CN205483913U - Be used for testing hydrophilic device in silicon chip surface - Google Patents

Be used for testing hydrophilic device in silicon chip surface Download PDF

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Publication number
CN205483913U
CN205483913U CN201620245684.6U CN201620245684U CN205483913U CN 205483913 U CN205483913 U CN 205483913U CN 201620245684 U CN201620245684 U CN 201620245684U CN 205483913 U CN205483913 U CN 205483913U
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CN
China
Prior art keywords
connecting rod
silicon chip
wafer surface
slide glass
silicon wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201620245684.6U
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Chinese (zh)
Inventor
裴娜
刘红明
王禹
陈丹丹
范磊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tianjin Yingli New Energy Resource Co Ltd
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Tianjin Yingli New Energy Resource Co Ltd
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Publication date
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Priority to CN201620245684.6U priority Critical patent/CN205483913U/en
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Publication of CN205483913U publication Critical patent/CN205483913U/en
Expired - Fee Related legal-status Critical Current
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Abstract

The utility model provides a be used for testing hydrophilic device in silicon chip surface, including base, slide glass base plate, the slide glass base plate can through the rotating electrical machines for does the base realize 0 180 degree rbitrary angle rotation, be equipped with the position of fixed silicon chip on the slide glass base plate, the position upper portion of fixed silicon chip is equipped with the burette, still be equipped with the translation motor on the base plate, with the translation hub connection of translation motor be the connecting rod, be equipped with the sensor on the connecting rod, the connecting rod can perpendicular to under the drive of translation motor the translation axle reciprocates, does not need artifical the participation at the hydrophilic in -process of test, has reduced the labour cost, has improved degree of automation greatly, distance among the test procedure, and the time, the angle isoparametric all has the device automatic setting, reads, has improved the accuracy of test result.

