CN205398724U - Base plate bearing structure and filming equipment - Google Patents
Base plate bearing structure and filming equipment Download PDFInfo
- Publication number
- CN205398724U CN205398724U CN201620161379.9U CN201620161379U CN205398724U CN 205398724 U CN205398724 U CN 205398724U CN 201620161379 U CN201620161379 U CN 201620161379U CN 205398724 U CN205398724 U CN 205398724U
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- Prior art keywords
- cap
- dottle pin
- pin portion
- support
- described support
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- 239000000758 substrate Substances 0.000 claims abstract description 68
- 239000000463 material Substances 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 238000000926 separation method Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 239000007770 graphite material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 230000000630 rising effect Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002372 labelling Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The utility model discloses a base plate bearing structure and filming equipment relates to filming equipment technical field, can solve prior art on guaranteeing the basis of product quality in the problem that shortens of base plate bearing structure life. This base plate bearing structure includes supporting platform and fixed part, be equipped with recess and through -hole in the supporting platform, be equipped with the bracing piece in the through -hole, the bottom of bracing piece can be supported with the fixed part and lean on, the top of bracing piece is equipped with the support cap, it can be located the recess to support the cap, the upper surface that supports the cap is greater than supporting platform's thickness to the distance of bracing piece bottom, the lower surface that supports the cap is relative with the bottom surface of recess, supporting platform can reciprocate, be equipped with dottle pin portion between the lower surface of support cap and the bottom surface of recess, dottle pin portion is fixed with the bracing piece, the hardness of dottle pin portion is greater than the hardness that supports the cap, the upper surface that supports the cap equals the degree of depth of recess to the surperficial distance of dottle pin troops under one's command, dottle pin portion can make the internal surface separation of supporting cap and recess. The utility model is used for the supporting substrate.
Description
Technical field
This utility model relates to filming equipment technical field, particularly relates to a kind of substrate support structure and filming equipment.
Background technology
In the production process of liquid crystal panel or thin-film solar cells, it will usually use the outer surface that PECVD (PlasmaEnhancedChemicalVaporDeposition, plasma enhanced chemical vapor deposition method) equipment is substrate to carry out plated film.
Being provided with substrate support structure in the process cavity of PECVD device, with reference to Fig. 1, existing substrate support structure includes supporting platform 01 and fixed part 02, supports platform 01 and is provided with stepped hole 03, is provided with auxiliary supports 04 in stepped hole 03.Support platform 01 liftable, when supporting platform 01 and being in position shown in Fig. 1, the bottom of auxiliary supports 04 and fixed part 02 against, the top of auxiliary supports 04 is higher than the upper surface supporting platform 01 simultaneously, thus substrate 05 is held up, make substrate 05 separate with the upper surface supporting platform 01, and then facilitate the mechanical hand loading or unloading operation to substrate 05.
When needing plated film, support platform 01 to be gradually increasing, the step surface 031 of stepped hole 03 moves closer to the support cap 041 of auxiliary supports 04, eventually it is supported on the lower surface supporting cap 041, as in figure 2 it is shown, now, support cap 041 and sink in stepped hole 03, and the upper surface of support cap 041 is concordant with the upper surface supporting platform 01, thus common support substrate 05.
In order to reduce the impact on substrate 05 film quality performance, supporting cap 041 generally selects the material all close with support platform 01 electric conductivity and heat conductivity to make, such as aluminum or graphite, but in hot environment, aluminum is readily adhered on the lower surface of substrate 05, affect the quality of substrate 05, therefore, support cap 041 at present and generally select graphite material to make.
But, owing to graphite quality is soft, intensity is low, easily rupture with the connecting portion of support bar 042 after the support force being repeatedly subject to step surface 031, cause that the service life of substrate support structure shortens.
Utility model content
Embodiment of the present utility model provides a kind of substrate support structure and filming equipment, can solve the problem of substrate support structure shortening in service life in prior art on the basis of guarantee product quality.
