body 19 includes air inlet pipe 21, microwave co-axial antenna 22, annular permanent magnet steel
24th, magnet steel fixes sleeve 25 and plasma adjustable plate 28, the magnet steel fixes sleeve 25 are the tubular structure that lower end opens,
Microwave co-axial antenna 22 and the blind end of air inlet pipe 21 from magnet steel fixes sleeve 25 are inserted into its inner cavity, and the annular permanent magnet steel 24 is solid
Dingan County is mounted in the inner side of magnet steel fixes sleeve 25 and is centered around the outside of microwave co-axial antenna 22,24 inner ring of annular permanent magnet steel and microwave
Coaxial antenna 22 forms in vitro adjustable plate, the microwave such as plasma chamber 27,25 lower end of the magnet steel fixes sleeve fixed installation and leads to
Cross in 22 feed-in plasma room of coaxial antenna, send out electronics at 0.0875 Tesla magnetic fields caused by annular permanent-magnet steel 24
Raw cyclotron resonance accelerates, and makes its stable discharging under a high vacuum.Use and compact microwave antenna knot by annular permanent magnet
Structure designs, the 19 long 4cm of plasma source body addressed, diameter about 2.5cm, weight 1kg, the power consumption in the course of discharge 20W~100W.
Referring to attached drawing 5, the air inlet pipe 21 is used to working gas being passed through in plasma chamber 27, and microwave is same by microwave
22 feed-in plasma chamber 27 of axis antenna, annular permanent-magnet steel are used to produce 0.0875 Tesla magnetic fields in plasma chamber 27.
Referring to attached drawing 4, the plasma source body is arranged on vacuum by means of the remote operating bar 10 sealed through vacuum chamber 15
In room 15, plasma source body is installed on 10 end of remote operating bar by means of retainer ring 17 and plasma source body case 18, etc.
Plasma source body case 18 is connected by means of retainer ring 17 and remote operating bar 10, and it is external that plasma source body is installed on plasma source
Potentiometer 16 is fixedly mounted in 18 lower end of shell, 10 end other side of remote operating bar, and plasma source body case 18 is to fixed etc.
Plasma source body 19, and be fixed on by retainer ring 17 on remote operating bar 10, retainer ring 17 is another in plasma source body 19 at the same time
Outer side fixed potentiometer 16, to monitor 20 surface potential of sample, plasma source body 19 is produced when being passed through microwave etc. from
Daughter diffuses to 20 surface of sample, the positive charge that is adhered to by electronics included in plasma, ion and sample surfaces, negative
Neutralization reaction occurs for electric charge etc., eliminates sample surface charge amount, reduces its surface potential.
Referring to attached drawing 1-2, the microwave power supply system includes microwave power supply and magnetron 1, and microwave passes through microwave transmission system
System is coupled into plasma source body, and microwave transmission system includes coaxial waveguide, tuner, directional coupler 5, air load
11st, wave detector 6, flexible coaxial waveguide and microwave co-axial antenna 22, the microwave coaxial waveguide is by coaxial plug with isolating
Device 3 connects, and isolator 3 is connected by coaxial waveguide with directional coupler 5, and wave detector 6 and installation are installed on directional coupler 5
Air load 11, directional coupler 5 are connected by flexible coaxial cable 12 with three pin tuners 13, and three pin tuners 13 are used
In the impedance matching for adjusting microwave transmission circuit, three pin tuners 13 are docked by sealing coaxially connected end 9 with vacuum chamber 15,
Three pin tuners, 13 output terminal connects the microwave co-axial antenna 22 of plasma source body by radio frequency coaxial-cable, passes through microwave
The breakdown working gas in plasma chamber 27 of coaxial antenna 22 forms plasma, and plasma passes through plasma adjustable plate
