CN205352020U - Portable wafer hair -dryer - Google Patents
Portable wafer hair -dryer Download PDFInfo
- Publication number
- CN205352020U CN205352020U CN201521111745.1U CN201521111745U CN205352020U CN 205352020 U CN205352020 U CN 205352020U CN 201521111745 U CN201521111745 U CN 201521111745U CN 205352020 U CN205352020 U CN 205352020U
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- CN
- China
- Prior art keywords
- corrosion resistant
- resistant plate
- stainless steel
- wafer
- hollow corrosion
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model discloses a portable wafer hair -dryer, including bottom plate, slip table, driver, electric lift rod, L type connecting rod, cavity corrosion resistant plate and air exhauster, bottom plate, driver, air exhauster are installed subaerial, the slider is installed on the bottom plate, electric lift rod installs on the slip table, the tip at electric lift rod, one end welded connection cavity corrosion resistant plate are installed to L type connecting rod one end, the air exhauster passes through tuber pipe and cavity corrosion resistant plate intercommunication, the tuber pipe is connected the plastic tubing by pipe joint and is become with the stainless steel nest of tubes, is equipped with two heating rods on the nonrust steel pipe, set up the thermocouple on the cavity corrosion resistant plate, cavity corrosion resistant plate is rectangular bodily form structure, and the level is placed, and one side down is equipped with the ventilation hole. Utilize the utility model discloses a hair -dryer can be high -efficient, safe, simple dry wafer, guarantee especially that the performance of dry back wafer is not influenced.
Description
Technical field
This utility model relates to a kind of wafer manufacture device, is specifically related to a kind of portable wafer hair-dryer, for the safe and efficient production of wafer.
Background technology
Since Curie brother is found that quartz crystal has piezoelectric effect, piezoelectric quartz crystal technology has the history of 100 years so far.In 40～fifties, being widely used in military affairs, communication aspect, early stage is all process with natural quartz, is relatively used for low frequency.The fifties, start to process for artificial crystal.The seventies, occur in that high frequency monolithic crystal filter, be widely used in wireless, microwave, digital communication, communication navigation and aerospace flight technology.In recent years, due to artificial quartz crystal synthetic technology, developing rapidly of production technology, production cost significantly declines, and makes the application of crystal go deep into each family.
Synthetic quartz rod, through operations such as cutting, grinding, corrosion, is processed into variously-shaped wafer, and frequency and the thickness of wafer are inversely proportional to, and the characteristic of wafer is affected very big by the outward appearance of wafer, size and dimension.Quartz wafer (semi-finished product) is through welding electrode, mounting bracket, electronic component--the quartz resonator (abbreviation crystal) of the working procedure processing finished product such as package casing.Crystal is made up of parts such as quartz wafer, support, shells.The kind of crystal has 49U, 49S, UM, SMD (surface mount) tuning fork crystal (table is brilliant).Quartz wafer and peripheral circuit composition quartz crystal device.Main devices has: crystal filter, quartz oscillator (PXO), temperature compensating crystal oscillator (TCXO), voltage controlled oscillator, (VCXO), Temperature Controlled Oscillator (OCXO).
In wafer manufacture step, relate to repeatedly matting.In current production process, the wafer after cleaning be placed in baking oven dry, there is drawback, oven can on wafer surface micro structure produce impact, thus causing that wafer property change, particularly baking oven or make wafer generation internal stress；So in prior art, after each drying and processing, having certain scrappage.
So, necessary research and development New drying equipment, for the drying of wafer cleaning rear surface moisture, ensure that wafer property is unaffected simultaneously.
Summary of the invention
Goal of the invention of the present utility model is to provide a kind of portable wafer hair-dryer, it is possible to dry up uniformly and effectively wafer surface with water.
To achieve the above object of the invention, the technical solution adopted in the utility model is: a kind of portable wafer hair-dryer, including base plate, slide unit, driver, electric lifting rod, L-type connecting rod, hollow corrosion resistant plate and air exhauster；Described base plate is installed on the ground；Described driver is installed on the ground；Described slide block is arranged on base plate；Described driver is connected with slide block；Described electric lifting rod is arranged on slide unit；Described L-type connecting rod one end is arranged on electric up-down boom end, and one end connects hollow corrosion resistant plate；Described air exhauster is installed on the ground, is connected with hollow corrosion resistant plate by airduct；Described airduct is made up of plastic tube, stainless steel tube and pipe joint；Described plastic tube is connected by pipe joint with stainless steel tube；Described plastic tube connects air exhauster, and stainless steel tube connects hollow corrosion resistant plate；Described stainless steel tube is provided with two heating rods；Described hollow corrosion resistant plate arranges thermocouple；Described hollow corrosion resistant plate is cuboid structure；Described hollow corrosion resistant plate horizontal positioned；Described hollow corrosion resistant plate one side down is provided with air vent；The diameter of described air vent is 2mm～3mm.