For reaching above-mentioned purpose, embodiment of the present utility model adopts the following technical scheme that
nullThis utility model embodiment provides a kind of substrate support structure，Including supporting platform and being located at the fixed part below described support platform，The upper surface of described support platform is provided with groove，Described groove floor and the through hole of described support platform lower surface it is provided with through in described support platform，It is provided with support bar in described through hole，The bottom of described support bar can with described fixed part against，The top of described support bar is provided with support cap，Described support cap can be located in described groove，The upper surface of described support cap to the distance of described support bar bottom more than the thickness of described support platform，The lower surface of described support cap is relative with the bottom surface of described groove，Described support platform is connected to driving device，Described driving device can drive described support platform to move up and down，It is provided with dottle pin portion between lower surface and the bottom surface of described groove of described support cap，Described dottle pin portion and described support bar are fixed，The hardness in described dottle pin portion is more than the hardness of described support cap，The upper surface of described support cap to the distance of described dottle pin lower surface equal to the degree of depth of described groove，Described dottle pin portion can make described support cap separate with the inner surface of described groove.
Further, described dottle pin portion adapts with the shape and size of described support cap lower surface.
Further, the upper surface in described dottle pin portion is fitted with the lower surface of described support cap.
Further, described dottle pin portion is one-body molded with described support bar.
Further, the lower surface in described dottle pin portion is provided with head rod, and the top of described support bar is provided with the first connecting hole, and described head rod inserts in described first connecting hole, and is fixed by the first steady pin.
Further, described head rod is one-body molded with described dottle pin portion.
Further, the lower surface of described support cap is provided with the second connecting rod, and the top of described support bar is provided with the second connecting hole, and described second connecting rod is inserted in described second connecting hole, and is fixed by the second steady pin.
Further, described second connecting rod is one-body molded with described support cap.
Further, the thickness in described dottle pin portion is more than or equal to 1mm.
Further, the material in described dottle pin portion is pottery, rustless steel or aluminum.
nullA kind of substrate support structure that this utility model embodiment provides，First，Owing to being provided with dottle pin portion between lower surface and the bottom surface of described groove of described support cap，Described dottle pin portion and described support bar are fixed，The upper surface of described support cap to the distance of described dottle pin lower surface equal to the degree of depth of described groove，Therefore，Along with the rising supporting platform，When the bottom supporting of groove is on the lower surface in dottle pin portion，The upper surface supporting cap is just concordant with the upper surface supporting platform，That is，The substrate support structure that this utility model embodiment provides can carry out common support substrate by support platform and support cap，Simultaneously，Described support cap still can be selected all close with described support platform electric conductivity and heat conductivity、Weak with the adhesion of described substrate、And the graphite material easily cleaning removal makes，Thus the impact on substrate film quality performance can be reduced，Ensure the quality of product；
Secondly; owing to described dottle pin portion can make described support cap separate with the inner surface of described groove; therefore; this dottle pin portion can play a protective role to supporting cap; can avoid supporting platform extruding and support cap; that is; before this dottle pin portion is unbroken; support cap without fracture; again owing to the hardness in described dottle pin portion is more than the hardness of described support cap, therefore comparing support cap, this dottle pin portion is not easy fracture when stress with the connecting portion of support bar; so that supporting cap be also not easy fracture, and then extend the service life of substrate support structure.
This utility model embodiment additionally provides a kind of filming equipment, including the substrate support structure in any of the above-described technical scheme.