28 Driftdiffusions are to medium plate surface.
Specifically, the first segment coaxial waveguide 2 being connected with magnetron 1, coaxial waveguide 2 pass through coaxial plug and isolator
3 connections, isolator 3 are connected by second segment coaxial waveguide 4, and then second segment coaxial waveguide 4 is connected with directional coupler 5, fixed
Wave detector 6 is installed to detect the microwave power of positive direction transmission in real time on to coupler 5, air is installed on directional coupler 5 and is born
11 are carried to absorb microwave reflection, protects magnetron 1 not smashed by microwave reflection, directional coupler 5 passes through flexible coaxial cable 12
It is connected with three pin tuners 13, three pin tuners 13 are mainly used for adjusting the impedance of microwave transmission circuit to meet maximum effect
The output of rate, three pin tuners 13 are connected by sealing coaxially connected end 9 with the vacuum chamber 15 of electric eliminating simulation system, and sealing is same
Axis connecting pin 9 is mainly used for the vacuum for entering vacuum chamber and ensure vacuum chamber at the same time microwave transmission, and 15 background of vacuum chamber is true
It is empty to 10-4Below Pa, the remote operating bar 10 in vacuum chamber 15 are used to fix plasma source body case 18 and its position are carried out
Adjustment, 10 vertical portion of remote operating bar, to ensure the vacuum of vacuum chamber 15, while allow remote operating bar by magnet fluid sealing
10 rotation process.
Fig. 6 provides the plasma discharge schematic diagram based on said structure.
Fig. 7 gives the simulation knot of the magnetic field size that the annular permanent magnets that said structure is addressed produce in space and bit-type
Fruit.
Fig. 8 gives the plasma density size and distribution simulation result of the generation of said structure plasma source body 19.
Fig. 9 gives the saturation ion stream obtained using Single probe measurement and plasma density analysis experimental result, gas
Body flow and corresponding operating air pressure are respectively 0.1sccm, 0.15sccm, 0.2sccm and 2.6mPa, 2.8mPa, 3.0mPa, with
Microwave current increases to 37mA from 22mA, and plasma density is from 1013m-3Increase to 6 × 1013m-3(The electron temperature is taken to be
1.25eV).
It is respectively positive and negative 28.5 μ C/m that Figure 10, which is given in dielectric sample surface attachment surface density of charge,2Shi Jiezhi plate surfaces
Potential time Evolution Simulation result, it can be seen that the microwave ECR plasma source based on said structure can effectively, quickly eliminate
The positive and negative charge of medium plate surface, to the positive charge of medium plate surface(6500V)About 1 millisecond of elimination time, and to dielectric-slab
The negative electrical charge on surface(Negative 6500V)Eliminate about 0.25 second time.
The present invention operation principle be:
Control method according to the present invention can be divided into two processes, one is discharge process, the second is electric eliminating process;Plasma
Body discharge process is to power to produce 2.45GHz microwaves to magnetron by using microwave power supply, which passes through in a tem mode
Coaxial waveguide(Rectangular waveguide)It is fed into plasma room, is transferred through tuner(Three pin of rectangular waveguide or four pins,
Three pin of coaxial line etc.)With circulator, load(Water load or air load)Deng.The main function of tuner is to adjust microwave to pass
Defeated circuit(Including transmission line and microwave antenna etc.)Impedance matching to achieve the purpose that microwave most preferably inputs;Circulator it is main
Effect is to make electromagnetic wave one-way transmission, makes the microwave of reflecting part will not be back to circulator entrance, and is transferred to load end
Mouthful, the load that load port is installed(Water load or air load)The electromagnetic wave come can be then will reflect back into all to absorb, and then
Protect electromagnetic wave that end occurs.Electromagnetic wave is by three pin tuners, circulator, waveguide(Rectangular waveguide or coaxial line waveguide)
Plasma discharge region is fed into by microwave antenna afterwards, breakdown working gas forms plasma.In plasma room
The main function of annular permanent-magnet steel is that the magnetic field bit-type that intensity is 0.0875 tesla is formed in plasma discharge region, and electronics exists
Acted in the plane of vertical magnetic field by Lorentz force and do circumnutation.In the position that magnetic field intensity is 0.0875 tesla, electricity
Sub- cyclotron frequency and the right-handed circular polarization microwave frequency propagated along magnetic field are equal to 2.45GHz, and electronics will be by microwave electric field
Constantly synchronously, accelerate and obtain energy, when electron resonance absorbs ionization energy, molecular dissociation of the energy more than gas particle of microwave