In this utility model, air exhauster, plastic tube, pipe joint, stainless steel tube and hollow corrosion resistant plate are sequentially connected with, and air exhauster air-supply enters plastic tube, are entering stainless steel tube through pipe joint, finally enter the hollow part of hollow corrosion resistant plate, blow out from the air vent of bottom surface；Set the caliber of plastic tube as 4 centimetres；The caliber of stainless steel tube is 3.5 centimetres, thus being conducive to the heating rod being located at stainless steel tube place effectively to add hot-air；The size of hollow corrosion resistant plate and the quantity of air vent are not particularly limited, and those skilled in the art can select according to practical condition, blow out as long as being beneficial to thermal current；The diameter of preferred air vent is 2.5mm, meets aerodynamic, and the steam of blowout does not dissipate.
According to real use state, hollow corrosion resistant plate horizontal positioned refers to maximum two faces of hollow corrosion resistant plate area and plane-parallel, is overlying relation；Can being welded to connect with L-type connecting rod, upper surface is the installation position of L-type connecting rod, and lower surface arranges air vent so that thermal current is toward blowing down；The wafer that need to dry is positioned at immediately below hollow corrosion resistant plate, thus hot-fluid can blow to tide wafer, therefore realizes functions/drying.
This utility model arranges thermocouple simultaneously on hollow corrosion resistant plate, it is possible to the temperature of air in monitoring hollow corrosion resistant plate, with high temperature-proof or low temperature.Once there is needing the phenomenon of emergent stopping, then control electric lifting rod and improve hollow corrosion resistant plate by L-type connecting rod, it is to avoid wafer superheated.
In two heating rods disclosed in this utility model, a heating rod is positioned on stainless steel pipes near one end of pipe joint, and another root heating rod is positioned on stainless steel pipes near one end of hollow corrosion resistant plate.Be conducive to air homogeneous heating, keep certain temperature.
Owing to technique scheme is used, this utility model compared with prior art has the advantage that
1. this utility model provides first and a kind of is suitable for the device that wafer dries up, after wafer chunk completes to clean, and portable blowing, thus complete the step that wafer dewaters；Air-out efficiency is high, ensure that wafer wind-engaging is uniform, particularly portable blowing, it is to avoid existing continue drying out the defect that the wafer internal stress brought is big, be easily damaged；It it is a kind of device drying thoroughly, operating safety.
2. the portable wafer hair-dryer that this utility model provides controls the temperature of rustless steel airduct and hollow corrosion resistant plate air by heating rod, thus being conducive to steam to be blown to wafer surface, improves water rem oval；Temperature monitoring equipment thermocouple is set especially on hollow corrosion resistant plate, ensures that air themperature is rationally controlled, such that it is able to effectively remove while wafer surface water, it is ensured that wafer serviceability is unaffected.
Accompanying drawing explanation
Fig. 1 is the structural representation of portable wafer hair-dryer in embodiment one；
Fig. 2 is the structural representation of hollow corrosion resistant plate in embodiment one；
Wherein: base plate 1, slide unit 2, driver 3, electric lifting rod 4, L-type connecting rod 5, hollow corrosion resistant plate 6, air exhauster 7, airduct 8, pipe joint 81, plastic tube 82, stainless steel tube 83, heating rod 9, heating rod 10, thermocouple 11, air vent 12.
Detailed description of the invention
Below in conjunction with drawings and Examples, this utility model is further described:
Embodiment one: shown in Figure 1, portable wafer hair-dryer includes base plate 1, slide unit 2, driver 3, electric lifting rod 4, L-type connecting rod 5, hollow corrosion resistant plate 6 and air exhauster 7；Base plate, driver, air exhauster are installed on the ground；Slide block is arranged on base plate；Driver is connected with slide block；Electric lifting rod is arranged on slide unit；L-type connecting rod one end is arranged on electric up-down boom end, and one end is welded to connect hollow corrosion resistant plate；Air exhauster is connected with hollow corrosion resistant plate by airduct 8；Airduct is connected, by pipe joint 81, the plastic tube 82 that caliber is 4 centimetres and forms with the stainless steel tube 83 that caliber is 3.5 centimetres；Plastic tube connects air exhauster, the pipeline of enough length is provided for removable blowing, stainless steel tube connects hollow corrosion resistant plate, stainless steel tube is provided with two heating rods, a piece heating rod 9 is positioned on stainless steel pipes near one end of pipe joint, another root heating rod 10 is positioned on stainless steel pipes near one end of hollow corrosion resistant plate, is conducive to air homogeneous heating, keeps certain temperature；Hollow corrosion resistant plate arranges thermocouple 11；Hollow corrosion resistant plate is cuboid structure, horizontal positioned, and one side down is provided with air vent.