nullThe filming equipment that this utility model embodiment provides，First，Owing to being provided with dottle pin portion between lower surface and the bottom surface of described groove of described support cap，Described dottle pin portion and described support bar are fixed，The upper surface of described support cap to the distance of described dottle pin lower surface equal to the degree of depth of described groove，Therefore，Along with the rising supporting platform，When the bottom supporting of groove is on the lower surface in dottle pin portion，The upper surface supporting cap is just concordant with the upper surface supporting platform，That is，The filming equipment that this utility model embodiment provides can carry out common support substrate by support platform and support cap，Simultaneously，Described support cap still can be selected all close with described support platform electric conductivity and heat conductivity、Weak with the adhesion of described substrate、And the graphite material easily cleaning removal makes，Thus the impact on substrate film quality performance can be reduced，Ensure the quality of product；
Secondly; owing to described dottle pin portion can make described support cap separate with the inner surface of described groove; therefore; this dottle pin portion can play a protective role to supporting cap; can avoid supporting platform extruding and support cap; that is; before this dottle pin portion is unbroken; support cap without fracture; again owing to the hardness in described dottle pin portion is more than the hardness of described support cap, therefore comparing support cap, this dottle pin portion is not easy fracture when stress with the connecting portion of support bar; so that supporting cap be also not easy fracture, and then extend the service life of substrate support structure.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of substrate support structure in prior art；
Fig. 2 supports the schematic diagram that cap sinks in stepped hole in Fig. 1；
Fig. 3 is one of schematic diagram of this utility model embodiment substrate support structure；
Fig. 4 is that Fig. 3 further groove bottom supporting is in the schematic diagram of dottle pin lower surface；
Fig. 5 is the two of the schematic diagram of this utility model embodiment substrate support structure；
Fig. 6 is that Fig. 5 further groove bottom supporting is in the schematic diagram of dottle pin lower surface；
Accompanying drawing labelling:
1-supports platform；2-fixed part；3-groove；
4-through hole；5-support bar；6-supports cap；
7-dottle pin portion；8-substrate；9-head rod；
10-the first steady pin；11-the second connecting rod；12-the second steady pin.
Detailed description of the invention
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is clearly and completely described, it is clear that described embodiment is only a part of embodiment of this utility model, rather than whole embodiments.Based on the embodiment in this utility model, the every other embodiment that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of this utility model protection.
In description of the present utility model, it will be appreciated that, orientation or the position relationship of the instruction such as term " " center ", " on ", D score, "front", "rear", "left", "right", " vertically ", " level ", " top ", " end ", " interior ", " outward " be based on orientation shown in the drawings or position relationship; be for only for ease of description this utility model and simplifying and describe; rather than instruction or imply indication device or element must have specific orientation, with specific azimuth configuration and operation, therefore it is not intended that to restriction of the present utility model.
Term " first ", " second " only for descriptive purposes, and it is not intended that instruction or hint relative importance or the implicit quantity indicating indicated technical characteristic.Thus, define " first ", the feature of " second " can express or implicitly include one or more these features.
In description of the present utility model, it is necessary to explanation, unless otherwise clearly defined and limited, term " installation ", " being connected ", " connection " should be interpreted broadly, for instance, it is possible to it is fixing connection, it is also possible to be removably connect, or connect integratedly；Can be joined directly together, it is also possible to be indirectly connected to by intermediary, it is possible to be the connection of two element internals.For the ordinary skill in the art, it is possible to concrete condition understands above-mentioned term concrete meaning in this utility model.
nullThis utility model embodiment provides a kind of substrate support structure，As shown in Figures 3 to 6，Including supporting platform 1 and being located at the fixed part 2 supported below platform 1，The upper surface supporting platform 1 is provided with groove 3，Support and be provided with through groove 3 bottom surface in platform 1 and support the through hole 4 of platform 1 lower surface，Support bar 5 it is provided with in through hole 4，The bottom of support bar 5 can with fixed part 2 against，The top of support bar 5 is provided with support cap 6，Support cap 6 to can be located in groove 3，Support cap 6 upper surface to support bar 5 bottom distance more than support platform 1 thickness，The lower surface supporting cap 6 is relative with the bottom surface of groove 3，Support platform 1 and be connected to driving device (not shown)，Described driving device can drive support platform 1 to move up and down，Support and be provided with dottle pin portion 7 between lower surface and the bottom surface of groove 3 of cap 6，Dottle pin portion 7 is fixed with support bar 5，The hardness in dottle pin portion 7 is more than the hardness supporting cap 6，Support cap 6 upper surface to dottle pin portion 7 lower surface distance be equal to groove 3 the degree of depth，Dottle pin portion 7 can make support cap 6 separate with the inner surface of groove 3.
