CN205907390U - Many crucibles liquid phase epitaxy siC crystal bear device - Google Patents
Many crucibles liquid phase epitaxy siC crystal bear device Download PDFInfo
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- CN205907390U CN205907390U CN201620626980.0U CN201620626980U CN205907390U CN 205907390 U CN205907390 U CN 205907390U CN 201620626980 U CN201620626980 U CN 201620626980U CN 205907390 U CN205907390 U CN 205907390U
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- sic
- crucible
- crystal
- growth
- liquid phase
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Abstract
The utility model belongs to the technical field of new material processing, the utility model provides a many crucibles liquid phase epitaxy siC crystal bear device, it grows in the melt water at crucible bottom flooding to let the siC seed crystal fix through pining down of graphite rope, can provide relatively stable growing environment for the growth of siC crystal from this, flow through the melt water is easily with C to near the system of partial free supply and partial wages of bottom siC seed crystal, carry out simultaneously the growth of many crucibles again and improve production efficiency, the growing environment unstability that exists has been solved in the solwution method, a series of difficult problems of growth rate low grade.
Description
Technical field
This utility model belongs to new material field of crystal processing and in particular to one kind realizes many crucibles liquid phase epitaxy sic crystalline substance
The bogey of body method.
Background technology
Carborundum (sic) has bigger band gap compared with silicon (si), and the former possesses more excellent physical property.As
The new generation of semiconductor material gradually rising, the manufacture method of high-quality sic monocrystalline causes this skilled person more next
More concerns.The method of growth sic monocrystalline is broadly divided into vapor phase method and liquid phase method at present.Compared with vapor phase method, liquid phase method
The speed of growth is low, but produces high-quality sic monocrystalline for pursuit, and this method is worthy to be popularized.Liquid phase method has relatively
High polytype controllability simultaneously can efficiently reduce the crystal defects such as micro-pipe, fault, can obtain the good high-quality sic of crystallinity
Monocrystalline.It is a kind of method being conducive to and generating bulk high-purity sic monocrystalline, and avoids growth gained crystal in vapor phase method
The FAQs such as the micro-pipe existing and fault.Therefore, the brainstrust in this field has been carried out multinomial research (see Japan in recent years
Open 2000-264790 (the jp-a-2000- of patent application publication 2004-2173 (jp-a-2004-2173), Japanese patent application
264790), the open 2007-76986 (jp-a-2007-76986) of Japanese patent application), attempt utilizing rheotaxial growth sic
The method of crystal is improving growth rate.
In typical liquid phase method, it is that the si in graphite crucible is reached by molten condition by heating, this melting si exists
Thermograde, declines to surface temperature inside melting si, keeps the temperature ladder to melting si surface cooling inside melting si
Degree.C in graphite crucible melts in crucible bottom high-temperature area and is dissolved in si fused solution, subsequently mainly by si fused solution
C fused solution is risen the low-temperature space reaching si fused solution near surface by convection action, so that c fused solution mistake in low-temperature space
Saturation.The sic seed crystal being fixed on graphite rod end is held close on fused solution surface by the stretching of graphite rod, in this phase
Between, oversaturated c passes through in sic seed crystal Epitaxial growth, thus obtains sic monocrystalline.
But following situation can be had according to the liquid phase method of this quasi-tradition: on the aufwuchsplate of sic crystal often relatively
Easily produce hillock.If generation hillock, monocrystalline can be grown individually by hillock, thus leading to polycrystallization.Even if
Slight growth conditionss are had to change, such as in the fused solution at crystal growing surface, the slight change of c concentration and temperature can cause
The polycrystallization of multiple independent growth hills, hinders to be formed and has the homogeneous single crystal of flat growth surface, exists and is difficult to stable remain flat
The problem in smooth crystalline growth face.Liquid phase method is thermal balance process, is easier in theory to control growth conditionss compared with sublimed method,
But in order to solve flat this problem of crystalline growth face of stable maintenance it is necessary to strictly control very much the convection current of fused solution, temperature
The parameters such as degree gradient, bring great difficulty to concrete operations.
Content of the invention
The deficiency being existed according to prior art and blank, of the present utility model inventor provide outside a kind of many crucibles liquid phase
Prolong the bogey of sic crystal, by graphite rope pin down allow sic seed crystal be fixed on crucible bottom be immersed in fused solution raw
Long, provide metastable growing environment thus can to the growth of sic crystal, by the flowing of fused solution be easy to by c to
Partly supply near the sic seed crystal of bottom, carry out many crucible growth improve production efficiencies simultaneously again, solve present in solwution method
Growing environment is unstable, a series of low difficult problems of growth rate.
Concrete technical scheme of the present utility model is as follows:
A kind of bogey of many crucibles liquid phase epitaxy sic crystal, this bogey structure is as follows:
Including cavity, in described cavity, it is provided with several crucibles, outside described crucible bottom, be connected with graphite rope, described
Crucible bottom be connected with sic seed crystal;Described crucible is graphite crucible;
The method realizing many crucibles liquid phase epitaxy sic crystal using this bogey, concretely comprises the following steps:
Sic seed crystal is fixed on crucible bottom, and si raw material is placed in crucible, afterwards crucible is uniformly placed on cavity
Interior, and the graphite rope that each crucible bottom is connected flocks together and is placed in outside cavity, airtight cavity afterwards, and cavity is placed in
In conventional crystalline grower in conventional liquid phase method, according to the method adjusting parameter of existing rheotaxial growth sic crystal;
After sic crystal growth terminates, pull graphite rope, so that every crucible is inverted, sic crystal is inverted to top thus reality
Now separate with fused solution.
