CN205334053U - Photosensitive resist feeding device and photosensitive resist coating system - Google Patents
Photosensitive resist feeding device and photosensitive resist coating system Download PDFInfo
- Publication number
- CN205334053U CN205334053U CN201620100418.4U CN201620100418U CN205334053U CN 205334053 U CN205334053 U CN 205334053U CN 201620100418 U CN201620100418 U CN 201620100418U CN 205334053 U CN205334053 U CN 205334053U
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- photoresist
- connecting line
- controlled valve
- transfer conduit
- feedway
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Abstract
The utility model discloses a photosensitive resist feeding device and photosensitive resist coating system relates to and shows technical field, has solved the technical problem that life is short of the low interface with each pipeline of photosensitive resist feeding device's work efficiency. This photosensitive resist feeding device includes the container and supplies to glue the unit, supplies to glue the unit and includes glue outlet pipe way and air inlet pipeline, and the first end on glue outlet pipe way stretches into the container bottom, and the first end of air inlet pipeline stretches into the container top, and photosensitive resist feeding device still includes wash line, transmission pipeline, first connecting line and second connecting line, and transmission pipeline is used for transmitting the photosensitive resist to photosensitive resist coating unit, the second end on glue outlet pipe way communicates through the first end of second connecting line with transmission pipeline, and the first end of wash line is through the first end intercommunication of first connecting line with transmission pipeline, respectively be provided with a switching valve on first connecting line and the second connecting line. The utility model is used for coating photosensitive resist in picture composition process.
Description
Technical field
This utility model relates to Display Technique field, particularly relates to a kind of photoresist feedway and photoresist coating system。
Background technology
In the process making display base plate, it is necessary to being formed by patterning processes and have each rete figuratum, usual patterning processes includes the steps such as coating photoresist, mask, exposure, development。Wherein, in the step of coating photoresist, it is necessary to make coating system with photoresist。
Existing photoresist coating system includes the photoresist feedway and the photoresist apparatus for coating that are connected, wherein, photoresist feedway include container for holding photoresist and be positioned at container finish, by the glue supply unit of seal of vessel。This glue supply unit includes plastic emitting pipeline and air inlet pipeline, and wherein, container bottom is stretched in one end of plastic emitting pipeline, and the other end of plastic emitting pipeline is connected to photoresist apparatus for coating by transfer conduit, and container top is stretched in one end of air inlet pipeline。The process of this photoresist feedway offer photoresist is as follows: passes into compression drying air by air inlet pipeline in container, makes the pressure in container increase, and then be urged to by photoresist in plastic emitting pipeline, and is transmitted to photoresist apparatus for coating by transfer conduit。The process making display base plate typically requires replacing photoresist to meet different needs, when changing photoresist and needing transfer conduit is carried out, need manually transfer conduit to be disconnected with plastic emitting pipeline, then by transfer conduit and cleaning orifice, by clean interface to transfer conduit passes into compression drying air successively, clean feed liquid and it is carried out by compression drying air, last more manually by transfer conduit and cleaning interface disconnection, and by transfer conduit and plastic emitting pipeline connection。
But inventors herein have recognized that, in above process, not only need the interface of the interface to transfer conduit and plastic emitting pipeline and clean interface and be cleaned (for avoiding on each interface residual light photoresist or having foreign body to be mixed into), cause inefficiency, and abrasion that separated or connection the mechanical action of artificial just each interface can make each interface is relatively big, service life is shorter。
Utility model content
The purpose of this utility model is in that to provide a kind of photoresist feedway and photoresist coating system, for improving the work efficiency of photoresist feedway, and extends the service life of the interface of each pipeline in photoresist feedway。
For reaching above-mentioned purpose, this utility model provides a kind of photoresist feedway, adopts the following technical scheme that
This photoresist feedway includes the glue supply unit of the container for holding photoresist and the oral area being positioned at described container, described glue supply unit includes plastic emitting pipeline and air inlet pipeline, wherein, first end of described plastic emitting pipeline stretches into described container bottom, first end of described air inlet pipeline stretches into described container top, described photoresist feedway also includes detergent line, transfer conduit, the first connecting line and the second connecting line, and described transfer conduit is for by described photoresist transmission to photoresist apparatus for coating；Second end of described plastic emitting pipeline is connected with the first end of described transfer conduit by described second connecting line, and the first end of described detergent line is connected with the first end of described transfer conduit by described first connecting line；Described first connecting line and described second connecting line are each provided with a controlled valve。