Description

A kind of device for test silicon wafer surface hydrophilicity
Technical field
This utility model relates to photovoltaic manufacturing technology field, particularly relates to a kind of dress for test silicon wafer surface hydrophilicity Put.
Background technology
During manufacture of solar cells, need to aoxidize at silicon chip surface with shape after silicon chip is carried out wet etching Become layer oxide film, owing to the silicon chip surface after oxidized is become hydrophilic by hydrophobic, therefore to detection silicon chip surface is the most Through oxidized, it usually needs silicon chip surface is carried out hydrophilic test, and pure water is dropped in silicon chip surface by conventional method exactly Diverse location on rear-inclined silicon chip, the speed observing water droplet flowing judges that hydrophilic is good and bad.
The method that silicon chip surface carries out hydrophilic test at present is typically to be completed by manual operation completely, will put by silicon chip On the table top tilted, take liquid at the diverse location that according to technological requirement, the pure water formulating volume is dropped in silicon chip with burette On, the distance of manual observation droplet flow also records droplet flow to the time specifying position.
So, how a kind of device for test silicon wafer surface hydrophilicity is provided, all present in solution prior art Many problems, are current those skilled in the art technical problems urgently to be resolved hurrily.
Utility model content
In view of this, this utility model provides a kind of device for test silicon wafer surface hydrophilicity, solves existing skill Problem present in art, concrete scheme is as follows:
A kind of device for test silicon wafer surface hydrophilicity, it is characterised in that: include base, slide glass substrate, described load Plate base can realize 0-180 degree Arbitrary Rotation by electric rotating machine relative to described base;
Described slide glass substrate is provided with the position of fixing silicon chip, and the top, position of described fixing silicon chip is provided with dropper;
Be additionally provided with translation motor on described substrate, be connected with the translation shaft of described translation motor for connecting rod, described connecting rod Being provided with sensor, described connecting rod can be perpendicular to described translation shaft under the driving of described translation motor and move up and down.
Preferably, the quantity of described dropper is five, is separately positioned on center and the position, corner of described fixing silicon chip Put;
Described connecting rod sets gradually 3, and intermediate connecting rod is provided with a sensor, and two, both sides connecting rod is provided with two biographies Sensor.
Preferably, the position of described fixing silicon chip is vac sorb or is mechanically fixed.
Preferably, also include that control panel, described control panel are provided with on and off switch, setting regions and described setting The supporting adjustment button in region, status indicator lamp.
Preferably, described setting regions includes the setting of the anglec of rotation, the setting of flow distance, the setting of flowing time.
Preferably, the described anglec of rotation is set as 37 degree, and described flow distance is set as 5CM, and described flowing time sets For 60S.
This utility model compared with prior art, has the advantage, that 1, the detecting position of water droplet flowing stroke in this device Put, water droplet flow to specify time of position, is automatically adjusted by device, it is not necessary to manually adjust, and precision is high.2, water in this device Stroke, water droplet that drip moves flow to specify the time of position, all can be reached by being manually entered parameter and be configured, work as inspection When standard inspection standard changes, change can be made in time.3, the digital independent of this device is automatically performed by device, than artificial meter The result that number obtains is accurate.4, this device uses silicon wafer horizontal to rotate to specified angle after carrying out dropping liquid when placing, it is therefore prevented that During dropping liquid, tilting drips causes water droplet to have initial velocity being dropped in silicon chip surface moment, it is to avoid water when inclined-plane drips It is bigger than normal that drip moves stroke, the shortcoming that flow velocity is fast.
Accompanying drawing explanation
In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art, below will be to embodiment Or required accompanying drawing is briefly described in description of the prior art, it should be apparent that, the accompanying drawing in describing below is only this Some embodiments of utility model, for those of ordinary skill in the art, on the premise of not paying creative work, also Other accompanying drawing can be obtained according to these accompanying drawings.
Fig. 1 is the perspective view of provided a kind of detailed description of the invention of the present utility model;
In figure: 10, base 11, electric rotating machine 20, slide glass substrate 21, translation motor 211, translation shaft 22, Connecting rod 23, sensor 30, silicon chip 40, dropper 50, water droplet 60, control panel 61, on and off switch 62, setting Region 63, adjustment button 64, status indicator lamp
Detailed description of the invention
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is carried out Clearly and completely describe, it is clear that described embodiment is only a part of embodiment of this utility model rather than whole Embodiment.Based on the embodiment in this utility model, those of ordinary skill in the art are not under making creative work premise The every other embodiment obtained, broadly falls into the scope of this utility model protection.
With reference to shown in Fig. 1, this utility model claims a kind of device for test silicon wafer surface hydrophilicity, its feature Being: include base 10, slide glass substrate 20, described slide glass substrate 20 can be real relative to described base 10 by electric rotating machine 11 Existing 0-180 degree Arbitrary Rotation;
Described slide glass substrate 20 is provided with the position of fixing silicon chip 30, and the top, position of described fixing silicon chip 30 is provided with dropper 40;
Be additionally provided with translation motor 21 on described substrate 20, be connected with the translation shaft 211 of described translation motor 21 for connecting rod 22, described connecting rod 22 is provided with sensor 23, and described connecting rod 22 can be perpendicular to described under the driving of described translation motor 21 Translation shaft 211 moves up and down.
Concrete, the quantity of described dropper 40 is five, is separately positioned on the center and four of described fixing silicon chip 30 Angle Position;
Described connecting rod 22 sets gradually 3, and middle connecting rod 22 is provided with a sensor 23, on the connecting rod 22 of two, both sides It is provided with two sensors 23.
Further, the position of described fixing silicon chip 30 is vac sorb or is mechanically fixed.
Further, this utility model also include control panel 60, described control panel 60 be provided with on and off switch 61, The setting regions 62 adjustment button 63 supporting with described setting regions 62, status indicator lamp 64.
Concrete, described setting regions 62 includes the setting of the anglec of rotation, the setting of flow distance, the setting of flowing time Fixed.
When using this device, by guidance panel 60 can set the anglec of rotation of slide glass substrate 20, water droplet stream distance, And reach the flowing time of distance to a declared goal, after being fixed on slide glass substrate 20 by silicon chip 30, turn on the power switch 61, slide glass base Plate 20 is rotated set angle by electric rotating machine 11, sensor 23 also by the setting value according to water flow distance in translation motor Moving to specifying position under the drive of 21, a water is dripped 50 surfaces being dropped in silicon chip 30 by five droppers 40 respectively afterwards, dress Putting beginning timing, if in the setting time, sensor 23 detects liquid and has flow to setting position, then silicon chip hydrophilic closes Lattice, status indicator lamp 64 shows green, otherwise, if within a specified time, sensor 23 not up to specifies position, then state instruction Lamp 64 shows redness.
Concrete, the described anglec of rotation is set as 37 degree, and described flow distance is set as 5CM, and described flowing time sets For 60S.
This device need not manually participate in during test is hydrophilic, decreases labour cost, substantially increases certainly Dynamicization degree, the distance in test process, the time, the parameter such as angle all has device to automatically set, read, improves test result Accuracy.
Above a kind of device for test silicon wafer surface hydrophilicity provided by the present invention is described in detail.This Applying specific case in literary composition to be set forth principle and the embodiment of the present invention, the explanation of above example is only intended to Help to understand method and the core concept thereof of the present invention.It should be pointed out that, for those skilled in the art, Without departing from the principles of the invention, it is also possible to the present invention is carried out some improvement and modification, these improve and modify also to fall Enter in the protection domain of the claims in the present invention.