During the general crucible quantity in determination, can be adjusted according to producing needs, guarantee that adjacent crucible is anti-in the later stage simultaneously
Will not influence each other when turning and be defined;Simultaneously described crucible so may insure its later stage along chamber outer wall surrounding around setting
It is heated evenly.Why select graphite rope simultaneously, be because it is elementary composition by single c, other miscellaneous elements will not be introduced, with
Shi Shimo is resistant to high temperature in itself it can be ensured that not rupturing in process of production.
In order to reach more preferable effect, cavity bottom can be provided with rotating shaft, by this rotating shaft, whole cavity can be in crystal
Rotated in course of reaction, by this rotation, the rotation of within the chamber crucible can be driven, and can be according to the needs of crystal growth
To carry out acceleration or deceleration, to be flowed with rotation from the fused solution in this crucible it is easy to will to melt c attached to bottom sic seed crystal
Nearly supply.
In sum, inventor provide a kind of bogey of many crucibles liquid phase epitaxy sic crystal, by graphite rope
Pin down and allow sic seed crystal be fixed on crucible bottom to be immersed in fused solution growth, provide phase thus can to the growth of sic crystal
To stable growing environment, it is easy to partly supply c near the sic seed crystal of bottom by the flowing of fused solution, carry out simultaneously again
Many crucibles grow improve production efficiencies, solve that growing environment present in solwution method is unstable, growth rate is low a series of
A difficult problem.
Brief description
Fig. 1 is the bogey structural representation of many crucibles described in the utility model;
Fig. 2 is the structure sectional view of a-a in Fig. 1;
Fig. 3 is the structural representation of the adopted crucible of this utility model;
In figure 1 is cavity, and 2 is crucible, and 3 is graphite rope, and 4 is sic seed crystal.
Specific embodiment
A kind of bogey of many crucibles liquid phase epitaxy sic crystal, the bogey structure of this many crucible is as follows:
Including cavity 1, in described cavity 1, it is provided with several crucibles 2, described crucible 2 bottom outside is connected with graphite rope
3, described crucible 2 bottom is connected with sic seed crystal 4;Described crucible 2 is graphite crucible;Described crucible 2 is along cavity 1 outer wall four
Chow ring is around setting;In present embodiment, the number of crucible 2 is 6.
The method realizing many crucibles liquid phase epitaxy sic crystal using this bogey, concretely comprises the following steps:
Sic seed crystal is fixed on crucible bottom, and si raw material is placed in crucible, afterwards crucible is uniformly placed on cavity
Interior, and the graphite rope that each crucible bottom is connected flocks together and is placed in outside cavity, airtight cavity afterwards, and cavity is placed in
In conventional crystalline grower in conventional liquid phase method, according to the method adjusting parameter of existing rheotaxial growth sic crystal;
After sic crystal growth terminates, pull graphite rope, so that every crucible is inverted, sic crystal is inverted to top thus reality
Now separate with fused solution.
Claims (3)
1. a kind of bogey of many crucibles liquid phase epitaxy sic crystal it is characterised in that: concrete structure is as follows:
Including cavity (1), in described cavity (1), it is provided with least two crucibles (2), described crucible (2) bottom outside is connected with
Graphite rope (3), described crucible (2) bottom is connected with sic seed crystal (4), and described crucible is graphite crucible.
2. bogey according to claim 1 it is characterised in that: described cavity (1) bottom is provided with rotating shaft.
3. bogey according to claim 1 it is characterised in that: described crucible (2) is along cavity (1) outer wall four chow ring
Around setting.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201620626980.0U CN205907390U (en) | 2016-06-23 | 2016-06-23 | Many crucibles liquid phase epitaxy siC crystal bear device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201620626980.0U CN205907390U (en) | 2016-06-23 | 2016-06-23 | Many crucibles liquid phase epitaxy siC crystal bear device |
Publications (1)
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CN205907390U true CN205907390U (en) | 2017-01-25 |
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CN201620626980.0U Withdrawn - After Issue CN205907390U (en) | 2016-06-23 | 2016-06-23 | Many crucibles liquid phase epitaxy siC crystal bear device |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105970286A (en) * | 2016-06-23 | 2016-09-28 | 山东天岳先进材料科技有限公司 | Method for multi-crucible LPE (liquid phase epitaxy) of SiC crystals |
CN115074820A (en) * | 2022-06-17 | 2022-09-20 | 哈尔滨工业大学 | Double-crucible liquid phase epitaxy preparation method of single crystal RIG thick film |
-
2016
- 2016-06-23 CN CN201620626980.0U patent/CN205907390U/en not_active Withdrawn - After Issue
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105970286A (en) * | 2016-06-23 | 2016-09-28 | 山东天岳先进材料科技有限公司 | Method for multi-crucible LPE (liquid phase epitaxy) of SiC crystals |
CN115074820A (en) * | 2022-06-17 | 2022-09-20 | 哈尔滨工业大学 | Double-crucible liquid phase epitaxy preparation method of single crystal RIG thick film |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
AV01 | Patent right actively abandoned |
Granted publication date: 20170125 Effective date of abandoning: 20180410 |
|
AV01 | Patent right actively abandoned |