This utility model provides a kind of photoresist feedway as above, when changing photoresist and needing transfer conduit is carried out, as long as making the controlled valve arranged on the first connecting line open, the controlled valve arranged on second connecting line is closed, compression drying air is passed into successively from the second end of detergent line, clean feed liquid and transfer conduit can be carried out by compression drying air, after cleaning terminates, as long as making the controlled valve arranged on the first connecting line close, the controlled valve arranged on second connecting line is opened, passing into compression drying air from the second end of air inlet pipeline can make photoresist transmit to photoresist apparatus for coating along plastic emitting pipeline and transfer conduit。In above process, have only to control the opening and closing of each controlled valve, without manually each pipeline being turned off or connects, therefore, the work efficiency of photoresist feedway can be effectively improved, and avoid between the interface of each pipeline because disconnecting or the mechanical action of connection and the abrasion that causes, extend the service life of the interface of each pipeline in photoresist feedway。
Additionally, this utility model also provides for a kind of photoresist coating system, this photoresist coating system includes photoresist feedway as above and the photoresist apparatus for coating connected with described photoresist feedway。
Owing to this photoresist coating system includes photoresist feedway as above, therefore, this photoresist coating system has the beneficial effect identical with above-mentioned photoresist feedway, no longer repeats herein。
Accompanying drawing explanation
In order to be illustrated more clearly that this utility model embodiment or technical scheme of the prior art, below the accompanying drawing used required during embodiment is described is briefly described, apparently, accompanying drawing in the following describes is only embodiments more of the present utility model, for those of ordinary skill in the art, under the premise not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings。
Fig. 1 is the structure chart one of the photoresist feedway in this utility model embodiment；
Fig. 2 is the structure chart two of the photoresist feedway in this utility model embodiment；
Fig. 3 is the structure chart of the photoresist coating system in this utility model embodiment。
Description of reference numerals:
1 container；21 plastic emitting pipelines；22 air inlet pipelines；
23 outlet pipes；24 Pressure gauges；3 detergent lines；
4 first connecting lines；5 transfer conduit；6 second connecting lines；
7 the 3rd connecting lines；8 first photoresist filters；9 the 4th connecting lines；
10 second photoresist filters；11 the 5th connecting lines。
Detailed description of the invention
Below in conjunction with the accompanying drawing in this utility model embodiment, the technical scheme in this utility model embodiment is clearly and completely described, it is clear that described embodiment is a part of embodiment of this utility model, rather than whole embodiments。Based on the embodiment in this utility model, the every other embodiment that those of ordinary skill in the art obtain under not making creative work premise, broadly fall into the scope of this utility model protection。
This utility model embodiment provides a kind of photoresist feedway, as shown in Figure 1, this photoresist feedway includes the container 1 (such as photoetching packing element) for holding photoresist and is positioned at the oral area of container 1, the glue supply unit that sealed by container 1, glue supply unit includes plastic emitting pipeline 21 and air inlet pipeline 22, wherein, first end of plastic emitting pipeline 21 stretches into bottom container 1, and the first end of air inlet pipeline 22 stretches into container 1 top；Photoresist feedway also includes detergent line the 3, first connecting line 4, transfer conduit 5 and the second connecting line 6, and transfer conduit 5 is for by photoresist transmission to photoresist apparatus for coating；Second end of plastic emitting pipeline 21 is connected with the first end of transfer conduit 5 by the second connecting line 6, first end of detergent line 3 is connected with the first end of transfer conduit 5 by the first connecting line 4, and the first connecting line 4 and the second connecting line 6 are each provided with a controlled valve。
Alternatively, air inlet pipeline 22 is provided with a controlled valve, to facilitate the opening and closing to air inlet pipeline 22 to be controlled。Second end of detergent line 3 and cleaning orifice, clean interface and can pass into compression drying air in detergent line 3 or clean feed liquid；Second end of air inlet pipeline 22 connects with compression drying air interface。