Claims (6)

1. the device for test silicon wafer surface hydrophilicity, it is characterised in that:
Including base, slide glass substrate, described slide glass substrate can realize 0-180 degree by electric rotating machine relative to described base and appoint Meaning angle rotates;
Described slide glass substrate is provided with the position of fixing silicon chip, and the top, position of described fixing silicon chip is provided with dropper;
Be additionally provided with translation motor on described substrate, be connected with the translation shaft of described translation motor for connecting rod, described connecting rod sets Having sensor, described connecting rod can be perpendicular to described translation shaft under the driving of described translation motor and move up and down.
Device for test silicon wafer surface hydrophilicity the most according to claim 1, it is characterised in that:
The quantity of described dropper is five, is separately positioned on center and the corner location of described fixing silicon chip;
Described connecting rod sets gradually 3, and intermediate connecting rod is provided with a sensor, and two, both sides connecting rod is provided with two sensings Device.
Device for test silicon wafer surface hydrophilicity the most according to claim 1, it is characterised in that: described fixing silicon chip Position be vac sorb or be mechanically fixed.
4. according to the device for test silicon wafer surface hydrophilicity described in any one of claim 1-3, it is characterised in that: also wrap Include control panel, described control panel be provided with on and off switch, the setting regions adjustment button supporting with described setting regions, Status indicator lamp.
Device for test silicon wafer surface hydrophilicity the most according to claim 4, it is characterised in that: described setting regions Including the setting of the anglec of rotation, the setting of flow distance, the setting of flowing time.
Device for test silicon wafer surface hydrophilicity the most according to claim 5, it is characterised in that: the described anglec of rotation Being set as 37 degree, described flow distance is set as that 5CM, described flowing time are set as 60S.
CN201620245684.6U 2016-03-28 2016-03-28 Be used for testing hydrophilic device in silicon chip surface Expired - Fee Related CN205483913U (en)

Priority Applications (1)

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CN201620245684.6U CN205483913U (en) 2016-03-28 2016-03-28 Be used for testing hydrophilic device in silicon chip surface

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Application Number Priority Date Filing Date Title
CN201620245684.6U CN205483913U (en) 2016-03-28 2016-03-28 Be used for testing hydrophilic device in silicon chip surface

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107367446A (en) * 2017-09-20 2017-11-21 廊坊立邦涂料有限公司 A kind of hydrophilic detection method of paint coatings
CN110286062A (en) * 2019-06-11 2019-09-27 浙江伟星新型建材股份有限公司 A kind of device and method for testing inner wall of the pipe hydrophobic performance
CN112666050A (en) * 2020-11-30 2021-04-16 江苏科技大学 Functional surface hydrophilic performance testing device and characterization method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107367446A (en) * 2017-09-20 2017-11-21 廊坊立邦涂料有限公司 A kind of hydrophilic detection method of paint coatings
CN110286062A (en) * 2019-06-11 2019-09-27 浙江伟星新型建材股份有限公司 A kind of device and method for testing inner wall of the pipe hydrophobic performance
CN110286062B (en) * 2019-06-11 2021-08-31 临海伟星新型建材有限公司 Equipment and method for testing hydrophobic property of inner wall of pipeline
CN112666050A (en) * 2020-11-30 2021-04-16 江苏科技大学 Functional surface hydrophilic performance testing device and characterization method

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C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160817

CF01 Termination of patent right due to non-payment of annual fee