nullA kind of substrate support structure that this utility model embodiment provides，First，Owing to being provided with dottle pin portion 7 between lower surface and the bottom surface of groove 3 of support cap 6，Dottle pin portion 7 is fixed with support bar 5，Support cap 6 upper surface to dottle pin portion 7 lower surface distance be equal to groove 3 the degree of depth，Therefore，Along with the rising supporting platform 1，When the bottom supporting of groove 3 is on the lower surface in dottle pin portion 7，The upper surface supporting cap 6 is just concordant with the upper surface supporting platform 1，That is，The substrate support structure that this utility model embodiment provides can carry out common support substrate 8 by support platform 1 and support cap 6，Simultaneously，Support cap 6 still to select and support platform 1 electric conductivity and heat conductivity is all close、Weak with the adhesion of substrate 8、And the graphite material easily cleaning removal makes，Thus the impact on substrate 8 film quality performance can be reduced，Ensure the quality of product；
Secondly; owing to dottle pin portion 7 can make support cap 6 separate with the inner surface of groove 3; therefore; this dottle pin portion 7 can play a protective role to supporting cap 6; can avoid supporting platform 1 extruding and support cap 6; that is; before this dottle pin portion 7 is unbroken; support cap 6 without fracture; again owing to the hardness in dottle pin portion 7 is more than the hardness supporting cap 6, therefore comparing support cap 6, this dottle pin portion 7 is not easy fracture when stress with the connecting portion of support bar 5; so that supporting cap 6 be also not easy fracture, and then extend the service life of substrate support structure.
Can directly be connected with the top of support bar 5 it should be noted that support cap 6, as shown in Figure 3 and Figure 4, it is possible to be connected with the dottle pin portion 7 being arranged at support bar 5 top, as shown in Figure 5 and Figure 6.Described substrate support structure can be used in coating process, it is also possible to needs in the technique of support substrate at other, for instance etching technics.When described substrate support structure is used in coating process, supporting platform 1 is the bottom crown in filming equipment.Substrate 8 can be the glass substrate in liquid crystal panel, it is also possible to for solar battery sheet.
Preferably, dottle pin portion 7 and the shape and size supporting cap 6 lower surface adapt, and thus, it is possible to increase the lifting surface area in dottle pin portion 7, thus reducing pressure, further reduce the probability of dottle pin portion 7 fracture；It addition, the area in dottle pin portion 7 also can be avoided excessive, thus the sidewall that groove 3 can be prevented and the excesssive gap supported between cap 6, and then avoid the film quality performance to substrate 8 and impact.
In order to make on substrate 8 Temperature Distribution of various location evenly, the upper surface in dottle pin portion 7 and the lower surface laminating supporting cap 6 in the present embodiment, thus, when the bottom supporting of groove 3 is on the lower surface in dottle pin portion 7, the heat supported on platform 1 can quickly be conducted to supporting on cap 6 by dottle pin portion 7, namely increase heat and conduct to the efficiency supporting cap 6 from supporting platform 1, so that on substrate 8 with support the position that contact of platform 1 and the temperature of position that contacts with support cap 6 is basically identical, and then make on substrate 8 Temperature Distribution of various location evenly, the film quality performance making substrate 8 is better.
The fixed form of dottle pin portion 7 and support bar 5 has multiple, in a kind of embodiment of the present utility model, with reference to Fig. 3 and Fig. 4, dottle pin portion 7 is one-body molded with support bar 5, thus can save the attachment structure between dottle pin portion 7 and support bar 5, so that the connection of dottle pin portion 7 and support bar 5 is fixed more convenient.