Owing to the photoresist feedway in this utility model embodiment has structure as above, therefore, when changing photoresist and needing transfer conduit 5 is carried out, as long as making the controlled valve arranged on the first connecting line 4 open, the controlled valve arranged on second connecting line 6 is closed, compression drying air (CondensedDryAir is passed into successively from the second end of detergent line 3, it is called for short CDA), clean feed liquid and transfer conduit 5 can be carried out by compression drying air, after cleaning terminates, as long as making the controlled valve arranged on the first connecting line 4 close, the controlled valve arranged on second connecting line 6 is opened, passing into compression drying air from the second end of air inlet pipeline 22 can make photoresist transmit to photoresist apparatus for coating along plastic emitting pipeline 21 and transfer conduit 5。In above process, have only to control the opening and closing of each controlled valve, without manually each pipeline being turned off or connects, therefore, the work efficiency of photoresist feedway can be effectively improved, and avoid between the interface of each pipeline because disconnecting or the mechanical action of connection and the abrasion that causes, extend the service life of the interface of each pipeline in photoresist feedway。
Additionally, compared with photoresist feedway of the prior art, use this photoresist feedway will not increase the complexity producing line and technological process, and avoid each interface and introduce foreign body, and can be prevented effectively from and sow the loss with yield because of what manual operation brought。
Further, as shown in Figure 1, photoresist feedway in this utility model embodiment also includes the 3rd connecting line 7, first end and first connecting line 4 of the 3rd connecting line 7 connect, part connection between second end and the controlled valve being located thereon setting and the plastic emitting pipeline 21 of the second connecting line 6 of the 3rd connecting line 7, the 3rd connecting line 7 is provided with a controlled valve。Wherein, first end of the 3rd connecting line 7 can connect with the optional position of the first connecting line 4, in this utility model embodiment preferably, first end of the 3rd connecting line 7 connects with the part between the controlled valve being located thereon setting and transfer conduit 5 of the first connecting line 4, and then make the controlled valve arranged on the first connecting line 4 cleaning process of plastic emitting pipeline 21 can also be played control action, improve the controllability of this cleaning process。
This utility model embodiment connects for the first end of the 3rd connecting line 7 with the part between the controlled valve being located thereon setting and transfer conduit 5 of the first connecting line 4 below, the cleaning process of plastic emitting pipeline 21 is described in detail: when plastic emitting pipeline 21 is carried out, first the controlled valve arranged on the first connecting line 4 is made to open, the controlled valve arranged on 3rd connecting line 7 is opened, detergent line 3 connects with plastic emitting pipeline 21, the controlled valve arranged on second connecting line 6 is closed, and plastic emitting pipeline 21 does not connect with transfer conduit 5；Then, pass into compression drying air successively from detergent line 3, clean feed liquid and compression drying air, above compression drying air, cleaning feed liquid and compression drying air arrive plastic emitting pipeline 21 along detergent line the 3, first connecting line the 4, the 3rd connecting line 7 and the second connecting line 6, and then plastic emitting pipeline 21 is carried out。Therefore, in the process that plastic emitting pipeline 21 is carried out, without manually carrying out the disconnection of plastic emitting pipeline and cleaning interface and connecting, it is possible to improve the work efficiency of photoresist feedway further, and extend the service life of the interface of plastic emitting pipeline 21。
Alternatively, as shown in Figure 2, photoresist feedway in this utility model embodiment also includes the first photoresist filter 8, the glue-feeder of the first photoresist filter 8 is connected with the second end of transfer conduit 5 by the 4th connecting line 9, and first the gum exudation mouth of photoresist filter 8 connect with photoresist apparatus for coating, 4th connecting line 9 is provided with a controlled valve, and then makes photoresist feedway be supplied to the photoresist of photoresist apparatus for coating evenly。
First photoresist filter 8 cannot be continuing with after cleaning, needs are replaced, in Renewal process, photoresist feedway cannot provide photoresist for photoresist apparatus for coating, cause the inefficiency of photoresist feedway, based on case above, in this utility model embodiment preferably as shown in Figure 2, photoresist feedway also includes the second photoresist filter 10, the glue-feeder of the second photoresist filter 10 is connected with the second end of transfer conduit 5 by the 5th connecting line 11, and second the gum exudation mouth of photoresist filter 10 connect with photoresist apparatus for coating, 5th connecting line 11 is provided with a controlled valve。Now, after first photoresist filter 8 has been cleaned, without changing the first photoresist filter 8 at once, have only to be passed into by new photoresist in the second photoresist filter 10, new photoresist can be supplied to photoresist apparatus for coating by the second photoresist filter 10, and then the work efficiency of photoresist feedway can be improved, the first photoresist filter 8 is changed at one's leisure follow-up, such as, when photoresist feedway provides photoresist for photoresist apparatus for coating, or the first photoresist filter 8 changed by photoresist feedway when not working。
You need to add is that, the English name of above-mentioned photoresist filter (general designation of the first photoresist filter 8 and the second photoresist filter 10) is PRFilter。