The excitation energy of energy or a certain state, then ionization by collision, molecular dissociation and particle irradiation will be produced, put so as to fulfill plasma
Electricity and acquisition active reaction particle, form highdensity electron cyclotron resonace(ECR)Plasma.Because electronics can be in magnetic field
Resonance obtains energy constantly from microwave electromagnetic field under effect, effectively increases the effective cross section of collision of electronics, increases collision
The probability of ionization, so high density ecr plasma can be under extremely low air pressure(10-4Below Pa)Stablize and produce.Plasma
The operation principle of body electric eliminating process is by the positive charge included in plasma on electronics, ion and dielectric-slab, electronics
Mutually neutralize, so as to achieve the purpose that electric eliminating.The plasma beam formed after ecr plasma generation passes through plasma tune
Section plate diffuses to pending workpiece environment, and when material surface carries positive charge, the electronics in plasma will be in material surface
Outward direction electric field is accelerated caused by positive charge, when reaching material surface with its surface entrained by positive charge and;When
When material surface carries negative electrical charge, the cation in plasma will be in inward direction electric field caused by material surface negative electrical charge
Accelerated, when cation reaches material surface with surface entrained by negative electrical charge and.By the two processes, plasma will
It can realize and the positive or negative electric charge in dielectric material surface is effectively eliminated.
Claims (10)
1. a kind of method of dielectric material surface potential active control under high vacuum environment, it is characterised in that:The described method includes
Discharge process and electric eliminating process;
The discharge process is specific as follows:
Powered by microwave power supply system to microwave system and produce 2.45GHz electromagnetic waves, electromagnetic wave passes through on-axis wave in a tem mode
Feeding is led, and plasma source body is located at by microwave transmission system feed-in microwave co-axial antenna, microwave co-axial antenna lower end
In plasma room, plasma source body is located at vacuum for 10-4In the vacuum chamber of below Pa, microwave co-axial antenna is in plasma
Discharge process is completed in body room, and electric eliminating process is completed in vacuum chamber by means of plasma source body;
The electric eliminating process is specific as follows:
Discharged by microwave co-axial antenna in plasma room, and puncture working gas and form plasma, working gas profit
It is sent into air supply system by sebific duct and air supply pipe in plasma room, annular magnetic steel, annular is set in the body of pdp body source
Magnet steel forms the magnetic field bit-type that intensity is 0.0875 tesla, plane of the plasma in vertical magnetic field in plasma discharge region
On acted on by Lorentz force and do circumnutation, in the position that magnetic field intensity is 0.0875 tesla, electron gyro-frequency and edge
The right-handed circular polarization microwave frequency that magnetic field is propagated is equal to 2.45GHz, and the energy that electron resonance absorbs microwave is more than gas particle
Ionization energy, ionization by collision, molecular dissociation and particle irradiation are produced after energy of molecular dissociation, plasma discharge simultaneously obtains active anti-
Particle is answered, forms Ecr plasma, by electronics included in plasma and ion and dielectric-slab
Positive charge and electronics mutually neutralize.
2. dielectric material surface potential Active Control Method under high vacuum environment according to claim 1, it is characterised in that:
The electric eliminating process is 10-4Carried out under the vacuum environment of below Pa.
3. dielectric material surface potential Active Control Method under high vacuum environment according to claim 1, it is characterised in that:
The air supply system includes gas storing system and enters plasma chamber for controlling(27)The air pressure of interior gas and flow
Gas control system, the gas of the gas storing system pass through air inlet pipe(21)It is passed through the plasma chamber of plasma source body
(27), the vacuum system includes vacuum chamber(15), the built-in electricity for being useful for tested media material surface current potential of the vacuum chamber
Position meter(16)With the dielectric material of surface potential to be controlled(20)And dielectric material placement platform, its vacuum of vacuum chamber is 10- 4Below Pa;The plasma source body(19)Its plasma produced imports vacuum chamber(15)It is interior, and act on tabulation to be controlled
The dielectric material surface of face current potential.