In another kind of embodiment of the present utility model, with reference to Fig. 5 and Fig. 6, the lower surface in dottle pin portion 7 is provided with head rod 9, and the top of support bar 5 is provided with the first connecting hole (not shown), and head rod 9 inserts in described first connecting hole, and fixed by the first steady pin 10, so that dottle pin portion 7 is detachable with support bar 5, therefore, dottle pin portion 7 can be individually replaced when rupturing in dottle pin portion 7, together change without by dottle pin portion 7 and support bar 5, thus decreasing the waste of cost.Now, supporting cap 6 can be the graphite linings adhering to dottle pin portion 7 upper surface.
On the basis of above-described embodiment, head rod 9 is one-body molded with dottle pin portion 7, thus can save the attachment structure between head rod 9 and dottle pin portion 7, so that the connection in head rod 9 and dottle pin portion 7 is fixed more convenient.
When dottle pin portion 7 and support bar 5 are one-body molded, with reference to Fig. 3 and Fig. 4, the lower surface supporting cap 6 in the present embodiment is provided with the second connecting rod 11, the top of support bar 5 is provided with the second connecting hole (not shown), second connecting rod 11 is inserted in described second connecting hole, and fixed by the second steady pin 12, so that it is detachable with support bar 5 to support cap 6, therefore, have only to when rupturing in dottle pin portion 7 change dottle pin portion 7 and support bar 5, it is replaced without by dottle pin portion 7, support bar 5 and support cap 6 entirety, thus decreasing the waste of cost.
On the basis of above-described embodiment, the second connecting rod 11 is one-body molded with support cap 6, thus can save the second connecting rod 11 and the attachment structure supported between cap 6, so that the second connecting rod 11 and the connection supporting cap 6 are fixed more convenient.
In order to extend the service life of substrate support structure further, in the present embodiment, the thickness in dottle pin portion 7 is more than or equal to 1mm, thus can promoting the structural strength in dottle pin portion 7, thus reducing the probability of dottle pin portion 7 fracture, also just extending the service life of substrate support structure further.
Due to when plated film, corrosive gas is there is in filming equipment process cavity, and temperature in process cavity is higher, therefore, the material in dottle pin portion 7 can be selected for being provided simultaneously with the metal material of feature, macromolecular material or the other materials such as high temperature resistant, corrosion-resistant, high rigidity, in the present embodiment, the material in dottle pin portion 7 is preferably pottery, rustless steel or aluminum, thus, the longer service life in dottle pin portion 7 can not only be made, moreover it is possible to reduce substrate support structure cost.
This utility model embodiment additionally provides a kind of filming equipment, including the substrate support structure described in any of the above-described embodiment.
nullThe filming equipment that this utility model embodiment provides，First，Owing to being provided with dottle pin portion 7 between lower surface and the bottom surface of groove 3 of support cap 6，Dottle pin portion 7 is fixed with support bar 5，Support cap 6 upper surface to dottle pin portion 7 lower surface distance be equal to groove 3 the degree of depth，Therefore，Along with the rising supporting platform 1，When the bottom supporting of groove 3 is on the lower surface in dottle pin portion 7，The upper surface supporting cap 6 is just concordant with the upper surface supporting platform 1，That is，The filming equipment that this utility model embodiment provides can carry out common support substrate 8 by support platform 1 and support cap 6，Simultaneously，Support cap 6 still to select and support platform 1 electric conductivity and heat conductivity is all close、Weak with the adhesion of substrate 8、And the graphite material easily cleaning removal makes，Thus the impact on substrate 8 film quality performance can be reduced，Ensure the quality of product；
Secondly; owing to dottle pin portion 7 can make support cap 6 separate with the inner surface of groove 3; therefore; this dottle pin portion 7 can play a protective role to supporting cap 6; can avoid supporting platform 1 extruding and support cap 6; that is; before this dottle pin portion 7 is unbroken; support cap 6 without fracture; again owing to the hardness in dottle pin portion 7 is more than the hardness supporting cap 6, therefore comparing support cap 6, this dottle pin portion 7 is not easy fracture when stress with the connecting portion of support bar 5; so that supporting cap 6 be also not easy fracture, and then extend the service life of substrate support structure.