Alternatively, as depicted in figs. 1 and 2, glue supply unit in this utility model embodiment also includes gas exhaust piping 23, first end of gas exhaust piping 23 stretches into container 1 top, this gas exhaust piping 23 is used in container 1 during hypertonia, or when needing plastic emitting pipeline 21 is carried out, or need to be exhausted when transfer conduit 5 is carried out。Further, as depicted in figs. 1 and 2, the gas exhaust piping 23 in this utility model embodiment is provided with a controlled valve, to facilitate the opening and closing to this gas exhaust piping 23 accurately to control。
Further, as depicted in figs. 1 and 2, glue supply unit in this utility model embodiment also includes the Pressure gauge 24 being connected on gas exhaust piping 23, Pressure gauge 24 is for detecting the pressure in container 1, and then can timely and accurately the pressure in container 1 be detected, opening and closing for air inlet pipeline 22 and gas exhaust piping 23 provide foundation, and provide foundation for the air inflow of air inlet pipeline 22 and the control of feed rate, and then can effectively ensure that photoresist feedway can provide photoresist to photoresist apparatus for coating evenly。
Additionally, the above-mentioned each controlled valve in this utility model embodiment is both preferably precision and motility electromagnetic valve all preferably。
For the ease of it will be appreciated by those skilled in the art that the detailed process that the photoresist feedway with said structure is changed photoresist by following this utility model embodiment is described in detail:
First, making the controlled valve on gas exhaust piping 23 open, container 1 is exhausted, this exhaust process should carry out according to the data of Pressure gauge 24 detection；Then, the controlled valve on the second connecting line 6 is made to close, plastic emitting pipeline 21 does not connect with transfer conduit 5, controlled valve on 4th connecting line 9 is opened, transfer conduit 5 connects with the first photoresist filter 8, controlled valve on 5th connecting line 11 is closed, and transfer conduit 5 does not connect with the second photoresist filter 10；Then, making the controlled valve on the first connecting line 4 open, detergent line 3 connects with transfer conduit 5；Passing into compression drying air in detergent line 3, this compression drying air passes sequentially through detergent line the 3, first connecting line 4 and arrives transfer conduit 5, and transfer conduit 5 is carried out (being used for blowing away residual light photoresist)；Then pass in detergent line 3 and clean feed liquid transfer conduit 5 and the first photoresist filter 8 are carried out (for removing the photoresist of residual) then,；Then, in detergent line 3, pass into compression drying air again transfer conduit 5 is carried out (being used for blowing away cleaning feed liquid), between this step and above-mentioned steps, it is possible to plastic emitting pipeline 21 is carried out, concrete cleaning way, in detailed description carried out above, is not repeated herein；Then, the controlled valve on the first connecting line 4 is made to close, detergent line 3 does not connect with transfer conduit 5, controlled valve on 4th connecting line 9 is closed, transfer conduit 5 does not connect with the first photoresist filter 8, controlled valve on 5th connecting line 11 is opened, and transfer conduit 5 connects with the second photoresist filter 10；Finally, in the second photoresist filter 10, new photoresist is squeezed into by plastic emitting pipeline the 21, second connecting line 6 and transfer conduit 5, between this step and above-mentioned steps, it is possible to the first photoresist filter 8 is replaced。
Additionally, this utility model embodiment additionally provides a kind of photoresist coating system, as it is shown on figure 3, this photoresist coating system includes any of the above photoresist feedway and the photoresist apparatus for coating connected with photoresist feedway。Owing to this photoresist coating system includes photoresist feedway as above, therefore, this photoresist coating system has the beneficial effect identical with above-mentioned photoresist feedway, no longer repeats herein。
The above; it is only detailed description of the invention of the present utility model; but protection domain of the present utility model is not limited thereto; any those familiar with the art is in the technical scope that this utility model discloses; change can be readily occurred in or replace, all should be encompassed within protection domain of the present utility model。Therefore, protection domain of the present utility model should be as the criterion with described scope of the claims。
Claims (10)
1. a photoresist feedway, glue supply unit including container with the oral area being positioned at described container for holding photoresist, described glue supply unit includes plastic emitting pipeline and air inlet pipeline, wherein, first end of described plastic emitting pipeline stretches into described container bottom, first end of described air inlet pipeline stretches into described container top, it is characterised in that
Described photoresist feedway also includes detergent line, transfer conduit, the first connecting line and the second connecting line, and described transfer conduit is for by described photoresist transmission to photoresist apparatus for coating；Second end of described plastic emitting pipeline is connected with the first end of described transfer conduit by described second connecting line, and the first end of described detergent line is connected with the first end of described transfer conduit by described first connecting line；Described first connecting line and described second connecting line are each provided with a controlled valve。