4. dielectric material surface potential Active Control Method under high vacuum environment according to claim 1, it is characterised in that:
The plasma source body(19)Including air inlet pipe(21), coaxial microwave antenna(22), annular permanent magnet steel(24), magnet steel fixing sleeve
Cylinder(25)And plasma adjustable plate(28), the magnet steel fixes sleeve(25)The tubular structure opened for lower end, microwave are same
Axis antenna(22)And air inlet pipe(21)From magnet steel fixes sleeve(25)Blind end be inserted into its inner cavity, the annular permanent magnet steel(24)
It is fixedly mounted on magnet steel fixes sleeve(25)Inner side, and it is centered around microwave co-axial antenna(22)Outside, the in vitro adjustable plate of grade
(28)It is fixedly mounted on magnet steel fixes sleeve(25)Open end, the annular permanent magnet steel(24), magnet steel fixes sleeve(25), etc.
Gas ions adjustable plate(28)With microwave co-axial antenna(22)Form plasma chamber(27).
5. dielectric material surface potential Active Control Method under high vacuum environment according to claim 3, it is characterised in that:
The air inlet pipe(21)For working gas to be passed through plasma chamber(27)Interior, microwave passes through microwave co-axial antenna(22)Feed-in
Plasma chamber(27), annular permanent-magnet steel is in plasma chamber(27)0.0875 Tesla magnetic fields of interior generation.
6. dielectric material surface potential Active Control Method under high vacuum environment according to claim 4, it is characterised in that:
The plasma source body(19)Run through vacuum chamber by means of sealing(15)Remote operating bar(10)Arranged on vacuum chamber(15)It is interior, etc.
Plasma source body(19)By means of retainer ring(17)With plasma source body case(18)Installed in remote operating bar(10)End, institute
State plasma source body case(18)By means of retainer ring(17)With remote operating bar(10)Connection, the plasma source body are installed on
Plasma source body case(18)Lower end, the remote operating bar(10)It deviates from plasma source body(19)A side end with electricity
Position meter(16)It is fixedly mounted.
7. dielectric material surface potential Active Control Method under high vacuum environment according to claim 1, it is characterised in that:
The microwave power supply system includes microwave power supply and magnetron(1), microwave is coupled into plasma by microwave transmission system
Source body, the microwave transmission system include coaxial waveguide, tuner, directional coupler(5), air load(11), wave detector
(6), coaxial cable(12)With coaxial microwave antenna(22), the microwave coaxial waveguide passes through coaxial plug and isolator(3)Even
Connect, isolator(3)Pass through coaxial waveguide and directional coupler(5)Connection, wave detector(6)Air load(11)Installed in orientation
Coupler(5)On, directional coupler(5)Pass through coaxial cable(12)With three of the impedance matching for adjusting microwave transmission circuit
Pin tuner(13)Connection, three pin tuners(13)By sealing coaxially connected end(9)With vacuum chamber(15)Docking, three pins
Follow closely tuner(13)Its output terminal connects the microwave co-axial antenna of plasma source body by coaxial cable(22), and pass through microwave
Coaxial antenna(22)In plasma chamber(27)Interior breakdown working gas forms plasma, and plasma passes through plasma tune
Save plate(28)Driftdiffusion acts on the dielectric material surface of surface potential to be controlled to vacuum chamber(20).
8. dielectric material surface potential active control system under high vacuum environment according to claim 1, it is characterised in that:
Its working gas of the gas storing system is inert gas, active gases or mixed gas;The gas storing system
Its working gas is carried by pressure vessel or compressor is obtained from exterior space compression.
9. dielectric material surface potential active control system under high vacuum environment according to claim 8, it is characterised in that:
The inert gas is helium, one kind in neon, argon, krypton, xenon, radon, the active gases or mixed gas are nitrogen, oxygen, sky
One kind in gas, hydrogen.
10. dielectric material surface potential active control system under high vacuum environment according to claim 1, its feature exist
In:The microwave system includes being used for the microwave generator and microwave transmission system for producing 2.45GHz microwaves, and the microwave occurs
Device is made of microwave power supply and magnetron;Its microwave for producing of the microwave generator by microwave transmission system be transmitted to etc. from
Daughter source body(19)Plasma chamber(27)It is interior;The microwave generator is continuous operation mode or pulse working mode;
Its pulsewidth, duty cycle, run duration are adjustable under the pulse working mode.
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