CN205564803U - Mantle structure is used in PSS that receives a little preparation - Google Patents
Mantle structure is used in PSS that receives a little preparation Download PDFInfo
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- CN205564803U CN205564803U CN201620141889.XU CN201620141889U CN205564803U CN 205564803 U CN205564803 U CN 205564803U CN 201620141889 U CN201620141889 U CN 201620141889U CN 205564803 U CN205564803 U CN 205564803U
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- mantle
- metal layer
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- broach
- light
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- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 238000004026 adhesive bonding Methods 0.000 abstract 1
- 239000003292 glue Substances 0.000 description 7
- 229910002601 GaN Inorganic materials 0.000 description 6
- 229910052594 sapphire Inorganic materials 0.000 description 5
- 239000010980 sapphire Substances 0.000 description 5
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 241001025261 Neoraja caerulea Species 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Abstract
The utility model relates to a mantle structure is used in PSS that receives a little preparation, the mantle structure includes a mantle main part, and this mantle main part is the cuboid form, is provided with broach group in one side of the major axis direction of mantle main part, broach group comprises the broach that a plurality of equidistance side by side distribute jointly, still be provided with high reflective metal layer on the inner wall of two adjacent recesses that the broach formed, and high reflective metal layer covers two adjacent recesses that the broach formed. The utility model has the advantages of: the utility model provides a high reflective metal layer is add through the inner wall of the recess that the broach formed adjacent to the mantle structure, is exposing when handling, and light was when advancing the mantle, and part light can block by high reflective metal layer, can form the light zone territory of the being exposed to the sun light zone that does not expose to the sun, need not the mantle and shen ru contacts with gluing, has improved pial life.
Description
Technical field
This utility model relates to chip manufacturing field, particularly to a kind of micro-nano PSS preparation Soft film structure.
Background technology
Light emitting diode (LED) is a kind of electro-optic conversion, energy-efficient, environmental protection, the advantages such as life-span length, indicate in traffic, indoor and outdoor total colouring, the aspects such as LCD TV backlight source have a wide range of applications, especially can realize semiconductor solid lighting with LED, it is expected to become a new generation's light source and enters huge numbers of families, the mankind are caused to illuminate the revolution in history, wherein apply yellow fluorescent powder on the blue-ray LED chip of Sapphire Substrate growing gallium nitride extension, blue light excitated fluorescent powder sends gold-tinted, blue light and gold-tinted are mixed to get white light, thus obtain white light with blue-ray LED.Gallium nitride substrate material is common two kinds, i.e. sapphire and carborundum, carborundum machining property is poor, problem in terms of expensive and patent makes it apply to be limited, therefore the substrate being currently used in GaN epitaxial growth is mainly sapphire, and epitaxial layer of gallium nitride and sapphire lattice mismatch are quite big, and residualinternal stress is bigger, so growing gallium nitride easily causes substantial amounts of defect on sapphire, and these defects are substantially reduced luminescent device luminous efficiency；There is the difference of bigger refractive index between GaN and air, light shooting angle is less simultaneously, and significant portion is totally reflected back to LED chip internal, reduces the extraction efficiency of light, increases heat radiation difficulty, affects the reliability of LED device.Employing nanoscale PPS substrate technology can be substantially reduced the density of the dislocation of nitride material, the residualinternal stress produced when relaxing epitaxial growth, improves internal quantum efficiency, and light extraction efficiency is substantially improved.
During carrying out micro-nano PSS preparation, in order to improve the service life of mantle, now work out the preparation method of a kind of new micro-nano PSS, when being exposed processing, mantle only micro-with glue need to contact and can realize being exposed unexposed area, region, therefore for the improvement of this technique, need to study a kind of new Soft film structure.
Utility model content
The technical problems to be solved in the utility model is to provide a kind of micro-nano PSS preparation Soft film structure, it is possible to realizes mantle and only micro-with glue need to contact and can realize being exposed unexposed area, region.
For solving above-mentioned technical problem, the technical solution of the utility model is: a kind of micro-nano PSS preparation Soft film structure, and its innovative point is:
Described Soft film structure includes a mantle main body, and this mantle main body is rectangular-shaped, and the side of the long axis direction of mantle main body is provided with comb group；
Described comb group is collectively formed by some comb being equally spaced side by side, the inwall of the groove formed at two adjacent comb is additionally provided with high reflecting metal layer, and high reflecting metal layer covers the groove that adjacent two comb are formed.