Other compositions about the filming equipment of this utility model embodiment wait known by those skilled in the art, no longer describe in detail at this.
The above; it is only detailed description of the invention of the present utility model; but protection domain of the present utility model is not limited thereto; any those familiar with the art is in the technical scope that this utility model discloses; change can be readily occurred in or replace, all should be encompassed within protection domain of the present utility model.Therefore, protection domain of the present utility model should be as the criterion with described scope of the claims.
Claims (11)
1. a substrate support structure, including supporting platform and being located at the fixed part below described support platform, the upper surface of described support platform is provided with groove, described groove floor and the through hole of described support platform lower surface it is provided with through in described support platform, it is provided with support bar in described through hole, the bottom of described support bar can with described fixed part against, the top of described support bar is provided with support cap, described support cap can be located in described groove, the upper surface of described support cap to the distance of described support bar bottom more than the thickness of described support platform, the lower surface of described support cap is relative with the bottom surface of described groove, described support platform is connected to driving device, described driving device can drive described support platform to move up and down, it is characterized in that,
It is provided with dottle pin portion between lower surface and the bottom surface of described groove of described support cap, described dottle pin portion and described support bar are fixed, the hardness in described dottle pin portion is more than the hardness of described support cap, the upper surface of described support cap is to the distance of described dottle pin lower surface equal to the degree of depth of described groove, and described dottle pin portion can make described support cap separate with the inner surface of described groove.
2. substrate support structure according to claim 1, it is characterised in that the shape and size of described dottle pin portion and described support cap lower surface adapt.
3. substrate support structure according to claim 1, it is characterised in that the lower surface of the upper surface in described dottle pin portion and described support cap is fitted.
4. substrate support structure according to claim 1, it is characterised in that described dottle pin portion is one-body molded with described support bar.
5. substrate support structure according to claim 1, it is characterized in that, the lower surface in described dottle pin portion is provided with head rod, and the top of described support bar is provided with the first connecting hole, described head rod inserts in described first connecting hole, and is fixed by the first steady pin.
6. substrate support structure according to claim 5, it is characterised in that described head rod is one-body molded with described dottle pin portion.
7. substrate support structure according to claim 4, it is characterized in that, the lower surface of described support cap is provided with the second connecting rod, and the top of described support bar is provided with the second connecting hole, described second connecting rod is inserted in described second connecting hole, and is fixed by the second steady pin.
8. substrate support structure according to claim 7, it is characterised in that described second connecting rod is one-body molded with described support cap.
9. substrate support structure according to claim 1, it is characterised in that the thickness in described dottle pin portion is more than or equal to 1mm.
10. substrate support structure according to claim 1, it is characterised in that the material in described dottle pin portion is pottery, rustless steel or aluminum.
11. a filming equipment, it is characterised in that include the substrate support structure according to any one of claim 1～10.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620161379.9U CN205398724U (en) | 2016-03-02 | 2016-03-02 | Base plate bearing structure and filming equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620161379.9U CN205398724U (en) | 2016-03-02 | 2016-03-02 | Base plate bearing structure and filming equipment |
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| Publication Number | Publication Date |
|---|---|
| CN205398724U true CN205398724U (en) | 2016-07-27 |
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| CN201620161379.9U Expired - Fee Related CN205398724U (en) | 2016-03-02 | 2016-03-02 | Base plate bearing structure and filming equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115650772A (en) * | 2022-10-31 | 2023-01-31 | 上海拓赛半导体材料有限公司 | Method for processing central support rod for vapor deposition coating equipment |
-
2016
- 2016-03-02 CN CN201620161379.9U patent/CN205398724U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115650772A (en) * | 2022-10-31 | 2023-01-31 | 上海拓赛半导体材料有限公司 | Method for processing central support rod for vapor deposition coating equipment |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160727 |