2. photoresist feedway according to claim 1, it is characterized in that, also include the 3rd connecting line, first end of described 3rd connecting line connects with described first connecting line, second end of described 3rd connecting line connects with the part between the controlled valve being located thereon setting of described second connecting line and described plastic emitting pipeline, and described 3rd connecting line is provided with a controlled valve。
3. photoresist feedway according to claim 2, it is characterised in that the first end of described 3rd connecting line connects with the part between the controlled valve being located thereon setting and described transfer conduit of described first connecting line。
4. photoresist feedway according to claim 1, it is characterized in that, also include the first photoresist filter, the glue-feeder of described first photoresist filter is connected with the second end of described transfer conduit by the 4th connecting line, and the gum exudation mouth of described first photoresist filter connects with described photoresist apparatus for coating, described 4th connecting line is provided with a controlled valve。
5. photoresist feedway according to claim 4, it is characterized in that, also include the second photoresist filter, the glue-feeder of described second photoresist filter is connected with the second end of described transfer conduit by the 5th connecting line, and the gum exudation mouth of described second photoresist filter connects with described photoresist apparatus for coating, described 5th connecting line is provided with a controlled valve。
6. photoresist feedway according to claim 1, it is characterised in that described glue supply unit also includes gas exhaust piping, the first end of described gas exhaust piping stretches into described container top。
7. photoresist feedway according to claim 6, it is characterised in that be provided with a controlled valve on described gas exhaust piping。
8. the photoresist feedway according to claim 6 or 7, it is characterised in that described glue supply unit also includes the Pressure gauge being connected on described gas exhaust piping, described Pressure gauge is for detecting the pressure in described container。
9. photoresist feedway according to claim 1, it is characterised in that be provided with a controlled valve on described air inlet pipeline。
10. a photoresist coating system, it is characterised in that include the photoresist feedway as described in any one of claim 1～9 and with as described in the photoresist apparatus for coating that connects of photoresist feedway。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620100418.4U CN205334053U (en) | 2016-02-01 | 2016-02-01 | Photosensitive resist feeding device and photosensitive resist coating system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620100418.4U CN205334053U (en) | 2016-02-01 | 2016-02-01 | Photosensitive resist feeding device and photosensitive resist coating system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205334053U true CN205334053U (en) | 2016-06-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620100418.4U Expired - Fee Related CN205334053U (en) | 2016-02-01 | 2016-02-01 | Photosensitive resist feeding device and photosensitive resist coating system |
Country Status (1)
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| CN (1) | CN205334053U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107520099A (en) * | 2017-09-11 | 2017-12-29 | 京东方科技集团股份有限公司 | A kind of coating unit |
| CN110787967A (en) * | 2019-11-12 | 2020-02-14 | 江西沃格光电股份有限公司 | Photoresist coating system and coating method |
| CN110947707A (en) * | 2018-09-27 | 2020-04-03 | 长鑫存储技术有限公司 | Photoresist supply pipeline cleaning system and method |
| CN112329900A (en) * | 2020-11-05 | 2021-02-05 | 惠科股份有限公司 | Control method and device for cleaning photoresist pipeline and computer readable storage medium |
| CN113341654A (en) * | 2020-02-18 | 2021-09-03 | 长鑫存储技术有限公司 | Photoresist supply device |
-
2016
- 2016-02-01 CN CN201620100418.4U patent/CN205334053U/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107520099A (en) * | 2017-09-11 | 2017-12-29 | 京东方科技集团股份有限公司 | A kind of coating unit |
| CN107520099B (en) * | 2017-09-11 | 2019-11-05 | 京东方科技集团股份有限公司 | A kind of coating unit |
| US11383263B2 (en) | 2017-09-11 | 2022-07-12 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Coating device |
| CN110947707A (en) * | 2018-09-27 | 2020-04-03 | 长鑫存储技术有限公司 | Photoresist supply pipeline cleaning system and method |
| CN110787967A (en) * | 2019-11-12 | 2020-02-14 | 江西沃格光电股份有限公司 | Photoresist coating system and coating method |
| CN113341654A (en) * | 2020-02-18 | 2021-09-03 | 长鑫存储技术有限公司 | Photoresist supply device |
| CN113341654B (en) * | 2020-02-18 | 2023-02-28 | 长鑫存储技术有限公司 | Photoresist supply device |
| CN112329900A (en) * | 2020-11-05 | 2021-02-05 | 惠科股份有限公司 | Control method and device for cleaning photoresist pipeline and computer readable storage medium |
| CN112329900B (en) * | 2020-11-05 | 2022-01-07 | 惠科股份有限公司 | Control method and device for cleaning photoresist pipeline and computer readable storage medium |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160622 Termination date: 20220201 |
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| CF01 | Termination of patent right due to non-payment of annual fee |