In order to clearly show that hollow corrosion resistant plate, turned over turnback so that air vent upward, as shown in Figure 2；Hollow corrosion resistant plate 6 is cuboid structure, and simultaneously (in order to clearly show that air vent, in figure upward, actual should be down) be provided with the air vent 12 that diameter is 2.5mm.
Embodiment two: a kind of portable wafer hair-dryer is including base plate, slide unit, driver, electric lifting rod, L-type connecting rod, hollow corrosion resistant plate and air exhauster, consistent with embodiment one structure；Wherein two heating rods are positioned at stainless steel tube centre position.
Embodiment three: a kind of portable wafer hair-dryer is including base plate, slide unit, driver, electric lifting rod, L-type connecting rod, hollow corrosion resistant plate and air exhauster, consistent with embodiment one structure；Wherein one end of L-type connecting rod connects hollow corrosion resistant plate by screw.
During actual production, the top layer wafer with water is placed in wafer rack；Then wafer rack is placed on wafer hair-dryer limit, is positioned at the straight lower section of hollow corrosion resistant plate；Open air exhauster and temperature control, promote slide unit by driver, drive hollow corrosion resistant plate displacement；After certain distance, retract slide unit by driver, drive hollow corrosion resistant plate to return；So coming and going, air exhauster air-supply enters plastic tube, entering stainless steel tube through pipe joint, finally enters the hollow part of hollow corrosion resistant plate, blows out from the air vent of bottom surface so that thermal current is toward blowing down；The wafer that need to dry is positioned at immediately below hollow corrosion resistant plate, thus hot-fluid can blow to tide wafer, therefore realizes functions/drying, completes wafer and dry.Dry 1,000 wafer only need 3 minutes, and sampling result display all wafers damages without thermal stress.Add heat anomaly or other situations needing to adjust hollow hot plate and wafer relative altitude as run into, be easily accomplished by elevating lever.Therefore, utilize hair-dryer of the present utility model efficiently, safely, simply can dry wafer, particularly ensure that the performance of dried wafer is unaffected.
Claims (5)
1. a portable wafer hair-dryer, it is characterised in that: described portable wafer hair-dryer includes base plate, slide unit, driver, electric lifting rod, L-type connecting rod, hollow corrosion resistant plate and air exhauster；Described base plate is installed on the ground；Described driver is installed on the ground；Described slide block is arranged on base plate；Described driver is connected with slide block；Described electric lifting rod is arranged on slide unit；Described L-type connecting rod one end is arranged on electric up-down boom end, and one end connects hollow corrosion resistant plate；Described air exhauster is installed on the ground, is connected with hollow corrosion resistant plate by airduct；Described airduct is made up of plastic tube, stainless steel tube and pipe joint；Described plastic tube is connected by pipe joint with stainless steel tube；Described plastic tube connects air exhauster, and stainless steel tube connects hollow corrosion resistant plate；Described stainless steel tube is provided with two heating rods；Described hollow corrosion resistant plate arranges thermocouple；Described hollow corrosion resistant plate is cuboid structure；Described hollow corrosion resistant plate horizontal positioned；Described hollow corrosion resistant plate one side down is provided with air vent；The diameter of described air vent is 2mm～3mm.
2. portable wafer hair-dryer according to claim 1, it is characterised in that: the caliber of described plastic tube is 4 centimetres；The caliber of described stainless steel tube is 3.5 centimetres.
3. portable wafer hair-dryer according to claim 1, it is characterized in that: in described two heating rods, a piece heating rod is positioned on stainless steel pipes near one end of pipe joint, and another root heating rod is positioned on stainless steel pipes near one end of hollow corrosion resistant plate.
4. portable wafer hair-dryer according to claim 1, it is characterised in that: the diameter of described air vent is 2.5mm.
5. portable wafer hair-dryer according to claim 1, it is characterised in that: one end of described L-type connecting rod is welded to connect hollow corrosion resistant plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521111745.1U CN205352020U (en) | 2015-12-25 | 2015-12-25 | Portable wafer hair -dryer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201521111745.1U CN205352020U (en) | 2015-12-25 | 2015-12-25 | Portable wafer hair -dryer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205352020U true CN205352020U (en) | 2016-06-29 |
Family
ID=56170985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201521111745.1U Expired - Fee Related CN205352020U (en) | 2015-12-25 | 2015-12-25 | Portable wafer hair -dryer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205352020U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113294991A (en) * | 2021-05-13 | 2021-08-24 | 深圳市瑞之辰科技有限公司 | Silicon wafer processing and forming device |
-
2015
- 2015-12-25 CN CN201521111745.1U patent/CN205352020U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113294991A (en) * | 2021-05-13 | 2021-08-24 | 深圳市瑞之辰科技有限公司 | Silicon wafer processing and forming device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160629 Termination date: 20161225 |