The utility model has the advantage of: the inwall of the groove by being formed at adjacent comb of the Soft film structure in this utility model sets up high reflecting metal layer, when being exposed processing, light is through mantle, part light can be stopped by high reflecting metal layer, can be formed and be exposed unexposed area, region, deeply contact with glue without mantle, improve the service life of mantle.
By high reflecting metal layer being covered the design of the groove that adjacent two comb are formed, it is to avoid light arrives situation about penetrating between glue from the sidewall of comb, is wholly constrained in figure by light, effectively improves graphics resolution.
Accompanying drawing explanation
With detailed description of the invention, this utility model is described in further detail below in conjunction with the accompanying drawings.
Fig. 1 is the schematic diagram of micro-nano PSS preparation Soft film structure of the present utility model.
Fig. 2 is to utilize the schematic diagram of glue after micro-nano PSS preparation Soft film structure of the present utility model exposure.
Detailed description of the invention
The following examples can make professional and technical personnel that this utility model is more fully understood, but is the most therefore limited among described scope of embodiments by this utility model.
A kind of micro-nano PSS preparation Soft film structure as shown in Figure 1, including a mantle main body 1, comb group and high reflecting metal layer 3.
This mantle main body 1, in rectangular-shaped, is provided with comb group in the side of the long axis direction of mantle main body 1.
Comb group is collectively formed by some comb 2 being equally spaced side by side, the inwall of the groove formed at two adjacent comb 2 is additionally provided with high reflecting metal layer 3, and high reflecting metal layer 3 covers the groove that adjacent two comb 2 are formed.
Operation principle: when being exposed, opticpath is as shown by the arrows in Figure 1, light is through mantle, light through high reflecting metal layer 3 can be blocked, light through comb 2 can pass through arrival Jiao4Chu, thus the glue 4 after exposure-processed can form exposure area 5 and unexposed area 6, as shown in Figure 2.
It addition, when light arrives at comb 2, even if having some light to penetrate from side, also can be stopped by the light of high reflecting metal layer 3, it is to avoid occur that light arrives glue 4 before from the situation of pattern side wall outgoing.
Skilled person will appreciate that of the industry; this utility model is not restricted to the described embodiments; described in above-described embodiment and description, principle of the present utility model is simply described; on the premise of without departing from this utility model spirit and scope; this utility model also has various changes and modifications, in the range of these changes and improvements both fall within claimed this utility model.This utility model claims scope and is defined by appending claims and equivalent thereof.
Claims (1)
1. a micro-nano PSS preparation Soft film structure, it is characterised in that:
Described Soft film structure includes a mantle main body, and this mantle main body is rectangular-shaped, and the side of the long axis direction of mantle main body is provided with comb group；
Described comb group is collectively formed by some comb being equally spaced side by side, the inwall of the groove formed at two adjacent comb is additionally provided with high reflecting metal layer, and high reflecting metal layer covers the groove that adjacent two comb are formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620141889.XU CN205564803U (en) | 2016-02-26 | 2016-02-26 | Mantle structure is used in PSS that receives a little preparation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620141889.XU CN205564803U (en) | 2016-02-26 | 2016-02-26 | Mantle structure is used in PSS that receives a little preparation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205564803U true CN205564803U (en) | 2016-09-07 |
Family
ID=56818908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620141889.XU Active CN205564803U (en) | 2016-02-26 | 2016-02-26 | Mantle structure is used in PSS that receives a little preparation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205564803U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105609607A (en) * | 2016-02-26 | 2016-05-25 | 海迪科（南通）光电科技有限公司 | Soft film structure for preparing micro-nano PSS |
-
2016
- 2016-02-26 CN CN201620141889.XU patent/CN205564803U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105609607A (en) * | 2016-02-26 | 2016-05-25 | 海迪科（南通）光电科技有限公司 | Soft film structure for preparing micro-nano PSS |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20240328 Address after: 528225, Room A206, Building A, Nanhai Industrial Think Tank City Phase I, Taoyuan Road, Software Park, Shishan Town, Nanhai District, Foshan City, Guangdong Province (Residence Declaration) Patentee after: Foshan xinweilai Photoelectric Technology Co.,Ltd. Country or region after: China Address before: 226500 group 34, Yuhua village, Taoyuan Town, Rugao City, Nantong City, Jiangsu Province Patentee before: DURA-CHIP (NANTONG) Ltd. Country or region before: China |
|
| TR01 | Transfer of patent right |